JP2004067456A - Apparatus and method of manufacturing multilayer quartz glass plate - Google Patents

Apparatus and method of manufacturing multilayer quartz glass plate Download PDF

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Publication number
JP2004067456A
JP2004067456A JP2002230057A JP2002230057A JP2004067456A JP 2004067456 A JP2004067456 A JP 2004067456A JP 2002230057 A JP2002230057 A JP 2002230057A JP 2002230057 A JP2002230057 A JP 2002230057A JP 2004067456 A JP2004067456 A JP 2004067456A
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Japan
Prior art keywords
quartz glass
glass plate
laminate
multilayer
gas burner
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2002230057A
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Japanese (ja)
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JP4201544B2 (en
Inventor
Yoshiaki Ise
伊勢 吉明
Shiyouji Takahashi
高橋 賞治
Kazuo Asajima
浅島 一男
Hiroharu Yarimizu
鑓水 弘治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Quartz Products Co Ltd
Yamagata Shin Etsu Quartz Co Ltd
Original Assignee
Shin Etsu Quartz Products Co Ltd
Yamagata Shin Etsu Quartz Co Ltd
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Priority to JP2002230057A priority Critical patent/JP4201544B2/en
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00Re-forming shaped glass
    • C03B23/20Uniting glass pieces by fusing without substantial reshaping
    • C03B23/203Uniting glass sheets

Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing an inexpensive multilayer quartz glass plate having an excellent structure which is simple and formed by satisfactorily fusing the same or different kinds of quartz glass materials to each other and to provide a method of manufacturing the multilayer quartz glass having the excellent structure formed by satisfactorily fusing the different or the same kinds of the quartz glass materials to each other with the setting of the plate thickness dimension or the degree of drawing freely changed. <P>SOLUTION: The apparatus for manufacturing the multilayer quartz glass plate is composed of: an upper supporting member for supporting the upper end part of unfused stacked quartz glass plates formed by stacking a plurality of the different or the same kinds of quartz glass plates; a lower supporting member for supporting the lower end part of the unfused stacked quartz glass plates; and a pair of gas burner means facing each other and provided to heat both sides of the unfused stacked quartz glass plates. The unfused stacked quartz glass plates passed through between the gas burner means are heated and fused by the flame of the gas burners to form fused stacked quartz glass plates. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、半導体製造装置等において用いられる多層石英ガラス板の製造装置及び方法に関する。
【0002】
【関連技術】
石英ガラス板はその使用目的に応じて様々な特徴を持った品種があり、内部に泡等が入らないため光透過性の良い透明石英ガラス材料や逆に内部に泡等を積極的に入れて、光透過性を悪くした不透明石英ガラス材料及び合成石英を使用した超高純度品等がある。
【0003】
半導体向け石英ガラスの場合の多くは高純度・高耐熱性の二つの性能をともに満足する透明石英ガラス材料を使用するが、部分的には光を遮断する必要から、不透明の石英ガラス材料を使用する場合もある。
【0004】
不透明石英ガラス材料の場合、その多くはガラス内部に微細な泡を混入させて不透明化をしているため、使用後エッチング洗浄をすると石英ガラス表面の微細泡が開放されて表面が著しく粗れ、結果として石英ガラス表面から発塵する等使用上の短所がある。
【0005】
一方、従来より半導体製造工程においては、例えば、半導体基板をヒータで囲まれた加熱炉内に配置して所定のキャリアガスとともに原料ガスを流し、400〜1400℃程度の範囲の高温雰囲気下で不純物を半導体基板内部に浸透させるドライブイン処理を行う熱処理装置に、多数枚の基板を整列保持させて収納するカセットボート、該カセットボートを複数搭載するマザーボート又は基板支持ボートと呼称される基板支持治具が使用されている。
【0006】
この基板支持治具の下端部には、加熱炉内を外部から遮断して内部を一定温度に保温する保温部材が設けられている。この保温部材の内部には複数枚の熱遮蔽用の石英ガラス製治具、即ち石英ガラス熱遮蔽板と、これらの石英ガラス製治具を上下方向に所定間隔をもって水平に支持する複数の支柱が設けられている。この石英ガラス製治具としては、多数の気泡を含有すことで光透過性を抑制した不透明石英ガラス材料が主として用いられる。
【0007】
この種の不透明石英ガラス材料は、前述したように、内部に多数の泡が混入されており、半導体熱処理装置で使用中にこれらの泡が崩壊し、崩壊した泡がパーティクル(石英粉)として発生し、半導体基板の品質に悪影響を及ぼしてしまう。
【0008】
また、半導体製造工程において随時行われている洗浄工程においても泡が崩壊した状態の不透明石英ガラス材料を含む石英ガラス製治具は洗浄によって不透明石英ガラス材料の表面はさらに荒れてくるので、パーティクルが一層発生し益々半導体基板に悪影響を及ぼす。
【0009】
上記した不透明石英ガラス材料の表面からのパーティクル等の発生を防止する手段としては、石英粉又は透明石英ガラス材料を電気や水素ガス等の熱を利用して溶融し、不透明石英ガラス材料の表面に溶着することが考えられるが、いずれもコスト並びに時間がかかり、有効な方法とはいえない。
【0010】
【発明が解決しようとする課題】
本発明は、上記した問題点に鑑み、石英ガラス材料の品種毎の短所を補うために異種又は同種の石英ガラス材料を複合させる技術について種々検討を重ねた結果なされたもので、構造が簡単でかつ低廉なコストで異種又は同種の石英ガラス材料が互いに充分に溶着し合った、優れた構造の多層石英ガラス板を製造することのできる装置、並びに異種又は同種の石英ガラス材料が互いに充分に溶着し合った、優れた構造の多層石英ガラス板をその板厚寸法や延伸の度合を自在に変更設定して製造することのできる方法を提供することを目的とする。
【0011】
【課題を解決するための手段】
上記課題を解決するために、本発明の多層石英ガラス板の製造装置の第1の態様は、異種又は同種の複数枚の石英ガラス板を重ね合わせることによって形成される石英ガラス板載置積層体の上端縁部を支持する上部支持部材と、前記複数枚の石英ガラス板の下端縁部を支持する下部支持部材と、前記石英ガラス板載置積層体の両面を加熱することができるように設けられた相対向する一対のガスバーナー手段とからなり、前記ガスバーナー手段間を通過する前記石英ガラス板載置積層体をガスバーナー火炎によって加熱溶着し石英ガラス板溶着積層体を形成するようにしたことを特徴とする。
【0012】
前記ガスバーナー手段を水平方向に往復移動可能に設け、前記石英ガラス板載置積層体が該ガスバーナー手段間を通過する際に該ガスバーナー手段を水平方向に往復移動させることによって該ガスバーナー手段による加熱が該複数枚の石英ガラス板に対して均一に行われるようにするのが好ましい。
