JP2004214640A - Sealed vessel with internal atmosphere switching mechanism - Google Patents

Sealed vessel with internal atmosphere switching mechanism Download PDF

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JP2004214640A
JP2004214640A JP2003416848A JP2003416848A JP2004214640A JP 2004214640 A JP2004214640 A JP 2004214640A JP 2003416848 A JP2003416848 A JP 2003416848A JP 2003416848 A JP2003416848 A JP 2003416848A JP 2004214640 A JP2004214640 A JP 2004214640A
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vacuum
container
holding
valve
valve mechanism
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JP4326931B2 (en
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Yukio Minami
幸男 皆見
Shinichi Ikeda
信一 池田
Takeshi Tanigawa
毅 谷川
Michio Yamaji
道雄 山路
Akihiro Morimoto
明弘 森本
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Fujikin Inc
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Fujikin Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a sealed vessel which can hold vacuum or pressure and which can readily eject particles inside the vessel. <P>SOLUTION: The vessel is constituted of a vessel body, a vessel lid which is detachably fixed on the vessel body in a sealed manner, and an internal atmosphere switching mechanism 4, which comprises a vacuum-holding valve mechanism 17 and a pressure-holding vacuum breaking valve mechanism 18. The vacuum-keeping valve mechanism 17 opens and closes the communicating passages 19 to 22 for communication between the inside of the vessel body and the outside of the vessel lid. The vacuum-holding valve mechanism 17 is configured so that a valve is opened to produce vacuum in the vessel body, when vacuum is produced in an operation space, formed outside the container lid and the valve, is opened to hold a predetermined vacuum level in the vessel body, when the operation space is opened to the atmosphere. The pressure-holding vacuum breaking valve mechanism 18 is configured so that a valve will be closed to pressurize the vessel body, when the operation space is pressurized, and the valve will be closed to hold a predetermined pressure level in the vessel body when the operation space is opened to the atmosphere. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

本発明は、主として半導体製造装置や光学露光装置、精密機械装置、化学品製造装置等の技術分野に於いて使用されるウエハ等の密閉容器(真空ポッド)の改良に関するものであり、密閉容器内の雰囲気を真空又は加圧の状態に迅速且つ確実に切替え保持することができると共に、密閉容器内部のパージによるパーティクルの排出を高能率で、しかも切替え操作時の外部からのパーティクルの侵入を防止しつつ行なえるようにした内部雰囲気切替機構付密閉容器に関するものである。   The present invention relates to an improvement of a closed container (vacuum pod) for a wafer or the like used mainly in a technical field such as a semiconductor manufacturing apparatus, an optical exposure apparatus, a precision machine apparatus, and a chemical product manufacturing apparatus. The atmosphere can be quickly and reliably switched to a vacuum or pressurized state, and particles can be efficiently discharged by purging the inside of the sealed container, and particles can be prevented from entering from outside during the switching operation. The present invention relates to an airtight container with an internal atmosphere switching mechanism that can be operated while moving.

半導体製造装置の分野に於いては、従前から被処理物であるシリコンウエハの各処理工程間の移送に所謂真空ポッドと呼ばれる小型密閉容器が汎用されている。
上記真空ポッドを用いたハンドリングシステムはSMIF(Standard Mechanical Interface)システムとして広く知られているものであり、(1)ウエハー等を格納して移送するための密閉容器であるポッドと、(2)半導体処理ツール上に設けられてあって小型のクリーン・スペースを与える入出力(I/O)ミニ環境(このクリーン環境内でウエハーがポッド内から処理ツール内へ、又は処理ツール内からポッド内へ移送される)と、(3)ポッドとミニ環境間でウエハを汚損することなく移送するためのインターフェース等とからシステムが構成されている(US特許第4,532,970号等)。
2. Description of the Related Art In the field of semiconductor manufacturing equipment, a small closed container called a so-called vacuum pod has been widely used for transferring a silicon wafer as an object to be processed between processing steps.
A handling system using the above-mentioned vacuum pod is widely known as a standard mechanical interface (SMIF) system. (1) A pod which is a closed container for storing and transferring wafers and the like, and (2) a semiconductor. An input / output (I / O) mini environment provided on the processing tool to provide a small clean space (in this clean environment, wafers are transferred from the pod to the processing tool or from the processing tool to the pod) And (3) an interface for transferring the wafer between the pod and the mini-environment without soiling, etc. (US Pat. No. 4,532,970).

ところで、前記SMIFシステムでは、密閉容器であるポッド内部の真空引きやポッド内部のパージを前記インターフェース若しくはミニ環境の内部に設けたロードロック室を利用して行なう構成としているため、必然的に設備が大型化すると共に設備費が高騰することになる。
そのため、各種の解決策が検討されているものの、何れもロードロック室等を用いることなしに密閉容器であるポッド内部を真空又は加圧状態に迅速且つ確実に切換え保持することが困難であり、問題点を解決するまでには至っていない。
By the way, in the SMIF system, since the inside of the pod, which is a closed container, is evacuated and the inside of the pod is purged by using the load lock chamber provided in the interface or the mini environment, equipment is inevitably provided. As the size increases, the cost of equipment increases.
Therefore, although various solutions have been studied, it is difficult to quickly and reliably switch and hold the inside of the pod, which is a sealed container, to a vacuum or pressurized state without using a load lock chamber or the like, The problem has not been resolved.

米国特許第4532970号U.S. Pat. No. 4,532,970

本発明は、従前の密閉容器である真空ポッドを利用したウエハ等の処理・搬送システムに於ける上述の如き問題、即ち真空ポッド内部の真空引きやパージのためにロードロック室等の特別な設備を必要とし、設備の小型化や設備費の引下げを図れないと云う問題を解決せんとするものであり、真空ポッドを形成する密閉容器の容器蓋体に真空保持用弁機構と加圧保持真空破壊用弁機構とから成る内部雰囲気切替機構を組み込み、容器蓋体の外方に設けた外部空間を大気、真空又は加圧の状態に切換えて密閉容器の内部を真空又は加圧の状態に保持する構成とすることにより、ロードロック室等の特別な設備費を用いることなしに密閉容器内の真空引きやパージ、格納したウエハの処理用チャンバへの移送及び処理用チャンバからの処理済みウエハの再格納等をできるようにした内部雰囲気切替機構付密閉容器を提供せんとするものである。   The present invention relates to the above-mentioned problems in a processing / transferring system for wafers and the like using a vacuum pod which is a conventional closed container, that is, a special facility such as a load lock chamber for evacuation and purging inside the vacuum pod. In order to solve the problem that it is not possible to reduce the size of the equipment and reduce the cost of equipment, a valve mechanism for vacuum holding and a pressure holding vacuum are provided on the container lid of the closed container forming the vacuum pod. Built-in internal atmosphere switching mechanism consisting of a release valve mechanism, switches the external space provided outside the container lid to the atmosphere, vacuum or pressurized state and keeps the inside of the sealed container at vacuum or pressurized state With such a configuration, evacuation and purging in the sealed container, transfer of the stored wafers to the processing chamber, and processed wafers from the processing chamber can be performed without using special equipment costs such as a load lock chamber. The inside atmosphere switching mechanism with a sealed container to allow the wafer restoring the like there is provided cents.

請求項1の発明は、容器本体と、容器本体に気密に且つ着脱自在に固定された容器蓋体と、容器蓋体に気密に設けられ、容器本体内部と容器蓋体の外部とを連通する連通路を夫々開閉する真空保持用弁機構及び加圧保持真空破壊用弁機構を備えた内部雰囲気切替機構とから形成され、且つ前記真空保持用弁機構を、容器蓋体の外部に形成した操作空間を真空としたときには開弁して容器本体内を真空にすると共に、操作空間を大気に開放したときには閉弁して容器本体内を所定の真空度に保持する弁機構に、また前記加圧保持真空破壊用弁機構を、容器本体内を真空保持状態から大気圧に戻すために操作空間を加圧したときには開弁して容器本体内を加圧真空破壊すると共に、操作空間を大気に開放したときには閉弁して容器本体内を所定の加圧度に保持する弁機構に、夫々構成したことを発明の基本構成とするものである。   According to the first aspect of the present invention, a container body, a container lid air-tightly and detachably fixed to the container body, and a container lid air-tightly provided to communicate the inside of the container body with the outside of the container lid. An operation in which an internal atmosphere switching mechanism provided with a vacuum holding valve mechanism for opening and closing the communication passage and a pressure holding vacuum breaking valve mechanism, respectively, and wherein the vacuum holding valve mechanism is formed outside the container lid. When the space is evacuated, the valve is opened to evacuate the inside of the container body, and when the operation space is opened to the atmosphere, the valve is closed to close the valve and maintain a predetermined degree of vacuum in the container body. When the operation space is pressurized in order to return the inside of the container body from the vacuum holding state to the atmospheric pressure, the valve mechanism for holding vacuum release is opened to break the container body by pressurized vacuum and open the operation space to the atmosphere. Is closed, the inside of the container body A valve mechanism for holding the 圧度, in which the basic configuration of the invention that it has respective configurations.

