JP2005077102A - Electrostatic capacity detector - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To realize an excellent electrostatic capacity detector, in an electrostatic capacity detector for reading a surface shape having fine unevenness such as a finger print. <P>SOLUTION: This detector includes M column lines and N row lines, both arranged as a matrix of the M columns and N rows, and includes electrostatic capacity detecting elements provided at intersections thereof. The each electrostatic capacity detecting element includes a signal detecting element, a signal amplifying element and a row selecting element. The signal detecting element includes a capacity detecting electrode, a capacity detecting dielectric substance film and a reference capacitor. The signal amplifying element comprises a signal amplifying MIS type thin film semiconductor device composed of a gate electrode, a gate insulation film, and a semiconductor film, and one electrode of the reference capacitor is connected to the row wires. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

【００２３】
〔数式１〕

【００２４】
となる。従って、素子容量Ｃ_Ｄが基準コンデンサ容量Ｃ_Ｒとトランジスタ容量Ｃ_Ｔとの和であるＣ_Ｒ＋Ｃ_Ｔよりも十分に大きい時
【００２５】
〔数式２〕

【００２６】
には、ゲート電圧Ｖ_ＧＴは
【００２７】
〔数式３〕

【００２８】
と近似され、ゲート電極には殆ど電圧が掛からない。その結果、信号増幅用ＭＩＳ型薄膜半導体装置はオフ状態となり、ソースドレイン電流Ｉは窮めて小さくなる。結局、指紋の山に相当する対象物の凸部が静電容量検出装置に接した時に信号増幅素子が殆ど電流を流さない為には、静電容量検出素子を構成するゲート電極面積（ゲート長やゲート幅）やゲート絶縁膜材質、ゲート絶縁膜厚、基準コンデンサ電極面積（コンデンサ電極長やコンデンサ電極幅）、基準コンデンサ誘電体膜材質、基準コンデンサ誘電体膜厚、容量検出電極面積、容量検出誘電体膜材質、容量検出誘電体膜厚などを、素子容量Ｃ_Ｄが基準コンデンサ容量Ｃ_Ｒとトランジスタ容量Ｃ_Ｔとの和であるＣ_Ｒ＋Ｃ_Ｔよりも十分に大きくなる様に設定せねばならない訳で有る。一般に「十分に大きい」とは１０倍程度の相違を意味する。換言すれば素子容量Ｃ_Ｄは基準コンデンサ容量Ｃ_Ｒとトランジスタ容量Ｃ_Ｔとの和であるＣ_Ｒ＋Ｃ_Ｔと
Ｃ_Ｄ＞１０×（Ｃ_Ｒ＋Ｃ_Ｔ）
との関係を満たせば良い。この場合、Ｖ_ＧＴ／Ｖ_ｄｄは０．１程度以下となり薄膜半導体装置はオン状態には成り得ない。対象物の凸部を確実に検出するには、対象物の凸部が静電容量検出装置に接した時に、信号増幅用ＭＩＳ型薄膜半導体装置がオフ状態に成る事が重要である。従って電源電圧Ｖ_ｄｄに正電源を用いる場合には信号増幅用ＭＩＳ型薄膜半導体装置として、ゲート電圧がゼロ近傍でドレイン電流が流れないエンハンスメント型（ノーマリーオフ型）Ｎ型トランジスタを用いるのが好ましい。より理想的には、伝達特性に於けるドレイン電流が最小値となるゲート電圧（最小ゲート電圧）をＶ_ｍｉｎとして、この最小ゲート電圧が
０＜０．１×Ｖ_ｄｄ＜Ｖ_ｍｉｎ
又は
０＜Ｖ_ＧＴ＜Ｖ_ｍｉｎ
との関係を満たす様な信号増幅用Ｎ型ＭＩＳ薄膜半導体装置を使用する。反対に電源電圧Ｖ_ｄｄに負電源を用いる場合には信号増幅用ＭＩＳ型薄膜半導体装置として、ゲート電圧がゼロ近傍でドレイン電流が流れないエンハンスメント型（ノーマリーオフ型）Ｐ型トランジスタを用いる。理想的には信号増幅用Ｐ型ＭＩＳ薄膜半導体装置の最小ゲート電圧Ｖ_ｍｉｎが
Ｖ_ｍｉｎ＜０．１×Ｖ_ｄｄ＜０
又は
Ｖ_ｍｉｎ＜Ｖ_ＧＴ＜０
との関係を満たす信号増幅用Ｐ型ＭＩＳ薄膜半導体装置を使用する事である。斯うする事に依り対象物の凸部を、電流値Ｉが非常に小さいとの形態にて確実に検出し得るので有る。
【００２９】
次に対象物が容量検出誘電体膜に接しずに対象物距離ｔ_Ａを以て容量検出誘電体膜から離れて居る状況を考える。即ち測定対処物の凹部が容量検出誘電体膜上に有り、更に対象物が電気的に接地されて居る状況で有る。具体的には静電容量検出装置を指紋センサとして用いた時に、静電容量検出装置表面に指紋の谷が来て居る状態の検出を想定する。先にも述べた様に、本発明の静電容量検出装置では容量検出誘電体膜が静電容量検出装置の最表面に位置するのが望ましい。この時の等価回路図を図５に示す。容量検出誘電体膜に対象物表面が接していないので、容量検出誘電体膜と対象物表面との間には空気を誘電体とした新たなコンデンサーが形成される。此を対象物容量Ｃ_Ａと名付け、真空の誘電率ε_０と空気の比誘電率ε_Ａと容量検出電極の面積Ｓ_Ｄとを用いて、
Ｃ_Ａ＝ε_０・ε_Ａ・Ｓ_Ｄ／ｔ_Ａ
と定義する。斯うして対象物が容量検出誘電体膜から離れた状態では、素子容量Ｃ_Ｄと対象物容量Ｃ_Ａとが直列に接続され、更に此等のコンデンサに互いに並列接続されたトランジスタ容量Ｃ_Ｔと基準コンデンサ容量Ｃ_Ｒとが直列に接続される事になる。基準コンデンサには電圧Ｖ_ｄｄが印可され、信号増幅素子のドレイン電極にはｋＶ_ｄｄの電圧が印可される（図５）。印可電圧は静電容量に応じて四つのコンデンサー間で分割されるので、この条件下にて信号増幅用ＭＩＳ型薄膜半導体装置のゲート電極に掛かる電圧（谷が来たときのゲート電圧）Ｖ_ＧＶは
【００３０】
〔数式４〕

【００３１】
となる。一方、本発明では対象物が静電容量検出装置に接した時にドレイン電流が非常に小さくなる様に
【００３２】
〔数式２〕

【００３３】
との条件を満たすべく静電容量検出素子を作成して在るので、Ｖ_ＧＶは
【００３４】
〔数式５〕

【００３５】
と近似される。此処で基準コンデンサ容量Ｃ_Ｒを対象物容量Ｃ_Ａよりも十分に大きくなる様に設定すると、
【００３６】
〔数式６〕

【００３７】
ゲート電圧Ｖ_ＧＶは
【００３８】
〔数式７〕

【００３９】
と更に簡略化される。斯うしてｋの値が１に近ければ、ゲート電圧Ｖ_ＧＶは電源電圧Ｖ_ｄｄに略等しくなる。基準コンデンサ容量Ｃ_Ｒがトランジスタ容量Ｃ_Ｔよりも十分に大きくなるよう設定しておくと、
【００４０】
〔数式８〕