【0013】
前記上部支持部材及び下部支持部材をそれぞれ上下動可能に設けることによって、前記石英ガラス板載置積層体の下降速度や延伸速度を自在に設定することができ、最終製品である多層石英ガラス板の性能等を所望によって適宜変更設定できる。
【0014】
本発明の多層石英ガラス板の製造装置の第2の態様は、異種又は同種の石英ガラス板と異種又は同種の石英ガラス以外の板状体とを重ね合わせることによって形成される石英ガラス板載置積層体の上端縁部を支持する上部支持部材と、前記石英ガラス板載置積層体の下端縁部を支持する下部支持部材と、前記石英ガラス板載置積層体の両面を加熱することができるように設けられた相対向する一対のガスバーナー手段とからなり、前記ガスバーナー手段間を通過する前記石英ガラス板載置積層体をガスバーナー火炎によって加熱溶着し石英ガラス板溶着積層体を形成するようにしたことを特徴とする。石英ガラス以外の板状体としてはセラミックス板等をあげることができる。この本発明の第2の態様の装置においても、前記ガスバーナー手段が水平方向に往復移動可能に設け、かつ前記上部支持部材及び下部支持部材がそれぞれ上下動可能に設け、本発明の第1の態様の装置の場合と同様に作用させることができる。
【0015】
本発明の多層石英ガラス板の製造方法の第1の態様は、異種又は同種の複数枚の石英ガラス板を重ね合わせることによって石英ガラス板載置積層体を形成する工程と、該石英ガラス板載置積層体をガスバーナー火炎によって順次加熱し該石英ガラス板載置積層体の石英ガラス板同士を順次溶着させ石英ガラス板溶着積層体を形成する工程とからなることを特徴とする。前記石英ガラス板溶着積層体を順次溶着形成するとともに該石英ガラス板溶着積層体を順次延伸し石英ガラス板溶着延伸積層体を形成するのが好適である。
【0016】
前記石英ガラス板載置積層体の上端縁部及び下端縁部をそれぞれ上下動可能な上部支持部材及び下部支持部材に支持せしめ、該上端縁部及び下端縁部を支持された石英ガラス板載置積層体を下方に移動させつつガスバーナー火炎によって下部から上部へ順次加熱し該石英ガラス板載置積層体層体の石英ガラス板同士を順次溶着させ石英ガラス板溶着積層体を形成するのが好ましい。
【0017】
前記下部支持部材の降下速度を前記上部支持部材の降下速度よりも大なる速度とすることによって、前記石英ガラス板溶着積層体を下方に延伸し石英ガラス板溶着延伸積層体を形成することが可能となる。
【0018】
前記上部支持部材の降下速度に対する前記下部支持部材の降下速度の比率を1〜10倍の範囲で設定することによって延伸の有無、延伸の度合や最終製品の板厚を自在に変更設定することができる。延伸を行う場合には、上記降下速度の比率を1.5倍〜10倍、好ましくは1.5〜5倍の範囲に設定すればよい。
【0019】
本発明の多層石英ガラス板の製造方法の第2の態様は、異種又は同種の石英ガラス板と異種又は同種の非石英ガラス材料からなる板状体とを重ね合わせることによって石英ガラス板載置積層体を形成する工程と、該石英ガラス板載置積層体をガスバーナー火炎によって順次加熱し該石英ガラス板載置積層体を構成する石英ガラス板と板状体とを順次溶着させ石英ガラス板溶着積層体を形成する工程とからなることを特徴とする。この場合、通常は延伸を行う必要はないので、前記降下速度の比率は1とすればよいが、非石英ガラス材料からなる板状体が延伸可能な材料である場合には必要に応じて上述したように延伸作業を行ってもよいことは勿論である。
【0020】
前記異種又は同種の石英ガラス板としては、透明石英ガラス材料、不透明石英ガラス材料、天然石英ガラス材料、合成石英ガラス材料等の1種又は2種以上を用いることができる。また、前記した非石英ガラス材料からなる板状体としてはセラミックス板等をあげることができる。
【0021】
【発明の実施の形態】
以下に本発明の多層石英ガラス板の製造方法の実施の形態を添付図面に基づいて説明するが、本発明の技術思想から逸脱しない限り図示例以外にも種々の変更が可能なことはいうまでもない。
【0022】
図1は本発明の多層石英ガラス板の製造装置の構造の一例を概略的に示す斜視説明図である。図1において、20は本発明に係る多層石英ガラス板の製造装置である。この製造装置20は、基台22を有し、該基台22上にはブロック体24が立設されている。該ブロック体24は上部ブロック体24aと下部ブロック体24bとに分離されている。該上部及び下部ブロック体24a,24bの表面には相対向する一対の上部及び下部のガイドレール26a,26a及び26b,26bがそれぞれ上下方向に取りつけられている。
【0023】
28aは上部支持部材で上部主板30aを有している。該上部主板30aは上記ガイドレール26a,26aを介して該上部ブロック体24aに上下動可能に取りつけられている。該上部主板30aには側方に突出する2本の上部支持アーム32a,32aが設けられている。一方、28bは下部支持部材で下部主板30bを有している。該下部主板30bは上記下部ガイドレール26b,26bを介して該下部ブロック体26bに上下動可能に取りつけられている。該下部支持部材28bには側方に突出する2本の下部支持アーム32b,32bが設けられ、該下部支持アーム32b,32bの先端には下部支持バー34が取りつけられている。
【0024】
36はガイドロッドで、前記基台22の上面に前記ブロック体24の表面側の中央部に位置するように立設されている。前記上部及び下部主板30a,30bの裏面にはガイド孔38a,38bを穿設したガイドチップ40a,40bが取りつけられている。前記ガイドロッド36は、該ガイド孔38a,38bに挿通され、該ガイドチップ40a,40bを介して上部及び下部の支持部材28a,28bが該ガイドロッド36によって上下動可能にガイドされるようになっている。
【0025】
上記基台22の一側部には前記ブロック体24に対応して支柱42が立設されている。該支柱42の上部には側方に延出するバーナー移動台44,44が水平方向に摺動可能に相対向して設けられ、該バーナー移動台44,44の上面にはガスバーナー手段46,46がそれぞれ相対向して設けられている。該ガスバーナー手段46,46は作動時には水平方向に往復移動しつつ石英ガラス板載置積層体10Aに対して均一に加熱を行うことができるようになっている。
【0026】
上記した多層石英ガラス板の製造装置20を用いて多層石英ガラス板10を製造する方法について図2〜図9を参照して説明する。図2〜図4は図1に示した製造装置における多層石英ガラス板の製造手順を示す概略斜視説明図で、図2は製造開始時において石英ガラス板載置積層体を上部支持部材及び下部支持部材によって支持した状態、図3は製造途中時において順次溶融形成される石英ガラス板溶融積層体の下部側を下部支持部材の下降速度を早めて下方に延伸している状態、及び図4は製造終了時において、石英ガラス板溶融積層体の全てを下部支持部材によって下方に延伸して石英ガラス板溶融延伸積層体即ち本発明の多層石英ガラス板を製造した状態をそれぞれ示す。図5は多層石英ガラス板の製造の手順を石英ガラス材料の形状の変化とともに模式的に示す説明図である。図6は本発明の多層石英ガラス板の製造方法の工程図の一例を示すフローチャートである。図7は、本発明方法によって(a)石英ガラス板載置積層体を溶着延伸して(b)石英ガラス板溶着延伸積層体を形成した場合の1例を模式的に示す平面説明図である。図8は図7の断面説明図である。図9は本発明方法によって(a)石英ガラス板載置積層体を溶着延伸して(b)石英ガラス板溶着延伸積層体を形成した場合の他の例を模式的に示す平面説明図である。
【0027】
まず、異種又は同種の複数枚の石英ガラス板(図示例では不透明石英ガラス材料12aの両側に実質的に気泡のない透明石英ガラス材料14a,14aを配置した場合を示す)を重ね合わせることによって石英ガラス板載置積層体10Aを形成する[図5(a)、図7(a)、図8(a)、図9(a)及び図6のステップ100]。
【0028】
次に、上記石英ガラス板載置積層体10Aの上下の端縁部を上部及び下部支持部材28a,28bによって支持する[図2(a)及び図6のステップ102]。この時、該石英ガラス板載置積層体10Aの上端部及び下端部には上部及び下部の石英ガラスサポート板50a,50a,50b,50bが溶接によって取りつけられ、この上部及び下部の石英ガラスサポート板50a,50a,50b,50bをそれぞれ上部支持アーム32a,32a及び下部支持バー34に接続することによって、該石英ガラス板載置積層体10Aは上部及び下部の支持部材28a,28bにそれぞれ支持された状態となる。
【0029】
続いて、上部及び下部の支持部材28a,28bを下方に同時に移動(降下)させつつガスバーナー手段46,46のガスバーナー火炎によって石英ガラス板載置積層体10Aは加熱されて順次溶融せしめられる[図5(b)及び図6のステップ104]。
【0030】
さらに、順次溶融された石英ガラス板載置積層体10Aの石英ガラス板、即ち透明石英ガラス材料14a、不透明石英ガラス材料12a及び透明石英ガラス材料14aは降下するにつれて互いに順次溶着し、この順次溶着形成される石英ガラス板溶着積層体を順次延伸し石英ガラス板溶着延伸積層体10Bが形成される[図5(b)、図7(b)、図8(b)、図9(b)及び図6のステップ106]。このようにして本発明の多層石英ガラス板即ち石英ガラス板溶着延伸積層体10Bが形成される。
【0031】
このように需要者の要望に応じて自在に板状材料の複合的な組み合わせができる上、作業開始時の板状材料の厚さは引き降下速度と送り降下速度の比率に応じて自由に設計することが可能となる。さらに作業時に板状材料に対する装置の接触部分がないので、汚れが全く発生しないという利点がある。
【0032】
不透明石英ガラス材料12aの両面に透明石英ガラス材料14aを重ね合わせて、形成された石英ガラス板溶着延伸積層体10Bは、使用目的に応じて所望の形状に切断されて使用される。この切断した状態の多層石英ガラス板単体(図示例では三層石英ガラス板単体)10aは、図10に示すように、不透明石英ガラス層12の側面は露出された状態となっており、このまま熱処理装置等において使用すると、該不透明石英ガラス層12の露出された側面部分12bからパーティクル等が排出されて汚染の原因となってしまう。
【0033】
