JP2004345003A - Abrasive, and method for polishing optical connector end face - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide abrasive, with which an optical connector end face or the like can be polished with high precision, and which is not likely to leave abrasive grains attached to it after polishing, and a method for polishing the optical connector end face. <P>SOLUTION: This abrasive is composed to be provided with an abrasive layer comprising abrasive grains and coupling agent. The abrasive layer further includes photocatalyst material having photocatalytic effect, and the coupling agent includes anti-oxidation resin having anti-oxidation effect. Using the abrasive, light having wavelength to generate photocatalytic effect of the photocatalyst material is radiated to the abrasive layer while polishing. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a polishing material used for finish polishing of an optical fiber connector end face and the like, and a polishing method of an optical connector end face.
[0002]
[Prior art]
Optical fibers used as transmission means for optical communication are required to have as small an optical loss as possible with recent demands for large capacity and high efficiency. An optical connector is used to connect the optical fibers. The optical connector has a ferrule, and an optical fiber is inserted into an insertion hole formed inside the ferrule. The optical fiber is fixed to the ferrule with an adhesive or the like. The quality of the connection end face of the optical connector is very important because it affects the optical characteristics of the optical fiber. Therefore, the end face of the optical connector is mirror-finished by polishing in a plurality of stages. As a final finish of polishing, precise mirror polishing using a polishing material such as a polishing sheet, a polishing tape, a polishing grindstone, or a polishing cloth provided with a polishing layer containing fine abrasive grains is performed.
[0003]
As an abrasive used for precise mirror polishing, for example, a polishing medium in which a polishing layer containing abrasive grains and a predetermined binder is formed on a support is disclosed (for example, see Patent Document 1). . Further, as a polishing tape provided with a polishing layer containing silica particles and a binder on a base material, a polishing tape having a center line average roughness of the polishing layer surface of 0.005 to 0.5 μm is disclosed. (For example, see Patent Document 2).
[0004]
[Patent Document 1]
JP 2002-254319 A [Patent Document 2]
JP-A-2002-254326
[Problems to be solved by the invention]
However, when precise mirror-polishing is performed using an abrasive as disclosed in Patent Literatures 1 and 2, after polishing, abrasive grains and the like contained in the polishing layer may adhere to the surface to be polished and remain. There's a problem. Therefore, it is necessary to separately provide a step of removing the deposits on the surface to be polished. Further, if the adhered substance remains on the surface to be polished, the desired optical characteristics cannot be obtained, and there is a possibility that a problem may occur during use.
[0006]
The present invention has been made in order to solve the above-mentioned problem, and is capable of polishing an optical connector end face or the like with high accuracy, and has a polishing method in which abrasive grains or the like hardly adhere and remain on a polished surface even after polishing. It is an object of the present invention to provide a material and a method for polishing an end face of an optical connector.
[0007]
[Means for Solving the Problems]
The abrasive of the present invention is an abrasive provided with a polishing layer containing abrasive grains and a binder, wherein the polishing layer further contains a photocatalytic material having a photocatalytic action, and the binder has oxidation resistance It is characterized by being used for light irradiation polishing in which the polishing layer contains an oxidation resistant resin and is polished while irradiating the polishing layer with light having a wavelength at which the photocatalytic action of the photocatalytic material is exhibited.
[0008]
In the polishing material of the present invention, polishing is performed by the surface to be polished of the partner member slidingly contacting the polishing layer. Further, the polishing material of the present invention contains a photocatalytic material in the polishing layer. Therefore, the photocatalytic action is exhibited by irradiating the polishing layer with light having a wavelength at which the photocatalytic action of the photocatalytic material is exhibited. This photocatalytic action makes it difficult for abrasive grains and the like to adhere and remain on the surface to be polished. For example, when titanium oxide is used as a photocatalyst material, the mechanism of suppressing the adhesion of abrasive grains and the like is considered as follows.
