JP2004192861A - Electric contact material and operation switch using it - Google Patents

Electric contact material and operation switch using it Download PDF

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Publication number
JP2004192861A
JP2004192861A JP2002357036A JP2002357036A JP2004192861A JP 2004192861 A JP2004192861 A JP 2004192861A JP 2002357036 A JP2002357036 A JP 2002357036A JP 2002357036 A JP2002357036 A JP 2002357036A JP 2004192861 A JP2004192861 A JP 2004192861A
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Prior art keywords
layer
alloy
contact material
thickness
switch
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JP3956841B2 (en
Inventor
Satoshi Suzuki
智 鈴木
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Furukawa Electric Co Ltd
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Furukawa Electric Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an electric contact material with excellent corrosion resistance under a vulcanized environment and an operating switch with little degradation of solderability and contact resistance even under sulfuric environment. <P>SOLUTION: A first layer consisting of Ag or an Ag alloy, a second layer with Ni, Co, or their alloy as a main component with a thickness of 0.001 to 0.20 μm, and a surface layer with Pd or a Pd alloy as a main component with a thickness of 0.001 to 0.4 μm are laminated in that order on a conductive substrate. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

【0001】
【発明の属する技術分野】
本発明は電気接点材料およびそれを用いた操作スイッチに関し、さらに詳しくは、耐硫化性に優れた電気接点材料、およびこの電気接点材料から構成され、硫化環境下ではんだ付け性および接触抵抗の劣化が抑制された操作スイッチに関する。
【0002】
【従来の技術】
スライドスイッチ、レバースイッチ、プッシュスイッチ、タクティルプッシュスイッチ、および、ディップスイッチなどの各種操作スイッチは、一般に、例えば銅合金条などの導電性基体の表面をAgまたはAg合金で被覆してなる接点材料により形成されている。このような被覆層を設けることにより、基体が具備する機械的、電気的特性に加えて、AgまたはAg合金特有の耐食性、はんだ付け性、および電気接続性が付与されるという利点がある。
【0003】
ところで、上記の各種操作スイッチは、その機能から一次回路切替え用(電源の切替え)と二次回路切替え用(信号の切替え)とに分類される。大電流が流れる一次回路切替えスイッチの接点材料としては、耐アーク性や耐摩耗性に優れたAg−Ni系合金、Ag−CdO系合金、あるいは、Cu合金などにAg合金を高い被覆率で被覆した接点材料が使用されている。一方、二次回路切替えスイッチの接点材料としては、微少電流が流れるため、導電性基体を被覆するAgまたはAg合金層を薄く形成したものが使用される。
【0004】
さらに、上記の操作スイッチは、固定接点部と可動接点部とを組み合わせて構成されているものが多く、その場合、固定接点部ははんだ付け端子と一体化されたものとなっており、例えば、黄銅などよりなる基体にAgまたはAg合金が被覆されたものが使用される。そして、可動接点部は高い弾性を有するりん青銅などよりなる基体にAgまたはAg合金が被覆されたものが使用される。
【0005】
ところで、かかる操作スイッチにおいて固定接点部のはんだ付け端子部は外気に晒される場合が多く、とくに硫化環境下では、表面層のAgが硫化してはんだ付け性が低下するという問題が生じる。この問題を解消するために、はんだ付け端子部に防錆剤を塗布する、あるいは、はんだめっきする等の対策が講じられている。
【0006】
しかし、防錆剤を塗布する方法は、極端な硫化環境下ではその効果が十分ではなく、はんだめっきする方法は、コストの上昇を招来するためいずれも満足すべき対策であるとはいえない。
この接点材料の耐食性を改善するために、導電性基体上にNi、Co、またはこれらの合金を主成分とする下地層が形成され、中間層にAgまたはAg合金層、さらに最外層にPdまたはPd合金層が、それぞれ電気めっき法によって形成されたものが提案されている(特許文献1を参照)。
【0007】
