JP2004141450A - Polishing cloth holder of pachinko ball lifting polisher - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To eliminate the need for handle operation or the like when a polishing cloth to be attached to a pachinko ball lifting polisher is pinched. <P>SOLUTION: A polishing cloth holder (21 and 71) that can be attached to the pachinko ball lifting polisher (1) is structured so as to pinch the polishing cloth (11) between a friction roller (65 and 77) and a supporting board (35 and 75) by providing the friction roller (65 and 77) provided on the supporting face side of the supporting board (35 and 75) and a regulation structure (49 and 79) regulating the rotation direction of the friction rollers (65 and 77). The regulating structure (49 and 79) is structured so as to permit only a rotation in the direction of stretching the polishing cloth (11). <P>COPYRIGHT: (C)2004,JPO

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention provides a pachinko ball lifting and polishing machine, particularly a polishing cloth holding device that can be attached to a device for lifting and polishing pachinko balls by rotation of a belt-shaped polishing cloth and an endless belt indicated by a guide, and such a polishing cloth holding apparatus. The present invention relates to a pachinko ball lifting and polishing machine provided with a polishing cloth holding device.
[0002]
[Prior art]
The polishing cloth holding device 101 shown in FIG. 9 includes a pressing rod member 105 supported by an eccentric shaft 103 extending in the width direction of the polishing cloth N. The pressing rod member 105 is opened when the handle 109 is lifted up. It is configured to be displaced from a position (shown by an imaginary line) to a clamp position (shown by a solid line) when pressed down. The pressing rod member 105 when displaced to the clamp position is configured to sandwich the polishing cloth N drawn from the pachinko ball polishing machine M between the pressing rod member 105 and the resistor 107. Further, the polishing cloth holding device 101 is configured to be able to move up and down with respect to the pachinko ball polishing machine M, and is urged downward by a spring 111 (for example, see Patent Document 1).
[0003]
[Patent Document 1]
JP 2001-120827 A (paragraphs 0027 to 0030, FIGS. 1 and 7)
[0004]
[Problems to be solved by the invention]
However, the above-described polishing cloth holding device 101 is inconvenient in the following points. That is, the holding of the polishing cloth N is completed by first pushing up the handle 109 to expand the space between the pressing rod member 105 and the resistor 103, passing the polishing cloth N therebetween, and then pushing down the handle 109. When the polishing cloth N (not shown) located inside the lifting polishing machine M is dirty and the position is to be changed, the handle 109 is pushed up again, the polishing cloth N is lowered, and the dirty portion is pulled out. Need to be pushed down. This operation must be performed with the other hand while pulling down the polishing pad N with one hand. This is very inconvenient. The problem to be solved by the present invention is to provide a polishing cloth holding device that can easily perform a work of changing the position of the polishing cloth and the like by eliminating the need for operating a handle when holding the polishing cloth. An object of the present invention is to provide a pachinko ball polishing machine provided with a polishing cloth holding device.
[0005]
[Means for Solving the Problems]
In order to solve the above-described problem, the present invention employs a friction roller rotatable only in a tension applying direction, while holding a polishing cloth drawn out of a pachinko ball polishing machine between the friction roller and a mounting plate. It is configured to be able to be pulled in the tension applying direction by rotation. The detailed configuration will be described later. It should be noted that the definition of terms used in the description of the invention of any claim is applied to the inventions of other claims to the extent possible in nature.
[0006]
(Characteristics of the invention described in claim 1)
The polishing cloth holding device according to the first aspect of the present invention provides a mounting plate capable of mounting a mounting surface facing a pachinko ball polishing machine, and a support mounted on a supporting surface side of the mounting plate which is a back surface of the mounting surface. A substrate, a friction roller provided on a support surface side of the support substrate via a roller support, and a regulating structure for regulating a rotation direction of the friction roller, the roller support including the friction roller. The polishing cloth is configured to be able to be sandwiched between the support substrate and the friction roller is rotatable with the movement of the polishing cloth sandwiched between the support substrate and cooperates with the support substrate. The pachinko ball polishing machine is configured to be able to apply a static friction force greater than the maximum pull-in force generated by the operation of the pachinko ball polishing machine to the polishing cloth, and the regulation structure allows only rotation in the direction of applying tension to the polishing cloth. Constitution And Aru. The tension applying direction may be from above to below, or may be from below to above.
