JP2004293025A - Yarn crimping apparatus, method for manufacturing the same, and method for producing crimped yarn by using the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To inhibit reduction of quality of crimped yarns, thread breakage in crimping process caused by accumulation of fouling in the crimping apparatus or growth of wear-out on a section where the threads pass and contact in crimping process of synthetic fibers. <P>SOLUTION: The invention relates to the yarn crimping apparatus carrying out crimping treatment on synthetic fibers. At least a part of surface of each thread feeding port, heated fluid spray nozzle and accumulating section for the crimped threads is composed of evaporated film wherein the evaporated film has contact angle with distilled water of 65-115° and 1,500-6,000 of film hardness (at normal temperatures HV). <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  TECHNICAL FIELD The present invention relates to a crimping device used for crimping a synthetic fiber yarn, a method for producing the same, and a method for producing a crimped yarn using the same. More specifically, a crimp applying apparatus having a high hardness deposited film having excellent release properties from synthetic fiber yarns and excellent abrasion resistance, a method of manufacturing the same, and a crimp applying apparatus using the same were used. The present invention relates to a method for producing a crimped yarn.

  In a conventional crimping device for crimping a synthetic fiber yarn using high-temperature steam, the yarn is sucked by a suction force generated by injection of a heating fluid from an injection nozzle portion of a heating fluid, and The yarn is violently disturbed and entangled while being subjected to a heat treatment by a heating fluid injected from a heating fluid injection nozzle, and is crimped. As a means for heating the yarn, there is no problem even if an electric heater or the like is used in addition to a heating fluid such as steam or heated air.

  In such a crimping device for crimping, various kinds of deposits may accumulate on a portion where the yarn comes into contact with the injection nozzle portion of the heating fluid of the yarn introduction nozzle portion, or the crimping device may be used. There is a problem that the part is easily worn away. In the crimping device, the amount of steam injected is one of the most important factors that determine the suction force of the yarn and the degree of crimping of the yarn. Processing and assembling are performed with high precision so that the clearance through which the strip passes is always constant. However, when deposits are deposited or deposited in the portion where the yarn is brought into contact with or through the introduction nozzle portion of the yarn of the crimping device or or in the vicinity of the introduction nozzle portion of the yarn, or when abrasion occurs, The quality of the crimped yarn changes because the flow rate of the heating fluid changes or the jetting direction of the heating fluid changes, or the yarn does not pass smoothly through the crimping device and the yarn breaks. .

  Substances adhering and depositing on the portion of the crimping device where the yarn comes in contact with and pass through are mainly oily agents and thermal denatured products adhering to the synthetic fiber yarn, monomers and oligomers precipitated from the yarn, and the yarn. It is a polymer or the like scraped off from the strip. In addition, when steam is used as the heating fluid, calcium carbonate, etc., contained in water accumulates near the nozzle for jetting the heating fluid, and when heating air is used, micron-order dirt contained in the air accumulates. I do.

  Further, in the crimping device, the abrasion caused by the passing contact of the yarn is also caused by the yarn component polymer itself, but particularly remarkable when the inorganic compound having high hardness is added to the yarn. . For example, titanium oxide added as a matting agent, kaolin, clay, or the like, or pigments added for producing a soaked yarn, for example, carbon black, iron oxide, in the case of fibers containing magnesium oxide, etc. Notable.

  A method of applying or spraying a fluorine-based coating agent having excellent releasability and heat resistance on a surface of a portion through which a yarn of a crimping device passes, in order to solve the above-described problem that occurs in a crimping device. Is disclosed in Patent Document 1 (see Patent Document 1).

  However, although the technology described in Patent Document 1 has good releasability, the amount of deposits deposited in the crimping device is reduced, but the adhesion between the fluorine-based coating agent and the metal substrate of the crimping device is reduced. However, if the synthetic fiber yarn is continuously crimped, the release agent tends to peel off. The effect can be evaluated by the cleaning cycle of the introduction nozzle portion of the yarn for removing the deposit attached to the introduction nozzle portion of the yarn of the crimping device, but it was one day in the conventional technology. The washing cycle could be extended up to two days. In other words, although a certain effect is recognized, in order to stably continue production of the crimped yarn, the cleaning cycle needs to be greatly extended, and further improvement has been demanded. That is, it is necessary to develop a device capable of greatly extending the cleaning cycle of the yarn introduction nozzle portion of the crimping device. It was necessary to develop a shrinking device.

  Further, from the viewpoint of improving the abrasion resistance of the portion where the yarn passes and comes into contact in the crimping device, almost no improvement was observed in the technique of Patent Document 1. In order to improve the abrasion resistance, it is necessary to increase and improve the hardness of the portion of the crimping device where the yarn passes and contacts, but this is not mentioned at all.

Therefore, the problem of the conventional crimping technology, which is a problem, is prevented from accumulating deposits on the introduction nozzle portion of the yarn of the crimping device, thereby greatly extending the cleaning cycle of the introduction nozzle portion of the yarn. In addition, there has been a demand for the development of a technique for improving the abrasion resistance of the portion of the crimp applying device where the yarn passes and comes into contact.
JP 2000-212843 A

  The present invention has been achieved as a result of studying to solve the problems in the above-described conventional technology.

  Therefore, an object of the present invention is to obtain a stable quality product at low cost. More specifically, in the crimping of synthetic fiber yarns, deposits may accumulate in the crimping device or abrasion may occur at the portion where the yarn passes through and contacts the crimping device. Provided is a yarn crimping device, a method of manufacturing the same, and a method of manufacturing a crimped yarn using the same, which can prevent the quality from being reduced and the occurrence of yarn breakage during the crimping process and can extend the life. It is in.