しかしながら、上記のAgまたはAg合金層上へのPdめっきは、硫化環境に長期間晒された場合に、Pdめっき層に存在するピンホールにおいて電食が発生するために硫化変色が生じ、結果として、十分な耐食効果を得ることができないという問題がある。この問題を解消するためには、Pdめっき層の厚さを比較的厚くする必要があるため、コストが上昇するなどの新たな問題が生じる。
【0008】
【特許文献1】
特開平9−330629号公報
【0009】
【発明が解決しようとする課題】
本発明は上記の問題を解消するためになされ、硫化環境下に長期間晒された場合の耐食性に優れ、はんだ付け性や接触抵抗の劣化の抑制された電気接点材料、および、その接点材料により形成された操作スイッチを提供することを目的とする。
【0010】
【課題を解決するための手段】
上記の目的を達成するために、本発明によれば、導電性基体上に、AgまたはAg合金よりなる第1層、Ni,Coまたはこれらの合金を主体とし、厚さが0.001〜0.20μmである第2層、ならびに、PdまたはPd合金を主体とし、厚さが0.001〜0.4μmである表面層がこの順に積層されてなる電気接点材料が提供される。
【0011】
上記の構成において、前記導電性基体と前記第1層との間に、さらに、Ni,Coまたはこれらの合金を主体とする拡散防止層が形成されていることが好ましく、また、前記各層が電気めっき法により形成されていることが好ましい。
また、本発明によれば、接点部およびはんだ付け端子が一体形成された固定端子を具備する操作スイッチであって、前記固定端子が上記のいずれかの構成の電気接点材料により形成されている操作スイッチが提供される。
【0012】
【発明の実施の形態】
以下、図1,2を参照しながら本発明の電気接点材料について詳述する。
本発明の電気接点材料は、基本的に、図1に示すような層構成を有する。すなわち、導電性基体1上にAgまたはAg合金層(第1層)2、Ni、Coまたはこれらの合金層(第2層)3、PdまたはPd合金層(表面層)4がこの順に積層形成されている。
【0013】
図1の電気接点材料において、まず、導電性基体1としてはとくに限定されるものではないが、例えば、Cu、Ni、Feあるいはこれらの合金、または、鋼やAlにCuもしくはCu合金を被覆した複合素材などを使用することができる。これらの材料は電気接点材料の用途、使用環境等に応じて適宜選択されることが好ましい。
【0014】
この導電性基体1上に形成される第1層2はAgまたはAg合金層であり、この層は表面層であるPdまたはPd合金層4が接点の繰り返し開閉動作により機械的に摩耗した場合に、電気接続性を維持する目的で配置されている。Ag合金としては、例えば、Ag−Sb,Ag−Se,Ag−Cu,Ag−Pdなどをあげることができる。
【0015】
この第1層2の厚さは、とくに限定されるものではないが、例えば、0.1〜5.0μmの範囲であることが好ましい。
第2層3は、Ni、Co、またはこれらの合金よりなる層であり、この層は第1層2のAgと表面層4のPdとが局部電池を形成することにより生じるAgの腐食を防止するための、いわば、犠牲陽極として機能する層である。
【0016】
Ni合金としては、Ni−Co,Ni−P,Ni−B,Ni−Znなどが、また、Co合金としては、Co−Ni,Co−P,Co−Bなどがあげられる。
この第2層3の厚さは、0.001〜0.2μmとすることが必要である。この厚さが0.001μm未満である場合には、犠牲陽極として十分な機能を発揮することが困難となり、一方、0.2μmを超えると、表面層4のPdめっきが繰り返し開閉動作により機械的に摩耗した際に、第2層3のNi、Coまたはこれらの合金が酸化して接触抵抗が増加してしまう。
【0017】
表面層4は接点材料において、耐食性、はんだ付け性、電気接続性、耐熱性および耐酸化性を付与するための層であり、PdまたはPd合金により形成される。Pd合金の種類はとくに限定されるものではないが、例えば、Pd−Ni系合金、Pd−Co系合金、Pd−Ag系合金などを好適なものとしてあげることができる。
【0018】
このPd合金におけるPdの含有量は50質量%以上であることが好ましく、さらに好ましくは、70質量%以上である。Pdの含有量が50質量%未満である場合には、上記の各効果が十分に発揮されない可能性がある。
また、この表面層4の厚さは、0.001〜0.4μmでとすることが必要である。この厚さが0.001μm未満である場合には、表面層4を形成したことによる十分な効果が得られず、また、0.4μmを超えてもその効果は飽和に達し、経済的な不利益が生じるとともに、曲げ加工時に表面に割れが発生しやすくなる。表面層4のさらに好ましい厚さは、0.005〜0.1μmである。
【0019】
図2は本発明の電気接点材料の他の構成を示し、図中、図1と同一の構成要素には同一の符号を付して示してある。
この電気接点材料は、導電性基体1と第1層2との間に、さらに拡散防止層5が形成されているものである。拡散防止層5はNi、Coまたはこれらの合金より形成され、導電性基体1の構成元素がPdまたはPd合金よりなる表面層4に拡散して耐食性を低下させるのを防止するために有効である。拡散防止層5の好適な厚さは、0.05〜1.0μmである。
【0020】
上記の電気接点材料において、導電性基体1上の各層の形成方法はとくに限定されるものではないが、例えば、電気めっき法により形成すると、各層の厚さを精密に制御でき、また、量産性に優れるため経済的に有利である。
本発明の操作スイッチは上述した電気接点材料を用いて形成される。ここで、操作スイッチとしては、スライドスイッチ、レバースイッチ、プッシュスイッチ、タクティルプッシュスイッチ、ディップスイッチなどのような接点部とはんだ付け端子部とが一体に形成された固定端子を備えたスイッチ類をいう。
【0021】
すなわち、本発明の電気接点材料が固定端子に使用され、その表面に接点部とはんだ付け端子部とが形成されたものであり、接点部には可動接点部が接触・離隔してスイッチの開閉動作が行われる。
このような操作スイッチにおいて、固定端子を上記の層構成を有する本発明の電気接点材料により構成することにより、当該スイッチが硫化環境下で使用された場合も、長期間に亘ってはんだ付け性および接触抵抗の劣化が抑制され、信頼性の高い操作スイッチを得ることが可能となる。