[0007]
According to the polishing cloth holding device of the first aspect, the polishing cloth can be sandwiched between the friction roller supported by the roller support and the support substrate. The sandwiched polishing cloth can be pulled in the tension applying direction, that is, in the direction of being pulled out from the lift polishing machine, while being held. The friction roller rotates with the movement of the polishing cloth. When there is play or backlash in the restricting structure, it rotates only in the tension applying direction due to the restricting of the restricting structure, except when there is a slight return due to such play or backlash. Furthermore, it is configured such that a frictional force that does not pull back the sandwiched polishing cloth can be applied. For this reason, the abrasive cloth once pulled is not pulled back in the anti-traction direction. As described above, when pulling out the polishing cloth from the pachinko ball lifting and polishing machine for changing the position or the like, it is sufficient to pull out the polishing cloth with holding the polishing cloth, and it is not necessary to operate the handle or the like to release the clamping. For this reason, the operation such as the change of the position of the polishing pad can be easily performed, which is very convenient.
[0008]
(Characteristics of the invention described in claim 2)
A polishing cloth holding device according to a second aspect of the present invention is the polishing cloth holding device according to the first aspect, wherein the support substrate is provided with friction applying means capable of applying a static friction force to the sandwiched polishing cloth. It is characterized by having.
[0009]
According to the polishing cloth holding device of the second aspect, in addition to the operation and effect of the polishing cloth holding device of the first aspect, the function of the friction applying means reduces the slip of the holding surface of the support substrate and provides the necessary frictional force. Can be made possible.
[0010]
(Characteristics of the invention described in claim 3)
A polishing cloth holding device according to a third aspect of the present invention is the polishing cloth applying device according to the second aspect, wherein the friction applying means is an opening or a recess formed in the support substrate, and Alternatively, the concave portion is formed so as to be able to receive a part of the polishing cloth pressed by the friction roller by pinching.
[0011]
According to the polishing cloth applying apparatus of the third aspect, in addition to the operation and effect of the polishing cloth holding apparatus of the second aspect, the polishing cloth pressed by the friction roller is received, so that the linearity of the polishing cloth is lost. Becomes strongly frictional.
[0012]
(Characteristics of the invention described in claim 4)
A polishing cloth holding device according to a fourth aspect of the present invention is the polishing cloth holding device according to any one of the first to third aspects, wherein the roller support enables the friction roller to hold a polishing cloth. The apparatus is characterized in that it is reciprocally movable between a clamp position and an opening position where the polishing pad can be opened. The roller support itself may be configured to be reciprocally movable with the friction roller, or may be configured to reciprocate only the friction roller.
[0013]
According to the polishing cloth holding device of claim 4, in addition to the operation and effect of the polishing cloth holding device of any one of claims 1 to 3, the friction roller can reciprocate between the clamp position and the opening position. The work is simple because the attachment and detachment of the polishing cloth to and from the polishing cloth holding device can be performed at the open position. If it is only necessary to change the position of the polishing cloth, it is sufficient to hold the friction roller at the clamp position.For example, when attaching the polishing cloth to the polishing cloth holding device that was not attached, or when the polishing cloth When the whole is to be replaced with another polishing cloth due to contamination, it is easier to perform the operation by placing the friction roller in the open position.
[0014]
(Characteristics of the invention described in claim 5)
A polishing cloth holding device according to a fifth aspect of the present invention is the polishing cloth holding device according to the fourth aspect, wherein the friction roller in the open position is one-sided in the width direction of the polishing cloth with respect to the support substrate. It is characterized by being in a state.
[0015]
According to the polishing cloth holding device of the fifth aspect, in addition to the operation and effect of the polishing cloth holding device of the fourth aspect, since the friction roller opens sideways, the mounting and dismounting of the polishing cloth can be easily performed from the lateral direction. In other words, when the vertical opening method in which the polishing cloth is opened in the length direction is adopted, it is necessary to pass the end of the polishing cloth between the support substrate and the friction roller and then to lower or raise the polishing cloth by a desired length. However, if the opening is made laterally, it is easy to insert only the portion corresponding to the polishing cloth holding device regardless of where the end of the polishing cloth is. The same is true when removing the polishing cloth from the polishing cloth holding device.