  A crimping device of the present invention for solving the above-mentioned problems is a crimping device for crimping a synthetic fiber yarn, and a yarn introduction nozzle portion and a heating fluid of the yarn constituting the crimping device. At least a part of the surface of the injection nozzle portion, the deposited portion of the crimped yarn, and the surface of the heating fluid passage of the body is formed of a deposited film, and the characteristic of the deposited film is a contact angle between the deposited film and water. Is from 65 to 115 ° and the coating hardness (normal temperature HV) is from 1500 to 6000.

In the crimping device of the present invention, the following (1) to (3) are each preferred embodiments.
(1) The portion formed by the vapor-deposited film is a contact portion of a synthetic fiber yarn or a contact portion with a heating fluid.
(2) The thickness of the deposited film is 0.5 to 20 μm.
(3) The deposited film is FHC (floric hard coat), CFC (carbon fluoride coat), DLC (diamond-like carbon), TiBN (titanium boron nitride), CrBN (chromium boron nitride), SiBN (silicon boron nitride) , CrN (chromium nitride).

Further, the method for producing a crimping device of the present invention is a method for producing a crimping device for depositing a vapor-deposited film using an organic gas as a raw material. The accelerating voltage of the base material is controlled in a range of -100 to -3 kV under vacuum on the nozzle portion, the piled portion of the crimped yarn, and at least a part of the surface of the heating fluid passage of the body. The method is characterized in that a gas or an organic gas component of a CH-based gas is ionized to form a deposited film. Note that the following (4) and (5) are each preferred embodiments.
(4) The deposited film is any one selected from FHC (floric hard coat), CFC (carbon fluoride coat), and DLC (diamond-like carbon).
(5) The amount of fluorine added to the FHC (floric hard coat) or CFC (carbon fluoride coat) is 2% or more.

  Still another method of manufacturing a crimping device is a method of manufacturing a crimping device that deposits a vapor-deposited film made of a metal as a raw material. Controls the accelerating voltage of the base material in the range of -50 to -2 kV, and ionizes at least one metal component selected from B (boron), Ti (titanium), Cr (chromium), and Si (silicon). The method is further characterized by forming a deposited film by substituting nitrogen.

In addition, the following (6) and (7) are each preferred embodiments. (6) The impurity content of B (boron), Ti (titanium), Cr (chromium), and Si (silicon) is 0.01%. It must be:
(7) The deposited film is made of at least one selected from TiBN (titanium boron nitride), CrBN (chromium boron nitride), SiBN (silicon boron nitride), and CrN (chromium nitride).

Further, a method for producing a crimped yarn of the present invention is a method for producing a crimped yarn made of a synthetic fiber, characterized by using the crimping device.

The present invention is excellent in release properties from synthetic fiber yarns, and by using a crimping device provided with a high-hardness vapor-deposited film having excellent abrasion resistance, the crimped yarn by scraping of the yarn is used. It is possible to prevent the occurrence of yarn breakage due to the deterioration of the quality or the accumulation of dirt, and to extend the life of the crimping device, and to produce crimped yarn with stable quality and high yield.

  The synthetic fiber yarn provided to the crimping device of the present invention is not particularly limited as long as it is a yarn of synthetic fiber. For example, polyamide such as nylon 6, nylon 66, nylon 46, polyethylene terephthalate, polypropylene terephthalate, polybutylene It is a synthetic fiber yarn formed by using a usual thermoplastic polymer such as polyester such as terephthalate and polylactic acid, polyolefin such as polyethylene and polypropylene, polysulfide, polyimide, polyetherketone and polyethernitrile. Further, it includes a copolymer obtained from the above polymer as a main component, and a fiber obtained by blending or compounding the above two or more polymers.

  The crimping device of the present invention is a crimping device for crimping a synthetic fiber yarn, and comprises a yarn introducing nozzle portion, a heating fluid injection nozzle portion, and a crimping portion which constitute the crimping device. At least a part of the deposited portion of the processed yarn and the surface of the heating fluid passage of the body are formed of a deposited film, and the characteristics of the deposited film are such that the contact angle between the deposited film and water is 65 to 115 °, It is a crimping device characterized by having a coating hardness (normal temperature HV) of 1500 to 6000.

  FIG. 1 is a cross-sectional view of one embodiment of the crimp applying apparatus of the present invention, and FIGS. 2A to 2D are cross-sectional views respectively showing an introduction nozzle unit, an ejection nozzle unit, a deposition unit, and a body unit. The crimping device usually includes an introduction nozzle portion, an ejection nozzle portion, a deposition portion, and a body. In the present invention, the yarn introduction nozzle portion and the heating fluid ejection nozzle portion constituting the crimping device are included. The piled portion of the crimped yarn and the surface of the heating fluid passage of the body refer to the thick line portion shown in FIG. 1 and refer to the surface portion of the crimping device with which the synthetic fiber yarn passes and contacts. It is necessary that at least a part of the surface portion of each of these parts is formed of a deposited film.

  One of the characteristics of the deposited film formed in the crimping device of the present invention is that the contact angle between the deposited film and water is in the range of 65 to 115 °. Preferably it is 80 to 105 °. If the angle is less than 65 °, there is no sufficient releasability, so that deposits are deposited particularly on the introduction nozzle portion of the yarn and on the portion where the yarn passes through, and the effect of the present invention cannot be obtained. Substances that are deposited on the portion of the crimping device where the yarn passes through contact are mainly oils and thermal denatured products attached to the synthetic fiber yarn, monomers and oligomers precipitated from the yarn, and the yarn. However, when a vapor-deposited film having releasability is formed on the surface of the crimping device as in the present invention, it hardly accumulates for a long period of time. It is expected that a more preferable mold releasability can be obtained if a surface having a contact angle of 115 ° or more can be formed, but it is difficult to attain the technology as a practical technology at present.

