JP2004062045A5 - - Google Patents
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- Publication number
- JP2004062045A5 JP2004062045A5 JP2002223234A JP2002223234A JP2004062045A5 JP 2004062045 A5 JP2004062045 A5 JP 2004062045A5 JP 2002223234 A JP2002223234 A JP 2002223234A JP 2002223234 A JP2002223234 A JP 2002223234A JP 2004062045 A5 JP2004062045 A5 JP 2004062045A5
- Authority
- JP
- Japan
- Prior art keywords
- resin
- group
- hydrogen atom
- resist composition
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011347 resin Substances 0.000 claims 10
- 229920005989 resin Polymers 0.000 claims 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 9
- 239000002253 acid Substances 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 5
- 150000001875 compounds Chemical class 0.000 claims 5
- 229910052731 fluorine Inorganic materials 0.000 claims 4
- 125000001153 fluoro group Chemical group F* 0.000 claims 4
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims 4
- 230000005855 radiation Effects 0.000 claims 4
- -1 vinyl ether compound Chemical class 0.000 claims 4
- 150000002148 esters Chemical class 0.000 claims 2
- 239000000178 monomer Substances 0.000 claims 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 1
- 125000002723 alicyclic group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 125000001309 chloro group Chemical group Cl* 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000012046 mixed solvent Substances 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 239000007870 radical polymerization initiator Substances 0.000 claims 1
- 238000010526 radical polymerization reaction Methods 0.000 claims 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002223234A JP4178007B2 (ja) | 2002-07-31 | 2002-07-31 | ポジ型レジスト組成物 |
| US10/422,789 US7198880B2 (en) | 2002-04-26 | 2003-04-25 | Positive resist composition |
| KR1020030026279A KR100955006B1 (ko) | 2002-04-26 | 2003-04-25 | 포지티브 레지스트 조성물 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002223234A JP4178007B2 (ja) | 2002-07-31 | 2002-07-31 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004062045A JP2004062045A (ja) | 2004-02-26 |
| JP2004062045A5 true JP2004062045A5 (enrdf_load_stackoverflow) | 2005-09-22 |
| JP4178007B2 JP4178007B2 (ja) | 2008-11-12 |
Family
ID=31943045
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002223234A Expired - Fee Related JP4178007B2 (ja) | 2002-04-26 | 2002-07-31 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4178007B2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7537879B2 (en) * | 2004-11-22 | 2009-05-26 | Az Electronic Materials Usa Corp. | Photoresist composition for deep UV and process thereof |
| KR20150101074A (ko) * | 2014-02-26 | 2015-09-03 | 삼성전자주식회사 | 포토레지스트 조성물, 이를 이용한 패턴 형성 방법 및 반도체 소자의 제조 방법 |
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2002
- 2002-07-31 JP JP2002223234A patent/JP4178007B2/ja not_active Expired - Fee Related