JP2004104140A - Method and apparatus for processing substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide apparatus for processing a substrate that performs positional changes in plural number of substrates easily and promptly. <P>SOLUTION: In the apparatus for processing a substrate, in which a substrate W is carried in being stored in a multi-purpose carrier SC in a horizontal attitude, a exclusive carrier EC used within the apparatus is positioned on a position changing stage 231. The stage 231 is turnably supported at 90 degrees with an axis 231C as the center. First, the carrier EC makes the substrate W in a condition where it is stored in the horizontal attitude, and a number of substrates W are transferred from the carrier SC to the carrier EC, while being held together using a number of holding plates 211. Next, the attitude-changing stage 231 is rotated by 90 degrees, to change the attitude of the carrier EC so that the substrates W stored in the carrier EC are in a standing attitude. Thus, the positional change of the substrate W is carried out easily and promptly in the apparatus for processing the substrate, in which the substrate W is handled in the erect attitude. <P>COPYRIGHT: (C)2004,JPO

Description

The present invention relates to a substrate processing method and a substrate processing apparatus for performing predetermined processing on a semiconductor substrate in an upright posture (hereinafter, simply referred to as “substrate”).

Conventionally, when a substrate is carried in and out of a substrate processing apparatus that performs a predetermined process on a substrate, a method in which a plurality of substrates are housed in one carrier is often used. Also, the substrate is placed in the carrier in an upright posture, and when the substrate is processed while stored in the carrier, or when the processing is performed on a plurality of substrates simultaneously, the posture of the substrate is changed. In many cases, processing is performed without changing the state of the standing posture.

For example, in a substrate processing apparatus that performs a cleaning process on a plurality of substrates at once, a method is adopted in which a plurality of substrates in an upright posture inside a carrier are gripped at once and immersed in a processing liquid. There is. Of course, when the substrate is immersed together with the carrier, the substrate is processed in an upright posture.

As described above, the substrate has been conventionally handled in a state of being stored in the carrier in an upright posture. However, with the recent enlargement of the substrate due to technological innovation, the substrate processing apparatus has not been able to handle all of the substrate processing steps. Standardization of carriers used for transporting substrates between them has been promoted in a direction of storing substrates in a horizontal posture.

However, it is not always preferable to handle the substrate in a horizontal position in all the steps of the substrate processing, and it may be preferable to handle the substrate in an upright position depending on the processing content.

Therefore, in such a substrate processing apparatus, it is necessary to change the posture of the substrate stored in the carrier in a horizontal posture and carried in to the standing posture inside the apparatus. Further, the carrier for storing the incoming substrate is designed so as to be suitable for transportation between the devices, and it is not appropriate to change the posture of the carrier itself, and the substrate is set to the standing posture by another method. You need to change your posture.

Here, for example, if the substrates are taken out one by one using a robot hand and the posture is changed to the standing posture, it takes enormous time to bring all the substrates stored in the carrier into the standing posture, which is not practical. . In addition, when the posture is changed while holding the substrate, it is necessary to securely hold and handle the substrate, and there is a problem of generation of particles from a contact portion between the substrate and the robot hand.

Accordingly, the present invention has been made in view of the above-described problems, and when a substrate is transferred to and from the outside of the apparatus, the substrate is stored and handled in a carrier in a horizontal posture, but the substrate processing in which the substrate is handled in an upright posture inside the apparatus. An object of the present invention is to provide a substrate processing apparatus capable of quickly and easily realizing a change in the posture of a substrate and suppressing generation of particles.

The invention according to claim 1 is a substrate processing method for processing a plurality of substrates collectively, comprising: (a) {a step of collectively loading a plurality of substrates in a horizontal posture into a substrate processing apparatus; A step of changing the posture from the horizontal posture to the standing posture while the plurality of substrates carried into the apparatus are collectively held by the posture changing means; and (c) a processing unit for collectively processing the plurality of substrates in the standing posture. (D) 工程 a step of changing the posture from a standing posture to a horizontal posture in a state where the plurality of substrates processed in the processing unit are collectively held by the posture changing means, and (e) a horizontal posture. Collectively returning the returned substrates from the substrate processing apparatus.

According to a second aspect of the present invention, there is provided the substrate processing method according to the first aspect, wherein after the step (a), the plurality of substrates are collectively transported to the attitude changing means in a horizontal attitude.

According to a third aspect of the present invention, there is provided the substrate processing method according to the first or second aspect, wherein after the step (b), the plurality of substrates in the standing posture are collectively transferred to the processing unit by the substrate transfer robot. It is characterized by the following.

According to a fourth aspect of the present invention, there is provided the substrate processing method according to any one of the first to third aspects, wherein after the step (c), the plurality of substrates in the standing posture are collectively changed by the substrate transfer robot. It is transported to the means.

The invention according to claim 6 is a substrate processing apparatus for performing a predetermined process on a plurality of substrates, wherein (a) a plurality of substrates stored in a first carrier in a horizontal posture are collectively placed in a second carrier in a horizontal posture. And (b) changing the posture of the second carrier so that the postures of the plurality of substrates stored in the second carrier are collectively set between the horizontal posture and the standing posture. (C) a processing unit having a storage tank for performing a cleaning process on a plurality of substrates in an upright posture, and (d) a plurality of substrates standing between the posture changing unit and the processing unit. And a transport system for transporting in a posture.

