JP2004249723A5 - - Google Patents

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JP2004249723A5
JP2004249723A5 JP2004014045A JP2004014045A JP2004249723A5 JP 2004249723 A5 JP2004249723 A5 JP 2004249723A5 JP 2004014045 A JP2004014045 A JP 2004014045A JP 2004014045 A JP2004014045 A JP 2004014045A JP 2004249723 A5 JP2004249723 A5 JP 2004249723A5
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led
characteristic
current value
light
light amount
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JP2004014045A
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JP4808929B2 (en
JP2004249723A (en
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Publication of JP2004249723A5 publication Critical patent/JP2004249723A5/ja
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Claims (11)

ＬＥＤを光源として感光材料を露光する露光装置の製造方法において、
前記ＬＥＤに基準電流値を印加して発光させ、前記ＬＥＤから照射される光の分光特性及び光量を測定する工程と、
前記分光特性及び前記光量に基づいた第１のＬＥＤ特性を求める工程と、
前記第１のＬＥＤ特性を、前記光量を測定するためのセンサの感度特性に基づいて補正して第２のＬＥＤ特性を求める工程と、
前記第２のＬＥＤ特性を、前記感光材料の波長感度特性に基づいて補正して第３のＬＥＤ特性を求める工程と、
前記第３のＬＥＤ特性が、基準特性になるように設定電流値を決定する工程と、
を有することを特徴とする露光装置の製造方法。 In an exposure apparatus manufacturing method for exposing a photosensitive material using an LED as a light source,
Applying a reference current value to the LED to emit light, and measuring a spectral characteristic and a light amount of light emitted from the LED; and
Obtaining a first LED characteristic based on the spectral characteristic and the light amount;
Correcting the first LED characteristic based on a sensitivity characteristic of a sensor for measuring the light amount to obtain a second LED characteristic;
Correcting the second LED characteristic based on the wavelength sensitivity characteristic of the photosensitive material to obtain a third LED characteristic;
Determining a set current value so that the third LED characteristic becomes a reference characteristic;
An exposure apparatus manufacturing method characterized by comprising: 前記第２のＬＥＤ特性を求める工程と前記第３のＬＥＤ特性を求める工程を同時に行う請求項１に記載の露光装置の製造方法。 2. The method of manufacturing an exposure apparatus according to claim 1 , wherein the step of obtaining the second LED characteristic and the step of obtaining the third LED characteristic are performed simultaneously. 前記光量が基準光量となるように、前記基準電流値を補正する工程を、更に有する請求項１又は２に記載の露光装置の製造方法。 Wherein such amount is a reference amount of light, a process for correcting the reference current value, a manufacturing method of an exposure apparatus according to claim 1 or 2 further comprising. ＬＥＤを光源として感光材料を露光する露光装置の製造方法において、
前記ＬＥＤに第１の電流値を印加して発光させ、前記ＬＥＤから照射される光の分光特性及び光量を測定する工程と、
前記光量が基準光量となるように、前記第１の電流値を補正して第２の電流値を決定する工程と、
前記分光特性及び前記基準光量に基づいた第１のＬＥＤ特性を求める工程と、
前記第１のＬＥＤ特性を、前記光量を測定するためのセンサの感度特性に基づいて補正して第２のＬＥＤ特性を求める工程と、
前記第２のＬＥＤ特性を、前記感光材料の波長感度特性に基づいて補正して第３のＬＥＤ特性を求める工程と、
前記第３のＬＥＤの特性が、基準特性になるように前記第２の電流値を補正して第３の電流値を決定する工程と、
を有することを特徴とする露光装置の製造方法。 In an exposure apparatus manufacturing method for exposing a photosensitive material using an LED as a light source,
Applying a first current value to the LED to emit light, and measuring the spectral characteristics and the amount of light emitted from the LED; and
Correcting the first current value and determining a second current value so that the light amount becomes a reference light amount; and
Obtaining a first LED characteristic based on the spectral characteristic and the reference light amount;
Correcting the first LED characteristic based on a sensitivity characteristic of a sensor for measuring the light amount to obtain a second LED characteristic;
Correcting the second LED characteristic based on the wavelength sensitivity characteristic of the photosensitive material to obtain a third LED characteristic;
Correcting the second current value so that the characteristic of the third LED becomes a reference characteristic and determining a third current value;
An exposure apparatus manufacturing method characterized by comprising: 前記第１のＬＥＤ特性は、予め定められたＬＥＤプロファイルデータを前記分光特性及び前記基準光量に基づいて修正することによって求める請求項４に記載の露光装置の製造方法。 5. The exposure apparatus manufacturing method according to claim 4 , wherein the first LED characteristic is obtained by correcting predetermined LED profile data based on the spectral characteristic and the reference light amount. 前記分光特性は、ピーク波長である請求項１〜５の何れか一項に記載の露光装置の製造方法。 The spectral characteristics, a manufacturing method of an exposure apparatus according to any one of claims 1 to 5, which is the peak wavelength. 前記分光特性は、前記ＬＥＤから照射される光の最大光量を有する波長の１／２の光量を有する短波長側の第１の半値波長と、前記最大光量を有する波長の１／２の光量を有する長波長側の第２の半値波長との平均により求められた仮想のピーク波長である請求項１〜５の何れか一項に記載の露光装置の製造方法。 The spectral characteristics include a first half-value wavelength on the short wavelength side having a light amount that is ½ of a wavelength having a maximum light amount of light emitted from the LED, and a light amount that is ½ of a wavelength having the maximum light amount. The exposure apparatus manufacturing method according to claim 1 , which is a virtual peak wavelength obtained by averaging with the second half-value wavelength on the long wavelength side. 前記ＬＥＤはＲ光用ＬＥＤである請求項１〜７の何れか一項に記載の露光装置の製造方法。 The LED manufacturing method of an exposure apparatus according to any one of claims 1 to 7, an LED for R light. 前記ＬＥＤはＲ光用ＬＥＤであり、前記感光材料の波長感度特性は長波長側の波長感度特性である請求項１〜７の何れか一項に記載の露光装置の製造方法。 8. The method of manufacturing an exposure apparatus according to claim 1 , wherein the LED is an LED for R light, and the wavelength sensitivity characteristic of the photosensitive material is a wavelength sensitivity characteristic on a long wavelength side. ＬＥＤを光源として感光材料を露光する露光装置であって、
