JP2003329827A - Method for manufacturing pattern member and manufacturing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To improve both the productivity and product quality of a pattern member in manufacturing the pattern member in which a plurality of types of different materials are formed on a substrate in a pattern shape. <P>SOLUTION: A method for manufacturing the pattern member comprises the processes for: forming respective pattern-shaped grooves KA for red, green and blue on the surface of a flat plate-shaped temporary support K; injecting a material P into the grooves KA; binging a peeling layer material 22 into close contact with the surface of the temporary support K, inserting a portion of the peeling layer material 22 into the grooves KA and bringing the peeling layer material 22 into close contact with the material P in the grooves; peeling the peeling layer material 22 from the temporary support K; and transferring a pattern to a substrate B by overlapping the pattern on the substrate B so as to bring the pattern into contact with the substrate B to perform position adjustment and applying pressing from the rear side face of the substrate B and/or the peeling layer material 22, and forming the plurality of types of different materials P on the substrate B in a pattern shape. <P>COPYRIGHT: (C)2004,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for manufacturing a pattern member, and more particularly to a pattern member suitable for use in electronic displays such as color filters for liquid crystal display devices and pixels for organic EL devices. A method and a manufacturing apparatus.

[0002]

2. Description of the Related Art Conventionally, as a material for electronic displays such as color filters for liquid crystal display elements and pixels for organic EL elements, for example, red (R), green ( G), blue (B), etc., or 3
A pattern member on which a stripe-shaped or matrix-shaped pattern with a fine color (micrometer level) is formed is used.

As a method for manufacturing such a pattern member, various methods have been proposed and adopted so far. For example, photolithography, a pigment dispersion method, a relief dyeing method, an electrodeposition method, a printing method, an inkjet method and the like can be mentioned. These manufacturing methods have merits and demerits, and at present, each company adopts a manufacturing method judged to be optimal.

[0004]

However, under the present circumstances, it is difficult to satisfy both the quality (pattern accuracy) and the cost with the conventional method for manufacturing a pattern member.

That is, in photolithography, vapor deposition, etc. (see, for example, Japanese Patent Laid-Open Nos. 2000-36385 and 9-204984), the apparatus is complicated, and processing into a continuous flexible support is performed. Is not suitable for mass production.

The gravure offset printing method (see, for example, Japanese Patent Application Laid-Open No. 62-85202) has a problem in that the pattern shape is disturbed during transfer and it is difficult to perform high-precision (several tens of μm level) processing. There is also a problem that it is difficult to deal with a large area.

Inkjet system (for example, Japanese Patent Laid-Open No.
In Japanese Patent Laid-Open No. 0-153967), since a partition wall is required, there is a problem that the aperture ratio is small, and it is difficult to form organic layers in multiple layers.

The pigment dispersion method and the relief dyeing method have a problem that they are not suitable for mass production due to the large number of steps.

Transfer system (for example, Japanese Patent Laid-Open No. 2000-24
Japanese Patent No. 6866) is a technique for transferring a pattern formed on a film to a glass substrate or the like, but cannot transfer the pattern to a continuous film-shaped substrate or the like.

Electrodeposition method (for example, JP-A-5-8801)
No. 6) is a technique in which a magnetic mask having patterned openings for materials is fixed on a substrate, electricity is applied in a state of being immersed in an electrodeposition paint bath, and a pattern is formed on the substrate by electrodeposition. However, there is a problem that the facility becomes large and the productivity is poor.

The present invention has been made in view of such circumstances, and in the manufacture of a pattern member for forming a plurality of different kinds of materials in a pattern on a substrate, any one of productivity and product quality (pattern accuracy). It is an object of the present invention to provide a manufacturing method and a manufacturing apparatus capable of improving the above.

[0012]

In order to achieve the above object, the present invention provides a method of manufacturing a pattern member for forming a plurality of different types of materials on a substrate in a pattern, wherein a pattern-shaped groove for the material is used. A step of forming on the surface of a plate-shaped temporary support, a step of injecting the material into the groove,
A step of bringing a release layer material into close contact with the surface of the temporary support, fitting a part of the release layer material into the groove, and bringing the release layer material into close contact with the material in the groove; The step of peeling the release layer material, and adjusting the position of the release layer material on the substrate so that the pattern contacts the substrate, and pressing from the back surface of the substrate and / or the release layer material. And a step of forming the pattern of the plurality of different materials on the substrate by transferring the pattern to the substrate, and a manufacturing method used for the method. Provide a device.