そこで、半導体装置等で使用する場合には該不透明石英ガラス層12の露出状態の側面部分12bを側面用透明石英ガラス材料によって被覆することによって側面透明石英ガラス層14Bを形成し、パーティクル等の排出が生じないようにして最終的に図1に示した多層石英ガラス板10の構造とすることが必要である。この側面部分12bを被覆する手法(1)〜(3)について図11〜図13を参照して以下に説明する。
【0034】
(1)第1の手法としては、図11に示したように、不透明石英ガラス層12の露出した側面部分12bを有する多層石英ガラス板単体10a[図11(a)]に対して、フッ酸エッチング処理又は機械研削処理を施すことによって該側面部分12bを除去して後退側面部分12c及び側面空間Kを形成するとともに上下の透明石英ガラス層14の端縁部を外方に延出した状態として上下の延出端縁部14bを形成する[図11(b)]。
【0035】
次いで、上記上下の延出端縁部14b,14bをガスバーナーBを用いファイア仕上げによって不透明石英ガラス層12の側面空間K側に溶解折曲せしめて[図11(c)]、側面空間Kを該透明石英ガラス層14の延出端縁部14bによって充填して後退側面部分12cを被覆する側面透明石英ガラス層14Bを形成する。これにより、不透明石英ガラス層12の全面が透明石英ガラス層14で被覆された多層石英ガラス板10が形成される[図11(d)]。
【0036】
(2)第2の手法としては、図9に示したように、多層石英ガラス板単体10a[図12(a)]に対して、レーザー加工手段Rを用いて該多層石英ガラス板単体10aの上面側から適宜の傾斜角θ(例えば、45°程度)でレーザー光線を照射して側面部分12bをレーザーカットし、斜面側面部分12dを形成するとともに上面側の透明石英ガラス層14の上部の端縁部を外方に延出した状態として上部の延出端縁部14bを形成する[図12(b)]。
【0037】
次いで、上記上部延出端縁部14bをガスバーナーBを用いファイア仕上げによって下方に溶解折曲せしめて[図12(c)]、不透明石英ガラス層12の斜面側面部分12dを該透明石英ガラス層14の延出端縁部14bによって被覆し側面透明石英ガラス層14Bを形成する。これにより、不透明石英ガラス層12の全面が透明石英ガラス層14で被覆された多層石英ガラス板10が形成される[図12(d)]。
【0038】
(3)第3の手法としては、図13に示したように、多層石英ガラス板単体10a[図13(a)]に対して、透明ガラス製溶接棒Dの先端をガスバーナーBのファイア仕上げによって溶解して垂らし[図13(b)]、不透明石英ガラス層12の側面部分12bを被覆し、側面透明石英ガラス層14Bを形成する。これにより、不透明石英ガラス層12の全面が透明石英ガラス層14で被覆された多層石英ガラス板10が形成される[図13(c)]。
【0039】
上記した実施の形態においては、不透明石英ガラス材料12aの表面及び裏面に対して透明石英ガラス材料14a、14aをそれぞれ重ね合わせて複合的な多層(図示例では三層)構造を形成する場合について説明したが、その他の組み合わせによって多層構造を形成することも勿論可能であり、例えば、天然石英ガラス材料、合成石英ガラス材料、透明石英ガラス材料、不透明石英ガラス材料等を適宜複合的に重ね合わせて多層構造とすることもできる。さらに、これらの石英ガラス材料に対して非石英ガラス材料からなる板状体、例えば、セラミックス材料等を複合的に組み合わせて非石英ガラス材料を含めた多層構造を形成することも可能である。
【0040】
【実施例】
以下に本発明方法の実施例をあげてさらに具体的に説明するが、これらの実施例は例示的に示されるもので限定的に解釈されるべきでないことはいうまでもない。
【0041】
(実施例1)
図1に示した多層石英ガラス板の製造装置と同様の装置を用いて多層石英ガラス板を製造した例を以下に示す。
【0042】
まず、400mm(幅)×300mm(長さ)×6mm(厚さ)の不透明石英ガラス材料12aの表裏両面に400mm(幅)×300mm(長さ)×3mm(厚さ)の透明石英ガラス材料14a,14aを重ね合わせてサンドイッチ構造の石英ガラス板載置積層体10Aを形成する。この石英ガラス板載置積層体10Aのサイズは、400mm(幅)×300mm(長さ)×12mm(厚さ)である[図7(a)及び図8(a)の状態]。
【0043】
この石英ガラス板載置積層体10Aを図2に示したように、上部及び下部の支持部材28a,28bによって支持する。この支持された石英ガラス板載置積層体10Aの下端部からガスバーナー手段46,46のガスバーナー火炎によって石英ガラス板載置積層体10Aを加熱する。この時、上部支持部材28aの送り降下速度は3mm/分及び下部支持部材28bの引き降下速度は9mm/分に設定した。
【0044】
このようにして、該石英ガラス板載置積層体10Aはガスバーナー火炎によって加熱溶融されつつ降下しかつ同時に下部支持部材28bは上部支持部材28aの3倍の速度で降下するので下方への延伸力として働き溶融されかつ互いに溶着した透明石英ガラス材料14a,14a及び不透明石英ガラス材料12aは延伸されつつ降下することとなる。
【0045】
この状態で降下を続け石英ガラス板載置積層体10Aの上端縁部がガスバーナー手段46,46の位置まで降下して該石英ガラス板載置積層体10Aの全てが溶融し、透明石英ガラス材料14a,14a及び不透明石英ガラス材料12aの全てが互いに溶着され延伸されて石英ガラス板溶着延伸積層体10Bが形成される[図7(b)及び図8(b)の状態]。
【0046】
この時点で、ガスバーナー手段46,46を止めると共に上部及び下部の支持部材28a,28bの下降を停止する。この実験で得られた石英ガラス板溶着延伸積層体10B(即ち多層石英ガラス板10)における溶着延伸した不透明石英ガラス材料12aのサイズは、幅は溶着延伸前と変わりなく400mmであるが長さは溶着延伸前の3倍の900mmとなっており、厚さは溶着延伸前の1/3の2mmとなっていた。
【0047】
また、溶着した透明石英ガラス材料14aのサイズは、幅は400mmで溶着延伸前と変わりなく、長さは同様に溶着延伸前の3倍の900mmとなり、厚さは溶着延伸前の1/3の1mmとなっていた。つまり、全体の石英ガラス板溶着延伸積層体10Bのサイズは、400mm(幅)×900mm(長さ)×4mm(厚さ)であった。この石英ガラス板溶着延伸積層体10Bから所定サイズの円盤を切り出し、その側面の露出した不透明ガラス層を溶接棒で溶接することによって透明ガラス層によって被覆して石英ガラス製治具を製作した。
【0048】
この石英ガラス治具を半導体熱処理装置において熱遮蔽板として用いたところ、パーティクルの発生は全く見られずかつ極めて優れた熱遮蔽効果を発揮することとが確認できた。
【0049】
(実施例2)
300mm(直径)×6mm(厚さ)の円板状の不透明石英ガラス材料12aの表裏両面に300mm(幅)×300mm(長さ)×3mm(厚さ)の透明石英ガラス材料14a、14aを重ね合わせてサンドイッチ構造とした石英ガラス板載置積層体10A〔図9(a)の状態〕を形成した以外は実施例1と同様にして石英ガラス板溶着延伸積層体10B〔図9(b)の状態〕を作成した。図9(b)によく示されるように、円板状の不透明石英ガラス材料12aが縦方向に延伸されて長円状の形状となったが、三層構造の石英ガラス板溶着延伸積層体を実施例1の場合と同様に製造することができた。
【0050】
【発明の効果】
以上述べたごとく、本発明装置によれば、構造が簡単でかつ低廉なコストで異種又は同種の石英ガラス材料が充分に溶着し合った、優れた構造の多層石英ガラス板を製造することができる。
【0051】
本発明方法によれば、異種又は同種の石英ガラス材料が充分に溶着し合った、優れた構造の多層石英ガラス板をその板厚寸法や延伸の度合を自在に変更して製造することができる。
【図面の簡単な説明】
【図1】本発明の多層石英ガラス板の製造装置の構造の一例を概略的に示す斜視説明図である。
【図2】本発明装置の使用の態様を示すもので、製造開始時において石英ガラス板載置積層体を上部支持部材及び下部支持部材によって支持した状態を示す概略斜視説明図である。
【図3】本発明装置の使用の態様を示すもので、製造途中時において順次溶融形成される石英ガラス板溶融積層体の下部側を下部支持部材の下降速度を早めて下方に延伸している状態を示す概略斜視説明図である。
【図4】本発明装置の使用の態様を示すもので、製造終了時において石英ガラス板溶融積層体の全てを下部支持部材によって下方に延伸して石英ガラス板溶融延伸積層体即ち本発明の多層石英ガラス板を製造した状態を示す概略斜視説明図である。
【図5】多層石英ガラス板の製造の手順を石英ガラス材料の形状の変化とともに模式的に示す説明図である。
【図6】本発明の多層石英ガラス板の製造方法の工程図の一例を示すフローチャートである。
【図7】本発明方法によって(a)石英ガラス板載置積層体を溶着延伸して(b)石英ガラス板溶着延伸積層体を形成した場合の1例を模式的に示す平面説明図である。
【図8】図7の断面説明図である。
【図9】本発明方法によって(a)石英ガラス板載置積層体を溶着延伸して(b)石英ガラス板溶着延伸積層体を形成した場合の他の例を模式的に示す平面説明図である。
【図10】多層石英ガラス板単体の構造の一つの例を示す拡大断面図である。
【図11】多層石英ガラス板の側面透明石英ガラス層の形成方法の一例を示す模式的説明図である。
【図12】多層石英ガラス板の側面透明石英ガラス層の形成方法の他の例を示す模式的説明図である。
【図13】多層石英ガラス板の側面透明石英ガラス層の形成方法の別の例を示す模式的説明図である。
【符号の説明】
10:多層石英ガラス板、10A:石英ガラス板載置積層体、10a:多層石英ガラス板単体、10B:石英ガラス板溶着延伸積層体、12:不透明石英ガラス層、12a:不透明石英ガラス材料、12b:側面部分、12c:後退側面部分、12d:斜面側面部分、14B:側面透明石英ガラス層、14b:延出端縁部、14:透明石英ガラス層、14a:透明石英ガラス材料、20:多層石英ガラス板の製造装置、22:基台、24:ブロック体、24a:上部ブロック体、24b:下部ブロック体、26a:上部ガイドレール、26b:下部ガイドレール、28a:上部支持部材、28b:下部支持部材、30a:上部主板、30b:下部主板、32a:上部支持アーム、32b:下部支持アーム、34:下部支持バー、36:ガイドロッド、38a,38b:ガイド孔、40a,40b:ガイドチップ、42:支柱、44:バーナー移動台、46:ガスバーナー手段、50a,50b:石英ガラスサポート板、B:ガスバーナー、D:溶接棒、K:側面空間、R:レーザー加工手段。
