JPH02226619A - Electric contact material and manufacture thereof - Google Patents

Electric contact material and manufacture thereof

Info

Publication number
JPH02226619A
JPH02226619A JP4419789A JP4419789A JPH02226619A JP H02226619 A JPH02226619 A JP H02226619A JP 4419789 A JP4419789 A JP 4419789A JP 4419789 A JP4419789 A JP 4419789A JP H02226619 A JPH02226619 A JP H02226619A
Authority
JP
Japan
Prior art keywords
alloy
contact
base material
layer
coating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4419789A
Other languages
Japanese (ja)
Inventor
Satoshi Suzuki
智 鈴木
Nobuyuki Shibata
宣行 柴田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP4419789A priority Critical patent/JPH02226619A/en
Publication of JPH02226619A publication Critical patent/JPH02226619A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain an electric contact material of excellent electric connection that does not generate adhesion nor abrasion by depositing an Ag or Ag alloy coating layer, and a thin layer of Au, Pd, Ru, Rh, or of alloy thereof, on the surface of a metal filament substrate. CONSTITUTION:Cu, Cu alloy, Cu coated steel material, or Al material, or Ni, Fe, or alloy thereof are used for a base material, on which 0.5mum or more of Ag or of alloy such as Ag-Cu, Ag-Sb, etc., is formed by electroplating and so on. On the surface, a thin layer of Au, Pt, Ru, Rh or of alloy thereof is electroplated by 0.001-0.1mum. The thin film is effective when it is not less than 0.001mum, and the generation of adhesion and abrasion due to the contact between Ag or alloy thereof is prevented, forming an excellent electric contact.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は電気接点材料とその製造方法に関し、更に詳し
くは、電気接点として用いたときに優れた摺動特性や安
定した電気接続性を発揮する電気接点材料と、その製造
方法に関する。
[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to an electrical contact material and a method for manufacturing the same, and more specifically, exhibits excellent sliding properties and stable electrical connectivity when used as an electrical contact. The present invention relates to an electrical contact material and a manufacturing method thereof.

(従来の技術) 一般に、各種の金属線条の基材の表面をAgまたはAg
合金で被覆した材料は、基材が具備する特性に加えて、
AgまたはAg合金特有の耐食性、半田付は性、電気接
続性等が発現するため、従来から各種の用途に用いられ
る。
(Prior art) Generally, the surface of the base material of various metal wires is coated with Ag or Ag.
In addition to the properties possessed by the base material, materials coated with alloys have
Ag or Ag alloys exhibit corrosion resistance, solderability, electrical connectivity, etc., which are unique to Ag or Ag alloys, so they have been used for various purposes.

例えば、Cu合金条に厚み0.5〜20μmのAg被覆
層を形成したAg被被覆Cu会合材料、基材であるCu
合金の優れた機械的特性に加えて、八gの優れた耐食性
、半田付は性、電気接続性等を有する経済的な高性能導
体として知られており、電気・電子機器分野における部
品やリード材料として広く用いられている。また、この
材料は電気接点の材料としても用いられている。
For example, an Ag-coated Cu association material in which an Ag coating layer with a thickness of 0.5 to 20 μm is formed on a Cu alloy strip;
In addition to the excellent mechanical properties of the alloy, it is known as an economical high-performance conductor with excellent corrosion resistance, solderability, electrical connectivity, etc., and is used as a component and lead in the electrical and electronic equipment field. Widely used as a material. This material is also used as a material for electrical contacts.

(発明が解決しようとする課題) ところで、スイッチは固定接点と可動接点を組み合わせ
て構成される。そして、これら両接点には、いずれも基
材表面にAgまたはAg合金の被覆層を形成した材料が
用いられている。
(Problems to be Solved by the Invention) By the way, a switch is constructed by combining a fixed contact and a movable contact. Both of these contacts are made of a material in which a coating layer of Ag or Ag alloy is formed on the surface of the base material.

しかしながら、これら両接点の接触回数が増加するにつ
れて、スイッチ作動力の低下や接触抵抗の増加が発生し
はじめてスイッチ機能の低下を招き、結局はスイッチの
使用寿命が短くなる。この現象は、両接点の接触面にお
けるAgまたはAg合金の凝着に起因するものであって
、凝着の進行によってスイッチ作動力が低下し、接触面
のAgまたはAg合金の被覆層が剥ぎとられて基材が露
出することにより接触抵抗の増加を引き起すからである
However, as the number of contacts between these two contacts increases, the switch actuation force begins to decrease and the contact resistance increases, leading to a decrease in the switch function and eventually shortening the service life of the switch. This phenomenon is caused by the adhesion of Ag or Ag alloy on the contact surfaces of both contacts, and as the adhesion progresses, the switch actuation force decreases and the coating layer of Ag or Ag alloy on the contact surfaces is peeled off. This is because contact resistance increases as the base material is exposed.

