JP2005005106A - Plasma treatment device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To improve treatment efficiency in a plasma treatment device in which a processed object is passed between a first electrode and a second electrode. <P>SOLUTION: The first electrode 11 of the plasma treatment device M1 is constituted of a plurality of partial electrodes 11S, and these partial electrodes 11S are arranged in a row so as to be along a feed direction to the processed object W. Between the adjacent partial electrodes 11S and on the outsides of the adjacent partial electrodes 11S of both ends in an arrangement direction of the partial electrodes 11S, a blow means 31 of a treatment gas to a plasma treatment space 1a and a suction means 51 of the gas from the plasma treatment space are alternately arranged so as to be along the row direction. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a plasma processing apparatus that performs a plasma surface treatment such as cleaning, film formation, ashing, and etching through a processing object through a plasma processing space formed between a pair of electrodes.
[0002]
[Prior art]
Generally, in a plasma processing apparatus, an object to be processed is arranged between a pair of electrodes to perform a plasma treatment between the electrodes, and an object to be processed is arranged outside the electrodes, and a plasma gas is applied between the electrodes. There are some which perform processing by blowing to a processed material.
[0003]
As an apparatus classified into the former, for example, in the device described in Patent Document 1, one electrode is divided into a plurality of partial electrodes, and these partial electrodes are arranged in one direction. Along the alignment direction, an object to be processed is passed between a pair of electrodes, that is, between a partial electrode of one electrode and the other electrode, and a processing gas is passed between the pair of electrodes in the same direction. It has come to pass.
[0004]
Moreover, in the thing of patent document 2, the whole electrode structure is accommodated in a chamber, and process gas is introduce | transduced into this chamber. As a result, the processing gas can enter between the partial electrode of the one electrode and the other electrode through a gap between the adjacent partial electrodes of the one electrode.
In addition, there exists patent document 3 etc. which have the electrode structure divided | segmented into the some partial electrode.
[0005]
[Patent Document 1]
Japanese Unexamined Patent Publication No. 2000-140623 (first page, FIG. 1)
[Patent Document 2]
JP 2001-35694 A (first page, FIG. 1)
[Patent Document 3]
JP 2002-94221 A (5th page, FIG. 6)
[0006]
[Problems to be solved by the invention]
Although the thing of patent document 1 can obtain sufficient activity in the partial electrode of an upstream side along the flow direction of a processing gas, a processing gas once reacts in the partial electrode of a downstream side. It becomes only what was used, and even if energy is reintroduced into this, sufficient activity cannot be obtained. Therefore, the processing efficiency is not sufficient.
The thing of patent document 2 cannot make it easy to make process gas enter between electrodes reliably, and process efficiency is not enough similarly.
[0007]
[Means for Solving the Problems]
In order to solve the above-described problems, the present invention provides a plasma processing apparatus that includes first and second electrodes, and in which a workpiece is passed through a plasma processing space between these electrodes. Consists of a plurality of partial electrodes arranged along the feed direction of the processed material, and corresponds to the space between adjacent partial electrodes and the outside of the partial electrodes at both ends in the alignment direction to the plasma processing space. The discharge ports of the processing gas blowing means and the suction ports of the gas suction means from the plasma processing space are alternately arranged along the arrangement direction.
[0008]
Thereby, between any partial electrode of the first electrode and the second electrode, only a fresh process gas can be flowed to obtain a large degree of activity, and a process gas that cannot obtain sufficient activity flows. You can keep it from going on. Thereby, the efficiency of the plasma surface treatment can be increased. Also, the processing gas can be supplied to and discharged from the adjacent partial electrodes by one processing gas blowing means or gas suction means, and the configuration can be made compact.
[0009]
Here, as a means (feed mechanism) for passing the object to be processed into the plasma processing space between the electrodes, in addition to the means for moving the object to be processed, the plasma processing space is moved by moving at least one of the first and second electrodes. Something to let you be included. The “feed direction of the workpiece” refers to the relative movement direction of the workpiece relative to the plasma processing space formed between the first and second electrodes.
