JP2004235435A5 - - Google Patents
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- Publication number
- JP2004235435A5 JP2004235435A5 JP2003022088A JP2003022088A JP2004235435A5 JP 2004235435 A5 JP2004235435 A5 JP 2004235435A5 JP 2003022088 A JP2003022088 A JP 2003022088A JP 2003022088 A JP2003022088 A JP 2003022088A JP 2004235435 A5 JP2004235435 A5 JP 2004235435A5
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Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003022088A JP4252813B2 (en) | 2003-01-30 | 2003-01-30 | Charged beam lens, charged beam exposure apparatus and device manufacturing method |
| EP11195133.1A EP2434522B8 (en) | 2002-07-16 | 2003-07-08 | Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| EP03254334.0A EP1383158B1 (en) | 2002-07-16 | 2003-07-08 | Charged-particle beam lens |
| US10/615,955 US6946662B2 (en) | 2002-07-16 | 2003-07-10 | Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003022088A JP4252813B2 (en) | 2003-01-30 | 2003-01-30 | Charged beam lens, charged beam exposure apparatus and device manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004235435A JP2004235435A (en) | 2004-08-19 |
| JP2004235435A5 true JP2004235435A5 (en) | 2006-03-09 |
| JP4252813B2 JP4252813B2 (en) | 2009-04-08 |
Family
ID=32951255
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003022088A Expired - Fee Related JP4252813B2 (en) | 2002-07-16 | 2003-01-30 | Charged beam lens, charged beam exposure apparatus and device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4252813B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4745739B2 (en) * | 2005-07-06 | 2011-08-10 | キヤノン株式会社 | Electrostatic lens apparatus, exposure apparatus, and device manufacturing method |
| KR101384260B1 (en) * | 2005-12-05 | 2014-04-11 | 전자빔기술센터 주식회사 | Method for focusing electron beam in electron column |
| JP5669636B2 (en) * | 2011-03-15 | 2015-02-12 | キヤノン株式会社 | Charged particle beam lens and exposure apparatus using the same |
| JP5744579B2 (en) * | 2011-03-15 | 2015-07-08 | キヤノン株式会社 | Charged particle beam lens and exposure apparatus using the same |
| JP5886663B2 (en) * | 2012-03-21 | 2016-03-16 | 株式会社日立ハイテクノロジーズ | Electron beam application device and lens array |
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2003
- 2003-01-30 JP JP2003022088A patent/JP4252813B2/en not_active Expired - Fee Related