このような凝着摩耗現象を防止するための手段としては
、Au−Ag、Pd−Ag、AgPd−Agのような異
種金属を互いに組合わせた材料で接点表面を構成するこ
とが知られている。しかしながら、この手段は、上記の
ような高価な貴金属を使用するため、接点のコストを大
幅に高めてしまい、その用途は極(狭く限定されざるを
得ない。
As a means to prevent such adhesive wear phenomena, it is known that the contact surface is made of a material that is a combination of different metals such as Au-Ag, Pd-Ag, and AgPd-Ag. . However, since this method uses expensive precious metals such as those mentioned above, the cost of the contact point increases significantly, and its application is inevitably limited to a very narrow range.

一般に、電気接点には安定した電気接続性が要求される
ものが多い、そして、この電気接続性を安定化させるた
めには、初期においてもまた時間が経過したのちであっ
ても、両接点間における接触抵抗の変動を小たらしめる
ことや、接触面における摺動性が良好で摩耗損傷が小さ
く、しかも耐食性に優れていることが必要とされている
In general, many electrical contacts require stable electrical connectivity, and in order to stabilize this electrical connectivity, both initially and after time has passed, it is necessary to It is necessary to reduce fluctuations in contact resistance at the contact surface, to have good sliding properties on the contact surface, to reduce wear damage, and to have excellent corrosion resistance.

本発明は、上記したような凝着摩耗現象を起こすことが
なく、また電気接続性も優れている電気接点材料とそれ
を安価に製造する方法の提供を目的とする。
The object of the present invention is to provide an electrical contact material that does not cause the adhesive wear phenomenon described above and has excellent electrical connectivity, and a method for manufacturing the same at low cost.

(課題を解決するための手段・作用) 上記した目的を達成するために、本発明においては、金
属線条基材と、該金属線条基材の表面を被覆して形成さ
れたAgまたはAg合金の被覆層と、該被覆層の表面を
被覆して形成されたAu。
(Means/effects for solving the problem) In order to achieve the above-mentioned object, the present invention includes a metal filament base material, and Ag or Ag formed by coating the surface of the metal filament base material. An alloy coating layer and Au formed by coating the surface of the coating layer.

Pd、Ru、Rhまたはこれらの合金の薄層とから成る
ことを特徴とする電気接点材料が提供され、また、金属
線条基材の表面に、AgまたはAg合金のめっき処理ま
たはクラッド処理を施して被覆層を形成したのち、@被
覆層の表面に、Au、Pd。
There is provided an electrical contact material characterized by comprising a thin layer of Pd, Ru, Rh or an alloy thereof, and the surface of the metal wire base material is plated or cladded with Ag or an Ag alloy. After forming a coating layer, Au and Pd are deposited on the surface of the coating layer.

Ru、Rhまたはこれらの合金のめっき処理を施して薄
層を形成することを特徴とする電気接点材料が提供され
る。
An electrical contact material is provided that is characterized in that it is plated with Ru, Rh, or an alloy thereof to form a thin layer.

まず、本発明において、用いる金属線条基材としては、
Cu、各種のCu合金;Cu被覆鋼材、Cu被覆アルミ
材のような、CuまたはCu合金で異種材料を被覆して
成る複合基材;または、[。
First, in the present invention, the metal wire base material used is
Cu, various Cu alloys; composite substrates made by coating different materials with Cu or Cu alloys, such as Cu-coated steel and Cu-coated aluminum; or [.

Fe、これらの合金から成る基材;をあげることができ
る。
Examples include Fe and a base material made of an alloy thereof.

この基材の表面には、AgまたはAg合金の被覆層が形
成される。用いるAg合金としては、^g−Cu合金、
Ag−5b合金などをあげることができる。
A coating layer of Ag or Ag alloy is formed on the surface of this base material. The Ag alloy used is ^g-Cu alloy,
Examples include Ag-5b alloy.

この被覆層は、電気めっき法またはクラッド法を適用し
て形成される。形成される被覆層の厚みは、通常、0.
5μm以上であればよく、そのような層厚となるように
、電気めっき法やクラッド法における操業条件が管理さ
れる。
This coating layer is formed by applying an electroplating method or a cladding method. The thickness of the formed coating layer is usually 0.
It is sufficient that the layer thickness is 5 μm or more, and the operating conditions in the electroplating method and the cladding method are controlled so that such a layer thickness is obtained.