[0010]
The width of each partial electrode along the arrangement direction is desirably within a range in which the activity of the processing gas can be maintained as desired even on the downstream side of the plasma processing space formed by the partial electrode and abnormal discharge can be suppressed. . Specifically, it is desirable that it is 50 mm or less and 0.1 mm or more. If it exceeds 50 mm, it will be difficult to maintain the activity and the processing efficiency will be reduced, and if it is less than 0.1 mm, abnormal discharge will easily occur. It is more desirable that it is 40 mm or less and 10 mm or more. The width of one partial electrode may be different from the width of another partial electrode.
[0011]
It is desirable that a gap is formed between adjacent partial electrodes, and this gap is provided as a blow-out port of the processing gas blow-out means or a suction port of the gas suction means.
As a result, the configuration can be simplified. In the case where the partial electrode is incorporated in a subunit described later, the gap is formed between adjacent subunits.
[0012]
A unit of the first electrode is configured by connecting subunits configured for each partial electrode to each other, and the processing gas blowing means or the gas suction means is opposite to the second electrode side of the adjacent subunit. It is desirable that they are arranged so as to straddle between the backs of each other.
Thereby, the blow-out path of the processing gas blow-out means or the suction path of the gas suction means can be reliably communicated with the gap as the blow-out opening or the suction opening.
[0013]
It is desirable that the first electrode unit includes a support frame that detachably supports the subunit, and the processing gas blowing means or gas suction means is detachably attached to the subunit.
As a result, according to the size of the object to be processed and the content of processing, the subunits, processing gas blowing means and gas suction means can be freely rearranged, replaced, increased or decreased, and the degree of freedom of configuration change can be increased. It can be increased and maintenance becomes easy.
[0014]
It is desirable that the subunits are supported on the support frame so that the position of the subunits can be adjusted in the alignment direction, and the position adjustment can be permitted by the processing gas blowing means and the gas suction means.
As a result, adjacent subunits can be moved closer to and away from each other, the width of the gap between the subunits, that is, the opening degree of the outlet / suction port can be adjusted, and the momentum and flow rate of the processing gas can be adjusted accordingly. Can do.
[0015]
The processing gas blowing means or gas suction means may have a long hole whose long axis is directed in the arrangement direction, and may be joined to the subunit by a bolt passed through the long hole.
This makes it possible to easily adjust the position of the subunits and thus the width of the gap between adjacent subunits. Further, the adjacent subunits can be fixed via the processing gas blowing means or the gas suction means by bolting the processing gas blowing means or the gas suction means.
[0016]
The processing gas blowing means or the gas suction means may not be joined to the subunit with a bolt or the like, for example, may be simply placed on the subunit.
The processing gas blowing means or gas suction means may be provided with an insertion piece that is inserted into the gap and releasably fixed to the subunit. This makes it possible to reliably adjust the width of the gap between adjacent subunits. Further, the adjacent subunits can be fixed to each other through the processing gas blowing means or the gas suction means by fixing the insertion piece.
The insertion piece is preferably disposed at an end portion along a direction orthogonal to both the arrangement direction and the facing direction of the second electrode in the gap. Thereby, it is possible to prevent leakage of the processing gas from the end of the gap or suction of the outside atmosphere.
[0017]
The processing gas conditions (type of processing gas, component ratio, blowing suction flow rate, etc.) may be set independently for each processing gas blowing means or gas suction means. Thereby, a different process can be performed for every partial electrode, or a process speed can be adjusted.
The partial electrode may be temperature-controlled (heated or cooled). In this case, the temperature control temperature may be set independently for each partial electrode. Thereby, processing speed can be adjusted for every partial electrode. The set temperature is preferably 20 ° C to 300 ° C. If it is below 20 ° C, there is a possibility of condensation, and if it is above 300 ° C, design and management become difficult.