【００４１】
ｋの値の大小に関わらず、ゲート電圧Ｖ_ＧＶは
【００４２】
〔数式９〕

【００４３】
となり、電源電圧Ｖ_ｄｄにほぼ等しくなる。この結果、信号増幅用ＭＩＳ型薄膜半導体装置をオン状態と出来、電流Ｉは窮めて大きくなる。指紋の谷に相当する対象物の凹部が静電容量検出装置上に来た時に信号増幅素子が大電流を通す為には、基準コンデンサ容量Ｃ_Ｒが対象物容量Ｃ_Ａよりも十分に大きくなる様に構成付ける必要がある。先に述べた如く、１０倍程度の相違が認められると一般に十分に大きいと言えるので、基準コンデンサ容量Ｃ_Ｒと対象物容量Ｃ_Ａとが
Ｃ_Ｒ＞１０×Ｃ_Ａ
との関係を満たせば良い。又、ｋの値如何に関わらず指紋の谷等が接近した時にトランジスタがオン状態になるには基準コンデンサ容量Ｃ_Ｒがトランジスタ容量Ｃ_Ｔよりも十倍以上大きくしておけば良い。
【００４４】
Ｃ_Ｒ＞１０×Ｃ_Ｔ
此等の条件を満たすと、Ｖ_ＧＴ／Ｖ_ｄｄは０．９程度以上となり薄膜半導体装置は容易にオン状態と化す。対象物の凹部を確実に検出するには、対象物の凹部が静電容量検出装置に近づいた時に、信号増幅用ＭＩＳ型薄膜半導体装置がオン状態に成る事が重要である。電源電圧Ｖ_ｄｄに正電源を用いる場合には信号増幅用ＭＩＳ型薄膜半導体装置としてエンハンスメント型（ノーマリーオフ型）Ｎ型トランジスタを用いており、このトランジスタの閾値電圧Ｖ_ｔｈがＶ_ＧＶよりも小さいのが好ましい。より理想的には、
０＜Ｖ_ｔｈ＜０．９１×Ｖ_ｄｄ
との関係を満たす様な信号増幅用Ｎ型ＭＩＳ薄膜半導体装置を使用する。反対に電源電圧Ｖ_ｄｄに負電源を用いる場合には信号増幅用ＭＩＳ型薄膜半導体装置としてエンハンスメント型（ノーマリーオフ型）Ｐ型トランジスタを用ており、理想的には信号増幅用Ｐ型ＭＩＳ薄膜半導体装置の閾値電圧Ｖ_ｔｈがＶ_ＧＶよりも大きいのが好ましい。より理想的には、
０．９１×Ｖ_ｄｄ＜Ｖ_ｔｈ＜０
との関係を満たす信号増幅用Ｐ型ＭＩＳ薄膜半導体装置を使用する事である。斯うする事に依り対象物の凹部が、電流値Ｉが非常に大きいとの形態にて確実に検出されるに至る。
【００４５】
結局、指紋の山等に相当する対象物の凸部が静電容量検出装置に接した時に信号増幅素子が殆ど電流を通さず、同時に指紋の谷等に相当する対象物の凹部が静電容量検出装置に近づいた時に信号増幅素子が大きな電流を通して対象物の凹凸を正しく認識するには、静電容量検出素子にて容量検出誘電体膜が静電容量検出装置の最表面に位置し、信号増幅用ＭＩＳ型薄膜半導体装置のゲート電極面積Ｓ_Ｔ（μｍ^２）やゲート絶縁膜の厚みｔ_ｏｘ（μｍ）、ゲート絶縁膜の比誘電率ε_ｏｘ、基準コンデンサの電極面積Ｓ_Ｒ（μｍ^２）、基準コンデンサ誘電体膜の厚みｔ_Ｒ（μｍ）、基準コンデンサ誘電体膜の比誘電率ε_Ｒ、容量検出電極面積Ｓ_Ｄ（μｍ^２）、容量検出誘電体膜の厚みｔ_Ｄ（μｍ）、容量検出誘電体膜の比誘電率ε_Ｄ等を素子容量Ｃ_Ｄが基準コンデンサ容量Ｃ_Ｒとトランジスタ容量Ｃ_Ｔとの和であるＣ_Ｒ＋Ｃ_Ｔよりも十分に大きくなる様に設定する必要があり、且つ対象物が容量検出誘電体膜に接しずに対象物距離ｔ_Ａを以て離れて居る際に基準コンデンサ容量Ｃ_Ｒが対象物容量Ｃ_Ａよりも十分に大きく成る様に静電容量検出装置を構成づける必要がある。更に基準コンデンサ容量Ｃ_Ｒがトランジスタ容量Ｃ_Ｔよりも十分大きいのが理想的と言える。より具体的には基準コンデンサ容量Ｃ_Ｒとトランジスタ容量Ｃ_Ｔとが
Ｃ_Ｒ＞１０×Ｃ_Ｔ
との関係式を満たした上で、素子容量Ｃ_Ｄと基準コンデンサ容量Ｃ_Ｒと対象物容量Ｃ_Ａとが
Ｃ_Ｄ＞１０×Ｃ_Ｒ
Ｃ_Ｒ＞１０×Ｃ_Ａ
との関係を満たす様に静電容量検出装置を特徴付ける。又、電源電圧Ｖ_ｄｄに正電源を用いる場合には信号増幅用ＭＩＳ型薄膜半導体装置としてエンハンスメント型（ノーマリーオフ型）Ｎ型トランジスタを用いるのが好ましく、此のＮ型トランジスタの最小ゲート電圧Ｖ_ｍｉｎは
０＜０．１×Ｖ_ｄｄ＜Ｖ_ｍｉｎ 又は０＜Ｖ_ＧＴ＜Ｖ_ｍｉｎ
との関係を満たし、更に閾値電圧Ｖ_ｔｈがＶ_ＧＶよりも小さく、具体的には
０＜Ｖ_ｔｈ＜０．９１×Ｖ_ｄｄ 又は０＜Ｖ_ｔｈ＜Ｖ_ＧＶ
との関係を満たしているエンハンスメント型Ｎ型トランジスタを用いるのが理想的である。反対に電源電圧Ｖ_ｄｄに負電源を用いる場合には信号増幅用ＭＩＳ型薄膜半導体装置としてエンハンスメント型（ノーマリーオフ型）Ｐ型トランジスタを用いるのが好ましく、此のＰ型トランジスタの最小ゲート電圧Ｖ_ｍｉｎは
Ｖ_ｍｉｎ＜０．１×Ｖ_ｄｄ＜０ 又はＶ_ｍｉｎ＜Ｖ_ＧＴ＜０
との関係を満たし、更に閾値電圧Ｖ_ｔｈがＶ_ＧＶよりも大きく、具体的には
０．９１×Ｖ_ｄｄ＜Ｖ_ｔｈ＜０ 又はＶ_ＧＶ＜Ｖ_ｔｈ＜０
との関係を満たしているエンハンスメント型Ｐ型トランジスタを用いるのが理想的である。
【００４６】
次に斯うした発明を具現化する静電容量検出素子の構造を図６を用いて説明する。本発明では行選択素子と列選択素子と信号増幅素子とがソースドレイン領域の導電型と不純物濃度とを除いて同一構造を取るので、図６には信号増幅素子と基準コンデンサとの断面構造を示す。静電容量検出素子の信号増幅素子を成す信号増幅用ＭＩＳ型薄膜半導体装置はソース領域とチャンネル形成領域とドレイン領域とを含む半導体膜とゲート絶縁膜とゲート電極とを不可欠な構成要件としている。行選択素子を為す行選択用ＭＩＳ型薄膜半導体装置も列選択素子を為す列選択用ＭＩＳ型薄膜半導体装置もソース領域とチャンネル形成領域とドレイン領域とを含む半導体膜とゲート絶縁膜とゲート電極とを不可欠な構成要件とする。図６の構成例では信号増幅用ＭＩＳ型薄膜半導体装置をＮＭＯＳで作成し、基準コンデンサ下部電極は信号増幅用ＭＩＳ型薄膜半導体装置のドレイン領域と同じ素材であるＮ型半導体膜から成っている。基準コンデンサ下部電極も薄膜半導体装置のドレイン領域も同じ下地保護膜上に形成されている。基準コンデンサの誘電体膜は信号増幅用ＭＩＳ型薄膜半導体装置のゲート絶縁膜と同一素材である酸化珪素膜から成り、共に同一層上（半導体膜上）に形成される。基準コンデンサ上部電極は信号増幅用ＭＩＳ型薄膜半導体装置のゲート電極と同一素材である金属膜（具体的にはタンタル薄膜）にて形成され、ゲート絶縁膜や基準コンデンサ誘電体膜を為す酸化硅素膜上に形成されている。図６では基準コンデンサ下部電極が容量検出電極と信号増幅素子のゲート電極に接続されているが、基準コンデンサ上部電極が容量検出電極と信号増幅素子のゲート電極に接続されても無論良い。
【００４７】
斯様な静電容量検出素子は前述のＳＵＦＴＬＡ技術を用いて、プラスティック基板上に形成され得る。単結晶硅素技術に基づく指紋センサはプラスティック上では直ぐに割れて仕舞ったり、或いは十分な大きさを有さぬが為に実用性に乏しい。これに対して本願発明に依るプラスティック基板上の静電容量検出素子は、プラスティック基板上で指を被うに十分に大きい面積としても静電容量検出素子が割れる心配もなく、プラスティック基板上での指紋センサとして利用し得る。具体的には本願発明により個人認証機能を兼ね備えたスマートカードが実現される。個人認証機能を備えたスマートカードはキャッシュカード（ｂａｎｋ ｃａｒｄ）やクレジットカード（ｃｒｅｄｉｔ ｃａｒｄ）、身分証明書（Ｉｄｅｎｔｉｔｙ ｃａｒｄ）等で使用され、此等のセキュリティーレベルを著しく高めた上で尚、個人指紋情報をカード外に流出させずに保護するとの優れた機能を有する。
【００４８】
（実施例１）
ガラス基板上に薄膜半導体装置からなる静電容量検出装置を製造した上で、此の静電容量検出装置をＳＵＦＴＬＡ技術を用いてプラスティック基板上に転写し、プラスティック基板上に静電容量検出装置を作成した。静電容量検出装置は３０４行３０４列の行列状に並んだ静電容量検出素子から構成される。行列部の大きさは２０ｍｍ角の正方形である。
【００４９】
基板は厚み２００μｍのポリエーテルスルフォン（ＰＥＳ）である。信号増幅用Ｎ型ＭＩＳ型薄膜半導体装置も列選択用Ｎ型ＭＩＳ型薄膜半導体装置も行選択用Ｎ型ＭＩＳ型薄膜半導体装置も総て同じ断面構造を有する薄膜トランジスタにて作られている。薄膜トランジスタは図６に示すトップゲート型で工程最高温度４２５℃の低温工程にて作成される。半導体膜はレーザー結晶化にて得られた多結晶硅素薄膜でその厚みは５０ｎｍである。又、ゲート絶縁膜は化学気相堆積法（ＣＶＤ法）にて形成された４５ｎｍ厚の酸化硅素膜で、ゲート電極は厚み４００ｎｍのタンタル薄膜から成る。ゲート絶縁膜を成す酸化硅素膜の比誘電率はＣＶ測定により略３．９と求められた。基準コンデンサ下部電極は信号増幅用Ｎ型ＭＩＳ型薄膜半導体装置のドレイン領域と同じＮ型半導体膜にて形成され、基準コンデンサ誘電体膜は信号増幅用Ｎ型ＭＩＳ型薄膜半導体装置のゲート絶縁膜と同じ酸化珪素膜で作られ、基準コンデンサ上部電極は信号増幅用Ｎ型ＭＩＳ型薄膜半導体装置のゲート電極と同じタンタル薄膜から成る。基準コンデンサ下部電極はコンタクトホールを介して列線に接続され、上部電極は信号増幅用Ｎ型ＭＩＳ型薄膜半導体装置のゲート電極と容量検出電極とに接続されている。静電容量検出素子の回路構成は図３と同一である。
【００５０】
本実施例では静電容量検出装置を成す行列のピッチを６６μｍとし、解像度を３８５ｄｐｉ（ｄｏｔｓ ｐｅｒ ｉｎｃｈ）としている。この結果、容量検出電極面積は１４８５μｍ^２となった。容量検出誘電体膜は厚み３００ｎｍの窒化硅素膜にて形成された。ＣＶ測定からこの窒化硅素膜の比誘電率は略７．５であったから、素子容量Ｃ_Ｄは凡そ３２９ｆＦ（フェムトファラッド）となる。本実施例の静電容量検出装置を指紋センサと想定すると、指紋の凹凸は５０μｍ程度なので、静電容量検出装置表面に指紋の谷が来た時の対象物容量Ｃ_Ａは０．２６ｆＦと計算される。一方、信号増幅用ＭＩＳ薄膜半導体装置のゲート電極長Ｌを２μｍとし、ゲート電極幅Ｗを２μｍとしたから、トランジスタ容量Ｃ_Ｔは凡そ３．０７ｆＦとなる。又、基準コンデンサ電極面積Ｓ_Ｒを４２μｍ^２とした。この結果、基準コンデンサ容量Ｃ_Ｒは３２ｆＦとなった。斯うして本実施例に示す静電容量検出素子は
Ｃ_Ｄ＞１０×Ｃ_Ｒ
Ｃ_Ｒ＞１０×Ｃ_Ｔ
Ｃ_Ｒ＞１０×Ｃ_Ａ
との関係を満たす。斯くして電源電圧Ｖ_ｄｄを３．３Ｖとすると、指紋の山が静電容量検出装置表面に接した時に信号増幅用ＭＩＳ薄膜半導体装置のゲート電極に印可される電圧Ｖ_ＧＴは０．３０Ｖとなり、指紋の谷が来た時に此のゲート電極に印可される電圧Ｖ_ＧＶは３．０８Ｖとなる。本実施例にて用いた信号増幅用Ｎ型ＭＩＳ型薄膜半導体装置の最小ゲート電圧Ｖ_ｍｉｎは０．３５Ｖで有り、指紋の山が接した時のゲート電圧Ｖ_ＧＴの０．３０Ｖよりも大きいために、信号増幅用Ｎ型ＭＩＳ型薄膜半導体装置は完全にオフ状態となった。一方、閾値電圧Ｖ_ｔｈは１．４２Ｖであり、指紋の谷が来た時に得られるゲート電圧Ｖ_ＧＶの３．１１Ｖより小さいために、信号増幅用Ｎ型ＭＩＳ型薄膜半導体装置は完全にオン状態となった。この結果、指紋の山が静電容量検出装置表面に接した時に信号増幅素子から出力される電流値は４．５×１０^−１３Ａと窮めて微弱となる。反対に指紋の谷が来た時には信号増幅素子から２．５×１０^−５Ａと大きな電流が出力され、指紋等の凹凸情報を精度良く検出するに至った。
【００５１】
【発明の効果】
以上詳述してきた様に、本願により高精度検出可能な静電容量検出装置を薄膜半導体装置にて作成する事が可能になった。従来の単結晶硅素基板を用いた技術では数ｍｍ×数ｍｍ程度の小さな静電容量検出装置しかプラスティック基板上に形成出来なかったが、本願発明に依るとその百倍もの面積を有する静電容量検出装置をプラスティク基板上に作成する事が実現し、しかも対象物の凹凸情報を窮めて高精度に検出出来る様になった。その結果、例えはスマートカードのセキュリティーレベルを著しく向上せしめるとの効果が認められる。又、単結晶硅素基板を用いた従来の静電容量検出装置は装置面積の極一部しか単結晶硅素半導体を利用して居らず、莫大なエネルギーと労力とを無駄に費やしていた。これに対し本願発明では斯様な浪費を排除し、地球環境の保全に役立つとの効果を有する。
【図面の簡単な説明】
【図１】従来技術に於ける動作原理を説明した図。
【図２】本願発明に於ける動作原理を説明した図。
【図３】本願発明に於ける静電容量検出素子の回路構成を説明した図。
【図４】本願発明の原理を説明した図。
【図５】本願発明の原理を説明した図。
【図６】本願発明の素子構造を説明した図。[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a capacitance detection device that reads the surface shape of an object having fine irregularities such as fingerprints by detecting the capacitance that changes according to the distance from the object surface.
[0002]
[Prior art]
Conventionally, a capacitance detection device used for a fingerprint sensor or the like has formed a sensor electrode and a dielectric film provided on the sensor electrode on a single crystal silicon substrate (Japanese Patent Laid-Open Nos. 11-118415 and 2000-). 346608, JP-A-2001-56204, JP-A-2001-133213, etc.). FIG. 1 illustrates the principle of operation of a conventional capacitance detection device. The sensor electrode and the dielectric film form one electrode of the capacitor and the dielectric film, and the other body is grounded. Capacitance C of this capacitor_FChanges according to the unevenness of the fingerprint in contact with the surface of the dielectric film. On the other hand, the capacitance C_SIs prepared, and these two capacitors are connected in series, and a predetermined voltage is applied. As a result, a charge Q corresponding to the unevenness of the fingerprint is generated between the two capacitors. This electric charge Q was detected using ordinary semiconductor technology, and the surface shape of the object was read.
[0003]
[Problems to be solved by the invention]
However, since these conventional capacitance detection devices are formed on a single crystal silicon substrate, when the device is used as a fingerprint sensor, when the finger is pressed strongly, the device breaks down. I had it.
[0004]
Furthermore, the fingerprint sensor is inevitably required to have a size of about 20 mm × 20 mm depending on its use, and most of the capacitance detection device area is occupied by the sensor electrode. Of course, the sensor electrode is made on a single crystal silicon substrate, but most of the single crystal silicon substrate (bottom part of the sensor electrode) produced by expending enormous energy and labor plays only a role as a support. That is, the conventional capacitance detection device is not only expensive, but has a problem that it is formed on a great deal of waste and waste.
[0005]
In addition, in recent years, it is strongly pointed out that a personal authentication function should be provided on a card such as a credit card or a cash card to enhance the safety of the card. However, since a conventional capacitance detection device made on a single crystal silicon substrate lacks flexibility, there is a problem that the device cannot be made on a plastic substrate.
[0006]
In view of the above-mentioned circumstances, the present invention is intended to operate stably, further reduce unnecessary energy and labor at the time of manufacture, and excellent electrostatic capacity that can be created other than a single crystal silicon substrate. To provide a capacity detection device.
[0007]
[Means for Solving the Problems]