According to the present invention, first, a plurality of types of materials,
For example, patterned grooves for red (R), green (G), and blue (B) materials are formed on the surface of a plate-shaped temporary support. Then, the material is injected into the groove by various means. While the material is dried and stable, the release layer material is brought into close contact with the surface of the temporary support, and a part of the release layer material is fitted into this groove, and the release layer material is brought into close contact with the material in the groove, afterwards,
The release layer material is released from the temporary support.

As a result, this material can be formed in a pattern on the release layer material. Then, by superposing this material on the substrate to be a product so as to face the substrate and pressing from the back surface of the substrate and / or the release layer material, the material can be transferred to the substrate in a pattern, and a pattern member (for example, Organic E
L element, a color filter of a liquid crystal display element) can be formed.

Therefore, according to the method of the present invention, both productivity and product quality (pattern accuracy) can be improved in the manufacture of a pattern member in which a plurality of different materials are formed in a pattern on a substrate. . Further, there is an advantage that the degree of freedom in selecting the type of material (ink) is large.

In particular, since the process can be performed by a dry method, the pattern material is not corroded by a liquid such as an etching liquid (etchant) or a resist stripping liquid, and high-precision pixels can be formed.
In addition, since the electron transport layer, the light emitting layer, the hole transport layer, and the like can be laminated by a dry method, there is no mixing between layers as in the multi-layer coating / printing method, and highly accurate and highly efficient pixels can be formed.

Further, there is an advantage that minute pixels can be formed with high precision without leakage from a mask during vapor deposition in the vapor deposition system and restrictions due to ejection accuracy in the inkjet system.

In the present invention, it is preferable that the patterned groove for the material is formed by pressing a master die having a convex portion having a shape obtained by inverting the groove on the surface of the temporary support. This is because the use of a master die having such a convex portion on the surface facilitates formation of a patterned groove for a material.

Further, in the present invention, the material to be injected into the groove is one of the above-mentioned materials, and a plurality of types of the release layer material are formed so as to correspond to the plurality of types of materials. It is preferable that the operation of transferring the pattern to the substrate is repeated for a plurality of types of the release layer material.
Thus, for example, red (R), green (G), blue (B)
This is because if the release layer material is formed for each material, the transfer operation and the like can be easily managed.

Further, in the present invention, the substrate is preferably a strip-shaped flexible support. Thus, the substrate is a strip-shaped flexible support (for example, a flexible film).
If so, the substrate can be easily transported, and the productivity is excellent.
Further, if the substrate is a strip-shaped flexible support, it can be applied to various uses such as organic EL.

[0021]

BEST MODE FOR CARRYING OUT THE INVENTION Preferred embodiments of a method and an apparatus for manufacturing a pattern member according to the present invention will be described below in detail with reference to the accompanying drawings.

1 and 4 show an example of the process flow of the method for manufacturing a pattern member of the present invention. 2 and 3 show the outline of the pattern member manufacturing apparatus of the present invention. FIG. 2 shows a pattern member manufacturing apparatus 10.
3 is a plan view showing the layout of FIG. A configuration diagram of the transfer means 24 in the pattern member manufacturing apparatus 10 is shown in FIG.

In FIG. 2, a pattern member manufacturing apparatus 1
Reference numeral 0 denotes a groove forming means (not shown), a coating device 12 corresponding to a material injecting means, and a coating liquid dryer (drying means) for drying the pattern material P coated (injected) by the coating device 12.
14, a peeling layer material forming means 32, a peeling means 34, a transfer device (transfer means) 24, and transfer devices 26 and 28 that convey the peeling layer material 22 and the like between each step.
The description of each device (means) will be given later.

In the present embodiment, as the temporary support K,
The moldability is good so that the groove KA using the master mold M can be easily formed, the melting point is higher than that of the release layer material 22 described later, and the pattern material P is higher than that of the release layer material 22. It is preferable that the material has low adhesiveness or wettability with respect to.