[0018]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
FIG. 1 schematically shows an atmospheric pressure plasma processing apparatus M1 according to the first embodiment of the present invention. The apparatus M <b> 1 includes electrodes 11 and 21 that are paired up and down, a gas supply / discharge mechanism 30, and a feed mechanism 60. An electric field applying means 40 is connected to the upper electric field applying electrode 11 (first electrode) via a feeder line 41, and the lower ground electrode 21 (second electrode) is grounded via a ground line 42. Yes. The electric field applying means 40 applies, for example, a pulsed voltage to the electric field applying electrode 11. As a result, a substantially normal pressure plasma processing space 1 a is formed between the electrodes 11 and 21. A processing gas is introduced into the plasma processing space 1a by the gas supply / exhaust mechanism 30 and is converted into plasma. A workpiece W (object to be processed) is placed on the large flat ground electrode 21. Then, the electric field applying electrode 11 is horizontally moved back and forth so as to scan the workpiece W by the feed mechanism 60. (That is, the workpiece W is passed through the plasma processing space 1a.) Thereby, the plasma surface treatment of the workpiece W is performed. Of course, the feed mechanism may move the workpiece W.
In addition, the substantially normal pressure (pressure near atmospheric pressure) in the present invention is 1.333 × 10. ⁴ ~ 10.664 × 10 ⁴ Says the range of Pa. Especially 9.331 × 10 ⁴ ~ 10.397 × 10 ⁴ The range of Pa is preferable because pressure adjustment is easy and the apparatus configuration is simple.
[0019]
As shown in FIGS. 2 and 3, the electric field application electrode 11 of the atmospheric pressure plasma processing apparatus M <b> 1 is incorporated in the unit 10. The electric field applying electrode unit 10 includes four (a plurality of) electrode subunits 10S arranged in the front-rear direction (left and right in FIG. 2, the same direction as the feed direction by the feed mechanism 60) and the subunits 10S at both front and rear ends. A pair of pseudo subunits 19 arranged on the outside and a support frame 70 that supports these subunits 10S and 19 are provided.
[0020]
The electrode 11 in the electric field applying electrode unit 10 is divided into four (plural) partial electrodes 11S, and each partial electrode 11S is incorporated in a corresponding subunit 10S. That is, as shown in FIGS. 3 and 4, each subunit 10 </ b> S has the partial electrode 11 </ b> S and an insulating resin holder 12 that holds the partial electrode 11 </ b> S. It extends long in the direction. The partial electrode 11S is formed in an elongated plate shape on the left and right by a conductive metal such as stainless steel or aluminum. The width along the front-rear direction of the partial electrode 11S is desirably 0.1 mm to 50 mm. More desirably, the thickness is 10 mm to 40 mm.
[0021]
Note that the front and rear partial electrodes 11S are relatively wide, and the inner two partial electrodes 11S are relatively narrow. As a result, the subunits 10S at the front and rear ends are relatively wide, and the inner two subunits 10S are relatively narrow.
[0022]
A gap 10a is formed between the adjacent subunits 10S and 19 respectively.
The pseudo subunit 19 is entirely made of resin and has the same external configuration as the subunit 10S.
[0023]
The feeder line 41 from the electric field applying means 40 is branched and connected to the partial electrode 11S of each subunit 10S (see FIG. 1).
[0024]
In each subunit 10S, the lower surface of the partial electrode 11S is covered with a dielectric plate 13 (solid dielectric layer) made of, for example, quartz. The dielectric plate 13 is separated from the partial electrode 11 </ b> S, and is supported by side plates 14 on the front and rear side surfaces of the holder 12.
[0025]
A support structure for the dielectric plate 13 will be described.
As shown in FIG. 9, the front and rear edges of the dielectric plate 13 are pointed like a knife edge. The knife edge portion 13 c is inserted and fixed in the V groove 14 c at the lower end portion of the side plate 14.
[0026]
The side plate 14 can be vertically adjusted with respect to the holder 12. That is, as shown in FIGS. 7 and 9, the longitudinal projections 12 a that are long in the vertical direction are provided on the front and rear side surfaces of the holder 12. On the other hand, as shown in FIG. 8 and FIG. 9, vertically long grooves 14 a are formed on the inner surface of the side plate 14. A vertical protrusion 12a is inserted into the vertical groove 14a so as to be slidable up and down. As a result, the side plate 14 can slide up and down with respect to the holder 12.
[0027]
The dielectric plate 13 can be pressed against the partial electrode 11S by pushing up the side plate 14 (the phantom line in FIG. 9). Thereby, it is possible to prevent an arc from being generated due to a gap between the dielectric plate 13 and the partial electrode 11S. Alternatively, a conductor layer such as an aluminum foil may be pasted on the upper surface of the dielectric plate 13, and this conductor layer may be pressed against the partial electrode 11S.