請求項2の発明は、請求項1の発明に於いて、操作空間を、密閉容器の容器蓋体の下方と処理用チャンバのボトムプレートの上方との間に形成し、処理用チャンバの壁体に形成した流通路を通して操作空間内を真空、大気圧及び加圧状態に保持するようにしたものである。   According to a second aspect of the present invention, in the first aspect, the operation space is formed between a lower portion of the container lid of the closed container and an upper portion of the bottom plate of the processing chamber. The inside of the operation space is maintained at a vacuum, an atmospheric pressure and a pressurized state through a flow passage formed as described above.

請求項3の発明は、請求項1の発明に於いて、真空保持用弁機構と加圧保持真空破壊用弁機構とを共通のボディに隣接して設けるようにしたものである。また、請求項4の発明は、請求項1の発明に於いて、真空保持用弁機構と加圧保持真空破壊用弁機構とを共通のボディに隣接して設けると共に、各連通路の入口端及び出口端に夫々フィルタを配設するようにしたものである。   According to a third aspect of the present invention, in the first aspect of the invention, the vacuum holding valve mechanism and the pressure holding vacuum breaking valve mechanism are provided adjacent to a common body. According to a fourth aspect of the present invention, in the first aspect of the present invention, a vacuum holding valve mechanism and a pressure holding vacuum breaking valve mechanism are provided adjacent to a common body, and an inlet end of each communication passage is provided. And a filter at the outlet end.

請求項5の発明は、請求項1の発明に於いて、真空保持用弁機構と加圧保持真空破壊用弁機構を夫々別体として容器蓋体に設けるようにしたものである。また、請求項6の発明は、請求項1の発明に於いて、真空保持用弁機構と加圧保持真空破壊用弁機構を夫々別体として容器蓋体の外周縁部に対向状に配置すると共に、各連通路の入口端及び出口端に夫々フィルタを配設するようにしたものである。   According to a fifth aspect of the present invention, in the first aspect of the invention, the vacuum holding valve mechanism and the pressure holding vacuum breaking valve mechanism are separately provided on the container lid. According to a sixth aspect of the present invention, in the first aspect of the present invention, the vacuum holding valve mechanism and the pressure holding vacuum breaking valve mechanism are separately provided and opposed to the outer peripheral edge of the container lid. In addition, filters are provided at the inlet end and the outlet end of each communication passage.

請求項7の発明は、請求項1の発明に於いて、真空保持用弁機構と加圧保持真空破壊用弁機構の何れか一方又は両方に、夫々の弁機構の機能を外部から任意に妨げる手段を設けるようにしたものである。   According to a seventh aspect of the present invention, in the first aspect of the present invention, any one or both of the vacuum holding valve mechanism and the pressure holding vacuum breaking valve mechanism arbitrarily prevents the functions of the respective valve mechanisms from the outside. Means are provided.

請求項8の発明は、請求項1の発明に於いて、真空保持用弁機構及び加圧保持真空破壊用弁機構をダイヤフラム型バルブとすると共に、そのダイヤフラム弁体をステンレス製、ゴム製又は弗素ゴム製ダイヤフラム弁体としたものである。   The invention of claim 8 is the invention of claim 1, wherein the vacuum holding valve mechanism and the pressure holding vacuum breaking valve mechanism are diaphragm type valves, and the diaphragm valve body is made of stainless steel, rubber or fluorine. It is a rubber diaphragm valve element.

請求項9の発明は、請求項1の発明に於いて、内部雰囲気切替機構のボディの厚みを容器蓋体の厚みとほぼ同一にすると共に、前記ボディを容器蓋体の一部へ気密状に挿着固定するようにしたものである。   According to a ninth aspect of the present invention, in the first aspect of the invention, the thickness of the body of the internal atmosphere switching mechanism is made substantially the same as the thickness of the container lid, and the body is hermetically sealed to a part of the container lid. It is designed to be inserted and fixed.

請求項10の発明は、請求項1の発明に於いて、加圧保持真空破壊用弁機構をダイヤフラム型バルブとし、外部からダイヤフラム弁体を開弁状態に保持することにより、密閉容器内を大気圧に保つ構成としたものである。   According to a tenth aspect of the present invention, in the first aspect of the present invention, the inside of the closed container is enlarged by using a diaphragm-type valve as the pressure holding vacuum breaking valve mechanism and holding the diaphragm valve body in an open state from the outside. It is designed to be kept at atmospheric pressure.

請求項11の発明は、請求項1の発明に於いて、真空保持用弁機構をダイヤフラム型バルブとし、外部からダイヤフラム弁体を開弁状態とすることにより、密閉容器内を大気圧とする構成としたものである。   According to an eleventh aspect of the present invention, in the first aspect, the vacuum holding valve mechanism is a diaphragm type valve, and the diaphragm valve body is opened from the outside to make the inside of the closed vessel an atmospheric pressure. It is what it was.

本発明に係る内部雰囲気切替機構付密閉容器に於いては、容器蓋体に真空保持用弁機構と加圧保持真空破壊用弁機構とを備えた内部雰囲気切替機構を気密状に挿着し、密閉容器の容器蓋体側の外部に形成した操作空間を真空、大気、加圧の状態とすることにより前記両弁機構を開閉操作し、密閉容器の内部を真空又は加圧の状態に切替え保持する構成としている。
その結果、操作空間の内部圧力を真空、大気又は加圧の状態とするだけで密閉容器の内部を所定の真空度又は加圧度に保持することができると共に、前記真空状態と加圧状態を繰り返えすことによって密閉容器内部の所謂パージを行なうこともでき、従前の真空ポッドを用いたハンドリングシステムのように、複雑な機構のロードロック室等を具備しなくても、密閉容器(真空ポッド)を用いたハンドリングを高能率で行なうことが可能となり、設備費や半導体製造コストの大幅な引下げが可能となる。
本発明は上述の通り優れた実用的効用を奏するものである。
In the closed container with an internal atmosphere switching mechanism according to the present invention, the internal atmosphere switching mechanism provided with a vacuum holding valve mechanism and a pressure holding vacuum breaking valve mechanism in the container lid body is hermetically inserted, The operation space formed outside the container lid side of the closed container is set to a vacuum, air, and pressurized state to open and close the two valve mechanisms, and the inside of the closed container is switched to a vacuum or pressurized state and held. It has a configuration.
As a result, the inside of the closed container can be maintained at a predetermined degree of vacuum or pressurization only by setting the internal pressure of the operation space to vacuum, atmospheric or pressurized, and the vacuum state and pressurized state can be maintained. By repeating the process, so-called purging of the inside of the closed container can be performed. Even if a load lock chamber or the like having a complicated mechanism is not provided as in a conventional handling system using a vacuum pod, the closed container (vacuum pod) may be used. ) Can be handled with high efficiency, and equipment costs and semiconductor manufacturing costs can be significantly reduced.
The present invention has excellent practical utility as described above.

以下、図面に基づいて本発明の実施形態を説明する。
図1及び図2は、本発明に係る内部雰囲気切替機構付密閉容器(以下密閉容器と呼ぶ)の使用状態の説明図であり、図に於いてAはウエハ、1は密閉容器、2は容器本体、3は密閉容器蓋体、4は内部雰囲気切替機構、5は処理用チャンバ、6はチャンバ本体、7は処理用チャンバのボトムプレート、8は流通路、9は操作空間、10・11・12はOリングである。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIGS. 1 and 2 are explanatory views of a use state of a closed container with an internal atmosphere switching mechanism according to the present invention (hereinafter referred to as a closed container). In the drawings, A is a wafer, 1 is a closed container, and 2 is a container. Main body, 3 is a closed container lid, 4 is an internal atmosphere switching mechanism, 5 is a processing chamber, 6 is a chamber main body, 7 is a bottom plate of the processing chamber, 8 is a flow passage, 9 is an operation space, 10 · 11 · 12 is an O-ring.

