JP2004110072A5 - - Google Patents

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Publication number
JP2004110072A5
JP2004110072A5 JP2003409608A JP2003409608A JP2004110072A5 JP 2004110072 A5 JP2004110072 A5 JP 2004110072A5 JP 2003409608 A JP2003409608 A JP 2003409608A JP 2003409608 A JP2003409608 A JP 2003409608A JP 2004110072 A5 JP2004110072 A5 JP 2004110072A5
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JP
Japan
Prior art keywords
photomask
image
defect
mask
laser light
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Granted
Application number
JP2003409608A
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English (en)
Japanese (ja)
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JP2004110072A (ja
JP4309752B2 (ja
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Priority to JP2003409608A priority Critical patent/JP4309752B2/ja
Priority claimed from JP2003409608A external-priority patent/JP4309752B2/ja
Publication of JP2004110072A publication Critical patent/JP2004110072A/ja
Publication of JP2004110072A5 publication Critical patent/JP2004110072A5/ja
Application granted granted Critical
Publication of JP4309752B2 publication Critical patent/JP4309752B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003409608A 1997-06-27 2003-12-08 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法 Expired - Fee Related JP4309752B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003409608A JP4309752B2 (ja) 1997-06-27 2003-12-08 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP17169597 1997-06-27
JP2003409608A JP4309752B2 (ja) 1997-06-27 2003-12-08 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP17830098A Division JPH1172905A (ja) 1997-06-27 1998-06-25 フォトマスク修復方法、検査方法、検査装置及びフォトマスク製造方法

Publications (3)

Publication Number Publication Date
JP2004110072A JP2004110072A (ja) 2004-04-08
JP2004110072A5 true JP2004110072A5 (enrdf_load_stackoverflow) 2005-09-22
JP4309752B2 JP4309752B2 (ja) 2009-08-05

Family

ID=32299943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003409608A Expired - Fee Related JP4309752B2 (ja) 1997-06-27 2003-12-08 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法

Country Status (1)

Country Link
JP (1) JP4309752B2 (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4309751B2 (ja) * 1997-06-27 2009-08-05 株式会社東芝 フォトマスク修復方法
US6849363B2 (en) 1997-06-27 2005-02-01 Kabushiki Kaisha Toshiba Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
JP5905257B2 (ja) * 2008-09-29 2016-04-20 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ 計測システムの照明サブシステム、計測システム、および計測測定のために試験片を照明するための方法
US9080991B2 (en) 2008-09-29 2015-07-14 Kla-Tencor Corp. Illuminating a specimen for metrology or inspection
EP2399098B1 (en) * 2009-02-23 2018-11-21 Dental Imaging Technologies Corporation Apparatus for high-speed phase shifting for interferometric measurement systems
US10234402B2 (en) * 2017-01-05 2019-03-19 Kla-Tencor Corporation Systems and methods for defect material classification
CN110673319B (zh) * 2019-09-29 2021-04-09 江苏才道精密仪器有限公司 一种可自动调光源的显微镜激光修复系统及装置
CN112254801B (zh) * 2020-12-21 2021-04-02 浙江中自庆安新能源技术有限公司 一种微小振动视觉测量方法及系统

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63173322A (ja) * 1987-01-13 1988-07-16 Toshiba Corp 半導体露光装置
JPH01114035A (ja) * 1987-10-28 1989-05-02 Hitachi Ltd 露光装置
DE69208413T2 (de) * 1991-08-22 1996-11-14 Kla Instr Corp Gerät zur automatischen Prüfung von Photomaske
US5668887A (en) * 1992-05-29 1997-09-16 Eastman Kodak Company Coating density analyzer and method using non-synchronous TDI camera
JP4309751B2 (ja) * 1997-06-27 2009-08-05 株式会社東芝 フォトマスク修復方法

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