[0016]
(Characteristics of the invention described in claim 6)
The polishing cloth holding device according to the invention described in claim 6 is the polishing cloth holding device according to any one of claims 1 to 5, wherein the roller support is provided between the roller support and the support substrate. Is provided on the roller support, and a biasing means (for example, a spring) for biasing the support substrate in a direction of applying tension to the polishing pad is provided on the roller support. It is characterized by being provided. The urging means may push the polishing cloth in the direction of pulling the polishing cloth, or may pull the polishing cloth in the same direction.
[0017]
According to the polishing cloth holding device of the sixth aspect, in addition to the effect of the polishing cloth holding device of any one of the first to fifth aspects, the roller support slides up and down with respect to the support substrate in the length direction of the polishing cloth. The urging means urges the support substrate in a direction in which tension is applied to the polishing cloth, that is, in a pulling direction. By the action of the urging means, the polishing cloth pulled out from the pachinko ball lifting and polishing machine and held by the polishing cloth holding device is constantly urged in a direction in which tension is applied. When the pachinko ball lifting and polishing machine is operated, the pachinko balls pass through the polishing machine, and the passing of the pachinko balls pushes the polishing cloth up in a squeezing manner. This push-up may cause the polishing cloth to elongate or loosen, and by covering the elongation or loosening with the expansion or contraction of the urging means, the looseness of the polishing cloth is suppressed and the appropriate tension is maintained. As a result, the pachinko balls can be smoothly lifted and polished.
[0018]
(Characteristics of the invention described in claim 7)
The polishing cloth holding device according to the invention described in claim 7 is the polishing cloth holding device according to claim 5 or 6, wherein the roller support is hinged to one side of the support substrate in a polishing cloth width direction. An opening / closing plate, a roller supporting portion that stands up from both sides of the opening / closing plate so as to sandwich both ends of the friction roller, and the opening / closing plate to expose a roller surface of the friction roller to the supporting substrate side (mounting plate side). And a lock structure for locking the open / close plate to the support substrate. The shape of the opening or the concave portion is not limited as long as the shape can make the roller surface of the friction roller desired.
[0019]
According to the polishing cloth holding device of the seventh aspect, in addition to the operation and effect of the polishing cloth holding device of the fifth or sixth aspect, the hinge-coupled opening / closing plate opens halfway with respect to the support substrate. The opening / closing plate supports the friction roller via a roller support portion, and opens and closes the friction roller with respect to the support substrate by opening and closing the friction roller. The roller surface of the friction roller faces the support substrate side (the mounting plate side) through an opening or a concave portion of the opening / closing plate, where the polishing cloth is sandwiched between the friction roller and the support substrate. The lock structure locks the open / close plate in the closed state, that is, the clamp position, to the support substrate, and prevents the open / close plate from being opened by the movement of the pachinko ball lifting and polishing machine.
[0020]
(Characteristics of the invention described in claim 8)
The polishing cloth holding device according to the invention described in claim 8 is the polishing cloth holding device according to claim 7, wherein the opening / closing plate is provided with a handle for assisting opening and closing of the opening / closing plate. Features.
[0021]
According to the polishing cloth holding device of claim 8, in addition to the operation and effect of the polishing cloth holding device of claim 7, since the user can use the handle when opening and closing the opening / closing plate, compared with the case where there is no handle. Opening and closing operations can be performed more smoothly.
[0022]
(Characteristics of the invention described in claim 9)
A polishing cloth holding device according to a ninth aspect of the present invention is the polishing cloth holding device according to any one of the first to eighth aspects, wherein the friction roller is made of metal or synthetic resin having a knurled roller surface. It is characterized by being a roller.
[0023]
According to the polishing cloth holding device of the ninth aspect, in addition to the function and effect of the polishing cloth holding device of any one of the first to eighth aspects, since the roller surface that is in contact with the polishing cloth is knurled, the roller surface slides. Can be reduced to provide a necessary frictional force.
[0024]
(Characteristics of the invention described in claim 10)
A polishing cloth holding device according to a tenth aspect of the present invention is the polishing cloth holding device according to any one of the first to ninth aspects, wherein the regulating structure meshes with the ratchet fixed to the roller shaft. And a nail.
[0025]
According to the polishing cloth holding device of the tenth aspect, in addition to the operation and effect of the polishing cloth holding device of any one of the first to ninth aspects, when the sandwiched polishing cloth is pulled, the frictional force acts between the frictional roller and the friction roller. The roller rotates. The ratchet also rotates with this, but the pawl allows this rotation. On the other hand, rotation of the ratchet in the direction opposite to the direction of traction is prevented by the pawl engaged with the ratchet. The return due to the play of meshing or the backlash of the ratchet is not included in the rotation in the opposite direction.
