JP2005007261A - Ion exchange method and ion exchange system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To prevent the effect of initial elution while utilizing a margin capable of ion exchange to reduce the cost of equipment and running cost. <P>SOLUTION: The subject system comprises a plurality of resin cylinders containing exchangeable resins, and each resin cylinder is connected with pipes via valves. In subject ion exchange method, the resin at the lowest stream is used as one at the highest stream, the resin at the middle stream is used as one shifted downstream, and a new resin is used as one next to the highest stream. The above series of operations are carried out by exchanging the resins and changing passages through valve operation as the resin exchange method. As a result of the operations, the new resin at the middle stream is cleaned and the resulting initial elution of the new resin is eliminated by the resin downstream to the new resin. Meanwhile, the resin at the highest stream can be utilized effectively without considering an element of margin because of the resin arranged downstream. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an ion exchange resin (hereinafter referred to as “resin”), and can be applied, for example, to the production of pure water.
[0002]
[Prior art]
High-purity pure water is required for pure water used for wafer cleaning in semiconductor manufacturing or the like. The reason is that impurities such as metal ions and organic components contained in the pure water adhere to the wafer being cleaned, thereby adversely affecting the yield and reliability of the finished product device.
[0003]
In addition, for the stable supply of products, this high-purity pure water must be stably supplied. Therefore, conventionally, a resin is used, and ion impurities are removed (ion exchange) by flowing pure water containing impurities into the resin. For example, see Patent Document 1.
[0004]
[Patent Document 1]
Japanese Patent Application Laid-Open No. 6-206069
[0005]
[Problems to be solved by the invention]
When the resin is used, the tip of the ion exchange zone curve approaches the flow-through point with time, and the resin exchange time comes. This resin exchange is performed while leaving a certain margin before the tip of the ion exchange zone curve reaches the flow-through point in order to guarantee the quality of pure water, so that the margin part where ion exchange is possible is wasted. It was.
[0006]
Further, at the initial stage of replacement with a new resin, impurities were eluted from the resin (hereinafter referred to as “initial dissolution”), and the quality of pure water was lowered. Therefore, when a new resin is used, it must be washed and blown with pure water for a long period of time to confirm that the eluted components have been sufficiently reduced. For this reason, it takes a long time until a new resin can be used after resin replacement, and a large amount of pure water is required for cleaning and blowing.
[0007]
Therefore, it is conceivable to clean a new resin in parallel with the supply of high-purity pure water, but the capital investment and running cost increase.
[0008]
The present invention has been made in view of the above circumstances, and while effectively preventing the influence of the initial elution, it is possible to effectively use the portion of the margin where ion exchange is possible, thereby reducing the capital investment and the running cost. Objective.
[0009]
[Means for Solving the Problems]
An ion exchange method according to the present invention is a method of using an ion exchange system that includes a plurality of ion exchangers through which a fluid flows sequentially, and each of the ion exchangers can be exchanged. When exchanging with an ion exchanger, the ion exchanger other than the most downstream ion exchanger is exchanged.
[0010]
The first ion exchange system according to the present invention includes a plurality of ion exchangers through which a fluid sequentially flows, and the plurality of ion exchangers are stacked on each other and can be individually exchanged.
[0011]
A second ion exchange system according to the present invention includes three ion exchangers through which a fluid sequentially flows, and a plurality of pipes that connect the three ion exchangers to flow the fluid, and the ion exchanger includes: It is placed at the apex of the triangle.
[0012]
A third ion exchange system according to the present invention includes three ion exchangers through which a fluid sequentially flows, and a plurality of pipes that connect the three ion exchangers to flow the fluid, and at least one of the pipes. One is provided with a valve for draining fluid.
[0013]
A fourth ion exchange system according to the present invention includes a plurality of ion exchangers through which a fluid sequentially flows, and a plurality of pipes through which the fluid flows by connecting the ion exchangers, and at least one of the pipes includes A pure water quality monitor is connected.
[0014]
DETAILED DESCRIPTION OF THE INVENTION
Before describing the details of the embodiment of the invention, the margin that should be effectively used for the purpose of the present invention and the initial elution that should be prevented from being affected will be described.
[0015]
FIG. 1 is a conceptual cross-sectional view showing a state in which the resin 1 installed in the resin cylinder 2 is in water. Water 11 containing impurity ions from one end is poured into the resin 1 to obtain water 12 from which impurity ions are removed from the other end of the resin 1.