前記密閉容器1は、アルミニウムやエンジニアリングプラスチックから成る容器本体2と容器蓋体3とから形成されており、その内部には適宜数の被処理物であるウエハAが格納されている。
また、容器蓋体3はOリング10を介して容器本体2の下方開口部へ着脱自在に挿着されており、Oリング10により気密性が保持されている。
更に、容器蓋体3は、容器本体2へロック機構(図示省略)を介して着脱自在に固定されている。
The hermetically sealed container 1 is formed of a container body 2 made of aluminum or engineering plastic and a container lid 3, in which an appropriate number of wafers A to be processed are stored.
The container lid 3 is detachably inserted into the lower opening of the container body 2 via the O-ring 10, and the O-ring 10 maintains airtightness.
Further, the container lid 3 is detachably fixed to the container main body 2 via a lock mechanism (not shown).

尚、前記容器蓋体3の下面側には、ボトムプレート7の突出部7aを着脱自在に係合する係合機構(図示省略)が設けられており、処理用チャンバ5の上方開口部へ密閉容器1をセットした際に、前記ボトムプレート7の突出部7aが係合機構(図示省略)によって容器蓋体3の下面側へ係合されると共に、蓋体3の下方とボトムプレート7の上方との間に気密状の操作空間9が形成される。   An engagement mechanism (not shown) is provided on the lower surface side of the container lid 3 to detachably engage the projection 7a of the bottom plate 7, and is sealed to the upper opening of the processing chamber 5. When the container 1 is set, the projection 7a of the bottom plate 7 is engaged with the lower surface of the container lid 3 by an engagement mechanism (not shown), and the lower portion of the lid 3 and the upper portion of the bottom plate 7 An airtight operating space 9 is formed between the two.

また、容器蓋体3には、本発明の要部である内部雰囲気切替機構4が気密に組込み固定されており、当該内部雰囲気切替機構4を介して後述するように密閉容器1内が真空又は微加圧状態に保持される。   An internal atmosphere switching mechanism 4, which is a main part of the present invention, is hermetically incorporated and fixed to the container lid 3. The inside of the closed container 1 is evacuated or vacuumed through the internal atmosphere switching mechanism 4 as described later. It is kept in a slightly pressurized state.

前記処理用チャンバ5は、チャンバ本体6と、本体の上方開口部を気密に閉鎖するボトムプレート7と、ボトムプレート7を上下動させる昇降機構(図示省略)等から形成されており、前述の如く密閉容器1をチャンバ本体6上の所定位置にセットし、その後ボトムプレート7を上昇させることにより、ボトムプレート上方部の突出部7aが容器蓋体3の下面側へ自動的に係合されると共に、蓋体3とボトムプレート7との間に気密の操作空間9が形成される。   The processing chamber 5 includes a chamber main body 6, a bottom plate 7 for hermetically closing an upper opening of the main body, an elevating mechanism (not shown) for vertically moving the bottom plate 7, and the like. By setting the closed container 1 at a predetermined position on the chamber main body 6 and then raising the bottom plate 7, the protrusion 7a at the upper portion of the bottom plate is automatically engaged with the lower surface side of the container lid 3, and An airtight operation space 9 is formed between the lid 3 and the bottom plate 7.

前記気密の操作空間9は流通路8及び操作バルブ8aを介して、外部の真空ポンプ装置13と加圧ガス供給装置14と大気へ夫々切換自在に連通されており、操作用空間9は各切換バルブ13a・14a・15を操作することにより、真空又は加圧若しくは大気圧の状態に切換えされる。   The airtight operation space 9 is connected to an external vacuum pump device 13, a pressurized gas supply device 14, and the atmosphere via a flow passage 8 and an operation valve 8a so as to be freely switchable. By operating the valves 13a, 14a, and 15, the state is switched to vacuum, pressurized, or atmospheric pressure.

前記内部雰囲気切替機構4は図3に示すように容器蓋体3へOリング16を介して着脱可能に且つ気密に固定されており、密閉容器1の内部と操作空間9間の連通路19、21を開閉する真空保持用弁機構17と、密閉容器1の内部と操作空間9間の連通路20、21を開閉する加圧保持真空破壊用弁機構18を備えている。
尚、図3に於いて22は連通路、23はフィルタ、24・25はダイヤフラム弁体、26・27はスプリング、28・29は弁座シートである。
The internal atmosphere switching mechanism 4 is detachably and air-tightly fixed to the container lid 3 via an O-ring 16 as shown in FIG. 3, and a communication path 19 between the inside of the closed container 1 and the operation space 9; A vacuum holding valve mechanism 17 for opening and closing 21 and a pressure holding vacuum breaking valve mechanism 18 for opening and closing the communication paths 20 and 21 between the inside of the sealed container 1 and the operation space 9 are provided.
In FIG. 3, 22 is a communication passage, 23 is a filter, 24 and 25 are diaphragm valve bodies, 26 and 27 are springs, and 28 and 29 are valve seats.

前記真空保持用弁機構17は、操作空間9内が真空になれば開放されて密閉容器1内を真空にし、また操作空間9内が大気圧になれば、閉鎖されて密閉容器1内を真空状態に保持するものである。
また、前記加圧保持真空破壊用弁機構18は、操作空間9内が加圧状態になれば開放されて密閉容器1内を加圧真空破壊し、操作空間9内が大気圧になれば閉鎖され、密閉容器1内を加圧状態に保持するものである。
The vacuum holding valve mechanism 17 is opened when the inside of the operation space 9 becomes vacuum to make the inside of the sealed container 1 vacuum, and when the inside of the operation space 9 becomes atmospheric pressure, it is closed and the inside of the closed container 1 becomes vacuum. It keeps the state.
The pressure holding vacuum breaking valve mechanism 18 is opened when the inside of the operation space 9 is pressurized to break the inside of the closed container 1 under pressure and closed when the inside of the operation space 9 becomes atmospheric pressure. Then, the inside of the closed container 1 is maintained in a pressurized state.

尚、前記密閉容器1の内容積は通常500〜3000cc程度を必要とし、また真空度は1〜100Pa、加圧度は780〜850torrを必要とする。
具体的には、N2 による加圧パージを行なう場合には、N2 加圧後5分以内に密閉容器1内のO2 濃度が20ppmとなる必要がある。
更に、各弁機構17、18のシートリーク量は10-10 Pa・m3 /sec以内であることが望ましく、100〜200Paの真空度を30日間保持できることが望ましい。
加えて、内部雰囲気切替機構4を固定する密閉容器蓋体3の厚みは、10〜20mm程度とするのが望ましい。
The inner volume of the closed vessel 1 usually requires about 500 to 3000 cc, the degree of vacuum requires 1 to 100 Pa, and the degree of pressurization requires 780 to 850 torr.
Specifically, when performing the pressurization purge with N 2, it the O 2 concentration in the sealed container 1 within 5 minutes N 2 after pressing need to be 20 ppm.
Further, the sheet leak amount of each of the valve mechanisms 17 and 18 is preferably within 10 −10 Pa · m 3 / sec, and it is desirable that a vacuum degree of 100 to 200 Pa can be maintained for 30 days.
In addition, the thickness of the closed container lid 3 for fixing the internal atmosphere switching mechanism 4 is desirably about 10 to 20 mm.

図1及び図2を参照して、ウエハAを格納した密閉容器1は、処理用チャンバ5の上方の所定位置まで搬送され、セッティングされる。これにより、ボトムプレート7の突出部7aが容器蓋体3へ係合すると共に容器蓋体3と容器本体2間のロックが解除され、更に、蓋体3とボトムプレート7との間に気密の操作空間9が形成される。
次に、真空ポンプ装置13が作動されて操作空間9内が減圧される。これにより、内部雰囲気切替機構4の真空保持用弁機構17が開放され、密閉容器1内と操作用空間9とが連通する。尚、密閉容器1内と処理用チャンバ5内は通常所定の真空度に保持されている。
Referring to FIG. 1 and FIG. 2, the sealed container 1 storing the wafer A is transported to a predetermined position above the processing chamber 5 and set. Thereby, the projecting portion 7a of the bottom plate 7 is engaged with the container lid 3, the lock between the container lid 3 and the container main body 2 is released, and the airtightness between the lid 3 and the bottom plate 7 is further improved. An operation space 9 is formed.
Next, the vacuum pump device 13 is operated to reduce the pressure inside the operation space 9. As a result, the vacuum holding valve mechanism 17 of the internal atmosphere switching mechanism 4 is opened, and the inside of the sealed container 1 and the operation space 9 are communicated. Incidentally, the inside of the sealed container 1 and the inside of the processing chamber 5 are usually kept at a predetermined degree of vacuum.