  Note that the contact angle is largely determined by the material of the deposited film. Preferably, a vapor-deposited film made of a fluoride such as FHC or CFC has extremely excellent water repellency and releasability. Furthermore, naturally, the obtained surface morphology differs depending on the vapor deposition method and the vapor deposition device. For example, the raw materials of the vapor deposition film can be roughly classified into a gas system such as an organic gas or a metal system composed of a single metal or alloy. In general, when a gas system is ionized and vapor-deposited, the finish of the substrate surface is reflected without roughening the surface of the substrate. In order to further improve the finish of the surface of the deposited film after the deposition, it is more preferable that the acceleration voltage of the substrate is controlled in the range of -100 to -3 kV, and the amount of added fluorine is maintained at 2% or more. is there.

  In the present invention, the amount of fluorine to be added to the deposited film is determined by, for example, performing quantitative analysis using an electron beam microanalyzer of EPMA-8705 type manufactured by Shimadzu Corporation under the analysis conditions of an acceleration voltage of 8 kV, a sample current of 50 nA, and a beam diameter of φ100 μm. Can be measured.

  On the other hand, when depositing a metal-based material, the ionized metal is caused to physically collide with the surface of the substrate by utilizing a strong potential energy difference from the substrate. Therefore, the stronger the impact energy, the higher the adhesion between the deposited film and the substrate. Thus, the obtained substrate surface is finished to be relatively rougher than the gas system. Therefore, in order to finish the surface roughness in the same manner as in the gas system, the irradiation amount and irradiation speed of the ionized metal are controlled and improved. In order to further improve the finish of the surface of the deposited film after the deposition, it is more preferable to control the acceleration voltage of the base material in the range of −50 to −2 kV. Furthermore, the obtained vapor-deposited film is wrapped to finish the surface.

  In any case, it is preferable that the vapor deposition surface is smooth so that the surface roughness Ra is 0.5 μm or less.

  When deposits accumulate in the crimping device, especially in the vicinity of the heating fluid injection nozzle, the flow rate of the heating fluid changes and the crimping conditions change, so the quality of the crimped crimped yarn is reduced. Change. Usually, the crimp characteristics of the crimped yarn change. When a tufting carpet is manufactured using crimped yarns having different crimp characteristics, different portions of the crimp appear in a streak-like manner, which becomes a so-called vertical streak and significantly impairs the commercial value of the carpet. Change must be managed to a certain extent.

  Usually, in the production of crimped yarns for carpets, crimping characteristics are monitored online in the yarn making process. That is, by applying a certain stretch to the yarn after the crimping process, the crimp is released, the tension generated at that time is measured, and the process is controlled so that the tension falls within a certain range. The production of yarn is continuing. In particular, when deposits accumulate in the vicinity of the yarn introduction nozzle portion, the volume of the heating fluid passing therethrough decreases, or the jetting direction changes, so that the crimping processing conditions change over time, and the crimped yarn Changes the crimping characteristics, and the stretch tension deviates from the control range. In such a case, the yarn introducing nozzle portion of the crimping device is removed, and washing and regeneration are performed. In cleaning and regeneration, since it is necessary to disassemble and assemble the yarn introduction nozzle portion, it has been required to extend the cleaning cycle of the nozzle as much as possible. The application has made it possible to continue using without washing several times or more, usually one week or more, compared to the conventional one or two days.

  The hardness of the deposited film (normal temperature HV) of the crimping device of the present invention is 1500 to 6000. Preferably it is 2000-5000. If it is less than 1500, when the crimping device is used for a long period of time, the portion where the yarn passes through and wears out, and stable crimping cannot be performed, and the crimping device must be replaced. On the other hand, when the deposited film strength is 6000 or more, the abrasion resistance is further improved, but it is difficult to realize with the current technology. The hardness of the vapor-deposited film is determined mainly by the type of a film-forming component for vapor deposition. Therefore, it is important to select the kind of the film forming component suitable for this in order to make the vapor deposition film hardness of the vapor deposition film forming part of the crimping device in the range of 1500 to 6000.

  Note that it is preferable to increase the adhesion by performing ion cleaning in an environment of 10 −3 Torr or more by setting the vacuum chamber to a high vacuum, and it is more preferable to implant ions into the substrate. For this purpose, it is most important to set the accelerating voltage of the base material according to the material of the base material, generate clean plasma, and perform vapor deposition. Further, it is more preferable to use a high-purity metal material for vapor deposition having an impurity content of 0.01% or less.

  In the present invention, the impurity content of the metal raw material is measured, for example, by performing quantitative analysis using an electron beam microanalyzer of EPMA-8705 type manufactured by Shimadzu Corporation, under the analysis conditions of an acceleration voltage of 8 kV, a sample current of 50 nA, and a beam diameter of 100 μm. it can. In addition, specific examples of the impurities contained in the deposited metal in trace amounts include Fe (iron), K (potassium), Ca (calcium), and Na (sodium).

  The reason for forming a high hardness deposited film on the surface of the crimp applying apparatus of the present invention is as follows. That is, the portion where the yarn passes through and contacts the crimp applying device is abraded by the yarn for a long period of time, and particularly when the inorganic compound having high hardness is added to the fiber yarn, the abrasion wear occurs remarkably. However, this is to prevent the wear. Examples of the additive component that easily causes abrasion include, for example, titanium oxide, kaolin, clay, and the like, which are added as a matting agent, or pigments, such as carbon black and iron oxide, which are added to produce a dyed yarn. , Magnesium oxide. Furthermore, in the conventional crimping device, when the deposits accumulate particularly on the injection nozzle portion of the heating fluid and the crimping conditions are out of the production control range, the crimping device is disassembled and cleaned, and reassembled. However, there is a problem that the surface of the yarn introduction nozzle is easily damaged during disassembly and assembly. However, since the crimping device of the present invention has a high hardness deposited film formed on the surface, such a problem can be solved.

