JP2004003024A5 - Semiconductor device - Google Patents

Semiconductor device Download PDF

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Publication number
JP2004003024A5
JP2004003024A5 JP2003142825A JP2003142825A JP2004003024A5 JP 2004003024 A5 JP2004003024 A5 JP 2004003024A5 JP 2003142825 A JP2003142825 A JP 2003142825A JP 2003142825 A JP2003142825 A JP 2003142825A JP 2004003024 A5 JP2004003024 A5 JP 2004003024A5
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JP
Japan
Prior art keywords
heat sink
semiconductor device
copper
copper oxide
semiconductor
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Application number
JP2003142825A
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Japanese (ja)
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JP2004003024A (en
JP4277582B2 (en
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Publication date
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Priority to JP2003142825A priority Critical patent/JP4277582B2/en
Priority claimed from JP2003142825A external-priority patent/JP4277582B2/en
Publication of JP2004003024A publication Critical patent/JP2004003024A/en
Publication of JP2004003024A5 publication Critical patent/JP2004003024A5/en
Application granted granted Critical
Publication of JP4277582B2 publication Critical patent/JP4277582B2/en
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Description

【特許請求の範囲】
【請求項1】
放熱板上に搭載された絶縁基板及び該絶縁基板上に搭載された半導体素子を有する半導体装置において、前記放熱板は銅と酸化銅を有する複合材料よりなり、前記酸化銅がアイランド状に分散し、前記アイランドの50%以上が、アスペクト比が3以上であり、一方向に配向していることを特徴とする半導体装置。
【請求項2】
放熱板上に搭載された半導体素子と、前記放熱板に接続されたリードフレームと、該リードフレームと半導体素子とを電気的に接続する金属ワイヤとを備え、前記半導体素子を樹脂封止した半導体装置において、前記放熱板は銅と酸化銅を有する複合材料よりなり、前記酸化銅がアイランド状に分散し、前記アイランドの50%以上が、アスペクト比が3以上であり、一方向に配向していることを特徴とする半導体装置。
【請求項3】
請求項2において、前記放熱板の前記素子の接合面に対して反対の面側が前記樹脂に対して開放されていることを特徴とする半導体装置。
【請求項4】
放熱板上に搭載された半導体素子と、外部配線接続用ピン及び中央部に前記素子を収納する開放空間を有するセラミックス多層配線基板と、前記素子と基板の端子とを電気的に接続する金属ワイヤとを備え、前記素子を前記空間に設置するように前記放熱板と前記基板とを接合するとともに前記基板をリッドによって接合し前記素子を大気より遮断する半導体装置において、前記放熱板は銅と酸化銅を有する複合材料よりなり、前記酸化銅がアイランド状に分散し、前記アイランドの50%以上が、アスペクト比が3以上であり、一方向に配向していることを特徴とする半導体装置。
【請求項5】
放熱板上に搭載された半導体素子と、外部配線接続用端子及び中央部に前記素子を収納する凹部を有するセラミックス多層配線基板と、前記素子と基板の端子とを電気的に接続する金属ワイヤとを備え、前記素子を前記凹部に設置するように前記放熱板と前記基板の凹部とを接合するとともに前記基板をリッドによって接合し前記素子を大気より遮断する半導体装置において、前記放熱板は銅と酸化銅を有する複合材料よりなり、前記酸化銅がアイランド状に分散し、前記アイランドの50%以上が、アスペクト比が3以上であり、一方向に配向していることを特徴とする半導体装置。
【請求項6】
放熱板上に熱伝導性樹脂によって接合された半導体素子と、セラミックス絶縁基板に接合されたリードフレームと、前記素子とリードフレームとを電気的に接続するTABとを備え、前記放熱板と絶縁基板とを接合し前記素子を大気より遮断するとともに前記素子と絶縁基板との間に熱伝導性樹脂弾性体を介在させた半導体装置において、前記放熱板は銅と酸化銅を有する複合材料よりなり、前記酸化銅がアイランド状に分散し、前記アイランドの50%以上が、アスペクト比が3以上であり、一方向に配向していることを特徴とする半導体装置。
【請求項7】
第1の放熱板上に金属によって接合された半導体素子と、接地板が接合された第2の放熱板の前記接地板上に前記第1の放熱板を搭載し、前記素子の端子に電気的に接続した
TABとを備え、前記素子を樹脂封止した半導体装置において、前記放熱板は銅と酸化銅を有する複合材料よりなり、前記酸化銅がアイランド状に分散し、前記アイランドの50%以上が、アスペクト比が3以上であり、一方向に配向していることを特徴とする半導体装置。
【請求項8】
請求項1〜7のいずれかにおいて、前記放熱板の表面にAu,Ni,Pd,Cr,Al,Sn,Sn−Pbのうち少なくとも一つのめっき層を有することを特徴とする半導体装置。