The present invention creates a capacitance detection device on a glass substrate or the like by using a thin film semiconductor device for detecting the surface shape of an object by detecting the capacitance that changes according to the distance to the object. To do. Such a capacitance detection device has M rows and N column lines arranged in a matrix of M rows and N columns, and M × N pieces provided at the intersections of the row lines and the column lines. And a capacitance detection element. Each capacitance detection element includes a signal detection element, a signal amplification element, and a column selection element. The signal detection element includes a capacitance detection electrode, a capacitance detection dielectric film, and a reference capacitor. The reference capacitor includes a reference capacitor lower electrode, a reference capacitor dielectric film, and a reference capacitor upper electrode. On the other hand, the signal amplifying element comprises a signal amplifying MIS type thin film semiconductor device comprising a gate electrode, a gate insulating film, and a semiconductor film. The present invention is characterized in that the reference capacitor lower electrode and the column line are electrically connected. The column selection element is composed of a column selection MIS type thin film semiconductor device comprising a gate electrode, a gate insulating film, and a semiconductor film. It is also a feature of the present invention that the gate electrode of the column selection MIS thin film semiconductor device is connected to the column line. The MIS thin film semiconductor device for signal amplification and the MIS thin film semiconductor device for column selection are semiconductor devices of the same conductivity type, and both thin film semiconductor devices are connected in series. The present invention is characterized in that the reference capacitor lower electrode and the column line are electrically connected in such a configuration. The present invention is also characterized in that when the reference capacitor lower electrode and the column line are electrically connected, the capacitance detection electrode and the reference capacitor upper electrode are electrically connected. In this state, the gate electrode of the MIS thin film semiconductor device for signal amplification is connected to the capacitance detection electrode and the reference capacitor upper electrode.
[0008]
The present invention creates a capacitance detection device on a glass substrate or the like by using a thin film semiconductor device for detecting the surface shape of an object by detecting the capacitance that changes according to the distance to the object. To do. Such a capacitance detection device has M rows and N column lines arranged in a matrix of M rows and N columns, and M × N pieces provided at the intersections of the row lines and the column lines. And a capacitance detection element. Each capacitance detection element includes a signal detection element, a signal amplification element, and a column selection element. The signal detection element includes a capacitance detection electrode, a capacitance detection dielectric film, and a reference capacitor. The reference capacitor includes a reference capacitor lower electrode, a reference capacitor dielectric film, and a reference capacitor upper electrode. On the other hand, the signal amplifying element comprises a signal amplifying MIS type thin film semiconductor device comprising a gate electrode, a gate insulating film, and a semiconductor film. The present invention is characterized in that the reference capacitor upper electrode and the column line are electrically connected. The column selection element is composed of a column selection MIS type thin film semiconductor device comprising a gate electrode, a gate insulating film, and a semiconductor film. It is also a feature of the present invention that the gate electrode of the column selection MIS thin film semiconductor device is connected to the column line. The MIS thin film semiconductor device for signal amplification and the MIS thin film semiconductor device for column selection are semiconductor devices of the same conductivity type, and both thin film semiconductor devices are connected in series. The present invention is characterized in that the reference capacitor upper electrode and the column line are electrically connected in such a configuration. The present invention is also characterized in that when the reference capacitor upper electrode and the column line are electrically connected, the capacitance detection electrode and the reference capacitor lower electrode are electrically connected. In this state, the gate electrode of the MIS thin film semiconductor device for signal amplification is connected to the capacitance detection electrode and the reference capacitor lower electrode.
[0009]
The present invention is characterized in that the drain electrode of the signal amplifying MIS thin film semiconductor device is electrically connected to the row line when the capacitance detecting element is in a selected state. Further, in the present invention, the capacitance detection device includes an output line, and when a certain capacitance detection element is selected, the source electrode of the MIS type thin film semiconductor device for signal amplification in the capacitance detection element is the output line. It is also characterized by electrical conduction.
[0010]
The present invention is characterized in that the dielectric film of the reference capacitor and the gate insulating film of the MIS thin film semiconductor device for signal amplification are formed of the same material. These films may be formed on the same layer. The reference capacitor lower electrode can be formed of the same material as the drain region of the MIS thin film semiconductor device for signal amplification. The reference capacitor lower electrode and the drain region of the signal amplifying MIS thin film semiconductor device are also formed on the same layer. The upper electrode of the reference capacitor is formed of the same material as the gate electrode of the signal amplification MIS type thin film semiconductor device. These electrodes may be formed on the same layer.
[0011]
The present invention sets the electrode area of the reference capacitor to S_R(Μm²), The thickness of the reference capacitor dielectric film is t_R(Μm), the dielectric constant of the reference capacitor dielectric film is ε_RThe gate electrode area of the MIS type thin film semiconductor device for signal amplification is S_T(Μm²), The thickness of the gate insulating film is t_ox(Μm), the dielectric constant of the gate insulating film is ε_oxReference capacitor capacity C_RAnd transistor capacitance C of MIS type thin film semiconductor device for signal amplification_TAnd each
C_R= Ε₀・ Ε_R・ S_R/ T_R
C_T= Ε₀・ Ε_ox・ S_T/ T_ox
(Ε₀Is the dielectric constant of the vacuum), and the area of the capacitance detection electrode is S_D(Μm²), The thickness of the capacitance detection dielectric film is t_D(Μm), the dielectric constant of the capacitance detection dielectric film is ε_DAs the element capacitance C of the signal detection element_DThe
C_D= Ε₀・ Ε_D・ S_D/ T_D
(Ε₀Is the vacuum dielectric constant), and this element capacitance C_DIs the reference capacitor capacity C_RAnd transistor capacitance C_TC which is the sum of_R+ C_TIt is characterized by being sufficiently larger than. Furthermore, the reference capacitor capacity C_RIs transistor capacitance C_TIdeally it should be much larger than. Therefore, element capacitance C_DIs the reference capacitor capacity C_RIt is also characterized by being sufficiently larger than a single unit. The capacitance detection dielectric film is also characterized by being located on the outermost surface of the capacitance detection device. In addition, the present invention also provides an object distance t without the object to be measured contacting the capacitance detecting dielectric film._AThe object capacity C_AThe dielectric constant of vacuum ε₀And air relative permittivity ε_AAnd area S of the capacitance detection electrode_DAnd
C_A= Ε₀・ Ε_A・ S_D/ T_A
Is defined as the reference capacitor capacity C_RIs the object capacity C_AIt is characterized by being sufficiently larger than. Again, the reference capacitor capacitance C_RIs transistor capacitance C_TIdeally it should be much larger than.
[0012]
In the present invention, the capacitance detection dielectric film is positioned on the outermost surface of the capacitance detection device, and the electrode area of the reference capacitor is defined as S._R(Μm²), The thickness of the reference capacitor dielectric film is t_R(Μm), the dielectric constant of the reference capacitor dielectric film is ε_RThe gate electrode area of the MIS type thin film semiconductor device for signal amplification is S_T(Μm²), The thickness of the gate insulating film is t_ox(Μm), the dielectric constant of the gate insulating film is ε_oxReference capacitor capacity C_RAnd transistor capacitance C of MIS type thin film semiconductor device for signal amplification_TAnd each