The invention according to claim 7 is a substrate processing apparatus for performing a predetermined process on a plurality of substrates, wherein (a) the plurality of substrates are collectively stored, and the postures of the plurality of substrates are collectively set to a horizontal posture. Posture changing means for changing between the standing posture, (b) transfer means for collectively storing a plurality of substrates stored in the carrier in a horizontal posture in the posture changing means, (c) plural A processing unit having a storage tank for performing a cleaning process on the substrate in an upright position; (d) a loading / unloading unit that unloads or loads a plurality of substrates in an upright position stored in the position changing unit; And a transport unit for transporting the plurality of substrates in a standing posture between the loading / unloading unit and the processing unit.

According to the first to fifth aspects of the present invention, while the plurality of substrates carried into the substrate processing apparatus are collectively held by the posture changing means, the posture is changed from the horizontal posture to the standing posture, and the plurality of standing postures is changed. The substrates are collectively processed in the processing unit, and the postures are changed from the standing posture to the horizontal posture while the plurality of substrates processed in the processing unit are collectively held by the posture changing unit, and the plurality of substrates are collectively processed. Since the substrate is dispensed from the substrate processing apparatus, a plurality of substrates can be handled easily and quickly in the standing posture inside the substrate processing apparatus. In addition, by changing the posture in a lump, generation of particles due to the posture change can be suppressed.

According to the invention of claim 6, the plurality of substrates stored in the first carrier in the horizontal posture are stored in the second carrier in the horizontal posture, and the plurality of substrates stored in the second carrier by the posture changing means. Are collectively changed, so that a plurality of substrates can be handled easily and quickly in the standing posture inside the substrate processing apparatus. In addition, by changing the posture in a lump, generation of particles due to the posture change can be suppressed.

According to the invention of claim 7, the plurality of substrates stored in the carrier in the horizontal posture are stored in the posture changing means in the horizontal posture, and the postures of the plurality of substrates stored in the posture changing means are changed collectively. Therefore, a plurality of substrates can be handled easily and quickly in the standing posture inside the substrate processing apparatus. In addition, by changing the posture in a lump, generation of particles due to the posture change can be suppressed.

<1. First Embodiment>
FIG. 1 is a perspective view showing the entire substrate processing apparatus 1 according to the present invention, and FIG. 2 is a plan view schematically showing the substrate processing apparatus 1 as viewed from above (in the (-Z) direction in FIG. 1). FIG. The substrate processing apparatus 1 is an apparatus for performing a cleaning process by immersing a substrate W in a processing liquid such as a chemical solution or pure water in a standing posture, and is roughly composed of a carrier mounting unit 2 and a substrate processing unit 3. ing. The carrier mounting unit 2 transfers a carrier SC (used for transport between apparatuses, hereinafter, referred to as a “general-purpose carrier”) SC with the outside of the apparatus, and moves the substrate W from a horizontal posture to a standing posture. The substrate processing unit 3 is changed to deliver the substrate W to the substrate processing unit 3. The substrate processing unit 3 is a unit that immerses the substrate W received from the carrier mounting unit 2 in a processing liquid to perform a cleaning process.

The carrier mounting unit 2 includes a substrate transfer robot 21 for transferring the substrate W from the general-purpose carrier SC to a dedicated carrier EC used inside the apparatus 1, and a general-purpose carrier for mounting the general-purpose carrier SC carried into the apparatus 1. The mounting section 22, the attitude changing section 23 for changing the attitude of the dedicated carrier EC, the dedicated carrier transfer robot 24 for transporting the dedicated carrier EC, and the dedicated carrier EC are placed by the dedicated carrier transfer robot 24, and the substrate processing unit 3 The carrier W has a protruding portion 25 for transferring the substrate W, and a carrier cleaning unit 26 for cleaning the dedicated carrier EC.

Further, the substrate processing unit 3 receives the substrate W from the protruding portion 25 and transports the substrate W. The substrate transport robot 31 transfers the substrate W to and from the substrate transport robot 31 and performs a cleaning process by immersing the substrate W in a processing liquid. And a drying processing unit 33 for transferring the substrate W to and from the substrate transport robot 31 and drying the substrate W after the cleaning processing.

In addition, the dedicated carrier transfer robot 24, the protrusion 25, and the substrate transfer robot 31 form a transfer system for transferring the substrate W between the posture changing unit 23 and the cleaning unit 32 and the drying unit 33. .

The above is the general configuration of the substrate processing apparatus 1. Next, a description will be given of a method of handling the substrate W in the substrate processing apparatus 1 and the structure and operation of each component.

First, the substrate W is mounted on the carrier mounting table 221 of the general-purpose carrier mounting section 22 from the outside of the apparatus while being stored in the general-purpose carrier SC. The carrier mounting table 221 is arranged in the Y direction on the general-purpose carrier mounting section 22, and the general-purpose carrier SC transported in a state of being stored in a special pod (not shown) above the carrier mounting table 221 is provided. The pod is taken out from under the special pod and placed in the state shown in FIG. The general-purpose carrier SC has a substantially columnar shape as shown in FIG. 3, and can be stored in a horizontal posture such that the plurality of substrates W are supported by the claws Na. The general-purpose carrier SC has two openings Ea1 and Ea2 so as to face each other, and the substrate W can be moved in and out only from the opening Ea1 side as shown by an arrow Da1. The general-purpose carrier SC is mounted on the carrier mounting table 221 such that the opening Ea1 faces the attitude changing unit 23 and the opening Ea2 faces the substrate transfer robot 21.