[0009]
When the titanium oxide is irradiated with light (ultraviolet light) having energy equal to or greater than the band gap, the valence electrons of oxygen in the crystal are excited and transition to the titanium side. As a result, oxygen becomes free oxygen, and holes are generated in the crystal. The holes react with the adsorbed water on the surface of the titanium oxide and the surrounding water to generate hydroxyl radicals (.OH) having strong oxidizing power. These hydroxyl radicals oxidize and decompose the resin component attached to the surface to be polished. Further, the hydroxyl radical reacts with the titanium oxide surface to form a hydroxyl group (-OH), and makes the surface strongly hydrophilic. Therefore, the hydrophilic substance (colloidal silica of the abrasive grains) attached to the surface to be polished is adsorbed on the titanium oxide surface.
[0010]
On the other hand, electrons that have transitioned to the titanium side react with surrounding oxygen to generate superoxide ions (O ²⁻ ). The resin component attached to the surface to be polished is also oxidatively decomposed by the superoxide ions. In addition, the superoxide ion reacts with the titanium oxide surface to form a hydroxyl group similarly to the above-mentioned hydroxyl radical, and makes the surface strongly hydrophilic. Therefore, the hydrophilic substance attached to the polished surface is adsorbed on the titanium oxide surface.
[0011]
When light having a specific wavelength is applied to the polishing layer in contact with the surface to be polished in this manner, the adhesion of abrasive grains and the like to the surface to be polished is suppressed by photocatalysis. Therefore, if the abrasive of the present invention is used, the step of removing the deposits on the surface to be polished after polishing can be omitted, and the polishing step can be simplified. In addition, there is little possibility that the optical characteristics are deteriorated due to the remaining of the attached matter. Further, the abrasive of the present invention contains an oxidation-resistant resin having oxidation resistance as a binder. Therefore, there is little possibility that the binder is oxidatively degraded by light or photocatalytic action applied to the polishing layer. Therefore, the abrasive of the present invention is a highly durable abrasive.
[0012]
The polishing method of the end face of the optical connector of the present invention, the surface of the polishing layer provided with a polishing layer containing abrasive grains, on the surface of the polishing layer, an optical fiber, a ferrule covering the periphery of the optical fiber, the end face of the optical connector comprising. A method for polishing an end face of an optical connector in which the end face is pressed against the polishing surface, wherein the polishing layer includes a photocatalytic material having a photocatalytic action, and light having a wavelength at which the photocatalytic action of the photocatalytic material is developed is applied to the polishing layer. It is characterized by polishing while irradiating.
[0013]
In the method for polishing an end face of an optical connector according to the present invention, a polishing layer containing a photocatalytic material is used for the polishing layer, and polishing is performed while irradiating the polishing layer with light having a wavelength at which the photocatalytic action of the photocatalytic material is exhibited. As a result, the above-described photocatalytic action of the photocatalytic material makes it difficult for abrasive grains and the like to adhere and remain on the surface to be polished. Therefore, according to the polishing method of the present invention, after polishing the end face of the optical connector, the step of removing the deposit attached to the end face can be omitted, and the polishing step can be simplified. In addition, there is little possibility that the optical characteristics are deteriorated due to the remaining of the attached matter.
[0014]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of a polishing material and a method for polishing an end face of an optical connector of the present invention will be described in detail. The polishing material and the method for polishing the end face of the optical connector according to the present invention are not limited to the following embodiments. The polishing material and the method for polishing an end face of an optical connector of the present invention can be carried out in various modes in which a person skilled in the art can make changes and improvements without departing from the gist of the present invention.
[0015]
<Abrasive>
The abrasive of the present invention includes a polishing layer containing abrasive grains and a binder. Known materials may be used for the abrasive grains. For example, particles such as silica (SiO ₂ ), silicon oxide (SiO), colloidal silica, organosilica, alumina (Al ₂ O ₃ ), zirconia (ZrO ₂ ), iron oxide, chromium oxide, and tin oxide may be used. In addition to the single metal oxide, a composite oxide such as SiO ₂ —Al ₂ O ₃ or SiO ₂ —ZrO ₂ may be used. Among them, it is desirable to use colloidal silica because a good polished surface can be obtained.