【0022】
【実施例】
実施例1〜13、比較例1〜5、従来例
<電気接点材料の製造>
厚さ0.3mm、幅30mmの黄銅条を導電性基体とし、これを電解脱脂、酸洗の前処理後に、連続めっきラインに通板して表1に示した各めっき層を形成し、電気接点材料(a)〜(s)を製造した。なお、各めっき層は以下に示す条件により形成した。
【0023】

Figure 2004192861
Figure 2004192861
【0024】
【表1】
Figure 2004192861
【0025】
<評価試験>
上記により得られた各電気接点材料について、以下の各条件で、硫化環境下に保持前後のはんだ付け性と接触抵抗の変化、および、10万回の接点開閉試験後の接触抵抗を測定し、結果を表2に示した。
1)硫化環境保持前後のはんだ付け性
硫化水素(HS)濃度3ppm、温度40℃の硫化環境下に各接点材料を24時間保持し、その前後のはんだ付け性を、メニスコグラフにより、濡れ時間(ゼロクロスタイム)として求めた。なお、はんだとしては、共晶SnPbはんだを用い、フラックスとして25%ロジン/IPAを用い、サンプル幅は5mmとした。
2)硫化環境保持前後の接触抵抗
上記と同様の硫化環境下で保持前後の接触抵抗を測定した。頭部5Rの純Ag製プローブを使用し、荷重196mN(20gf)、電流10mAの各条件で測定した。
3)10万回開閉接点試験
Agめっき厚2.0μmのAgめっきりん青銅条にダボ加工(先端2R)を施したものをプローブとして用い、荷重0.98N(100gf)、電流10mA、開閉速度5Hzの条件で10万回の開閉試験を行い、10万回終了時の接触抵抗を測定した。
【0026】
【表2】
Figure 2004192861
【0027】
表2の結果からも明らかなように、本発明の電気接点材料(実施例1〜13)は、表面層がAgにより形成されている従来の電気接点材料(従来例)に比べて、硫化試験後のはんだ付け性に優れ、さらに接触抵抗の劣化も小さく、耐食性に優れたものであることが確認された。
【0028】
それに対して、第2層が形成されていないもの(比較例1)は硫化試験時間24時間で硫化腐食が進行してはんだ付け性および接触抵抗が著しく劣化した。また、第2層の厚さが本発明の範囲を下回るもの(比較例2)はAgの硫化によりはんだ付け性が低下し、逆に第2層の厚さが本発明の範囲を超えるもの(比較例3)は、はんだ付け性と接触抵抗の劣化の程度は小さいものの、開閉接点試験において接触抵抗の著しい増加が見られた。
【0029】
さらに、表面層の厚さが本発明の範囲を下回るもの(比較例4)は、硫化試験後のはんだ付け性および接触抵抗の劣化が顕著であり、逆に、表面層の厚さが本発明の範囲を超えるもの(比較例5)は、はんだ付けと接触抵抗はいずれも劣化しないとはいえ、コストが大幅に上昇し、また曲げ割れが発生しやすいという問題がある。
【0030】
【発明の効果】
以上の説明から明らかなように、本発明の電気接点材料は硫化環境下での腐食が防止されているため、これらの電気接点材料より形成された操作スイッチは、硫化環境下でのはんだ付け性および接触抵抗の劣化が抑制され、耐久性および信頼性に優れたものである。したがって、スライドスイッチ、レバースイッチ、プッシュスイッチ、タクティルプッシュスイッチ、および、ディップスイッチなどの各種操作スイッチに適用した際に極めて有用であり、その工業的価値は高い。
【図面の簡単な説明】
【図1】本発明の電気接点材料の層構成を示す概念的縦断面図である。
【図2】本発明の電気接点材料の層構成の好ましい態様を示す概念的縦断面図である。
【符号の説明】
1 導電性基体
2 第1層(AgまたはAg合金層)
3 第2層(Ni,Coまたはこれらの合金層)
4 表面層(PdまたはPd合金層)
5 拡散防止層(Ni,Coまたはこれらの合金層)[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to an electric contact material and an operation switch using the same, and more particularly, to an electric contact material excellent in sulfuration resistance, and composed of the electric contact material, and having a deterioration in solderability and contact resistance in a sulfurized environment. In which the operation switch is suppressed.
[0002]
[Prior art]
Various operation switches such as a slide switch, a lever switch, a push switch, a tactile push switch, and a dip switch are generally contact materials obtained by coating a surface of a conductive substrate such as a copper alloy strip with Ag or an Ag alloy. Is formed. By providing such a coating layer, there is an advantage that in addition to the mechanical and electrical properties of the substrate, the corrosion resistance, solderability, and electrical connectivity inherent to Ag or an Ag alloy are imparted.
[0003]
