JP2004045200A - Inspection device and inspection method for inspecting appearance of inspection object - Google Patents

Inspection device and inspection method for inspecting appearance of inspection object Download PDF

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JP2004045200A
JP2004045200A JP2002202761A JP2002202761A JP2004045200A JP 2004045200 A JP2004045200 A JP 2004045200A JP 2002202761 A JP2002202761 A JP 2002202761A JP 2002202761 A JP2002202761 A JP 2002202761A JP 2004045200 A JP2004045200 A JP 2004045200A
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inspection
product
angle
inspected
imaging unit
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JP2002202761A
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JP3931121B2 (en
Inventor
Takashi Nagayama
長山 孝
Yasuyuki Omasa
大政 穏之
Noriyuki Kojima
小島 範幸
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Toray Engineering Co Ltd
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Toray Engineering Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To inspect an appearance of an inspection object, for example, a semiconductor chip, a substrate with a pattern or a film with a pattern, to classify a defective from a non-defective. <P>SOLUTION: In this device/method, an image picking-up means A for measuring an angle and a position of the inspection object, and an image picking-up means B having at least an angle control means and for inspecting the appearance are provided with a prescribed space along a conveyer for mounting the inspected object to be conveyed unidirectionally in order, and the image picking-up means B is controlled, based on positional information of the inspected object acquired by the image picking-up means A. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、被検査品、例えば、半導体チップ、又はパターン付き基板、或いはパターン付きフィルムの外観検査を行い、良品と不良品とに分別する外観検査装置及び外観検査方法に関するものである。
【0002】
【従来の技術】
半導体チップの製造工程では、パターンを形成した半導体ウエハをダイシングして個々の半導体チップに分割している。しかるに、このダイシング処理工程においては、半導体チップに割れや欠けが生じたり、チップ表面に汚れや傷が生じる場合がある。
【0003】
かかる欠陥半導体チップは良品半導体チップから分別し、排除する必要があり、従来、図6に示すような外観検査装置が用いられていた。即ち、トレイ3dに収納された半導体チップ2を上方からコレット40で真空吸着して、XYθステージ41の上に設けられた検査ステージ42に移動させ、検査ステージ42で真空吸着により半導体チップ2を固定した後、その上方に設けられた顕微鏡付きカメラ43で半導体チップ2の位置と角度を測定し、その測定データに基づき検査ステージ41を移動回転させ位置補正を行った後、再度、顕微鏡付きカメラ43で画像入力し、入力された画像を画像処理部(図示せず)において検査処理を行っていた。
【0004】
【発明が解決しようとする課題】
画像処理を用いた検査は、画像処理部にあらかじめ保存された被検査品の良品画像と検査対象である被検査品の画像を比較する方法が一般的である。高精度で画像処理検査を行う為には濃淡画像レベルでの画像比較が必要であるのに加え、更に画像処理部に保存した良品画像に対する被検査品画像の角度と位置が撮像系の分解能以下となるよう厳密に合わせ込むことが好ましい。
【0005】
