JP2004093801A5 - - Google Patents
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- Publication number
- JP2004093801A5 JP2004093801A5 JP2002253620A JP2002253620A JP2004093801A5 JP 2004093801 A5 JP2004093801 A5 JP 2004093801A5 JP 2002253620 A JP2002253620 A JP 2002253620A JP 2002253620 A JP2002253620 A JP 2002253620A JP 2004093801 A5 JP2004093801 A5 JP 2004093801A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- monomer
- photosensitive member
- member according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000178 monomer Substances 0.000 claims 12
- 125000001424 substituent group Chemical group 0.000 claims 6
- 125000000524 functional group Chemical group 0.000 claims 5
- 108091008695 photoreceptors Proteins 0.000 claims 5
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims 4
- -1 acryl group Chemical group 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 238000004140 cleaning Methods 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000005641 methacryl group Chemical group 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000000732 arylene group Chemical group 0.000 claims 1
- 125000003262 carboxylic acid ester group Chemical group [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 125000001033 ether group Chemical group 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 239000003973 paint Substances 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims 1
- 125000005504 styryl group Chemical group 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002253620A JP3977207B2 (ja) | 2002-08-30 | 2002-08-30 | 電子写真感光体の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002253620A JP3977207B2 (ja) | 2002-08-30 | 2002-08-30 | 電子写真感光体の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004093801A JP2004093801A (ja) | 2004-03-25 |
| JP2004093801A5 true JP2004093801A5 (https=) | 2005-08-04 |
| JP3977207B2 JP3977207B2 (ja) | 2007-09-19 |
Family
ID=32059575
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002253620A Expired - Fee Related JP3977207B2 (ja) | 2002-08-30 | 2002-08-30 | 電子写真感光体の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3977207B2 (https=) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4921982B2 (ja) | 2004-01-26 | 2012-04-25 | ノースウエスタン ユニバーシティ | ペリレンｎ型半導体及び関連装置 |
| US7371492B2 (en) * | 2005-07-28 | 2008-05-13 | Eastman Kodak Company | Vinyl polymer photoconductive elements |
| DE102005061997A1 (de) * | 2005-12-23 | 2007-07-05 | Basf Ag | Naphthalintetracarbonsäurederivate und deren Verwendung |
| WO2007146250A2 (en) | 2006-06-12 | 2007-12-21 | Northwestern University | Naphthalene-based semiconductor materials and methods of preparing and use thereof |
| EP2089398A2 (en) * | 2006-10-25 | 2009-08-19 | Polyera Corporation | Organic semiconductor materials and methods of preparing and use thereof |
| WO2008063609A2 (en) | 2006-11-17 | 2008-05-29 | Polyera Corporation | Diimide-based semiconductor materials and methods of preparing and using the same |
| CN101622253B (zh) | 2007-01-08 | 2015-04-29 | 破立纪元有限公司 | 用于制备基于芳烃-双（二羧酰亚胺）的半导体材料的方法和用于制备它们的相关中间体 |
| WO2008091670A2 (en) | 2007-01-24 | 2008-07-31 | Polyera Corporation | Organic semiconductor materials and precursors thereof |
| JP4859239B2 (ja) * | 2007-03-30 | 2012-01-25 | キヤノン株式会社 | 電子写真感光体の製造方法 |
| JP5306681B2 (ja) * | 2007-03-30 | 2013-10-02 | 富士フイルム株式会社 | 重合性化合物、重合体、インク組成物、印刷物及びインクジェット記録方法 |
| US9029054B2 (en) * | 2012-06-29 | 2015-05-12 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus |
| EP2680077B1 (en) | 2012-06-29 | 2015-10-28 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, process catridge, and electrophotographic apparatus |
| US20140004456A1 (en) * | 2012-06-29 | 2014-01-02 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, method for producing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus |
| CN103529662B (zh) * | 2012-06-29 | 2016-05-18 | 佳能株式会社 | 电子照相感光构件、处理盒以及电子照相设备 |
| EP2680079B1 (en) | 2012-06-29 | 2016-05-04 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, process catridge, and electrophotographic apparatus |
| EP2680076B1 (en) | 2012-06-29 | 2016-03-02 | Canon Kabushiki Kaisha | Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus |
| CN103529667B (zh) | 2012-06-29 | 2016-08-10 | 佳能株式会社 | 电子照相感光构件、电子照相感光构件的生产方法、处理盒、电子照相设备和酰亚胺化合物 |
| JP5981887B2 (ja) * | 2012-06-29 | 2016-08-31 | キヤノン株式会社 | 電子写真感光体、プロセスカートリッジ及び電子写真装置 |
| JP6635021B2 (ja) * | 2016-12-26 | 2020-01-22 | 京セラドキュメントソリューションズ株式会社 | 正帯電積層型電子写真感光体、プロセスカートリッジ及び画像形成装置 |
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2002
- 2002-08-30 JP JP2002253620A patent/JP3977207B2/ja not_active Expired - Fee Related
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