前記ＬＥＤに基準電流値を印加して発光させ、前記ＬＥＤから照射される光の分光特性及び光量を測定する工程と、
前記ＬＥＤに基準電流値を印加して発光させ、前記ＬＥＤから照射される光の分光特性及び光量を測定する工程と、
前記分光特性及び前記光量に基づいた第１のＬＥＤ特性を求める工程と、
前記第１のＬＥＤ特性を、前記光量を測定するためのセンサの感度特性に基づいて補正して第２のＬＥＤ特性を求める工程と、
前記第２のＬＥＤ特性を、前記感光材料の波長感度特性に基づいて補正して第３のＬＥＤ特性を求める工程と、
前記第３のＬＥＤ特性が、基準特性になるように設定電流値を決定する工程と、を有する調整方法によって、前記ＬＥＤが調整されたことを特徴とする露光装置。 An exposure apparatus that exposes a photosensitive material using an LED as a light source,
Applying a reference current value to the LED to emit light, and measuring a spectral characteristic and a light amount of light emitted from the LED; and
Applying a reference current value to the LED to emit light, and measuring a spectral characteristic and a light amount of light emitted from the LED; and
Obtaining a first LED characteristic based on the spectral characteristic and the light amount;
Correcting the first LED characteristic based on a sensitivity characteristic of a sensor for measuring the light amount to obtain a second LED characteristic;
Correcting the second LED characteristic based on the wavelength sensitivity characteristic of the photosensitive material to obtain a third LED characteristic;
An exposure apparatus wherein the LED is adjusted by an adjustment method including a step of determining a set current value so that the third LED characteristic becomes a reference characteristic. ＬＥＤを光源として感光材料を露光する露光装置であって、
前記ＬＥＤに第１の電流値を印加して発光させ、前記ＬＥＤから照射される光の分光特性及び光量を測定する工程と、
前記光量が基準光量となるように、前記第１の電流値を補正して第２の電流値を決定する工程と、
前記分光特性及び前記基準光量に基づいた第１のＬＥＤ特性を求める工程と、
前記第１のＬＥＤ特性を、前記光量を測定するためのセンサの感度特性に基づいて補正して第２のＬＥＤ特性を求める工程と、
前記第２のＬＥＤ特性を、前記感光材料の波長感度特性に基づいて補正して第３のＬＥＤ特性を求める工程と、
前記第３のＬＥＤの特性が、基準特性になるように前記第２の電流値を補正して第３の電流値を決定する工程と、を有する調整方法によって、前記ＬＥＤが調整されたことを特徴とする露光装置。 An exposure apparatus that exposes a photosensitive material using an LED as a light source,
Applying a first current value to the LED to emit light, and measuring the spectral characteristics and the amount of light emitted from the LED; and
Correcting the first current value and determining a second current value so that the light amount becomes a reference light amount; and
Obtaining a first LED characteristic based on the spectral characteristic and the reference light amount;
Correcting the first LED characteristic based on a sensitivity characteristic of a sensor for measuring the light amount to obtain a second LED characteristic;
Correcting the second LED characteristic based on the wavelength sensitivity characteristic of the photosensitive material to obtain a third LED characteristic;
Correcting the second current value to determine a third current value so that the characteristic of the third LED becomes a reference characteristic, and adjusting the LED, A featured exposure apparatus.
JP2004014045A 2003-01-27 2004-01-22 Exposure apparatus manufacturing method and light source adjusted exposure apparatus Expired - Fee Related JP4808929B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004014045A JP4808929B2 (en) 2003-01-27 2004-01-22 Exposure apparatus manufacturing method and light source adjusted exposure apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003017932 2003-01-27
JP2003017932 2003-01-27
JP2004014045A JP4808929B2 (en) 2003-01-27 2004-01-22 Exposure apparatus manufacturing method and light source adjusted exposure apparatus

Publications (3)

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JP2004249723A JP2004249723A (en) 2004-09-09
JP2004249723A5 true JP2004249723A5 (en) 2007-03-01
JP4808929B2 JP4808929B2 (en) 2011-11-02

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* Cited by examiner, † Cited by third party
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JP2006218746A (en) * 2005-02-10 2006-08-24 Fuji Photo Film Co Ltd Exposure head, method for correcting quantity of light thereof, and exposure device
JP2006330163A (en) * 2005-05-24 2006-12-07 Citizen Watch Co Ltd Exposure device and manufacturing method for exposure device
JP4901246B2 (en) * 2006-03-15 2012-03-21 財団法人２１あおもり産業総合支援センター Spectral luminance distribution estimation system and method

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JPH1032681A (en) * 1996-07-16 1998-02-03 Asahi Optical Co Ltd Color image reader and its adjustment method
JPH1199698A (en) * 1997-09-26 1999-04-13 Minolta Co Ltd Image forming apparatus
JP2001018450A (en) * 1999-07-09 2001-01-23 Konica Corp Image recording apparatus
JP4618904B2 (en) * 2001-02-08 2011-01-26 Ｈｏｙａ株式会社 Electronic endoscope device

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