JP2005085877A - Method of manufacturing device, device, and electronic apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a device for making contribution to an improvement in productivity and quality at the time of forming the predetermined pattern on a substrate using a liquid-drop discharging head. <P>SOLUTION: When an interval of discharging nozzles of a liquid-drop discharging head is defined as a, the diameter of a liquid-drop as D, the size of a unit region in the direction crossing the predetermined direction as by, and the size of the unit region in the predetermined direction as bx1, the unit region is set using the number of divisions ny and nx for satisfying the conditions of (D/2)<by<D and a=by×ny(ny is a positive integer), (D/2)<bx1<D, and a=bx1×nx(nx is a positive integer). <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a device manufacturing method, a device, and an electronic apparatus.

  2. Description of the Related Art Conventionally, a photolithography method has been frequently used as a method for manufacturing a fine wiring pattern such as a semiconductor integrated circuit. On the other hand, Patent Document 1, Patent Document 2, and the like disclose a method using a droplet discharge method. The techniques disclosed in these publications form a wiring pattern by disposing (applying) a material on a pattern forming surface by discharging a functional liquid containing a pattern forming material from a droplet discharge head onto a substrate. It is said to be very effective, such as being able to cope with a variety of small-volume production.

In the droplet discharge head, it is preferable from the viewpoint of productivity to use a multi-nozzle head including a plurality of discharge nozzles for discharging droplets. However, the pitch of the wiring pattern (pattern pitch) does not necessarily match the nozzle interval a of the droplet discharge head. Therefore, in order to make the nozzle interval and the pattern pitch coincide with each other, there is a technique for scanning while the droplet discharge head is tilted by a predetermined angle θ with respect to a direction orthogonal to the scanning direction (hereinafter referred to as “non-scanning direction” as appropriate). Patent Document 3 discloses this.
In addition, a pattern formed by droplet discharge is rarely used alone, and often functions in combination with another thin film pattern formed by photolithography before and after the pattern. In such a case, although the patterning accuracy by photolithography is better than the patterning accuracy by droplet ejection, the nozzle pitch of the droplet ejection device has hitherto been limited when designing a pattern to be formed by photolithography. It was never considered. For this reason, the above-mentioned problems occur, and the head is tilted to perform scanning. Therefore, even when a head having a plurality of nozzles is used, a pattern cannot be ejected efficiently.
Japanese Patent Laid-Open No. 11-274671 JP 2000-216330 A JP-A-9-300664

However, the following problems exist in the conventional technology as described above.
With the technique disclosed in the above publication, it is possible to match the pattern pitch by in the non-scanning direction with the nozzle pitch in the non-scanning direction, but match the pattern pitch bx in the scanning direction with the nozzle pitch in the scanning direction. It is difficult to make it. This is an integer ratio between the pattern pitch by in the non-scanning direction and the nozzle pitch a · cos θ in the non-scanning direction, but the pattern pitch bx in the scanning direction and a · sin θ that is the nozzle pitch in the scanning direction. Is not a realistic integer ratio.

On the other hand, even when the droplet ejection head is tilted, it is possible to eject droplets to a desired position in the scanning direction by adjusting the timing of ejecting droplets from each of the ejection nozzles. It is necessary to make the discharge operation control interval in the scanning direction of the nozzle fine, which causes a reduction in scanning speed and a complicated control, resulting in a reduction in productivity. Further, even when the pattern pitch bx in the scanning direction and the nozzle pitch a · sin θ in the scanning direction are set to an integer ratio, if the droplet discharge pitch is large, the liquid is present at a portion of the line. There is a possibility that a bulge that causes a quality defect such as a disconnection of a line or a short circuit with another line may occur due to a liquid pool generated by concentration.
Furthermore, if a linear wiring pattern is to be formed in the non-scanning direction, it is necessary to make the ejection operation control interval in the scanning direction fine as described above, which causes a problem of reducing productivity.

  The present invention has been made in consideration of the above points. When a predetermined pattern is formed on a substrate using a multi-nozzle head, the pattern is formed by contributing to improvement in productivity and quality. An object of the present invention is to provide a device manufacturing method, a device, and an electronic apparatus.

In order to achieve the above object, the present invention employs the following configuration.
In the device manufacturing method of the present invention, the droplet discharge head and the substrate are relatively moved in a predetermined direction, and the plurality of discharge nozzles arranged at predetermined intervals in the direction intersecting the predetermined direction are arranged on the droplet discharge head. In a device manufacturing method including a step of discharging a liquid material to a substrate and forming a predetermined pattern on the substrate, a plurality of lattice-shaped discharge liquid droplets of the liquid material are discharged onto the substrate. A step of setting a unit region; and a step of discharging the droplets from the discharge nozzle to a predetermined unit region of the plurality of unit regions to form the pattern. When the interval between the discharge nozzles is a, the diameter of the droplet is D, the size of the unit region in the direction intersecting the predetermined direction is by, and the size of the unit region in the predetermined direction is bx1. D / 2) <by <D and a = by × ny (ny is a positive integer), (D / 2) <bx1 <D and a = bx1 × nx (nx is a positive integer) The unit area is set using the number of divisions ny and nx to be performed.

Accordingly, in the present invention, a plurality of grid-like unit regions to be ejected with droplets, that is, a bitmap is preset on the substrate, and droplets are ejected to the unit region of the bitmap. When setting the map, the size by in the direction (non-scanning direction) intersecting the predetermined direction of the unit area (or pixel) and the interval a between the discharge nozzles of the droplet discharge head is an integer ratio, and the liquid is not changed. Even if the droplet discharge head is not tilted, the discharge nozzle and the unit area can be matched. Accordingly, it is possible to discharge a droplet to a desired discharge position without the need for complicated control regarding the discharge operation. In other words, by setting a bitmap, that is, a pattern design rule, according to the interval “a” of the discharge nozzles, the discharge nozzles coincide with the unit area, and the discharge operation can be performed without reducing the scanning speed.
In the present invention, the number of divisions, which is the number of unit regions arranged in a predetermined direction (scanning direction) and a non-scanning direction, is set based on the diameter of the droplet (droplet diameter), so that the discharge nozzle pitch and liquid It is possible to set an optimum unit area according to the droplet diameter, and it is possible to improve productivity. Furthermore, when the size of the unit region is small, even if the unit region is skipped by one and droplets are ejected, the droplets may come into contact with each other and a bulge may be generated. Since the sizes by and bx1 are larger than half of the droplet diameter D, this problem can be solved. In this case, when the liquid droplets are continuously discharged, it is preferable that the liquid droplets be discharged at least outside the adjacent unit regions.

In the device manufacturing method of the present invention, L = ny × np (np is a positive integer), where L is the number of unit regions corresponding to the pitch in the direction intersecting the predetermined direction of the plurality of patterns. Configuration is adopted.
As a result, it is possible to discharge droplets to a unit region of the same dot arrangement (droplet discharge arrangement) for a plurality of patterns, and pattern design can be easily performed to improve productivity. Can do.

