JP2004262044A - Apparatus for flushing mask - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for flushing a mask which can suppress scattering of a washing liquid jetted from washing nozzles as much as possible. <P>SOLUTION: A mask fixing plate 5 for fixing the mask which is an object to be washed under a condition where the mask is stood, and a mask fixing cylinder 4 are provided in the apparatus for flushing the mask. In addition, washing nozzles 6a and 6b are arranged both on the surface side and the back face side of the mask fixed by the plate 5 and the cylinder 4, and jet the washing liquid on these faces, cylinders 9a and 9b for elevating and lowering for moving slidably the washing nozzles 6a and 6b in the up and down direction, and scattering-proof covers 11a and 11b which are arranged in the neighborhood of the washing nozzles 6a and 6b, are elevated and lowered with the washing nozzles 6a and 6b, and are formed in curved sectional shapes, and whose opening parts are arranged by facing to the mask sides, are provided. It is thereby possible to prevent the washing liquid from being scattered and to prevent the washing liquid from sticking on a driving device or the like. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a mask cleaning apparatus for cleaning a mask used for screen printing, and more particularly to a technique for preventing scattering of a cleaning liquid used for cleaning.
[0002]
[Prior art]
In general, a mask used for screen printing may need to be periodically cleaned because cream solder may adhere or clog if the frequency of use is increased. For cleaning such a mask, a mask cleaning machine is used. As a conventional example of this type of mask cleaning machine, for example, a screen plate cleaning apparatus described in Japanese Patent Application Laid-Open No. Hei 10-71705 (hereinafter referred to as Patent Document 1) is known.
[0003]
In Patent Document 1, a screen plate is fixed to a holder in an upright state, and a cleaning liquid is sprayed from cleaning nozzles provided on both sides of the screen plate. Further, the holder is slid up and down so that the cleaning liquid hits the entire screen plate.
[0004]
The screen, the holder supporting the screen, and the cleaning nozzle are entirely covered by a casing, and a funnel-shaped partition plate is formed below the casing. Therefore, the cleaning liquid sprayed from the cleaning nozzle is collected in the tank via the partition plate after cleaning the screen plate.
[0005]
[Patent Document 1]
JP-A-10-71705 (FIG. 1)
[0006]
[Problems to be solved by the invention]
However, in the cleaning device described in Patent Literature 1, the cleaning liquid sprayed from the cleaning nozzle hits the screen plate and then scatters throughout the casing, so that the cleaning operation of the casing is not easy. Further, since the cleaning liquid adheres to the components of the vertical drive unit of the screen plate, much labor is required at the time of maintenance.
[0007]
The present invention has been made to solve such a conventional problem, and an object of the present invention is to provide a mask cleaning apparatus that minimizes scattering of a cleaning liquid sprayed from a cleaning nozzle. It is in.
[0008]
[Means for Solving the Problems]
In order to achieve the above object, the invention according to claim 1 of the present application is directed to a mask cleaning apparatus for cleaning a mask used for screen printing, wherein: a fixing means for fixing a mask to be cleaned in an upright state; A cleaning nozzle that is disposed on both the first surface side and the second surface side of the mask fixed to the fixing means, and that sprays a cleaning liquid onto the first surface and the second surface; Raising and lowering means for sliding movement in the direction, and being disposed in the vicinity of the washing nozzle, moving up and down together with the washing nozzle, being formed into a curved cross-section, and having an opening facing the first surface and the second surface. Scatter prevention means provided.
[0009]
According to a second aspect of the present invention, there is provided a recovery means provided below the fixing means for recovering the cleaning liquid jetted from the cleaning nozzle.
[0010]
According to a third aspect of the present invention, there is provided an advancing / retreating cylinder for advancing / retreating the cleaning nozzle disposed on one of the first surface and the second surface with respect to a mask. It is characterized by having.
[0011]
The invention according to claim 4 is characterized in that the scattering prevention means is set such that the distance between the upper end and the mask is smaller than the distance between the lower end and the mask.
[0012]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a front view showing a configuration of an embodiment of a mask cleaning apparatus according to the present invention, and FIG. 2 is a plan view of the same. As shown in the figure, the mask cleaning apparatus 1 includes a casing 2 having a rectangular parallelepiped shape as a whole, and a hopper (recovery means) 3 having a substantially V-shaped cross section provided at a lower portion of the casing 2. ing.
[0013]
The casing portion 2 is provided with a mask fixing plate (fixing means) 5 for fixing a mask to be cleaned in a central portion, and a mask fixing cylinder (fixing means) is provided at a portion opposed to the mask fixing plate 5. ) 4 is provided. Therefore, the mask to be cleaned is set so as to be in contact with the mask fixing plate 5, and the stroke of the mask fixing cylinder 4 is extended in this state, so that the mask can be fixed to the mask fixing plate 5.
[0014]
Further, when the mask is fixed to the mask fixing plate 5, cleaning nozzles for spraying a cleaning liquid are provided on portions on the front side (first surface side) and the back side (second surface side) of the mask. 6a and 6b are provided.