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to an apparatus and a method for manufacturing a multilayer quartz glass plate used in a semiconductor manufacturing apparatus or the like.
[0002]
[Related technology]
There are various types of quartz glass plates with various characteristics depending on the purpose of use.Because no bubbles etc. enter inside, transparent quartz glass material with good light transmittance or conversely, bubbles etc. are actively put inside. There are opaque quartz glass materials with poor light transmittance and ultra-high purity products using synthetic quartz.
[0003]
In many cases, quartz glass for semiconductors uses a transparent quartz glass material that satisfies both high purity and high heat resistance properties, but uses an opaque quartz glass material because it is necessary to partially block light. In some cases.
[0004]
In the case of opaque quartz glass materials, most of them are made opaque by mixing fine bubbles inside the glass, so that after etching and cleaning after use, the fine bubbles on the quartz glass surface are opened and the surface becomes extremely rough, As a result, there is a disadvantage in use such as dust generation from the quartz glass surface.
[0005]
On the other hand, conventionally, in a semiconductor manufacturing process, for example, a semiconductor substrate is placed in a heating furnace surrounded by a heater, a source gas is flowed together with a predetermined carrier gas, and impurities are removed under a high temperature atmosphere in a range of about 400 to 1400 ° C. A boat supporting a substrate boat called a cassette boat for aligning and holding a large number of substrates, a mother boat mounting a plurality of the cassette boats, or a substrate supporting boat, in a heat treatment apparatus for performing a drive-in process for infiltrating the inside of the semiconductor substrate. Tools are used.
[0006]
At the lower end of the substrate support jig, there is provided a heat insulating member for shutting off the inside of the heating furnace from the outside and keeping the inside at a constant temperature. Inside the heat retaining member, a plurality of quartz glass jigs for heat shielding, that is, a quartz glass heat shielding plate, and a plurality of columns for horizontally supporting these quartz glass jigs at predetermined intervals in the vertical direction. Is provided. As this quartz glass jig, an opaque quartz glass material containing a large number of bubbles to suppress light transmittance is mainly used.
[0007]
As described above, this type of opaque quartz glass material has a large number of bubbles mixed therein, and these bubbles collapse during use in a semiconductor heat treatment apparatus, and the collapsed bubbles are generated as particles (quartz powder). However, the quality of the semiconductor substrate is adversely affected.
[0008]
Also, in the washing process that is performed as needed in the semiconductor manufacturing process, the surface of the opaque quartz glass material containing the opaque quartz glass material in which bubbles are collapsed is further roughened by washing, so that particles are generated. It occurs more and adversely affects the semiconductor substrate.
[0009]
As a means for preventing the generation of particles and the like from the surface of the opaque quartz glass material described above, quartz powder or a transparent quartz glass material is melted by using heat of electricity or hydrogen gas and the like, and is applied to the surface of the opaque quartz glass material. Welding is conceivable, but all are costly and time consuming, and are not effective methods.
[0010]
[Problems to be solved by the invention]
In view of the above-mentioned problems, the present invention has been made as a result of various studies on a technique of combining different or similar quartz glass materials in order to compensate for the disadvantages of each type of quartz glass material, and has a simple structure. A device capable of producing a multilayer quartz glass plate of excellent structure, in which different or similar quartz glass materials are sufficiently welded to each other at a low cost, and where different or similar quartz glass materials are sufficiently welded to each other. It is an object of the present invention to provide a method capable of producing a multilayer quartz glass plate having an excellent structure and having a variable thickness and a degree of stretching.