  Further, the device manufacturing method of the present invention includes a plurality of discharge nozzles arranged in a direction intersecting the predetermined direction on the droplet discharge head while relatively moving the droplet discharge head and the substrate in a predetermined direction. In a device manufacturing method including a step of discharging a liquid material to the substrate and forming a predetermined pattern on the substrate, a plurality of lattice-like shapes on which droplets of the liquid material are discharged on the substrate And a step of forming the pattern by discharging the droplets from the discharge nozzle to a predetermined unit region of the plurality of unit regions. The specified value in the direction intersecting with the predetermined direction is bky, the interval between the discharge nozzles of the droplet discharge head is a, the diameter of the droplet is D, and the size of the unit region in the direction intersecting with the predetermined direction. By2, when the size of the unit area in the predetermined direction is bx2, and when the liquid droplet ejection head is moved relative to the direction orthogonal to the predetermined direction at an angle θ, (D / 2) <by2 < D and the number of divisions ny satisfying the conditions of bky = by2 × ny (ny is a positive integer), (D / 2) <bx2 <D, and a · sin θ = bx2 × nx (nx is a positive integer), The unit area is set using nx.

According to the present invention, for example, some restrictions occur in the process including before and after the droplet discharge process, and the size of the unit area in the direction intersecting the predetermined direction (non-scanning direction) cannot be set based on the interval between the discharge nozzles. Even so, by tilting the droplet discharge head by the angle θ and setting the size of the unit area in the scanning direction and the non-scanning direction to be by2 and bx2, respectively, the discharge nozzle and the unit area can be matched. .
Further, in the present invention, when the size of the unit region is small, there is a possibility that even if the unit region is skipped and the droplet is ejected, the droplets come into contact with each other and a bulge may occur. In this case, since the unit areas size by and bx2 are larger than half of the droplet diameter D, this problem can be solved.

The device of the present invention is manufactured by the device manufacturing method described above. According to the present invention, a device having a pattern formed with high pattern accuracy is provided.
An electronic apparatus according to the present invention includes the above-described device.
According to the present invention, an electronic apparatus equipped with a high-performance device is provided.

Here, the droplet discharge head in the present invention includes a droplet discharge head provided in a droplet discharge apparatus. The droplet discharge head is a device that can quantitatively discharge a liquid material by a droplet discharge method, for example, a device capable of quantitatively intermittently dropping 1 to 300 nanograms of a liquid material (fluid).
By adopting a droplet discharge method as a device manufacturing method, the reflective film can be formed in a predetermined pattern with inexpensive equipment.
As a droplet discharge method, a piezo jet method in which a fluid (liquid material) is discharged by a change in volume of a piezoelectric element is a method in which a fluid is discharged when steam is suddenly generated by the application of heat. There may be.

  Here, the fluid refers to a medium having a viscosity that can be discharged (dropped) from the discharge nozzle of the droplet discharge head. It does not matter whether it is aqueous or oily. It is sufficient if it has fluidity (viscosity) that can be discharged from a nozzle or the like. In addition to the material dispersed in the solvent as fine particles, the material contained in the fluid may be dissolved by heating above the melting point. In addition to the solvent, dyes, pigments and other functional materials are added. It may be a thing. In addition to a flat substrate, the substrate may be a curved substrate. Furthermore, the hardness of the pattern formation surface does not need to be high, and it may be a flexible surface such as a film, paper, or rubber, in addition to glass, plastic, or metal.

  The device in the present invention includes an element and apparatus having a predetermined wiring pattern, a color filter, or the like.

Hereinafter, embodiments of a device manufacturing method, a device, and an electronic apparatus according to the present invention will be described with reference to FIGS.
(First embodiment)
FIG. 1 is a schematic external perspective view of a droplet discharge apparatus equipped with a droplet discharge head used in the device manufacturing method of the present invention.
In FIG. 1, a droplet discharge device IJ includes a droplet discharge head 1, an X-axis direction drive shaft 4, a Y-axis direction guide shaft 5, a control device 6, a stage 7, a cleaning mechanism 8, and a base. 9 and a heater 15.
The stage 7 supports the substrate 101 on which a liquid material is provided by the droplet discharge device IJ, and includes a fixing mechanism (not shown) that fixes the substrate 101 to a reference position.

  The droplet discharge head 1 is a multi-nozzle type droplet discharge head including a plurality of discharge nozzles, and the longitudinal direction and the Y-axis direction are made to coincide. The plurality of ejection nozzles are provided on the lower surface of the droplet ejection head 1 at regular intervals along the Y-axis direction. For example, a liquid material containing conductive fine particles is discharged from the discharge nozzle of the droplet discharge head 1 to the substrate 101 supported by the stage 7.

  FIG. 2 is a view of the droplet discharge head 1 as viewed from the nozzle surface side (the surface facing the substrate 101). As shown in FIG. 2, the droplet discharge head 1 includes a plurality of head portions 21 and a carriage portion 22 on which these head portions 21 are mounted. The nozzle surface 24 of the head unit 21 is provided with a plurality of discharge nozzles 10 for discharging liquid material droplets. Each of the head portions 21 (nozzle surfaces 24) has a rectangular shape in plan view, and the discharge nozzles 10 are arranged in a line at regular intervals along the substantially Y-axis direction that is the longitudinal direction of the head portion 21 and the head portions 21. A plurality of nozzle surfaces 24 (for example, 180 nozzles in one row, a total of 360 nozzles) are provided in two rows at intervals in the substantially X-axis direction that is the width direction. In addition, the head unit 21 directs the discharge nozzle 10 toward the substrate 101 and is arranged in a line along the substantially Y-axis direction with a predetermined interval in the X-axis direction while being inclined at a predetermined angle with respect to the Y-axis. A plurality (6 in one row, 12 in total in FIG. 2) are positioned and supported on the carriage portion 22 in a state of being arranged in two rows.

  Here, the droplet discharge head 1 includes an angle adjustment mechanism (not shown) that can adjust the attachment angle of the droplet discharge head 1 with respect to the Y-axis direction. By this angle adjustment mechanism, the droplet discharge head 1 makes the angle θ with respect to the Y-axis direction variable. By driving the angle adjustment mechanism, the discharge nozzles 10 can be arranged side by side in the Y-axis direction, or the angle of the alignment direction of the discharge nozzles 10 with respect to the Y-axis can be adjusted.

Returning to FIG. 1, the X-axis direction drive motor 2 is connected to the X-axis direction drive shaft 4. The X-axis direction drive motor 2 is a stepping motor or the like, and rotates the X-axis direction drive shaft 4 when a drive signal in the X-axis direction is supplied from the control device 6. When the X-axis direction drive shaft 4 rotates, the droplet discharge head 1 moves in the X-axis direction.
The Y-axis direction guide shaft 5 is fixed so as not to move with respect to the base 9. The stage 7 includes a Y-axis direction drive motor 3. The Y-axis direction drive motor 3 is a stepping motor or the like, and moves the stage 7 in the Y-axis direction when a drive signal in the Y-axis direction is supplied from the control device 6.

The control device 6 supplies a droplet discharge control voltage to the droplet discharge head 1. In addition, a drive pulse signal for controlling the movement of the droplet discharge head 1 in the X-axis direction is supplied to the X-axis direction drive motor 2, and a drive pulse signal for controlling the movement of the stage 7 in the Y-axis direction is sent to the Y-axis direction drive motor 3. Supply.
The cleaning mechanism 8 cleans the droplet discharge head 1. The cleaning mechanism 8 is provided with a Y-axis direction drive motor (not shown). By driving the drive motor in the Y-axis direction, the cleaning mechanism moves along the Y-axis direction guide shaft 5. The movement of the cleaning mechanism 8 is also controlled by the control device 6.
Here, the heater 15 is a means for heat-treating the substrate 101 by lamp annealing, and performs evaporation and drying of the solvent contained in the liquid material applied on the substrate 101. The controller 6 also controls the turning on and off of the heater 15.