上述の従来の検査装置においては、検査前・再検査品チップ兼用トレイ3dに収納された半導体チップをピックアップ機構であるコレット40で半導体チップを一個ずつ検査位置まで移動させ、その位置で半導体チップの角度と位置を測定し、その各々の測定値により所定の位置にくる様、位置補正を行った後、検査を実施し、検査結果に基づいてコレット40で良品トレイ3cまたは検査前チップトレイ兼再検査チップ収納トレイ3dに収納していた。この場合、被検査品の移動、角度と位置の測定、角度と位置の補正、検査、検査品の移動が同時に実施できず、シリーズに実施されるため、検査に長い時間を要するという問題がある。別の方法として、角度と位置を測定し、取り込んだ被検査品の画像を画像処理装置内部で所定の位置にくる様、回転および位置処理の変換を実施し、その各々の所定値とのズレ量を補正することも考えられるが、画像を回転させることにより画像情報の精度が落ちると共に、画像情報量そのものが減少し、検査のために取り込む画像の枚数が多くなるという問題が生じる。また、被検査品の検査に複数の画像を要する場合においては前記の画像の回転および位置移動処理を複数の画像に対して実施する必要があり、検査の精度が落ちると共に長い時間を要するという問題がある。
【0006】
そこで、本発明の目的は、被検査品、例えば、半導体チップ、又はパターン付き基板、或いはパターン付きフィルムの外観検査を精度良く且つ短時間に実行し得る外観検査装置及び外観検査方法を提供することにある。
【0007】
【課題を解決するための手段】
請求項1に記載の本発明の被検査品の外観検査装置は、被検査品を載置して一方向に順送りされる搬送装置に沿って、前記被検査品の少なくとも角度を測定する撮像手段Aと、少なくとも角度制御機能を有し外観検査を行う撮像手段Bとを所定の間隔を開けて設け、撮像手段Aからの角度情報を基に撮像手段Bの角度を制御せしめることを特徴とするものである。このように、撮像手段を2台配置し、先ず、撮像手段Aで角度を測定し、その角度情報に基づき事前に検査位置を制御し調整した後段の撮像手段Bで外観検査を行えば、検査精度を落とすことなく、被検査品1個当たりの検査のタクトタイムを大幅に短縮し得る。
【0008】
また、請求項2に記載の本発明の被検査品の外観検査装置は、前記撮像手段Aが角度、及び位置(XY方向位置)を測定する機能を有することを特徴とする。このように構成すれば、請求項1に記載の発明に比し、検査精度を更に高めることができる。
【0009】
また、請求項3に記載の本発明の被検査品の外観検査装置は、被検査品を載置して一方向に順送りされる搬送装置に沿って、被検査品を前記搬送装置に載置せしめる被検査品移載機構と、前記被検査品の角度及び/又は位置(XY方向位置)を測定する撮像手段Aと、角度及び/又は位置(XY方向位置)制御機能を有する撮像手段Bと、検査品を取得せしめる検査品取込機構とをそれぞれ所定の間隔を開けて設けたことを特徴とするものである。このように、被検査品移載機構及び検査品取込機構を設ければ、被検査品の外観検査を効率的に行うことができる。
【0010】
さらに、請求項4に記載の本発明の被検査品の外観検査装置は、請求項1乃至3の何れかに記載の被検査品の外観検査装置において、前記被検査品が半導体チップ、又はパターン付き基板であることを特徴とするものである。
【0011】
さらに、請求項5に記載の被検査品の外観検査装置は、被検査品をテープ送りする搬送路に沿って、前記被検査品の少なくとも角度を測定する撮像手段Aと、少なくとも角度制御機能を有し外観検査を行う撮像手段Bとを所定の間隔を開けて設け、撮像手段Aからの情報を基に撮像手段Bの角度を制御せしめることを特徴とするものである。被検査品がフィルム上の配線パターンの場合に有効である。
さらに、請求項6に記載の本発明の被検査品の外観検査方法は、請求項3に記載の外観検査装置を用いる検査方法において、前記撮像手段Aから取得した被検査品の角度及び/又は位置情報を基に、被検査品移載機構による前記搬送装置への載置角度及び/又は載置位置補正と、検査品取込機構による前記搬送装置からの取得角度及び/又は位置補正とをそれぞれ行うことを特徴とするものである。このように、撮像手段Aからの情報を基に被検査品の搬送装置への載置角度及び/又は載置位置補正を行うと共に、検査品取込機構による搬送装置からの取得角度及び/又は位置補正を行えば、移載、載置、角度・位置測定、検査、取込、収納の動作を同時且つ正確に実行できることにより、被検査品のタクトタイムを飛躍的に短縮することができる。さらに、載置および、または取込位置を制御することにより、良品チップトレイ、再検査品チップトレイ等への検査済み被検査品の収納が正確に実施され、収納トラブルの発生が抑えられる。
【0012】
さらに、請求項7に記載の発明は、請求項1乃至4の何れかに記載の外観検査装置を用いて生産された製品である。
【0013】
【発明の実施の形態】
以下、図1及び図2に基づいて、半導体チップを被検査品とした本発明の実施の形態について説明する。
【0014】
1は複数個の半導体チップ2を収納したトレイ3aを所定の位置に供給する被検査品供給機構である。4はトレイ3aに収納されている半導体チップ2を1個ずつ搬送装置5の載置位置に移載する被検査品移載機構である。これら被検査品供給機構1及び被検査品移載機構4は搬送装置5の上流側に配置されている。搬送装置5は半導体チップ2を吸着した状態で一方向へ定ピッチで移動可能であり、その搬送路下流側には、所定の間隔を開けて補正ステーション6と検査ステーション7が配置されている。そして、補正ステーション6には半導体チップ2の角度及び位置を測定する撮像手段Aである顕微鏡付きカメラ8が、また、検査ステーション7には少なくと角度制御機能(以後、θ機能という。)を有する撮像手段Bである顕微鏡付きカメラ9が角度ステージ上のXYZステージ上にそれぞれ設けられている。なお、θ機能とは搬送装置5の搬送面に対し垂直軸線の周りに回転自在で制御可能な機能を意味する。さらに、撮像手段Bは、搬送面と平行な面上で直行する2方向に移動自在で制御可能な機能(以後、XY機能と言う。)を有することが、該被検査品である半導体チップ2の被検査領域の大きさが顕微鏡付きカメラ8の1視野内に所定の余裕を持って収まらない場合に必要であり、XY機能の中心位置に顕微鏡付きカメラ9を設けることが、機械構成を小さくするために好ましい。さらにまた、搬送面に対し垂直軸方向に移動自在で制御可能な機能(以後、Z機能と言う。)を持たせ、Z機能の中心位置に顕微鏡付きカメラ9を設けることが、該被検査品である半導体チップ2の品種により半導体チップ2の厚みが変わる場合および搬送装置5の搬送位置による顕微鏡付きカメラ9との距離の変動を吸収し、カメラの焦点合わせをする上で好ましい。