Examples of such materials include polyethylene terephthalate (PET), polyethylene-2,6-naphthalate, cellulose diacetate, cellulose triacetate, cellulose acetate propionate, polyvinyl chloride, polyvinylidene chloride, polycarbonate,
A plastic film such as polyimide or polyamide can be used.

As shown in the sectional view of FIG. 4A, the master mold M is a plate-shaped body having on its surface a convex portion MA having a shape in which the groove KA of the temporary support K is inverted. It is preferable to use a material that is excellent in the molding accuracy of the MA and that does not lose its shape even when the groove KA of the temporary support K is repeatedly formed. As such a material, for example,
Nickel alloy can be used. The formation of the convex portion MA is
Various known methods such as photolithography, machining, electric discharge machining, and laser machining can be adopted depending on the material of the master mold M, the shape of the convex portion MA, and the like.

In the illustrated example, the master mold M is a plate-shaped member, but a roll mold having a convex surface MA formed on the surface of the master mold M is combined with a roll having a smooth surface to form a roll. Thus, the groove KA of the temporary support K can be formed. The groove KA of the temporary support K can be formed by another method that does not use the master mold M.

Further, the temporary support K may be formed of a durable material such as metal (for example, nickel) and used semipermanently. The groove KA of the temporary support K such as metal is formed by various known methods according to the material of the temporary support K, the shape of the convex portion KA, and the like, such as photolithography, machining, electric discharge machining, and laser machining. Can be adopted.

As shown in FIG. 4B, the temporary support K
The groove width W of the groove KA is formed to be substantially the same as the pattern width, and the pitch between the grooves is formed to be a multiple of the pattern pitch. In the illustrated example, the pitch between the grooves is three times the pitch of the pattern. In this example, a structure of a pattern member made of three kinds of materials of red (R), green (G), and blue (B) is adopted, and red (R), green (G), and blue (B) are used. (3) Three types of release layer materials 22 are formed for each material.

In addition, even in the configuration of the pattern member made of three kinds of materials of R, G and B, for example, the groove K of the temporary support K is used.
It is also possible to adopt a configuration in which the pitch between A is twice the pitch of the pattern and only two kinds of release layer materials 22 are used. Ie 1
Grooves KA of the temporary support K of the seed are arranged in order from the end to R, B, G, R,
The grooves KA of the other temporary support K are used for G, R, B, G, R, B, ... By doing so, the number of release layer members 22 can be reduced.

The groove depth D of the groove KA of the temporary support K can be set to an appropriate value in consideration of the material of the release layer material 22, the aspect ratio with the groove width W, and the like.

The conditions for forming the grooves KA by the groove forming means are appropriate values (pressurizing conditions, heating conditions, cooling conditions, etc.) depending on the processing method (pressing, roll forming, etc.), the material of the temporary support K, etc. Can be adopted.

As the material injection means (application device) 12 for injecting the pattern material P into the groove KA of the temporary support K, various known application means can be adopted. Specifically, a roller coating method, a dip coating method, a fountain coating method and the like can be applied to the application system, and an air knife coating method, a blade coating method, a bar coating method and the like can be applied to the measuring system. Also, as the application system and the measurement system are in charge of the same part, the extrusion coating method,
A slide bead coating method, a curtain coating method or the like can be applied.

An ink jet printer is used as the coating device 12 shown in FIG. That is, the respective nozzles are arranged corresponding to the grooves KA of the temporary support K, respectively, so that different kinds of pattern materials P can be injected into the respective grooves KA. The outer diameter of the nozzle is usually larger than that shown in the drawing, and it is often difficult to arrange the nozzles adjacent to each other. However, it is possible to adopt a configuration in which the nozzles are arranged alternately in the direction perpendicular to the paper surface. Then, a striped pattern can be formed by relatively moving the coating device 12 and the temporary support K in the direction perpendicular to the paper surface.

The coating device 12 having such a structure is provided with each groove K.
Since different kinds of pattern materials P can be injected into A, respectively, the feature can be brought out particularly in the case of the above-mentioned constitution in which only two kinds of release layer materials 22 are used.