[0016]
The binder serves to bond the abrasive grains together. Further, when the polishing material is formed by forming a polishing layer on the surface of the base material, it also has a role of bonding the abrasive grains to the base material. The abrasive of the present invention contains an oxidation-resistant resin having oxidation resistance as a binder. The oxidation resistant resin is desirably at least one selected from silicone resins, fluorine resins, acrylic resins, vinyl chloride resins, polyphenylene ethers, and modified resins thereof. Particularly, it is preferable to use a silicone resin because of its high resistance to ultraviolet rays. In the abrasive of the present invention, a resin other than the above-mentioned oxidation-resistant resin may be contained as a binder. For example, it may contain a urethane resin, a vinyl chloride resin, or the like. The mixing ratio of the binder in the polishing layer is not particularly limited. For example, about 10 to 186 parts by weight may be added to 100 parts by weight of the abrasive grains.
[0017]
In the polishing material of the present invention, the polishing layer further contains a photocatalytic material having a photocatalytic action. Examples of the photocatalyst material include titanium oxide (TiO ₂ ), N-doped titanium dioxide, zinc oxide, tungsten oxide, iron oxide, zirconia, tin oxide, strontium titania oxide, niobium oxide, vanadium oxide, cerium oxide, cadmium sulfide, and oxy. Zinc sulfide, antimony porphyrin complex and the like can be mentioned. These may be used alone or in combination. Further, a metal may be supported on the above-mentioned material. Among them, it is desirable to use at least one of titanium oxide, N-doped titanium dioxide, and zinc oxide because it is easily available and practical. In particular, titanium oxide is preferred.
[0018]
The photocatalyst material only needs to be contained in the polishing layer, and the content form is not particularly limited. For example, there is an embodiment in which a photocatalyst material such as a particle, a tube, a needle, and a fiber is mixed with abrasive grains or a binder. Further, a mode may be adopted in which the photocatalytic material is attached to the surface of the particles constituting the abrasive grains, or a film of the photocatalytic material is formed. Note that the photocatalytic material can also exhibit a polishing effect by forming a photocatalytic material having a polishing effect such as titanium oxide, iron oxide, or zirconia into particles and mixing with the abrasive grains.
[0019]
From the viewpoint of sufficiently exhibiting a photocatalytic action for suppressing the attachment of abrasive grains or the like to the surface to be polished, the content ratio of the photocatalytic material in the polishing layer is 3 wt% or more when the weight of the entire abrasive grains is 100 wt%. It is desirable. More preferably, the content is 10% by weight or more. On the other hand, when the content ratio of the photocatalyst material is increased, the polishing characteristics of the abrasive may be affected depending on the type of the photocatalyst material. For example, when titanium oxide is used as the photocatalyst material, the content ratio is desirably 30 wt% or less when the weight of the entire abrasive grains is 100 wt%. The polishing layer may include a lubricant, a dispersant for abrasive grains, and the like, in addition to the abrasive grains, the binder, and the photocatalytic material.
[0020]
The abrasive of the present invention can be implemented, for example, as a polishing sheet, a polishing tape, a polishing stone, a polishing cloth, or the like. For example, in the case of implementing as a polishing sheet or the like, an abrasive may be formed by forming a polishing layer on the surface of a base material. In this case, the substrate to be used only needs to have the required elasticity and strength and can hold the polishing layer. For example, a film made of polyester such as polyethylene terephthalate (PET) or polybutylene terephthalate (PBT), a film made of polycarbonate (PC), or the like is suitable. The thickness of the substrate is not particularly limited, and may be, for example, about 25 to 150 μm.
[0021]
Further, a buffer layer may be formed on the surface of the base material in advance according to the purpose, such as improvement in adhesion between the base material and the polishing layer and patterning of the surface of the polishing layer. For example, a buffer layer may be formed by forming an easily adhesive layer on the surface of the base material. Alternatively, the buffer layer may be formed by heat treatment, corona treatment, plasma treatment, or the like on the surface of the base material. The easy-adhesion layer can be formed by, for example, applying a buffer coating solution composed of an epoxy resin, an acrylic resin, a polyester resin, or the like to the surface of the base material and drying the coating solution.
[0022]
In the case of using the above-described base material, the abrasive of the present invention can be produced by applying a coating agent containing abrasive grains, a binder, a photocatalytic material and the like to the surface of the base material and drying. Specifically, first, a coating agent in which abrasive grains and the like are dispersed in a predetermined solvent is prepared. Next, a coating agent may be applied to the surface of the substrate by a bar coater method, a microgravure method, a comma coat method, or the like, and then heated to 20 to 140 ° C. and dried. The thickness of the polishing layer to be formed may be appropriately set according to the material of the surface to be polished and the polishing process. For example, the thickness is preferably about 3 to 15 μm. The abrasive may be used in a predetermined shape such as a sheet shape, a band shape, and a circular shape.