顕微鏡付きカメラ9にθ機能とXYZ機能(XYZステージ)とを持たせる場合、θ機能(角度ステージ)の上にXYZ機能を配置する方が、角度を合わせた後、XY方向の位置制御から角度の影響を排除できる為、制御が簡単になるので好ましい。
同様に、撮像手段AにもXYZ機能を持たせる必要があり、顕微鏡付きカメラ8を撮像手段AのXYZ機能の中心に配置した方が好ましい。
10は検査品取込機構であり、顕微鏡付きカメラ9で検査した検査品を検査品収納機構11に移し替えるものである。本実施例においては、検査結果により良品と不良品をふくむ再検査品とに分別収納するため、検査品収納機構が2系列、即ち、良品チップトレイ収納機構11aと再検査品チップトレイ収納機構11bが設けられている。検査結果が良品、要再検査品および不良品の3つになる場合は各々に対応する検査品収納機構を別個に設けても良い。
【0015】
次に、かかる被検査品の外観検査装置を用いて、半導体チップを検査する方法を説明する。
【0016】
検査対象である半導体チップ2をトレイ3aから被検査品移載機構4により、移動可能な搬送装置5の上流側載置位置2aに移載する。搬送装置5に移載された半導体チップ2は搬送装置5上で吸着により固定され、定ピッチp単位で移動される。搬送装置5が定ピッチpのi倍(iは整数)移動した箇所の上方に設置された補正ステーション6には撮像手段Aの顕微鏡付きカメラ8が設けられており、半導体チップ2が撮像手段Aの直下に搬送され、静止した時に該半導体チップ2の角度及び位置が測定される。撮像手段Aの直下とは、該被検査品である半導体チップ2の大きさが顕微鏡付きカメラ8の1視野内に所定の余裕を持って収まる場合は、該半導体チップ2の中心が、顕微鏡付きカメラ8の視野の中心となる「ハズ」の位置であることが好ましい。
なお、搬送装置5が定ピッチp分移動する毎に被検査品移載機構4は次の検査対象である半導体チップ2を搬送装置5の上流側載置位置に供給している。
そして、補正ステーション6を通過した搬送装置5上の全ての半導体チップ2は、顕微鏡付きカメラ8で測定した角度・位置情報が個々に装置内メモリに保存される。半導体チップ2の角度及び位置が測定された後、搬送装置5は定ピッチpのj倍(jは整数)下流側に移動する。このj×pピッチ分移動した箇所の上方には外観検査を行う撮像手段Bである顕微鏡付きカメラ9が設けられた検査ステーション7が設置されており、この検査ステーション7では、半導体チップ2の保存された角度・位置情報に基づき、検査対象半導体チップ2が1ピッチ分上流の待機位置から検査ステーション7の検査位置までの移動中に顕微鏡付きカメラ9を少なくともθ機能、望ましくは、θ・XYZ機能により自動的に外観検査位置に移動し、待機している。顕微鏡付きカメラ9は搬送装置5が静止した時点で半導体チップ2の画像を取り込み、検査を開始する。半導体チップ2の被検査領域が顕微鏡付きカメラ9の視野領域を上回る場合は、少なくともθ・XY機能を具備した顕微鏡付きカメラ9とする事により、半導体チップ2を複数の検査視野に分割して検査する事ができるのは勿論である。
次に、外観検査が終了した最初の半導体チップ2は更に定ピッチpのk倍(kは整数)下流側に搬送され、取込位置2bで静止した後、検査品取込機構10で検査品収納機構11に移される。
【0017】
つまり、M番目の半導体チップ2の外観検査が顕微鏡付きカメラ9で行われている時、(M+j)番目の半導体チップが補正ステーション6に配置された顕微鏡付きカメラ8で角度及び位置が測定されており、(M−k)番目の半導体チップが検査品取込機構10で検査品収納機構11に移されており、(M+i+j)番目の半導体チップが被検査品移載機構4により載置位置に移載されることになる。
【0018】
そして、半導体チップが載置位置2a、補正ステーション6、検査ステーション7、取込位置2bと移動している移動時間に、補正ステーション6の顕微鏡付きカメラ8で測定された角度と位置情報は、各々のステーション機構に伝達され、その都度、被検査品移載機構4による搬送装置5の上流側への載置角度及び/又は載置位置2a、検査ステーション7における顕微鏡付きカメラ9の検査角度及び/又は検査位置、検査品取込機構10による搬送装置5の下流側からの取込角度及び/取込位置2bは補正されることになる。
このようにして、搬送装置5が半導体チップ2を定ピッチp単位で継続して下流側に移動させる事により、同一タイミングでの半導体チップの移載、載置、角度及び位置測定、検査、取込、収納が可能になり、順送りで連続的且つ効率的に検査を行うことが可能となる。
【0019】
これまで、被検査品が半導体チップの場合について説明してきたが、パターン付き基板の場合にも同様に実施できることは申すまでもない。
図3、4は本発明の被検査品の外観検査装置の他の実施態様を示す平面図と側面図であり、被検査品をフィルム上の配線パターンとしたものである。
この場合、被検査品供給機構1は送出機20に、検査品取込機構10は巻取機23に相当する。この場合のテープ送り量定ピッチpはフィルム上の単位パターンの巻取り方向の繰り返しピッチとなり、補正ステーション6と検査ステーション7間のテープ送り方向の距離はテープ送り量定ピッチpのj倍(jは整数。)、および、検査ステーション7とNGパンチャー22間のテープ送り方向の距離は、テープ送り量定ピッチpのk倍(kは整数。)となる。また、不良品についてはNGパンチャー20にて打ち抜くものとなっている。他の機構は図1及び図2に示した実施態様と同一であるので、説明は省略する。