  The thickness of the vapor-deposited film formed on the surface of the crimping device of the present invention is usually 0.5 to 20 μm, preferably 1 to 15 μm. At present, it is difficult to commercialize vapor deposition having a thickness of less than 0.5 μm. It also has the disadvantage that it is susceptible to mechanical damage such as bruising. On the other hand, a thickness exceeding 20 μm is unnecessary because the effect aimed at by the present invention is already saturated and the vapor deposition cost increases. The properties of the surface of the vapor-deposited film formed on the surface of the crimping device of the present invention are as described above, but specific vapor-deposited film components and vapor-deposition methods are as follows.

  In the present invention, a specific metal or a special compound is vapor-deposited on a surface of a crimp applying device, at least a portion where a thread passes and contacts, to form a vapor-deposited film. The substrate used in the crimping device is not particularly limited as long as it is a metal. Conventionally used metals such as stainless steel, iron and chromium molybdenum steel are used, but stainless steel is usually preferred.

  The components of the vapor-deposited film formed on the surface of the crimping device of the present invention by vapor deposition are fluorocarbon-based, fluorine-based compound FHC (floric hard coat), CFC (carbon fluoride coat), and carbon-based DLC (diamond-like carbon). , Boron-based TiBN (titanium boron nitride), CrBN (chromium boron nitride), SiBN (silicon boron nitride), Cr-based CrN (chromium nitride), titanium alloy-based TiCN (titanium carbonitride), TiN (titanium nitride) , TiALN (titanium aluminum nitride), other SiC (silicon carbide), and other metal processed products and ceramic compounds.

  These vapor-deposited films are excellent in releasability from a thermoplastic polymer and are excellent in corrosion resistance against an acid or alkali aqueous solution. In particular, fluorocarbon-based and fluorine-based compounds such as FHC (floric hard coat), CFC (carbon fluoride coat), carbon-based DLC (diamond-like carbon), boron-based TiBN (titanium boron nitride), and CrBN (chromium boron nitride) , SiBN (silicon boron nitride), and Cr-based CrN (chromium nitride) exhibit more excellent corrosion resistance.

  In the present invention, the vapor deposition on the crimping apparatus is performed by any of a PVD method (Physical Vapor Deposition Process: physical vapor deposition) or a CVD method (Chemical Vapor Deposition Process: chemical vapor deposition). It can be carried out. However, the PVD method (physical vapor deposition) has a lower processing temperature at the time of vapor deposition than the CVD method, and is therefore a preferable method for vapor deposition on the crimping apparatus of the present invention. However, among the CVD methods, the P-CVD method (plasma CVD) can be deposited under a low-temperature environment equivalent to that of the PVD method.

  A specific method of forming a vapor-deposited film on the crimp applying apparatus of the present invention is, for example, as follows. First, as a pretreatment of the metal base material prior to the vapor deposition, the base material is washed in order to easily form a deposited film on the surface of the metal base material. A solvent such as ethanol or thinner is used for cleaning the substrate, and thereafter, ultrasonic cleaning is performed in water to remove foreign matter that has entered pores and the like. Further, pure water or water conditioning is used as the finish cleaning water.

If the above pretreatment is properly performed, the adhesion of the deposited film is not impaired, but ion cleaning may be performed as a more preferable substrate cleaning method. Using a vacuum furnace, the inside of the furnace is evacuated to a vacuum of 10 ⁻² to 10 ⁻⁷ Torr, and an ion gun serving as an ion source or a high frequency (RF) or DC voltage is applied to a substrate or an electrode. Ar) is introduced to generate plasma. Argon ions (Ar) are caused to collide with the substrate at a potential difference, and the collision energy removes oxide films and deposits on the substrate surface.

  Next, the inside of the vacuum furnace used at the time of vapor deposition processing is also sufficiently cleaned. This is because if a metal or a metal oxide that has been previously subjected to vapor deposition adheres to the inside of the vacuum furnace, it is vaporized during vapor deposition and is vapor-deposited on the substrate as an impurity component. In order to prevent this, it is preferable to perform cleaning by attaching a thin metal plate to the inner surface of the vacuum furnace and replacing it after vapor deposition, or by coating the inner surface of the vacuum furnace with a release agent to prevent the adhesion of oxides and the like. There is also a method in which shots are sandblasted at locations where masking or the like cannot be performed due to complicated shapes, and the previous film is removed by physical impact.

In addition, a vacuum pump type must be selected according to the conditions for evacuation of the vacuum furnace, that is, the degree of vacuum. When used in an environment where the degree of vacuum is high (10 ^-1 Torr or more), a turbo molecular pump or a cryopump may be used so that lubricating oil such as an oil rotary pump does not flow back into the furnace due to vacuum. The maintenance condition of the pump also has an extremely large weight for the quality of the coating, so it is necessary to sufficiently maintain the condition.

Regarding the vapor deposition method formed in the crimp applying apparatus of the present invention, the PVD method and the CVD method will be described in detail below.
(1) PVD method: As a main device, an ionization vapor deposition device, an ion plating vapor deposition device, a sputtering device, an arc ion plating device, or the like is used. In a vacuum environment, a positively charged atom is put into an ion state in a metal substrate to be vapor-deposited, and a negative voltage is applied to the metal substrate using the energy of a strong potential to rapidly ionize the metal substrate surface. And vapor-deposited.