[0011]
[Means for Solving the Problems]
In order to solve the above problems, a first embodiment of a multilayer quartz glass plate manufacturing apparatus according to the present invention is a quartz glass plate mounting laminate formed by laminating a plurality of different or similar quartz glass plates. An upper support member for supporting an upper edge portion of the quartz glass plate, a lower support member for supporting a lower edge portion of the plurality of quartz glass plates, and provided so as to heat both surfaces of the quartz glass plate mounting laminate. And a pair of opposed gas burner means, and the quartz glass plate-mounted laminate passing between the gas burner means is heated and welded by a gas burner flame to form a fused quartz glass plate welded laminate. It is characterized by the following.
[0012]
The gas burner means is provided so as to be capable of reciprocating in the horizontal direction, and the gas burner means is reciprocated in the horizontal direction when the quartz glass plate-mounted laminate passes between the gas burner means. It is preferable that the heating is performed uniformly on the plurality of quartz glass plates.
[0013]
By providing the upper support member and the lower support member so as to be vertically movable, it is possible to freely set a descent speed and a stretching speed of the quartz glass plate-mounted laminate, and a multilayer quartz glass plate as a final product. Performance and the like can be changed and set as needed.
[0014]
A second aspect of the apparatus for manufacturing a multilayer quartz glass plate of the present invention is a quartz glass plate mounting formed by laminating different or similar quartz glass plates and a plate-like body other than the different or similar quartz glass. An upper support member that supports an upper edge of the laminate, a lower support member that supports a lower edge of the quartz glass plate mounting laminate, and both surfaces of the quartz glass plate mounting laminate can be heated. And a pair of opposed gas burner means provided as described above, and the fused quartz glass plate mounted laminate passing between the gas burner means is heated and fused by a gas burner flame to form a fused quartz glass plate welded laminate. It is characterized by doing so. As a plate-like body other than quartz glass, a ceramic plate or the like can be given. Also in the apparatus according to the second aspect of the present invention, the gas burner means is provided so as to be capable of reciprocating in the horizontal direction, and the upper support member and the lower support member are provided so as to be vertically movable, respectively. The same operation as in the device of the embodiment can be performed.
[0015]
The first aspect of the method for manufacturing a multilayer quartz glass plate of the present invention includes a step of forming a quartz glass plate mounting laminate by laminating a plurality of different or similar quartz glass plates, A step of sequentially heating the mounted laminates by a gas burner flame and sequentially welding the quartz glass plates of the mounted quartz glass plate laminate to form a fused quartz glass plate laminated body. It is preferable that the fused quartz glass plate laminate is sequentially formed by welding and the fused quartz glass plate welded laminate is sequentially stretched to form a fused fused quartz glass plate laminate.
[0016]
The upper end edge and the lower end edge of the quartz glass plate mounting laminate are respectively supported by an upper support member and a lower support member which can be moved up and down, and the quartz glass plate support having the upper end edge and the lower end edge supported thereon It is preferable to form a fused quartz glass sheet laminate by sequentially heating the laminated body downward from the lower part to the upper part by a gas burner flame and sequentially welding the quartz glass plates of the quartz glass plate mounted laminated body layered body to each other. .
[0017]
By making the descending speed of the lower supporting member higher than the descending speed of the upper supporting member, it is possible to form the fused fused quartz glass plate by stretching the fused fused quartz glass plate laminate downward. It becomes.
[0018]
By setting the ratio of the lowering speed of the lower supporting member to the lowering speed of the upper supporting member in a range of 1 to 10 times, the presence or absence of stretching, the degree of stretching and the thickness of the final product can be freely changed and set. it can. In the case of stretching, the ratio of the descending speed may be set in the range of 1.5 to 10 times, preferably 1.5 to 5 times.
[0019]
The second aspect of the method for producing a multilayer quartz glass plate of the present invention is a method of placing and laminating a quartz glass plate on a quartz glass plate of a different kind or the same kind and a plate made of a different kind or the same kind of non-quartz glass material. A step of forming a body, and sequentially heating the quartz glass plate-mounted laminate by a gas burner flame to sequentially weld the quartz glass plate and the plate-like body constituting the quartz glass plate-mounted laminate to weld the quartz glass plate. And forming a laminate. In this case, since it is not usually necessary to perform stretching, the ratio of the descending speed may be set to 1. However, if the plate-shaped body made of a non-quartz glass material is a stretchable material, the aforementioned It goes without saying that the stretching operation may be performed as described above.
[0020]
As the quartz glass plate of the different kind or the same kind, one or more kinds of a transparent quartz glass material, an opaque quartz glass material, a natural quartz glass material, a synthetic quartz glass material and the like can be used. Further, as the plate-like body made of the non-quartz glass material, a ceramic plate or the like can be given.
[0021]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, an embodiment of a method for manufacturing a multilayer quartz glass plate of the present invention will be described with reference to the accompanying drawings, but it goes without saying that various modifications other than the illustrated examples are possible without departing from the technical idea of the present invention. Nor.
[0022]
FIG. 1 is a perspective explanatory view schematically showing an example of the structure of a multilayer quartz glass plate manufacturing apparatus of the present invention. In FIG. 1, reference numeral 20 denotes an apparatus for manufacturing a multilayer quartz glass plate according to the present invention. The manufacturing apparatus 20 has a base 22, and a block 24 is erected on the base 22. The block body 24 is divided into an upper block body 24a and a lower block body 24b. A pair of opposing upper and lower guide rails 26a, 26a and 26b, 26b are vertically mounted on the surfaces of the upper and lower block bodies 24a, 24b, respectively.
[0023]
28a is an upper support member having an upper main plate 30a. The upper main plate 30a is vertically movably attached to the upper block body 24a via the guide rails 26a, 26a. The upper main plate 30a is provided with two upper support arms 32a, 32a projecting sideways. On the other hand, 28b is a lower support member having a lower main plate 30b. The lower main plate 30b is vertically movably attached to the lower block body 26b via the lower guide rails 26b, 26b. The lower support member 28b is provided with two lower support arms 32b, 32b projecting laterally, and a lower support bar 34 is attached to the distal ends of the lower support arms 32b, 32b.
[0024]
A guide rod 36 is provided upright on the upper surface of the base 22 so as to be located at the center of the surface of the block body 24. Guide chips 40a, 40b having guide holes 38a, 38b are attached to the back surfaces of the upper and lower main plates 30a, 30b. The guide rod 36 is inserted into the guide holes 38a, 38b, and the upper and lower support members 28a, 28b are vertically movably guided by the guide rod 36 via the guide tips 40a, 40b. ing.
[0025]
On one side of the base 22, a column 42 is erected corresponding to the block body 24. Burner moving bases 44, 44 extending laterally are provided opposite to each other so as to be slidable in the horizontal direction on the upper portion of the column 42, and gas burner means 46, 46 are provided opposite to each other. The gas burners 46, 46 can reciprocate in the horizontal direction during operation to uniformly heat the quartz glass plate-mounted laminate 10A.
[0026]
A method of manufacturing the multilayer quartz glass plate 10 using the above-described multilayer quartz glass plate manufacturing apparatus 20 will be described with reference to FIGS. 2 to 4 are schematic perspective explanatory views showing a manufacturing procedure of the multilayer quartz glass plate in the manufacturing apparatus shown in FIG. 1, and FIG. FIG. 3 shows a state in which the lower side of the fused quartz glass sheet laminated body which is sequentially melt-formed in the course of manufacturing is extended downward by increasing the lowering speed of the lower supporting member, and FIG. At the end of the process, all of the fused quartz glass sheet laminate is stretched downward by the lower support member to produce the fused quartz glass sheet fused laminate, that is, the multilayer quartz glass sheet of the present invention. FIG. 5 is an explanatory view schematically showing a procedure for manufacturing a multilayer quartz glass plate together with a change in the shape of the quartz glass material. FIG. 6 is a flowchart showing an example of a process chart of the method for manufacturing a multilayer quartz glass plate of the present invention. FIG. 7 is an explanatory plan view schematically showing an example in which (a) the fused quartz glass plate mounted laminate is welded and stretched by the method of the present invention to form (b) the fused fused silica plate stretched laminate. . FIG. 8 is an explanatory sectional view of FIG. FIG. 9 is a plan explanatory view schematically showing another example in which (a) the fused and laminated quartz glass plate is welded and stretched by the method of the present invention to form (b) the fused and fused quartz glass plate laminated laminate. .