On the other hand, the planar coating device 12 (for example, a roller coater or a die coater) is used for each pattern material P described above.
The feature is particularly exhibited in the case of the structure in which the release layer material is formed for each. That is, it is only necessary to apply (inject) the same pattern material P to the grooves KA on the entire surface of the temporary support K. Since such a planar coating device 12 has a relatively simple structure and a high coating speed, it is effective for mass production of a large area.

In the case of coating the entire surface, one coating device 12 may coat various pattern materials P, but
It is preferable to provide the coating device 12 for each of the various pattern materials P in terms of productivity (job change, cleaning of the device, etc.), quality control (prevention of mixing of the pattern material P, etc.), and improvement of yield. In the pattern member manufacturing apparatus 10 of the present embodiment, three coating devices 12 are provided, each of which is a pattern material P of red (R), green (G) and blue (B).
It corresponds to. In addition, you may provide the coating device 12 for insulating layers (I) as needed (refer FIG. 2).

As described above, the coating device 12 may be of any type as long as the pattern material P having a predetermined thickness can be coated in the groove KA of the temporary support K. Further, a film forming method which is a superordinate concept other than the above coating method, for example, a vapor deposition method or the like can be adopted.

Further, before injecting the pattern material P into the groove KA of the temporary support K, a release material may be applied (eg, spray coating) into the groove KA. Thus groove K
If the release material is applied in A, the effect of improving the release property of the pattern material P can be obtained.

When a band-shaped flexible support is adopted as the temporary support K, it is poor in shape retention (flat state) by itself, and therefore it is preferably fixed to a temporary support support table (not shown). . As a means for fixing the temporary support K to the temporary support support table, various known means can be adopted.
In the present embodiment, a plurality of fine vacuum suction holes provided on the surface of the temporary support support table and suction means (for example, a rotary vacuum pump) that communicates with the fine vacuum suction holes are combined.

As described above, the temporary support K of a predetermined size is held on the temporary support support table, and the coating device 1
Although it may be moved by 2, the temporary support K wound into a roll is unwound from the roller of the sending portion (not shown), and wound up via the coating device 12 and the drying means 14 (described later). It is also possible to employ a configuration in which the rollers are conveyed in a manner of being wound around rollers of a part (not shown).

When the pattern material P is an organic EL element pixel, a light emitting organic thin film layer is formed as a pattern. Therefore, the pattern material P applied in the coating device 12 contains one or more luminescent compounds and / or phosphorescent compounds. In particular, from the viewpoint of luminous brightness and luminous efficiency, it is preferable that the phosphorescent compound is contained. The content of the luminescent compound and / or the phosphorescent compound in the coating liquid is preferably 0.1 to 70% by mass,
1 to 20 mass% is more preferable.

When the light emitting organic thin film layer is formed as a pattern, the film thickness in a product state is preferably 10 to 200 nm, more preferably 20 to 80 nm. This is because if the film thickness is less than 10 nm, the possibility of disconnection is high, and if the film thickness exceeds 200 nm, the driving voltage increases, which is not preferable.

Temporary support K coated with the pattern material P
Is sent to a coating liquid dryer (drying means) 14 to dry the pattern material P. Coating liquid dryer 1 used for this
As 4, an apparatus of various known systems such as a hot air circulating dryer, a far infrared dryer, a vacuum dryer and the like can be used. The drying condition can be appropriately selected depending on the composition of the coating liquid, but when the solvent of the coating liquid is water, the drying condition is performed under vacuum at 50 to 150 ° C. for 3 minutes or more. preferable.

When the pattern material P is a light emitting layer of an organic EL, this light emitting layer is vulnerable to dust and moisture, and since moisture has a great influence on the product life, it is necessary to perform sufficient drying. In this case, for example, it is preferable to allow a large number of temporary supports K to be stored in a hot air circulation dryer (clean oven) and to sequentially process them by a first-in / first-out system. By doing so, the production efficiency is good.
In the pattern member manufacturing apparatus 10 of the present embodiment,
As shown in FIG. 2, two coating liquid dryers 14 are provided.

In the above-mentioned series of steps, the temporary support K is automatically handled by the first transfer device 26 shown in FIG. 2 in terms of quality (for example, dust-free) and production efficiency. Is also preferable. First transfer device 26
For example, a known automatic warehouse robot can be used. The flow of the temporary support K is shown by an arrow in FIG.