【0020】
図5は本発明の被検査品の外観検査装置の他の実施態様を示す平面図であり、図1及び図2の搬送装置5をロータリー式の回転テーブル31にしたものである。この実施態様では、補正ステーション6の上流側に、粗位置決め機構30を設けているが、他の機構は図1及び図2に示した実施態様と同一であるので、説明は省略する。
【0021】
【発明の効果】
従来は同一の箇所で移載、載置、角度・位置の測定、検査、取込、収納の動作をシリーズに実行し、検査に長時間を要したが、本発明の被検査品の外観検査装置及び外観検査方法によれば、移載、載置、角度・位置測定、検査、取込、収納の動作を同時に実行できることにより、被検査品1個の検査時間であるタクトタイムを飛躍的に短縮することができるとともに高精度の外観検査が可能になる。さらに、被検査品が半導体チップ又はパターン付き基板の場合には、載置および、または取込位置を制御することにより、良品チップトレイ、再検査品チップトレイ等への検査済み被検査品の収納が正確に実施され、収納トラブルの発生が抑えられる。
【図面の簡単な説明】
【図1】本発明の被検査品の外観検査装置の概要を示す平面図である。
【図2】図1に示した本発明の被検査品の外観検査装置の側面図である。
【図3】本発明の被検査品の外観検査装置の他の実施態様を示す平面図である。
【図4】図3に示した他の実施態様を示す側面図である。
【図5】本発明の被検査品の外観検査装置の他の実施態様を示す平面図である。
【図6】従来の半導体チップの外観検査装置の一例を示す構想図である。
【符号の説明】
1  被検査品供給機構
2  半導体チップ
2a 載置位置
2b 取込位置
3 チップトレイ
3a  検査前チップトレイ
3b  再検査品チップトレイ
3c  良品チップトレイ
3d  検査前・再検査品チップ兼用トレイ
4 チップトレイ供給機構
5 搬送装置
6 補正ステーション
7 検査ステーション
8 顕微鏡付きカメラ
9 顕微鏡付きカメラ
10 検査品取込機構
11 チップトレイ収納機構
11a  良品チップトレイ収納機構
11b 再検査品チップトレイ収納機構
20  送出機
21  プリントフィルム
22  NGパンチャー
23  巻取機
30  粗位置決め機構
31  回転テーブル
40  コレット
41  XYθステージ
42  検査ステージ
43  顕微鏡付きカメラ
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a visual inspection apparatus and a visual inspection method for performing a visual inspection of a product to be inspected, for example, a semiconductor chip, a substrate with a pattern, or a film with a pattern, and separating the inspected product into non-defective products and defective products.
[0002]
[Prior art]
In a semiconductor chip manufacturing process, a semiconductor wafer on which a pattern is formed is diced and divided into individual semiconductor chips. However, in the dicing process, the semiconductor chip may be cracked or chipped, or the chip surface may be stained or damaged.
[0003]
Such defective semiconductor chips need to be separated from non-defective semiconductor chips and eliminated, and a visual inspection apparatus as shown in FIG. 6 has been used conventionally. That is, the semiconductor chip 2 accommodated in the tray 3d is vacuum-adsorbed from above by the collet 40, moved to the inspection stage 42 provided on the XYθ stage 41, and the semiconductor chip 2 is fixed by the vacuum suction at the inspection stage 42. After that, the position and angle of the semiconductor chip 2 are measured by the camera 43 with a microscope provided thereabove, and the inspection stage 41 is moved and rotated based on the measurement data to correct the position. And an image processing unit (not shown) performs an inspection process on the input image.