When the general-purpose carrier SC is mounted on the carrier mounting table 221, the substrate transfer robot 21 transfers the substrate W stored in the general-purpose carrier SC to the dedicated carrier EC mounted on the posture changing unit 23. .

As shown in FIG. 4, the dedicated carrier EC supports a plurality of substrates W by means of claws Nb. When the dedicated carrier EC is used, the substrate S is stored in a horizontal posture with the surface Sf1 as the bottom surface and the surface Sf2 is set as the bottom surface. And a state in which the substrate W is stored in the upright posture. In addition, the point that two openings Eb1 and Eb2 are opposed to each other and the substrate W enters and exits through the opening Eb1 as shown by an arrow Db1 is the same as the general-purpose carrier SC. The shape is different, for example, in that a handle P is provided for the mounting. When the substrate W is transferred from the general-purpose carrier SC to the special-purpose carrier EC, the special-purpose carrier EC is in a state in which the surface Sf1 is on the bottom surface on the posture changing unit 23, and the opening Eb1 is attached to the carrier mounting table 221. It is in a state of facing.

The substrate transfer robot 21 includes a plurality of holding plates 211 corresponding to the substrates W stored in the general-purpose carrier SC as shown in FIG. 5A, and a drive source 212 for moving the holding plates 211 (see FIG. 1). As shown in FIGS. 5B and 5C, the holding plate 211 is moved so as to scoop up the substrate W stored in the general-purpose carrier SC, and the substrate W is transferred to the dedicated carrier EC. .

More specifically, as shown in FIG. 6A, each holding plate 211 has a suction pad VP so as to suck and hold the substrate W from below, and each holding plate 211 is opened from the opening Ea2 of the general-purpose carrier SC. After the substrate 211 is moved below each substrate W, the holding plate 211 is moved upward to suction-hold the substrate W. Thereafter, the substrate transfer robot 21 moves in the X direction as shown in FIG. 5B, and moves the substrate W to the dedicated carrier EC through the opening Ea1 of the general-purpose carrier SC and the opening Eb1 of the dedicated carrier. The holding plate 211 is lowered and the suction of the substrate W is released, and the substrate W is placed on the nail Nb of the dedicated carrier EC. When the transfer of the substrate W is completed, the substrate transfer robot 21 moves in the (-X) direction to be in a state shown in FIG.

The substrate transfer robot 21 can move in the X and Y directions as shown by arrows 21X and 21Y in FIG. 2 so that the transfer operation can be performed on all the carrier mounting tables 221 arranged in the Y direction. Further, it is also possible to move the holding plate 211 in the Z direction in order to realize the transfer operation.

(4) When the transfer of the substrate W is completed, the posture changing unit 23 changes the posture of the substrate W together with the dedicated carrier EC from the horizontal posture to the standing posture. That is, as shown in FIGS. 1 and 7, the dedicated carrier EC is mounted on a posture changing table 231. This posture changing table 231 is turned around an axis 231C extending in the Y direction by a rotation driving source (not shown). As shown in FIG. 7 (a), the exclusive carrier EC rotates from the horizontal storage position H where the dedicated carrier EC stores the substrate W in a horizontal posture as shown in FIG. As shown, the dedicated carrier EC rotates to the upright storage position S where the substrate W is held in a state where the substrate W is stored in an upright state. By doing so, the substrate W in the horizontal posture as shown in FIG. 7A becomes the standing posture together with the dedicated carrier EC as shown in FIG. 7B. At this time, the state where the surface Sf1 of the dedicated carrier EC shown in FIG. 4 is the bottom surface is changed to the state where the surface Sf2 is the bottom surface. Note that this operation is also indicated by an arrow 231R in FIG.

When the attitude change of the dedicated carrier EC is completed, two of the plurality of dedicated carriers EC on the attitude changing unit 23 are placed on each of the two protrusions 25 arranged in the Y direction by the dedicated carrier transfer robot 24. Is done. That is, the dedicated carrier transfer robot 24 is movable in the Y direction as shown by an arrow 24Y in FIG. 2, and is rotatable about an axis in the Z direction as shown by an arrow 24R. Further, it can also be moved up and down in the Z direction, and holds the handle P shown in FIG. 4 to transfer the dedicated carrier EC from the attitude changing base 231 to the protrusion 25.

As shown in FIG. 8A, the protrusion 25 has a turntable 251 that can turn around an axis in the Z direction and a protrusion 252 that can move up and down. The mounted dedicated carrier EC first rotates by 90 ° about an axis in the Z direction as indicated by an arrow 25R in FIG. As a result, the normal of the main surface of the substrate W stored in the dedicated carrier EC points in the Y direction.