  In the present embodiment, the droplet discharge device IJ forms a wiring pattern on the substrate 101. Therefore, the liquid material contains conductive fine particles (metal fine particles) which are wiring pattern forming materials. The liquid material is obtained by pasting metal fine particles using a predetermined solvent and a binder resin. Examples of the metal fine particles include gold, silver, copper, and iron. The particle diameter of the metal fine particles is preferably 5 to 100 nm. The liquid material discharged from the droplet discharge head 1 onto the substrate 101 is converted (formed) into a conductive film by heat treatment with the heater 15.

  Furthermore, as the liquid material for forming the wiring pattern, a liquid material containing an organometallic compound, an organometallic complex, and the like can be used. Examples of the organic metal compound include an organic silver compound, and a solution obtained by dispersing (dissolving) an organic silver compound in a predetermined solvent can be used as a liquid material for forming a wiring pattern. In this case, for example, diethylene glycol diethyl ether can be used as the solvent. When an organic silver compound (organometallic compound) is used as the liquid material, the organic component is removed by heat treatment or light treatment of the liquid material, and silver particles (metal particles) remain to develop conductivity.

  The droplet discharge device IJ discharges droplets onto the substrate 101 while relatively scanning the droplet discharge head 1 and the stage 7 that supports the substrate 101. Here, in the following description, the X-axis direction is a scanning direction (predetermined direction), and the Y-axis direction orthogonal to the X-axis direction is a non-scanning direction. Therefore, the discharge nozzles of the droplet discharge head 1 are provided at regular intervals in the Y-axis direction, which is the non-scanning direction.

Next, a method for manufacturing a device by discharging droplets onto the substrate 101 using the droplet discharge head 1 will be described with reference to FIGS.
The manufacturing method according to the present embodiment includes a step of setting a grid-like bitmap composed of a plurality of pixels (unit regions) that are regions on which droplets are to be ejected on a substrate 101, and a predetermined pixel of the bitmap. And a step of discharging droplets.

FIG. 3 is a diagram schematically showing a plurality of discharge nozzles 10 provided in the droplet discharge head 1 and a bitmap set on the substrate 101.
In the present embodiment, as shown in FIG. 3, the size in the X-axis direction (scanning direction) of one pixel (unit region) is bx1, and the size in the Y-axis direction (non-scanning direction) is by. .

The droplet discharge head 1 has the longitudinal direction aligned with the Y-axis direction. In addition, the discharge nozzles 10 are provided at regular intervals a in the Y-axis direction in the droplet discharge head 1. Each of the plurality of discharge nozzles 10 is arranged along the Y-axis direction.
In the present embodiment, the size by of the pixel in the Y-axis direction is set to a value obtained by dividing the interval a into a plurality so as to be smaller than the interval (pitch) a between the discharge nozzles 10.
Here, when the diameter of the droplets discharged from the discharge nozzle 10 is D, the division number ny (ny is a positive integer) satisfies a = by × ny and (D / 2) <by <D. Set to a satisfactory value.
Similarly, the size bx1 of the pixel in the X-axis direction is set to a value obtained by dividing the discharge nozzle interval a into a plurality, and the division number nx (nx is a positive integer) satisfies a = bx1 × nx, In addition, a value satisfying (D / 2) <bx1 <D is set.

  In addition, when by and bx1 are small, even when droplets are ejected by skipping one pixel, the droplets may come into contact with each other and a bulge may be generated. This problem can be resolved by making it larger than half. In this case, when the liquid droplets are continuously discharged, it is preferable that the liquid droplets be discharged at least outside the adjacent unit regions.

Thus, when setting a bitmap,
by = a / ny (1)
bx1 = a / nx (2)
Thus, the size of one pixel in the Y-axis direction is set.

(Example)
Assuming that the arrangement interval a of the discharge nozzles 10 is 120 μm and the diameter d of the droplets discharged from the discharge nozzles 10 is 55 μm, the pixel sizes by and bx1 are both 27.5 μm <by and bx1 <55 μm. The numbers ny and nx are selected from integers 3 to 4. At this time, if the number of divisions ny and nx is too large, the number of passes (number of step movements for scanning movement) increases in the Y-axis direction, especially in the non-scanning direction, or the scanning speed is slowed down and productivity is lowered. In addition, there is a possibility that the ejection performance of the droplet ejection head, such as the driving frequency and the minimum droplet diameter, does not sufficiently follow in the X-axis direction of the scanning direction.

On the other hand, if the division numbers ny and nx are too small, the pattern formed by the discharged droplets becomes rough, and the shape may become unstable or a bulge may occur. Further, when the numerical value part (the part excluding the unit μm) of the step moving distance and the droplet discharge pitch is an integer or has no fraction, data input at the time of design and manufacturing becomes easy, so that productivity is improved.
In consideration of these points, in the present embodiment, the division number ny in the non-scanning direction and the division number nx in the scanning direction are set to 4 or 3, respectively.
FIG. 3 shows an example in which the division number ny in the non-scanning direction (Y-axis direction) is set to 4, and FIG. 4 shows an example in which the division number nx in the scanning direction (X-axis direction) is set to 3. It is shown.
By setting the division numbers ny and nx in this way, the size by 1 in the Y-axis direction of one pixel is set to 30 μm from the equation (1), and the size bx1 in the X-axis direction is set to 40 μm from the equation (2). Is done.

FIG. 4 is a schematic diagram when droplets are ejected onto the substrate 101 by a single scan using the ejection nozzle 10. In FIG. 4, “1” is given to the droplets ejected in the first scanning.
In the following description using FIGS. 4 to 7, it is assumed that a droplet is finally discharged to each pixel in the region indicated by gray in FIG. 3.
When droplets are ejected onto the substrate 101 while scanning the droplet ejection head 1 in the X-axis direction, the droplet ejection head 1 is controlled by the control device 6 while maintaining a predetermined interval in the X-axis direction. Discharge drops. In the present embodiment, in order to discharge droplets at least other than adjacent pixels when droplets are discharged continuously, as shown in FIG. In contrast, droplets are ejected.

On the other hand, the liquid droplets ejected onto the substrate 101 spread on the substrate 101 by landing on the substrate 101. That is, as shown by a circle in FIG. 4, the droplet that has landed on the substrate 101 spreads out so as to have a diameter c larger than the size of one pixel.
Here, since the droplets are ejected at a predetermined interval (two pixels) in the X-axis direction, the droplets arranged on the substrate 101 are set so as not to overlap each other. By doing so, it is possible to prevent the liquid material from being excessively provided on the substrate 101 in the X-axis direction and to prevent the occurrence of bulges.

In FIG. 4, the droplets are arranged so as not to overlap each other when placed on the substrate 101, but the droplets may be arranged so as to slightly overlap. For example, in FIG. 4, the liquid droplet is ejected while opening two pixels in the X-axis direction, but the liquid droplet may be ejected while opening one pixel.
In this case, it is possible to prevent the occurrence of bulges by ejecting the droplets so as to cause an overlap of 10% or less of the diameter c of the droplets disposed on the substrate 101 in one scan.

  Here, the degree of wetting and spreading when the droplets are arranged on the substrate 101, that is, the diameter c of the droplets on the substrate 101 varies depending on the characteristics of the liquid material. Therefore, in order to prevent the droplets when they are arranged on the substrate 101 from overlapping each other or to cause an overlap of 10% or less of the diameter c of the droplets, the droplets on the substrate 101 in one scan. The arrangement interval (pixel interval) is experimentally obtained in advance, and an ejection operation in one scan is performed based on the obtained pixel interval.