The apparatus used in the PVD method performs processing in a vacuum environment using a vacuum furnace. The degree of vacuum is once reached to 10 ^-5 to 10 ^-7 Torr, and Ti, nitrogen gas, hydrocarbon-based gas (acetylene gas) is used. Gas) or a gas such as an argon gas as a carrier gas, and is finally treated at 10 ^-2 to 10 ^-4 Torr. The processing temperature is 100 to 400C, preferably 100 to 280C. By performing the treatment in this temperature range, it is possible to prevent deterioration of the mechanical properties of the deposited film, thermal deformation, cracks and breakage due to stress concentration on a complicated shape portion of the metal base material, and the like. The deposition time varies depending on the thickness of the deposition, but is usually 1 to 5 hours.
(2) CVD method: As in the PVD method, a vacuum furnace is used, and for example, a thermal CVD apparatus, a DC plasma CVD apparatus, a high-frequency plasma CVD apparatus, or the like is used. In this method, a metal substrate to be vapor-deposited is heated to a high temperature in a reduced-pressure container at normal pressure, and a raw material gas is brought into contact with the metal substrate to vapor-deposit and coat the metal substrate surface by a chemical reaction. The degree of vacuum at this time is first made to reach 1 to 10 ^-5 Torr, and then a reaction gas is introduced and finally the treatment is performed at normal pressure to 10 ^-3 Torr. The processing temperature in the thermal plasma apparatus is 500 to 1200 ° C, preferably 500 to 600 ° C. The processing temperature in a DC plasma CVD apparatus or a high-frequency plasma CVD apparatus is 100 to 400 ° C., and low-temperature film formation equivalent to that of a PVD apparatus is possible. The deposition time varies depending on the thickness of the deposited film, but is usually 1 to 5 hours.

  Since a thermal CVD apparatus performs a film forming process in a high temperature environment, mechanical properties are degraded, deformation due to thermal strain, and cracks and breakage due to stress concentration are likely to occur in a complicated shape. Therefore, this method is used for applications that require a relatively simple shape and little accuracy. Regardless of which of the above methods is used, in the inside of the yarn introduction nozzle portion and the heating fluid injection nozzle portion of the crimping device of the present invention, the yarn introduction nozzle portion and the heating fluid In some cases, a deposited film is formed up to the inside of the injection nozzle portion, and a method of forming a film from a reaction gas such as a CVD method is preferable. As in the case of PVD sputtering, the metal is melted in a vacuum furnace, and the ions can only progress linearly as in the case of sputtering, so that the ions reach the inside of the yarn introduction nozzle and the heated fluid injection nozzle. It is difficult. For this reason, when selecting a vapor-based material for vapor deposition, or when selecting a metal-based material, devising the arrangement of an ion source and a metal substrate, or performing vapor deposition several times to form a vapor-deposited film using a polymer tube Perform processing.

Next, a method for producing a vapor-deposited film of seven preferred examples of the vapor-deposited film of the crimping device of the present invention will be described below.
(1) FHC (Floric Hard Coat): A film is formed by a PVD ion plating apparatus. The crimping device is set on a rotary table of a vacuum furnace, and rotated in one of forward and reverse directions at 30 to 100 rpm. Vacuum is drawn by a vacuum pump to make the degree of vacuum 10 ⁻³ to 10 ⁻⁶ Torr, argon gas (Ar) is introduced, and the degree of vacuum is controlled to 10 ⁻² to 10 ⁻³ Torr to perform ion cleaning. A CF-based gas (CF ₄ or C ₃ F ₈ ) is introduced from the introduction nozzle into the vacuum furnace. Plasma is generated by applying voltage or high frequency with a hot filament to ionize the CF-based gas. Evaporated particles that have become positive ions by applying a positive voltage to the actively moving thermoelectrons are accelerated and collide with the crimping device biased to a negative DC voltage. The evaporated particles that have reached the surface of the crimping device are rapidly cooled and solidified to form a film. The processing is performed at a temperature of a vacuum furnace of 100 to 400 ° C, preferably 100 to 250 ° C.