[0028]
As shown in FIGS. 8 and 9, the side plate 14 is formed with an elongated bolt insertion hole 14 b extending vertically. A bolt 91 passed through the hole 14 b is screwed into the bolt hole 12 b of the holder 12. Thus, the side plate 14 is fixed to the holder 12 in a state where the dielectric plate 13 is pressed against the partial electrode 11S.
In addition, the upper and lower edges of the side plate 14 are subjected to R for smooth gas flow, and the lower end surface is flush with the lower surface of the dielectric plate 13.
[0029]
As shown in FIGS. 4 and 10, bottom holders 16 are attached to the lower ends of the left and right ends of the holder 12 with bolts 94. The bottom end surface of the bottom holder 16 protrudes below the set dielectric plate 13. At the lower end of the bottom holder 16, a convex piece 16 a that protrudes toward the left and right inside is formed. The convex piece 16a sandwiches and supports the dielectric plate 13 in cooperation with the partial electrode 11S.
[0030]
As shown in FIG. 10, the gap between the lower end protruding portion of the bottom holder 16 and the solid dielectric layer 23 coated on the upper surface of the ground electrode 21 by thermal spraying is very narrow. As a result, it is possible to prevent the outside air from entering the plasma processing space 1a and the processing gas in the plasma processing space 1a from leaking outside.
[0031]
Next, the support frame 70 of the electric field applying electrode unit 10 will be described.
As shown in FIGS. 2 and 3, the support frame 70 has a pair of upper and lower frame members 71, 72 extending in the front-rear direction at the left and right ends of the electric field applying electrode unit 10. The ends of the upper and lower frame members 71 and 72 are connected by a short prismatic end block 73.
[0032]
Intermediate portions of the left and right upper frame members 71 are connected by a beam member 79 extending in the left-right direction. This beam member 79 is moved back and forth by the feed mechanism 60 so that the electric field applying electrode unit 10 is fed back and forth.
[0033]
The lower frame member 72 penetrates the six subunits 10S and 19 in a skewered manner. Thus, the subunits 10S and 19 are supported by the frame 70.
More specifically, as shown in FIGS. 4 and 5, end caps 15 are fixed by bolts 92 to the left and right end surfaces of the holder 12 of each subunit 10 </ b> S. Recesses 12d and 15d are formed on the mating surfaces of the holder 12 and the end cap 15, respectively, and a frame member 72 is passed through a through hole 11d defined by the recesses 12d and 15d.
The left and right ends of the pseudo subunit 19 are similarly configured.
[0034]
By loosening the bolt 92, the position of the subunits 10S and 19 can be adjusted back and forth along the frame member 72. As a result, the gap 10a between the adjacent subunits 10S and 19 can be enlarged or reduced. Furthermore, by removing the end cap 15, the subunits 10 </ b> S and 19 can be detached from the frame 70.
[0035]
Next, the gas supply / discharge mechanism 30 of the atmospheric pressure plasma processing apparatus M1 will be described.
As shown in FIG. 1, the gas supply / discharge mechanism 30 of the atmospheric pressure plasma processing apparatus M1 includes two types of units 31, 51 attached to the electric field applying electrode unit 10, a processing gas source 3, and an exhaust pump 5. I have. A flexible gas supply pipe 3a extends from the processing gas source 3 and branches to be connected to three (a plurality of) blowing units 31 (processing gas blowing means). Flexible exhaust pipes 5a extend from two (plurality) of suction units 51 (gas suction means), and these join together to connect to the exhaust pump 5.
[0036]
As shown in FIGS. 2 and 3, the blowout unit 31 and the suction unit 51 are arranged in the front-rear direction so as to correspond to the gap 10a on the upper side of the subunits 10S and 19 (the back part opposite to the ground electrode 21 side). Alternatingly arranged. Each blowing unit 31, 51 straddles between the upper surfaces of adjacent subunits 10S, 19.
