JP2004341224A - Film forming substrate for large-size pellicle and method for manufacturing large-size pellicle film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a large-size film forming substrate to be used for manufacturing a large-size pellicle film having ≥1,000 cm<SP>2</SP>pellicle area, and to solve the problems that because a temporary frame has ≥1 m maximum width in the short side, a worker has to handle and operate the frame by approaching the temporary frame and the large-size pellicle film, and this means inferior workability and easily causes deposition of dust on the large-size pellicle film. <P>SOLUTION: The film forming substrate 1 having 1,100 mm maximum width in the short side to be used for the manufacture of a large-size pellicle film 4 is cut in the right lower corner to make a corner cut C to decrease the width W2 in the shorter side to 900 mm. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a film-forming substrate having a maximum width of 1 m or more on a short side used in manufacturing a large-sized pellicle film and a method for manufacturing a large-sized pellicle film using the film-formed substrate. In particular, the present invention relates to a large-sized pellicle film-forming substrate and a method for manufacturing a large-sized pellicle film, in which workability in manufacturing a large-sized pellicle film is improved and dust is hardly attached to the large-sized pellicle film.
[0002]
[Prior art]
As a conventional method for manufacturing a pellicle film or a technique relating to a film forming substrate used for manufacturing a pellicle film, for example, Patent Documents 1, 2, 3, and 4 described below are known. .
[0003]
Patent Document 1 described below discloses a separation method in which a water-soluble sol-gel convertible material is applied in a sol state on a substrate such as glass or plastic having a smooth surface using a spin coating method and gelled. After applying a protective film material for a photomask to a desired film thickness using a spin coating method on the film, the separation film is immersed in warm water at a gel temperature or higher of the separation film material. Sol-gel conversion, floating the topmost photomask protective film in warm water, and then scooping the photomask protective film from the warm water with a frame having a desired shape and thickness, heating and drying. A method for producing a protective film for a high-precision pattern plate, which is characterized by forming a better film, is described in detail.
[0004]
Further, Patent Document 2 described below is characterized in that a nitrocellulose thin film is formed on a smooth plate by a solution casting method, a frame is adhered to the thin film, then the film is immersed in water to peel the thin film, and then dried. A method of manufacturing a dustproof cover for a photomask is described.
[0005]
Further, Patent Document 3 described below discloses that a polymer thin film of a different kind is fixed to a base polymer layer, and a frame is adhered to the polymer thin film. A method for producing a polymer thin film adhered and fixed to a frame, which comprises dissolving and removing a polymer layer, is described.
[0006]
Patent Document 4 described below discloses that in manufacturing a pellicle film, an extremely smooth surface is formed on the surface of the substrate by coating chromium or a chromium alloy on a surface-side film forming surface of the substrate on which the pellicle film is formed. The technology describes that the thin film of the pellicle formed on the smooth surface can be peeled off smoothly with low resistance, and the pellicle film is prevented from spreading, wrinkling, flaws, tearing, etc. Have been.
[0007]
Further, Patent Document 5 described below discloses that a pellicle film having a high volume resistivity of at least 10 ⁵ Ω · cm is formed by using silicon or SiC-Si as a substrate for forming a pellicle film. The film formation substrate used when forming the film has a volume resistivity of 10 ³ Ω · cm or less, whereby the static electricity generated between the substrate and the film when the film formed on the substrate is peeled off. This is a technique for reducing the force of the film being attracted to the substrate, thereby preventing the film from being wrinkled or torn when the film is peeled off.
[0008]
[Patent Document 1]
JP-A-59-182730 [Patent Document 2]
JP-A-60-35733 [Patent Document 3]
JP-A-60-38130 [Patent Document 4]
JP-A-2-134634 [Patent Document 5]
Japanese Patent No. 2938709
[Problems to be solved by the invention]
The pellicle film-forming substrate used by the techniques of Patent Documents 1 to 5 described above is generally intended to produce a pellicle film having a pellicle area of 1,000 cm ² or less. As the film substrate, one having a maximum width on the short side of 1 m or less was used.