C_R= Ε₀・ Ε_R・ S_R/ T_R
C_T= Ε₀・ Ε_ox・ S_T/ T_ox
(Ε₀Is the dielectric constant of the vacuum), and the area of the capacitance detection electrode is S_D(Μm²), The thickness of the capacitance detection dielectric film is t_D(Μm), the dielectric constant of the capacitance detection dielectric film is ε_DAs the element capacitance C of the signal detection element_DThe
C_D= Ε₀・ Ε_D・ S_D/ T_D
(Ε₀Is the vacuum dielectric constant), and this element capacitance C_DIs the reference capacitor capacity C_RAnd transistor capacitance C_TC which is the sum of_R+ C_TLarger than the object distance t and the object does not contact the capacitance detection dielectric film._AThe object capacity C_AThe dielectric constant of vacuum ε₀And air relative permittivity ε_AAnd area S of the capacitance detection electrode_DAnd
C_A= Ε₀・ Ε_A・ S_D/ T_A
Is defined as the reference capacitor capacity C_RIs the target capacity C_AIt is characterized by being sufficiently larger than. Again, the reference capacitor capacitance C_RIs transistor capacitance C_TIdeally it should be much larger than. Therefore, element capacitance C_DIs the reference capacitor capacity C_RIt is sufficiently larger than a single unit, and the reference capacitor capacity C_RSingle object volume C_AIt is also characterized by being sufficiently larger than.
[0013]
DETAILED DESCRIPTION OF THE INVENTION
According to the present invention, a capacitance detecting device for reading the surface shape of an object is detected by detecting a capacitance that changes in accordance with the distance to the object, and an MIS type thin film made of a metal-insulating film-semiconductor film. Created with a semiconductor device. Since a thin film semiconductor device is usually formed on a glass substrate, it is known as a technique for manufacturing a semiconductor integrated circuit requiring a large area at a low cost. Specifically, it has recently been applied to a liquid crystal display device or the like. Therefore, when a capacitance detection device adapted to a fingerprint sensor or the like is made with a thin film semiconductor device, it is not necessary to use an expensive substrate made by consuming a great amount of energy such as a single crystal silicon substrate. Therefore, the apparatus can be produced at low cost without wasting valuable earth resources. Thin film semiconductor devices adopt a transfer technique called SUFTLA (Japanese Patent Laid-Open No. 11-312811 and S. Utsunomiya et al. Society for Information Display p. 916 (2000)), so that a semiconductor integrated circuit is formed on a plastic substrate. Since it can be made, the capacitance detecting device can be released from the single crystal silicon substrate and formed on the plastic substrate.
[0014]
Now, as shown in FIG. 1, it is impossible to produce a capacitance detecting device to which a conventional operation principle is applied using a thin film semiconductor device with the current technology of the thin film semiconductor device. Since the charge Q induced between two capacitors connected in series is very small, the charge Q can be accurately read using single crystal silicon LSI technology that enables high-precision sensing. However, the charge Q cannot be read accurately because it is not as good as single crystal silicon LSI technology and the characteristic deviation between thin film semiconductor devices is large. Therefore, the capacitance detection device of the present invention includes M (M is an integer of 1 or more) row lines and N (N is an integer of 1 or more) column lines arranged in a matrix of M rows and N columns, And M × N capacitance detection elements provided at the intersections of the row lines and the column lines, each of which includes a signal detection element, a signal amplification element, and a column selection element. Including the above. The signal detection element includes a capacitance detection electrode, a capacitance detection dielectric film, and a reference capacitor. The reference capacitor further includes a reference capacitor lower electrode, a reference capacitor dielectric film, and a reference capacitor upper electrode. When an object such as a fingerprint contacts or approaches the capacitance detection dielectric film, a potential V is generated in the capacitance detection electrode according to the capacitance with the object. In the present invention, this potential V is amplified by a signal amplifying element provided in each capacitance detecting element, and converted into an amplified current or voltage. Specifically, the signal amplifying element comprises a signal amplifying MIS thin film semiconductor device comprising a gate electrode, a gate insulating film, and a semiconductor film. One electrode of the reference capacitor is connected to the column line, and the other electrode is connected to the capacitance detection electrode and the gate electrode of the MIS thin film semiconductor device for signal amplification. For example, when the reference capacitor lower electrode and the column line are electrically connected, the reference capacitor upper electrode is electrically connected to the capacitance detection electrode, and the capacitance detection electrode and the reference capacitor upper electrode are for signal amplification. It is electrically connected to the gate electrode of the MIS type thin film semiconductor device. Conversely, when the reference capacitor upper electrode and the column line are electrically connected, the reference capacitor lower electrode is electrically connected to the capacitance detection electrode, and the capacitance detection electrode and the reference capacitor lower electrode are amplified. It is electrically connected to the gate electrode of the MIS type thin film semiconductor device.
[0015]
The operating principle of the present invention in such a configuration will be described with reference to FIG. Capacitance C that changes according to the surface shape of the object_FAnd a capacitance C_RReference capacitor with transistor capacitance C_TCapacitance C with MIS type thin film semiconductor device for signal amplification having_R+ C_TThe potential V induced between the two is connected to the gate electrode (G in the figure) of the MIS thin film semiconductor device for signal amplification, and changes the gate potential of the semiconductor device. Thus, when a predetermined voltage is applied to the drain region (D in the figure) of this thin film semiconductor device, the current I flowing between the source and drain of the thin film semiconductor device is significantly modulated according to the induced gate potential V. A charge Q is generated in the gate electrode or the like according to the potential V. However, since these charges are stored without flowing anywhere, the current value I is constant. Therefore, the current I can be easily measured by increasing the drain voltage or lengthening the measurement time, and thus the surface shape of the object can be measured sufficiently accurately even if the thin film semiconductor device is used. A signal (current or voltage) obtained by amplifying the capacitance information of the object is read through the output line. In order to measure the capacitance of the object, the current I through the signal amplification element may be measured, or the voltage V through the signal amplification element corresponding to the current I may be measured.
[0016]