[0026]
(Characteristics of the invention described in claim 11)
According to an eleventh aspect of the present invention, there is provided a pachinko ball raising and polishing machine comprising the polishing cloth holding device according to any one of the first to tenth aspects.
[0027]
According to the pachinko ball raising and polishing machine of claim 9, since the polishing cloth holding device of any one of claims 1 to 8 is attached, it is not necessary to operate the handle when holding the polishing cloth, so that the polishing cloth Position change work and the like can be easily performed.
[0028]
BEST MODE FOR CARRYING OUT THE INVENTION
Embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a front view of a pachinko ball raising and polishing machine provided with a polishing cloth holding device ((a) is a door closed state, (b) is a door open state). FIG. 2 is a perspective view of the polishing pad holding device when the opening and closing plate is at the open position. FIG. 3 is a perspective view of only the friction roller of the polishing pad holding device shown in FIG. 2 drawn by imaginary lines. FIG. 4 is a perspective view of the polishing pad holding device when the opening / closing plate is at the clamp position. FIG. 5 is a cross-sectional view taken along line XX of the polishing pad holding device shown in FIG. FIG. 6 is a sectional view taken along the line YY of the polishing pad holding device shown in FIG. FIG. 7 is a view for explaining the operation of the lock structure of the polishing pad holding device shown in FIG. FIG. 8 is a perspective view of a polishing cloth holding device according to a modification of the present embodiment.
[0029]
(Schematic structure of pachinko ball lifting and polishing machine)
Referring to FIGS. 1 (a) and 1 (b), a pachinko ball lifting and polishing machine (hereinafter, simply referred to as a "lifting machine") including a polishing cloth holding device (hereinafter, simply referred to as a "holding device") described later. explain. The pumping and polishing machine 1 generally includes a base 3 installed on the floor and a pumping tower 5 standing upright from the base. A door section 7 is hingedly connected to the front of the lifting tower 5 to open and close. A guide member (not shown) and a polishing cloth 11 are provided inside the pumping tower 5, and are held between the polishing cloth 11 supported by the guide member and a transport belt (not shown). The pachinko balls that have been lifted are polished.
[0030]
The polishing cloth 11 is made of knitted cotton or synthetic fiber, non-woven fabric, or the like, and is formed in an elongated strip shape as shown in FIG. Normally, as shown in FIG. 1 (b), it is stored in a roll-up state, taken out as much as necessary, and the dirty portion is used by being shifted in order. Specifically, first, the polishing cloth 11 taken out of the roll is folded back on the surface of the door portion 7, and the folded back portion is pressed by the presser 9. Next, it returns from the lower end of the door part 7 and draws it into the inside of the pumping tower 5. Furthermore, the pulled-in polishing cloth 11 is folded back from the upper end of the door portion 7, pulled out of the lifting tower 5, lowered along the door portion 7, and finally held by the holding device 21. The structure of the holding device 21 will be described below.
[0031]
(Structure of holding device)
The structure of the holding device 21 will be described with reference to FIGS. The holding device 21 includes a mounting plate 23 that can be mounted with the mounting surface 23a facing the pachinko ball polishing machine, a support substrate 35 provided on a support surface 23b that is the back surface of the mounting surface 23a of the mounting plate 23, and a support substrate 35. , And a friction roller 65 that the opening / closing plate 45 supports via the opening / closing side portions 36, 36. The polishing cloth 11 is configured to be sandwiched (held) between the friction roller 65 and the support substrate 35.
[0032]
(Structure of mounting plate)
The mounting plate 23 is formed by subjecting a steel plate having appropriate strength to sheet metal processing or the like, and has a size that can be mounted on the door portion 7 of the lifting and polishing machine 1. At the upper and lower ends of the mounting plate 23, mounting portions 25, 25 are formed via step portions 24, 24. The reason why the step portions 24 are formed is to form a gap between the door portion 7 and the slide structure described later using the gap. In the mounting portions 25, 25, the mounting plate 23 is fixed to the door portion 7 by fixing screws 27, 27,. . Screw holes 26, 26,. . Is formed. On the support surface 23b side of the mounting plate 23, a support substrate 35 described below and further, an opening / closing plate 45 are mounted.