[0015]
The cleaning nozzles 6a and 6b are fixed to brackets 7a and 7b, and the brackets 7a and 7b are slidably mounted along rails 8a and 8b that are provided upright along the vertical direction.
[0016]
Pneumatically operated cylinders (elevating / lowering means) 9a, 9b are erected near the inside of the two opposing surfaces of the casing part 2, and the stroke parts 10a, 10b of the cylinders 9a, 9b are It is connected to the brackets 7a and 7b described above. Therefore, when the stroke portions 10a, 10b of the cylinders 9a, 9b move in the up-down direction, the brackets 7a, 7b slide along the rails 8a, 8b, thereby causing the cleaning nozzles 6a, 6b to move. Works up and down.
[0017]
Further, a cylinder 19 for advancing and retreating the cleaning nozzle 6b is attached to the bracket 7b. When the mask is attached / detached, the cleaning nozzle 6b is retracted so that the interval between the cleaning nozzles 6a and 6b is increased. An operation is performed in which the nozzle 6b is extended to switch so that the cleaning liquid is sprayed close to the mask.
[0018]
The brackets 7a and 7b are provided with scattering prevention covers (scattering prevention means) 11a and 11b each having a U-shaped cross section (curved shape) and opening toward the mask.
[0019]
FIG. 3 is an explanatory diagram schematically showing the positional relationship between the mask 22, the cleaning nozzles 6a and 6b, and the scattering prevention covers 11a and 11b. As shown in FIG. 3, the distance between the mask 22 and the cleaning nozzles 6a and 6b is illustrated. T1 is about 2 to 3 [mm]. The interval T2 between the upper ends p of the scattering prevention covers 11a and 11b and the mask 22 is about 10 [mm], and the interval T3 between the lower end q and the mask 22 is about 30 [mm].
[0020]
As shown in FIGS. 1 and 2, a strainer 12 is attached to the lower end of the hopper 3 so that the used cleaning liquid is collected and reused via the strainer 12. Has become.
[0021]
Furthermore, a compressor 13 for generating compressed air and a cleaning liquid recovery pump 14 for recovering used cleaning liquid are provided.
[0022]
FIG. 4 is a flowchart showing a piping system for compressed air and a piping system for cleaning liquid. First, the compressed air piping will be described. The output of the compressor 13 is connected to the solenoid valve SV1 via the air tank 16 and the stop valve V1, and the output terminal of the solenoid valve SV1 is connected to the solenoid valves SV2 and SV3. , SV4.
[0023]
An output end of the solenoid valve SV2 is connected to a cylinder 17 for opening and closing a door, an output end of the solenoid valve SV3 is connected to cylinders 9a and 9b for lifting and lowering the cleaning nozzles 6a and 6b, and an output end of the solenoid valve SV4 is It is connected to the solenoid valve SV5 and the regulator RG1.
[0024]
The output end of the solenoid valve 5 is introduced into the cleaning liquid tank 21 via a check valve V2. The output end of the regulator RG1 is introduced to the cleaning nozzles 6a and 6b via the solenoid valve SV6 and the check valve V3.
[0025]
On the other hand, the piping system of the cleaning liquid will be described. A stop valve V5 and solenoid valves SV7 and SV8 are provided on the output end side of the recovery liquid tank 18 for accumulating the collected cleaning liquid. It is introduced into the cleaning liquid tank 21. The cleaning liquid tank 21 is connected to the cleaning nozzles 6a and 6b via a check valve V4. Further, the cleaning liquid tank 21 is provided with a drain valve V6.
[0026]
Next, the operation of the mask cleaning apparatus 1 according to the present embodiment configured as described above will be described. When cleaning the mask to be cleaned, first, the mask is set on the mask fixing plate 5 shown in FIGS. 1 and 2, and in this state, the mask fixing cylinder 4 is extended, and the mask is fixed to the mask fixing plate 5. Fixed to. The door opening / closing operation is performed by the solenoid valve SV2 and the door opening / closing cylinder 17 shown in FIG.
[0027]
Thereafter, the nozzle advance / retreat cylinder 19 is extended, and the cleaning nozzle 6b is moved to the mask side. In this state, when the compressor 13 shown in FIG. 4 is started and the solenoid valves SV1, SV4 and SV5 are turned on, compressed air is introduced into the cleaning liquid tank 21, and the cleaning liquid stored in the cleaning liquid tank 21 is compressed by air pressure. Are sent to the cleaning nozzles 6a and 6b.
[0028]
Thus, the pressurized cleaning liquid is jetted from the cleaning nozzles 6a and 6b, so that the mask fixed to the mask fixing plate 5 can be cleaned. Then, by turning on the solenoid valve SV3 and moving the cylinders 9a and 9b for raising and lowering the cleaning nozzles 6a and 6b, the cleaning liquid can be sprayed on the entire mask, and the entire mask can be cleaned uniformly.