Next, a circuit configuration of a capacitance detection element embodying the present invention will be described with reference to FIG. As described above, each capacitance detection element includes a signal amplification element, a signal detection element, and a column selection element as indispensable components. The signal detection element includes a capacitance detection electrode, a capacitance detection dielectric film, and a reference capacitor. The reference capacitor includes a reference capacitor lower electrode, a reference capacitor dielectric film, and a reference capacitor upper electrode. The signal amplifying element comprises a signal amplifying MIS thin film semiconductor device comprising a gate electrode, a gate insulating film and a semiconductor film, and the column selecting element comprises a column selecting MIS thin film semiconductor comprising a gate electrode, a gate insulating film and a semiconductor film. Consists of devices. These two types of thin film semiconductor devices are of the same conductivity type. Further, the signal amplification element and the column selection element are installed in series between the row line and the output line. As an example, the drain electrode of the N-type MIS thin film semiconductor device for column selection is electrically connected to the row line, and the source electrode of the N-type MIS thin film semiconductor device for column selection and the N-type MIS thin film semiconductor device for signal amplification And the source electrode of the N-type MIS thin film semiconductor device for signal amplification are electrically connected to the output line. The term “electrically connected” means that a state is established in which electrical conduction can be achieved through a switch element or the like. Of course, the source electrode of the MIS thin film semiconductor device for signal amplification may be directly connected to the output line, or the drain electrode of the column selection MIS thin film semiconductor device may be directly connected to the row line. Further, since the source electrode and the drain electrode of the transistor are symmetrical in structure, the source electrode and the drain electrode may be interchanged. (That is, the word “source electrode” and the word “drain electrode” may be interchanged in the above example. However, in terms of physical strictness, in N-type transistors, the lower potential is defined as the source electrode. In the P-type transistor, the higher potential is defined as the source electrode, and in this example, the high potential (V_dd) And N-type transistors are used for the signal amplifying element and the column selecting element, so that the drain electrode of the signal amplifying element and the column selecting element is electrically connected to the row line side, and the source electrode is on the output line side It will be connected to. Further, the positional relationship between the column selection element and the signal amplification element may be opposite to the previous example. That is, the signal amplification element may be located on the row line side, and the column selection element may be located on the output line side.
[0017]
The number of output lines provided in the capacitance detection device can be taken out in the column direction as the same number N as the column lines, or can be taken out in the row direction as the same number M as the row lines. Furthermore, one output line may be provided in two columns, or one output line may be provided in two rows. In the present invention, since each capacitance detection element is selected one by one, the output line has such various forms. In the example of FIG. 3, the number of output lines is N, which is the same as the number of column lines, and the output lines are taken out in the column direction.
[0018]
One electrode of the reference capacitor is connected to the column line, and the other electrode is connected to the capacitance detection electrode and the gate electrode of the MIS semiconductor device for signal amplification. In the present invention, since a high potential is applied to the column line with the column line selected, one electrode of the reference capacitor directly connected to the column line has a high potential (V_dd) Is always applied, and a potential corresponding to the capacitance of the object is applied to the gate electrode of the signal amplifying element. Thus, the electrical conductivity between the source and drain of the MIS type thin film semiconductor device for signal amplification changes, and this is detected to obtain surface irregularity information of the object such as fingerprint information.
[0019]
Basically, it is possible to detect the capacitance with high accuracy with such a configuration, but in order to prevent information interference between the capacitance detection elements and realize high-precision detection at high speed, the capacitance The detection element preferably includes a column selection element and a row selection element. Similar to the column selection element, the row selection element can be constituted by a MIS type thin film semiconductor device for row selection comprising a gate electrode, a gate insulating film, and a semiconductor film. The MIS thin film semiconductor device for signal amplification, the MIS thin film semiconductor device for column selection, and the MIS thin film semiconductor device for row selection that form a signal amplification element are all connected in series. A row selection element is turned on by a row selection signal applied to the row line, and a column selection element is turned on by a column selection signal applied to the column line. In FIG. 3, an N-type semiconductor device is used as a row selection element, and this N-type semiconductor device drain electrode and gate electrode are connected to a row line to perform a diode operation. The diode-connected N-type MIS thin film semiconductor device for row selection operates so that the direction from the row line to the output line is the forward direction. That is, only when a selection signal having a high potential is input to the row line, the electrical conductivity of the row selection element is increased and the switch is turned on. The source electrode of the row selecting N-type thin film semiconductor device is connected to the drain electrode of the column selecting N-type thin film semiconductor device, and the gate electrode of the column selecting N-type thin film semiconductor device is connected to the column line. The column line has a low potential (V_ss: Negative power supply potential) and high potential (V_dd: Positive power supply potential). Accordingly, the column selecting element is increased in electrical conductivity only when the column line is selected, and is switched on. Eventually, a specific row line (for example, the i-th row line) is selected from among the M row lines, and a high potential is applied to the row line (i-th row line). As a result, the row selection element connected to the selected row line (i-th row line) is turned on. Next, in this state, when a selection signal enters a specific column line (for example, the jth column line) among the N column lines, it is connected to that column line (jth column line). Further, the electrical conductivity of the column selection element is increased and the transistor is turned on. As a result, the high potential applied to the selected row line (i-th row line) is applied to the drain electrode of the signal amplifying element located on the selected column line (j-th column line), and the target A source / drain current modulated with a gate voltage corresponding to the unevenness information of the object is generated in the signal amplifying element located in i row and j column. Thus, only M × N static capacitance detection elements (capacitance detection elements located in i rows and j columns) located at the intersections of the selected rows (i rows) and columns (j columns). The capacitance of the object at the position selected from the capacitance detection element group is measured. By providing a column selection element in each capacitance detection element, column selection is uniquely performed and information interference between columns can be prevented. Similarly, by providing a row selection element in each capacitance detection element, row selection is uniquely performed and information interference between rows can be prevented. By providing the column selection element and the row selection element in series, information backflow from the output line to the row line can be prevented, and the capacitance can be detected with high accuracy. In order to exhibit these effects, the column selection element, the row selection element, and the signal amplifying element may be arranged in series, and their order is not limited. These three elements are arranged in series between the row line and the output line, the gate electrode of the row selection element is connected to the row line, the gate electrode of the column selection element is connected to the column line, and the gate of the signal amplification element It is important that the electrode is connected to the capacitance detection electrode. As described above, in the present invention, when the capacitance detecting element is selected by the row selection signal or the column selection signal, the drain electrode of the signal amplification MIS thin film semiconductor device is electrically connected to the row line. The source electrode is electrically connected to the output line. Actually, switching elements such as row selection elements and column selection elements can be inserted between the signal