By the way, the various operation switches are classified into primary circuit switching (power supply switching) and secondary circuit switching (signal switching) according to their functions. As a contact material of the primary circuit changeover switch through which a large current flows, Ag-Ni alloy, Ag-CdO alloy, or Cu alloy with excellent arc resistance and wear resistance are coated with Ag alloy at a high coverage. Contact material is used. On the other hand, as a contact material of the secondary circuit changeover switch, a material having a thin Ag or Ag alloy layer covering the conductive substrate is used because a minute current flows.
[0004]
Furthermore, the above-mentioned operation switch is often configured by combining a fixed contact portion and a movable contact portion, in which case, the fixed contact portion is integrated with a soldering terminal, for example, A substrate made of brass or the like coated with Ag or an Ag alloy is used. As the movable contact portion, a substrate made of phosphor bronze having high elasticity and coated with Ag or an Ag alloy is used.
[0005]
By the way, in such an operation switch, the soldering terminal portion of the fixed contact portion is often exposed to the outside air. In particular, in a sulfurizing environment, there is a problem that Ag in the surface layer is sulfurized and the solderability is reduced. In order to solve this problem, countermeasures such as applying a rust preventive to the soldering terminal portion or plating with solder are taken.
[0006]
However, the method of applying a rust preventive is not effective enough in an extremely sulfurized environment, and the method of solder plating raises the cost, so that it cannot be said that any method is satisfactory.
In order to improve the corrosion resistance of the contact material, a base layer mainly composed of Ni, Co, or an alloy thereof is formed on the conductive substrate, and an Ag or Ag alloy layer is formed on the intermediate layer, and a Pd or Ag layer is formed on the outermost layer. A Pd alloy layer formed by an electroplating method has been proposed (see Patent Document 1).
[0007]
However, when the Pd plating on the Ag or Ag alloy layer is exposed to a sulfurizing environment for a long time, the electrolytic corrosion occurs in pinholes existing in the Pd plating layer, thereby causing discoloration due to sulfurization. However, there is a problem that a sufficient corrosion resistance effect cannot be obtained. In order to solve this problem, it is necessary to make the thickness of the Pd plating layer relatively large, so that new problems such as an increase in cost arise.