操作空間9内と密閉容器1間が連通されて両空間内の真空度が設定値になると、流通路8の操作バルブ8aが閉鎖され、ボトムプレート7が下降される。
これにより、密閉容器1内のウエハAは処理用チャンバ5内へ移動され、ここで所定の加工処理が施される。
When the inside of the operation space 9 and the closed container 1 are communicated with each other and the degree of vacuum in both spaces reaches a set value, the operation valve 8a of the flow passage 8 is closed, and the bottom plate 7 is lowered.
As a result, the wafer A in the sealed container 1 is moved into the processing chamber 5, where a predetermined processing is performed.

前記ウエハAに対する加工処理が完了すれば、ボトムプレート7が上方へ移動され、これにより、ウエハAは密閉容器1内へ戻される。
また、ボトムプレート7の上昇により操作空間9が形成されると、流通路8の操作バルブ8aが開放され、操作空間9が大気へ連通される。これにより、前記真空保持用弁機構17が閉鎖される。その後、容器蓋体3のロックや蓋体3からのボトムプレート突出部7aの解離が行なわれ、ウエハAを格納した真空状態下の密閉容器1は、次工程へ移送されて行く。
When the processing on the wafer A is completed, the bottom plate 7 is moved upward, whereby the wafer A is returned into the closed container 1.
When the operation space 9 is formed by raising the bottom plate 7, the operation valve 8a of the flow passage 8 is opened, and the operation space 9 is communicated with the atmosphere. As a result, the vacuum holding valve mechanism 17 is closed. Thereafter, the container lid 3 is locked and the bottom plate projection 7a is disengaged from the lid 3, and the vacuum container 1 containing the wafer A is transferred to the next step.

また、密閉容器1内をN2 等で微加圧することが必要な場合や容器本体2内をパージする場合には、操作空間9内へ流通路8を通してN2 ガスを供給し、操作空間9内を所定圧に加圧する。これにより、通路20を通して加圧保持真空破壊用弁機構18のダイヤフラム25がバネ27に抗して押し下げられ、弁機構18が開放されることにより密閉容器1内が所定圧に加圧される。
一方、真空保持用弁機構17の方は、ダイヤフラム24にかかる下方からの閉弁力(バネ26の押圧力+下面側受圧力)と上方からの開弁力(上面側受圧力)との差により、常時閉弁状態に保持されている。
Further, when it is necessary to slightly pressurize the inside of the sealed container 1 with N 2 or the like or when purging the inside of the container main body 2, the N 2 gas is supplied into the operation space 9 through the flow passage 8 and the operation space 9 is supplied. Is pressurized to a predetermined pressure. As a result, the diaphragm 25 of the pressure holding / vacuum breaking valve mechanism 18 is pushed down through the passage 20 against the spring 27, and the interior of the sealed container 1 is pressurized to a predetermined pressure by opening the valve mechanism 18.
On the other hand, the vacuum holding valve mechanism 17 has a difference between the valve closing force applied to the diaphragm 24 from below (the pressing force of the spring 26 + the lower surface receiving pressure) and the valve opening force from above (the upper surface receiving pressure). Thus, the valve is normally kept closed.

密閉容器1内を所定圧に加圧したあと、操作空間9内の加圧を止めて操作空間9内を大気圧に戻すと、加圧保持真空破壊用弁機構18のダイヤフラム25はバネ27によって押し上げられ、閉弁状態に保持される。
また、真空保持用弁機構17の方は、バネ26によってダイヤフラム24が上方へ押圧された状態に保持され続けており、閉弁状態に保持されている。
その結果、密閉容器1内は所定圧に加圧された状態に保持されることになる。 尚、上記真空引き操作と加圧操作を繰り返すことにより、容器本体2内がパージされることになり、内部に残存するパーティクルが外部へ排出されることになる。
After the inside of the closed container 1 is pressurized to a predetermined pressure, when the pressurization in the operation space 9 is stopped and the inside of the operation space 9 is returned to the atmospheric pressure, the diaphragm 25 of the pressure holding vacuum breaking valve mechanism 18 is actuated by a spring 27. It is pushed up and held in the valve closed state.
Also, the vacuum holding valve mechanism 17 is kept in a state where the diaphragm 24 is pressed upward by the spring 26, and is kept in a closed state.
As a result, the inside of the closed container 1 is maintained in a state where it is pressurized to a predetermined pressure. By repeating the vacuuming operation and the pressurizing operation, the inside of the container body 2 is purged, and the particles remaining inside are discharged to the outside.

図4及び図5は、本発明で使用する内部雰囲気切替機構4の第1実施例の底面図及び平面図のA−A視断面図である。
図4及び図5に於いて、30はアルマイト製のボディであり、容器蓋体3の厚みに合わせて厚さ10〜18mm位いに選定されている。
FIGS. 4 and 5 are a bottom view and a plan view of the first embodiment of the internal atmosphere switching mechanism 4 used in the present invention.
4 and 5, reference numeral 30 denotes an alumite body, which is selected to have a thickness of about 10 to 18 mm in accordance with the thickness of the container lid 3.

当該ボディ30には、厚み方向寸法の約半分の深さを有する円形孔がその裏面側(即ち、処理用チャンバ5と対向する側)に設けられており、また、当該円形孔の天井部には、更に真空保持用弁機構17と加圧保持真空破壊用弁機構18の弁室を形成する二つの小円孔が夫々形成されている。   The body 30 is provided with a circular hole having a depth of about half the thickness in the thickness direction on the back surface side (that is, the side facing the processing chamber 5). Further, two small holes forming valve chambers of the vacuum holding valve mechanism 17 and the pressure holding vacuum breaking valve mechanism 18 are respectively formed.

更に、ボディ30の厚み方向の上方部(即ち、容器本体2と対向する側)には、連通路19、20、21が形成されており、各連通路19、20の端部にはフィルター36及びフィルタボディ37がフィルタボディ押えリング37aにより固着されている。更に、連通路21の端部にはフィルタ23、フィルタボディ34及びフィルタ押えリング35が設けられており、押えリング35をボディ30へ固定することによりフィルタ23が挿着固定されている。
尚、前記フィルタ23、36は密閉容器1や処理用チャンバ5内へパーティクルが侵入するのを防止するためのものであり、本実施例では0.15μm以上のパーティクルの侵入を皆無にするために、0.1μm径のフィルタが設けられている。
Further, communication passages 19, 20, 21 are formed in an upper portion of the body 30 in the thickness direction (ie, on a side facing the container body 2), and a filter 36 is provided at an end of each communication passage 19, 20. The filter body 37 is fixed by a filter body holding ring 37a. Further, a filter 23, a filter body 34, and a filter holding ring 35 are provided at an end of the communication path 21, and the filter 23 is inserted and fixed by fixing the holding ring 35 to the body 30.
The filters 23 and 36 are for preventing particles from entering the closed vessel 1 and the processing chamber 5, and in the present embodiment, the filters 23 and 36 are for preventing particles of 0.15 μm or more from entering. , 0.1 μm diameter filters are provided.

前記弁室を形成する各小円孔の内部には、弗素ゴム系の弁座シート28・29、フッ素ゴム系のダイヤフラム24・25、PCTFE製のスプリング受け31a・31b、スプリング26・27が夫々挿着され、更にその下面側から押えフランジ32a・32b及びダイヤフラム押え33を挿着し、ダイヤフラム押えねじ40によってダイヤフラム押え33をボディ30へ固定することにより、前記各部材が夫々組立て固着されている。   Inside each of the small holes forming the valve chamber, a fluorine rubber-based valve seat sheet 28/29, a fluoro rubber-based diaphragm 24/25, a spring receiver 31a / 31b made of PCTFE, and a spring 26/27 are respectively provided. Each member is assembled and fixed by inserting the holding flanges 32a and 32b and the diaphragm holding member 33 from the lower surface side thereof and fixing the diaphragm holding member 33 to the body 30 by the diaphragm holding screw 40. .