[0016]
The hatched portion indicates a resin region 101 in which ion exchange cannot be performed, and the boundary between this and a resin region 102 in which ion exchange is possible forms an ion exchange zone curve 103. The ion exchange zone curve 103 moves from the side where water 11 is poured (one end of the resin 1) to the side where the water 12 is obtained (the other end of the resin 1). As grasped.
[0017]
In the ion exchange zone curve 103, the position closest to the through-flow point 105 (hereinafter referred to as “tip”) and the through-flow point 105 serve as a margin 104 when the resin 1 is exchanged. That is, the water 12 can be obtained without flowing through by replacing the resin 1 when the margin 104 remains.
[0018]
FIG. 2 is a conceptual cross-sectional view showing how the initial eluted impurities move. The resin 3 is, for example, a new product and includes an initial eluting impurity 109. Water 11 containing impurity ions is poured into the resin 3 from one end, and the initial eluting impurity 109 moves to the other end of the resin 3 as indicated by the arrow 15 in accordance with the water pouring and includes the initial eluting impurity 109 from the other end of the resin 3. Water 13 is obtained.
[0019]
3 to 5 show how the resin 3 is washed with water 12. First, the water 12 from which the impurity ions have been removed is poured into one end of the resin 3, which moves the initial eluting impurities 109 in the resin 3 to the other end of the resin 3 as indicated by an arrow 16. Thereby, the water 13 containing the initial eluting impurities 109 is obtained from the other end of the resin 3 (FIG. 3).
[0020]
As the outflow of the initial eluting impurities 109 proceeds, a resin region 101 in which ion exchange cannot be performed is generally generated on one end side of the resin 3, and the ion exchange zone curve 103 moves to the other end side (FIG. 4). When the resin 1 from which the initial eluting impurities 109 have been removed is obtained, water 14 having a lower impurity ion concentration than the water 12 is obtained from the other end of the resin 1 (FIG. 5).
[0021]
Embodiment 1 FIG.
In the present embodiment, three resin cylinders are provided, and high-purity pure water is produced by a method in which the resin installed in the resin cylinders is periodically replaced one by one.
[0022]
6 to 8 are conceptual plan views showing the configuration of the pure water production system according to the present embodiment. In this system, the flow of water (hereinafter referred to as “flow path”) can be changed from three to three in FIGS. 6 to 8, the resin cylinders 51, 52, 53 are connected to each other via valves 31-39. That is, the water intake pipe 121 and the resin cylinders 51, 52, 53 are connected via the valves 31, 32, 33, respectively. Further, the water discharge pipe 122 and the resin cylinders 51, 52, 53 are connected via valves 34, 35, 36, respectively. The resin cylinders 51 and 52 are connected via a valve 37, the resin cylinders 52 and 53 are connected via a valve 38, and the resin cylinders 53 and 51 are connected via a valve 39, respectively. In these figures and the subsequent figures, the black valve is in a closed state and the white valve is in an open state.
[0023]
FIG. 6 shows a state in which the valves 31, 36, 37, 38 are opened and the valves 32, 33, 34, 35, 39 are closed. The flow path at this time is indicated by a thick line pipe and an arrow in the figure, and water passes through the resin cylinders 51, 52 and 53 in this order. Similarly, in FIG. 7, the valves 33, 35, 37, 39 are opened and the remaining valves are closed, so that water passes in the order of the resin cylinders 53, 51, 52. In FIG. 8, the valves 32, 34, 38, 39 are opened and the other valves are closed, so that water passes in the order of the resin tubes 52, 53, 51. FIG. 9 conceptually shows a cross-sectional view of this system, and the flow path corresponds to FIG.
[0024]
The first effect by using this system will be described with reference to FIGS. FIGS. 10 to 13 show conceptual plan views of the resin state and flow path immediately after replacement, and FIGS. 14 to 20 show conceptual sectional views of the resin state. 14 to 20 show the resin cylinders in the order in which water flows in order to simplify the drawings.
[0025]
First, as shown in FIG. 10 and FIG. 14, the resin in a state 74 without pre-elution that has been pretreated is placed in each resin cylinder. Then, the valves are opened and closed so that the flow paths are in the order of the resin cylinders 51, 52 and 53. The resin state 74 in FIG. 10 corresponds to the state of the resin installed in each resin cylinder in FIG. At this time, water that has passed through each resin is water 12 from which impurity ions have been removed.