[0023]
The polishing material of the present invention is used for light irradiation polishing for polishing while irradiating the polishing layer with light having a wavelength at which the photocatalytic action of the catalyst material is exhibited. The method of irradiating light to the polishing layer in contact with the surface to be polished is not particularly limited. For example, when an abrasive is composed of a base material and a polishing layer, light can be irradiated from the base material side, and light transmitted through the base material can be applied to the polishing layer. In general, the wavelength at which the photocatalytic action is exhibited differs depending on the type of the photocatalytic material. Therefore, light having an optimal wavelength may be appropriately irradiated according to the type of the photocatalytic material used for the abrasive of the present invention. For example, when anatase-type titanium oxide is used as the photocatalyst material, it is effective to irradiate ultraviolet light having an intensity peak at 360 to 390 nm. When N-doped titanium dioxide is used, visible light may be applied in addition to ultraviolet light.
[0024]
The abrasive of the present invention can be used for polishing various precision parts such as optical connector end faces, semiconductor wafers, optical lenses, optical disk substrates, and the like. The abrasive of the present invention can be used not only in the final finishing step of polishing, but also in intermediate steps of polishing and the like. In particular, it is most suitable for the final polishing step of the optical connector end face.
[0025]
<Method of polishing optical connector end face>
In the method for polishing an end face of an optical connector according to the present invention, an abrasive having an abrasive layer containing abrasive grains and a photocatalytic material is used. The abrasive may be in accordance with the abrasive of the present invention. Therefore, details are omitted here. In the polishing method of the present invention, the binder constituting the polishing layer does not necessarily need to contain an oxidation-resistant resin. That is, a known material may be used as the binder. However, in consideration of further suppressing oxidative deterioration due to photocatalysis and improving the durability of the abrasive, an embodiment containing an oxidation-resistant resin such as a silicone resin as the binder is preferable.
[0026]
In the polishing method of the present invention, polishing is performed by pressing the end face of the optical connector against the surface of the polishing layer of the polishing material. At that time, the polishing layer is irradiated with light having a wavelength at which the photocatalytic action of the photocatalytic material is exhibited. Here, the method of irradiating the polishing layer with light is not particularly limited. For example, when the polishing material is composed of a base material and a polishing layer, light can be irradiated from the base material side of the polishing material, and the light transmitted through the base material can be applied to the polishing layer. Further, the polishing layer can be irradiated with light through the optical fiber of the optical connector. In the mode of irradiating light through an optical fiber, a special device for guiding light is not required. Therefore, it can be easily implemented and is practical.
[0027]
FIG. 1 shows a schematic view of an example of a polishing apparatus that can carry out the polishing method of the present invention. As shown in FIG. 1, the optical connector 1 is disposed on the upper surface of the abrasive 2. The optical connector 1 is fixed by a jig (not shown).
[0028]
The optical connector 1 includes a ferrule 11 and an optical fiber 12. The ferrule 11 is made of zirconia. An insertion hole is formed inside the ferrule 11. One end (lower end) of the optical fiber 12 is inserted into the insertion hole of the ferrule 11 and fixed with an adhesive. The other end (upper end) of the optical fiber 12 is connected to a light source. Ultraviolet rays are emitted from the light source through the optical fiber 12. The end face 13 of the optical connector 1 is pressed against the surface of the polishing layer 22 of the polishing material 2.
[0029]
The polishing material 2 includes a base material 21 and a polishing layer 22. The substrate 21 is made of polyester and has a sheet shape. The thickness of the substrate 21 is 75 μm. The surface of the substrate 21 on which the polishing layer 22 is formed is subjected to an easy adhesion treatment. The polishing layer 22 is formed on the surface of the substrate 21 and includes colloidal silica (abrasive grains), anatase-type titanium oxide particles (photocatalytic material), and a silicone resin (binder). The content ratio of the titanium oxide particles in the polishing layer 22 is 10 wt% when the weight of the colloidal silica is 100 wt%. The thickness of the polishing layer 22 is about 5 μm.