[0008]
[Patent Document 1]
JP-A-9-330629
[Problems to be solved by the invention]
The present invention has been made in order to solve the above-described problems, and has excellent corrosion resistance when exposed to a sulfurized environment for a long period of time, and an electrical contact material in which deterioration of solderability and contact resistance is suppressed, and the contact material It is an object to provide a formed operation switch.
[0010]
[Means for Solving the Problems]
In order to achieve the above object, according to the present invention, a first layer made of Ag or an Ag alloy, mainly composed of Ni, Co or an alloy thereof, having a thickness of 0.001 to 0, is formed on a conductive substrate. An electric contact material is provided in which a second layer having a thickness of .20 μm and a surface layer mainly composed of Pd or a Pd alloy and having a thickness of 0.001 to 0.4 μm are laminated in this order.
[0011]
In the above structure, it is preferable that a diffusion prevention layer mainly composed of Ni, Co, or an alloy thereof is further formed between the conductive substrate and the first layer. It is preferably formed by a plating method.
Further, according to the present invention, there is provided an operation switch including a fixed terminal in which a contact portion and a soldering terminal are integrally formed, wherein the fixed terminal is formed of an electrical contact material having any one of the above-described configurations. A switch is provided.
[0012]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, the electrical contact material of the present invention will be described in detail with reference to FIGS.
The electrical contact material of the present invention basically has a layer configuration as shown in FIG. That is, Ag or Ag alloy layer (first layer) 2, Ni, Co or alloy layer (second layer) 3, and Pd or Pd alloy layer (surface layer) 4 are formed on conductive substrate 1 in this order. Have been.
[0013]
In the electrical contact material of FIG. 1, first, the conductive substrate 1 is not particularly limited. For example, Cu, Ni, Fe or an alloy thereof, or steel or Al coated with Cu or a Cu alloy is used. Composite materials and the like can be used. It is preferable that these materials are appropriately selected according to the use of the electric contact material, the use environment, and the like.
[0014]
The first layer 2 formed on the conductive substrate 1 is an Ag or Ag alloy layer, and this layer is used when the surface layer Pd or the Pd alloy layer 4 is mechanically worn by repeated contact opening and closing operations. , For the purpose of maintaining electrical connectivity. Examples of the Ag alloy include Ag-Sb, Ag-Se, Ag-Cu, and Ag-Pd.
[0015]
The thickness of the first layer 2 is not particularly limited, but is preferably, for example, in the range of 0.1 to 5.0 μm.
The second layer 3 is a layer made of Ni, Co, or an alloy thereof. This layer prevents the corrosion of Ag caused by the formation of the local cell by the Ag of the first layer 2 and the Pd of the surface layer 4. In other words, it is a layer that functions as a sacrificial anode.
[0016]
Examples of the Ni alloy include Ni-Co, Ni-P, Ni-B, and Ni-Zn, and examples of the Co alloy include Co-Ni, Co-P, and Co-B.
The thickness of the second layer 3 needs to be 0.001 to 0.2 μm. When the thickness is less than 0.001 μm, it is difficult to exhibit a sufficient function as a sacrificial anode. On the other hand, when the thickness is more than 0.2 μm, Pd plating of the surface layer 4 is mechanically performed by repeated opening and closing operations. When the second layer 3 is worn down, Ni, Co or an alloy thereof is oxidized to increase the contact resistance.
[0017]
The surface layer 4 is a layer for imparting corrosion resistance, solderability, electrical connectivity, heat resistance and oxidation resistance in the contact material, and is formed of Pd or a Pd alloy. Although the type of the Pd alloy is not particularly limited, for example, a Pd-Ni-based alloy, a Pd-Co-based alloy, a Pd-Ag-based alloy and the like can be mentioned as suitable ones.
[0018]
The Pd content in the Pd alloy is preferably at least 50% by mass, and more preferably at least 70% by mass. When the content of Pd is less than 50% by mass, each of the above effects may not be sufficiently exhibited.
The thickness of the surface layer 4 needs to be 0.001 to 0.4 μm. When the thickness is less than 0.001 μm, a sufficient effect due to the formation of the surface layer 4 cannot be obtained, and when the thickness exceeds 0.4 μm, the effect reaches saturation and is not economically viable. Profit is generated, and cracks are easily generated on the surface during bending. The more preferable thickness of the surface layer 4 is 0.005 to 0.1 μm.