[0026]
Among the resins installed in the resin cylinders 51, 52, and 53, ion exchange is remarkably performed toward the upstream side. In particular, when the most upstream resin does not flow, ion exchange in the next upstream (hereinafter referred to as “middle stream”) resin and downstream resin is not as significant as the upstream resin. Therefore, at present, it is considered that the resin installed in the upstream resin cylinder 51 flows first. Therefore, as shown in FIG. 15, in the resin installed in the upstream resin cylinder 51, when a period during which the tip of the ion exchange zone curve 103 is expected to reach the through point 105 has passed (hereinafter, this is referred to as one cycle). 11) and FIG. 16, the resin in the resin cylinder 51 is replaced with a new resin 3.
[0027]
The upstream resin cylinder 51 is in the middle, the intermediate resin cylinder 52 is in the downstream, and the downstream resin cylinder 53 is in the upstream, that is, the flow path is the resin cylinder 53, 51, 52. Open and close each valve in order. The resin states 75, 76, and 77 in FIG. 11 correspond to the resin states of the resin cylinders 51, 52, and 53 in FIG.
[0028]
At this time, the water that has passed through the resin cylinder 53 located upstream is the water 12, but the water that has passed through the resin cylinder 51 (installed with the new resin 3) located in the middle stream thereafter has the initial eluting impurities 109. Since it is washed, it becomes water 13 containing initial eluting impurities. However, by passing through the resin cylinder 52 located downstream, the eluted impurity ions in the water 13 are removed and become water 12 again. The new resin 3 is washed during this one cycle, and is ready for use in the next cycle.
[0029]
Then, after one cycle has passed again (FIG. 17), high purity pure water 12 can be obtained and new resin 3 can be washed by performing the same operation as shown in FIGS. 12 and 18. it can. The resin states 78 and 79 in FIG. 12 correspond to the resin states of the resin cylinders 51 and 52 in FIG. Hereinafter, by repeating the same operation for each cycle, the influence of initial elution can be prevented, and high-purity pure water can be supplied stably and continuously (FIGS. 19, 13, and 20). In addition, since a large amount of pure water and equipment for cleaning are not required, the cost is reduced. The resin states 80 and 81 in FIG. 13 correspond to the resin states of the resin cylinders 51 and 53 in FIG. 20, respectively.
[0030]
Next, the second effect obtained by using this system will be described. That is, there is an effect that it is not necessary to consider a margin for the resin located at the uppermost stream because the ion exchange by the resin has three stages.
[0031]
For example, in the case of FIG. 15, after one cycle has elapsed, the tip of the ion exchange zone curve 103 reaches the through-flow point 105 for the resin installed in the resin cylinder 51. However, if the period of one cycle is fixed, the tip of the ion exchange zone curve has already reached the through point 105 before one cycle has elapsed, and the portion of the region 101 that has reached the through point 105 has increased when one cycle has elapsed. there is a possibility. In this case, the passed water is hardly ion-exchanged and becomes water 17 containing a large amount of impurities. However, since there is a resin that does not flow through in the middle and downstream, high-purity pure water 12 is obtained as a result.
[0032]
Further, as described above, the flow path is changed during resin replacement, and the resin is periodically positioned at the uppermost stream. For this reason, it is not necessary to consider a margin for each resin to be replaced, and the resin can be used effectively.
[0033]
Further, when the ion exchange efficiency varies depending on the resin lot, if the period of one cycle is fixed, a margin may remain after one cycle has elapsed, which may cause waste.
[0034]
FIG. 21 is a conceptual plan view of the system when a pure water quality monitor is attached. In FIG. 21, each of the resin cylinders 51, 52, 53 has two outlets, and one of the necessary outlets is attached with a pure water quality monitor 5, 6, 7, such as a resistivity meter, and is upstream. By monitoring the water that has passed through the resin cylinder located in the pure water quality monitor, it is possible to accurately know the replacement time. Here, the one required is the one that becomes the outlet of water when the respective resin cylinders are positioned in the uppermost stream.