[0030]
The abrasive 2 reciprocates in the horizontal direction while rotating. Thereby, the end surface 13 of the optical connector 1 pressed against the surface of the polishing layer 22 is polished. At the same time, ultraviolet light is applied to the surface of the polishing layer 22 through the optical fiber 12. As a result, the colloidal silica attached to the end face 13 is adsorbed on the polishing layer 22 by the photocatalytic action of the titanium oxide particles contained in the polishing layer 22. Therefore, the remaining of the abrasive particles and the like on the end face 13 is suppressed.
[0031]
In the present embodiment, anatase-type titanium oxide is used as the photocatalyst material. Therefore, in consideration of the photocatalytic action of titanium oxide, ultraviolet light having an intensity peak at 360 to 390 nm was irradiated. However, the light applied during polishing is not limited to ultraviolet light. As described above, the wavelength at which the photocatalytic action is exhibited differs depending on the type of the photocatalytic material. Therefore, optimal light may be appropriately used according to the type of the photocatalyst material. In this embodiment, the end face of the optical connector made of a zirconia ferrule is polished. However, the material of the ferrule is not particularly limited, and may be metal or plastic. Further, in the present embodiment, the abrasive is composed of the base material and the abrasive layer. However, the abrasive is not limited to the above configuration, and may be composed of only the polishing layer.
[0032]
The polishing method of the present invention is most suitable for the final finishing polishing step of the end face of an optical connector, but can also be used in an intermediate polishing step or the like. Further, it is desirable that the end face of the optical fiber opposite to the end face constituting the polished surface be polished to a somewhat favorable state in order to reduce the influence of light passage and wavelength.
[0033]
【Example】
An abrasive was manufactured based on the above embodiment. Using the manufactured abrasive, finish polishing of the optical connector end surface was performed while irradiating ultraviolet rays, and the polished surface after polishing was evaluated. Hereinafter, the production of the abrasive, the finish polishing test, and the evaluation of the polished surface will be described.
[0034]
<Manufacture of abrasives>
(1) Colloidal silica (manufactured by Nissan Chemical Industries, Ltd .: average particle diameter 0.02 μm) was used as abrasive grains of # 1. As a photocatalyst material, anatase type titanium oxide (trade name “AMT-100”, manufactured by Teica Co., Ltd .: average particle diameter: 6 nm) was used. As the binder, a silicone resin (manufactured by Shin-Etsu Chemical Co., Ltd.) was used. First, 100 parts by weight of colloidal silica, 10 parts by weight of titanium oxide, and 100 parts by weight of a silicone resin were dispersed in methyl ethyl ketone (MEK) as a solvent to prepare a coating agent. The weight ratio of titanium oxide to the total weight of colloidal silica was 10% by weight. Next, the prepared coating agent was applied to the surface of a polyester sheet (manufactured by Panac Co., Ltd .: 75 μm in thickness) as a base material by a bar coater method. In addition, the surface of the polyester sheet to which the coating agent was applied was previously subjected to an easy adhesion treatment. Then, it heated at 60 degreeC and dried the applied coating agent, and formed the polishing layer. The thickness of the formed polishing layer was about 5 μm. The abrasive thus produced was processed into a circular shape and subjected to the following finish polishing. In addition, this abrasive was used as # 1 abrasive.
[0035]
(2) Abrasive of # 2 An abrasive containing no photocatalytic material was produced. In the production of the abrasive # 1 above, the abrasive was produced in the same manner as the abrasive # 1, except that titanium oxide was not mixed. The manufactured abrasive was numbered as # 2 abrasive.
[0036]
<Finish polishing test and evaluation of polished surface>
(1) Finish polishing test The manufactured abrasives of # 1 and # 2 were each attached to a polishing machine (“OFL-15”, manufactured by Seiko Instruments Inc.), and a finish polishing test of the end face of the optical connector was performed. Also, polishing sheets A and F (A: trade name “ATR-01”: manufactured by Nippon Micro Coating Co., Ltd., F: trade name “FOS-01”: Dai Nippon Printing) are commercially available for finish polishing of the end face of an optical connector. (Manufactured by Co., Ltd.), and the finish polishing test was similarly performed. The final polishing test was performed using six optical connectors for each polishing material and polishing sheet. Then, three of the used optical connectors were polished while being irradiated with ultraviolet rays (wavelength of intensity peak: 360 to 390 nm), and the other three were polished without being irradiated with ultraviolet rays. Polishing was performed for 180 seconds. The end face of the used optical connector was subjected to a prescribed polishing prescription for PC ferrule as pre-polishing until finish polishing. Then, the end face of the optical connector immediately after the finish polishing was evaluated by the following four items (a) to (d).