[0027]
First, a plurality of different or similar quartz glass plates (in the illustrated example, a case where transparent quartz glass materials 14a, 14a having substantially no air bubbles are arranged on both sides of an opaque quartz glass material 12a are shown) are overlapped with each other to form quartz. A glass plate-mounted laminate 10A is formed [Step 100 in FIG. 5A, FIG. 7A, FIG. 8A, FIG. 9A, and FIG. 6].
[0028]
Next, the upper and lower edges of the quartz glass plate-mounted laminate 10A are supported by upper and lower support members 28a and 28b [Step 102 in FIG. 2A and FIG. 6]. At this time, upper and lower quartz glass support plates 50a, 50a, 50b, 50b are attached to the upper and lower ends of the quartz glass plate mounting laminate 10A by welding, and the upper and lower quartz glass support plates are attached. By connecting 50a, 50a, 50b, 50b to the upper support arms 32a, 32a and the lower support bar 34, respectively, the quartz glass plate mounted laminate 10A was supported by the upper and lower support members 28a, 28b, respectively. State.
[0029]
Subsequently, while simultaneously moving (falling) the upper and lower supporting members 28a, 28b downward, the quartz glass plate-mounted laminate 10A is heated by the gas burner flames of the gas burner means 46, 46 and is sequentially melted [ Step 104 in FIG. 5B and FIG. 6].
[0030]
Further, the fused quartz glass plates of the fused quartz glass plate mounting laminated body 10A, that is, the transparent quartz glass material 14a, the opaque quartz glass material 12a, and the transparent quartz glass material 14a are sequentially welded to each other as they descend, and are sequentially welded. The fused quartz glass plate welded laminate is sequentially stretched to form a fused quartz glass plate welded stretched laminate 10B [FIGS. 5 (b), 7 (b), 8 (b), 9 (b) and 9 (b). 6, Step 106]. In this way, the multilayer quartz glass plate of the present invention, that is, the fused stretched laminate 10B of the quartz glass plate is formed.
[0031]
In this way, the combination of plate materials can be freely combined according to the demands of the user, and the thickness of the plate material at the start of work can be freely designed according to the ratio of the pulling down speed and the feed down speed It is possible to do. Furthermore, since there is no contact portion of the device with the plate-like material during the operation, there is an advantage that no stain is generated.
[0032]
The fused quartz glass sheet laminated laminate 10B formed by laminating the transparent quartz glass material 14a on both surfaces of the opaque quartz glass material 12a is used after being cut into a desired shape according to the purpose of use. As shown in FIG. 10, the multilayer quartz glass plate alone (in the illustrated example, a triple quartz glass plate alone) 10a in a cut state has the side surfaces of the opaque quartz glass layer 12 exposed, and the heat treatment is performed as it is. When used in an apparatus or the like, particles and the like are discharged from the exposed side surface portion 12b of the opaque quartz glass layer 12, thereby causing contamination.
[0033]
Therefore, when used in a semiconductor device or the like, the exposed side surface portion 12b of the opaque quartz glass layer 12 is covered with a transparent quartz glass material for a side surface to form a side transparent quartz glass layer 14B, thereby discharging particles and the like. It is necessary to finally obtain the structure of the multilayer quartz glass plate 10 shown in FIG. Techniques (1) to (3) for covering the side surface portion 12b will be described below with reference to FIGS.
[0034]
(1) As a first method, as shown in FIG. 11, a multilayer quartz glass plate 10a having exposed side portions 12b of an opaque quartz glass layer 12 [FIG. The side surface portion 12b is removed by performing an etching process or a mechanical grinding process to form the receding side surface portion 12c and the side surface space K, and the upper and lower edges of the transparent quartz glass layer 14 are extended outward. The upper and lower extending edge portions 14b are formed [FIG. 11B].
[0035]
Next, the upper and lower extending edge portions 14b, 14b are melt-bent to the side space K side of the opaque quartz glass layer 12 by fire finishing using a gas burner B (FIG. 11 (c)). The transparent quartz glass layer 14B is filled with the extending edge portion 14b to form the side transparent quartz glass layer 14B covering the receding side portion 12c. Thereby, the multilayer quartz glass plate 10 in which the entire surface of the opaque quartz glass layer 12 is covered with the transparent quartz glass layer 14 is formed (FIG. 11D).
[0036]
(2) As a second method, as shown in FIG. 9, the multilayer quartz glass plate 10a (FIG. 12A) is The side surface portion 12b is laser-cut by irradiating a laser beam from the upper surface side at an appropriate inclination angle θ (for example, about 45 °) to form an inclined side surface portion 12d and an upper edge of the transparent quartz glass layer 14 on the upper surface side. The upper extending edge portion 14b is formed with the portion extending outward [FIG. 12 (b)].
[0037]
Next, the upper extending edge portion 14b is melted and bent downward by fire finishing using a gas burner B [FIG. 12 (c)], and the slope side surface portion 12d of the opaque quartz glass layer 12 is removed from the transparent quartz glass layer. 14 to form a side transparent quartz glass layer 14B. Thus, the multilayer quartz glass plate 10 in which the entire surface of the opaque quartz glass layer 12 is covered with the transparent quartz glass layer 14 is formed (FIG. 12D).
[0038]
(3) As a third method, as shown in FIG. 13, the tip of the transparent glass welding rod D is fire-finished with the gas burner B for the multilayer quartz glass plate 10a (FIG. 13A). 13 (b)] to cover the side portion 12b of the opaque quartz glass layer 12 to form a side transparent quartz glass layer 14B. Thus, the multilayer quartz glass plate 10 in which the entire surface of the opaque quartz glass layer 12 is covered with the transparent quartz glass layer 14 is formed [FIG. 13 (c)].
[0039]
In the above-described embodiment, a case will be described in which the transparent quartz glass materials 14a, 14a are respectively superposed on the front and back surfaces of the opaque quartz glass material 12a to form a composite multilayer (three layers in the illustrated example) structure. However, it is of course possible to form a multilayer structure by other combinations, for example, a natural quartz glass material, a synthetic quartz glass material, a transparent quartz glass material, an opaque quartz glass material, etc. It can also be structured. Furthermore, it is also possible to form a multilayer structure including the non-quartz glass material by combining these quartz glass materials with a plate-like body made of a non-quartz glass material, for example, a ceramic material.
[0040]
【Example】
Hereinafter, the method of the present invention will be described in more detail with reference to examples. However, it is needless to say that these examples are illustrative and should not be construed as limiting.
[0041]
(Example 1)
An example in which a multilayer quartz glass plate is manufactured using an apparatus similar to the apparatus for manufacturing a multilayer quartz glass plate shown in FIG. 1 will be described below.
[0042]
First, a transparent quartz glass material 14a of 400 mm (width) × 300 mm (length) × 3 mm (thickness) is formed on both sides of an opaque quartz glass material 12 a of 400 mm (width) × 300 mm (length) × 6 mm (thickness). , 14a are stacked to form a sandwiched quartz glass plate-mounted laminate 10A. The size of the quartz glass plate-mounted laminate 10A is 400 mm (width) × 300 mm (length) × 12 mm (thickness) [states of FIGS. 7A and 8A].
[0043]
As shown in FIG. 2, the quartz glass plate-mounted laminate 10A is supported by upper and lower support members 28a and 28b. The quartz glass plate stack 10A is heated from the lower end of the supported quartz glass plate stack 10A by the gas burner flame of the gas burner means 46, 46. At this time, the feed lowering speed of the upper supporting member 28a was set at 3 mm / min, and the pulling down speed of the lower supporting member 28b was set at 9 mm / min.
[0044]
In this manner, the quartz glass plate-mounted laminated body 10A descends while being heated and melted by the gas burner flame, and at the same time, the lower supporting member 28b descends at a speed three times as high as the upper supporting member 28a. The transparent quartz glass materials 14a, 14a and the opaque quartz glass material 12a that have been melted and welded to each other are lowered while being stretched.