[0035]
Further, an example of monitoring pure water using this system will be described with reference to FIG. 21. In the case of the flow path shown in FIG. 21, the quality of water that has passed through the resin cylinder 51 located at the uppermost stream is monitored. By monitoring according to 5, it is possible to know the replacement time of the resin. This makes it possible to use an effective resin.
[0036]
As described above, in the initial state of the system, the pre-processed resin was used for all the resins (FIGS. 10 and 14). The same effect can be obtained. That is, in the first half of the first cycle of the system, the water obtained by the influence of the initial elution is the same as that of the water 13, but in the second half, the initial elution is washed and water 12 having high purity is obtained. Thereafter, the operations shown in FIGS. 11 to 13 are performed every cycle.
[0037]
The above contents can also be grasped as follows. The system has resin cylinders 51, 52, and 53 each having a resin through which water sequentially flows, and resin replacement is possible in each of the resin cylinders. The following procedure is adopted when replacing the resin.
[0038]
First, the most downstream resin before replacement is adopted as the most upstream resin after replacement. This corresponds to the fact that the resin installed in the resin cylinder 53 is downstream in FIG. 10 before the replacement, but is upstream in FIG. 11 after the replacement.
[0039]
Second, exchange other than the most upstream resin before replacement (resin installed in the resin cylinder 51 in FIG. 10) and the most downstream resin before replacement (resin installed in the resin cylinder 53 in FIG. 10). The previous resin is adopted as the resin positioned by being sequentially lowered to the downstream side. This corresponds to the fact that the resin installed in the resin cylinder 52 in FIG. 10 is lowered from the middle stream (FIG. 10) to the downstream (FIG. 11).
[0040]
Third, a new resin is adopted as the second resin from the uppermost stream after replacement. This corresponds to the adoption of a new resin as the resin installed in the resin cylinder 51 in FIG. Fourth, the resin cylinders 51, 52, and 53 are connected to each other through a pipe through which water flows, and the first to third procedures are performed by changing the flow path.
[0041]
By this series of operations, it is possible to obtain ion-exchanged water continuously and stably over a long period of time. Further, in this system, when one of the resins is replaced with a new resin, initial elution occurs from the new resin, so that the replacement is performed with a resin other than the most downstream resin.
[0042]
Embodiment 2. FIG.
When the system arranged as shown in FIG. 6 is used, the pipes 123 and 124 connecting the resin cylinders 51 and 53 become long. For this reason, when the valve 39 is closed, a water pool is generated inside the pipes 123 and 124 before and after the valve 39. The amount of this water pool is larger than other pipes. In view of this, the present embodiment proposes a piping arrangement method that suppresses the amount of water pools.
[0043]
FIG. 22 is an example of a conceptual plan view of a piping arrangement method. In FIG. 22, three resin cylinders 54, 55, 56 are located at the apexes of a triangle, and pipes 127, 128, 129 along the sides of the triangles are connected via the valves 40, 41, 42 to the resin cylinders 54, 55 and 56 are connected to each other. Further, pipes 144, 145, and 146 are arranged from the lower portions of the resin cylinders 54, 55, and 56 toward the center of gravity of the triangle, and are connected at a connection point 111 near the center of gravity. And the valve | bulb 43, 44, 45 is attached to the center vicinity of each of those piping. A drain pipe 126 is attached to the connecting portion 111.
[0044]
Similarly, pipes 147, 148, 149 are arranged from the upper portions of the resin tubes 54, 55, 56 toward the vicinity of the center of gravity of the triangle, and are connected at the connecting portion 112 near the center of gravity. Valves 46, 47, and 48 are attached near the center of each of these pipes. In addition, a water intake pipe 125 is attached to the connecting portion 112.
[0045]
By adopting this system, in addition to the effects obtained in the first embodiment, the piping is shortened as a whole and the water pool portion is reduced, so that contamination in the piping can be prevented.
[0046]
Embodiment 3 FIG.
In the present embodiment, a system as shown in FIG. 23 is considered with respect to the system shown in the first embodiment. FIG. 23 is a conceptual plan view of the system considered in the present embodiment. In FIG. 23, valves 91a and 91b are attached to both ends of a pipe 131, and a water draining open / close valve 151a (hereinafter referred to as a “water drain valve”) is provided near the valve 91b in the vicinity of the valve 91a. The drain valve 151b is attached to the valve 91a side.