[0033]
(Structure of support substrate and open / close plate)
Both the support substrate 35 and the opening / closing plate 45 are formed by performing sheet metal processing on a steel plate as in the case of the mounting plate 23. As shown in FIG. 2, the support substrate 35 has substrate sides 36, 36 whose sides are bent in the direction of the mounting plate 23, and outer portions extending over the entire length in the length of the substrate sides 36, 36. Pieces 37, 37 and inner pieces 38, 38. The outer pieces 37, 37 and the inner pieces 38, 38 are formed by, for example, sheet metal working or welding. The outer pieces 37 protrude into a gap between the door 7 and the mounting plate 23 so that the mounting plate 23 can be sandwiched between inner pieces 38 protruding from the middle of the board side parts 36. It has become. As a result of this configuration, the support substrate 35 can be slid up and down with respect to the support substrate 35 or the door part 7 as shown by a two-way arrow A in FIG. Can be prevented. The mounting plate 23, the outer pieces 37, 37 and the inner pieces 38, 38 constitute a slide structure 40 in the present embodiment.
[0034]
The support substrate 35 is provided with a rectangular opening (friction applying means) 42, which is provided mainly for applying a static friction force to the polishing pad 11 sandwiched between the supporting roller 35 and the friction roller 65. Things. Although the clamping will be described later, by accepting a part of the polishing cloth 11 pressed by the friction roller 65 by the clamping, it plays a role of causing the polishing cloth 11 to lose linearity and make the sliding with respect to the support substrate 35 worse. (See FIG. 5). That is, the roller surface 66 of the friction roller 65 presses and holds the polishing cloth pressed into the opening 42 against the peripheral edge of the opening 42, so that the polishing pad becomes less slippery.
Instead of forming the opening 42, for example, a friction plate having a high friction coefficient may be attached to the surface of the support substrate 35. Reference numeral 43 indicates a lock hole for locking. Reference numeral 44 shown in FIG. 4 denotes a protruding piece formed by bending the center of the lower end of the support substrate 35 in the front direction in the figure.
[0035]
Next is the opening / closing plate 45. The opening / closing plate 45 is connected to one side (left side in FIG. 2) of the support substrate 35 in the width direction of the polishing cloth by a hinge 63 (see FIG. 6). ) And a position for releasing the holding (open position). In this manner, the opening / closing plate 45 is configured to be opened in one direction (horizontal opening) in the width direction of the polishing cloth, that is, in the lateral direction with respect to the support substrate 35, because the opening / closing plate 45 or the friction roller 65 and the support substrate 35 This is because the polishing pad 11 can be inserted or removed from the side (the direction of the arrow B in FIG. 2). When a method of inserting from the vertical direction (the direction of arrow C) that opens in the length direction like the polishing cloth 11 shown by the imaginary line in FIG. 2 is adopted, the end of the polishing cloth 11 is placed between the mounting plate 23 and the friction roller 65. After passing through, it is necessary to perform an operation of lowering by a desired length. However, if it is opened horizontally, it is sufficient to insert only the portion corresponding to the holding device 21 (the portion shown by the solid line in FIG. 2) regardless of where the end of the polishing cloth 11 is. Sideways are much easier. The same can be said for the case where the polishing pad 11 is removed from the holding device 21. The above is the reason why the horizontal opening is employed in the present embodiment.
[0036]
The opening / closing plate 45 is provided with opening / closing plate side portions 46, 46 rising from both sides to sandwich both ends of the friction roller 61, and a part of the opening / closing plate side portions 46, constitutes roller support portions 47, 47. ing. The opening / closing plate 45 is provided with an opening 48 having a position and a shape corresponding to the opening 42 of the support substrate 35 (see FIG. 3). The configuration is such that the roller surface 66 of the polishing roller 65 faces the support substrate 35 side (the mounting plate 23 side) via the opening 48, that is, slightly protrudes from the back surface of the opening / closing plate 45 (see FIG. 6). It is. The shape of the opening 48 is not limited as long as the opening 48 can face the roller surface 66. The opening 48 may be replaced by a recess formed by cutting the upper end of the support substrate 35 or the like. The opening / closing plate 45 and the opening / closing plate side portions 46, 46 constitute a roller support of the present embodiment.