[0004]
[Problems to be solved by the invention]
Inspection using image processing is generally performed by comparing a non-defective product image of the product to be inspected stored in the image processing unit in advance with an image of the product to be inspected. In order to perform image processing inspection with high accuracy, it is necessary to compare images at the grayscale image level. In addition, the angle and position of the inspected product image with respect to the non-defective image stored in the image processing unit are less than the resolution of the imaging system It is preferable to strictly match them so that
[0005]
In the above-described conventional inspection apparatus, the semiconductor chips housed in the tray 3d for both pre-inspection and re-inspection product chips are moved one by one to the inspection position by the collet 40, which is a pickup mechanism, and the semiconductor chips are removed at that position. The angle and the position are measured, the position is corrected so as to come to a predetermined position based on the respective measured values, an inspection is performed, and based on the inspection result, the collet 40 re-uses the non-defective tray 3c or the chip tray before the inspection. It was stored in the inspection chip storage tray 3d. In this case, the movement of the inspection object, the measurement of the angle and the position, the correction of the angle and the position, the inspection, and the movement of the inspection object cannot be performed at the same time. . As another method, the angle and the position are measured, the rotation and the position processing are converted so that the captured image of the inspected product comes to a predetermined position inside the image processing apparatus, and the deviation from each of the predetermined values is performed. Although it is conceivable to correct the amount, rotating the image reduces the accuracy of the image information, reduces the amount of image information itself, and increases the number of images taken for inspection. Further, when a plurality of images are required for the inspection of the inspected product, it is necessary to perform the above-described image rotation and position movement processing on the plurality of images, which lowers the accuracy of the inspection and requires a long time. There is.
[0006]
Therefore, an object of the present invention is to provide an appearance inspection apparatus and an appearance inspection method capable of executing an appearance inspection of an object to be inspected, for example, a semiconductor chip, a patterned substrate, or a patterned film with high accuracy and in a short time. It is in.
[0007]
[Means for Solving the Problems]
The inspection device according to claim 1, wherein the inspection device is configured to measure at least an angle of the inspection object along a transport device on which the inspection object is placed and forwarded in one direction. A and an imaging unit B having at least an angle control function and performing an appearance inspection are provided at a predetermined interval, and the angle of the imaging unit B is controlled based on angle information from the imaging unit A. Things. As described above, two imaging units are arranged, and first, the angle is measured by the imaging unit A, and the appearance inspection is performed by the imaging unit B at the subsequent stage where the inspection position is controlled and adjusted in advance based on the angle information. The tact time of the inspection per inspection object can be greatly reduced without lowering the accuracy.
[0008]
According to a second aspect of the present invention, there is provided an appearance inspection apparatus for an inspected product, wherein the imaging unit A has a function of measuring an angle and a position (XY direction position). According to this structure, the inspection accuracy can be further improved as compared with the first aspect of the invention.
[0009]
According to a third aspect of the present invention, there is provided an appearance inspection apparatus for an inspected product, wherein the inspected product is placed on the transport device along a transport device on which the inspected product is placed and forwarded in one direction. An inspection object transfer mechanism to be inspected, an imaging unit A for measuring an angle and / or a position (XY direction position) of the inspection object, and an imaging unit B having an angle and / or a position (XY direction position) control function And an inspection product taking-in mechanism for obtaining an inspection product are provided at predetermined intervals. As described above, if the inspection object transfer mechanism and the inspection item take-in mechanism are provided, the appearance inspection of the inspection object can be efficiently performed.
[0010]
Further, according to a fourth aspect of the present invention, there is provided a visual inspection apparatus for an inspected product according to any one of claims 1 to 3, wherein the inspected product is a semiconductor chip or a pattern. Characterized in that it is a substrate with an attachment.
[0011]
The inspection device for inspecting an inspected product according to claim 5 further includes an imaging unit A that measures at least an angle of the inspected product along a transport path that feeds the inspected product by a tape, and at least an angle control function. The image pickup means B for performing a visual inspection is provided at a predetermined interval, and the angle of the image pickup means B is controlled based on information from the image pickup means A. This is effective when the inspected product is a wiring pattern on a film.
Further, according to a sixth aspect of the present invention, in the inspection method using the appearance inspection apparatus according to the third aspect, the angle and / or the angle of the inspection object acquired from the imaging unit A is provided. Based on the position information, the mounting angle and / or mounting position correction on the transport device by the inspected product transfer mechanism and the acquisition angle and / or position correction from the transport device by the inspection product loading mechanism are performed. It is characterized by performing each. As described above, the mounting angle and / or the mounting position of the inspected product on the transport device are corrected based on the information from the imaging unit A, and the angle obtained from the transport device by the inspected product capturing mechanism and / or By performing the position correction, the operations of transfer, placement, angle / position measurement, inspection, capture, and storage can be performed simultaneously and accurately, so that the tact time of the inspected product can be drastically reduced. Furthermore, by controlling the placement and / or take-in position, the inspected inspected product is accurately stored in the non-defective chip tray, the re-tested chip tray, or the like, and the occurrence of storage trouble is suppressed.
[0012]
Furthermore, the invention according to claim 7 is a product produced using the appearance inspection device according to any one of claims 1 to 4.