[0019]
FIG. 2 shows another configuration of the electrical contact material of the present invention. In the drawing, the same components as those in FIG. 1 are denoted by the same reference numerals.
This electrical contact material is such that a diffusion preventing layer 5 is further formed between the conductive substrate 1 and the first layer 2. The diffusion prevention layer 5 is formed of Ni, Co, or an alloy thereof, and is effective for preventing the constituent elements of the conductive substrate 1 from diffusing into the surface layer 4 made of Pd or a Pd alloy to reduce the corrosion resistance. . The preferred thickness of the diffusion prevention layer 5 is 0.05 to 1.0 μm.
[0020]
In the above electrical contact material, the method of forming each layer on the conductive substrate 1 is not particularly limited. For example, when the layer is formed by electroplating, the thickness of each layer can be controlled precisely, and And is economically advantageous.
The operation switch of the present invention is formed using the above-mentioned electric contact material. Here, as the operation switch, switches having a fixed terminal in which a contact portion and a soldering terminal portion are integrally formed, such as a slide switch, a lever switch, a push switch, a tactile push switch, and a dip switch, are used. Say.
[0021]
That is, the electrical contact material of the present invention is used for a fixed terminal, and a contact portion and a soldered terminal portion are formed on the surface of the fixed terminal, and the movable contact portion contacts and separates from the contact portion to open and close the switch. The operation is performed.
In such an operation switch, by configuring the fixed terminal with the electric contact material of the present invention having the above-described layer configuration, even when the switch is used in a sulfurized environment, the solderability and the solderability can be maintained over a long period of time. Deterioration of contact resistance is suppressed, and a highly reliable operation switch can be obtained.
[0022]
【Example】
Examples 1 to 13, Comparative Examples 1 to 5, Conventional Example <Production of Electrical Contact Material>
A brass strip having a thickness of 0.3 mm and a width of 30 mm was used as a conductive substrate. After the pretreatment of electrolytic degreasing and pickling, the brass strip was passed through a continuous plating line to form each plating layer shown in Table 1. Contact materials (a) to (s) were manufactured. Each plating layer was formed under the following conditions.
[0023]
Figure 2004192861
Figure 2004192861
[0024]
[Table 1]
Figure 2004192861
[0025]
<Evaluation test>
For each of the electrical contact materials obtained above, under the following conditions, the change in solderability and contact resistance before and after holding in a sulfurized environment, and the contact resistance after 100,000 times of contact opening and closing tests were measured. The results are shown in Table 2.
1) Solderability before and after holding sulfurized environment Each contact material was held for 24 hours in a sulfurized environment with a hydrogen sulfide (H 2 S) concentration of 3 ppm and a temperature of 40 ° C., and the solderability before and after the contact time was measured using a meniscograph to determine the wetting time. (Zero cross time). Note that eutectic SnPb solder was used as the solder, 25% rosin / IPA was used as the flux, and the sample width was 5 mm.
2) Contact resistance before and after holding in sulfurizing environment Contact resistance before and after holding in the same sulfurizing environment as above was measured. Using a probe made of pure Ag having a head 5R, the measurement was performed under the conditions of a load of 196 mN (20 gf) and a current of 10 mA.
3) 100,000 times switching contact test Ag plating Phosphor bronze strip with Ag plating thickness of 2.0 μm and subjected to dowel processing (tip 2R) as a probe, load 0.98 N (100 gf), current 10 mA, switching speed 5 Hz Was performed 100,000 times under the above conditions, and the contact resistance at the end of 100,000 times was measured.
[0026]
[Table 2]
Figure 2004192861
[0027]
As is clear from the results in Table 2, the electrical contact material of the present invention (Examples 1 to 13) has a higher sulfuric acid test than the conventional electrical contact material in which the surface layer is formed of Ag (conventional example). It was confirmed that it was excellent in later solderability, furthermore, the deterioration of contact resistance was small and the corrosion resistance was excellent.
[0028]
On the other hand, in the case where the second layer was not formed (Comparative Example 1), the sulfidation corrosion progressed in 24 hours of the sulfurization test, and the solderability and the contact resistance were significantly deteriorated. In the case where the thickness of the second layer is less than the range of the present invention (Comparative Example 2), the solderability is reduced due to sulfuration of Ag, and conversely, the thickness of the second layer exceeds the range of the present invention ( In Comparative Example 3), although the degree of deterioration of the solderability and the contact resistance was small, a remarkable increase in the contact resistance was observed in the switching contact test.