  FIG. 5 is a schematic diagram when droplets are ejected from the ejection nozzle 10 to the substrate 101 by the second scanning. In FIG. 5, “2” is given to the liquid droplets ejected in the second scanning. Even during the second scan, the ejection operation is performed while leaving two pixels in the X-axis direction. In addition, the droplet that has landed on the substrate 101 during the second scanning also spreads so as to have the diameter c.

FIG. 6 is a schematic diagram when droplets are ejected from the ejection nozzle 10 to the substrate 101 by the third scanning. In FIG. 6, “3” is given to the liquid droplets ejected in the third scan. Even during the third scan, the ejection operation is performed while leaving two pixels in the X-axis direction. In addition, the droplet that has landed on the substrate 101 during the third scan also spreads so as to have a diameter c.
Here, the droplets on the uppermost stage (+ Y side) in the figure are continuous by the three scanning and discharging operations.

FIG. 7 is a schematic diagram when droplets are ejected from the ejection nozzle 10 to the substrate 101 by the fourth scan. Here, in the fourth scan, the droplet discharge head 1 and the substrate 101 supported by the stage 7 move relative to the Y-axis direction by a step (30 μm). In the present embodiment, the substrate 101 supported by the stage 7 moves stepwise in the Y-axis direction.
Here, the substrate 101 moves stepwise in the Y-axis direction by a positive integer multiple of the size by of the pixel in the Y-axis direction. FIG. 7 shows an example in which the substrate 101 is moved stepwise in the Y-axis direction by 1 times by (that is, by) with respect to the droplet discharge head 1.

When the step is moved by the distance by, the droplet discharge head 1 discharges the droplet while scanning the substrate 101 in the X-axis direction. In FIG. 7, “4” is given to the droplets ejected in the fourth scan. In addition, the droplet that has landed on the substrate 101 during the fourth scan also spreads so as to have a diameter c.
Here, after the step movement, when performing the discharge operation, the droplets arranged on the substrate 101 do not overlap each other, or the overlap of the diameter of the droplets when arranged on the substrate 101 is 10% or less. As may occur, the droplets may be ejected in the Y-axis direction. That is, the distance of the step movement may be set to, for example, three times the by, and the step movement may be performed. By doing so, for example, when the droplet of “1” is wet, it is possible to prevent the occurrence of bulges in the Y-axis direction.
On the other hand, in the example shown in FIG. 7, it is assumed that the droplet “1” is dry. In this case, “1” and “4” may overlap 10% or more of the diameter c.

Hereinafter, similarly, the ejection operation while scanning and the step movement are repeated. In the present embodiment, as shown in FIG. 8, by performing a total of 12 scans, a droplet is ejected to each of the pixels corresponding to the regions shown in gray in the figure. In FIG. 8, “n” is given to the droplets ejected during the n-th scanning.
Note that since the discharged liquid droplets wet and spread on the substrate 101, the actually formed wiring pattern is wider than the area shown in gray in the drawing. Therefore, when the wiring pattern is formed, the pattern design is performed in consideration of the wet spread. Here, since the degree of wetting and spreading of the droplets on the substrate 101 is determined by the contact angle between the substrate 101 and the droplets, the substrate 101 is subjected to lyophilic treatment and lyophobic treatment according to the characteristics of the liquid material. A surface treatment is performed to obtain a desired contact angle. By doing so, a wiring pattern having a desired width can be formed.

As described above, this embodiment has a configuration in which a bitmap is set on the substrate 101 and droplets are ejected to the pixels of the bitmap. When setting the bitmap, the size of the bitmap in the Y-axis direction and the interval a between the discharge nozzles 10 are set so as to have an integer ratio. Even if it does not incline, the discharge nozzle 10 and a pixel can be made to correspond. Therefore, it is possible to discharge a droplet to a desired pixel without having to perform complicated control regarding the discharge operation.
In this embodiment, since the pixel size and the number of divisions are optimally set according to the diameter of the droplet, the number of buses becomes too large, resulting in a decrease in productivity and a decrease in quality due to the occurrence of bulges. Can be prevented.
In this way, by setting the bit map, that is, the pattern design rule, with the number of divisions corresponding to the interval a of the discharge nozzles 10, the discharge nozzles 10 and the pixels coincide with each other and the desired speed is not reduced. The discharging operation can be performed accurately with respect to the position.

Further, in the present embodiment, when droplets are ejected onto the substrate 101, the droplets disposed on the substrate 101 do not overlap with each other, or the diameter c of the droplet when disposed on the substrate 101 is the same. Since the droplets are ejected in the X-axis direction so as to cause an overlap of 10% or less, it is possible to prevent excessive liquid material from being provided on the substrate 101 and prevent the occurrence of bulges in one scan. can do.
In addition, when the droplet discharge head 1 and the substrate 101 are moved stepwise in the Y-axis direction, the pixel is moved stepwise by a positive integer multiple of the size by in the Y-axis direction of one pixel. Alternatively, the discharge nozzle 10 and the pixel can be matched.

In the above embodiment, an example of forming an L-shaped pattern has been described. However, for example, as illustrated in FIG. 9, when a plurality of patterns are formed at intervals in the Y-axis direction, If the number of pixels corresponding to the pattern pitch is L,
L = ny × np (np is a positive integer)
As a result, the number of pixels L is an integral multiple of the number of divisions ny (three times in the example of FIG. 9), and droplets are ejected to pixels of the same dot arrangement (droplet ejection arrangement) for a plurality of patterns. Therefore, pattern design can be easily performed, and productivity can be easily improved.

(Second Embodiment)
In the above embodiment, the size of the pixel is set based on the interval a of the discharge nozzle 10 and the droplet discharge process is performed. However, the process before and after the droplet discharge process, for example, the electric circuit shown in FIG. Even when patterning is performed on a substrate in a photolithography process when manufacturing a plasma display device as an optical device, the design is based on the interval a of the discharge nozzles 10 or 1 / n thereof (n is an integer of 2 or more). When patterning is performed, a bitmap for ejection can be designed so that the pattern formed by the preceding and following processes and the pattern patterned in the droplet ejection process are exactly the same.

A plasma display device 500 shown in FIG. 10 is generally configured by a glass substrate 501 and a glass substrate 502 that are arranged to face each other, and a discharge display portion 510 formed therebetween.
The discharge display unit 510 includes a plurality of discharge chambers 516, and among the plurality of discharge chambers 516, three of the red discharge chamber 516 (R), the green discharge chamber 516 (G), and the blue discharge chamber 516 (B). Two discharge chambers 516 are arranged in pairs to constitute one pixel.
Address electrodes 511 are formed in stripes at predetermined intervals on the upper surface of the (glass) substrate 501, a dielectric layer 519 is formed so as to cover the address electrodes 511 and the upper surface of the substrate 501, and further a dielectric layer A partition wall 515 is formed on the 519 between the address electrodes 511 and 511 and along the address electrodes 511. The partition wall 515 is also partitioned at a predetermined interval in a direction perpendicular to the address electrode 511 at a predetermined position in the longitudinal direction (not shown), and is basically adjacent to the left and right sides of the address electrode 511 in the width direction. A rectangular region partitioned by the barrier ribs and the barrier ribs extending in a direction orthogonal to the address electrodes 511 is formed, and discharge chambers 516 are formed so as to correspond to the rectangular regions. One pixel is composed of three pairs. In addition, a phosphor 517 is disposed inside a rectangular region partitioned by the partition 515. The phosphor 517 emits red, green, or blue fluorescence. The red phosphor 517 (R) is located at the bottom of the red discharge chamber 516 (R), and the bottom of the green discharge chamber 516 (G). Are arranged with a green phosphor 517 (G) and a blue phosphor 517 (B) at the bottom of the blue discharge chamber 516 (B).