即ち、前記真空保持用弁機構17は弁座シート28、ダイヤフラム24、スプリング26、スプリング受け31a、押えフランジ32a等から形成されており、必要に応じて連通路22内にフィルタ38が設けられている。
又、前記加圧保持真空破壊用弁機構18は弁座シート29、ダイヤフラム25、スプリング27、スプリング受け31b、押えフランジ32b等から形成されている。 そして、前記両スプリング26、27等の弾性力やダイヤフラム24、25の受圧面積比を調整することにより、密閉容器1内の真空引き(即ち、操作空間9内の真空引き)に際しては真空保持用弁機構17が先きに開弁され、また逆に、密閉容器1内の加圧に際しては加圧保持真空破壊用弁機構18が先きに開弁されることになる。
That is, the vacuum holding valve mechanism 17 is formed of a valve seat 28, a diaphragm 24, a spring 26, a spring receiver 31a, a holding flange 32a, and the like, and a filter 38 is provided in the communication passage 22 as necessary. I have.
The pressure holding vacuum breaking valve mechanism 18 includes a valve seat 29, a diaphragm 25, a spring 27, a spring receiver 31b, a holding flange 32b, and the like. By adjusting the elastic force of the springs 26, 27 and the like and the pressure receiving area ratio of the diaphragms 24, 25, a vacuum is maintained during the evacuation of the closed vessel 1 (that is, the evacuation of the operation space 9). The valve mechanism 17 is opened first, and conversely, when pressurizing the closed container 1, the pressure holding vacuum breaking valve mechanism 18 is opened first.

より具体的には、真空保持用弁機構17のダイヤフラム24にかかる真空−大気圧間の圧力差(約1.033kgf/cm2 )を用いて当該弁機構17の開閉作動を行ない、また、加圧保持用真空破壊弁機構18の方は、加圧−大気圧間の圧力差(約100torr程度)を利用して加圧保持真空破壊用弁機構18の開閉作動を行なうようにしている。 More specifically, the valve mechanism 17 is opened and closed by using a pressure difference (approximately 1.033 kgf / cm 2 ) between the vacuum and the atmospheric pressure applied to the diaphragm 24 of the vacuum holding valve mechanism 17. The pressure holding vacuum break valve mechanism 18 uses the pressure difference between pressurization and atmospheric pressure (about 100 torr) to open and close the pressure hold vacuum break valve mechanism 18.

尚、真空保持用弁機構17及び加圧保持真空破壊用弁機構18等を備えた内部雰囲気切替機構4は、そのボディ30をボディ固定ねじ39によって容器蓋体3へ固定することにより容器蓋体3と一体化されており、密閉容器1と共に各処理工程へ移行して行く。   The internal atmosphere switching mechanism 4 including the vacuum holding valve mechanism 17 and the pressure holding vacuum breaking valve mechanism 18 is provided by fixing the body 30 to the container lid 3 with the body fixing screw 39. 3 and move to each processing step together with the closed container 1.

図6及び図7は、内部雰囲気切替機構4の他の実施例を示すものであり、ボディ30がフランジ型に形成されている点が第1実施例との相違点であり、その他の内部雰囲気切替機構4の構成は第1実施例の場合と略同一である。
即ち、当該第2実施例では、容器蓋体3側にボディ30のフランジ部30aを受け入れするためのフランジ受け部(図示省略)が形成されており、当該フランジ受け部へボディ30のフランジ部30aを接当させた状態でボディ固定ねじ39を締め付けすることにより、ボディ30が固定されている。
6 and 7 show another embodiment of the internal atmosphere switching mechanism 4, which is different from the first embodiment in that the body 30 is formed in a flange shape. The configuration of the switching mechanism 4 is substantially the same as that of the first embodiment.
That is, in the second embodiment, a flange receiving portion (not shown) for receiving the flange portion 30a of the body 30 is formed on the container lid 3 side, and the flange receiving portion 30a of the body 30 is formed on the flange receiving portion. The body 30 is fixed by tightening the body fixing screw 39 in a state where is brought into contact with the body 30.

尚、前記第1及び第2実施例では、ボディ固定ねじ39によって容器蓋体3へボディ30を固定する構成としているが、ボディ固定ねじ39の使用に代えて、ボディ30の外周面にねじを形成し、これを容器蓋体3へねじ込み固定する構成としてもよい。   In the first and second embodiments, the body 30 is fixed to the container lid 3 by the body fixing screw 39. However, instead of using the body fixing screw 39, a screw is attached to the outer peripheral surface of the body 30. It may be configured to be formed and screwed and fixed to the container lid 3.

(第3実施例)
図8及び図9は本発明の第3実施例の一部(加圧保持真空破壊用弁機構18)を示す底面図及び断面図である。
当該第3実施例では、内部雰囲気切替機構4の真空保持用弁機構17と加圧保持真空破壊用弁機構18とが分割され、夫々別体として形成されている。
尚、真空保持用弁機構17及び加圧保持真空破壊用弁機構18の構成は前記第1及び第2実施例の場合と略同一であるため、ここではその説明を省略する。
(Third embodiment)
FIGS. 8 and 9 are a bottom view and a sectional view, respectively, showing a part (a pressure holding vacuum breaking valve mechanism 18) of a third embodiment of the present invention.
In the third embodiment, the vacuum holding valve mechanism 17 and the pressure holding vacuum breaking valve mechanism 18 of the internal atmosphere switching mechanism 4 are divided and formed separately.
Note that the configurations of the vacuum holding valve mechanism 17 and the pressure holding vacuum breaking valve mechanism 18 are substantially the same as those in the first and second embodiments, and therefore description thereof is omitted here.

この第3実施例に係る真空保持用弁機構17と加圧保持真空破壊用弁機構18とは、通常容器蓋体3の直径(円形密閉容器1の場合)又は対角線(角形密閉容器の場合)の両端部近傍位置に取り付けされる。容器蓋体3の両縁部に対向状に配置することにより、密閉容器1内に存在するパーティクルの排出が容易となるからである。
即ち、操作空間9の圧力を真空−大気−加圧と順次切り換えし、密閉容器1内を真空−加圧の状態に繰り返し切替えすることにより、密閉容器1内のパーティクルは容器1外方へ排出される。このとき、両弁機構17、18が対向状に配置されていると、密閉容器1内のパージ流体の流れがバイパス流にならずに内部空間の全域に亘って流通するため、パーティクルの排出効率が大幅に向上することになる。
[作動試験]
The vacuum holding valve mechanism 17 and the pressure holding vacuum breaking valve mechanism 18 according to the third embodiment are usually the diameter of the container lid 3 (in the case of the circular closed container 1) or the diagonal line (in the case of the rectangular closed container). Are attached near both ends. This is because, by arranging the container lid 3 at both edges so as to face each other, it is easy to discharge particles existing in the closed container 1.
That is, the pressure in the operation space 9 is sequentially switched to vacuum-atmosphere-pressurization, and the inside of the closed container 1 is repeatedly switched to the vacuum-pressurized state, so that the particles in the closed container 1 are discharged to the outside of the container 1. Is done. At this time, if the two valve mechanisms 17 and 18 are arranged to face each other, the flow of the purge fluid in the sealed container 1 flows through the entire internal space without being a bypass flow, so that the particle discharge efficiency is improved. Will be greatly improved.
[Operation test]

図10は本発明に係る内部雰囲気切替機構の作動試験装置の構成説明図であり、図10に於いて、Cは密閉容器部(内容積512cc)、Dは操作空間部(内容積463cc)、PT1 は圧力計(−1.03〜10kgf/cm2 G)、PT2 はバラトロン計(1000torrF・S)、PT3 は真空計(10-3〜760torr)、PT4 はバラトロン計(1000torrF・S)、RGは調整器(0.2MPaG)、MFCは流量制御器(5SLMF・S)、FILはフィルタ(0.01μm)、DPは真空ポンプ(180L/min)、V1 はベント用弁、V2 はN2 ガス供給弁、V3 は真空引き弁、V4 は大気開放弁、V5 は真空排気速度調整弁、P1 は操作空間部Dの圧力、P2 は密閉空間部Cの圧力である。 FIG. 10 is an explanatory diagram of a configuration of an operation test device of the internal atmosphere switching mechanism according to the present invention. In FIG. 10, C is a closed container portion (internal volume of 512 cc), D is an operation space portion (internal volume of 463 cc), PT 1 is a pressure gauge (−1.03 to 10 kgf / cm 2 G), PT 2 is a baratron gauge (1000 torr FS · S), PT 3 is a vacuum gauge (10 -3 to 760 Torr), and PT 4 is a baratron gauge (1000 torr F · S). S), RG is a regulator (0.2 MPaG), MFC is a flow controller (5 SLMF · S), FIL is a filter (0.01 μm), DP is a vacuum pump (180 L / min), V 1 is a vent valve, V 2 is a N 2 gas supply valve, V 3 is a vacuum evacuation valve, V 4 is an air release valve, V 5 is a vacuum evacuation speed control valve, P 1 is the pressure of the operation space D, and P 2 is the pressure of the closed space C. Pressure.