[0010]
As described above, in a film forming substrate having a maximum width of 1 m or less, a temporary frame having a maximum width of 1 m or less can be used as a temporary frame for peeling the pellicle film from the film forming substrate when a pellicle film is manufactured. Therefore, it was in a state where a person could hold it with both hands and easily operate it at a relatively distant place.
[0011]
However, as shown in FIG. 5, for example, in a large pellicle film forming substrate 51 for producing a large pellicle film having a pellicle area of 1,000 cm ² or more, the maximum width on the short side is 1 m or more. Therefore, the temporary frame 53 used for peeling the large pellicle film 52 from the large pellicle film forming substrate 51 also has a maximum width on the short side of 1 m or more. , 54b, the operator 54 must hold the both hands 54a, 54b at a distance D1 that is extremely close to the temporary frame 53, so that the operability of the handling becomes poor. There is a risk that the large pellicle film 52 may be damaged inside, and dust generated by the approach of the worker 54 adheres to the large pellicle film 52 and the quality of the large pellicle film 52 tends to deteriorate. . In the figure, reference numeral 55 denotes an adhesive applied to the lower surface of the temporary frame 53.
[0012]
The present invention is a completely novel invention developed in view of the above-described problems, and in particular, by providing a corner cut on at least one side of a large pellicle film deposition substrate, the large pellicle film deposition substrate And the length of the side of the temporary frame used for the large-sized pellicle film deposition substrate is also shortened. The present invention provides a technique for a large pellicle film-forming substrate and a method for manufacturing a large pellicle film, which facilitates a peeling operation and prevents dust from adhering to the large pellicle film and deteriorating quality. is there.
[0013]
[Means for Solving the Problems]
The film-forming substrate for a large pellicle according to the present invention is an invention which fundamentally improves the above-mentioned conventional problems, and the gist of the first invention is a short side used in manufacturing a large pellicle film. A large-sized pellicle film-forming substrate characterized in that at least one side of the film-forming substrate is provided with a corner cut in a film-forming substrate having a maximum width on the side of 1 m or more.
[0014]
In the large-sized pellicle film-forming substrate according to the first aspect, corner cuts are made on at least one side of the large-sized film-forming substrate having a maximum width of 1 m or more on a short side used for manufacturing a large-sized pellicle film. Since it is provided, the length of the side can be shortened.
[0015]
Therefore, the temporary frame used for peeling the large pellicle film formed on the large pellicle film-forming substrate can also be subjected to a similar corner cut to shorten the length of the side. The worker can work while holding the temporary frame with both hands without approaching. Therefore, the operability for peeling the large pellicle film can be improved, and the quality can be prevented from deteriorating due to the adhesion of dust to the large pellicle film.
[0016]
The gist of the second invention of the large-sized pellicle deposition substrate according to the present invention is that the side length is set to 1 m or less by providing the corner cut. It is.
[0017]
In the second aspect of the present invention, the corner length is set to 1 m or less by providing a corner cut on the large-sized pellicle deposition substrate. The length of the side is set to 1 m or less by providing a cut, so that the operator can easily and uniformly operate the temporary frame without approaching.
[0018]
The method for manufacturing a large pellicle film according to the present invention is also an invention that fundamentally improves the above-mentioned conventional problems, and the gist of the invention is to reduce the length of a side by providing a corner cut on at least one side. After forming a pellicle film by applying a pellicle film forming material to the surface of a large pellicle film formation substrate having a length of 1 m or less, at least one side is subjected to corner cut similarly to the large pellicle film formation substrate. A temporary frame formed to a length of 1 m or less is adhesively fixed on the pellicle film, and the operator holds the side formed to a length of 1 m or less of the temporary frame with both hands while holding the pellicle film for a large pellicle. This is a method for manufacturing a large pellicle film, which is manufactured by peeling off from a film-forming substrate.
[0019]
In the method for producing a large pellicle film according to the present invention, a pellicle film forming material is applied to the surface of a large pellicle deposition substrate having a side length of 1 m or less by providing a corner cut on at least one side. After the pellicle film is formed and the temporary frame similarly formed with the corner cut and having a side length of 1 m or less is adhesively fixed to the pellicle film, the side formed 1 m or less of the temporary frame. Is held by both hands, so that the worker operates the temporary frame and removes the pellicle film together with the temporary frame from the large-sized pellicle deposition substrate without operating the temporary frame and the pellicle film. Can be done. Therefore, it is possible to easily and reliably peel off the large pellicle film, and to prevent dust from being generated on the pellicle film due to the approach of an operator.