Next, the push-up table 252 rises, enters the dedicated carrier EC through the opening Eb2 of the dedicated carrier EC, pushes up the substrate W, and takes out the substrate W from the opening Eb1 to the outside of the dedicated carrier EC. Then, the two protrusions 252 approach each other in the Y-axis direction. By doing so, the interval between the group of substrates W on each of the protrusions 252 is reduced. Then, the substrate W is transferred to the substrate transfer robot 31, and the state shown in FIG. Thereafter, the push-up table 252 descends. This push-up operation is performed simultaneously on the two protrusions 25, and the substrates W stored in the two dedicated carriers EC are transferred to the substrate transfer robot 31 at the same time. In addition, grooves (corresponding to the outer edges of the substrates W being held in contact with the grooves) corresponding to the respective substrates W are formed on the protrusion 252 so that the substrates W can be supported in an upright posture. The empty dedicated carrier EC is conveyed to the carrier cleaning unit 26 by the dedicated carrier transfer robot 24 and cleaned, and then mounted on the protrusion 25 again to store the washed substrate W. Is placed.

As shown in FIGS. 1 and 8, the substrate transfer robot 31 has two holding plates 311 extending in the Y direction, and each holding plate 311 is rotatable about a shaft 312 extending in the Y direction. . As a result, the substrate W pushed up from the protruding portion 25 moves between the two holding plates 311, and the two holding plates 311 rotate so as to sandwich the substrate W, thereby causing the substrate W to move as shown in FIG. Is held by the substrate transfer robot 31. That is, the protrusion 25 serves as a relay position for transferring the substrate W to the substrate processing unit 3. In addition, grooves (corresponding to the outer edges of the substrates W being held in contact with the grooves) corresponding to the respective substrates W are formed in both holding plates 311 of the substrate transport robot 31 so that the substrates W can be held in the upright posture. ing.

The substrate transfer robot 31 is also movable in the X direction as indicated by an arrow 31X in FIG. 2, and holds the held substrate W above the plurality of cleaning processing units 32 and drying processing units 33. It can be transported to a position.

(4) The substrate transport robot 31 that has received the substrate W from the protruding portion 25 first transports the substrate W to one of the cleaning processing units 32 (not being subjected to the cleaning process). As shown in FIGS. 1 and 2, each of the cleaning processing units 32 has a storage tank 321 for storing a processing liquid for cleaning, and an elevating robot 322 that can move up and down while holding the substrate W on the holding table 322a. . The elevating robot 322 trying to receive the substrate W from the substrate transfer robot 31 raises the holding table 322a, and then the substrate transfer robot 31 rotates the holding plate 311 holding the substrate W to open the substrate W, The released substrate W is held by the holding table 322a of the lifting robot 322. A plurality of grooves are also formed on the holding table 322a so that the substrate W can be held in the upright posture.

(4) The elevating robot 322 that has received the substrate W from the substrate transport robot 31 lowers the holding table 322a, and immerses the substrate W in the processing liquid stored in the storage tank 321.

As shown in FIG. 9, the storage tank 321 is configured to supply a plurality of types of chemical solutions and pure water from a plurality of chemical solution supply units 321a and a pure water supply unit 321b via supply pipes. It has a discharge groove 321d for receiving the processing liquid overflowing from the tank 321 as indicated by an arrow 321F, and a discharge section 321e for discharging the discharge liquid from the discharge groove 321d via a discharge pipe. Thus, the processing liquid in the storage tank 321 can be replaced with various chemicals (diluted with pure water) or pure water in a state where the substrate W is immersed in the storage tank 321, and appropriate cleaning processing can be performed. It can be applied to the substrate W.

(4) When the cleaning processing is completed in the cleaning processing unit 32, the holding table 322a of the lifting robot 322 is raised, and the substrate W is taken out of the processing liquid. The substrate transport robot 31 receives the substrate W from the holding table 322 a by performing an operation reverse to the operation of transferring the substrate W to the lifting robot 322, and transports the substrate W to the drying processing unit 33.

(4) In the drying processing unit 33, the substrate W is received from the substrate transport robot 31 and subjected to a drying process by a lifting robot (not shown), similarly to the cleaning processing unit 32. When the drying process is completed, the substrate W is transferred to the substrate transfer robot 31 again, and the substrate transfer robot 31 transfers the substrate W to the protrusion 25.

The substrate W that has been subjected to the cleaning process in the substrate processing unit 3 as described above is returned to the protrusion 25 again, and the substrate W is transferred from the substrate loading unit 2 to the substrate processing unit 3. Is stored in the general-purpose carrier SC on the carrier mounting table 221 by performing an operation reverse to the operation of passing the. That is, the substrate W is stored in the dedicated carrier EC in the upright position in the standing position, and the dedicated carrier EC is transferred to the position changing unit 23 by the dedicated carrier transfer robot 24. The substrate W together with the EC is changed from the standing posture to the horizontal posture, and the substrate W inside the dedicated carrier EC is transferred to the general-purpose carrier SC placed on the general-purpose carrier placing part 22 by the substrate transfer robot 21. The general-purpose carrier SC at this time has been replaced with a general-purpose carrier SC for storing the substrate W after the cleaning process. This operation is performed while the substrate W is being subjected to the cleaning process. This is performed by carrying in / out operation of the general-purpose carrier SC.