Next, on the glass substrate 502 side, transparent display electrodes 512 made of a plurality of ITO are formed in stripes at a predetermined interval in a direction orthogonal to the previous address electrode 511, and in order to compensate for the high resistance ITO. In addition, a bus electrode 512a made of metal is formed. Further, a dielectric layer 513 is formed so as to cover them, and a protective film 514 made of MgO or the like is further formed.
The substrate 501 and the substrate 2 of the glass substrate 502 are bonded to each other so that the address electrodes 511 and the display electrodes 512 are opposed to each other so as to be orthogonal to each other, and are formed on the substrate 501, the partition wall 515, and the glass substrate 502 side. A discharge chamber 516 is formed by evacuating a space surrounded by the protective film 514 and enclosing a rare gas. Note that two display electrodes 512 formed on the glass substrate 502 side are formed so as to be arranged two by two for each discharge chamber 516.
The address electrode 511 and the display electrode 512 are connected to an AC power supply (not shown), and the phosphor 517 is excited and emitted in the discharge display portion 510 at a necessary position by energizing each electrode so that color display can be performed. It has become.

In the present embodiment, the display electrode 512 is formed by a photolithography method, and the bus electrode 512a is formed by a droplet discharge method. Then, the interval between the display electrodes 512 formed by the photolithography method is set (designed) based on the interval a of the discharge nozzles 10 of the droplet discharge head 1, and the display electrodes 512 are changed based on the set value. A photolithography process is performed for formation.
Specifically, when the interval a of the discharge nozzle 10 is 141 μm, for example, ny = 10 and nx = 10 are set, and the pattern (interval and interval) of the ITO transparent display electrode 512 is set with 141/10 = 14.1 μm as a basic unit. The display electrode 512 is formed by photolithography based on the design value. In this case, the interval between the display electrodes 512 is set to, for example, 14.1 × 40 = 564 μm, and the width of the display electrode 512 is set to, for example, 14.1 × 35 = 493.5 μm.
Here, the case where the display electrode 512 is formed has been described as an example. However, other portions, for example, extraction electrodes at both ends (not shown) are also designed with 14.1 μm as a basic unit.

  As described above, the value based on the interval a of the discharge nozzle 10 is a basic unit, and the design for pattern formation by a method other than the droplet discharge method (photolithography method) is performed based on the basic unit. As described with reference to FIG. 10, even when the bus electrode 512 a is formed by the droplet discharge method by accurately aligning the ITO transparent display electrode 512 formed by the photolithography method, the discharge nozzle 10 can be used. It can be used efficiently, and a pattern whose pitch completely coincides with the underlying structure (in this case, the display electrode 512) can be formed.

(Third embodiment)
There is a case where there are some restrictions on the process including before and after the droplet discharge process, and the size of the pixel in the Y-axis direction cannot be set based on the interval a of the discharge nozzle 10.
For example, as shown in FIG. 11A, when a plurality of structures (banks) BK for setting the position of droplets are provided on the substrate, the pitch bky of the structures in the Y-axis direction is defined. A case will be considered where the size of the pixel in the Y-axis direction cannot be set based on the interval a of the discharge nozzles 10. Since there is a limitation in the photolithography process for forming the structure BK and the value of bky cannot be freely designed, there is no integer ny that satisfies bky = a / ny, or ny becomes an unrealistically large integer. May end up.
In such a case, it is effective to perform the discharge operation while tilting the droplet discharge head 1 by an angle θ with respect to the Y axis. In this case, conventionally, the discharge nozzle and the pixel cannot be matched in the X-axis direction, but the size by2 in the Y-axis direction and the X-axis among the pixels (unit regions) for discharging the droplets The size bx2 in the direction is
by2 = bky / ny (ny is a positive integer) and
bx2 = (a · sin θ) / nx (nx is a positive integer),
By setting so as to satisfy the above condition, the discharge nozzle 10 and the pixel can be matched.

In other words, the angle θ is set so that the specified value bky and a · cos θ have an integer ratio, and the size of the unit region (pixel) in the X-axis direction is based on the set angle θ and the nozzle interval a. Bx2 is set.
By setting as described above, as shown in the schematic diagram of FIG. 11B, while discharging nozzle 10 and substrate 101 are scanned, each pixel of the bitmap and discharge nozzle 10 are made to coincide with each other to discharge droplets. The action can be performed.

(Fourth embodiment)
The device manufacturing method of the present invention can also be applied when manufacturing the liquid crystal device shown in FIG. FIG. 12 shows a planar layout of signal electrodes and the like on the first substrate of the liquid crystal device. The liquid crystal device includes a first substrate, a second substrate (not shown) provided with scanning electrodes and the like, and a liquid crystal (not shown) sealed between the first substrate and the second substrate. It is roughly structured.

As shown in FIG. 12, a plurality of signal electrodes 310 are provided in a multiple matrix form in the pixel region 303 on the first substrate 300. In particular, each signal electrode 310 is composed of a plurality of pixel electrode portions 310a provided corresponding to each pixel and signal wiring portions 310b that connect them in a multiplex matrix, and extends in the Y direction. ing.
Reference numeral 350 denotes a liquid crystal driving circuit having a one-chip structure, and the liquid crystal driving circuit 350 and one end side (lower side in the figure) of the signal wiring portions 310b... Are connected via first routing wirings 331.
Further, reference numeral 340... Is a vertical conduction terminal, and the vertical conduction terminals 340... Are connected to terminals provided on a second substrate (not shown) by vertical conduction members 341. Further, the vertical conduction terminals 340... And the liquid crystal driving circuit 350 are connected via the second routing wirings 332.

  In the present embodiment, the signal wiring portions 310b..., The first routing wiring 331..., The second routing wiring 332... Provided on the first substrate 300 are each formed based on the device manufacturing method according to the present invention. ing.

(Fifth embodiment)
Specific examples of the electronic device of the present invention will be described.
FIG. 13A is a perspective view showing an example of a mobile phone. In FIG. 13A, reference numeral 1600 denotes a mobile phone body, and reference numeral 1601 denotes a display portion provided with the plasma display device (or a liquid crystal display device or an organic electroluminescence device).
FIG. 13B is a perspective view illustrating an example of a portable information processing apparatus such as a word processor or a personal computer. In FIG. 13B, reference numeral 1700 denotes an information processing device, 1701 denotes an input unit such as a keyboard, 1703 denotes an information processing body, and 1702 denotes a display unit including the plasma display device (or liquid crystal display device).
FIG. 13C is a perspective view illustrating an example of a wristwatch type electronic device. In FIG. 13C, reference numeral 1800 denotes a watch body, and reference numeral 1801 denotes a display unit provided with the plasma display device (or liquid crystal display device).
Since the electronic apparatus shown in FIGS. 13A to 13C includes the display device (device) of the above-described embodiment, it has excellent display performance.
Note that although the electronic device includes a plasma display device or a liquid crystal device, the electronic device can be an electronic device including another electro-optical device such as an organic electroluminescence display device.