本発明の材料は、上記したAgまたはAg合金の被覆層
の表面に、更に、Au、PL、Ru、RhまたはAu−
Ag、Au−Pdのようなこれらの合金から成る薄層が
積層して形成される。
The material of the present invention further has Au, PL, Ru, Rh or Au-
Thin layers of these alloys, such as Ag and Au-Pd, are laminated.

この薄層は、下地としである被覆層のAgが接点作動時
に互いに凝着する現象を抑制する作用を果すものと考え
られる。すなわち、Agまたはへg合金は互いに接触す
ると、前記したような凝着摩耗を起してスイッチ作動力
を低下せしめたり、または基材から剥ぎとられて基材を
露出せしめて接点間の接触抵抗を増加させることになる
が、両接点間では、この薄層が介在することにより上記
現象が抑制されるものと考えられる。
This thin layer is thought to have the effect of suppressing the phenomenon in which the Ag of the underlying coating layer adheres to each other during contact operation. In other words, when Ag or Heg alloys come into contact with each other, they may cause adhesive wear as described above, reducing the switch actuation force, or they may be peeled off from the base material, exposing the base material and reducing the contact resistance between the contacts. However, it is thought that the presence of this thin layer between both contacts suppresses the above phenomenon.

このような効果は、薄層の厚みが0.001μm以上か
ら発現しはじめる。しかし、0.1μmより厚くしても
効果は飽和に達して、徒らに高価な貴金属を消費するば
かりで経済的ではないので、上記薄層の厚みは、0.0
01〜0.1μmの範囲に設定することか好ましい。
Such an effect begins to appear when the thickness of the thin layer is 0.001 μm or more. However, even if it is thicker than 0.1 μm, the effect will reach saturation and expensive precious metals will be wasted, which is not economical.
It is preferable to set it in the range of 0.01 to 0.1 μm.

薄層は電気めっき法で形成される。用いるめっき浴、め
っき条件等は、薄層の種類、形成する厚み等を勘案して
適宜に選定すればよい。
The thin layer is formed by electroplating. The plating bath to be used, plating conditions, etc. may be appropriately selected in consideration of the type of thin layer, the thickness to be formed, etc.

(発明の実施例) 実施例1〜9.比較例1〜3 厚み0.3m、幅3m、長さ150mの黄銅板に、アル
カリ脱脂、水洗、酸洗の各処理を施して表面を清浄化し
た。
(Embodiments of the invention) Examples 1 to 9. Comparative Examples 1 to 3 A brass plate with a thickness of 0.3 m, a width of 3 m, and a length of 150 m was subjected to alkaline degreasing, water washing, and pickling to clean the surface.

ついで、この黄銅板の表面に、Agストライクめっきを
施し、第1表に示したような各種厚みのAgめっき被覆
層を形成した。
Next, the surface of this brass plate was subjected to Ag strike plating to form Ag plating coating layers having various thicknesses as shown in Table 1.

つぎに、得られたAgめっき黄銅板の表面に、第1表に
示した金属または合金からなり第1表のような厚みを有
するめっき薄層を形成した。
Next, a thin plating layer made of the metal or alloy shown in Table 1 and having the thickness shown in Table 1 was formed on the surface of the obtained Ag-plated brass plate.

得られた各材料につき、下記仕様で動摩擦係数と微動摩
擦接触抵抗とのそれぞれの経時変化を調べた。
For each of the obtained materials, changes over time in the dynamic friction coefficient and microdynamic friction contact resistance were investigated using the following specifications.

動摩擦係数:ヘッド頭部の半径が5mであるAg棒を上
記めっき薄層に当接し、50g の荷重をかけなから摺動路j!110 mの間を反復摺
動せしめ、摺動回数10回。
Dynamic friction coefficient: An Ag rod with a head radius of 5 m is brought into contact with the above thin plating layer, and a load of 50 g is applied to the sliding path. Repeated sliding over a distance of 110 m, 10 times.

50回、100回、200回、500 回の各場合における動摩擦係数を測 定。50 times, 100 times, 200 times, 500 Measure the coefficient of kinetic friction in each case. Fixed.

微動摩擦接触抵抗:ヘッド頭部の半径が5腸であるAg
棒を上記めっき薄層に当接 し、100 gの荷重をかけ、通電電流IAの条件で、
摺動距離0.1 mの間を反復摺動せしめ、摺動回数が
0.5 万回、2万回、5万回、10万回。
Microdynamic friction contact resistance: Ag whose head radius is 5 mm
A rod was brought into contact with the thin plating layer, a load of 100 g was applied, and the current applied was IA.
Repeated sliding is performed over a sliding distance of 0.1 m, and the number of times of sliding is 5,000, 20,000, 50,000, and 100,000 times.