[0020]
BEST MODE FOR CARRYING OUT THE INVENTION
One embodiment of the method for manufacturing a large pellicle film-forming substrate and a large pellicle film according to the present invention will be specifically described with reference to the drawings. FIG. FIGS. 2A and 2B are plan views of a large-sized pellicle deposition substrate according to the second and third embodiments of the present invention, and FIGS. 3A to 3C are diagrams of the present invention. FIGS. 4A to 4C are explanatory diagrams showing a state in which a large pellicle film is formed on the surface of the large pellicle film-forming substrate of the third embodiment. FIGS. FIG.
[0021]
In FIG. 1, reference numeral 1 denotes a large-sized pellicle film forming substrate (hereinafter, simply referred to as a film forming substrate) capable of manufacturing a large-sized pellicle film having a pellicle area of 1,000 cm ² or more, and a width of a short side thereof. W1 is formed at 1,100 mm. A corner cut C is formed in the lower right corner of the film forming substrate 1, and a width W2 of the short side on which the corner cut C is formed is 900 mm.
[0022]
In the above-described embodiment, the corner cut C is formed at one corner of the film-forming substrate 1, but as shown in FIG. By applying C, the film formation substrate 2 can be formed. In the case of this embodiment, the width W1 on the short side of the film forming substrate 2 is 1,200 mm, whereas the width W3 on the short side with the corner cut C formed on both sides is 800 mm. I have.
[0023]
Further, as shown in FIG. 2B, it is possible to form the film-forming substrate 3 by making corner cuts C at all four corners of the film-forming substrate. In the case of this embodiment, the width W1 on the short side of the film-forming substrate 3 is 1,200 mm, as in the case of the film-forming substrate 2 described above, whereas the width on the short side having the corner cut C on both sides. W3 can be formed to 800 mm.
[0024]
A method for manufacturing a large-sized pellicle film using the above-described film-forming substrate 3 with respect to the method for manufacturing a large-sized pellicle film of the present invention is as shown in FIGS. 3 (a) to 3 (c).
[0025]
That is, in the drawing, a film material such as nitrocellulose is applied to the surface of a film forming substrate 3 to form a large pellicle film 4. Subsequently, as shown in FIGS. 4A to 4C, a temporary frame 5 of the same size as the film-forming substrate 3 having the corner cuts C formed at the four corners is placed on the large pellicle film 4 as in the case of the film-forming substrate 3. The temporary frame 5 is placed on the temporary frame 5 and the temporary frame 5 is adhesively fixed to the large pellicle film 4 via the adhesive 6 applied to the lower surface of the temporary frame 5.
[0026]
Next, as shown in FIG. 4 (b), the operator 7 handles both ends where the width W3 on the short side is 800 mm as described above while spreading both hands 7a and 7b, and moves the temporary frame 5 toward the front. By gradually rising from the side, the large pellicle film 4 can be peeled from the deposition substrate 3.
[0027]
Since the above-described film-forming substrate 3 has a width W3 on the short side of 800 mm, as shown in the figure, the operator 7 can extend both ends of the film-forming substrate 3 without greatly expanding both hands 7a and 7b. The temporary frame 5 can be raised and the large pellicle film 4 can be smoothly peeled off while easily and uniformly applying force. Further, since the operator 7 does not need to widely spread both hands 7a and 7b, it is not necessary to approach the temporary frame 5 and the large pellicle film 4 as in the conventional example shown in FIG. It is possible to work at a distant distance D2.
[0028]
Therefore, since the worker 7 does not need to approach the temporary frame 5 and the large pellicle film 4, dust generated on the large pellicle film 4 generated when the worker 7 approaches the large pellicle film 4 as in the conventional example is reduced. Thus, it is possible to prevent the quality of the large pellicle film 4 from deteriorating due to the adhesion of dust.