[0045]
In this state, the lower end of the quartz glass plate-mounted laminate 10A is lowered to the position of the gas burner means 46, 46, and all of the quartz glass plate-mounted laminate 10A is melted, and the transparent quartz glass material is melted. All of 14a, 14a and the opaque quartz glass material 12a are welded to each other and stretched to form a fused and fused quartz glass laminate 10B (the state shown in FIGS. 7B and 8B).
[0046]
At this time, the gas burner means 46, 46 are stopped, and the lowering of the upper and lower support members 28a, 28b is stopped. The size of the fused and stretched opaque quartz glass material 12a in the fused and stretched fused quartz glass laminate 10B (that is, the multilayered fused quartz glass plate 10) obtained in this experiment has a width of 400 mm, which is the same as before the fusion stretching, but has a length of The thickness was 900 mm, three times that before welding and stretching, and the thickness was 2 mm, one third that before welding and stretching.
[0047]
Also, the size of the fused transparent quartz glass material 14a is 400 mm in width and the same as that before welding and stretching, the length is 900 mm, which is three times that before welding and stretching, and the thickness is 1/3 of that before welding and stretching. It was 1 mm. That is, the size of the whole fused and stretched fused quartz glass plate 10B was 400 mm (width) × 900 mm (length) × 4 mm (thickness). A disc of a predetermined size was cut out from the fused and stretched fused quartz glass plate 10B, and the opaque glass layer exposed on the side was covered with a transparent glass layer by welding with a welding rod to produce a quartz glass jig.
[0048]
When this quartz glass jig was used as a heat shielding plate in a semiconductor heat treatment apparatus, no generation of particles was observed, and it was confirmed that an extremely excellent heat shielding effect was exhibited.
[0049]
(Example 2)
300 mm (width) x 300 mm (length) x 3 mm (thickness) transparent quartz glass materials 14a, 14a are overlaid on both front and back surfaces of a disc-shaped opaque quartz glass material 12a of 300 mm (diameter) x 6 mm (thickness). A quartz glass plate welded stretched laminate 10B [FIG. 9 (b)] was formed in the same manner as in Example 1 except that a quartz glass plate mounting laminate 10A (the state shown in FIG. 9 (a)) having a sandwich structure was formed. State] was created. As shown in FIG. 9 (b), the disc-shaped opaque quartz glass material 12a is elongated in the longitudinal direction to have an elliptical shape. It could be manufactured in the same manner as in Example 1.
[0050]
【The invention's effect】
As described above, according to the apparatus of the present invention, it is possible to manufacture a multilayer quartz glass plate having an excellent structure in which different or similar quartz glass materials are sufficiently welded to each other at a simple structure and at low cost. .
[0051]
According to the method of the present invention, it is possible to manufacture a multilayer quartz glass plate having an excellent structure, in which different or similar quartz glass materials are sufficiently welded to each other, by freely changing the plate thickness and the degree of stretching. .
[Brief description of the drawings]
FIG. 1 is a perspective explanatory view schematically showing an example of the structure of an apparatus for manufacturing a multilayer quartz glass plate of the present invention.
FIG. 2 is a schematic perspective explanatory view showing a mode of use of the apparatus of the present invention and showing a state in which a quartz glass plate-mounted laminate is supported by an upper support member and a lower support member at the start of production.
FIG. 3 shows a mode of use of the apparatus of the present invention, in which the lower side of a fused quartz glass sheet laminated body which is sequentially melt-formed in the course of manufacturing is extended downward by increasing the lowering speed of a lower support member. It is a schematic perspective explanatory view showing a state.
FIG. 4 shows a mode of use of the apparatus of the present invention, in which, at the end of production, all of the fused quartz glass laminate is stretched downward by a lower support member, that is, the fused fused quartz glass laminate, that is, the multilayer of the present invention. It is a schematic perspective explanatory view which shows the state which manufactured the quartz glass plate.
FIG. 5 is an explanatory view schematically showing a procedure for manufacturing a multilayer quartz glass plate together with a change in the shape of a quartz glass material.
FIG. 6 is a flowchart showing an example of a process chart of a method for manufacturing a multilayer quartz glass plate of the present invention.
FIG. 7 is an explanatory plan view schematically showing an example in which (a) a fused silica glass plate-mounted laminate is welded and stretched by the method of the present invention to form (b) a fused silica glass plate-welded stretched laminate. .
FIG. 8 is an explanatory sectional view of FIG. 7;
FIG. 9 is a plan explanatory view schematically showing another example in which (a) a fused quartz glass plate-mounted laminate is welded and stretched by the method of the present invention to form (b) a fused fused glass plate-stretched laminate. is there.
FIG. 10 is an enlarged cross-sectional view showing one example of the structure of the multilayer quartz glass plate alone.
FIG. 11 is a schematic explanatory view showing an example of a method of forming a side transparent quartz glass layer of a multilayer quartz glass plate.
FIG. 12 is a schematic explanatory view showing another example of a method for forming a transparent quartz glass layer on the side surface of a multilayer quartz glass plate.
FIG. 13 is a schematic explanatory view showing another example of a method for forming a side transparent quartz glass layer of a multilayer quartz glass plate.
[Explanation of symbols]
10: multilayer quartz glass plate, 10A: laminated quartz glass plate, 10a: multilayer quartz glass plate alone, 10B: fused fused glass laminate, 12: opaque quartz glass layer, 12a: opaque quartz glass material, 12b : Side portion, 12c: receding side portion, 12d: slope side portion, 14B: side transparent quartz glass layer, 14b: extended edge, 14: transparent quartz glass layer, 14a: transparent quartz glass material, 20: multilayer quartz Glass plate manufacturing apparatus, 22: base, 24: block body, 24a: upper block body, 24b: lower block body, 26a: upper guide rail, 26b: lower guide rail, 28a: upper support member, 28b: lower support Member, 30a: upper main plate, 30b: lower main plate, 32a: upper support arm, 32b: lower support arm, 34: lower support bar, 36: guide , 38a, 38b: guide hole, 40a, 40b: guide tip, 42: support, 44: burner moving table, 46: gas burner means, 50a, 50b: quartz glass support plate, B: gas burner, D: welding Rod, K: side space, R: laser processing means.