[Claims]
(1)
In a semiconductor device having an insulating substrate mounted on a heat sink and a semiconductor element mounted on the insulating substrate, the heat sink is made of a composite material having copper and copper oxide, and the copper oxide is dispersed in an island shape. A semiconductor device , wherein 50% or more of the islands have an aspect ratio of 3 or more and are oriented in one direction .
(2)
A semiconductor comprising a semiconductor element mounted on a heat sink, a lead frame connected to the heat sink, and metal wires electrically connecting the lead frame and the semiconductor element, wherein the semiconductor element is resin-sealed. In the apparatus, the heat sink is made of a composite material having copper and copper oxide, and the copper oxide is dispersed in an island shape, and 50% or more of the islands have an aspect ratio of 3 or more and are oriented in one direction. wherein a it is.
(3)
3. The semiconductor device according to claim 2, wherein a surface of the heat sink opposite to a surface to which the element is joined is open to the resin.
(4)
A semiconductor element mounted on a heat sink, a ceramic multilayer wiring board having external wiring connection pins and an open space for accommodating the element in the center, and a metal wire for electrically connecting the element to a terminal of the substrate with the door, oxidation in a semiconductor device for blocking from atmospheric air to the substrate was joined by the lid with the elements the elements joining the said and the heat radiating plate substrate for installation in the space, wherein the heat sink and copper A semiconductor device comprising a composite material containing copper, wherein the copper oxide is dispersed in an island shape, and 50% or more of the islands have an aspect ratio of 3 or more and are unidirectionally oriented .
(5)
A semiconductor element mounted on a heatsink, a ceramic multilayer wiring board having external wiring connection terminals and a concave portion for accommodating the element in the center, and a metal wire for electrically connecting the element and the terminal of the substrate. A semiconductor device that joins the heat sink and the recess of the substrate so as to place the element in the recess, and joins the substrate with a lid to shut off the element from the atmosphere, wherein the heat sink is made of copper. A semiconductor device comprising a composite material having copper oxide, wherein the copper oxide is dispersed in an island shape, and 50% or more of the islands have an aspect ratio of 3 or more and are unidirectionally oriented .
6.
A semiconductor element joined to the heat sink with a thermally conductive resin, a lead frame joined to a ceramic insulating substrate, and a TAB for electrically connecting the element to the lead frame; In a semiconductor device in which a heat conductive resin elastic body is interposed between the element and the insulating substrate while the element is shielded from the atmosphere and the element is insulated from the atmosphere, the heat sink is made of a composite material having copper and copper oxide, The semiconductor device, wherein the copper oxide is dispersed in an island shape, and 50% or more of the islands have an aspect ratio of 3 or more and are oriented in one direction .
7.
A semiconductor element joined by a metal on a first heat sink and the first heat sink is mounted on the ground plate of a second heat sink joined to a ground plate, and an electric terminal is connected to a terminal of the element. Wherein the heat sink is made of a composite material having copper and copper oxide, and the copper oxide is dispersed in an island shape, and 50% or more of the island is provided. Wherein the semiconductor device has an aspect ratio of 3 or more and is oriented in one direction .
Claim 8.
8. The semiconductor device according to claim 1, further comprising at least one plating layer of Au, Ni, Pd, Cr, Al, Sn, and Sn-Pb on a surface of the heat sink.


JP2003142825A 2003-05-21 2003-05-21 Semiconductor device Expired - Lifetime JP4277582B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003142825A JP4277582B2 (en) 2003-05-21 2003-05-21 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003142825A JP4277582B2 (en) 2003-05-21 2003-05-21 Semiconductor device

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP37268399A Division JP3552623B2 (en) 1999-12-28 1999-12-28 Composite material and heat sink for semiconductor device using the same

Publications (3)

Publication Number Publication Date
JP2004003024A JP2004003024A (en) 2004-01-08
JP2004003024A5 true JP2004003024A5 (en) 2006-07-20
JP4277582B2 JP4277582B2 (en) 2009-06-10

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JP2003142825A Expired - Lifetime JP4277582B2 (en) 2003-05-21 2003-05-21 Semiconductor device

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JP (1) JP4277582B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6416996B1 (en) * 2017-07-24 2018-10-31 アサヒ・エンジニアリング株式会社 Sealing type for resin sealing equipment
CN115287491B (en) * 2022-08-11 2023-08-18 江西博钦纳米材料有限公司 AlN and Al2O3 hybrid reinforced copper-based composite material and preparation method thereof

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