The configuration and operation of the substrate processing apparatus 1 have been described above. In the substrate processing apparatus 1, the substrate W in the horizontal position carried by the general-purpose carrier SC is transferred to the dedicated carrier EC, and thereafter, the dedicated carrier EC Since the posture of the substrate W is changed to the standing posture, the posture of the substrate W can be quickly and easily changed inside the apparatus. Further, since the mechanism is simple, generation of particles can be easily suppressed, and the quality of the substrate W can be improved. Accordingly, in a substrate processing system including a plurality of substrate processing apparatuses, it is possible to easily introduce a substrate processing apparatus that handles a substrate in an upright posture even when the substrate is transported between the apparatuses in a horizontal posture. it can. In addition, since the posture changing table 231 is configured to rotate around the shaft 231C, the horizontal storage position H where the dedicated carrier EC stores the substrate W in the horizontal posture and the dedicated carrier EC hold the substrate W. The upright storage position S, which is located in the stored state in the upright posture, is adjacent. Therefore, the foot space is minimized.

<2. Second Embodiment>
FIG. 10 is a plan view schematically showing a configuration of a substrate processing apparatus 1a according to a second embodiment of the present invention.

The substrate processing apparatus 1 is roughly composed of a carrier mounting unit 2a and a substrate processing unit 3a. The carrier mounting unit 2a includes a substrate transfer robot 21, a general-purpose carrier mounting unit 22, and a posture changing / projecting unit. The substrate processing unit 3a includes an upper portion 27, and includes a substrate transfer robot 31, a cleaning unit 32, and a drying unit 33. Note that, of these components, except for the posture change / projection portion 27, the structure is substantially the same as that of the substrate processing apparatus 1 according to the first embodiment.

The posture changing / projecting portion 27 and the substrate transport robot 31 form a transport system for transporting the substrate W between the posture changing / projecting portion 27 and the cleaning section 32 or the drying section 33.

In the substrate processing apparatus 1a, first, the two general-purpose carriers SC that store the substrate W in a horizontal posture are mounted on the two carrier mounting tables 221 of the general-purpose carrier mounting portion 22, as in the first embodiment. . Next, the substrate W stored in the general-purpose carrier SC is transferred to the posture change / projection part 27 by the substrate transfer robot 21 as in the first embodiment.

Posture change / protrusion part 27 is a structure in which posture change part 23 and protruding part 25 in the first embodiment have one structure, and FIG. 11 is a diagram showing the structure. In FIG. 11, the same components as those of the posture changing unit 23 shown in FIG. 7 and the protruding portion 25 shown in FIG.

As shown in FIG. 11, the posture change / projection portion 27 has a turntable 251 and a protrusion table 252, and these are the same as the protrusion 25 in the first embodiment. It is rotatable about a shaft facing the same, and the upright base 252 can be moved up and down.

An attitude changing table 231 is mounted on the rotating table 251, and rotates 90 ° around a rotating shaft 231 </ b> C fixed to the rotating table 251 as shown by an arrow 231 </ b> R in FIG. Supported as possible.

The attitude changing base 231 is provided with a carrier portion FC having the same shape as the dedicated carrier EC in the first embodiment, but the difference from the first embodiment is that the carrier part FC is different from the attitude changing base 231 in the first embodiment. , And does not separate from the attitude change table 231.

When the substrate W is transferred from the general-purpose carrier SC to the carrier unit FC, the carrier unit FC stores the substrate W in a horizontal posture as shown in FIG. I have. Accordingly, the carrier section FC and the general-purpose carrier SC have the same arrangement relationship as the dedicated carrier EC and the general-purpose carrier SC shown in FIG. 5, and the substrate W can be transferred by the substrate transfer robot 21.

When the transfer of the substrate W is completed, the attitude change base 231 rotates around the axis 231C in the Y direction as shown by an arrow 231R in FIG. 11A, and the carrier unit FC stores the substrate W in an upright state. It is located at the upright storage position S in the state of being pressed. Thus, as shown in FIG. 11 (b), the substrate W rotates together with the carrier unit FC and assumes a standing posture.

When the posture change of the substrate W is completed, the turntable 251 rotates 90 ° about the axis in the Z direction as shown by the arrow 25R, and the substrate W rotates together with the carrier portion FC, as shown in FIG. As shown in (), the normal line of the substrate W is oriented in the Y direction.

(4) After the normal line of the substrate W is directed in the Y direction, the substrate W is pushed up by the push-up table 252 as in the first embodiment. Then, the two protrusions 252 approach each other in the Y-axis direction, and the distance between the group of substrates W on each of the protrusions 252 is reduced, and the substrate W is transferred to the substrate transfer robot 31. . As shown in FIG. 10, two posture change / projection portions 27 are arranged in the Y direction, and the substrate W is transferred to the substrate transfer robot 31 from these posture change / projection portions 27 at the same time. In addition, as shown in FIG. 11 (c), since the push-up table 252 pushes up the substrate W, the carrier portion FC has an opening Ec1 into and out of the substrate W like the dedicated carrier EC in the first embodiment. An opening Ec2 is provided at a position facing the opening, and an opening 231E through which the push-up table 252 passes is provided in the posture changing table 231 in accordance with the opening Ec2.