[0013]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, an embodiment of the present invention in which a semiconductor chip is an inspection object will be described with reference to FIGS.
[0014]
Reference numeral 1 denotes an inspection object supply mechanism for supplying a tray 3a containing a plurality of semiconductor chips 2 to a predetermined position. Reference numeral 4 denotes an inspection object transfer mechanism for transferring the semiconductor chips 2 stored in the tray 3a one by one to the mounting position of the transfer device 5. The inspection object supply mechanism 1 and the inspection object transfer mechanism 4 are arranged upstream of the transport device 5. The transfer device 5 is movable in one direction at a constant pitch while the semiconductor chip 2 is being sucked, and a correction station 6 and an inspection station 7 are arranged at a predetermined interval downstream of the transfer path. The correction station 6 has a camera 8 with a microscope as an imaging means A for measuring the angle and position of the semiconductor chip 2, and the inspection station 7 has at least an angle control function (hereinafter referred to as a θ function). Cameras 9 with microscopes, which are imaging means B, are provided on the XYZ stages on the angle stage, respectively. Note that the θ function means a function that is rotatable and controllable about a vertical axis with respect to the transfer surface of the transfer device 5. Further, the imaging means B has a function (hereinafter, referred to as an XY function) that can be moved and controlled in two directions perpendicular to a plane parallel to the transport surface. This is necessary when the size of the region to be inspected does not fit within one field of view of the camera 8 with a microscope with a predetermined margin, and providing the camera 9 with a microscope at the center position of the XY function reduces the mechanical configuration. Is preferred. Furthermore, the inspection object may be provided with a function (hereinafter, referred to as a Z function) that can be moved and controlled in the direction of a vertical axis with respect to the transport surface, and a camera 9 with a microscope is provided at a center position of the Z function. This is preferable in that the thickness of the semiconductor chip 2 changes depending on the type of the semiconductor chip 2 and the change in the distance from the camera 9 with a microscope due to the transfer position of the transfer device 5 and the camera is focused.
When the camera 9 with a microscope is provided with a θ function and an XYZ function (XYZ stage), it is better to arrange the XYZ function on the θ function (angle stage), after adjusting the angle, from position control in the XY direction to the angle. This is preferable because the control can be simplified because the influence of the above can be eliminated.
Similarly, it is necessary that the imaging means A also have an XYZ function, and it is preferable that the camera 8 with a microscope is arranged at the center of the XYZ function of the imaging means A.
Reference numeral 10 denotes an inspection product taking-in mechanism, which transfers an inspection product inspected by the camera 9 with a microscope to the inspection product storage mechanism 11. In this embodiment, the inspection product storage mechanism is divided into two groups, that is, a non-defective product chip tray storage mechanism 11a and a re-test product chip tray storage mechanism 11b in order to separate and store the non-defective product and the retest product including the defective product based on the inspection result. Is provided. When the inspection result is three, that is, a non-defective product, a product requiring re-inspection, and a defective product, a corresponding inspection product storage mechanism may be separately provided.
[0015]
Next, a method of inspecting a semiconductor chip using the inspection device for inspecting an object to be inspected will be described.
[0016]
The semiconductor chip 2 to be inspected is transferred from the tray 3a to the upstream mounting position 2a of the movable transfer device 5 by the inspection object transfer mechanism 4. The semiconductor chip 2 transferred to the transfer device 5 is fixed by suction on the transfer device 5 and is moved in units of a constant pitch p. A camera 8 with a microscope of the image pickup means A is provided at a correction station 6 installed above a position where the transfer device 5 has moved i times the constant pitch p (i is an integer). The semiconductor chip 2 is conveyed immediately below and when stopped, the angle and position of the semiconductor chip 2 are measured. Immediately below the imaging means A, when the size of the semiconductor chip 2 to be inspected fits within one field of view of the camera 8 with a microscope with a predetermined margin, the center of the semiconductor chip 2 is It is preferable that the position be a "haze" position which is the center of the field of view of the camera 8.
Each time the transport device 5 moves by the constant pitch p, the inspection object transfer mechanism 4 supplies the semiconductor chip 2 to be inspected next to the upstream mounting position of the transport device 5.
Then, for all the semiconductor chips 2 on the transfer device 5 that have passed through the correction station 6, the angle and position information measured by the camera 8 with a microscope are individually stored in the memory in the device. After the angle and the position of the semiconductor chip 2 are measured, the transport device 5 moves to the downstream side by j times (j is an integer) of the constant pitch p. An inspection station 7 provided with a camera 9 with a microscope, which is an imaging means B for performing an appearance inspection, is installed above the portion moved by the j × p pitch. In the inspection station 7, the semiconductor chip 2 is stored. Based on the obtained angle / position information, the camera 9 with the microscope is operated at least in the θ function, preferably in the θ · XYZ function while the semiconductor chip 2 to be inspected moves from the standby position one pitch upstream to the inspection position of the inspection station 7. Automatically moves to the visual inspection position and waits. The camera with microscope 9 captures an image of the semiconductor chip 2 when the transfer device 5 stops, and starts inspection. When the inspection area of the semiconductor chip 2 exceeds the visual field area of the camera 9 with a microscope, the semiconductor chip 2 is divided into a plurality of inspection visual fields by using the camera 9 with a microscope having at least the XY function. Of course you can.