(Sixth embodiment)
FIG. 14 is a diagram showing an example of a non-contact card medium as a device of the present invention. As shown in FIG. 14, a non-contact card medium 1400 includes a semiconductor integrated circuit chip 1408 and an antenna circuit 1412 in a housing made up of a card base 1402 and a card cover 1418. At least one of power supply and data transfer is performed by at least one of capacitive coupling.
In the present embodiment, the antenna circuit 1412 is formed based on the device manufacturing method of the present invention.

(Seventh embodiment)
In each of the above embodiments, the case where the wiring pattern is formed has been described. However, the manufacturing method of the present invention can be applied to manufacturing various devices and apparatuses including a color filter. Hereinafter, other application examples of the present invention will be described.
The present invention can be applied when manufacturing the liquid crystal display device shown in FIGS. The liquid crystal display device of the present embodiment is an active matrix type transmissive liquid crystal device using TFT (Thin Film Transistor) elements as switching elements. FIG. 15 is an equivalent circuit diagram of switching elements, signal lines, etc. in a plurality of pixels arranged in a matrix of the transmissive liquid crystal device. FIG. 16 is a plan view of a principal part showing the structure of a plurality of pixel groups adjacent to each other on a TFT array substrate on which data lines, scanning lines, pixel electrodes and the like are formed. 17 is a cross-sectional view taken along line AA ′ of FIG. Note that FIG. 17 illustrates the case where the upper side in the drawing is the light incident side and the lower side in the drawing is the viewing side (observer side). Moreover, in each figure, in order to make each layer and each member the size which can be recognized on drawing, the scale is varied for every layer and each member.

  In the liquid crystal display device according to the present embodiment, as shown in FIG. 15, a plurality of pixels arranged in a matrix includes a pixel electrode 109 and a TFT element that is a switching element for controlling energization of the pixel electrode 109. 130, and a data line 106a to which an image signal is supplied is electrically connected to the source of the TFT element 130. Image signals S1, S2,..., Sn to be written to the data line 106a are supplied line-sequentially in this order, or are supplied for each group to a plurality of adjacent data lines 106a. In addition, the scanning line 103a is electrically connected to the gate of the TFT element 130, and scanning signals G1, G2,..., Gm are applied to the plurality of scanning lines 103a in a pulse-sequential manner at a predetermined timing. The Further, the pixel electrode 109 is electrically connected to the drain of the TFT element 130, and the image signals S1, S2,... Supplied from the data line 106a are turned on by turning on the TFT element 130 as a switching element for a certain period. , Sn is written at a predetermined timing. Image signals S1, S2,..., Sn written at a predetermined level on the liquid crystal via the pixel electrode 109 are held for a certain period with the common electrode described later. The liquid crystal modulates light by changing the orientation and order of the molecular assembly according to the applied voltage level, thereby enabling gradation display. Here, in order to prevent the held image signal from leaking, a storage capacitor 170 is added in parallel with the liquid crystal capacitor formed between the pixel electrode 109 and the common electrode.

  Next, the planar structure of the main part of the liquid crystal display device of the present embodiment will be described with reference to FIG. As shown in FIG. 16, a rectangular pixel electrode 109 (dotted line portion 109A) made of a transparent conductive material such as indium tin oxide (hereinafter abbreviated as ITO) is formed on the TFT array substrate. Are provided in a matrix, and a data line 106a, a scanning line 103a, and a capacitor line 103b are provided along the vertical and horizontal boundaries of the pixel electrode 109, respectively. Each pixel electrode 109 is electrically connected to a TFT element 130 provided corresponding to each intersection of the scanning line 103a and the data line 106a, so that display can be performed for each pixel. It has become. The data line 106a is electrically connected to a source region, which will be described later, of the semiconductor layer 101a made of, for example, a polysilicon film constituting the TFT element 130 via the contact hole 105, and the pixel electrode 109 is connected to the semiconductor layer 101a. Among these, a drain region described later is electrically connected through a contact hole 108. In addition, a scanning line 103a is arranged in the semiconductor layer 101a so as to face a channel region (a region with a diagonal line rising to the left in the drawing), which will be described later, and the scanning line 103a serves as a gate electrode in a portion facing the channel region. Function. The capacitor line 103b extends from a portion intersecting the main line portion (that is, the first region formed along the scanning line 103a in plan view) extending along the scanning line 103a and the data line 106a. And a protruding portion (that is, a second region extending along the data line 106 a when viewed in a plan view) that protrudes forward (upward in the drawing) along the data line 106 a.

  Next, the cross-sectional structure of the liquid crystal display device of this embodiment will be described with reference to FIG. FIG. 17 is a cross-sectional view taken along the line A-A ′ of FIG. 16 as described above, and is a cross-sectional view showing the configuration of the region where the TFT element 130 is formed. In the liquid crystal display device of the present embodiment, the liquid crystal layer 150 is sandwiched between the TFT array substrate 110 and the counter substrate 120 disposed to face the TFT array substrate 110. The TFT array substrate 110 is mainly composed of a translucent substrate body 110A, a TFT element 130 formed on the surface of the liquid crystal layer 150, a pixel electrode 109, and an alignment film 140. The counter substrate 120 is translucent. The plastic substrate (substrate body) 120A, the common electrode 121 formed on the liquid crystal layer 150 side surface, and the alignment film 160 are mainly configured. Each of the substrates 110 and 120 holds a predetermined substrate interval (gap) via the spacer 115. In the TFT array substrate 110, a pixel electrode 109 is provided on the surface of the substrate body 110A on the liquid crystal layer 150 side, and a pixel switching TFT element 130 that controls switching of each pixel electrode 109 is provided at a position adjacent to each pixel electrode 109. It has been. The pixel switching TFT element 130 has an LDD (Lightly Doped Drain) structure, and includes a scanning line 103a, a channel region 101a ′ of the semiconductor layer 101a in which a channel is formed by an electric field from the scanning line 103a, and a scanning line 103a. A gate insulating film 102 that insulates the semiconductor layer 101a, a data line 106a, a low concentration source region 101b and a low concentration drain region 101c of the semiconductor layer 101a, and a high concentration source region 101d and a high concentration drain region 101e of the semiconductor layer 101a. ing. On the substrate main body 110A including the scanning line 103a and the gate insulating film 102, a second interlayer insulating layer in which a contact hole 105 leading to the high concentration source region 101d and a contact hole 108 leading to the high concentration drain region 101e are opened. A film 104 is formed. That is, the data line 106 a is electrically connected to the high concentration source region 101 d through the contact hole 105 that penetrates the second interlayer insulating film 104. Further, on the data line 106a and the second interlayer insulating film 104, a third interlayer insulating film 107 having a contact hole 108 leading to the high concentration drain region 101e is formed. That is, the high-concentration drain region 101 e is electrically connected to the pixel electrode 109 through the contact hole 108 that penetrates the second interlayer insulating film 104 and the third interlayer insulating film 107.

