JP2005079238A5 - - Google Patents

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Publication number
JP2005079238A5
JP2005079238A5 JP2003306015A JP2003306015A JP2005079238A5 JP 2005079238 A5 JP2005079238 A5 JP 2005079238A5 JP 2003306015 A JP2003306015 A JP 2003306015A JP 2003306015 A JP2003306015 A JP 2003306015A JP 2005079238 A5 JP2005079238 A5 JP 2005079238A5
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JP
Japan
Prior art keywords
immersion
substrate
projection optical
mask
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003306015A
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English (en)
Japanese (ja)
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JP2005079238A (ja
JP4168880B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2003306015A priority Critical patent/JP4168880B2/ja
Priority claimed from JP2003306015A external-priority patent/JP4168880B2/ja
Publication of JP2005079238A publication Critical patent/JP2005079238A/ja
Publication of JP2005079238A5 publication Critical patent/JP2005079238A5/ja
Application granted granted Critical
Publication of JP4168880B2 publication Critical patent/JP4168880B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003306015A 2003-08-29 2003-08-29 液浸用溶液 Expired - Fee Related JP4168880B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003306015A JP4168880B2 (ja) 2003-08-29 2003-08-29 液浸用溶液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003306015A JP4168880B2 (ja) 2003-08-29 2003-08-29 液浸用溶液

Publications (3)

Publication Number Publication Date
JP2005079238A JP2005079238A (ja) 2005-03-24
JP2005079238A5 true JP2005079238A5 (cg-RX-API-DMAC7.html) 2005-12-15
JP4168880B2 JP4168880B2 (ja) 2008-10-22

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ID=34409203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003306015A Expired - Fee Related JP4168880B2 (ja) 2003-08-29 2003-08-29 液浸用溶液

Country Status (1)

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JP (1) JP4168880B2 (cg-RX-API-DMAC7.html)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI245163B (en) 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101941351B1 (ko) 2003-12-15 2019-01-22 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 및 노광 방법
JP4907596B2 (ja) * 2003-12-15 2012-03-28 カール・ツァイス・エスエムティー・ゲーエムベーハー 屈折性投影対物レンズ
TWI395069B (zh) * 2004-02-18 2013-05-01 尼康股份有限公司 投影光學系統、曝光裝置以及曝光方法
JP2006024692A (ja) 2004-07-07 2006-01-26 Toshiba Corp レジストパターン形成方法
US7411654B2 (en) 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI313485B (en) * 2005-04-26 2009-08-11 Mitsui Chemicals Inc Liquid for immersion, purifying method of liquid for immersoin, and immersion exposure method
JP4589809B2 (ja) * 2005-06-06 2010-12-01 パナソニック株式会社 バリア膜形成用材料及びそれを用いたパターン形成方法
EP1895571A4 (en) * 2005-06-21 2011-04-27 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD, MAINTENANCE METHOD AND COMPONENT MANUFACTURING METHOD
JP4804950B2 (ja) 2005-09-26 2011-11-02 東京応化工業株式会社 有機膜の液浸リソグラフィ溶解成分測定方法
US7903232B2 (en) * 2006-04-12 2011-03-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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