図11は、内部雰囲気切替機構4の作動試験結果を示すものであり、内部雰囲気切替機構4としては、前記図6及び図7に示した構成のものを使用している。 即ち、ボディ30はA5052(アルマイト7μm)を用いて作成し、そのポート内径は2mmφである。また、ダイヤフラム24、25には弗素ゴム(硬度70)を用い、スプリング(真空側)26は0.05(kgf)及びスプリング(加圧側)27は0.02kgfに夫々設定した。尚、前記両スプリング26,27の弾力性の調整により到達真空圧力及び真空破壊圧力が調整できる。   FIG. 11 shows an operation test result of the internal atmosphere switching mechanism 4. The internal atmosphere switching mechanism 4 having the configuration shown in FIGS. 6 and 7 is used. That is, the body 30 is formed using A5052 (alumite 7 μm), and its port inner diameter is 2 mmφ. The diaphragms 24 and 25 were made of fluorine rubber (hardness 70), and the spring (vacuum side) 26 was set to 0.05 (kgf) and the spring (pressing side) 27 was set to 0.02 kgf. Incidentally, the ultimate vacuum pressure and the vacuum breaking pressure can be adjusted by adjusting the elasticity of the two springs 26, 27.

図11は、図10に於けるPT2 、PT4 のレコーダ出力をデータロガーに記録したものである。
図11を参照して、先ずP1a点から真空ポンプDPを作動させ、操作空間部Dの真空排気を行なった(180sec、P1 =1Torr以下)。その結果、密閉容器部Cの真空度P2 は23.4torrに保持されており、密閉空間部Dを大気に開放してもその真空度は同じ値に保持されている(P2a、P2b)。
次に、操作空間部Dの圧力をN2 の供給(100SCCM)により上昇させ、1031torrの点P1eでP2 の真空保持がなくなり(真空破壊)、密閉用器Cの圧力は真空から大気圧に昇圧される。その後、P1 が920torrの点P1fで、操作空間部Dの加圧を止めて同空間部Dを大気へ開放した。その時の密閉空間部Cの加圧保持圧力は783torr(P2d点)となり、密閉空間部C内の圧力P2 が微加圧状態に保持されていることが判る。
尚、図11に於いて、P1cは空間部Dの大気開放点、P1bは空間部Dの真空排気停止点、P1dは空間部Dの加圧開始点である。また、P2cのときのP1eは空間部Cの真空P2 の破壊開始点である。なお、真空排気のときのP2 の到達圧力及びP1 の真空破壊圧力は、真空側及び加圧側のスプリングを変更することで調整可能である。
FIG. 11 shows the recorder outputs of PT 2 and PT 4 in FIG. 10 recorded on a data logger.
Referring to FIG. 11, first, the vacuum pump DP was operated from point P1a to evacuate the operation space D (180 sec, P 1 = 1 Torr or less). As a result, the degree of vacuum P 2 of the sealed container portion C is held in 23.4Torr, the vacuum sealed space D is also open to the atmosphere is maintained at the same value (P2a, P2b).
Next, the pressure in the operation space D is increased by supplying N 2 (100 SCCM), the vacuum of P 2 is stopped at the point P 1e of 1031 torr (vacuum break), and the pressure of the sealing device C is changed from vacuum to atmospheric pressure. Is boosted. Thereafter, P 1 is at P 1f terms of 920Torr, the same space D stop pressurization of the operating space D is open to the atmosphere. Its dwell pressure in the closed space C when it is found that 783torr (P2d point), and the pressure P 2 in the closed space portion C is held in the fine pressure.
In FIG. 11, P 1c is a point at which the space D is open to the atmosphere, P 1b is a vacuum evacuation stop point of the space D, and P 1d is a pressure start point of the space D. In the case of P 2c , P 1e is the breaking start point of the vacuum P 2 in the space C. Incidentally, the ultimate pressure and vacuum break pressure P 1 of P 2 when the evacuation can be adjusted by changing the springs of the vacuum side and pressure side.

上記図11の作動試験の結果からも明らかなように、本発明に係る内部雰囲気切替機構4に於いては、操作空間部Dを真空状態とすることにより、加圧保持真空破壊用弁機構18を閉弁状態に保持した状態で真空保持用弁機構17を開弁させ、密閉容器部C内を真空にすることができ、且つ操作空間部Dを大気状態に戻せば、真空保持用弁機構17が閉弁して、密閉容器部C内は真空状態に保持される。
また、逆に、前記操作空間部D内を加圧することにより、真空保持用弁機構17を閉弁状態に保持した状態で加圧保持真空破壊用弁機構18を開弁させ、密閉容器C内を加圧することが出来、且つ操作空間部Dを大気に戻せば、加圧保持真空破壊用弁機構18が閉弁して、密閉容器部C内は加圧状態に保持される。
As is clear from the result of the operation test shown in FIG. 11, in the internal atmosphere switching mechanism 4 according to the present invention, the operation space portion D is brought into a vacuum state so that the pressure holding valve breaking valve mechanism 18 The vacuum holding valve mechanism 17 can be opened while keeping the valve closed, and the interior of the closed vessel C can be evacuated, and the operation space D can be returned to the atmospheric state. The valve 17 is closed, and the inside of the closed container C is kept in a vacuum state.
Conversely, by pressurizing the inside of the operation space D, the pressure holding vacuum breaking valve mechanism 18 is opened while the vacuum holding valve mechanism 17 is held in the closed state, and the inside of the closed vessel C is opened. Can be pressurized and the operation space D is returned to the atmosphere, the pressure holding vacuum breaking valve mechanism 18 is closed, and the inside of the closed vessel C is maintained in a pressurized state.

図12及び図13は、真空保持用弁機構17の更に他の実施例を示す拡大断面図と底面図であり、加圧保持真空破壊用弁機構18と分離せしめて単独で、密閉容器蓋体3の適宜個所へ取り付けるようにしたものである。   FIGS. 12 and 13 are an enlarged sectional view and a bottom view showing still another embodiment of the vacuum holding valve mechanism 17, which is separated from the pressure holding vacuum breaking valve mechanism 18 and used alone to form a closed container lid. 3, where appropriate.

当該実施例の真空保持用弁機構17に於いては、前記図3や図5等に示した実施例の真空保持用弁機構17に於けるダイヤフラム24の押え用スプリング26及びスプリング受け31aが設けられておらず、ダイヤフラム24自体の弾性力と両側受圧面の面積差でもって、前記真空保持用弁機構17としての作動を行うように構成されている。   In the vacuum holding valve mechanism 17 of the present embodiment, a spring 26 for holding the diaphragm 24 and a spring receiver 31a are provided in the vacuum holding valve mechanism 17 of the embodiment shown in FIGS. The operation as the vacuum holding valve mechanism 17 is performed by the elastic force of the diaphragm 24 itself and the area difference between the pressure receiving surfaces on both sides.

尚、図12及び図13に於いて、16はOリング、19・20・21は連通路、24はダイヤフラム、28は弁座シート、30はボディ(厚さ10mm)、33はダイヤフラム押え、39はボディ固定ねじ、40はダイヤフラム押えねじである。
また、本実施例では図示されていないが、真空保持用弁機構17の外部からだ24を強制的に開放する機構を設け、密閉容器1内を大気圧に開放するためのオープナーとしての機能を具備するようにしてもよい。
12 and 13, 16 is an O-ring, 19, 20, and 21 are communication paths, 24 is a diaphragm, 28 is a valve seat, 30 is a body (10 mm thick), 33 is a diaphragm presser, 39 Is a body fixing screw, and 40 is a diaphragm holding screw.
Although not shown in the present embodiment, a mechanism for forcibly opening the external body 24 of the vacuum holding valve mechanism 17 is provided, and a function as an opener for opening the inside of the sealed container 1 to atmospheric pressure is provided. You may make it.

また、図14及び図15は、加圧保持真空破壊用弁機構18の更に他の実施例を示す拡大断面図と底面図であり、真空保持用弁機構17と分離せしめて単独で、密閉容器本体1の容器蓋体3の適宜個所へ取り付けるようにしたものである。   FIGS. 14 and 15 are an enlarged sectional view and a bottom view showing still another embodiment of the pressure holding and vacuum breaking valve mechanism 18, respectively. The container cover 3 of the main body 1 is attached to an appropriate place.

当該実施例の加圧保持真空破壊用弁機構18に於いては、前記図3や図5等に示した実施例の加圧保持真空破壊用弁機構18に於けるダイヤフラム25の押え用スプリング27及びスプリング受け31bが設けられておらず、ダイヤフラム25自体の弾性力と両側受圧面の面積差でもって、前記加圧保持真空破壊用弁機構18としての作動を行うように構成されている。   In the pressure-holding vacuum breaking valve mechanism 18 of the present embodiment, the pressing spring 27 of the diaphragm 25 in the pressure-holding vacuum breaking valve mechanism 18 of the embodiment shown in FIGS. Further, the spring mechanism 31b is not provided, and the operation as the pressure holding vacuum breaking valve mechanism 18 is performed by the elastic force of the diaphragm 25 itself and the area difference between the pressure receiving surfaces on both sides.