Claims (15)

異種又は同種の複数枚の石英ガラス板を重ね合わせることによって形成される石英ガラス板載置積層体の上端縁部を支持する上部支持部材と、前記石英ガラス板載置積層体の下端縁部を支持する下部支持部材と、前記石英ガラス板載置積層体の両面を加熱することができるように設けられた相対向する一対のガスバーナー手段とからなり、前記ガスバーナー手段間を通過する前記石英ガラス板載置積層体をガスバーナー火炎によって加熱溶着し石英ガラス板溶着積層体を形成するようにしたことを特徴とする多層石英ガラス板の製造装置。An upper support member that supports an upper edge of a quartz glass plate mounting laminate formed by stacking a plurality of different or similar quartz glass plates, and a lower edge of the quartz glass plate mounting laminate. A lower supporting member for supporting, and a pair of opposed gas burner means provided so as to be able to heat both surfaces of the quartz glass plate-mounted laminate, wherein the quartz passing between the gas burner means; An apparatus for manufacturing a multilayer quartz glass plate, wherein a glass plate mounted laminate is heated and welded by a gas burner flame to form a fused quartz glass plate welded laminate. 前記ガスバーナー手段を水平方向に往復移動可能に設け、前記石英ガラス板載置積層体が該ガスバーナー手段間を通過する際に該ガスバーナー手段を水平方向に往復移動させることによって該ガスバーナー手段による加熱が該複数枚の石英ガラス板に対して均一に行われるようにしたこと特徴とする請求項1記載の多層石英ガラス板の製造装置。The gas burner means is provided so as to be capable of reciprocating in the horizontal direction, and the gas burner means is reciprocated in the horizontal direction when the quartz glass plate-mounted laminate passes between the gas burner means. 2. The apparatus for manufacturing a multilayer quartz glass plate according to claim 1, wherein the heating is performed uniformly on the plurality of quartz glass plates. 前記上部支持部材及び下部支持部材をそれぞれ上下動可能に設けたことを特徴とする請求項1又は2記載の多層石英ガラス板の製造装置。3. The apparatus for manufacturing a multilayer quartz glass plate according to claim 1, wherein the upper support member and the lower support member are provided so as to be vertically movable. 前記下部支持部材の降下速度を前記上部支持部材の降下速度よりも大なる速度とすることによって、前記石英ガラス板溶着積層体を下方に延伸し石英ガラス板溶着延伸積層体を形成するようにしたことを特徴とする請求項3記載の多層石英ガラス板の製造装置。By making the descending speed of the lower support member higher than the descending speed of the upper support member, the quartz glass plate welded laminate is stretched downward to form a quartz glass plate welded stretched laminate. The apparatus for manufacturing a multilayer quartz glass plate according to claim 3, wherein: 前記上部支持部材の降下速度に対する前記下部支持部材の降下速度の比率を1.5〜10倍としたことを特徴とする請求項4記載の多層石英ガラス板の製造装置。The apparatus for manufacturing a multilayer quartz glass plate according to claim 4, wherein a ratio of a lowering speed of the lower supporting member to a lowering speed of the upper supporting member is 1.5 to 10 times. 異種又は同種の石英ガラス板と異種又は同種の非石英ガラス材料からなる板状体とを重ね合わせることによって形成される石英ガラス板載置積層体の上端縁部を支持する上部支持部材と、前記石英ガラス板載置積層体の下端縁部を支持する下部支持部材と、前記石英ガラス板載置積層体の両面を加熱することができるように設けられた相対向する一対のガスバーナー手段とからなり、前記ガスバーナー手段間を通過する前記石英ガラス板載置積層体をガスバーナー火炎によって加熱溶着し石英ガラス板溶着積層体を形成するようにしたことを特徴とする多層石英ガラス板の製造装置。An upper support member that supports an upper edge of a quartz glass plate-mounted laminate formed by laminating a different or similar quartz glass plate and a plate of a different or similar non-quartz glass material, A lower support member that supports a lower edge portion of the quartz glass plate mounting laminate, and a pair of opposed gas burners provided so as to be able to heat both surfaces of the quartz glass plate mounting laminate. Wherein the quartz glass plate mounted laminate passing between the gas burner means is heated and welded by a gas burner flame to form a fused quartz glass plate laminate. . 前記ガスバーナー手段を水平方向に往復移動可能に設け、前記石英ガラス板載置積層体が該ガスバーナー手段間を通過する際に該ガスバーナー手段を水平方向に往復移動させることによって該ガスバーナー手段による加熱が該複数枚の石英ガラス板に対して均一に行われるようにしたこと特徴とする請求項6記載の多層石英ガラス板の製造装置。The gas burner means is provided so as to be capable of reciprocating in the horizontal direction, and the gas burner means is reciprocated in the horizontal direction when the quartz glass plate-mounted laminate passes between the gas burner means. 7. The apparatus for manufacturing a multilayer quartz glass plate according to claim 6, wherein the heating is performed uniformly on the plurality of quartz glass plates. 前記上部支持部材及び下部支持部材をそれぞれ上下動可能に設けたことを特徴とする請求項6又は7記載の多層石英ガラス板の製造装置。8. The apparatus for manufacturing a multilayer quartz glass plate according to claim 6, wherein the upper support member and the lower support member are respectively provided so as to be vertically movable. 異種又は同種の複数枚の石英ガラス板を重ね合わせることによって石英ガラス板載置積層体を形成する工程と、該石英ガラス板載置積層体をガスバーナー火炎によって順次加熱し該石英ガラス板載置積層体の石英ガラス板同士を順次溶着させ石英ガラス板溶着積層体を形成する工程とからなることを特徴とする多層石英ガラス板の製造方法。A step of forming a quartz glass plate mounting laminate by laminating a plurality of different or similar quartz glass plates, and sequentially heating the quartz glass plate mounting laminate by a gas burner flame to place the quartz glass plate Forming a fused quartz glass plate welded laminate by sequentially fusing the quartz glass plates of the laminate to each other. 前記石英ガラス板溶着積層体を順次溶着形成するとともに該石英ガラス板溶着積層体を順次延伸し石英ガラス板溶着延伸積層体を形成するようにしたことを特徴とする請求項9記載の多層石英ガラス板の製造方法。The multilayer quartz glass according to claim 9, wherein the fused quartz glass sheet laminate is sequentially formed by welding, and the fused quartz glass sheet welded laminate is sequentially stretched to form a fused fused quartz glass sheet stretched laminate. Board manufacturing method. 前記石英ガラス板載置積層体の上端縁部及び下端縁部をそれぞれ上下動可能な上部支持部材及び下部支持部材に支持せしめ、該上端縁部及び下端縁部を支持された石英ガラス板載置積層体を下方に移動させつつガスバーナー火炎によって下部から上部へ順次加熱し該石英ガラス板載置積層体の石英ガラス板同士を順次溶着させ石英ガラス板溶着積層体を形成するようにしたことを特徴とする請求項9又は10記載の多層石英ガラス板の製造方法。The upper end edge and the lower end edge of the quartz glass plate mounting laminate are respectively supported by an upper support member and a lower support member that can be moved up and down, and the upper end edge portion and the lower end edge portion are supported. While moving the laminate downward, the gas burner flame sequentially heats from the lower part to the upper part, and the quartz glass plates of the quartz glass plate mounted laminate are sequentially welded to form a fused quartz glass plate laminated body. The method for producing a multilayer quartz glass plate according to claim 9 or 10, wherein: 前記上部支持部材の降下速度に対する前記下部支持部材の降下速度の比率を1〜10倍としたことを特徴とする請求項11記載の多層石英ガラス板の製造方法。The method according to claim 11, wherein a ratio of a lowering speed of the lower supporting member to a lowering speed of the upper supporting member is 1 to 10 times. 前記下部支持部材の降下速度を前記上部支持部材の降下速度よりも大なる速度とすることによって、前記石英ガラス板溶着積層体を下方に延伸し石英ガラス板溶着延伸積層体を形成するようにしたことを特徴とする請求項12記載の多層石英ガラス板の製造方法。By making the descending speed of the lower support member higher than the descending speed of the upper support member, the quartz glass plate welded laminate is stretched downward to form a quartz glass plate welded stretched laminate. The method for producing a multilayer quartz glass plate according to claim 12, wherein: 異種又は同種の石英ガラス板と異種又は同種の非石英ガラス材料からなる板状体とを重ね合わせることによって石英ガラス板載置積層体を形成する工程と、該石英ガラス板載置積層体をガスバーナー火炎によって順次加熱し該石英ガラス板載置積層体を構成する石英ガラス板と非石英ガラス材料からなる板状体とを順次溶着させ石英ガラス板溶着積層体を形成する工程とからなることを特徴とする多層石英ガラス板の製造方法。A step of forming a quartz glass plate-mounted laminate by laminating a different kind or the same kind of quartz glass plate and a plate-like body made of a different kind or the same kind of non-quartz glass material; Forming a quartz glass plate welded laminate by sequentially heating a quartz glass plate and a plate made of a non-quartz glass material by sequentially heating with a burner flame to form the quartz glass plate mounting laminate. A method for producing a multilayer quartz glass plate, which is a feature. 前記異種又は同種の石英ガラス板が、透明石英ガラス材料、不透明石英ガラス材料、天然石英ガラス材料及び合成石英ガラス材料からなる群から選択された1種又は2種以上の材料からなることを特徴とする請求項9〜14のいずれか1項記載の多層石英ガラス板の製造方法。The different type or the same type of quartz glass plate is made of one or more materials selected from the group consisting of a transparent quartz glass material, an opaque quartz glass material, a natural quartz glass material, and a synthetic quartz glass material. The method for producing a multilayer quartz glass plate according to any one of claims 9 to 14.
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