JP2004006300A5 - - Google Patents

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Publication number
JP2004006300A5
JP2004006300A5 JP2003104066A JP2003104066A JP2004006300A5 JP 2004006300 A5 JP2004006300 A5 JP 2004006300A5 JP 2003104066 A JP2003104066 A JP 2003104066A JP 2003104066 A JP2003104066 A JP 2003104066A JP 2004006300 A5 JP2004006300 A5 JP 2004006300A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2003104066A
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Japanese (ja)
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JP2004006300A (ja
JP4308564B2 (ja
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Priority to JP2003104066A priority Critical patent/JP4308564B2/ja
Priority claimed from JP2003104066A external-priority patent/JP4308564B2/ja
Publication of JP2004006300A publication Critical patent/JP2004006300A/ja
Publication of JP2004006300A5 publication Critical patent/JP2004006300A5/ja
Application granted granted Critical
Publication of JP4308564B2 publication Critical patent/JP4308564B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003104066A 2002-04-09 2003-04-08 プラズマ処理装置及びプラズマ処理用トレー Expired - Fee Related JP4308564B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003104066A JP4308564B2 (ja) 2002-04-09 2003-04-08 プラズマ処理装置及びプラズマ処理用トレー

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002106164 2002-04-09
JP2003104066A JP4308564B2 (ja) 2002-04-09 2003-04-08 プラズマ処理装置及びプラズマ処理用トレー

Publications (3)

Publication Number Publication Date
JP2004006300A JP2004006300A (ja) 2004-01-08
JP2004006300A5 true JP2004006300A5 (enrdf_load_stackoverflow) 2006-04-20
JP4308564B2 JP4308564B2 (ja) 2009-08-05

Family

ID=30446786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003104066A Expired - Fee Related JP4308564B2 (ja) 2002-04-09 2003-04-08 プラズマ処理装置及びプラズマ処理用トレー

Country Status (1)

Country Link
JP (1) JP4308564B2 (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100783829B1 (ko) * 2003-05-02 2007-12-10 동경 엘렉트론 주식회사 처리가스도입기구 및 플라즈마처리장치
JP4622764B2 (ja) * 2005-09-15 2011-02-02 パナソニック株式会社 プラズマ処理方法
JP5131762B2 (ja) * 2008-05-09 2013-01-30 サムコ株式会社 プラズマ処理方法及びプラズマ処理装置並びにプラズマ処理用トレイ
JP4709945B2 (ja) * 2009-04-13 2011-06-29 パナソニック株式会社 プラズマ処理装置及びプラズマ処理方法
WO2012077071A1 (en) * 2010-12-08 2012-06-14 Oc Oerlikon Balzers Ag Apparatus and method for depositing a layer onto a substrate
JP7002302B2 (ja) * 2016-12-13 2022-02-10 芝浦メカトロニクス株式会社 成膜装置

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