[0037]
That is, the blowing units 31 at both ends of the three blowing units 31 are arranged so as to straddle between the upper surfaces of the wide subunit 10S and the pseudo subunit 19 at both front and rear ends. Further, the central blowing unit 31 is arranged so as to straddle between the upper surfaces of the two narrow narrow subunits 10S. The gaps 10a corresponding to these blowout units 31 are denoted by reference numerals “10a”. ₁ ".
[0038]
The two suction units 51 are arranged so as to straddle between the upper surfaces of the wide subunit 10S at both front and rear ends and the adjacent narrow subunit 10S. The gaps 10a corresponding to these suction units 51 are denoted by reference numerals “10a”. ₂ ".
[0039]
A specific structure of each blowing unit 31 will be described.
As shown in FIGS. 3, 5, and 9, the blowout unit 31 includes double pipes 33 and 34 that extend left and right, and a casing 32 that accommodates the double pipes 33 and 34. By connecting the gas supply pipe 3a to, for example, the right end (one end) of the inner pipe 33, the processing gas from the processing gas source 3 is introduced into the pipe 33 through the pipe 3a. Yes. In the upper part of the inner pipe 33, a large number of spot-shaped small holes 33a are formed at short intervals along the longitudinal direction. The processing gas enters the space between the inner and outer pipes 33 and 34 through these small holes 33a. The inner pipe 33 is eccentric to the upper side with respect to the outer pipe 34. Thereby, the space between the inner and outer pipes 33 and 34 is narrower on the upper side and wider on the lower side. In this space, the processing gas flows from top to bottom. Thus, the processing gas is made uniform in the left-right longitudinal direction. A slit 34 a is formed on the lower side of the outer pipe 34 over substantially the entire length. This slit 34a corresponds to the corresponding gap 10a. ₁ It is connected to. As a result, the processing gas flows into the slit 34a and the corresponding gap 10a. ₁ And is blown out to the plasma processing space 1a.
Blowout unit compatible gap 10a ₁ Is provided as “the outlet of the processing gas outlet”.
[0040]
Next, a specific structure of the suction unit 51 will be described.
As shown in FIGS. 3, 6, and 9, the suction unit 51 includes a casing 52 that extends left and right, and a partition wall 53 that partitions the inside of the casing 52 into two upper and lower chambers 52 a and 52 b. The bottom plate 54 of the casing 52 is formed with a slit 54a that extends over substantially the entire length. The lower chamber 52b is connected to the corresponding gap 10a through the slit 54a. ₂ It is connected to. A plurality of circular holes 53a are formed in the partition wall 53 at intervals on the left and right. The upper and lower chambers 52a and 52b are connected through the circular hole 53a. At the center of the top plate of the casing 52, a discharge cylinder 54 connected to the upper chamber 52a is provided. An exhaust pipe 5 a to the exhaust pump 5 is connected to the discharge cylinder 54. By driving the exhaust pump 5, the processed gas (including by-products generated by the processing) in the plasma processing space 1a can be uniformly treated along the longitudinal direction. ₂ Then, after sequentially passing through the slit 54a, the lower chamber 52b, the circular hole 53a, the upper chamber 52a, and the discharge cylinder 54 of the unit 51, the air is exhausted from the exhaust pump 5 through the pipe 5a.
Suction unit compatible gap 10a ₂ Is provided as “a suction port of the gas suction means”.
[0041]
A structure for attaching the blowing units 31, 51 to the subunits 10S, 19 will be described. The units 31 and 51 are provided in the subunits 10S and 19 so that their front and rear positions can be adjusted, removed, and rearranged.
More specifically, as shown in FIGS. 2 and 9, bolt holes 12e and 19e are formed in the upper surface of the holder 12 of the electrode subunit 10S and the upper surface of the pseudo subunit 19, respectively. On the other hand, insertion holes 32 a are formed in the bottom flanges on both front and rear sides of the casing 32 of the blowout unit 31. A bolt 93 passed through the insertion hole 32a is screwed into the bolt holes 12e and 19e. As a result, the adjacent subunits 10S and 19 are detachably fixed via the blowing unit 31. Further, the insertion hole 32a is a long hole with the long axis directed in the front-rear direction. As a result, the front and rear positions of the subunits 10S and 19 can be adjusted. As a result, the interval between the adjacent subunits 10S and 19 (gap 10a ₁ )) Can be adjusted.