Further, it is preferable that the above-mentioned series of steps be carried out in an environment of good dust-freeness and optimum temperature and humidity.
Therefore, it is preferably performed in a clean room, and in particular, the coating device 12 and the drying means 14 are class 1
It is preferably installed in an environment of 00 or less. For this purpose, a downflow clean room or a clean bench can be used together.

In particular, when the pattern material P is a light emitting layer of an organic EL, it is preferable to maintain the environment of low humidity because the light emitting layer has a great influence on the product life. Specifically, it is preferably an air or nitrogen gas atmosphere having a dew point of -20 ° C or lower. Relative humidity (R
H) is also preferably as low as possible.

The temporary support K, which has been dried by the coating liquid dryer (drying means) 14, is sent to the peeling layer material forming means 32.
In the release layer material forming means 32, the release layer material 22 is brought into close contact with the surface of the temporary support K, and a part of the release layer material 22 is fitted into the groove KA, so that the release layer material 22 has a pattern in the groove KA. After being in close contact with the material P, the release layer material 22 is cured.

As the release layer material 22 used here,
It can fit into the groove KA of the temporary support K and has an appropriate adhesiveness with the pattern material P. Further, under the condition in the transfer step described later, the wettability or adhesiveness of the pattern material P is better than that of the substrate B. Any material may be used as long as it is inferior. For example, liquid materials of PVA (polyvinyl alcohol) and TAC (cellulose triacetate) can be used. In this case, the temporary support K needs to be insoluble in the solvent used for the release layer material 22. In order to cure the release layer material 22, heat treatment or the like is performed as necessary.

The liquid release layer material 22 as described above is suitable for conforming to the shape of the groove KA of the temporary support K.
However, the release layer material 22 may be a solid film instead of the above liquid. In that case, the back surface of the release layer material 22 is pressed by an embossed projection or the like to fit a part of the release layer material 22 into the groove KA, and the release layer material 22 adheres to the pattern material P in the groove KA. I have to do it.

The release layer material 22 needs to be a material that can be deformed more easily than the temporary support K. This is because otherwise the shape of the temporary support K will collapse. Therefore, when the temporary support K is PET, PEI, or the like, PE, PP, or methacrylic resin (acrylic) can be used as the release layer material 22. In addition, when the release layer material 22 is deformed while being heated, the temporary support K is separated from the release layer material 22.
It must be formed of a material having a higher melting point or vitrification temperature. This is because otherwise the shape of the temporary support K will collapse.

Release layer material 2 in the release layer material forming means 32
After 2 is cured (as it is in the case of a solid film), the peeling layer material 22 is sent to the peeling means 34 and peeled from the temporary support K. As means for peeling the release layer material 22, various known means (for example, by a robot hand) can be adopted. In the release layer material forming means 32, alignment marks that can be used for alignment in the alignment transfer zone 50 described later may be provided in the vicinity of both ends of the release layer material 22 in advance.

The peeling layer material 22 peeled by the peeling layer material forming means 32 is automatically handled by the first transfer device 26 and transferred to the second transfer device 28. The second transfer device 28 is configured to be movable in the left-right direction in FIG. 2, receives the release layer material 22 from the first transfer device 26, and transfers the release layer material 22 to a transfer device (transfer means). ) 24. As the second transfer device 28, various known transfer devices can be adopted.

The release layer material 22 is usually a strip-shaped flexible support, and by itself has a poor shape-retaining property (flat state), it is fixed to the release layer material support table 30 (see FIG. 1) or the like. Is preferred. As a means for fixing the release layer material 22 to the release layer material support table 30 or the like, various known means can be adopted. In the present embodiment, for example, a combination of a plurality of fine vacuum suction holes provided on the surface of the release layer material support table 30 and suction means (for example, a rotary vacuum pump) that communicates therewith can be used.

The transfer device (transfer means) 24 used in the alignment transfer zone 50 is arranged such that one of the release layer materials 22 is placed on the substrate B, and the pattern material P faces the substrate B. Is a device for transferring the pattern material P onto the substrate B by adjusting the overlapping position on the substrate B and / or pressing from the back surface of the substrate B and / or the release layer material 22.