(2) CFC (carbon fluoride coating): A film is formed by a P-CVD apparatus of a CVD method. The crimping device is set on a rotary table of a vacuum furnace, and rotated in one of forward and reverse directions at 30 to 100 rpm. Vacuum is drawn by a vacuum pump to a degree of vacuum of 10 ⁻³ to 10 ⁻⁶ Torr, argon gas (Ar) is introduced, and the degree of vacuum is controlled to 10 ⁻² to 10 ⁻³ Torr to perform ion cleaning. A CF-based gas (CF ₄ or C ₃ F ₈ ) and a CH-based gas (C ₆ H ₆ , C ₂ H ₂ or CH ₄ ) are introduced into a vacuum furnace from an introduction nozzle. A high frequency or DC voltage of 13.56 MHz or 27.12 MHz is applied to the crimp applying device, or a high frequency is applied to the electrode, and a DC voltage is applied to the crimp applying device to generate plasma around the crimp applying device. The generated CF gas and CH-based gas are ionized. The CF gas and the CH-based gas are accelerated by the electric field toward the crimp applying device biased to the DC negative voltage and go straight. The evaporated particles that have reached the surface of the crimping device are rapidly cooled and solidified to form a film. The processing is performed at a temperature of a vacuum furnace of 100 to 400 ° C, preferably 100 to 250 ° C.
(3) DLC (diamond-like carbon): There are a method of forming a film with an ion plating apparatus of the PVD method and a method of forming a film with a P-CVD apparatus of the CVD method. First, a film forming process is performed by the ion plating apparatus of the PVD method. The crimping device is set on a rotary table of a vacuum furnace, and rotated in one of forward and reverse directions at 30 to 100 rpm. Vacuum is drawn by a vacuum pump to make the degree of vacuum 10 ⁻³ to 10 ⁻⁶ Torr, argon gas (Ar) is introduced, and the degree of vacuum is controlled to 10 ⁻² to 10 ⁻³ Torr to perform ion cleaning. A CH-based gas (C ₆ H ₆ , C ₂ H ₂ or CH ₄ ) is introduced from the introduction nozzle into the vacuum furnace. Plasma is generated by applying voltage or high frequency with a hot filament to ionize the CH-based gas. Evaporated particles that have become positive ions by applying a positive voltage to the actively moving thermoelectrons are accelerated and collide with the crimping device biased to a negative DC voltage. The evaporated particles that have reached the surface of the crimping device are rapidly cooled and solidified to form a film. The processing is performed at a temperature of a vacuum furnace of 100 to 400 ° C, preferably 100 to 250 ° C. Next, in a method of forming a film by a P-CVD device of the CVD method, a crimp applying device is set on a rotary table of a vacuum furnace and rotated in one of forward and reverse directions at 30 to 100 rpm. Vacuum is drawn by a vacuum pump to a degree of vacuum of 10 ⁻³ to 10 ⁻⁶ Torr, argon gas (Ar) is introduced, and the degree of vacuum is controlled to 10 ⁻² to 10 ⁻³ Torr to perform ion cleaning. A CH-based gas (C ₆ H ₆ , C ₂ H ₂ or CH ₄ ) is introduced from the introduction nozzle into the vacuum furnace. A high frequency or DC voltage of 13.56 MHz or 27.12 MHz is applied to the crimping device, or a high frequency is applied to the electrode, and a DC voltage is further applied to the crimping device to generate plasma around the crimping device. generate. The CF gas and the CH-based gas are accelerated by the electric field toward the crimp applying device biased to the DC negative voltage and go straight. The evaporated particles that have reached the surface of the crimping device are rapidly cooled and solidified to form a film. The processing is performed at a temperature of a vacuum furnace of 100 to 400 ° C, preferably 100 to 250 ° C.
(4) TiBN (titanium boron nitride): A film is formed by a PVD arc ion plating deposition apparatus (AIP) or a sputtering deposition apparatus. The crimping device is set on a rotary table of a vacuum furnace, and rotated in one of forward and reverse directions at 30 to 100 rpm. Vacuum is drawn by a vacuum pump to make the degree of vacuum 10 ⁻³ to 10 ⁻⁶ Torr, argon gas (Ar) is introduced, and the degree of vacuum is controlled to 10 ⁻² to 10 ⁻³ Torr to perform ion cleaning. When a voltage is applied to the electrode, a glow discharge occurs, and argon (Ar) is used as a sputtering gas, a target of boron (B) and titanium nitride (TiN) is used, or TiB (titanium boron) or TiBN (titanium nitride) is used. (Boron) metal target. When the plasma is violently sputtered on the surface of the metal target, atoms of the metal target are repelled, and the deposited particles become ions. There, nitrogen gas is introduced. The treatment is performed at a temperature in a vacuum furnace of 200 to 400C, preferably 200 to 250C. The negative electric charges are applied to the crimp applying device by using the energy of the strong potential to attract atoms to the surface of the metal base material at a high speed, thereby forming a film on the surface of the crimp applying device.
(5) CrBN (chromium boron nitride): A film is formed by an arc ion plating deposition apparatus (AIP) or a sputtering deposition apparatus of a PVD method. The crimping device is set on a rotary table of a vacuum furnace, and rotated in one of forward and reverse directions at 30 to 100 rpm. Vacuum is drawn by a vacuum pump to make the degree of vacuum 10 ⁻³ to 10 ⁻⁶ Torr, argon gas (Ar) is introduced, and the degree of vacuum is controlled to 10 ⁻² to 10 ⁻³ Torr to perform ion cleaning. When a voltage is applied to the electrodes, glow discharge occurs, and argon (Ar) is used as a sputtering gas, and a target of boron (B) and chromium nitride (CrN) is used, or CrB (chromium boron) or CrBN (titanium nitride) is used. (Boron) metal target. Alternatively, when the surface of the metal target using a boron (B) and chromium (Cr) target is violently sputtered by plasma, the atoms of the metal target are repelled, and the deposited particles become ions. There, nitrogen gas is introduced. The treatment is performed at a temperature in a vacuum furnace of 200 to 400C, preferably 200 to 250C. The negative electric charges are applied to the crimp applying device by using the energy of the strong potential to attract atoms to the surface of the metal base material at a high speed, and a film is formed on the surface of the crimp applying device.
(6) SiBN (silicon boron nitride): A film is formed by a PVD arc ion plating deposition apparatus (AIP) or a sputtering deposition apparatus. The crimping device is set on a rotary table of a vacuum furnace, and rotated in one of forward and reverse directions at 30 to 100 rpm. Vacuum is drawn by a vacuum pump to make the degree of vacuum 10 ⁻³ to 10 ⁻⁶ Torr, argon gas (Ar) is introduced, and the degree of vacuum is controlled to 10 ⁻² to 10 ⁻³ Torr to perform ion cleaning. When a voltage is applied to the electrodes, a glow discharge occurs, and argon (Ar) is used as a sputtering gas, and a target of boron (B) and silicon nitride (SiN) is used. Alternatively, SiB (chromium boron) or SiBN (silicon nitride) is used. (Boron) metal target. Alternatively, the plasma is violently sputtered on the surface of the metal target using a boron (B) and silicon (Si) target, whereby atoms of the metal target are repelled, and vapor deposition particles become ions. There, nitrogen gas is introduced. The treatment is performed at a temperature in a vacuum furnace of 200 to 400C, preferably 200 to 250C. The negative electric charges are applied to the crimp applying device by using the energy of the strong potential to attract atoms to the surface of the metal base material at a high speed, thereby forming a film on the surface of the crimp applying device.
(7) CrN (Chromium Nitride): A film is formed by a PVD arc ion plating deposition apparatus. The degree of vacuum in the vacuum furnace is set to 10 ^-6 to 10 ^-7 Torr, and nitrogen gas is introduced therein. The treatment is performed at a temperature in a vacuum furnace of 200 to 400C, preferably 200 to 250C. Chromium is placed in the center of the vacuum furnace, and Cr is locally melted by an arc power supply. The molten chromium is vaporized in a vacuum environment, turns positively charged chromium atoms into an ionic state, and uses the energy of the strong potential to flow a negative charge to the crimping device to apply a high speed to the metal substrate surface. Attracts atoms to form a film on the surface of the crimping device.

  An example of a method for producing a crimped synthetic fiber yarn using the crimping device of the present invention will be described below.