[0042]
Furthermore, the bolt hole 12e on the upper surface of the subunit 10S is provided at a position that is symmetrical in the front-rear direction with respect to the side on which the blowing unit 31 is attached. As a result, as shown by the phantom line in FIG. 9, the blowing unit 31 can be attached to the arrangement position of the suction unit 51 instead.
[0043]
As shown in FIGS. 3 and 4, the left and right ends of the blowout unit 31 are sandwiched between the upper frame member 71 and the subunits 10 </ b> S and 19.
[0044]
As shown in FIG. 6, insertion pieces 56 made of plate-like insulating resin are suspended from the left and right ends of the suction unit 51. As shown in FIG. 2 and FIG. 6, the insertion piece 56 has a gap 10a. ₂ It is inserted in the left and right ends of the. Further, as shown in FIGS. 2, 5, and 6, a narrow gap 10 b is formed between the left and right end surfaces of the side plate 14 of the subunit 10 </ b> S and the end cap 15 and the frame member 72. The front and rear side edges of the insertion piece 56 are inserted into the gap 10b. Then, the side edge of the insertion piece 56 is sandwiched between the end cap 15 and the side plate 14 by bolting the end cap 15. Thus, the adjacent subunits 10S are fixed via the insertion piece 56. Each suction unit 51 has a gap 10a ₂ It is possible to fix to the subunit 10S while allowing the width adjustment. Further, the insertion piece 56 allows the gap 10a. ₂ It is possible to prevent leakage of processing gas from the left and right ends of the gas and suction of the outside atmosphere.
[0045]
As shown in FIG. 2, the gap 10b for the insertion piece 56 is a suction-compatible gap 10a. ₂ Not only the blowout gap 10a ₁ Is also provided. Therefore, the suction unit 51 can be attached to the arrangement position of the blowout unit 31 instead.
[0046]
According to the atmospheric pressure plasma processing apparatus M1 having the above-described configuration, the processing gas from the blow-out units 31 at both ends flows into the corresponding gaps 10a of the units 31. ₁ After passing through the space 1a on the lower side of the wide subunit 10S at both ends, the gap 10a is formed on the front and rear sides of the wide subunit 10S. ₂ Into the suction unit 51 (see the arrow in FIG. 1). Further, the processing gas from the central blowing unit 31 is separated from the central gap 10a. ₁ After passing through the space 1a below the two narrow subunits 10S, the gap 10a on the front and rear sides of the narrow subunit 10S is split. ₂ Into the suction unit 51 (see the arrow in FIG. 1). As a result, only a fresh process gas capable of obtaining a high degree of activity can be flowed below any subunit 10S, and a process gas whose activity cannot be obtained is prevented from continuing to flow. it can. Thereby, the efficiency of the plasma surface treatment can be improved.
Further, the process gas can be supplied to and discharged from both adjacent subunits 10S by one blow-out unit 31 and suction unit 51, and the configuration can be made compact.
[0047]
Furthermore, the width of the gap 10a, that is, the opening of the processing gas blowing means and the opening of the gas sucking means can be adjusted by moving the adjacent subunits 10S closer to and away from each other. As a result, the momentum and flow rate of the processing gas can be adjusted according to the processing content.
[0048]
Since each blowing unit 31, 51 is detachable from the subunits 10S, 19, and each subunit 10S, 19 is detachable from the support frame 70, the units 31, 51, 10S, 19 Rearrangement, replacement, increase / decrease can be performed freely, the degree of freedom of configuration change can be increased, and maintenance is facilitated.
[0049]
Next, another embodiment of the present invention will be described. In the following embodiments, the same components as those in the above embodiments are denoted by the same reference numerals and description thereof is omitted. FIG. 11 shows an atmospheric pressure plasma processing apparatus M2 according to the second embodiment of the present invention. In the device M2, a cylindrical electrode 21 ′ is used as a ground electrode (second electrode). The workpiece W ′ is formed in a sheet shape (film shape), is covered on the cylindrical electrode 21 ′, and is sent in the circumferential direction of the electrode 21 ′ by the rotation of the cylindrical electrode 21 ′. The rotating mechanism of the cylindrical electrode 21 ′ constitutes a feed mechanism for the workpiece W ′.