[0047]
Similarly, valves 92a to 99a and 92b to 99b and drain valves 152a to 159a and 152b to 159b are attached to both ends of the pipes 132 to 139, respectively.
[0048]
In FIG. 23, the case where a flow path is comprised by piping 132,134,136,137 is shown. Valves 92a, 92b, 94a, 94b, 96a, 96b, 97a, and 97b attached to the pipes 132, 134, 136, and 137 serving as flow paths are opened, and drain valves 152a, 152b, 154a, 154b, and 156a are opened. 156b, 157a, 157b are closed.
[0049]
On the other hand, the valves 91a, 91b, 93a, 93b, 95a, 95b, 98a, 98b, 99a, 99b attached to the pipes 131, 133, 135, 138, 139 that do not become flow paths are closed, and the water drain valve 151a. , 151b, 153a, 153b, 155a, 155b, 158a, 158b, 159a, 159b are opened.
[0050]
By opening the drain valves 151a, 151b, 153a, 153b, 155a, 155b, 158a, 158b, 159a, and 159b in this way, water pools generated in the pipes 131, 133, 135, 138, and 139 that do not become flow paths are formed. It can be easily removed and dried. And the inside of piping can be ventilated or sealed with clean air or nitrogen gas using these drain valves.
[0051]
By adopting this system, in addition to the effects obtained in the first embodiment, it is possible to remove a water pool in the pipe that does not become a flow path and prevent contamination in the pipe.
[0052]
Embodiment 4 FIG.
FIG. 24 is a conceptual cross-sectional view of a system when a cartridge type resin is used. In this system, three cartridge-type resins 80 are vertically stacked (stacked) inside the resin cylinder 57, and the same effect as in the first embodiment can be obtained.
[0053]
A resin cartridge arrangement method for obtaining the same effect as in the first embodiment will be described with reference to FIGS. 25 to 27 are conceptual cross-sectional views showing the state of the resin cartridge. First, as shown in FIG. 25, the pretreated resin cartridges 82, 83, and 84 are stacked vertically, and water 11 containing impurity ions is introduced from the top of the resin cylinder 57. At this time, when the water 11 passes through the resin cartridges 82, 83, 84, the water 12 from which the impurity ions have been removed is obtained. The state 74 corresponds to the state of the resin installed in the resin cylinder in FIG.
[0054]
Among the resin cartridges installed in the resin cylinder 57, the ion exchange is remarkably performed in the upper stage. When the upper resin cartridge does not flow, ion exchange in the middle and lower resin cartridges is not as remarkable as in the upper resin cartridge. Therefore, at present, it is considered that the upper resin cartridge 82 flows first.
[0055]
Therefore, after one cycle has elapsed, the resin cartridge 82 located in the upper stage is replaced with a new resin cartridge 85 and arranged in the middle stage as shown in FIG. Then, the resin cartridge 83 located in the middle stage is arranged in the lower stage, and the resin cartridge 84 located in the lower stage is arranged in the upper stage. By changing the stacking order, the state of the passing water is as follows.
[0056]
That is, the water that has passed through the resin cartridge 84 is water from which impurity ions have been removed, thereby washing the initial elution impurities of the new resin cartridge 85. Then, the water containing the initial eluting impurities generated by the washing passes through the resin cartridge 83, so that it becomes water containing no impurity ions again.
[0057]
Hereinafter, by performing the same operation every time one cycle has passed (FIG. 27), even in the cartridge type system, by changing the stacking order, the high purity can be stably and continuously as in the first embodiment. Pure water can be supplied. Further, since the system is simplified, the valve operation for changing the flow path is not required, and the operation is simplified.
[0058]
In this case, as in the first embodiment, the same effect as described above can be obtained by using a new resin cartridge that has not been pretreated instead of the resin that has been pretreated in the initial stage of the system (FIG. 25). can get.
[0059]
Embodiment 5 FIG.
There is no need to continuously supply high-purity pure water over a long period of time, even if it is only for a short period, only for the stable supply of high-purity pure water and effective use of resin. Think. FIG. 28 is a conceptual cross-sectional view of a system having only two resin cylinders. In FIG. 28, resin cylinders 58 and 59 in which the resin 1 is installed are connected by a pipe 141. A water inlet pipe 142 is connected to the resin cylinder 58, and a water inlet pipe 143 is connected to the resin cylinder 59.