[0029]
Further, when the thickness of the surface layer is less than the range of the present invention (Comparative Example 4), the solderability and the contact resistance after the sulfidation test are remarkably deteriorated. (Comparative Example 5) has a problem that although both soldering and contact resistance are not deteriorated, the cost is greatly increased and bending cracks are easily generated.
[0030]
【The invention's effect】
As is apparent from the above description, since the electrical contact material of the present invention is prevented from corroding in a sulfurized environment, the operation switch formed from these electrical contact materials has a soldering property in a sulfurized environment. In addition, deterioration of contact resistance is suppressed, and durability and reliability are excellent. Therefore, it is extremely useful when applied to various operation switches such as a slide switch, a lever switch, a push switch, a tactile push switch, and a dip switch, and its industrial value is high.
[Brief description of the drawings]
FIG. 1 is a conceptual longitudinal sectional view showing a layer configuration of an electric contact material of the present invention.
FIG. 2 is a conceptual longitudinal sectional view showing a preferred embodiment of a layer structure of the electric contact material of the present invention.
[Explanation of symbols]
1 conductive substrate 2 first layer (Ag or Ag alloy layer)
3 Second layer (Ni, Co or alloy layer thereof)
4 Surface layer (Pd or Pd alloy layer)
5 Diffusion prevention layer (Ni, Co or alloy layer thereof)

Claims (4)

導電性基体上に、AgまたはAg合金よりなる第1層、Ni,Coまたはこれらの合金を主体とし、厚さが0.001〜0.20μmである第2層、ならびに、PdまたはPd合金を主体とし、厚さが0.001〜0.4μmである表面層がこの順に積層されてなる電気接点材料。A first layer made of Ag or an Ag alloy, a second layer mainly composed of Ni, Co or an alloy thereof, having a thickness of 0.001 to 0.20 μm, and Pd or a Pd alloy are formed on a conductive substrate. An electric contact material mainly comprising a surface layer having a thickness of 0.001 to 0.4 μm laminated in this order. 前記導電性基体と前記第1層との間に、さらに、Ni,Coまたはこれらの合金を主体とする拡散防止層が形成されている請求項1記載の電気接点材料。The electrical contact material according to claim 1, wherein a diffusion preventing layer mainly composed of Ni, Co, or an alloy thereof is formed between the conductive substrate and the first layer. 前記各層が電気めっき法により形成されている請求項1または2記載の電気接点材料。3. The electrical contact material according to claim 1, wherein each of said layers is formed by an electroplating method. 接点部およびはんだ付け端子が一体形成された固定端子を具備する操作スイッチであって、前記固定端子が請求項1〜3のいずれかに記載の接点材料により形成されていることを特徴とする操作スイッチ。An operation switch comprising a fixed terminal in which a contact portion and a soldering terminal are integrally formed, wherein the fixed terminal is formed of the contact material according to claim 1. switch.
JP2002357036A 2002-12-09 2002-12-09 Electrical contact material and operation switch using the same Expired - Fee Related JP3956841B2 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017033795A1 (en) * 2015-08-25 2017-03-02 株式会社エンプラス Electrical contact and socket for electrical component
JP2019145458A (en) * 2018-02-23 2019-08-29 古河電気工業株式会社 Electrical contact material and switch using the same
JP2020063515A (en) * 2016-01-25 2020-04-23 田中貴金属工業株式会社 Sliding contact material and manufacturing method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017033795A1 (en) * 2015-08-25 2017-03-02 株式会社エンプラス Electrical contact and socket for electrical component
JP2017045589A (en) * 2015-08-25 2017-03-02 株式会社エンプラス Electric contactor and socket for electric component
US10431918B2 (en) 2015-08-25 2019-10-01 Enplas Corporation Electrical contact terminal and electronic component socket
JP2020063515A (en) * 2016-01-25 2020-04-23 田中貴金属工業株式会社 Sliding contact material and manufacturing method thereof
JP2019145458A (en) * 2018-02-23 2019-08-29 古河電気工業株式会社 Electrical contact material and switch using the same

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