As the material of the substrate B supplied in the alignment transfer zone 50, a glass plate (for color filter of liquid crystal display device, for example), a silicon substrate, a metal plate or the like can be used. Substrate B having a strip-shaped flexible support can be preferably used.

As the substrate B of the belt-shaped flexible support, a predetermined width, a length of 45 to 20000 m, and a thickness of 2 are generally used.
200 μm polyethylene terephthalate (PET),
Plastic film such as polyethylene-2,6-naphthalate, cellulose diacetate, cellulose triacetate, cellulose acetate propionate, polyvinyl chloride, polyvinylidene chloride, polycarbonate, polyimide, polyamide, paper, polyethylene, polypropylene, ethylene butene copolymer Has 2 to 10 carbon atoms
It is possible to use a flexible strip made of paper or the like coated with or laminated with the α-polyolefin, or a strip having a processed layer formed on the surface of the flexible strip as a base material.

Hereinafter, a mode in which the substrate B of the belt-shaped flexible support is used in the alignment transfer zone 50 will be described. In the configuration diagram of the transfer means 24 shown in FIG. 3, the substrate B of the strip-shaped flexible support is a delivery zone (U
It is fed out from the roller 42 of the (W portion) 40, and sent to the alignment transfer zone 50 through the dust removing zone 46 such as a dust remover. The pattern material P is transferred onto the substrate B in the alignment transfer zone 50. After that, the substrate B is transferred to the EPC (edge position control device) 54 of the winding zone (W portion) 56.
After that, it is wound around the roller 58.

In the transfer means 24, the suction rollers 44, 48, 52 are of the sectional drive type which can convey the substrate B of the belt-shaped flexible support while sucking and holding it. The tension can be determined respectively.

The dancer rollers 57 and 59 control the tension of the substrate B of the belt-shaped flexible support and the suction roller 4.
This is for controlling the rotational speed of 4, 48, 52, and any tension can be applied to the substrate B of the strip-shaped flexible support by an air cylinder or the like. Also, dancer roller 5
By changing the position of 7, 7, 59, the conveyance speed of the substrate B of the strip-shaped flexible support can be controlled at a constant speed (feedback control can be performed).

In the dust removing zone 46, dust attached to the substrate B of the belt-shaped flexible support is removed by the dust remover. At this time, air having a pressure of about 10 kPa is blown, and this air and dust are collected. At this time, if a tension of about 10 kg / m is not applied to the substrate B of the strip-shaped flexible support, the substrate B may be lifted and cause a meandering.

On the other hand, in the alignment transfer zone 50, since the substrate B is aligned with the release layer material 22 with high accuracy, it is preferable that the tension applied to the substrate B is small. That is, it is preferable to suppress the elastic deformation of the substrate B as much as possible for highly accurate alignment. In particular, it is preferable that no tension be applied when the substrate B is suction-supported by the substrate support base 60.

In the winding zone 56, when the surface pressure (pressure perpendicular to the plane of the substrate B) applied to the substrate B of the strip-shaped flexible support is too high, the transferred pattern material Since it may adversely affect P, the substrate B
It is preferable that the surface pressure applied to is always maintained below a certain value. The tension applied to the substrate B is preferably controlled so that the winding torque is always constant even if the winding diameter of the roller 58 increases.

As described above, the preferable tension applied to the substrate B in the dust removal zone 46, the alignment transfer zone 50, and the winding zone 56 is different. Therefore, it is preferable to control the tension applied to the substrate B for each zone, which is the suction rollers 44, 4.
8 and 52 and dancer rollers 57 and 59. The suction rollers 44, 4 are used as means for controlling the transport speed of the substrate B and the tension applied to the substrate B.
Instead of using 8, 52 and dancer rollers 57, 59, other known means may be adopted.

The substrate B of the strip-shaped flexible support may have a barrier function in which a cathode / electron transport layer is previously provided by another device by sputtering, a vacuum deposition method or the like.

The illustrated transfer device (transfer means) 24
Is a mode corresponding to the substrate B of the belt-shaped flexible support, but the substrate B having a plate-like body such as a glass plate, a silicon substrate, or a metal plate is different only in the transporting means, and has a basic configuration. Are almost the same.