amplification elements and the row lines or between the signal amplification elements and the output lines depending on the arrangement order of the three elements. Since the element has a high electric conductivity in the selected state, the drain electrode of the signal amplifying element is connected to the row line, and the source electrode is connected to the output line. As a result, the electric conductivity of the signal amplification element itself determines the current value from the row line to the output line. As will be described later, when the convex portion of the object (for example, a crest of a fingerprint) is in contact with the capacitance detection dielectric film, the electric conductivity of the signal amplification element is small, and almost no current is supplied to the output line. On the other hand, if the concave portion of the object (for example, the valley of the fingerprint) comes to the surface of the capacitance detection dielectric film and a thin air film is generated between the dielectric film and the object, the electric conductivity of the signal amplification element is remarkably large. Thus, a large current is supplied to the output line. Thus, the unevenness information of the object is obtained by measuring the current (or the voltage corresponding to the current) supplied to the output line.
[0020]
When each capacitance detection element includes a row selection element and a column selection element, only one specific capacitance detection element is reliably selected from the M × N capacitance detection element group as described above. Then the advantage is recognized. On the other hand, if there is no reference capacitor, the transistor capacitance of the signal amplification element and the capacitance of the object are capacitively coupled, and the product of the capacitance ratio and the drain voltage of the signal amplification element is applied to the gate electrode of the signal amplification element. Applied. Since the row selection element or the column selection element and the signal amplifying element are connected in series, the drain potential of the signal amplifying element is a high potential (V_dd) Is lowered by the presence of row selection elements and column selection elements. For example, assuming that the electric conductivity in the ON state of the row selection element, the column selection element, and the signal amplification element is approximately the same, V_ddIs applied, the drain potential of the signal amplifying element is V_ddV, which is about one third of_dd/ Go down to about 3 and finish. Therefore, even if the capacitance of the measurement object changes, the change amount of the gate potential of the signal amplifying element is at most V_dd/ 3, and the detection accuracy decreases or V_ddThe value of must be increased. In order to solve such a problem, in the present invention, a reference capacitor is provided, and one electrode of the reference capacitor is directly connected to the column line. Thus, even if there is a row selection element or a column selection element, one electrode of the reference capacitor is surely at a high potential (V_ddTherefore, the gate potential of the signal amplifying element is at least near zero and at most V_ddCan be near. That is, with the configuration of the present invention, even if the row selecting element and the column selecting element are connected in series with the signal amplifying element and provided between the row line and the output line, the gate potential of the signal amplifying element is a negative power source. Potential (V_ss: Zero volt) around positive power supply potential (V_dd: High potential) can be changed according to the capacitance of the measurement object. When the gate potential of the signal amplification element is in the vicinity of the negative power supply potential, the signal amplification MIS thin film semiconductor device is turned off, and the electric conductivity of the signal amplification element is significantly reduced. On the contrary, when the gate potential of the signal amplifying element is close to the positive power supply potential, the signal amplifying MIS thin film semiconductor device is turned on, and the electric conductivity of the signal amplifying element is increased. By measuring such a change in electrical conductivity via an output line, it is possible to collect unevenness information on the surface of the object. In such a configuration, the column selection element and the signal amplification element must be thin film semiconductor devices of the same conductivity type. This is because the column selection signal applied to the column line is applied to the gate electrode of the column selection element, and at the same time, the column selection signal is applied to the gate electrode of the signal amplification element via the reference capacitor. Specifically, when the column selection element and the signal amplifying element are N-type semiconductor devices, a negative power supply potential (ground potential, zero volts) is applied to the column line in a non-selected state, and a positive power supply potential (high potential) in the selected state. , A positive potential, such as +2.5 V or +3.3 V, is applied. When the column selection element and the signal amplifying element are P-type semiconductor devices, the column line is given a positive power supply potential (ground potential, zero volts) in a non-selected state, and a negative power supply potential (negative potential, negative in a selected state). For example, -2.5V or -3.3V). Further, when a semiconductor device is used as the row selection element, the row selection MIS thin film semiconductor device is preferably of the same conductivity type as the column selection element and the signal amplification element. This is because the column selection signal and the row selection signal can have the same polarity, and the drain potential of the signal amplifying element and the electrode potential connected to the column line of the reference capacitor have the same polarity, thereby increasing the signal amplification sensitivity. For example, the row selection element, the column selection element, and the signal amplifying element are all N-type semiconductor devices, and the row line and the column line are maintained at the negative power supply potential when not selected, and the positive power supply potential is applied to each line when selected. To do. Alternatively, the row selection element, the column selection element, and the signal amplifying element are all P-type semiconductor devices, and the row line and the column line are maintained at a positive power supply potential when not selected, and a negative power supply potential is applied to each line when selected. To do.
[0021]
In order to effectively perform the signal amplification function of the signal amplification MIS thin film semiconductor device of the present invention with the above-described configuration, the transistor capacitance C of the signal amplification MIS thin film semiconductor device is described._TAnd reference capacitor capacity C_R, And element capacitance C of the signal detection element_DMust be determined appropriately. Next, these relationships will be described with reference to FIGS.
[0022]
First, consider a situation where the convex portion of the measurement object is in contact with the capacitance detection dielectric film and the object is electrically grounded. Specifically, it is assumed that a capacitance detection device is used as a fingerprint sensor, and that a state in which a crest of fingerprints is in contact with the surface of the capacitance detection device is assumed. The electrode area of the reference capacitor is S_R(Μm²), The thickness of the reference capacitor dielectric film is t_R(Μm), the dielectric constant of the reference capacitor dielectric film is ε_RThe gate electrode area of the MIS type thin film semiconductor device for signal amplification is S_T(Μm²), The thickness of the gate insulating film is t_ox(Μm), the dielectric constant of the gate insulating film is ε_oxReference capacitor capacity C_RAnd transistor capacitance C of MIS type thin film semiconductor device for signal amplification_TAnd each
C_R= Ε₀・ Ε_R・ S_R/ T_R
C_T= Ε₀・ Ε_ox・ S_T/ T_ox
(Ε₀Is the dielectric constant of the vacuum). The area of the capacitance detection electrode is S_D(Μm²), The thickness of the capacitance detection dielectric film is t_D(Μm), the dielectric constant of the capacitance detection dielectric film is ε_DAs the element capacitance C of the signal detection element_DThe
C_D= Ε₀・ Ε_D・ S_D/ T_D