[0060]
Therefore, the effect when this system is used will be described with reference to FIGS. FIG. 29 to FIG. 34 are conceptual cross-sectional views of the resin state in this system. First, as shown in FIG. 29, the pretreated resin is placed in the resin cylinders 58 and 59. Among the resins installed in the resin cylinders 58 and 59, the ion exchange is remarkably performed toward the upstream. And when upstream resin does not flow through, ion exchange in downstream resin is not so remarkable as upstream resin. Therefore, at present, it is considered that the resin installed in the upstream resin cylinder 58 flows first.
[0061]
Therefore, after one cycle has elapsed (FIG. 30), the resin in the upstream resin cylinder 58 is replaced with a new resin (FIG. 31). At this time, since the resin which does not flow through is installed in the downstream resin cylinder 59, it is possible to remove the initial eluting impurities generated from the new resin, and to obtain water 12 containing no impurity ions. .
[0062]
Further, after one cycle, the resin in the upstream resin cylinder 58 is replaced with a new resin (FIGS. 32 and 33). Hereinafter, by performing the same operation for each cycle, high-purity pure water can be stably obtained for the above reasons. At this time, there is no need to change the flow path, and since new resin is constantly installed upstream, no valve operation is required.
[0063]
Further, since there is a resin that does not flow downstream with respect to the resin installed upstream, it is not necessary to consider a margin, and the resin can be used effectively. Then, after several cycles, the tip of the resin ion exchange zone curve 103 of the resin tube 59 approaches the flow-through point 105 as shown in FIG. 34, and it must be exchanged with a certain margin. However, until this time, pure water with high purity can be supplied stably.
[0064]
The above contents can also be grasped as follows. The system has resin cylinders 58 and 59 each having a resin through which water sequentially flows, and the resin can be changed for each of the resin cylinders. When the resin is exchanged, the resin installed in the most downstream resin cylinder 59 is left as it is, and the resin installed in the resin cylinder 58, which is other resin, is replaced with a new resin.
[0065]
That is, when one of the resins is replaced with a new resin, the replacement is performed with a resin other than the most downstream resin. By this series of operations, in the system, the most downstream resin removes the initial elution impurities that flow out from the new resin, thereby effectively using the resin and stably obtaining ion-exchanged water.
[0066]
Embodiment 6 FIG.
FIG. 35 is a conceptual cross-sectional view of a system in which the resin is a cartridge type. In this system, two cartridge-type resins 81 are vertically stacked (stacked) inside the resin cylinder 64, and the same effects as in the fifth embodiment can be obtained.
[0067]
A resin cartridge arranging method for obtaining the same effect as in the fifth embodiment will be described with reference to FIGS. 36 to 39 are conceptual cross-sectional views showing the state of the resin cartridge.
[0068]
First, as shown in FIG. 36, the pretreated resin cartridges 87 and 88 are stacked vertically, and water 11 containing impurity ions is introduced from the upper part of the resin cylinder 64. Then, when the water 11 passes through the resin cartridges 87 and 88, the water 12 from which the impurity ions have been removed is obtained. The state 114 corresponds to the state of the resin installed in the resin cylinders 58 and 59 in FIG.
[0069]
Among the resin cartridges installed in the resin cylinder 64, the ion exchange is remarkably performed in the upper stage. When the upper resin cartridge does not flow through, ion exchange in the lower resin cartridge is not as remarkable as the upper resin cartridge. Therefore, at present, it is considered that the upper resin cartridge 82 flows first.
[0070]
Therefore, as shown in FIG. 37, after one cycle has elapsed, the resin cartridge 87 located in the upper stage is replaced with a new resin cartridge 89. The arrangement at this time remains the same, with the resin cartridge 89 on the top and the resin cartridge 88 on the bottom. The resin state 116 corresponds to the state of the resin installed in the resin cylinder 59 in FIG. 30, and the tip of the ion exchange zone curve is closer to the reflux point than the resin state 114, but an ion-exchangeable region remains. It is in a state.
[0071]
The state of the passing water at this time is as follows. That is, when the water 11 passes through the resin cartridge 89, the initial elution impurities are washed, so that the water that has passed is water containing the initial elution impurities. However, when this water passes through the resin cartridge 88, it becomes water 12 containing no impurity ions again.
