JP2004079528A5

JP2004079528A5 -

Info

Publication number: JP2004079528A5
Application number: JP2003284342A
Authority: JP
Filing date: 2003-07-31
Publication date: 2006-08-31
Anticipated expiration: 2023-07-31

Claims

A manufacturing apparatus having a load chamber, transfer chamber and a plurality of film forming chambers and the processing chamber connected to the transfer chamber connected to the load chamber,
The plurality of film formation chambers are connected to an evacuation processing chamber for evacuating the film formation chamber, and aligning means for aligning a mask and a substrate, a substrate holding means, a vapor deposition source holder, and the vapor deposition source holder And means for moving
The vapor deposition source holder includes a container in which a vapor deposition material is sealed, means for heating the container, and a shutter provided on the container,
Wherein the processing chamber, manufacturing apparatus characterized by flat heater is disposed to overlap the plurality and after a short interval.

A manufacturing apparatus having a load chamber, transfer chamber and a plurality of film forming chambers and the processing chamber connected to the transfer chamber connected to the load chamber,
The plurality of film formation chambers are connected to an evacuation processing chamber for evacuating the film formation chamber, and aligning means for aligning a mask and a substrate, a substrate holding means, a vapor deposition source holder, and the vapor deposition source holder And means for moving
The vapor deposition source holder includes a container in which a vapor deposition material is sealed, means for heating the container, and a shutter provided on the container,
The processing chamber, hydrogen gas, oxygen gas, manufacturing apparatus characterized by comprising means for generating a plasma by introducing a fluorine gas or a noble gas.

According to claim 2, wherein the transfer chamber, the flat plate heater is disposed to overlap the plurality and after a short interval,
Manufacturing apparatus, wherein a process chamber in which a plurality of substrates can be vacuum heating are connected.

The manufacturing apparatus according to claim 1, wherein an evacuation processing chamber is connected to the processing chamber.

A transfer chamber;
A film forming chamber connected to the transfer chamber and for forming a layer made of a polymer material by a spin coating method;
A plurality of film forming chambers connected to the transfer chamber and first and second pretreatment chambers;
The plurality of film formation chambers are connected to an evacuation processing chamber for evacuating the film formation chamber, and aligning means for aligning a mask and a substrate, a substrate holding means, a vapor deposition source holder, and the vapor deposition source holder And means for moving
The vapor deposition source holder has a container in which a vapor deposition material is sealed, means for heating the container, and a shutter provided on the container,
The first pretreatment chamber has plasma generating means,
In the second pretreatment chamber, a plurality of flat plate heaters are arranged in a stacked manner at intervals.

A transfer chamber;
A first film forming chamber connected to the transfer chamber for forming a layer made of a polymer material by a spin coating method;
A second film forming chamber connected to the transfer chamber and first and second pretreatment chambers;
The second film forming chamber has a vapor deposition source holder,
The vapor deposition source holder has a container in which a vapor deposition material for forming an EL layer is enclosed,
The first pretreatment chamber has plasma generating means,
The manufacturing apparatus according to claim 2, wherein the second pretreatment chamber includes means for vacuum-heating a plurality of substrates.

A transfer chamber;
A first film forming chamber connected to the transfer chamber for forming a layer made of a polymer material by a spin coating method;
A second film forming chamber connected to the transfer chamber and first and second pretreatment chambers;
The second film forming chamber has a vapor deposition source holder,
The vapor deposition source holder has a container in which a vapor deposition material for forming an EL layer is enclosed,
The first pretreatment chamber has plasma generating means,
In the second pretreatment chamber, a plurality of flat plate heaters are arranged in a stacked manner at intervals.

A transfer chamber;
A first film forming chamber connected to the transfer chamber for forming a layer made of a polymer material by a spin coating method;
A second film forming chamber connected to the transfer chamber and first and second pretreatment chambers;
The second film forming chamber has a vapor deposition source holder and means for moving the vapor deposition source holder,
The vapor deposition source holder has a container in which a vapor deposition material for forming an EL layer is enclosed,
The first pretreatment chamber has plasma generating means,
The manufacturing apparatus according to claim 2, wherein the second pretreatment chamber includes means for vacuum-heating a plurality of substrates.

A transfer chamber;
A first film forming chamber connected to the transfer chamber for forming a layer made of a polymer material by a spin coating method;
A second film forming chamber connected to the transfer chamber and first and second pretreatment chambers;
The second film forming chamber has a vapor deposition source holder and means for moving the vapor deposition source holder,
The vapor deposition source holder has a container in which a vapor deposition material for forming an EL layer is enclosed,
The first pretreatment chamber has plasma generating means,
In the second pretreatment chamber, a plurality of flat plate heaters are arranged in a stacked manner at intervals.

10. The EL layer according to claim 6, wherein the EL layer is at least one kind selected from a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer. Manufacturing equipment.

11. The manufacturing apparatus according to claim 6, wherein the plasma generation unit selectively removes the EL layer formed at an unnecessary place by dry etching.

12. The manufacturing apparatus according to claim 6, wherein the vapor deposition source holder includes means for heating the container in which the vapor deposition material is sealed.

13. The manufacturing apparatus according to claim 6, wherein the vapor deposition source holder includes a shutter provided on a container in which the vapor deposition material is sealed.

In any one of claims 1 to 5 and 13, the shutter, the manufacturing apparatus is characterized in that a hole of a small aperture area S2 than the opening area S1 of the container.

The manufacturing apparatus according to claim 5, wherein the plasma is generated by exciting hydrogen gas, oxygen gas, fluorine gas, or a rare gas.

16. The manufacturing apparatus according to claim 2 , wherein the rare gas element is one or more selected from He, Ne, Ar, Kr, and Xe.

In any one of claims 1 to 4, 8 and 9, the means for moving the evaporation source holder moves said evaporation source holder in the X-axis direction at an arbitrary pitch, and, in the Y-axis direction at an arbitrary pitch A manufacturing apparatus having a function of moving.

18. The manufacturing apparatus according to claim 17 , wherein the vapor deposition holder rotates when switching from the X-axis direction to the Y-axis direction.

In any one of claims 1 to 18, manufacturing apparatus characterized by film thickness monitor is provided in the evaporation source holder.