In the present embodiment, the gate insulating film 102 is extended from a position facing the scanning line 103a and used as a dielectric film, the semiconductor film 101a is extended to serve as the first storage capacitor electrode 101f, and a capacitor facing these A storage capacitor 170 is configured by using a part of the line 103b as a second storage capacitor electrode. Further, between the TFT array substrate 110A and the pixel switching TFT element 130, a first interlayer insulating film 112 for electrically insulating the semiconductor layer 101a constituting the pixel switching TFT element 130 from the TFT array substrate 110A. Is formed. Further, an alignment film 140 for controlling the alignment of liquid crystal molecules in the liquid crystal layer 150 when no voltage is applied on the outermost surface of the TFT array substrate 110 on the liquid crystal layer 150 side, that is, on the pixel electrode 109 and the third interlayer insulating film 107. Is formed. Therefore, in the region including the TFT element 130, a plurality of irregularities or steps are formed on the outermost surface of the TFT array substrate 110 on the liquid crystal layer 150 side, that is, the sandwiching surface of the liquid crystal layer 150. . On the other hand, the counter substrate 120 is incident on the surface of the substrate main body 120A on the liquid crystal layer 150 side, which is opposed to the formation area (non-pixel area) of the data line 106a, the scanning line 103a, and the pixel switching TFT element 130. A second light shielding film 123 is provided to prevent light from entering the channel region 101a ′, the low concentration source region 101b, and the low concentration drain region 101c of the semiconductor layer 101a of the pixel switching TFT element 130. Further, a common electrode 121 made of ITO or the like is formed over the entire surface of the substrate body 120A on which the second light-shielding film 123 is formed on the liquid crystal layer 150 side, and on the liquid crystal layer 150 side, no voltage is applied. An alignment film 160 for controlling the alignment of the liquid crystal molecules in the liquid crystal layer 150 is formed.
In this embodiment, the data line 106a, the scanning line 103a constituting the gate electrode, the capacitor line 103b, the pixel electrode 109, and the like are formed based on the manufacturing method of the present invention.

(Eighth embodiment)
The present invention can also be used to form a film that is a component of a color filter.
FIG. 18 is a diagram showing a color filter formed on the substrate P, and FIG. 19 is a diagram showing a manufacturing procedure of the color filter. As shown in FIG. 18, in this example, a plurality of color filter regions 251 are formed in a matrix on a rectangular substrate P from the viewpoint of improving productivity. These color filter regions 251 can be used as color filters suitable for a liquid crystal display device by cutting the substrate P later. The color filter region 251 has a predetermined pattern, in this example, a conventionally known stripe type, of an R (red) liquid composition, a G (green) liquid composition, and a B (blue) liquid composition. Formed with.
In addition to the stripe type, this formation pattern may be a mosaic type, a delta type, or a square type. And the surfactant mentioned above is added to each liquid composition of RGB.

  In order to form such a color filter region 251, a bank 252 is first formed on one surface of the transparent substrate P as shown in FIG. The bank 252 is formed by exposing and developing after spin coating. The banks 252 are formed in a lattice shape in plan view, and ink is disposed inside the banks surrounded by the lattices. At this time, the bank 252 preferably has liquid repellency. The bank 252 preferably functions as a black matrix.

  Next, as shown in FIG. 19 (b), the liquid material composition droplets 254 are ejected from the droplet ejection head and land on the filter element 253. The amount of the liquid droplets 254 to be discharged is a sufficient amount considering the volume reduction of the liquid composition in the heating process. When all the filter elements 253 on the substrate P are filled with the droplets 254 in this manner, the substrate P is heated using a heater so that the substrate P reaches a predetermined temperature (for example, about 70 ° C.). By this heat treatment, the solvent of the liquid composition evaporates and the volume of the liquid composition decreases. In the case where the current volume is intense, the droplet discharge process and the heating process are repeated until a sufficient film thickness is obtained for the color filter. By this treatment, the solvent contained in the liquid composition evaporates, and finally only the solid content contained in the liquid composition remains to form a film, and the color filter 255 as shown in FIG. Become.

Next, in order to planarize the substrate P and protect the color filter 255, a protective film 256 is formed on the substrate P so as to cover the color filter 255 and the bank 252 as shown in FIG. In forming the protective film 256, a spin coating method, a roll coating method, a ripping method, or the like can be employed. However, as with the color filter 255, a droplet discharge method can also be used. Next, as shown in FIG. 19E, a transparent conductive film 257 is formed on the entire surface of the protective film 256 by sputtering, vacuum deposition, or the like. Thereafter, the transparent conductive film 257 is patterned, and the pixel electrode 258 is patterned in correspondence with the filter element 253 as shown in FIG. Note that this patterning is not necessary when a TFT (Thin Film Transistor) is used to drive the liquid display panel.
In the present embodiment, the manufacturing method of the present invention can be applied when forming the color filter 255 and the pixel electrode 258.

(Ninth embodiment)
The present invention can also be applied when manufacturing an organic EL device. A method for manufacturing an organic EL device will be described with reference to FIGS. 20 to 22 show only a single pixel for the sake of simplicity.
First, a substrate P is prepared. Here, in the organic EL element, light emitted from a light emitting layer to be described later can be extracted from the substrate side, and can be configured to be extracted from the side opposite to the substrate. In the case where the emitted light is extracted from the substrate side, a transparent or translucent material such as glass, quartz, or resin is used as the substrate material, but particularly inexpensive glass is preferably used. In this example, a transparent substrate P made of glass or the like is used as the substrate as shown in FIG. Then, a semiconductor film 700 made of an amorphous silicon film is formed on the substrate P. Next, a crystallization process such as laser annealing or solid phase growth is performed on the semiconductor film 700 to crystallize the semiconductor film 700 into a polysilicon film. Next, as shown in FIG. 20B, the semiconductor film (polysilicon film) 700 is patterned to form an island-shaped semiconductor film 710, and a gate insulating film 720 is formed on the surface thereof. Next, a gate electrode 643A is formed as shown in FIG. Next, high-concentration phosphorus ions are implanted in this state, and source / drain regions 643a and 643b are formed in the semiconductor film 710 in a self-aligned manner with respect to the gate electrode 643A. Note that a portion where impurities are not introduced becomes a channel region 643c. Next, as shown in FIG. 20D, after an interlayer insulating film 730 having contact holes 732 and 734 is formed, relay electrodes 736 and 738 are embedded in these contact holes 732 and 734. Next, as illustrated in FIG. 20E, the signal line 632, the common power supply line 633, and the scanning line (not illustrated in FIG. 20) are formed on the interlayer insulating film 730. Here, the relay electrode 738 and each wiring may be formed in the same process. At this time, the relay electrode 736 is formed of an ITO film described later. Then, an interlayer insulating film 740 is formed so as to cover the upper surface of each wiring, a contact hole (not shown) is formed at a position corresponding to the relay electrode 736, and an ITO film is embedded so as to be embedded in the contact hole. Then, the ITO film is patterned and a pixel electrode 641 electrically connected to the source / drain region 643a at a predetermined position surrounded by the signal line 632, the common power supply line 633, and the scanning line (not shown). Is formed. Here, a portion sandwiched between the signal line 632, the common power supply line 633, and further a scanning line (not shown) is a place where a hole injection layer and a light emitting layer are formed as described later.

Next, as shown in FIG. 21A, a bank 650 is formed so as to surround the formation place. The bank 650 functions as a partition member, and is preferably formed of an insulating organic material such as polyimide. Further, it is preferable that the bank 650 has no affinity for the liquid composition discharged from the droplet discharge head. In order to express the non-affinity in the bank 650, for example, a method of treating the surface of the bank 650 with a fluorine compound or the like is employed. Examples of the fluorine compound include CF ₄ , SF ₅ , and CHF ₃ , and examples of the surface treatment include plasma treatment and UV irradiation treatment. Under such a configuration, a sufficiently high step 611 is formed between the formation site of the hole injection layer and the light emitting layer, that is, the application position of these forming materials and the surrounding bank 650. Is done. Next, as shown in FIG. 21B, the liquid composition 614A containing the hole injection layer forming material is surrounded by the bank 650 by the droplet discharge head with the upper surface of the substrate P facing upward. It is selectively applied in the application position, that is, in the bank 650. Next, as shown in FIG. 21C, the solvent of the liquid composition 614A is evaporated by heating or light irradiation, so that a solid hole injection layer 640A is formed on the pixel electrode 641.