[0072]
Thereafter, the same operation is performed every one cycle (FIG. 38), and in this cartridge type system as well as in the fifth embodiment until the replacement time of the lower resin cartridge as shown in FIG. 39. High purity pure water can be supplied stably and continuously. The resin state 117 corresponds to the resin state installed in the resin tube 59 in FIG.
[0073]
Also, the resin state 118 corresponds to the state where the replacement time has been reached, that is, the state of the resin installed in the resin cylinder 59 of FIG. 34, and the resin state 119 is a state where the water 11 has flowed through, ie, the resin of FIG. This corresponds to the state of the resin installed in the cylinder 58.
[0074]
In this case, as in the fifth embodiment, the same effect as described above can be obtained by using a new resin cartridge that has not been pretreated instead of the resin that has been pretreated at the initial stage of the system (FIG. 36). can get.
[0075]
【The invention's effect】
When the ion exchange method according to the present invention is used, the most downstream ion exchanger removes the initial elution impurities flowing out from the new ion exchange. Thereby, it is possible to obtain an effect that the ion exchanger can be effectively used and the ion-exchanged fluid can be stably supplied.
[0076]
When the first ion exchange system according to the present invention is used, since the ion exchangers can be individually exchanged, it is possible to exchange other than the most downstream ion exchanger with a new ion exchanger. At this time, the initial elution impurities flowing out from the new ion exchanger are removed by the most downstream ion exchanger. Thereby, it is possible to obtain an effect that the ion exchanger can be effectively used and the ion-exchanged fluid can be stably supplied.
[0077]
When the second ion exchange system according to the present invention is used, a part other than the most downstream ion exchanger can be exchanged with a new ion exchanger. At this time, the initial elution impurities flowing out from the new ion exchanger are removed by the most downstream ion exchanger. Thereby, it is possible to obtain an effect that the ion exchanger can be effectively used and the ion-exchanged fluid can be stably supplied. In addition, by shortening the pipe, it is possible to prevent fluid from accumulating in the pipe and being contaminated.
[0078]
When the third ion exchange system according to the present invention is used, a part other than the most downstream ion exchanger can be exchanged with a new ion exchanger. At this time, the initial elution impurities flowing out from the new ion exchanger are removed by the most downstream ion exchanger. Thereby, it is possible to obtain an effect that the ion exchanger can be effectively used and the ion-exchanged fluid can be stably supplied. In addition, by removing the fluid from the pipe, it is possible to prevent the fluid from being accumulated in the pipe and being contaminated.
[0079]
When the fourth ion exchange system according to the present invention is used, the state of the ion exchanger located in the uppermost stream can be monitored by a pure water quality monitor, and the uppermost ion exchanger is changed to a new ion exchanger. Know when to exchange. Thereby, it is possible to obtain an effect that the ion exchanger can be effectively used and the ion-exchanged fluid can be stably supplied.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view conceptually showing the state of resin in water.
FIG. 2 is a cross-sectional view conceptually showing the movement of initial elution impurities generated from a new resin.
FIG. 3 is a cross-sectional view conceptually showing a state in a new resin during cleaning.
FIG. 4 is a cross-sectional view conceptually showing a state in a new resin during cleaning.
FIG. 5 is a cross-sectional view conceptually showing a state in a new resin during cleaning.
FIG. 6 is a plan view conceptually showing the structure of a pure water production system.
FIG. 7 is a plan view conceptually showing the structure of a pure water production system.
FIG. 8 is a plan view conceptually showing the structure of a pure water production system.
FIG. 9 is a plan view conceptually showing the structure of a pure water production system.
FIG. 10 is a plan view conceptually showing a resin state and a flow path immediately after resin replacement.
FIG. 11 is a plan view conceptually showing a resin state and a flow path immediately after resin replacement.
FIG. 12 is a plan view conceptually showing a resin state and a flow path immediately after resin replacement.
FIG. 13 is a plan view conceptually showing a resin state and a flow path immediately after resin replacement.
FIG. 14 is a cross-sectional view conceptually showing the state of the resin, showing the resin cylinders in the order of water flow.
FIG. 15 is a cross-sectional view conceptually showing the state of the resin, showing the resin cylinders in the order of water flow.
FIG. 16 is a cross-sectional view conceptually showing the state of the resin, showing the resin cylinders in the order of water flow.