[0037]
(Regulatory structure)
The roller support portions 47 are configured to rotatably support the friction roller 65 via a roller shaft 67. A ratchet 50, which is a main component of a ratchet device (regulation structure) 49, is fixed to the tip of a roller shaft 67 that penetrates one of the roller support portions 47 located on the right side in FIG. The ratchet device 49 is a member for regulating the rotation direction of the friction roller 65, and includes the ratchet 50 described above and the claw 51 that meshes with the ratchet 50. By the operation of the ratchet device 49, the friction roller 65 can rotate only in the direction of arrow D shown in FIG. The direction of the arrow D is a rotation direction accompanying the pulling of the sandwiched polishing pad 11 downward (pulling) when the polishing pad 11 is pulled downward. As a result of restricting rotation in the direction opposite to the direction of the arrow D, even if the polishing pad 11 is pulled back by the operation of the lifting and polishing apparatus 1, the static frictional force given by the friction roller 65 and the opening 42 of the support substrate 35 are reduced. The pullback is prevented in combination with the applied static friction force and the like. Of course, the friction roller 65 may have a play or backlash of the ratchet device 49 or a slight slip between the polishing pad 11 and the like. Only rotate.
[0038]
As described above, since the polishing cloth 11 moves only in the pulling-down direction, when the polishing cloth 11 is pulled out from the polishing roll (see FIG. 1B) via the lifting polisher 1 for position change or the like, polishing is performed. Simply pulling down the cloth 11 is sufficient, and it is not necessary to operate the handle or the like to release the holding. For this reason, operations such as changing the position of the polishing cloth can be easily performed, which is very convenient. Further, the polishing cloth 11 can be lowered with one hand, but an operator who is not restricted by the operation of the handle or the like can pull down with both hands. By gripping both ends of the polishing cloth 11 with both hands and pulling it down, it is not necessary to form a wrinkle that can be generated when the user holds the polishing cloth 11 with one hand, and it is easy to apply force, which is easy. The grip wrinkles may lead to inconveniences such as lateral displacement of the polishing pad 11, but such inconveniences can be avoided by pulling down with both hands.
[0039]
The opening / closing plate side portions 46, 46 are provided with support pieces 46a, 46a formed by bending a part thereof inward. A handle 53 for assisting opening and closing of the opening and closing plate 45 is attached to the support pieces 46a and 46a. Further, a tension spring 53 is bridged between the projecting piece 44 (see FIG. 4) at the lower center of the support substrate 35 and the hook screw 13 fixed to the door portion 7. The tension spring 53 has a function of urging the support substrate 35 slidable up and down by the operation of the slide structure 40 in a direction in which the polishing pad 11 is pulled (tension applying direction). When the lifting polishing machine 1 is operated, pachinko balls (not shown) pass through the polishing machine 1, and the polishing cloth 11 is wrung by the passage of the pachinko balls, which may cause the polishing cloth 11 to be extended or slackened. . If the extension or slack is left as it is, the polishing cloth 11 will be bumped. Therefore, the supporting substrate 35 is pulled down by the pulling force of the tension spring 53 to cover (absorb) the loosened portion, so that the polishing pad 11 can be properly adjusted. Keep you nervous.
[0040]
(Lock structure)
The lock structure will be described with reference to FIGS. The lock structure 55 includes a lock hole 43 of the support substrate 35 and a seesaw member 56 of the open / close plate side portion 46 of the open / close plate 45. The seesaw member 56 has a shape similar to a seesaw, and is configured to move up and down with a support shaft 58 passing through the support pieces 57, 57 substantially at the center as a fulcrum. The seesaw member 56 has a lock piece 59 having one end bent. When the opening / closing plate 45 is at the clamping position, that is, at a position where the polishing pad can be held, the lock piece 59 enters the lock hole 43 and locks the opening / closing plate 45 to the support substrate 35. It is. A cantilever spring 60 is wound around the support shaft 58. Since the cantilever spring 60 is configured to always bias the lock piece 59 in the lock direction, when the open / close plate 45 is moved from the open position to the clamp position, the lock shown in FIG. State. The lock is released by pushing the seesaw member 56 in the direction E shown in FIG. 7B while opposing the cantilever spring 60 so that the lock piece 59 retreats from the lock hole 43. When the lock is released, as shown in FIG. 7C, the opening / closing plate 45 can be moved to the open position. The lock structure 55 has a role of preventing the opening / closing plate 45 at the clamp position from moving due to the operation of the lift polishing machine 1 and of pressing the friction roller 65 firmly against the polishing pad 11. It should be noted that the form of the lock structure 55 is not limited to the above-described one, and it is needless to say that another form having a different mechanical structure or a form using a magnet can be employed.