また、本実施例に於いては、図14に示す如く連通路20内にねじが形成されており、このねじ内へ真空破壊用押えボルト41をねじ込みしてその先端でダイヤフラム25を押圧することにより、ダイヤフラム25を常時開状態に保持することが可能な構成となっている。即ち、当該真空破壊用押えボルト41は、弁座シート29を常に開状態に固定して密閉容器1内を大気圧に保った状態で使用する際に利用されるものである。   In this embodiment, a screw is formed in the communication passage 20 as shown in FIG. 14, and a vacuum breaking holding bolt 41 is screwed into the screw and the diaphragm 25 is pressed with its tip. Thereby, the diaphragm 25 can be kept open at all times. That is, the holding bolt 41 for vacuum breaking is used when the valve seat 29 is always fixed to the open state and the inside of the sealed container 1 is maintained at the atmospheric pressure.

尚、図14及び図15に於いて、16はOリング、20・21は連通路、23はフィルター、25はダイヤフラム、29は弁座シート、30はボディ(厚さ10mm)、33はダイヤフラム押え、39はボディ固定ねじ、40はダイヤフラム押えねじ、41は真空破壊用押えボルト、42は窒素ガス封入用ポートである。   14 and 15, 16 is an O-ring, 20 and 21 are communication paths, 23 is a filter, 25 is a diaphragm, 29 is a valve seat, 30 is a body (thickness 10 mm), and 33 is a diaphragm holder. , 39 are body fixing screws, 40 is a diaphragm holding screw, 41 is a holding bolt for vacuum breaking, and 42 is a port for charging nitrogen gas.

また、図14及び図15の実施例では、ダイヤフラム25の開放用に押えボルト41を使用しているが、ダイヤフラム25の開放機構は如何なる機構であってもよく、例えば手動式のプッシュボタン(係止ロック機構付)や電気作動式のプランジャー型ボタン等であってもよい。   In the embodiments of FIGS. 14 and 15, the holding bolt 41 is used to open the diaphragm 25, but the opening mechanism of the diaphragm 25 may be any mechanism, for example, a manual push button (engagement mechanism). (With a stop lock mechanism) or an electrically operated plunger button.

本発明は、半導体製造装置や光学露光装置、精密機械装置、化学品製造装置等の技術分野で主として利用されるものである。   The present invention is mainly used in the technical fields of a semiconductor manufacturing apparatus, an optical exposure apparatus, a precision machine, a chemical manufacturing apparatus, and the like.

内部雰囲気切替機構付密閉容器の使用状態説明図であり、密閉容器を処理用チャンバへセットした状態を示すものである。FIG. 4 is an explanatory view of a use state of the closed container with an internal atmosphere switching mechanism, showing a state where the closed container is set in a processing chamber. 内部雰囲気切替機構付密閉容器の使用状態説明図であり、ボトムプレートを下降させた状態を示すものである。FIG. 3 is an explanatory view of a use state of the closed container with an internal atmosphere switching mechanism, showing a state in which a bottom plate is lowered. 内部雰囲気切替機構の構成説明図である。FIG. 3 is an explanatory diagram of a configuration of an internal atmosphere switching mechanism. 第1実施例に係る内部雰囲気切替機構の底面図である。FIG. 4 is a bottom view of the internal atmosphere switching mechanism according to the first embodiment. 図4のA−A視断面図である。FIG. 5 is a sectional view taken along line AA of FIG. 4. 第2実施例に係る内部雰囲気切替機構の底面図である。FIG. 9 is a bottom view of the internal atmosphere switching mechanism according to the second embodiment. 図6のA−A視断面図である。It is AA sectional drawing of FIG. 第3実施例に係る内部雰囲気切替機構の加圧保持真空破壊用弁機構部分の底面図である。It is a bottom view of the valve mechanism part for pressure holding vacuum breakage of the internal atmosphere switching mechanism concerning a 3rd example. 図8のA−A視断面図である。FIG. 9 is a sectional view taken along line AA of FIG. 8. 本発明に係る内部雰囲気切替機構の作動試験装置の説明図である。It is an explanatory view of an operation test device for an internal atmosphere switching mechanism according to the present invention. 作動試験の結果を示す線図である。It is a diagram showing the result of an operation test. 第4実施例に係る内部雰囲気切替機構の真空保持用弁機構部分の断面図である。It is sectional drawing of the valve mechanism part for vacuum maintenance of the internal atmosphere switching mechanism which concerns on 4th Example. 図13の底面図である。It is a bottom view of FIG. 第4実施例に係る内部雰囲気切替機構の加圧保持真空破壊用弁機構部分の断面図である。It is sectional drawing of the valve mechanism part for pressurization holding vacuum break of the internal atmosphere switching mechanism which concerns on 4th Example. 図14の底面図である。FIG. 15 is a bottom view of FIG. 14.

符号の説明Explanation of reference numerals

Aはウエハ、1は密閉容器、2は容器本体、3は容器蓋体、4は内部雰囲気切替機構、5は処理用チャンバ、6はチャンバ本体、7はボトムプレート、7aは突出部、8は流通路、8aは操作バルブ、9は操作空間、10・11・12はOリング、13は真空ポンプ装置、13aは真空切換弁、14は加圧ガス供給装置、14aは加圧ガス切換弁、15は大気開放弁、16はOリング、17は真空保持用弁機構、18は加圧保持真空破壊用弁機構、19・20・21・22は連通路、23はフィルター、24・25はダイヤフラム弁体、26・27はスプリング、28・29は弁座シート、30はボディ、30aはフランジ部、31a・31bはスプリング受け、32a・32bは押えフランジ、33はダイヤフラム押え、34はフィルタボディ、35はフィルタ押えリング、36はフィルタ、37はフィルタボディ、37aはフィルタ押えリング、38はフィルタ、39はボディ固定ねじ、40はダイヤフラム押えねじ、41は真空破壊用押えボルト、42は窒素ガス封入用ポート、Cは密閉容器部(作動試験装置)、Dは操作空間部(作動試験装置)、PT1 は圧力計PT2 はバラトロン計、PT3 は真空計、PT4 はバラトロン計、RGは調整器、MFCは流量制御器、FILはフィルタ、V1 はベント用弁、V2 はN2 ガス供給弁、V3 は真空引き弁、V4 は大気開放弁、V5 は真空排気速度調整弁、P1 は操作空間部Dの圧力、P2 は密閉空間部Cの圧力、P1aは真空ポンプDPのスタート点、P1bは真空排気停止点、P1cは大気開放点、P1dはN2 加圧のスタート点、P1eは真空破壊点、P1fは大気開放点、P2aはP2 圧力保持(P2 真空時)、P2bはP2 圧力保持(P1 大気圧の時)、P1eは真空破壊点、P2cはP2 真空破壊(開き始め点)、P2dはP2 保持圧力(P2 加圧時)。 A is a wafer, 1 is a sealed container, 2 is a container body, 3 is a container lid, 4 is an internal atmosphere switching mechanism, 5 is a processing chamber, 6 is a chamber body, 7 is a bottom plate, 7a is a protruding portion, and 8 is A flow passage, 8a is an operation valve, 9 is an operation space, 10 ・ 11 ・ 12 is an O-ring, 13 is a vacuum pump device, 13a is a vacuum switching valve, 14 is a pressurized gas supply device, 14a is a pressurized gas switching valve, 15 is an atmosphere release valve, 16 is an O-ring, 17 is a valve mechanism for vacuum holding, 18 is a valve mechanism for vacuum holding and pressure release, 19, 20, 21, and 22 are communication paths, 23 is a filter, and 24 and 25 are diaphragms. Valve bodies, 26 and 27 are springs, 28 and 29 are valve seats, 30 is a body, 30a is a flange, 31a and 31b are spring receivers, 32a and 32b are holding flanges, 33 is a diaphragm holder, and 34 is a filter body. , 35 is a filter holding ring, 36 is a filter, 37 is a filter body, 37a is a filter holding ring, 38 is a filter, 39 is a body fixing screw, 40 is a diaphragm holding screw, 41 is a holding bolt for vacuum breaking, and 42 is nitrogen. Port for gas filling, C is a sealed container (operation test device), D is an operation space (operation test device), PT 1 is a pressure gauge PT 2 is a baratron gauge, PT 3 is a vacuum gauge, PT 4 is a baratron gauge, RG is regulator, MFC is flow controller, FIL filter, V 1 is a vent valve, V 2 is N 2 gas supply valve, V 3 vacuuming valve, V 4 is the air release valve, V 5 is evacuated speed control valve, P 1 is the pressure of the operating space D, P 2 is the pressure in the sealed space station C, a start point of P 1a is a vacuum pump DP, P 1b is evacuated stopping point, P 1c is air release point, P 1d is the starting point of N 2 pressurization, P 1e is vacuum Break point, P 1f is open point to atmosphere, P 2a is P 2 pressure hold (at P 2 vacuum), P 2b is P 2 pressure hold (at P 1 atmospheric pressure), P 1e is vacuum break point, P 2c is P P 2 vacuum breaking (opening start point), P 2d is P 2 holding pressure (when P 2 is pressurized).

