JP2004071470A5 - - Google Patents

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Publication number
JP2004071470A5
JP2004071470A5 JP2002231887A JP2002231887A JP2004071470A5 JP 2004071470 A5 JP2004071470 A5 JP 2004071470A5 JP 2002231887 A JP2002231887 A JP 2002231887A JP 2002231887 A JP2002231887 A JP 2002231887A JP 2004071470 A5 JP2004071470 A5 JP 2004071470A5
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JP
Japan
Prior art keywords
electrode
side plate
ion
lens system
incident
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002231887A
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English (en)
Japanese (ja)
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JP2004071470A (ja
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Publication date
Application filed filed Critical
Priority to JP2002231887A priority Critical patent/JP2004071470A/ja
Priority claimed from JP2002231887A external-priority patent/JP2004071470A/ja
Publication of JP2004071470A publication Critical patent/JP2004071470A/ja
Publication of JP2004071470A5 publication Critical patent/JP2004071470A5/ja
Pending legal-status Critical Current

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JP2002231887A 2002-08-08 2002-08-08 大気圧プラズマイオン化源質量分析装置 Pending JP2004071470A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002231887A JP2004071470A (ja) 2002-08-08 2002-08-08 大気圧プラズマイオン化源質量分析装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002231887A JP2004071470A (ja) 2002-08-08 2002-08-08 大気圧プラズマイオン化源質量分析装置

Publications (2)

Publication Number Publication Date
JP2004071470A JP2004071470A (ja) 2004-03-04
JP2004071470A5 true JP2004071470A5 (cg-RX-API-DMAC7.html) 2005-10-06

Family

ID=32017511

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002231887A Pending JP2004071470A (ja) 2002-08-08 2002-08-08 大気圧プラズマイオン化源質量分析装置

Country Status (1)

Country Link
JP (1) JP2004071470A (cg-RX-API-DMAC7.html)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003044778A (ja) * 2001-07-30 2003-02-14 Fujitsu Ltd 明細通知方法、明細通知プログラム及び明細表示方法
JP5469823B2 (ja) * 2008-04-25 2014-04-16 アジレント・テクノロジーズ・インク プラズマイオン源質量分析装置
EP2681755B1 (en) * 2011-03-04 2017-06-07 PerkinElmer Health Sciences, Inc. Electrostatic lenses and systems including the same
US8796638B2 (en) * 2011-06-08 2014-08-05 Mks Instruments, Inc. Mass spectrometry for a gas analysis with a two-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens
US8450681B2 (en) 2011-06-08 2013-05-28 Mks Instruments, Inc. Mass spectrometry for gas analysis in which both a charged particle source and a charged particle analyzer are offset from an axis of a deflector lens, resulting in reduced baseline signal offsets
US8796620B2 (en) * 2011-06-08 2014-08-05 Mks Instruments, Inc. Mass spectrometry for gas analysis with a one-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens
JP5792561B2 (ja) * 2011-08-25 2015-10-14 株式会社日立製作所 自動クリーニング機能付き質量分析装置
JP6209519B2 (ja) * 2012-09-04 2017-10-04 アトナープ株式会社 膜交換ユニットおよび膜交換ユニットを有するシステム
CN104882351B (zh) * 2015-05-23 2017-01-11 浙江大学 基于常压等离子体的多模式离子源工作装置及应用
JP6456863B2 (ja) * 2016-03-04 2019-01-23 株式会社日立ハイテクノロジーズ イオン移動度分離部を備える分析装置
CN108152358B (zh) * 2017-12-30 2024-02-02 杭州谱育科技发展有限公司 等离子体-质谱分析系统及其工作方法
CN113078041A (zh) * 2021-04-22 2021-07-06 北京衡昇仪器有限公司 双90度偏转四级杆等离子体质谱仪
KR102614315B1 (ko) * 2021-12-02 2023-12-19 영인에이스 주식회사 질량 분석기
CN114944322B (zh) * 2022-06-21 2025-07-25 广州禾信仪器股份有限公司 离子透镜装置和质谱仪
CN117147670B (zh) * 2023-10-26 2023-12-29 广州源古纪科技有限公司 一种VOCs检测方法、系统及设备

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