(A) Presence or absence of attached matter on ferrule end face: The ferrule end face was observed with an optical microscope, and the presence or absence of attached matter was investigated. (B) Presence / absence of polishing flaw (scratch) on ferrule end face and mirror surface state: The ferrule end face was observed with an optical microscope, and the presence / absence of polishing flaw and the mirror surface state were examined. (C) Surface roughness (Ra) at the center line of the optical fiber: Ra (nm) was measured using a surface profile roughness measuring instrument manufactured by Taylor Hobson Co., Ltd. (D) The amount of protrusion of the optical fiber relative to the ferrule: The amount of protrusion (nm) of the optical fiber relative to the ferrule was measured using an ultra-precision level difference meter manufactured by Taylor Hobson.
[0037]
(2) Evaluation of Polished Surface (2-1) In polishing using abrasive # 1 of abrasive # 1, the state of the end face of the optical connector was different depending on the presence or absence of irradiation of ultraviolet rays. As an example, FIG. 2 shows an optical microscope photograph of an optical connector end face polished while being irradiated with ultraviolet light. As shown in FIG. 2, when irradiated with ultraviolet rays, no deposits and polishing debris were observed on the surface to be polished. In addition, there was no polishing scratch on the end face of the optical connector, and the optical connector was finished in a good mirror surface state. The surface roughness (Ra) at the center line of the optical fiber and the convexity of the optical fiber with respect to the ferrule were both within the range of the standard value.
[0038]
In contrast, raindrop-shaped deposits were observed on the end face of the optical connector polished without irradiating ultraviolet rays. The size of the attached matter was about 1 to 150 mm, and the major axis directions were substantially aligned in the same direction. Further, the adhered matter was fixed to the surface to be polished, and could not be removed by wiping with a nonwoven fabric or the like impregnated with alcohol or the like. Even when ultraviolet light was not irradiated, polishing scratches were not observed and the mirror was finished. The surface roughness (Ra) at the center line of the optical fiber and the convexity of the optical fiber with respect to the ferrule were both within the range of the standard value.
[0039]
(2-2) Polishing of abrasive material # 2 In polishing using the abrasive material of # 2, the end faces of the optical connector were almost in the same state regardless of the presence or absence of ultraviolet irradiation. As an example, FIG. 3 shows an optical microscope photograph of an end face of an optical connector polished while being irradiated with ultraviolet rays. As shown in FIG. 3, in the polishing with the abrasive material of # 2, the same deposits as those described in the later stage of (2-1) were observed on almost the entire end face of the optical connector. The adhered substance remained even when the surface to be polished was wiped with a nonwoven fabric or the like impregnated with alcohol or the like. From this, it can be seen that the deposit is fixed to the surface to be polished. Polishing debris was also observed at the periphery of the ferrule. No polishing scratches were observed, and the mirror finished. The surface roughness (Ra) at the center line of the optical fiber and the convexity of the optical fiber with respect to the ferrule were both within the range of the standard value.
[0040]
(2-3) Commercially available polishing sheets A and F
In the polishing using the polishing sheet A and the polishing sheet F, the end faces of the optical connector were almost in the same state regardless of the presence or absence of the irradiation of the ultraviolet light. That is, in the polishing using the polishing sheets A and F, a raindrop-shaped deposit as shown in FIG. 2 was observed on the end face of the optical connector. Polishing debris was also observed at the periphery of the ferrule. No polishing scratches were observed, and the mirror finished. The surface roughness (Ra) at the center line of the optical fiber and the convexity of the optical fiber with respect to the ferrule were both within the range of the standard value.