(4) The substrate transport robot 31 that has received the substrate W transports the substrate W to the cleaning processing unit 32 and delivers the substrate W. The cleaning processing unit 32 performs the cleaning process and delivers the substrate W to the substrate transport robot 31 again. Then, the substrate transfer robot 31 transfers the substrate W to the drying processing unit 33 to perform a drying process on the substrate W, and returns the substrate W to the substrate transfer robot 31 again. Thereafter, the substrate transport robot 31 returns the substrate W to the posture change / projection portion 27 and returns to the general-purpose carrier SC. That is, the substrate W performs an operation reverse to the operation from the loading of the substrate into the apparatus 1a to the transfer of the substrate W to the substrate transfer robot 31, and the posture of the substrate W is changed from the standing posture to the horizontal posture and returned to the general-purpose carrier SC. It is.

Although the substrate processing apparatus 1a according to the present invention has been described above, in the substrate processing apparatus 1a, the posture change of the plurality of substrates W in the posture change / projection part 27 is collectively performed by the carrier unit FC, and the substrate processing is performed. Since the transfer of the substrate W to and from the transfer robot 31 is performed, the posture of the substrate W can be quickly and easily changed inside the apparatus. Further, since the mechanism is simple, generation of particles is suppressed, and the quality of the substrate W is improved. Further, since the attitude changing table 231 is provided on the rotating table 251, the overall size of the apparatus can be reduced.

<3. Third Embodiment>
FIG. 12 is a plan view showing a substrate processing apparatus 1b according to a third embodiment of the present invention. The substrate processing apparatus 1b performs a cleaning process on the substrate W as in the first and second embodiments. However, the substrate processing apparatus 1b processes the substrate W while storing the substrate W in the cleaning carrier WC. This is different from the embodiment.

The substrate processing apparatus 1b is roughly configured such that a first carrier mounting unit 2b, a substrate processing unit 3b, and a second carrier mounting unit 2c are arranged in the X direction. In the stored state, the substrate W is carried into the first carrier mounting unit 2b, and after being subjected to a cleaning process in the substrate processing unit 3b, the substrate W is stored in the general-purpose carrier SC from the second carrier mounting unit 2c. W is carried out of the apparatus.

The first carrier mounting unit 2b includes a substrate transfer robot 21, a general-purpose carrier mounting unit 22, an attitude changing / projecting portion 27, a cleaning carrier delivery unit 28, and a substrate transfer robot 29. The loading robot 21, the general-purpose carrier placing section 22, and the posture change / projection portion 27 are the same as those in the second embodiment. Further, the cleaning carrier delivery unit 28 is a place where the cleaning carrier WC is placed, and the substrate transport robot 29 transports the substrate W from the posture change / projection part 27 to the cleaning carrier delivery unit 28. And can be moved in the X direction as indicated by arrow 29X.

The substrate processing unit 3b has a cleaning carrier transport robot 31a, a plurality of cleaning processing units 32, and a drying processing unit 33, and the cleaning processing unit 32 and the drying processing unit 33 are the same as those in the second embodiment. It is almost the same as However, the cleaning carrier transport robot 31a receives the cleaning carrier WC in which the substrate W is stored from the cleaning carrier delivery unit 28 and transports the cleaning carrier WC in the X direction as indicated by the arrow 31Xa. The second embodiment differs from the second embodiment in that the unit 32 and the drying unit 33 also handle the substrate W together with the cleaning carrier WC.

The second carrier mounting unit 2c has the same configuration as the first carrier mounting unit 2b, and the components are symmetrically arranged with the substrate processing unit 3b interposed therebetween.

Note that the posture change / projection 27 and the cleaning carrier transport robot 31a in the first and second carrier mounting units 2b and 2c move between the posture change / projection 27 and the cleaning processing unit 32 and the drying processing unit 33. A transfer system for transferring the substrate W is formed.

In the substrate processing apparatus 1b, first, the general-purpose carrier SC storing the substrate W in a horizontal posture is mounted on the carrier mounting table 221 of the general-purpose carrier mounting unit 22. Thereafter, similarly to the second embodiment, the substrate is transferred by the substrate transfer robot 21 to the carrier portion FC of the posture change / projection portion 27, and is changed to the standing posture, and the required rotation is performed to push up.

The substrate W pushed up by the posture change / projection portion 27 is received by the substrate transfer robot 29. As shown in FIG. 13, the substrate transfer robot 29 has two rotating shafts 29C oriented in the Y direction. The substrate W is held by using two arms 291 that rotate as shown by an arrow 29R. The rotating shaft 29C is configured to move so as to expand and contract in the Y direction, and can transport the substrate W also in the Y direction. A groove is formed at a position where the arm 291 contacts the substrate W so that the substrate W can be held in an upright posture.

(4) The substrate transport robot 29 that has received the substrate W transfers the substrate W to the cleaning carrier delivery unit 28. That is, the raising table rises from below the cleaning carrier WC by a mechanism similar to the raising mechanism shown in FIG. 8, receives the substrate W, and moves down to store the substrate W in the cleaning carrier WC. Note that this substrate storing operation is performed twice for one cleaning carrier WC, and the substrates W of the two attitude change / projection portions 27 are stored in one cleaning carrier WC.

When the substrate W is stored in the cleaning carrier WC, the cleaning carrier WC itself is pushed up in the cleaning carrier delivery unit 28 and transferred to the cleaning carrier transport robot 31a. The cleaning carrier transport robot 31a has two bar-shaped arms 311a oriented in the Y direction as shown in FIG. 12, and these arms 311a are held by clamping the cleaning carrier WC. I have.