  The thermoplastic polymer is melted by an extruder type spinning machine and spun through a filter for polymer filtration and a die having a large number of pores. The yarn spun from the die is cooled and solidified by cold air. As the cold air, warm air of about 80 to 30 ° C or more or cold air of 30 to 15 ° C is used. Next, the yarn is wound around a take-up roller after being provided with an oil agent containing a surfactant as a main component, and taken up at a predetermined take-up speed. The take-off speed is 300 to 2000 m / min, usually 500 to 1500 m / min. The take-up yarn is wound around a plurality of pairs of rollers rotating at a high speed sequentially without being wound once, and is stretched by a speed difference between the pair of rollers. Normally, the film is stretched in one or two stages at a stretching ratio of 2.0 to 4.0 and then guided to a crimping device to be crimped. The crimping device is composed of, for example, the device shown in FIG. 1 and has the following functions. The steam ejection hole nozzle sucks the thermoplastic synthetic fiber yarn by ejecting high-temperature, usually 100 to 160 ° C. saturated steam or superheated steam heated to 150 to 400 ° C., and entangles and winds with the steam. Perform shrinking processing. Depending on the required characteristics of the crimped yarn, a method of blowing yarn together with steam from the steam jet nozzle, or a compression chamber in which fibers are connected to the steam jet nozzle and installed, that is, a stuffing box. After the treatment, the yarn is crimped by a method of blowing out the yarn together with the steam. In the stuffing box, the crimped yarn is further subjected to indentation crimping processing and heat setting treatment, and a porous member that collides the fiber nozzle installed under the injection nozzle portion of the heating fluid or the stuffing box, that is, a rotary filter or It is blown out together with the steam on the fixed filter. A rotary member is generally used as a porous member for causing fiber yarns to collide with a recent increase in crimping processing speed.

  The vapor-deposited film in the crimping device of the present invention includes at least a surface of a yarn introduction nozzle portion, a heating fluid ejection nozzle portion, and a crimped yarn deposition portion constituting the crimping device. Although it is necessary to form a part, the part refers to a part of the crimping nozzle device with which the yarn passes and contacts, and is the whole or a part of the part 7 shown in FIG. . In particular, the most effective is deposition of the yarn on the introduction nozzle portion 2 and the yarn deposition portion 3 where the deposits and the abrasion easily occur.

  The yarn cooled on the rotary filter is subjected to predetermined stretching and elongation to loosen the crimp and monitor the tension of the crimped yarn when the stretch is applied (referred to as stretch tension). Stretching is performed by winding the crimped yarn around two pairs of rollers having different speeds, and monitoring is performed by a continuous tension meter installed between the rollers. In order to produce crimped yarn of a certain quality, it is necessary to monitor the tension and produce a crimped yarn falling within a certain tension range. When the stretching tension is out of the control range, most of the tension is caused by a change in crimp processing conditions due to dirt or abrasion of the crimping device. . The replaced steam injection nozzle can be reused if it is not worn after cleaning.

  When the crimping device of the present invention is used, the cleaning cycle for removing the steam injection hole nozzle can be extended from the conventional 1-2 days to 5 days or more, usually 1 week or more. The replacement cycle of the yarn introduction nozzle due to abrasion can be continuously used for about 10 months or more from the conventional 3 to 4 months, usually for 1 year or more.

  The crimped yarn that has passed through the stretch tension monitoring unit is entangled by the entanglement imparting device, bundled, and wound.

Next, the present invention will be specifically described with reference to examples and comparative examples. The evaluation methods of each characteristic used in the following examples will be described.
(1) Deposited film thickness: A stylus scanning roughness meter was used for the roughness measurement. As a measurement model, a test piece partially masked is placed in a “Sulfcoder” (SE1700) evaporation furnace of Kosaka Laboratory Co., Ltd., and the masking is removed after the evaporation processing. Since the masking portion is not deposited, there is a step difference from the deposition portion. The step was measured by a cross-sectional curve of a stylus-scanning-type roughness measuring instrument.
(2) Contact angle with water: A test piece made of the same material as the crimping member or the crimping device is vapor-deposited, and then 2.5 cc of distilled water is dropped on the test piece to reduce the contact angle. It was measured with a contact angle automatic measuring instrument. The measurement was performed in an environment at a temperature of 24 ± 2 ° C. and a humidity of 60 ± 5%. "ACT-PRODUCTS" (VCA-OPTIMA apparatus) was used as the contact angle automatic measuring device.
(3) Deposited film hardness: The deposited film formed portion was measured by the Vickers hardness test method of JIS-B7734. As the Vickers hardness tester, "MVK-E" manufactured by Akashi Seisakusho Co., Ltd. was used.
(4) Washing cycle of the yarn introduction nozzle: In the crimping device shown in FIG. 1, the range of tension when a 2-7% stretch is applied to the crimped yarn is set to 100 to 150 gf. When the tension was set below the lower limit (100 gf), the steam injection nozzle was removed and the washing was performed. The average number of days until the tension reached the lower limit of the set value was determined, and this was defined as the cleaning cycle of the yarn introduction nozzle.

The continuous tension measuring device used here was TMS (tension, monitoring, system) manufactured by Eiko Sokki Co., Ltd.
(5) Wear life: The wear life of the steam injection nozzle until the tension reached the lower limit was determined in the same manner as in (4) due to the wear of the yarn introduction nozzle, and the wear life was determined. In addition, the tension reached the lower limit, the tension did not recover to a normal value even when the introduction nozzle of the yarn was washed and reinstalled, and wear was confirmed by observing the introduction nozzle of the yarn. . In addition, the effect of the present invention was relatively shown assuming that the life of Comparative Example 4 according to the prior art is 1.
(Examples 1 to 10, Comparative Examples 1 to 4)
Nylon 6 polymer chips containing 0.1% by weight of titanium oxide and having a relative viscosity of sulfuric acid of 2.6 were melted and spun using an extruder type spinning machine.