[0029]
At this time, as described above, since the scattering prevention covers 11a and 11b are attached around the cleaning nozzles 6a and 6b, the sprayed cleaning liquid does not scatter to the entire casing portion 2 and the scattering prevention cover 11a , 11b and fall into the hopper 3. Thereafter, the cleaning liquid is recovered in the hopper section 3, and after the impurities are removed by the strainer 12, the cleaning liquid is returned to the recovery liquid tank 18.
[0030]
Next, a switching operation of turning off the solenoid valve SV5 and turning on the solenoid valve SV6 shown in FIG. 4 is performed. Then, compressed air output from the compressor 13 is introduced into the cleaning nozzles 6a and 6b, so that air is jetted onto the mask to which the cleaning liquid is attached, and the mask can be dried. Thus, the cleaning of the mask is performed by spraying the cleaning liquid.
[0031]
In this manner, in the mask cleaning apparatus 1 according to the present embodiment, the cleaning liquid is sprayed on the mask to be cleaned, and the cleaning nozzles 6a and 6b are moved in the vertical direction, so that the mask can be cleaned evenly. it can. Further, by covering the cleaning nozzles 6a, 6b with the scattering prevention covers 11a, 11b having a U-shaped cross section, scattering of the cleaning liquid can be prevented, and the used cleaning liquid after cleaning is collected by the hopper 3. Since the cleaning liquid is returned to the collection liquid tank 18, the cleaning liquid can be effectively reused.
[0032]
In addition, since the cleaning liquid does not scatter in the casing 2, the cleaning liquid does not adhere to the driving device and the like, and labor during maintenance can be reduced.
[0033]
In the present embodiment, an example in which the scattering prevention covers 11a and 11b have a U-shaped cross section has been described. However, the present invention is not limited to this. It is needless to say that the present invention can be applied to any shape that can prevent scattering of the cleaning liquid, such as a “-” shape.
[0034]
【The invention's effect】
As described above, in the mask cleaning apparatus according to the present invention, the provision of the scattering prevention means makes it possible to prevent the cleaning liquid sprayed from the cleaning nozzle from scattering into the casing. Therefore, it is possible to prevent the cleaning liquid from adhering to various devices mounted in the casing, such as the driving devices, and to easily perform maintenance and other operations.
[0035]
Further, the used cleaning liquid once injected is recovered by the recovery means and reused, so that the cleaning liquid can be used effectively. Further, the cleaning nozzle arranged on one surface side of the mask can be moved forward and backward by the forward / backward cylinder, so that when the mask is attached / detached, the cleaning nozzle is retracted to increase the distance between the opposed cleaning nozzles, and during cleaning. Efficient cleaning can be performed by bringing the cleaning nozzle close to the mask.
[0036]
In addition, since the distance between the upper end of the scattering prevention means and the mask is set to be smaller than the distance between the lower end and the mask, scattering of the cleaning liquid can be more effectively prevented, and the cleaning liquid can be efficiently used. Can be collected well.
[Brief description of the drawings]
FIG. 1 is a side view showing a configuration of a mask cleaning apparatus according to an embodiment of the present invention.
FIG. 2 is a plan view showing a configuration of a mask cleaning apparatus according to one embodiment of the present invention.
FIG. 3 is an explanatory diagram schematically showing a positional relationship between a mask to be cleaned, a cleaning nozzle, and a scattering prevention cover.
FIG. 4 is a flowchart showing a supply system of compressed air and cleaning water.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Mask cleaning device 2 Casing part 3 Hopper part 4 Mask fixing cylinder (fixing means)
5 Mask fixing plate (fixing means)
6a, 6b Cleaning nozzles 7a, 7b Brackets 8a, 8b Rails 9a, 9b Cylinder (elevating means)
10a, 10b Stroke portions 11a, 11b Splash prevention cover (scatter prevention means)
12 Strainer 13 Compressor 14 Cleaning liquid recovery pump 16 Air tank 17 Cylinder (for opening and closing door)
18 Recovered liquid tank 19 Cylinder (cylinder for advance / retreat)
21 Cleaning liquid tank 22 Mask

Claims (4)

In a mask cleaning apparatus for cleaning a mask used for screen printing,
Fixing means for fixing the mask to be cleaned in an upright state,
A cleaning nozzle that is disposed on both the first surface side and the second surface side of the mask fixed to the fixing unit, and that sprays a cleaning liquid on the first surface and the second surface;
Lifting means for slidingly moving the washing nozzle in the vertical direction,
Scattering prevention means installed in the vicinity of the cleaning nozzle, moved up and down together with the cleaning nozzle, formed into a curved cross-sectional shape, and having an opening disposed toward the first surface and the second surface;
A mask cleaning apparatus comprising: A mask cleaning apparatus, further comprising a recovery unit provided below the fixing unit and configured to recover the cleaning liquid ejected from the cleaning nozzle. 2. An advancing / retracting cylinder for moving the cleaning nozzle disposed on one of the first surface and the second surface with respect to a mask. Alternatively, the mask cleaning apparatus according to claim 2. The said scattering prevention means is set so that the space | interval of an upper end part and a mask may become smaller than the space | interval of a lower end part and a mask, The claim 1 characterized by the above-mentioned. Mask cleaning equipment.

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