The cleaning carrier transport robot 31a that has received the cleaning carrier WC transports the cleaning carrier WC to a predetermined cleaning processing unit 32. In the cleaning processing unit 32, the lifting robot receives the cleaning carrier WC and together with the cleaning carrier WC. The cleaning process is performed by immersing the substrate W in the processing liquid. When the cleaning process is completed, the cleaning carrier transport robot 31a receives the cleaning carrier WC from the elevating robot and transports the cleaning carrier WC to the drying processing unit 33, and the drying processing unit 33 receives the cleaning carrier WC and performs the drying process. Apply.

When the drying process is completed, the cleaning carrier transport robot 31a receives the cleaning carrier WC from the drying processing unit 33 and passes it to the cleaning carrier delivery unit 28 of the second carrier mounting unit 2c. Thereafter, the substrate W inside the cleaning carrier WC is stored in the general-purpose carrier SC mounted on the general-purpose carrier mounting portion 22 of the second carrier mounting unit 2c by an operation reverse to that of the first carrier mounting unit 2b. Is carried out of the apparatus 1b. That is, in the substrate processing apparatus 1c, the substrate W is transferred only from the general-purpose carrier mounting part 22 to the substrate processing unit 3b in the first carrier mounting unit 2b, and the substrate W is transferred in the second carrier mounting unit 2c. The substrate W is transferred only from the substrate processing unit 3b to the general-purpose carrier mounting section 22.

As described above, the substrate processing apparatus 1b according to the third embodiment of the present invention has been described. In the substrate processing apparatus 1b, when the substrate W is stored in the cleaning carrier WC in the upright posture, the posture is changed. Since the plurality of substrates W are collectively changed to a horizontal posture or a standing posture at the protruding portion 27, the posture of the substrates W can be quickly and easily changed inside the apparatus. Further, the mechanism is simple, the generation of particles is suppressed, and the quality of the substrate W is improved.

<4. Fourth embodiment>
FIG. 14 is a plan view and a front view showing the configuration of the substrate transfer device 2d according to the present invention.

The substrate transfer device 2d includes a substrate transfer robot 21, a general-purpose carrier mounting portion 22, and a posture changing portion 23, and these configurations are substantially the same as those in the substrate processing device 1 according to the first embodiment. Configuration. That is, the substrate transfer robot 21 has a plurality of holding plates 211, and the holding plates 211 can be moved in the X and Z directions by the drive source 212. The substrate W is transferred using the holding plate 211 between the mounted general-purpose carrier SC and the dedicated carrier EC mounted on the attitude changing unit 23.

The dedicated carrier EC is mounted on a posture changing table 231. The posture changing table 231 rotates 90 ° by rotating about an axis in the Y direction as shown by an arrow 231R, and is horizontally stored. It rotates from the position H to the standing storage position S. Thus, the postures of the plurality of substrates W stored in the dedicated carrier EC are changed to the horizontal posture or the standing posture at a time.

(4) With the substrate transfer device 2d as described above, it is possible to transfer the substrate W stored in the general-purpose carrier SC in the horizontal posture so as to be stored in the dedicated carrier EC in the standing posture. In addition, by the reverse operation, the substrate W stored in the dedicated carrier EC in the upright posture can be transferred to the general-purpose carrier SC so as to be stored in the horizontal posture. This is a case where the substrate processing system that conventionally stores the substrate W in the carrier in the upright posture and transports the substrate W between the substrate processing apparatuses is changed to a substrate processing system that transports the substrate W in a horizontal posture. However, the substrate processing apparatus that handles the substrate W in the upright posture can be used as it is through the substrate transfer device 2d without making major modifications, and the substrate processing system can be economically operated. It becomes.

<5. Modification>
The substrate processing apparatus and the substrate transfer apparatus according to the present invention have been described above, but the present invention is not limited to the above-described embodiment.

For example, in the first to third embodiments, the cleaning process and the drying process are performed on the substrate W. However, any substrate processing apparatus that processes a plurality of substrates W in an upright posture may be used. Or a heat treatment apparatus.

In the first embodiment, as a method of carrying the substrate W into the apparatus, the general-purpose carrier SC is stored in a special pod, transported, taken out of the special pod, and mounted on the carrier mounting table 221. However, the general-purpose carrier SC may of course be carried in and out by another robot.

In the first to fourth embodiments, a plurality of holding plates 211 having suction pads VP as shown in FIG. 6A are used to transfer a substrate W from a general-purpose carrier SC to a dedicated carrier EC or a carrier portion FC. Although the transfer is performed, other forms may be adopted, and for example, a plurality of support pads SP may be provided as shown in FIG.

Further, it is not always necessary to dispose the general-purpose carrier SC and the dedicated carrier EC or the carrier unit FC so as to face each other. If the substrate transfer robot 21 can transfer the substrate W, it is disposed at a remote position. May be.

Further, the number of holding plates 211 of the substrate transfer robot 21 may not be equal to the number of substrates W stored in the general-purpose carrier SC or the dedicated carrier EC. For example, the general-purpose carrier SC can store 25 substrates W. Alternatively, the dedicated carrier EC may store 50 substrates W, and the substrate transfer robot 21 may hold five substrates W at the same time. In this case, instead of the transfer method as in the above-described embodiment, the substrate transfer robot 21 repeats the operation of transferring five substrates W at a time, and transfers the substrates W stored in the two general-purpose carriers SC to one. It will be transferred to the dedicated carrier EC.