[0041]
(2-4) Conclusion In the polishing using the # 2 polishing material containing no photocatalyst material in the polishing layer and the commercially available polishing sheets A and F, the adhering matter and the polishing are applied to the end face of the optical connector regardless of the irradiation of ultraviolet rays. Debris was observed. In addition, even when the polishing material was used without irradiating ultraviolet rays even when the polishing material of # 1 containing a photocatalytic material in the polishing layer was used, an adhering substance was observed on the end face of the optical connector. On the other hand, when polishing using # 1 abrasive containing the photocatalyst material in the polishing layer and irradiating with ultraviolet rays, the end face of the optical connector can be precisely formed without deposits or polishing debris remaining on the end face of the optical connector. Could be polished.
[0042]
【The invention's effect】
The polishing material of the present invention contains a photocatalytic material in the polishing layer. Therefore, in the polishing with the abrasive of the present invention, when light having a wavelength at which the photocatalytic action of the photocatalytic material is exerted is applied to the polishing layer, abrasive grains and the like hardly adhere and remain on the surface to be polished due to the photocatalytic action. Further, the abrasive of the present invention contains an oxidation-resistant resin as a binder. Therefore, there is little possibility that the binder is oxidized and deteriorated by the light or photocatalytic action applied to the polishing layer, and the durability is high.
[0043]
In the method for polishing an end face of an optical connector of the present invention, a polishing material having a polishing layer containing a photocatalytic material is used, and polishing is performed while irradiating the polishing layer with light having a wavelength at which a photocatalytic action is exhibited. According to the polishing method of the present invention, the abrasive particles and the like hardly adhere to and remain on the surface to be polished by the photocatalytic action of the photocatalytic material. Therefore, the step of removing the deposit on the surface to be polished after polishing can be omitted, and the polishing step can be simplified. In addition, there is little possibility that the optical characteristics are deteriorated due to the remaining of the attached matter.
[Brief description of the drawings]
FIG. 1 shows a schematic view of an example of a polishing apparatus capable of performing a polishing method of the present invention.
FIG. 2 is an optical micrograph of an end face of an optical connector after ultraviolet irradiation polishing using a polishing material of # 1.
FIG. 3 is an optical microscope photograph of an end face of an optical connector after ultraviolet irradiation polishing using an abrasive of # 2.
[Explanation of symbols]
1: optical connector 11: ferrule 12: optical fiber 13: end face 2: abrasive 21: base material 22: polishing layer

Claims (10)

An abrasive having a polishing layer containing abrasive grains and a binder,
The polishing layer further includes a photocatalytic material having a photocatalytic action,
The binder includes an oxidation-resistant resin having oxidation resistance,
A polishing material used for light irradiation polishing for polishing while irradiating the polishing layer with light having a wavelength at which the photocatalytic action of the photocatalytic material is exhibited. The polishing material according to claim 1, wherein the photocatalytic material includes at least one of titanium oxide, N-doped titanium dioxide, and zinc oxide. The abrasive according to claim 1, wherein the oxidation-resistant resin is at least one selected from a silicone resin, a fluorine resin, an acrylic resin, a vinyl chloride resin, a polyphenylene ether, and a modified resin thereof. The polishing material according to claim 1, wherein the photocatalytic material is titanium oxide, and the light is ultraviolet light. 2. The abrasive according to claim 1, wherein the photocatalyst material is contained in a ratio of 3 wt% or more when the weight of the entire abrasive grains is 100 wt%. 3. On the surface of the polishing layer of the abrasive having a polishing layer containing abrasive grains,
An optical fiber, a ferrule for coating the periphery of the optical fiber, and a method for polishing an end face of an optical connector for polishing the end face by pressing the end face of the optical connector,
The polishing layer contains a photocatalytic material having a photocatalytic action,
A method for polishing an end face of an optical connector, wherein the polishing is performed while irradiating the polishing layer with light having a wavelength at which the photocatalytic action of the photocatalytic material is exhibited. The method for polishing an end face of an optical connector according to claim 6, wherein the light is applied to the polishing layer through the optical fiber. The method of claim 6, wherein the photocatalyst material includes at least one of titanium oxide, N-doped titanium dioxide, and zinc oxide. The method for polishing an end face of an optical connector according to claim 6, wherein the photocatalyst material is contained at a rate of 3 wt% or more when the mass of the entire abrasive grains is 100 wt%. The method according to claim 6, wherein the photocatalyst material is titanium oxide, and the light is ultraviolet light.

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