Claims (11)

容器本体と、容器本体に気密に且つ着脱自在に固定された容器蓋体と、容器蓋体に気密に設けられ、容器本体内部と容器蓋体の外部とを連通する連通路を夫々開閉する真空保持用弁機構及び加圧保持真空破壊用弁機構を備えた内部雰囲気切替機構とから形成され、且つ前記真空保持用弁機構を、容器蓋体の外部に形成した操作空間を真空としたときには開弁して容器本体内を真空にすると共に、操作空間を大気に開放したときには閉弁して容器本体内を所定の真空度に保持する弁機構に、また前記加圧保持真空破壊用弁機構を、容器本体内を真空保持状態から大気圧に戻すために操作空間を加圧したときには開弁して容器本体内を加圧真空破壊すると共に、操作空間を大気に開放したときには閉弁して容器本体内を所定の加圧度に保持する弁機構に、夫々構成したことを特徴とする内部雰囲気切替機構付密閉容器。   A container body, a container lid hermetically and detachably fixed to the container main body, and vacuums provided in the container lid hermetically to open and close a communication passage communicating between the inside of the container main body and the outside of the container lid. An internal atmosphere switching mechanism provided with a holding valve mechanism and a pressure holding vacuum breaking valve mechanism, and the vacuum holding valve mechanism is opened when an operation space formed outside the container lid is evacuated. A valve mechanism for evacuating the inside of the container body and closing the valve body when the operation space is opened to the atmosphere to maintain the inside of the container body at a predetermined degree of vacuum, and a valve mechanism for pressurized holding vacuum breakage. When the operation space is pressurized in order to return the inside of the container body from the vacuum holding state to the atmospheric pressure, the valve is opened and the inside of the container body is pressurized and vacuum destroyed, and the valve is closed and closed when the operation space is opened to the atmosphere. A valve that maintains the inside of the main body at a predetermined degree of pressurization The structure, the sealed container with the internal atmosphere switching mechanism, characterized in that the respective configuration. 操作空間を密閉容器の容器蓋体の下方と処理用チャンバのボトムプレートの上方との間に形成し、処理用チャンバの壁体に形成した流通路を通して操作空間内を真空、大気圧及び加圧状態に保持するようにした請求項1に記載の内部雰囲気切替機構付密閉容器。   An operation space is formed between the lower part of the container lid of the closed container and the upper part of the bottom plate of the processing chamber, and the inside of the operation space is evacuated, atmospheric pressure and pressurized through the flow passage formed in the wall of the processing chamber. The sealed container with an internal atmosphere switching mechanism according to claim 1, wherein the container is held in a state. 真空保持用弁機構と加圧保持真空破壊用弁機構とを共通のボディに隣接して設けるようにした請求項1に記載の内部雰囲気切替機構付密閉容器。   The sealed container with an internal atmosphere switching mechanism according to claim 1, wherein the vacuum holding valve mechanism and the pressure holding vacuum breaking valve mechanism are provided adjacent to a common body. 真空保持用弁機構と加圧保持真空破壊用弁機構とを共通のボディに隣接して設けると共に、各連通路の入口端及び出口端に夫々フィルタを配設するようにした請求項1に記載の内部雰囲気切替機構付密閉容器。   2. A vacuum holding valve mechanism and a pressure holding vacuum breaking valve mechanism are provided adjacent to a common body, and filters are provided at an inlet end and an outlet end of each communication passage. Closed container with internal atmosphere switching mechanism. 真空保持用弁機構と加圧保持真空破壊用弁機構を夫々別体として容器蓋体に設けるようにした請求項1に記載の内部雰囲気切替機構付密閉容器。   The closed container with an internal atmosphere switching mechanism according to claim 1, wherein the vacuum holding valve mechanism and the pressure holding vacuum breaking valve mechanism are separately provided on the container lid. 真空保持用弁機構と加圧保持真空破壊用弁機構を夫々別体として容器蓋体の外周縁部に対向状に配置すると共に、各連通路の入口端及び出口端に夫々フィルタを配設するようにした請求項1に記載の内部雰囲気切替機構付密閉容器。   A vacuum holding valve mechanism and a pressure holding vacuum breaking valve mechanism are separately provided and arranged on the outer peripheral edge of the container lid so as to face each other, and filters are provided at the inlet end and the outlet end of each communication passage. The sealed container with an internal atmosphere switching mechanism according to claim 1. 真空保持用弁機構と加圧保持真空破壊用弁機構の何れか一方又は両方に、夫々の弁機構の機能を外部から任意に妨げる手段を設ける構成とした請求項1に記載の内部雰囲気切替機構付密閉容器。   2. The internal atmosphere switching mechanism according to claim 1, wherein one or both of the vacuum holding valve mechanism and the pressure holding vacuum breaking valve mechanism are provided with means for arbitrarily preventing the function of each valve mechanism from the outside. Sealed container with. 真空保持用弁機構及び加圧保持真空破壊用弁機構をダイヤフラム型バルブとすると共に、そのダイヤフラム弁体をステンレス製、ゴム製又は弗素ゴム製ダイヤフラム弁体とした請求項1に記載の内部雰囲気切替機構付密閉容器。   2. The internal atmosphere switching according to claim 1, wherein the vacuum holding valve mechanism and the pressure holding vacuum breaking valve mechanism are diaphragm type valves, and the diaphragm valve body is a stainless steel, rubber or fluorine rubber diaphragm valve body. Closed container with mechanism. 内部雰囲気切替機構のボディの厚みを容器蓋体の厚みとほぼ同一にすると共に、前記ボディを容器蓋体の一部へ気密状に挿着固定するようにした請求項1に記載の内部雰囲気切替機構付密閉容器。   2. The internal atmosphere switching device according to claim 1, wherein the thickness of the body of the internal atmosphere switching mechanism is substantially equal to the thickness of the container lid, and the body is airtightly inserted and fixed to a part of the container lid. Closed container with mechanism. 加圧保持真空破壊用弁機構をダイヤフラム型バルブとし、外部からダイヤフラム弁体を開弁状態に保持することにより、密閉容器内を大気圧に保つ構成とした請求項1に記載の内部雰囲気切替機構付密閉容器。   2. The internal atmosphere switching mechanism according to claim 1, wherein the pressure holding vacuum breaking valve mechanism is a diaphragm type valve, and the inside of the closed vessel is kept at atmospheric pressure by holding the diaphragm valve body in an open state from the outside. Sealed container with. 真空保持用弁機構をダイヤフラム型バルブとし、外部からダイヤフラム弁体を開弁状態とすることにより、密閉容器内を大気圧とする構成とした請求項1に記載の内部雰囲気切替機構付密閉容器。   2. The sealed container with an internal atmosphere switching mechanism according to claim 1, wherein the vacuum holding valve mechanism is a diaphragm type valve, and the inside of the sealed container is set to the atmospheric pressure by opening the diaphragm valve body from the outside.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009222189A (en) * 2008-03-18 2009-10-01 Dainippon Screen Mfg Co Ltd Diaphragm valve and substrate processing device having the same
KR20190051832A (en) 2017-11-07 2019-05-15 도쿄엘렉트론가부시키가이샤 Relief valve and substrate processing apparatus
CN113645885A (en) * 2019-04-05 2021-11-12 安重根 Vacuum wall breaking machine

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009222189A (en) * 2008-03-18 2009-10-01 Dainippon Screen Mfg Co Ltd Diaphragm valve and substrate processing device having the same
KR20190051832A (en) 2017-11-07 2019-05-15 도쿄엘렉트론가부시키가이샤 Relief valve and substrate processing apparatus
CN113645885A (en) * 2019-04-05 2021-11-12 安重根 Vacuum wall breaking machine

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