Next, the first semiconductor chip 2 for which the appearance inspection has been completed is further transported downstream by k times (k is an integer) of the constant pitch p, and stops at the take-in position 2b. It is moved to the storage mechanism 11.
[0017]
That is, when the appearance inspection of the M-th semiconductor chip 2 is performed by the camera 9 with a microscope, the angle and position of the (M + j) -th semiconductor chip are measured by the camera 8 with a microscope arranged in the correction station 6. The (M−k) th semiconductor chip is moved to the inspection product storage mechanism 11 by the inspection product take-in mechanism 10, and the (M + i + j) th semiconductor chip is moved to the mounting position by the inspection product transfer mechanism 4. Will be transferred.
[0018]
The angle and the position information measured by the camera 8 with the microscope of the correction station 6 during the moving time when the semiconductor chip moves to the mounting position 2a, the correction station 6, the inspection station 7, and the take-in position 2b are respectively , And each time, the mounting angle and / or mounting position 2a of the inspection object transfer mechanism 4 on the upstream side of the transport device 5 and the inspection angle and / or Alternatively, the inspection position, the angle of the inspection product taking-in mechanism 10 from the downstream side of the transport device 5 and / or the take-in position 2b are corrected.
In this way, the transfer device 5 continuously moves the semiconductor chip 2 in the unit of the constant pitch p to the downstream side, so that the transfer, placement, angle and position measurement, inspection, and removal of the semiconductor chip are performed at the same timing. In addition, it becomes possible to carry out the inspection continuously and efficiently in a sequential manner.
[0019]
Until now, the case where the inspected product is a semiconductor chip has been described, but it is needless to say that the same can be applied to the case of a patterned substrate.
3 and 4 are a plan view and a side view, respectively, showing another embodiment of the device for inspecting the appearance of a product to be inspected according to the present invention, wherein the product to be inspected is a wiring pattern on a film.
In this case, the inspected product supply mechanism 1 corresponds to the sending device 20, and the inspected product take-in mechanism 10 corresponds to the winding machine 23. In this case, the tape feed amount constant pitch p is a repetition pitch in the winding direction of the unit pattern on the film, and the distance in the tape feed direction between the correction station 6 and the inspection station 7 is j times (j) the tape feed amount constant pitch p. Is an integer.) And the distance between the inspection station 7 and the NG puncher 22 in the tape feed direction is k times the tape feed amount constant pitch p (k is an integer). Defective products are punched out by the NG puncher 20. Other mechanisms are the same as those of the embodiment shown in FIGS.
[0020]
FIG. 5 is a plan view showing another embodiment of the appearance inspection apparatus for an object to be inspected according to the present invention, in which the transport device 5 of FIGS. In this embodiment, a coarse positioning mechanism 30 is provided on the upstream side of the correction station 6, but the other mechanisms are the same as those of the embodiment shown in FIGS.
[0021]
【The invention's effect】
In the past, operations such as transfer, placement, measurement of angle and position, inspection, capture, and storage were performed in a series at the same location, requiring a long time for inspection. According to the apparatus and the appearance inspection method, the operations of transfer, placement, angle / position measurement, inspection, take-in, and storage can be performed at the same time. It is possible to shorten the time and perform high-precision visual inspection. Further, when the inspected product is a semiconductor chip or a substrate with a pattern, the placement and / or taking-in position is controlled to store the inspected inspected product in a non-defective chip tray, a re-inspected chip tray, or the like. Is carried out accurately, and occurrence of storage trouble is suppressed.
[Brief description of the drawings]
FIG. 1 is a plan view showing an outline of an appearance inspection apparatus for an object to be inspected according to the present invention.
FIG. 2 is a side view of the appearance inspection apparatus of the inspection object of the present invention shown in FIG.
FIG. 3 is a plan view showing another embodiment of the appearance inspection device for an inspected product of the present invention.
FIG. 4 is a side view showing another embodiment shown in FIG. 3;
FIG. 5 is a plan view showing another embodiment of the appearance inspection apparatus for an inspected product of the present invention.
FIG. 6 is a conceptual diagram showing an example of a conventional semiconductor chip appearance inspection apparatus.