Details of the alignment transfer zone 50 will be described below with reference to FIGS. 1 and 4. Note that FIG. 1 and FIG. 4 (g) are in a state in which the upper and lower sides are reversed. Further, in FIG. 4, the release layer material support table 3
0 and the substrate support base 60 are not shown.

In FIG. 4, the alignment transfer zone 50
The alignment transfer means 24 in FIG. 2 supports the peeling layer material 22 and flattens the surface (lower surface) with a peeling layer material supporting base (not shown) for aligning the peeling layer material 22 in the X, Y, Z and θ directions. And a release layer member 2 for supporting the back surface (upper surface) of the substrate B by suction.
2 and two or more positioning detecting means (not shown) provided so as to be positioned near both ends of the peeling layer 22 and capable of detecting the positioning mark of the peeling layer material 22, the pattern portion 22A of the peeling layer material 22 or the pattern portion of the substrate B. , And pressing means (not shown) for transferring the pattern material P onto the substrate B by pressing from the back surface of the substrate B and / or the release layer material 22.

Release Layer Material Release Layer Material 22 in Support Base
The X-, Y-, Z-, and θ-direction alignment means can be configured by a conventional means, for example, a combination of a ball screw and a stepping motor. The suction support of the substrate B on the substrate support base 60 can be configured by, for example, a combination of a plurality of fine vacuum suction holes provided on the surface of the substrate support base 60 and suction means (for example, a rotary vacuum pump) communicating with the holes. The positioning detection means can be configured by a combination of a microscope or a digital camera and a CRT monitor connected to the microscope or digital camera.

The pressing means may be a conventional means, for example, a structure for pressing in a planar shape by a combination of an air cylinder and a regulator. Further, a linear pressing method using a roller member can be adopted instead of the planar pressing structure. That is, it is also possible to adopt a configuration in which this roller member is moved while being pressed by the roller member from the back surface of the substrate B and / or the release layer material 22.

Even if the operator uses the manual alignment method of aligning the release layer material 22 in the X, Y, Z, and θ directions by the alignment means while observing the detection result of the alignment detection means, the alignment detection means Alternatively, an automatic method may be used in which the release layer material 22 is automatically aligned in the X, Y, Z, and θ directions based on the detection result of 1.

From the state shown in FIG. 1, first, the substrate B is sucked and supported at a position where the substrate support base 60 is lowered and is substantially in contact with the back surface (upper surface) of the substrate B. Next, with the release layer material support base supporting (for example, vacuum suction) the release layer material 22, and with the release layer material 22 approaching and facing the substrate B, X, Y, Z of the release layer material 22 is performed. And align in the θ direction.

The release layer material 22 is supported by the release layer material support base even if the release layer material 22 is removed from the release layer material support table 30 and fixed to the release layer material support base. Supported release layer material support table 30
May be fixed to the release layer material support base.

When the alignment is completed, the pattern material P is transferred to the substrate B by pressing the substrate B and / or the back surface of the release layer material 22 (via the release layer material support base) by the pressing means. . This state is sequentially shown in FIGS. 4 (g) and 4 (h). Pattern material P when transferring
It is preferable that a predetermined pressure is applied according to the shape and material of the above and a predetermined heating is applied as necessary. As the heating means, for example, a configuration in which a sheath heater is provided on the substrate support base 60 can be adopted.

When the transfer of the first type pattern material P is completed, the substrate support base 60 and the substrate B supported by the substrate support base 60 stand by as they are. Then, the first release layer material 22 is replaced with another release layer material 22. At this time, the other release layer material 22 is positioned while being shifted by one pitch of the stripe or matrix pattern.

The alignment of the release layer material 22 of the second and subsequent types is close to both ends of the release layer material 22 so as to have an appropriate positional relationship with the pattern material P of the first type already formed on the surface of the substrate B. The alignment mark formed on the substrate is read by the positioning detecting means, or the first type pattern material P is read by the positioning detecting means to perform the alignment. Such an operation is performed for all types of the release layer material 22, and the transfer of the pattern material P to the substrate B is completed.

When the patterning material P of the first kind or the like is read by the positioning detecting means to perform the positioning, a part of the substrate supporting base 60 is formed of a transparent material,
If a part of the substrate support base 60 is cut out, it is convenient that the pattern material P of the first kind or the like can be read by the positioning detection means through the substrate support base 60.

