JP2004111386A5 - Manufacturing apparatus and method for producing layer containing organic compound - Google Patents

Manufacturing apparatus and method for producing layer containing organic compound Download PDF

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JP2004111386A5
JP2004111386A5 JP2003304398A JP2003304398A JP2004111386A5 JP 2004111386 A5 JP2004111386 A5 JP 2004111386A5 JP 2003304398 A JP2003304398 A JP 2003304398A JP 2003304398 A JP2003304398 A JP 2003304398A JP 2004111386 A5 JP2004111386 A5 JP 2004111386A5
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chamber
container
vapor deposition
source holder
installation
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JP2004111386A (en
JP4515060B2 (en
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Claims (10)

ロード室、該ロード室に連結された搬送室、及び該搬送室に連結された複数の成膜室と、該成膜室に連結された設置室を有し、
前記成膜室は、前記成膜室内を真空にする第１の真空排気処理室と連結され、マスクと基板の位置あわせを行うアライメント手段と、基板保持手段と、蒸着源ホルダと、前記蒸着源ホルダを移動させる手段と、を有し、
前記蒸着源ホルダは、蒸着材料が封入された容器を加熱する手段と、前記容器上に設けられたシャッターと、を有し、
前記設置室は、前記設置室内を真空にする第２の真空排気処理室と連結され、前記設置室には前記容器を加熱する手段と、前記成膜室内の前記蒸着源ホルダに前記容器を搬送する手段とを有することを特徴とする製造装置。 Load chamber, transfer chamber connected to the load chamber, and possess a plurality of film forming chamber connected to the transfer chamber, the installation chamber connected to the film forming chamber,
The film formation chamber is connected to a first evacuation processing chamber that evacuates the film formation chamber, and aligns the mask and the substrate, a substrate holding means, a vapor deposition source holder, and the vapor deposition source. Means for moving the holder ,
The evaporation source holder has a means for heating the container evaporation material is filled, and a shutter provided over the container,
The installation chamber, the installation chamber is connected to the second vacuum exhaust treatment chamber for the vacuum, conveying means wherein the installation chamber for heating the container, the container to the evaporation source holder of the deposition chamber A manufacturing apparatus. ロード室、該ロード室に連結された搬送室、及び該搬送室に連結された複数の成膜室と、該成膜室に連結された設置室を有し、
前記成膜室は、前記成膜室内を真空にする第１の真空排気処理室と連結され、マスクと基板の位置あわせを行うアライメント手段と、基板保持手段と、蒸着源ホルダと、前記蒸着源ホルダを移動させる手段と、を有し、
前記蒸着源ホルダは、蒸着材料が封入された容器を加熱する手段と、前記容器を前記蒸着源ホルダから浮かすことで冷却する手段と、を有し、
前記設置室は、前記設置室内を真空にする第２の真空排気処理室と連結され、前記設置室には前記容器を加熱する手段と、前記成膜室内の前記蒸着源ホルダに前記容器を搬送する手段とを有することを特徴とする製造装置。 Load chamber, transfer chamber connected to the load chamber, and possess a plurality of film forming chamber connected to the transfer chamber, the installation chamber connected to the film forming chamber,
The film formation chamber is connected to a first evacuation processing chamber that evacuates the film formation chamber, and aligns the mask and the substrate, a substrate holding means, a vapor deposition source holder, and the vapor deposition source. Means for moving the holder ,
The evaporation source holder has a means for heating the container evaporation material is sealed, and means for cooling by float the container from the evaporation source holder, and
The installation chamber, the installation chamber is connected to the second vacuum exhaust treatment chamber for the vacuum, conveying means wherein the installation chamber for heating the container, the container to the evaporation source holder of the deposition chamber A manufacturing apparatus. 請求項１または請求項２において、前記搬送室には、平板ヒーターが間隔を開けて複数重ねて配置でき、且つ、複数の基板を真空加熱することができる処理室が連結されていることを特徴とする製造装置。 3. The processing chamber according to claim 1 or 2, wherein a plurality of flat plate heaters can be arranged in a stacked manner at intervals, and a processing chamber capable of vacuum heating a plurality of substrates is connected to the transfer chamber. Manufacturing equipment. 請求項１乃至請求項３のいずれか一において、前記蒸着源ホルダを移動させる手段は、前記蒸着源ホルダをあるピッチでＸ軸方向に移動させ、且つ、あるピッチでＹ軸方向に移動させる機能を有していることを特徴とする製造装置。 The function of moving the vapor deposition source holder according to any one of claims 1 to 3, wherein the vapor deposition source holder is moved in the X-axis direction at a certain pitch and moved in the Y-axis direction at a certain pitch. The manufacturing apparatus characterized by having. 請求項１において、前記蒸着源ホルダには、蒸着材料が封入された前記容器が複数備えられ、The vapor deposition source holder according to claim 1, wherein the vapor deposition source holder includes a plurality of containers filled with a vapor deposition material,