[0050]
The electric field applying electrode 11 ′ of the device M2 is composed of a plurality of partial electrodes 11S ′ arranged in the circumferential direction of the cylindrical electrode 21 ′ (feeding direction of the workpiece W ′). The lower surface of each partial electrode 11S ′ is a partial cylindrical concave surface corresponding to the cylindrical surface of the electrode 21 ′.
[0051]
FIG. 12 shows an atmospheric pressure plasma processing apparatus M3 according to the third embodiment of the present invention. In the device M3, the ground electrode 21 ″ (second electrode) is also divided into four (plural) partial electrodes 21S. The partial electrodes 21S of the ground electrode 21 ″ are the same as the partial electrodes 11S and 11S of the electric field applying electrode 11. They are arranged with a gap 20a in the front and rear so as to face each other. The feeding mechanism 60 ″ of the apparatus M3 is configured to pass a large-area plate-like workpiece W ″ between the electrodes 11 and 21 ″ in the front-rear direction.
The number of partial electrodes 21S of the ground electrode 21 ″ may be different from the number of partial electrodes 11S of the electric field application electrode 11. The partial electrode 11S of the electric field application electrode 11 and the partial electrode 21S of the ground electrode 21 ″ are front and rear. Therefore, the gap 10a and the gap 20a may be shifted in the front-rear direction.
[0052]
The present invention is not limited to the above-described embodiment, and various forms can be adopted.
For example, the first electrode is not limited to being divided into four partial electrodes, and may be divided into three or two, or may be divided into five or more.
A plurality of subunits and blowing units between adjacent subunits may be modularized and attached to the support frame in units of modules.
The ground electrode may be divided into a plurality of partial electrodes as “first electrodes” instead of the electric field applying electrode, and the processing gas blowing means and the gas suction means may be alternately arranged outside the gap and both ends.
The partial electrodes of the first electrode may be connected integrally at an end portion orthogonal to the arrangement direction.
The treatment gas blowing means and the gas suction means need only be arranged alternately so that at least the blowout ports and the suction ports correspond to the partial electrodes of the first electrode and outside both ends, and are connected to the blowout ports and the suction ports. The gas path does not have to be in the arrangement relationship.
The blowout unit 31 and the gas suction unit 51 may be arranged so as to be sandwiched between the partial electrodes.
The suction unit 51 may be joined to the subunits 10 </ b> S and 19 through the same long holes as the blowout unit 31 so that the front and rear positions can be adjusted. The blowout unit 31 has the same insertion piece as the suction unit 51. You may have. Each unit 31 and 51 may have both a long hole and an insertion piece.
The present invention is applicable not only to a substantially normal pressure but also to a plasma treatment under a reduced pressure.
The present invention can be applied to various plasma processes such as cleaning, etching, film formation, surface modification, and ashing.
[0053]
【Example】
Examples of the present invention will be described. Needless to say, the present invention is not limited to this embodiment.
[Example 1]
An apparatus having the same basic structure as in FIG. 1 was used. The size of the ground electrode 21 was 600 mm on the left and right, 600 mm on the front and back, and 20 mm on the top and bottom. As the electric field application electrode 11, four partial electrodes 11S having 530 mm on the left and right, 25 mm on the front and back, and 20 mm on the top and bottom are used, and the width of the gap 10a is 1 mm. The partial electrode 11S and the ground electrode 21 were coated with an alumina coating having a thickness of 1 mm. The distance between the upper and lower electrodes, that is, the thickness of the plasma processing space 1a was set to 2 mm. Dry air was used as a processing gas, and this was blown out from each blowing unit 31 at a flow rate of 30 slm. The applied voltage was set to 15 kv and 25 kHz. Then, a workpiece W made of polyimide was placed, and plasma etching was performed at a processing speed (feeding speed) of 100 mm / min.
[0054]
As a result, a uniform and favorable discharge state could be obtained, and abnormal discharge was not confirmed.
In addition, the etching rate was improved by 3.8 times compared to the comparative example in which the electric field applying electrode 11 was replaced with an undivided unitary body (left and right 530 mm, front and rear 100 mm, upper and lower thickness 20 mm).