In addition, the storage tank 321 for storing the processing liquid in the first embodiment is configured to replace a chemical solution or pure water, but stores different processing liquids in a plurality of storage tanks 321 that do not replace the processing liquid. Alternatively, the substrate transfer robot 31 may sequentially transfer the substrates W to the storage tanks 321.

In addition, in the first and second embodiments, the loading / unloading of the substrate W is performed via one general-purpose carrier mounting portion 22. However, as in the third embodiment, two general-purpose carrier mounting portions are used. Alternatively, the substrate W may be loaded and unloaded via one general-purpose carrier mounting section 22 in the third embodiment.

Furthermore, the holding forms of the substrate transfer robots 31 and 29 and the cleaning carrier transfer robot 31a may be of other forms, and various modifications of each component are also possible.

1 is a perspective view showing a substrate processing apparatus according to the present invention. FIG. 2 is a plan view illustrating a configuration of the substrate processing apparatus illustrated in FIG. 1. It is a figure showing a general-purpose carrier. It is a figure which shows a special carrier. It is a figure showing operation of a substrate transfer robot. It is a perspective view which shows the shape of a holding plate. It is a figure showing operation of a posture change part. It is a figure showing operation of a projection part. It is a figure showing the structure of a washing processing part. 1 is a plan view showing a substrate processing apparatus according to the present invention. It is a figure which shows attitude | position change and operation | movement of a protrusion. 1 is a plan view showing a substrate processing apparatus according to the present invention. FIG. 4 is a diagram illustrating a substrate holding operation of the substrate transfer robot. It is the top view and front view which show the substrate transfer apparatus which concerns on this invention.

Explanation of reference numerals

DESCRIPTION OF SYMBOLS 1, 1a, 1b, 1c Substrate processing apparatus 1d Substrate transfer apparatus 22 General-purpose carrier mounting section 23 Attitude change section 24 Dedicated carrier transfer robot 25 Projection 27 Position change / projection 28 Cleaning carrier delivery section 29, 31 Substrate Transport robot 31a Cleaning carrier transport robot 32 Cleaning section 33 Drying section 211 Holding plate 212 Drive source 321 Storage tank 322 Elevating robot W Substrate EC Dedicated carrier FC Carrier section SC General-purpose carrier WC Cleaning carrier

Claims (7)

A substrate processing method for processing a plurality of substrates at a time,
(a) a step of collectively loading a plurality of substrates into a substrate processing apparatus in a horizontal posture,
(b) a step of changing the posture from a horizontal posture to a standing posture while holding a plurality of substrates carried into the substrate processing apparatus by the posture changing means collectively;
(c) a step of collectively processing a plurality of substrates in the standing posture in the processing unit;
(d) a step of changing the posture from the standing posture to the horizontal posture in a state where the plurality of substrates processed in the processing unit are collectively held by the posture changing means,
(e) a step of collectively discharging the plurality of substrates returned to the horizontal posture from the substrate processing apparatus,
A substrate processing method comprising: The substrate processing method according to claim 1, wherein
A substrate processing method, wherein after the step (a), a plurality of substrates are collectively transferred to a posture changing means in a horizontal posture. The substrate processing method according to claim 1 or 2, wherein
A substrate processing method, wherein after the step (b), a plurality of substrates in an upright posture are transferred to a processing unit at a time by a substrate transfer robot. The substrate processing method according to claim 1, wherein:
A substrate processing method, wherein after the step (c), a plurality of substrates in an upright posture are collectively transferred to a posture changing means by a substrate transfer robot. The substrate processing method according to any one of claims 1 to 4, wherein
In the step (c), a substrate processing method, wherein a plurality of substrates are collectively brought into contact with a predetermined processing liquid in a processing tank provided in the processing unit to perform a cleaning process. A substrate processing apparatus that performs predetermined processing on a plurality of substrates,
(a) transfer means for collectively storing a plurality of substrates stored in a first carrier in a horizontal posture in a second carrier;
(b) posture changing means for changing the posture of the plurality of substrates stored in the second carrier between the horizontal posture and the standing posture at once by changing the posture of the second carrier;
(c) a processing unit having a storage tank that performs a cleaning process on the plurality of substrates in an upright posture,
(d) a transport system that transports a plurality of substrates in an upright attitude between the attitude changing unit and the processing unit,
A substrate processing apparatus comprising: A substrate processing apparatus that performs predetermined processing on a plurality of substrates,
(a) in a state in which a plurality of substrates are collectively stored, posture changing means for changing the postures of the plurality of substrates collectively between a horizontal posture and a standing posture,
(b) transfer means for collectively storing a plurality of substrates stored in the carrier in the horizontal attitude in the attitude changing means,
(c) a processing unit having a storage tank for performing a cleaning process on the plurality of substrates in an upright posture,
(d) carrying-in / out means for carrying out or carrying in a plurality of substrates in the standing posture stored in the posture changing means,
(e) transport means for transporting the plurality of substrates in an upright posture between the loading / unloading means and the processing unit,
A substrate processing apparatus comprising:

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