[0023]
[Formula 1]

[0024]
It becomes. Therefore, the element capacitance C_DIs the reference capacitor capacity C_RAnd transistor capacitance C_TC which is the sum of_R+ C_TBig enough than
[0025]
[Formula 2]

[0026]
Includes the gate voltage V_GTIs
[0027]
[Formula 3]

[0028]
And almost no voltage is applied to the gate electrode. As a result, the MIS thin film semiconductor device for signal amplification is turned off, and the source / drain current I is abundantly reduced. After all, when the convex portion of the object corresponding to the peak of the fingerprint is in contact with the capacitance detection device, the signal amplification element hardly flows current, so that the gate electrode area (gate length) constituting the capacitance detection element is reduced. Gate width), gate insulating film material, gate insulating film thickness, reference capacitor electrode area (capacitor electrode length and capacitor electrode width), reference capacitor dielectric film material, reference capacitor dielectric film thickness, capacitance detection electrode area, capacitance detection Dielectric film material, capacitance detection dielectric film thickness, etc._DIs the reference capacitor capacity C_RAnd transistor capacitance C_TC which is the sum of_R+ C_TIt must be set to be sufficiently larger than this. In general, “sufficiently large” means a difference of about 10 times. In other words, element capacitance C_DIs the reference capacitor capacity C_RAnd transistor capacitance C_TC which is the sum of_R+ C_TWhen
C_D> 10 × (C_R+ C_T)
Satisfy the relationship with. In this case, V_GT/ V_ddIs about 0.1 or less, and the thin film semiconductor device cannot be turned on. In order to reliably detect the convex portion of the target object, it is important that the signal amplification MIS thin film semiconductor device is turned off when the convex portion of the target object contacts the capacitance detection device. Therefore, the power supply voltage V_ddWhen a positive power source is used, an enhancement type (normally off type) N-type transistor in which the drain current does not flow when the gate voltage is near zero is preferably used as the MIS type thin film semiconductor device for signal amplification. More ideally, the gate voltage (minimum gate voltage) at which the drain current in the transfer characteristics becomes the minimum value is V_minAs this minimum gate voltage is
0 <0.1 × V_dd<V_min
Or
0 <V_GT<V_min
An N-type MIS thin film semiconductor device for signal amplification that satisfies the above relationship is used. Conversely, the power supply voltage V_ddWhen a negative power supply is used, an enhancement type (normally off type) P-type transistor in which a drain current does not flow when the gate voltage is near zero is used as the MIS type thin film semiconductor device for signal amplification. Ideally, the minimum gate voltage V of the P-type MIS thin film semiconductor device for signal amplification_minBut
V_min<0.1 × V_dd<0
Or
V_min<V_GT<0
The signal amplification P-type MIS thin film semiconductor device satisfying the relationship is used. As a result, the convex portion of the object can be reliably detected in the form that the current value I is very small.
[0029]
Next, the object distance t does not contact the capacitance detection dielectric film._AThus, let us consider a situation where the capacitor is separated from the dielectric film. That is, there is a situation in which the concave portion of the measurement object is on the capacitance detection dielectric film and the object is electrically grounded. Specifically, it is assumed that a fingerprint valley is present on the surface of the capacitance detection device when the capacitance detection device is used as a fingerprint sensor. As described above, in the capacitance detection device of the present invention, it is desirable that the capacitance detection dielectric film is located on the outermost surface of the capacitance detection device. An equivalent circuit diagram at this time is shown in FIG. Since the object surface is not in contact with the capacitance detection dielectric film, a new capacitor using air as a dielectric is formed between the capacitance detection dielectric film and the object surface. This is the object capacity C_AAnd the dielectric constant ε of the vacuum₀And air relative permittivity ε_AAnd area S of the capacitance detection electrode_DAnd
C_A= Ε₀・ Ε_A・ S_D/ T_A
It is defined as Thus, when the object is away from the capacitance detection dielectric film, the element capacitance C_DAnd object capacity C_AAre connected in series and are further connected in parallel to these capacitors._TAnd reference capacitor capacity C_RAre connected in series. The reference capacitor has a voltage V_ddIs applied and kV is applied to the drain electrode of the signal amplifying element._ddIs applied (FIG. 5). Since the applied voltage is divided among the four capacitors according to the electrostatic capacity, the voltage applied to the gate electrode of the MIS type thin film semiconductor device for signal amplification under this condition (gate voltage when the valley comes) V_GVIs
[0030]
[Formula 4]

[0031]
It becomes. On the other hand, in the present invention, the drain current becomes very small when the object contacts the capacitance detection device.
[0032]
[Formula 2]

[0033]
Since the capacitance detection element has been created to satisfy the condition_GVIs
[0034]
[Formula 5]

[0035]
Is approximated by Here, the reference capacitor capacity C_RThe object capacity C_AIf you set it to be sufficiently larger than
[0036]
[Formula 6]

[0037]
Gate voltage V_GVIs
[0038]
[Formula 7]

[0039]
And is further simplified. Thus, if the value of k is close to 1, the gate voltage V_GVIs the power supply voltage V_ddIs approximately equal to Reference capacitor capacity C_RIs transistor capacitance C_TIf you set it to be sufficiently larger than
[0040]
[Formula 8]

[0041]
Regardless of the value of k, the gate voltage V_GVIs
[0042]
[Formula 9]