[0055]
【The invention's effect】
As described above, according to the present invention, a large degree of activity can be obtained by flowing only a fresh process gas between any of the partial electrodes of the first electrode and the second electrode. Therefore, it is possible to prevent the processing gas that cannot be obtained from continuing to flow. Thereby, the efficiency of the plasma surface treatment can be increased. Also, the processing gas can be supplied to and discharged from the adjacent partial electrodes by one processing gas blowing means or gas suction means, and the configuration can be made compact.
[Brief description of the drawings]
FIG. 1 is a schematic diagram showing a basic configuration of an atmospheric pressure plasma processing apparatus according to a first embodiment of the present invention.
FIG. 2 is a plan view of the electric field applying electrode unit of the atmospheric pressure plasma processing apparatus along the line II-II in FIG.
3 is a cross-sectional view of the electric field applying electrode unit taken along line III-III in FIG. 2;
4 is a cross-sectional view of the electric field applying electrode unit taken along line IV-IV in FIG. 3;
FIG. 5 is a cross-sectional view of the electric field applying electrode unit along the line VV in FIG. 3;
6 is a cross-sectional view of the electric field applying electrode unit taken along line VI-VI in FIG. 3;
FIG. 7 is a front view of front and rear side surfaces of the holder of the electric field applying electrode unit.
FIG. 8 is a front view of a holder facing surface of a side plate of the electric field applying electrode unit.
9 is an enlarged cross-sectional view showing one of the electrode subunits of the electric field applying electrode unit in FIG. 3. FIG.
10 is an enlarged cross-sectional view of the left end portion of the electrode subunit in FIG.
FIG. 11 is a schematic configuration diagram of an atmospheric pressure plasma processing apparatus according to a second embodiment of the present invention.
FIG. 12 is a schematic configuration diagram of an atmospheric pressure plasma processing apparatus according to a third embodiment of the present invention.
[Explanation of symbols]
M1, M2, M3 atmospheric pressure plasma processing equipment
W, W ', W "work
1a Plasmaization space
10 Electric field application electrode unit (first electrode unit)
10S electrode subunit
10a clearance
10a ₁ Blowout unit compatible gap (blowout port)
10a ₂ Suction unit compatible gap (suction port)
11 Electric field application electrode (first electrode)
11S Partial electrode
21 Ground electrode (second electrode)
32a Insertion hole (long hole)
56 Insertion piece
70 Support frame
93 volts

Claims (7)

In a plasma processing apparatus that includes first and second electrodes, and an object to be processed is passed through a plasma processing space between the electrodes,
The first electrode is composed of a plurality of partial electrodes arranged along the feed direction of the workpiece,
An outlet of the processing gas blowing means to the plasma processing space and an inlet of the gas sucking means from the plasma processing space so as to correspond to each other between the adjacent partial electrodes and the outside of the partial electrodes at both ends in the alignment direction. Are alternately arranged along the alignment direction. The plasma processing apparatus according to claim 1, wherein a gap is formed between adjacent partial electrodes, and the gap is provided as the blowout port or the suction port. A unit of the first electrode is configured by connecting subunits configured for each partial electrode to each other, and the processing gas blowing means or the gas suction means is opposite to the second electrode side of the adjacent subunit. The plasma processing apparatus according to claim 2, wherein the plasma processing apparatus is disposed so as to straddle between the back portions of the two. The said 1st electrode unit contains the support frame which supports the said subunit so that attachment or detachment is possible, The said process gas blowing means or gas suction means can be attached or detached to a subunit. The plasma processing apparatus as described. The said subunit is supported so that position adjustment is possible to the alignment direction to the said support frame, The said process gas blowing means and gas suction means can permit the said position adjustment. The plasma processing apparatus according to 1. 6. The process gas blowing means or the gas suction means has a long hole having a long axis directed in the arrangement direction, and is joined to the subunit by a bolt passed through the long hole. The plasma processing apparatus as described. 6. The plasma processing apparatus according to claim 5, wherein the processing gas blowing means or the gas suction means is provided with an insertion piece inserted into the gap and releasably fixed to the subunit.

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