  The spinning temperature was 260 ° C. as the polymer temperature in the spin pack, and the die was formed into a crimped yarn of 1150 dtex-54fil using 54 holes having a Y-shaped cross section. Cold air at 20 ° C. was blown onto the spun yarn at a speed of 30 m / min from a direction perpendicular to the spun yarn to cool and solidify.

  Next, after applying the oil agent to the yarn, the yarn was wound around a take-up roller rotating at a predetermined speed and taken up. The take-up yarn was continuously wound without being wound once, wound around a separate type paired roller whose speed was sequentially increased, and stretched in one step. The single-stage drawn yarn was continuously guided to a crimping device and subjected to a crimping process. The crimping apparatus used was a yarn introduction nozzle portion, a heating fluid injection nozzle portion, and the entire surface of the portion of the crimped yarn accumulation portion that comes into contact with the yarn (portion 7 in FIG. 1). 1) having a vapor-deposited film formed thereon, comprising a steam injection hole nozzle, a compression chamber (stuffing box) into which the fiber yarn is pushed, and a porous member (rotary filter) for impinging the fiber yarn. . 0.8 MPa superheated steam of 230 ° C. is blown out from the steam injection nozzle, the yarn is sucked, crimped, and the stuffing box is heat-fixed in the stuffing box, and then crimped together with steam from the stuffing box. The yarn was ejected downward. The crimped yarn was placed under a stuffing box at an interval of about 5 mm, and was sprayed with steam on a rotating rotary filter and transported while being cooled.

  Next, the crimped yarn was pulled out from the rotary filter and stretched by 5% between two pairs of separate rollers to loosen the crimp, and at the same time, the tension was measured by a stretch tension measuring instrument. Thereafter, the crimped yarn was entangled at 15 pcs / m through an entanglement imparting device, and then wound.

  In the present example, the crimping apparatus used a conventional SUS630 as a base material, performed a deposition film forming process specified in the present invention on the surface of the base material, and evaluated the effect. In Comparative Example 3, a conventional SUS630 untreated product was sprayed with a fluorine-based coating agent on the same portion as the vapor-deposited film forming portion of the example, and in Comparative Example 4, a conventional SUS630 untreated product was used. And evaluated. It can be seen that the use of the crimping device on which the vapor-deposited film of the present invention is formed can significantly extend the cleaning cycle of the steam injection nozzle and the replacement cycle for abrasion.

It is a figure showing the section of an example of the crimp giving device of the present invention. (A), (b), (c), and (d) are diagrams showing examples of vapor deposition (thick line portions) of the cross sections of each part of the crimp applying apparatus of the present invention.

Explanation of reference numerals

1: yarn introduction nozzle portion 2: heating fluid injection nozzle portion 3: crimped yarn accumulation portion 4: body 5: screw (for mounting heating fluid injection nozzle)
6: Screw (for mounting the stacking part)
7: Evaporated film 8: Thread inlet 9: Thread outlet 10: Heated fluid passage

Claims (11)

A crimping device for crimping a synthetic fiber yarn, comprising a yarn introduction nozzle portion, a heating fluid injection nozzle portion, and a crimped yarn stacking portion that constitute the crimping device. At least a part of the surface of the heating fluid passage of the body is formed of a deposited film, and the deposited film has a contact angle with water of 65 to 115 ° and a coating hardness (normal temperature HV) of 1500 to 6000. Characteristic crimping device. The crimping device according to claim 1, wherein the portion formed by the vapor-deposited film is a contact portion of a synthetic fiber yarn or a contact portion with a heating fluid. The crimping device according to claim 1, wherein a thickness of the vapor deposition film is 0.5 to 20 μm. The deposited film is made of FHC (floric hard coat), CFC (carbon fluoride coat), DLC (diamond-like carbon), TiBN (titanium boron nitride), CrBN (chromium boron nitride), SiBN (silicon boron nitride), CrN ( The crimping device according to any one of claims 1 to 3, comprising at least one selected from the group consisting of chromium nitride).
In a method of manufacturing a crimping device for depositing a vapor-deposited film made of an organic gas as a raw material, a nozzle for introducing a yarn constituting a crimping device, an injection nozzle for a heating fluid, and a crimped yarn are formed. The accelerating voltage of the base material is controlled in a range of -100 to -3 kV under vacuum on at least a part of the surface of the heating fluid passage of the deposition part and the body, and the organic gas component of the CF-based gas or the CH-based gas is ionized. And forming a vapor deposition film. 6. The crimping apparatus according to claim 5, wherein the vapor-deposited film is one selected from the group consisting of FHC (floric hard coat), CFC (carbon fluoride coat), and DLC (diamond-like carbon). Method. The method according to claim 6, wherein the amount of fluorine added to the FHC (floric hard coat) or CFC (carbon fluoride coat) is 2% or more. In a method of manufacturing a crimping apparatus for depositing a vapor-deposited film made of a metal as a raw material, the accelerating voltage of a substrate is set to -50 to -2 kV under vacuum on at least a part of a surface of a die including a discharge hole of a melt spinning die. , And at least one metal component selected from B (boron), Ti (titanium), Cr (chromium), and Si (silicon) is ionized and further substituted with nitrogen to form a deposited film. A method for producing a crimping device. The method according to claim 8, wherein the impurity content of the B (boron), Ti (titanium), Cr (chromium), and Si (silicon) is 0.01% or less. 9. The method according to claim 8, wherein the deposited film is made of at least one selected from TiBN (titanium boron nitride), CrBN (chromium boron nitride), SiBN (silicon boron nitride), and CrN (chromium nitride). A method for manufacturing a crimping device. A method for producing a crimped yarn made of synthetic fibers, wherein the method for producing a crimped yarn according to any one of claims 1 to 5 is used.

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