20万回の各場合における接触抵抗 を測定。Contact resistance in each case of 200,000 times Measure.

以上の結果を一括して第1表に示した。The above results are collectively shown in Table 1.

c以下余白) (発明の効果) 以上の説明で明らかなように、本発明における材料は、
動摩擦係数が小さくその摺動特性が優れ、また接触抵抗
の経時変化も少なく安定している。
(Blank below c) (Effect of the invention) As is clear from the above explanation, the materials in the present invention are:
It has a small coefficient of dynamic friction and excellent sliding properties, and the contact resistance changes little over time and is stable.

このことは、AgまたはAg合金の被覆層の表面に貴金
属のめっき薄層を形成したことに基づく効果であること
が、比較例の材料(比較例3の場合はAgめっき層の厚
み3.0μm)の特性と比べて明瞭である。
This is an effect based on the formation of a thin noble metal plating layer on the surface of the coating layer of Ag or Ag alloy. ) is clear compared to the characteristics of

しかも、めっき薄層の厚みは掘めて薄いので、製造され
た材料は比較的安価になる。このように、本発明によれ
ば、安定した電気接続性を有する電気接点材料を安価に
提供することができ、その工業的価値は大である。
Moreover, since the thickness of the thin plating layer is relatively thin, the manufactured material is relatively inexpensive. As described above, according to the present invention, an electrical contact material having stable electrical connectivity can be provided at low cost, and its industrial value is great.

Claims (4)

【特許請求の範囲】[Claims] (1)金属線条基材と、該金属線条基材の表面を被覆し
て形成された銀または銀合金の被覆層と、該被覆層の表
面を被覆して形成された金、白金、ルビジウム、ロジウ
ムまたはこれらの合金の薄層とから成ることを特徴とす
る電気接点材料。
(1) a metal filament base material, a coating layer of silver or silver alloy formed by coating the surface of the metal filament base material, and gold or platinum formed by coating the surface of the coating layer; An electrical contact material comprising a thin layer of rubidium, rhodium or an alloy thereof.
(2)前記薄層の厚みが0.001〜0.1μmである
請求項1記載の電気接点材料。
(2) The electrical contact material according to claim 1, wherein the thin layer has a thickness of 0.001 to 0.1 μm.
(3)金属線条基材の表面に、銀または銀合金のめっき
処理またはクラッド処理を施して被覆層を形成したのち
、該被覆層の表面に、金、白金、ルビジウム、ロジウム
またはこれらの合金のめっき処理を施して薄層を形成す
ることを特徴とする電気接点材料の製造方法。
(3) After forming a coating layer on the surface of the metal wire base material by plating or cladding with silver or silver alloy, gold, platinum, rubidium, rhodium or an alloy thereof is applied to the surface of the coating layer. 1. A method for producing an electrical contact material, which comprises forming a thin layer through plating.
(4)前記薄層の厚みが0.001〜0.1μmである
請求項3記載の製造方法。
(4) The manufacturing method according to claim 3, wherein the thin layer has a thickness of 0.001 to 0.1 μm.
JP4419789A 1989-02-23 1989-02-23 Electric contact material and manufacture thereof Pending JPH02226619A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4419789A JPH02226619A (en) 1989-02-23 1989-02-23 Electric contact material and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4419789A JPH02226619A (en) 1989-02-23 1989-02-23 Electric contact material and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH02226619A true JPH02226619A (en) 1990-09-10

Family

ID=12684848

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4419789A Pending JPH02226619A (en) 1989-02-23 1989-02-23 Electric contact material and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH02226619A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014080672A (en) * 2012-09-27 2014-05-08 Dowa Metaltech Kk Silver plated material and method for producing the same
JP2014181352A (en) * 2013-03-18 2014-09-29 Dowa Metaltech Kk Plating material
JP2014198895A (en) * 2012-09-27 2014-10-23 Dowaメタルテック株式会社 Silver plating material and method for producing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014080672A (en) * 2012-09-27 2014-05-08 Dowa Metaltech Kk Silver plated material and method for producing the same
JP2014198895A (en) * 2012-09-27 2014-10-23 Dowaメタルテック株式会社 Silver plating material and method for producing the same
JP2014181352A (en) * 2013-03-18 2014-09-29 Dowa Metaltech Kk Plating material

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