前記複数の容器には、それぞれ傾き調節ネジが設けられていることを特徴とする製造装置。The manufacturing apparatus according to claim 1, wherein each of the plurality of containers is provided with an inclination adjusting screw. 請求項１乃至請求項５のいずれか一において、前記成膜室には、蒸着マスクが設置され、In any one of Claims 1 thru | or 5, a vapor deposition mask is installed in the said film-forming chamber,
前記蒸着マスクは、タングステン、タンタル、クロム、ニッケル、モリブデンもしくはこれらの元素を含む合金、ステンレス、インコネル又はハステロイからなることを特徴とする製造装置。  The said vapor deposition mask consists of tungsten, a tantalum, chromium, nickel, molybdenum or the alloy containing these elements, stainless steel, Inconel, or Hastelloy, The manufacturing apparatus characterized by the above-mentioned. 請求項１乃至請求項６のいずれか一において、前記成膜室は、プラズマ発生手段を有することを特徴とする製造装置。The manufacturing apparatus according to claim 1, wherein the film formation chamber includes a plasma generation unit. 請求項１乃至請求項７のいずれか一において、前記成膜室は、蒸着マスクをプラズマクリーニングする手段を有することを特徴とする製造装置。8. The manufacturing apparatus according to claim 1, wherein the film formation chamber includes a unit that performs plasma cleaning of the vapor deposition mask. 9. 有機化合物を含む層の作製方法であって、
有機化合物を含む材料が充填された容器を設置室に設置し、
前記設置室を真空排気し、
前記設置室で前記容器を所定の温度まで加熱し、
予め前記容器と同じ温度まで加熱された蒸着源ホルダに加熱された前記容器を搬送し、
基板を成膜室に搬入し、
前記容器を前記所定の温度に維持したまま前記設置室よりも前記成膜室内の真空度を上げて前記基板に蒸着を行うことを特徴とする有機化合物を含む層の作製方法。 A method for producing a layer containing an organic compound,
A container material containing an organic compound has been filled is placed in the installation chamber,
The setting chamber is evacuated,
The vessel was heated to a predetermined temperature in the setting chamber,
Conveying the heated said container to advance the evaporation source holder that was heated to the same temperature as the container,
And the substrate is carried into the deposition chamber,
The method for manufacturing a layer containing an organic compound, wherein the TURMERIC rows deposited on the substrate by raising the degree of vacuum in the installation chamber the deposition chamber than while maintaining the container to the predetermined temperature. 有機化合物を含む層の作製方法であって、A method for producing a layer containing an organic compound,
有機化合物を含む材料が充填された容器を設置室に設置し、Install a container filled with materials containing organic compounds in the installation room,
前記設置室を真空排気し、Evacuate the installation chamber,
前記設置室で前記容器を所定の温度まで加熱し、Heating the container to a predetermined temperature in the installation room;
予め前記容器と同じ温度まで加熱された蒸着源ホルダに加熱された前記容器を搬送し、Transport the heated container to a deposition source holder that has been heated to the same temperature as the container in advance,
基板を成膜室に搬入し、Bring the substrate into the deposition chamber,
前記容器を前記所定の温度に維持したまま前記設置室よりも前記成膜室内の真空度を上げて前記基板に蒸着を行い、The deposition is performed on the substrate by raising the degree of vacuum in the film formation chamber rather than the installation chamber while maintaining the container at the predetermined temperature,
前記容器を前記蒸着源ホルダから浮かすことにより蒸着を止めることを特徴とする有機化合物を含む層の作製方法。The method for producing a layer containing an organic compound, wherein vapor deposition is stopped by floating the container from the vapor deposition source holder.


JP2003304398A 2002-08-30 2003-08-28 Manufacturing apparatus and method for producing layer containing organic compound Expired - Fee Related JP4515060B2 (en)

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CN101988190A (en) * 2010-05-25 2011-03-23 东莞宏威数码机械有限公司 Pretreatment device and pretreatment method for film-coating substrate
JP2012214834A (en) * 2011-03-31 2012-11-08 Hitachi High-Technologies Corp Vacuum deposition apparatus, and method for manufacturing organic el display device
KR101919021B1 (en) * 2011-12-15 2019-02-11 엘지디스플레이 주식회사 Deposition apparatus for fabricating emitting diode
CN112626462B (en) * 2020-12-11 2023-05-30 江苏集萃有机光电技术研究所有限公司 Evaporation source feeding device and evaporation source feeding method

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