[0029]
A glass substrate or the like can be used as a material of the above-mentioned film formation substrates 1 to 3. In the above-described embodiment, nitrocellulose was used as the film material of the pellicle film. Can be used. These film materials can be formed into a desired thickness on the surface of the glass plate by spin coating using a spin coater or the like.
[0030]
【The invention's effect】
In the film-forming substrate for a large pellicle according to the present invention, a corner cut is provided on at least one side of a large-sized film-forming substrate having a maximum width on the short side of 1 m or more used in manufacturing a large-sized pellicle film. , The length of the side can be shortened.
[0031]
Therefore, the temporary frame used for peeling the large pellicle film formed on the large pellicle film-forming substrate also has an effect that the length of the side can be shortened by performing a similar corner cut, This has an effect that the worker can work while holding the temporary frame with both hands without approaching. Therefore, the operability for peeling the large pellicle film is improved, and the quality can be prevented from deteriorating due to the adhesion of dust to the large pellicle film.
[0032]
Further, in the present invention, when the side length is set to 1 m or less by providing a corner cut on the large pellicle deposition substrate, the temporary frame used for the large pellicle deposition substrate is also corner-cut. Is provided so that the length of the side is 1 m or less, so that the possibility that the operator can operate the temporary frame easily and uniformly while applying force without approaching it can be more assured. Have.
[0033]
In the method for manufacturing a large pellicle film according to the present invention, a pellicle film forming material is formed on a surface of a large pellicle deposition substrate having a side length of 1 m or less by providing a corner cut on at least one side. After coating, a pellicle film was formed, and a temporary frame similarly formed with a corner cut and having a side length of 1 m or less was adhered and fixed to the pellicle film, and then formed to 1 m or less of the temporary frame. Since the operator holds the side with both hands, the operator does not approach the temporary frame and the pellicle film, but operates the temporary frame and peels off the pellicle film together with the temporary frame from the large-sized pellicle film forming substrate. It has the effect that can be. Therefore, it is possible to easily and reliably peel off the large pellicle film, and to prevent dust from being generated on the pellicle film due to the approach of an operator.
[Brief description of the drawings]
FIG. 1 is a plan view of a deposition substrate for a large pellicle according to a first embodiment of the present invention.
FIG. 2 is a plan view of a large-sized pellicle deposition substrate according to a second embodiment and a third embodiment of the present invention.
FIG. 3 is an explanatory view showing a state in which a large pellicle film is formed on the surface of a large pellicle film forming substrate according to a third embodiment of the present invention.
FIG. 4 is an explanatory view showing a step of peeling a large pellicle film of FIG. 3;
FIG. 5 is an explanatory view showing a conventional large-sized film-forming substrate used for manufacturing a large-sized pellicle film and a method for manufacturing a large-sized pellicle film.
[Explanation of symbols]
1 ... Deposition substrate for large pellicles (deposition substrate)
2. Film-forming substrate for large pellicle (film-forming substrate)
3. Film-forming substrate for large pellicle (film-forming substrate)
4 large pellicle film 5 temporary frame 6 adhesive 7 worker 7a
7a ... both hands 7b ... both hands 51 ... large-sized pellicle film forming substrate 52 ... large pellicle film 53 ... temporary frame 54 ... worker 54a ... both hands 54b ... both hands C ... corner cut D1 ... distance D2 ... distance W1 ... 1,100 mm
W2… 900mm
W3 ... 800mm

Claims (3)

A large-sized film having a maximum width on the short side of 1 m or more used in manufacturing a large-sized pellicle film, wherein at least one side of the film-formed substrate is provided with a corner cut. Deposition substrate for pellicle. 2. The film forming substrate for a large pellicle according to claim 1, wherein the side length is set to 1 m or less by providing the corner cut. A pellicle film forming material is applied to the surface of a large pellicle film forming substrate having a side length of 1 m or less by providing a corner cut on at least one side to form a pellicle film. As with the film substrate, at least one side is corner-cut, and a temporary frame having a side length of 1 m or less is adhesively fixed on the pellicle film. A method for manufacturing a large pellicle film, characterized in that the pellicle film is peeled off from a film-forming substrate for a large pellicle while being held by both hands and manufactured.

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