  Next, as shown in FIG. 22A, a liquid composition 614B containing a light emitting layer forming material (light emitting material) is placed in the bank 650 from the droplet discharge head with the upper surface of the substrate P facing upward. Is selectively applied on the positive hole injection layer 640A. When the liquid composition 614B containing the light emitting layer forming material is discharged from the droplet discharge head, the liquid composition 614B is applied on the hole injection layer 640A in the bank 650. Here, the formation of the light emitting layer by discharging the liquid composition 614B includes a liquid composition containing a light emitting layer forming material that emits red colored light and a light emitting layer forming material that emits green colored light. The liquid composition and the liquid composition containing the light emitting layer forming material that emits blue colored light are discharged and applied to the corresponding pixels. Note that the pixels corresponding to each color are determined in advance so that they are regularly arranged. When the liquid composition 614B containing the light emitting layer forming materials of the respective colors is discharged and applied in this manner, the solvent in the liquid composition 614B is evaporated to form a hole layer as shown in FIG. A solid light emitting layer 640B is formed on the injection layer 640A, whereby a light emitting portion 640 composed of the hole layer injection layer 640A and the light emitting layer 640B is obtained. Thereafter, as shown in FIG. 22C, the reflective electrode 654 (counter electrode) is formed on the entire surface of the transparent substrate P or in a stripe shape. Thus, an organic EL element is manufactured.

  The pixel electrode may be an electrode having reflection characteristics, and a transparent electrode (transparent electrode) may be formed as a counter electrode. In that case, light emitted upward is emitted in the drawing. Furthermore, it is also possible to form a transparent electrode as the pixel electrode, and to form a reflective material below the pixel electrode. In this case, for example, it can be formed of a material whose main component is aluminum (Al) or the like, and has a structure in which light is emitted upward in the drawing as described above.

  As described above, in this embodiment, the hole injection layer 640A and the light emitting layer 640B are formed based on the droplet discharge method, and the manufacturing method of the present invention is applied. In addition, the signal line 632, the common power supply line 633, the scanning line, the pixel electrode 641, and the like are also formed based on the manufacturing method of the present invention.

  The preferred embodiments of the present invention have been described above with reference to the accompanying drawings, but it goes without saying that the present invention is not limited to such examples. Various shapes, combinations, and the like of the constituent members shown in the above-described examples are examples, and various modifications can be made based on design requirements and the like without departing from the gist of the present invention.

It is a schematic perspective view which shows the droplet discharge apparatus used for the manufacturing method of the device of this invention. It is a schematic external view of a droplet discharge head. It is a figure which shows the space | interval and unit area | region of a discharge nozzle. It is explanatory drawing of the manufacturing method of the device of this invention. It is explanatory drawing of the manufacturing method of the device of this invention. It is explanatory drawing of the manufacturing method of the device of this invention. It is explanatory drawing of the manufacturing method of the device of this invention. It is explanatory drawing of the manufacturing method of the device of this invention. It is explanatory drawing which shows the other Example of the manufacturing method of the device of this invention. It is a disassembled perspective view which shows the plasma type display apparatus as a device. It is explanatory drawing which shows the other Example of the manufacturing method of the device of this invention. It is a top view which shows the liquid crystal display device as a device of this invention. It is a figure which shows the electronic device of this invention. It is a disassembled perspective view of the non-contact-type card medium which is the device of this invention. It is an equivalent circuit diagram of a switching element and a signal line to which the present invention is applied. It is a top view which shows the structure of the TFT array substrate to which this invention is applied. It is principal part sectional drawing of the liquid crystal display device with which this invention is applied. It is a schematic diagram of a color filter to which the present invention is applied. It is a schematic diagram of a color filter to which the present invention is applied. It is a schematic diagram which shows the manufacturing process of the organic electroluminescent apparatus to which this invention is applied. It is a schematic diagram which shows the manufacturing process of the organic electroluminescent apparatus to which this invention is applied. It is a schematic diagram which shows the manufacturing process of the organic electroluminescent apparatus to which this invention is applied.

Explanation of symbols

DESCRIPTION OF SYMBOLS IJ ... Droplet discharge apparatus, 1 ... Droplet discharge head, 10 ... Discharge nozzle, 101 ... Substrate

Claims (6)

While relatively moving the droplet discharge head and the substrate in a predetermined direction, a liquid material is discharged onto the substrate from a plurality of discharge nozzles arranged at predetermined intervals in the direction intersecting the predetermined direction on the droplet discharge head. In the method of manufacturing a device having a step of forming a predetermined pattern on the substrate,
Setting a plurality of lattice-like unit regions on which the liquid material droplets are ejected on the substrate;
Forming the pattern by ejecting the droplets from the ejection nozzle to a predetermined unit region of the plurality of unit regions,
An interval of the discharge nozzles of the droplet discharge head is a,
The diameter of the droplet is D,
The size of the unit region in the direction intersecting with the predetermined direction by,
When the size of the unit area in the predetermined direction is bx1,
(D / 2) <by <D and a = by × ny (ny is a positive integer),
(D / 2) <bx1 <D, and a = bx1 × nx (nx is a positive integer)
A device manufacturing method, characterized in that the unit region is set using division numbers ny and nx that satisfy the above condition. In the manufacturing method of the device of Claim 1,
A method for manufacturing a device, wherein when the droplets are continuously discharged, the droplets are discharged at least outside the adjacent unit regions. In the manufacturing method of the device of Claim 1 or 2,
When the number of the unit regions corresponding to the pitch in the direction intersecting the predetermined direction of the plurality of patterns is L,
L = ny × np (np is a positive integer)
A device manufacturing method characterized by the above. While relatively moving the droplet discharge head and the substrate in a predetermined direction, a liquid material is discharged to the substrate from a plurality of discharge nozzles arranged in a direction intersecting the predetermined direction in the droplet discharge head, In a device manufacturing method including a step of forming a predetermined pattern on the substrate,
Setting a plurality of lattice-like unit regions on which the liquid material droplets are ejected on the substrate;
Forming the pattern by ejecting the droplets from the ejection nozzle to a predetermined unit region of the plurality of unit regions,
The specified value in the direction intersecting with the predetermined direction defined in advance is bky,
An interval of the discharge nozzles of the droplet discharge head is a,
The diameter of the droplet is D,
The size of the unit region in the direction intersecting with the predetermined direction is by2,
The size of the unit area in the predetermined direction is bx2,
When the liquid droplet ejection head is moved relative to the direction orthogonal to the predetermined direction at an angle θ,
(D / 2) <by2 <D, and bky = by2 × ny (ny is a positive integer),
(D / 2) <bx2 <D, and a · sin θ = bx2 × nx (nx is a positive integer)
A device manufacturing method, characterized in that the unit region is set using division numbers ny and nx that satisfy the above condition.   A device manufactured by the device manufacturing method according to claim 1. An electronic apparatus comprising the device according to claim 5.

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