[Explanation of symbols]
1 inspection product supply mechanism 2 semiconductor chip 2a mounting position 2b take-in position 3 chip tray 3a pre-inspection chip tray 3b re-inspection product chip tray 3c non-defective product chip tray 3d pre-inspection / re-inspection product chip combined tray 4 chip tray supply mechanism 5 Conveying device 6 Correction station 7 Inspection station 8 Camera with microscope 9 Camera with microscope 10 Inspection product take-in mechanism 11 Chip tray storage mechanism 11a Good chip tray storage mechanism 11b Re-test product chip tray storage mechanism 20 Sending device 21 Print film 22 NG Puncher 23 Winder 30 Rough positioning mechanism 31 Rotary table 40 Collet 41 XYθ stage 42 Inspection stage 43 Camera with microscope

Claims (7)

被検査品を載置して一方向に順送りされる搬送装置に沿って、
前記被検査品の少なくとも角度を測定する撮像手段Aと、少なくとも角度制御機能を有し外観検査を行う撮像手段Bとを所定の間隔を開けて設け、撮像手段Aからの情報を基に撮像手段Bの角度を制御せしめることを特徴とする被検査品の外観検査装置。
Along the transport device that places the product to be inspected and is fed in one direction,
An imaging unit A for measuring at least the angle of the inspection object and an imaging unit B having at least an angle control function and performing an appearance inspection are provided at a predetermined interval, and an imaging unit based on information from the imaging unit A A visual inspection apparatus for an inspected product, wherein the angle of B is controlled.
前記撮像手段Aが角度、及び位置(XY方向位置)を測定する機能を有することを特徴とする請求項1に記載の被検査品の外観検査装置。2. The visual inspection apparatus according to claim 1, wherein the imaging unit A has a function of measuring an angle and a position (an XY direction position). 被検査品を載置して一方向に順送りされる搬送装置に沿って、被検査品を前記搬送装置に載置せしめる被検査品移載機構と、前記被検査品の角度及び/又は位置(XY方向位置)を測定する撮像手段Aと、角度及び/又は位置(XY方向位置)制御機能を有する撮像手段Bと、検査品を取得せしめる検査品取込機構とをそれぞれ所定の間隔を開けて設けたことを特徴とする被検査品の外観検査装置。An inspected article transfer mechanism for mounting the inspected article on the transport apparatus along a transport apparatus on which the inspected article is placed and sequentially fed in one direction; and an angle and / or position of the inspected article ( The imaging unit A for measuring the position in the XY direction), the imaging unit B having an angle and / or position (XY position) control function, and the inspection product taking-in mechanism for obtaining the inspection product are spaced apart from each other by a predetermined distance. Apparatus for inspecting the appearance of a product to be inspected, which is provided. 前記被検査品が半導体チップ、又はパターン付き基板であることを特徴とする請求項1乃至3の何れかに記載の被検査品の外観検査装置。4. The visual inspection device for an inspected product according to claim 1, wherein the inspected product is a semiconductor chip or a substrate with a pattern. 被検査品をテープ送りする搬送路に沿って、前記被検査品の少なくとも角度を測定する撮像手段Aと、少なくとも角度制御機能を有し外観検査を行う撮像手段Bとを所定の間隔を開けて設け、撮像手段Aからの情報を基に撮像手段Bの角度を制御せしめることを特徴とする被検査品の外観検査装置。Along the conveyance path for feeding the product to be inspected, an imaging unit A for measuring at least the angle of the product to be inspected and an imaging unit B having at least an angle control function and performing an appearance inspection are spaced apart by a predetermined distance. A visual inspection apparatus for inspecting an inspection object, wherein the angle of the imaging means B is controlled based on information from the imaging means A. 請求項3に記載の外観検査装置を用いる検査方法において、前記撮像手段Aから取得した被検査品の角度及び/又は位置情報を基に、被検査品移載機構による前記搬送装置への載置角度及び/又は載置位置補正と、検査品取込機構による前記搬送装置からの取得角度及び/又は位置補正とをそれぞれ行うことを特徴とする被検査品の外観検査方法。The inspection method using the appearance inspection device according to claim 3, wherein the inspection object transfer mechanism mounts the inspection object on the transport device based on the angle and / or position information of the inspection object obtained from the imaging unit A. 5. A method for inspecting the appearance of a product to be inspected, wherein correction of an angle and / or a mounting position and correction of an angle and / or a position obtained from the transport device by an inspection product take-in mechanism are performed. 請求項1乃至4の何れかに記載の外観検査装置を用いて生産された製品。A product produced using the visual inspection device according to claim 1.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009139155A (en) * 2007-12-04 2009-06-25 Ueno Seiki Kk Inspection system, image inspection device, and its control method
CN101900541A (en) * 2010-07-21 2010-12-01 中国航空工业集团公司西安飞机设计研究所 Airplane external illuminating space angle-positioning combining equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009139155A (en) * 2007-12-04 2009-06-25 Ueno Seiki Kk Inspection system, image inspection device, and its control method
CN101900541A (en) * 2010-07-21 2010-12-01 中国航空工业集团公司西安飞机设计研究所 Airplane external illuminating space angle-positioning combining equipment

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