JP2004512678A5 - - Google Patents
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- Publication number
- JP2004512678A5 JP2004512678A5 JP2002536614A JP2002536614A JP2004512678A5 JP 2004512678 A5 JP2004512678 A5 JP 2004512678A5 JP 2002536614 A JP2002536614 A JP 2002536614A JP 2002536614 A JP2002536614 A JP 2002536614A JP 2004512678 A5 JP2004512678 A5 JP 2004512678A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/IL2000/000667 WO2002033492A1 (en) | 1999-07-06 | 2000-10-19 | Nonlinear image distortion correction in printed circuit board manufacturing |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004512678A JP2004512678A (en) | 2004-04-22 |
JP2004512678A5 true JP2004512678A5 (en) | 2007-12-06 |
JP4791681B2 JP4791681B2 (en) | 2011-10-12 |
Family
ID=11043004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002536614A Expired - Fee Related JP4791681B2 (en) | 2000-10-19 | 2000-10-19 | Multilayer printed circuit board manufacturing process |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1252554A1 (en) |
JP (1) | JP4791681B2 (en) |
KR (1) | KR20020074163A (en) |
CN (1) | CN1434932A (en) |
AU (1) | AU2000279433A1 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100526035B1 (en) * | 2003-05-07 | 2005-11-08 | 홍성국 | A inspection system for the metal mask and the inspecting method thereof |
WO2006030727A1 (en) * | 2004-09-14 | 2006-03-23 | Nikon Corporation | Correction method and exposure device |
US7368207B2 (en) * | 2006-03-31 | 2008-05-06 | Eastman Kodak Company | Dynamic compensation system for maskless lithography |
EP2539774B1 (en) | 2010-02-26 | 2014-04-09 | Micronic Mydata AB | Method and apparatus for performing pattern alignment |
CN108901119B (en) * | 2018-06-22 | 2020-06-23 | 广州兴森快捷电路科技有限公司 | Jig and method for measuring hole site precision of laser drilling machine |
CN111694226B (en) * | 2020-05-25 | 2022-05-17 | 合肥芯碁微电子装备股份有限公司 | Levelness measuring method and direct imaging device |
KR102385554B1 (en) * | 2020-06-16 | 2022-04-13 | 재단법인 아산사회복지재단 | Surface enhanced raman substrate based on nanostructure and method for manufacturing same |
CN116362957B (en) * | 2021-12-27 | 2024-05-14 | 广州镭晨智能装备科技有限公司 | PCB card image alignment method, device, medium and electronic equipment |
CN114485409A (en) * | 2022-04-18 | 2022-05-13 | 深圳市元硕自动化科技有限公司 | Raw material plate quality detection method, device and equipment and readable storage medium |
CN117141037B (en) * | 2023-10-30 | 2024-02-02 | 山西昌鸿电力器材有限公司 | Electric power fitting processing technology |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3291176B2 (en) * | 1995-05-15 | 2002-06-10 | 松下電工株式会社 | Circuit pattern inspection method and inspection device |
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2000
- 2000-10-19 KR KR1020027007439A patent/KR20020074163A/en not_active Application Discontinuation
- 2000-10-19 JP JP2002536614A patent/JP4791681B2/en not_active Expired - Fee Related
- 2000-10-19 CN CN00819083A patent/CN1434932A/en active Pending
- 2000-10-19 AU AU2000279433A patent/AU2000279433A1/en not_active Abandoned
- 2000-10-19 EP EP00969787A patent/EP1252554A1/en not_active Withdrawn