[0041]
(Structure of friction roller)
The friction roller 65 is made of a metal such as aluminum or a synthetic resin. It is not intended to prevent the use of other materials, but these materials are relatively easy to obtain and process. It is preferable to knurl the roller surface in contact with the polishing cloth. This is because the required frictional force can be applied by reducing the slip on the roller surface. In order to secure the frictional force, there is a method of attaching an appropriate friction material to the roller surface.
[0042]
(How to use the holding device)
First, the lock structure 55 is released and the opening / closing plate 45 is moved to the open position. Next, the polishing cloth 11 pulled out from the upper end of the door portion 7 of the lifting polishing machine 1 is inserted between the friction roller 65 and the support substrate 35, and the opening / closing plate 45 is returned to the clamp position. When returned, the plate lock structure 55 automatically locks the opening / closing plate 45 to the support substrate 35 by the action of the cantilever spring 60 or the like. Thus, the holding of the polishing pad 11 is completed. The polishing cloth 11 once held is not pulled back by the operation of the lifting polishing apparatus 1 due to the static frictional force applied by the friction roller 65 or the like or the rotation control by the ratchet device 49. Further, the looseness of the polishing cloth due to the operation is almost automatically eliminated by the contraction of the tension spring 53. To change the position of the held polishing pad 11, the polishing pad 11 is grasped with both hands in a region below the holding device 21 and pulled down by a desired length. This is all you need. There is no need to bother the operation of the handle or the like. The removal of the polishing pad 11 is performed after the lock is released by operating the seesaw member 56 and the opening / closing plate 45 is moved to the opening / closing position.
[0043]
(Modification of this embodiment)
A modification of the present embodiment will be described with reference to FIG. The holding device according to this modification is different from the holding device according to the present embodiment in that the opening and closing structure of the latter is omitted in the former. Here, in order to avoid duplication, mainly the differences will be described, and the description of the common points will be omitted.
[0044]
The holding device 71 shown in FIG. 8 includes a mounting plate 73 for mounting to the door unit 7 of the lifting polisher, a support substrate 75 that can be slid up and down with respect to the mounting plate 73, and a fixing plate 76 fixed to the support substrate 75. And a friction roller 77 supported by the fixing plate 76, and a ratchet device 79 for regulating the rotation direction of the friction roller 77. The mounting plate 73 has the same structure as the mounting plate 23 of the present embodiment, the support substrate 75 has the same support substrate 35, the friction roller 77 has the same friction roller 65, and the ratchet device 79 has the same structure as the ratchet device 49. I have. Therefore, there is no difference in the operational effects of these members. Since the fixing plate 76 is immovable with respect to the support substrate 75, the mounting of the polishing cloth 11 is performed by inserting the tip of the polishing cloth 11 between the friction roller 77 and the support substrate 75. Removal is the reverse. Since the fixing plate 76 does not open and close, there is an inconvenience in attaching and detaching the polishing cloth from the holding device 21 of the present embodiment. It is more convenient than conventional holding devices in that it can be performed with both hands.
[0045]
Each of the holding devices 21 and 71 described so far is a type in which the polishing pad 11 is inserted from above, but this is such that the polishing pad mounting system of the lifting polishing machine 1 inserts from the lower end of the door portion 7 and pulls out from the upper end. Because it is. Depending on the type of the lifting polishing machine, the polishing device may be inserted from the upper end and pulled out from the lower end. In this case, the holding devices 21 and 71 are mounted in a direction opposite to the mounting direction (that is, upside down) to lower the polishing cloth. What is necessary is just to comprise so that it may enter.
[0046]
【The invention's effect】
ADVANTAGE OF THE INVENTION According to the polishing cloth holding apparatus which concerns on this invention, the handle operation etc. at the time of pinching the polishing cloth which is going to be attached to the pachinko ball lifting polishing machine provided with it are unnecessary. Therefore, the mounting operator can perform the operation of changing the position of the polishing pad and the like using both hands without bothering the operation of the handle. This makes the work of changing the position of the polishing cloth extremely simple.
[Brief description of the drawings]
FIG. 1 is a front view of a pachinko ball raising and polishing machine provided with a polishing cloth holding device ((a) is a door closed state, and (b) is a door open state).
FIG. 2 is a perspective view of the polishing pad holding device when an opening / closing plate is at an open position.