FIG. 17 is a cross-sectional view conceptually showing the state of the resin, showing the resin cylinders in the order of water flow.
FIG. 18 is a cross-sectional view conceptually showing the state of the resin, showing the resin cylinders in the order of water flow.
FIG. 19 is a cross-sectional view conceptually showing the state of the resin, showing the resin cylinders in the order of water flow.
FIG. 20 is a cross-sectional view conceptually showing the state of the resin, showing the resin cylinders in the order of water flow.
FIG. 21 is a plan view conceptually showing the system when a pure water quality monitor is attached.
FIG. 22 is a plan view conceptually showing a system in which resin cylinders are arranged in a triangle.
FIG. 23 is a plan view conceptually showing a system in which a valve for draining water is attached to a pipe.
FIG. 24 is a plan view conceptually showing a system using a cartridge type resin.
FIG. 25 is a sectional view conceptually showing a state of the resin cartridge.
FIG. 26 is a sectional view conceptually showing a state of the resin cartridge.
FIG. 27 is a sectional view conceptually showing the state of the resin cartridge.
FIG. 28 is a sectional view conceptually showing a system having only two resin cylinders.
FIG. 29 is a cross-sectional view conceptually showing the state of a resin.
FIG. 30 is a cross-sectional view conceptually showing a state of a resin.
FIG. 31 is a sectional view conceptually showing a state of a resin.
FIG. 32 is a cross-sectional view conceptually showing the state of the resin.
FIG. 33 is a sectional view conceptually showing a state of a resin.
FIG. 34 is a cross-sectional view conceptually showing the state of the resin.
FIG. 35 is a sectional view conceptually showing a system having only two resin cartridges in a resin cylinder.
FIG. 36 is a sectional view conceptually showing the state of the resin cartridge.
FIG. 37 is a sectional view conceptually showing the state of the resin cartridge.
FIG. 38 is a sectional view conceptually showing the state of the resin cartridge.
FIG. 39 is a sectional view conceptually showing the state of the resin cartridge.
[Explanation of symbols]
1 resin, 2 resin cylinder, 3 new resin, 5-7 pure water quality monitor, 31-48, 91a-99a, 91b-99b valve, 51-59, 61-64 resin cylinder, 80, 81 resin cartridge, 125 -129, 131-139, 141-149 Piping, 151a-159a, 151b-159b Valve for drainage.

Claims (8)

A method of using an ion exchange system comprising a plurality of ion exchangers through which fluid flows sequentially, wherein each of the ion exchangers can be exchanged,
An ion exchange method, in which one ion exchanger is exchanged with an ion exchanger other than the most downstream ion exchanger when the ion exchanger is exchanged with a new ion exchanger. The ion exchange system includes at least three of the ion exchangers, and when exchanging the ion exchangers,
Adopting the most downstream ion exchanger before the exchange as the most upstream ion exchanger after the exchange,
The ion exchanger before the exchange other than the ion exchanger at the most upstream before the exchange and the ion exchanger at the most downstream before the exchange, and the ion exchanger located at the downstream side. Adopted as
The ion exchange method according to claim 1, wherein a new ion exchanger is adopted as the second ion exchanger from the uppermost stream after the exchange. The ion exchangers are connected to each other through piping through which the fluid flows,
The ion exchange method according to claim 2, wherein the exchange is performed by changing a flow path of the fluid with respect to the ion exchanger. The ion exchangers are stacked and installed,
The ion exchange method according to claim 2, wherein the exchange is performed by changing a stacking order of the ion exchangers. A plurality of ion exchangers through which fluid flows sequentially,
The ion exchange system in which the plurality of ion exchangers are stacked on each other and can be individually exchanged. Three ion exchangers through which the fluid flows,
A plurality of pipes that connect the three ion exchangers and flow the fluid;
An ion exchange system in which the ion exchanger is arranged at a vertex of a triangle. Three ion exchangers through which the fluid flows,
A plurality of pipes that connect the three ion exchangers and flow the fluid;
An ion exchange system, wherein at least one of the pipes is provided with a valve for draining fluid. A plurality of ion exchangers through which fluids flow sequentially;
A plurality of pipes that connect the ion exchanger and flow the fluid;
An ion exchange system, wherein a pure water quality monitor is connected to at least one of the pipes.

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