[0043]
Power supply voltage V_ddIs almost equal to As a result, the MIS thin film semiconductor device for signal amplification can be turned on, and the current I is given up and increased. In order for the signal amplifying element to pass a large current when the concave portion of the object corresponding to the valley of the fingerprint comes on the capacitance detection device, the reference capacitor capacitance C_RIs the target capacity C_AIt is necessary to configure it to be sufficiently larger than the above. As described above, if a difference of about 10 times is recognized, it can be generally said that the difference is large._RAnd object capacity C_AToga
C_R> 10 × C_A
Satisfy the relationship with. In order to turn on the transistor when the valley of the fingerprint approaches, regardless of the value of k, the reference capacitor capacitance C_RIs transistor capacitance C_TIt should be 10 times larger than this.
[0044]
C_R> 10 × C_T
If these conditions are met, V_GT/ V_ddBecomes about 0.9 or more, and the thin film semiconductor device is easily turned on. In order to reliably detect the concave portion of the target object, it is important that the signal amplification MIS thin film semiconductor device is turned on when the concave portion of the target object approaches the capacitance detection device. Power supply voltage V_ddIn the case of using a positive power supply, an enhancement type (normally-off type) N-type transistor is used as the signal amplification MIS type thin film semiconductor device, and the threshold voltage V of this transistor is used._thIs V_GVIs preferably smaller. More ideally,
0 <V_th<0.91 × V_dd
An N-type MIS thin film semiconductor device for signal amplification that satisfies the above relationship is used. Conversely, the power supply voltage V_ddWhen a negative power supply is used, an enhancement type (normally-off type) P-type transistor is used as the signal amplification MIS type thin film semiconductor device. Ideally, the threshold voltage V of the signal type P type MIS thin film semiconductor device is used._thIs V_GVIs preferably larger. More ideally,
0.91 × V_dd<V_th<0
The signal amplification P-type MIS thin film semiconductor device satisfying the relationship is used. As a result, the concave portion of the object is reliably detected in a form that the current value I is very large.
[0045]
In the end, when the convex part of the object corresponding to the fingerprint crest etc. is in contact with the capacitance detection device, the signal amplification element hardly conducts current, and at the same time the concave part of the object corresponding to the fingerprint trough etc. In order for the signal amplification element to correctly recognize the unevenness of the object through a large current when approaching the detection device, the capacitance detection dielectric film is positioned on the outermost surface of the capacitance detection device and the signal is detected. Gate electrode area S of MIS type thin film semiconductor device for amplification_T(Μm²) And gate insulating film thickness t_ox(Μm), dielectric constant ε of gate insulating film_ox, Reference capacitor electrode area S_R(Μm²) Reference capacitor dielectric film thickness t_R(Μm), relative permittivity ε of the reference capacitor dielectric film_R, Capacitance detection electrode area S_D(Μm²), Thickness t of the capacitance detection dielectric film_D(Μm), dielectric constant ε of the capacitance detection dielectric film_DEtc., element capacitance C_DIs the reference capacitor capacity C_RAnd transistor capacitance C_TC which is the sum of_R+ C_TMust be set to be sufficiently larger than the object distance, and the object distance t does not contact the capacitance detection dielectric film._AThe reference capacitor capacitance C when_RIs the target capacity C_AIt is necessary to configure the capacitance detection device so as to be sufficiently larger than the above. Furthermore, the reference capacitor capacity C_RIs transistor capacitance C_TIt is ideal that it is sufficiently larger than that. More specifically, the reference capacitor capacity C_RAnd transistor capacitance C_TToga
C_R> 10 × C_T
The element capacitance C_DAnd reference capacitor capacity C_RAnd object capacity C_AToga
C_D> 10 × C_R
C_R> 10 × C_A
Characterize the capacitance detection device to satisfy the relationship. Power supply voltage V_ddIn the case of using a positive power supply, an enhancement type (normally off type) N-type transistor is preferably used as the MIS type thin film semiconductor device for signal amplification, and the minimum gate voltage V of this N-type transistor is used._minIs
0 <0.1 × V_dd<V_min  Or 0 <V_GT<V_min
And the threshold voltage V_thIs V_GVSmaller, specifically
0 <V_th<0.91 × V_dd  Or 0 <V_th<V_GV
It is ideal to use an enhancement type N-type transistor that satisfies the above relationship. Conversely, the power supply voltage V_ddIn the case of using a negative power supply, an enhancement type (normally off type) P-type transistor is preferably used as the MIS type thin film semiconductor device for signal amplification, and the minimum gate voltage V of this P-type transistor is used._minIs
V_min<0.1 × V_dd<0 or V_min<V_GT<0
And the threshold voltage V_thIs V_GVLarger, specifically
0.91 × V_dd<V_th<0 or V_GV<V_th<0
It is ideal to use an enhancement type P-type transistor that satisfies the relationship
[0046]
Next, the structure of a capacitance detecting element embodying such an invention will be described with reference to FIG. In the present invention, the row selection element, the column selection element, and the signal amplifying element have the same structure except for the conductivity type and impurity concentration of the source / drain region. FIG. 6 shows the cross-sectional structure of the signal amplifying element and the reference capacitor. Show. A signal amplifying MIS thin film semiconductor device that constitutes a signal amplifying element of a capacitance detecting element has a semiconductor film including a source region, a channel forming region, and a drain region, a gate insulating film, and a gate electrode as indispensable components. Both the row selection MIS thin film semiconductor device serving as a row selection element and the column selection MIS thin film semiconductor device serving as a column selection element include a semiconductor film including a source region, a channel formation region, and a drain region, a gate insulating film, and a gate electrode. Is an essential component. In the configuration example of FIG. 6, the signal amplification MIS thin film semiconductor device is made of NMOS, and the reference capacitor lower electrode is made of an N type semiconductor film which is the same material as the drain region of the signal amplification MIS thin film semiconductor device. The lower electrode of the reference capacitor and the drain region of the thin film semiconductor device are formed on the same base protective film. The dielectric film of the reference capacitor is made of a silicon oxide film that is the same material as the gate insulating film of the MIS thin film semiconductor device for signal amplification, and both are formed on the same layer (on the semiconductor film). The upper electrode of the reference capacitor is formed of a metal film (specifically, a tantalum thin film) that is the same material as the gate electrode of the MIS thin film semiconductor device for signal amplification, and a silicon oxide film serving as a gate insulating film and a reference capacitor dielectric film Formed on top. In FIG. 6, the reference capacitor lower electrode is connected to the capacitance detection electrode and the gate electrode of the signal amplifying element, but it goes without saying that the reference capacitor upper electrode is connected to the capacitance detection electrode and the gate electrode of the signal amplification element.
[0047]
Such a capacitance detection element can be formed on a plastic substrate using the above-described SUFTLA technology. A fingerprint sensor based on single-crystal silicon technology is not practical because it breaks immediately on a plastic or does not have a sufficient size. On the other hand, the capacitance detection element on the plastic substrate according to the present invention does not have to worry about the capacitance detection element being cracked even if the area is sufficiently large to cover the finger on the plastic substrate, and the fingerprint on the plastic substrate. It can be used as a sensor. Specifically, a smart card having a personal authentication function is realized by the present invention. Smart cards equipped with a personal authentication function are used for cash cards, credit cards, identity cards, etc., and with their security level remarkably increased, It has an excellent function of protecting information without leaking out of the card.
[0048]
(Example 1)
After manufacturing a capacitance detection device made of a thin film semiconductor device on a glass substrate, the capacitance detection device is transferred onto a plastic substrate using SUFTLA technology, and the capacitance detection device is placed on the plastic substrate. Created. The capacitance detection device is composed of capacitance detection elements arranged in a matrix of 304 rows and 304 columns. The size of the matrix portion is a 20 mm square.
[0049]
The substrate is polyethersulfone (PES) having a thickness of 200 μm. The N-type MIS thin film semiconductor device for signal amplification, the N-type MIS thin film semiconductor device for column selection, and the N-type MIS thin film semiconductor device for row selection are all made of thin film transistors having the same cross-sectional structure. The thin film transistor is a top gate type shown in FIG. 6 and is manufactured in a low temperature process with a maximum process temperature of 425 ° C. The semiconductor film is a polycrystalline silicon thin film obtained by laser crystallization and has a thickness of 50 nm. The gate insulating film is a 45 nm thick silicon oxide film formed by chemical vapor deposition (CVD), and the gate electrode is a 400 nm thick tantalum thin film. The relative dielectric constant of the silicon oxide film constituting the gate insulating film was determined to be approximately 3.9 by CV measurement. The reference capacitor lower electrode is formed of the same N-type semiconductor film as the drain region of the signal amplification N-type MIS thin film semiconductor device, and the reference capacitor dielectric film is formed of a gate insulating film of the signal amplification N-type MIS thin film semiconductor device. The reference capacitor upper electrode is made of the same silicon oxide film and is made of the same tantalum thin film as the gate electrode of the signal amplification N-type MIS thin film semiconductor device. The lower electrode of the reference capacitor is connected to the column line through a contact hole, and the upper electrode is connected to the gate electrode and the capacitance detection electrode of the signal amplification N-type MIS thin film semiconductor device. The circuit configuration of the capacitance detection element is the same as in FIG.
[0050]
In this embodiment, the pitch of the matrix forming the capacitance detection device is 66 μm, and the resolution is 385 dpi (dots per inch). As a result, the capacitance detection electrode area is 1485 μm.²It became. The capacitance detection dielectric film was formed of a silicon nitride film having a thickness of 300 nm. Since the relative dielectric constant of this silicon nitride film was about 7.5 from CV measurement, the element capacitance C_DIs approximately 329 fF (femtofarad). Assuming that the electrostatic capacity detection device of this embodiment is a fingerprint sensor, the unevenness of the fingerprint is about 50 μm._AIs calculated to be 0.26 fF. On the other hand, since the gate electrode length L of the MIS thin film semiconductor device for signal amplification is 2 μm and the gate electrode width W is 2 μm, the transistor capacitance C_TIs approximately 3.07 fF. Reference capacitor electrode area S_R42 μm²It was. As a result, the reference capacitor capacity C_RBecame 32 fF. Thus, the capacitance detecting element shown in this embodiment is
C_D> 10 × C_R
C_R> 10 × C_T
C_R> 10 × C_A
Satisfaction with the relationship. Thus, the power supply voltage V_ddIs 3.3 V, the voltage V applied to the gate electrode of the signal amplification MIS thin film semiconductor device when the peak of the fingerprint contacts the surface of the capacitance detection device._GTBecomes 0.30V, and the voltage V applied to this gate electrode when the valley of the fingerprint comes_GVBecomes 3.08V. Minimum gate voltage V of the N-type MIS thin film semiconductor device for signal amplification used in this example_minIs 0.35V, and the gate voltage V when the peak of the fingerprint touches_GTTherefore, the signal amplification N-type MIS thin film semiconductor device was completely turned off. On the other hand, the threshold voltage V_thIs 1.42 V, and the gate voltage V obtained when the valley of the fingerprint comes_GVTherefore, the N-type MIS thin film semiconductor device for signal amplification is completely turned on. As a result, the current value output from the signal amplifying element when the crest of fingerprint touches the surface of the capacitance detection device is 4.5 × 10.^-13Give up with A and become weak. On the other hand, when a fingerprint valley comes, 2.5 × 10^-5A large current A was output, leading to accurate detection of unevenness information such as fingerprints.
[0051]
【The invention's effect】
As described above in detail, the present application makes it possible to produce a capacitance detection device capable of highly accurate detection using a thin film semiconductor device. In the conventional technology using a single crystal silicon substrate, only a small capacitance detecting device of about several mm × several mm can be formed on a plastic substrate. It was possible to create a device on a plastic substrate, and it was possible to detect the unevenness information of an object with high accuracy. As a result, for example, the effect of significantly improving the security level of the smart card is recognized. In addition, the conventional capacitance detection device using a single crystal silicon substrate uses a single crystal silicon semiconductor for only a very small part of the device area, and wastes enormous energy and labor. On the other hand, the present invention eliminates such waste and has the effect of helping to preserve the global environment.
[Brief description of the drawings]
FIG. 1 is a diagram illustrating an operation principle in a conventional technique.
FIG. 2 is a diagram illustrating an operation principle in the present invention.
FIG. 3 is a diagram illustrating a circuit configuration of a capacitance detection element according to the present invention.
FIG. 4 is a diagram illustrating the principle of the present invention.
FIG. 5 is a diagram illustrating the principle of the present invention.
FIG. 6 is a diagram illustrating an element structure of the present invention.

Claims (2)

In the capacitance detection device that reads the surface shape of the object by detecting the capacitance that changes according to the distance to the object,
The capacitance detection device includes M row lines and N column lines arranged in a matrix of M rows and N columns, and capacitance detection elements provided at intersections of the row lines and the column lines. And
The capacitance detection element includes a signal detection element, a signal amplification element, and a column selection element,
The signal detection element includes a capacitance detection electrode, a capacitance detection dielectric film, and a reference capacitor,
The reference capacitor includes a reference capacitor lower electrode, a reference capacitor dielectric film, and a reference capacitor upper electrode.
The signal amplifying element comprises a MIS thin film semiconductor device for signal amplification comprising a gate electrode, a gate insulating film, and a semiconductor film,
The capacitance detecting device, wherein the reference capacitor lower electrode and the column line are electrically connected. In the capacitance detection device that reads the surface shape of the object by detecting the capacitance that changes according to the distance to the object,
The capacitance detection device includes M row lines and N column lines arranged in a matrix of M rows and N columns, and capacitance detection elements provided at intersections of the row lines and the column lines. And
The capacitance detection element includes a signal detection element, a signal amplification element, and a column selection element,
The signal detection element includes a capacitance detection electrode, a capacitance detection dielectric film, and a reference capacitor,
The reference capacitor includes a reference capacitor lower electrode, a reference capacitor dielectric film, and a reference capacitor upper electrode.
The signal amplifying element comprises a MIS thin film semiconductor device for signal amplification comprising a gate electrode, a gate insulating film, and a semiconductor film,
The capacitance detecting device, wherein the reference capacitor upper electrode and the column line are electrically connected.

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