FIG. 3 is a perspective view of only the friction roller of the polishing cloth holding device shown in FIG. 2 drawn by imaginary lines.
FIG. 4 is a perspective view of the polishing pad holding device when the opening / closing plate is at a clamp position.
5 is a cross-sectional view of the polishing cloth holding device shown in FIG. 4, taken along line XX.
FIG. 6 is a sectional view taken along the line YY of the polishing pad holding device shown in FIG.
FIG. 7 is a view for explaining the operation of the lock structure of the polishing pad holding device shown in FIG. 6;
FIG. 8 is a perspective view of a polishing cloth holding device according to a modification of the present embodiment.
FIG. 9 is a side view showing a conventional polishing pad holding device.
[Explanation of symbols]
1 Lifting polishing machine
3 Base part
5 lifting tower
7 Door
9 Holder
11 polishing cloth
13 Hook screw
21,71 polishing cloth holding device
23, 73 Mounting plate
23a Mounting surface
23b Support surface
24 steps
25 Mounting part
26 screw holes
27 Fixing screw
35,75 Support substrate
36 Board side
37 Outer piece
38 Inner pieces
40 slide structure
42,48 opening
43 Lock hole
45 Opening / closing plate (roller support)
46 Opening / closing side (roller support)
46a support piece
47 Roller support
49,79 Ratchet device
50 ratchet
51 claws
52 handle
53 Extension spring
55 Lock structure
56 Seesaw material
57 Supporting piece
58 spindle
59 Lock piece
60 cantilever spring
63 Hinge
65,77 friction roller
66 Roller surface
67 Roller shaft
76 Fixing plate

Claims (11)

A mounting plate that can be mounted with the mounting surface facing the pachinko ball polishing machine,
A support substrate attached to a support surface side of the attachment plate that corresponds to a back surface of the attachment surface,
A friction roller provided on the support surface side of the support substrate via a roller support,
A regulating structure that regulates the rotation direction of the friction roller,
The roller support is configured to be able to sandwich the polishing pad between the friction roller and the support substrate,
The friction roller is rotatable with the movement of the polishing cloth sandwiched between the support substrate, and the static friction force greater than the maximum pull-in force generated by operation of the pachinko ball polishing machine in cooperation with the support substrate. It is configured so that it can be applied to the polishing cloth,
The polishing cloth holding device, wherein the restricting structure is configured to allow only rotation of the polishing cloth in a tension applying direction. 2. The polishing cloth holding device according to claim 1, wherein the support substrate is provided with a friction applying means capable of applying a static friction force to the polishing cloth to be sandwiched. The friction applying means is an opening or a recess formed in the support substrate,
3. The polishing pad holding device according to claim 2, wherein the opening or the concave portion is formed so as to be able to receive a part of the polishing pad pressed by the friction roller by being pinched. The roller support, wherein the friction roller is configured to be reciprocally movable between a clamping position where the polishing cloth can be held and an opening position where the polishing cloth can be opened. 4. The polishing cloth holding device according to any one of 1 to 3. The polishing cloth holding device according to claim 4, wherein the friction roller at the open position is in a single-open state with respect to the support substrate in a width direction of the polishing cloth. A slide structure is provided between the roller support and the support substrate so that the roller support can be slid up and down with respect to the support substrate,
The polishing cloth holding device according to any one of claims 1 to 5, wherein the roller support is provided with an urging means for urging the support substrate in a direction in which tension is applied to the polishing cloth. The roller support,
An opening / closing plate hinged to one side of the support substrate in the polishing cloth width direction,
A roller support that stands upright so as to sandwich both ends of the friction roller from both sides of the opening and closing plate,
An opening or recess formed in the open / close plate to expose the roller surface of the friction roller to the support substrate side,
The polishing cloth holding device according to claim 5, further comprising: a lock structure for locking the opening / closing plate to the support substrate. The polishing cloth holding device according to claim 7, wherein the opening / closing plate is provided with a handle for assisting opening / closing of the opening / closing plate. The polishing cloth holding device according to any one of claims 1 to 8, wherein the friction roller is a metal or synthetic resin roller having a knurled roller surface. The polishing cloth holding device according to any one of claims 1 to 9, wherein the regulation structure includes a ratchet fixed to the roller shaft and a claw that meshes with the ratchet. A pachinko ball lifting and polishing machine equipped with the polishing cloth holding device according to claim 1.

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