The release layer material 22 is attached to the release layer material support base.
When supporting (for example, vacuum suction), the release layer material support base is provided with three positioning pins, and two sides of the release layer material support table 30 are pressed against the positioning pins, whereby each release layer material is supported. It is preferable that the support table 30 can be supported at the same position. Similarly, a through hole is provided at a position where the release layer material support base and the release layer material support table 30 are aligned with each other, and the through hole is connected by a through pin (in this case, a tapered one is preferable) for positioning. It is also possible to adopt a configuration that does.

When the positioning accuracy of the pattern material P is rough, it is possible to use only the above-mentioned positioning pins without adopting the above-mentioned positioning detecting means.

At this time, strict positioning of the release layer material 22 is not required when transferring the first type pattern material P.
It suffices that the release layer material 22 and the substrate B are arranged in parallel. When transferring the pattern material P of the second and subsequent types, accurate positioning of the release layer material 22 is important for obtaining a highly accurate product.

The transfer conditions are the material of the pattern material P and the substrate B.
It is necessary to select the optimum conditions according to the material of the. For the pressing force at the time of transfer, for example, in the case of linear pressing using a roller member (elastic roller such as rubber roller), 0.5 to 5 kg / cm can be adopted as the linear pressure.

The heating temperature at the time of transfer is generally 4
0 to 250 ° C is preferable, and 60 to 180 ° C is more preferable. The release layer material 22 (release layer material support table 30) and / or the substrate B (substrate support base 6)
It is preferable to preheat 0) because productivity is improved.

The substrate B supplied in the transfer device 24 is a strip-shaped flexible support, and the cathode and
In the case where the electron transport layer has a barrier function provided by sputtering, vacuum deposition or the like, the following constitution can be adopted as an example.

The back electrode can be formed of a metal, an alloy, a metal oxide, an electrically conductive compound, or the like. This back electrode is preferably formed of a material having a work function of 4.5 eV or more.

Specific materials include alkali metals, alkaline earth metals, gold, silver, lead and aluminum. These materials may be used alone, but it is preferable to use two or more of the above materials in combination in order to achieve both storage stability and electron injection property.

Of these, from the viewpoint of electron injection property, alkali metals and alkaline earth metals are preferable, and from the viewpoint of storage stability, a material mainly containing aluminum is preferable. The material containing aluminum as a main component means not only aluminum itself but also an alloy or a mixture of aluminum and 0.01 to 10 mass% of an alkali metal or an alkaline earth metal.

The thickness of the back electrode can be selected as appropriate depending on the material, but normally a value of 10 nm to 5 μm can be adopted, and a value of 50 nm to 1 μm is preferably adopted. This back electrode is preferably continuously formed on the substrate B of the strip-shaped flexible support by sputtering, vacuum deposition or the like.

After the alignment transfer zone 50 is completed, as described above, the suction roller 52 and the EPC 54 are passed through, and the adhesive force between the pattern material P and the substrate B is secured, so that the winding zone (W Part) 56 rollers 58
To be wound up.

FIG. 5 is a block diagram of the substrate B after the transfer is completed. On the surface of the substrate B, three types (R, G, B) of the pattern material P are repeatedly formed with a predetermined width and a predetermined pitch.

Although the example of the embodiment of the method and apparatus for manufacturing the pattern member according to the present invention has been described above, the present invention is not limited to the example of the above embodiment, and various aspects can be adopted.

For example, the type and number of release layer materials 22, the number of coating devices 12, coating liquid dryers 14, etc., layout, etc.
Various aspects other than the above-described embodiment can be selected for the arrangement of the transfer device, etc., depending on the product size of the pattern member, the type of product, the production quantity, and the like.

In this embodiment, the batch type coating liquid dryer 14 is used. However, the temporary support K is transported by rollers, and a tunnel furnace type coating liquid dryer is provided at the subsequent stage of the coating device 12. A mode in which 14 is provided can also be adopted.

Further, for example, the transfer device (transfer means) 2
4, the next peeling layer material 22 may be positioned by shifting the substrate support base 60 (substrate B) by one pitch instead of positioning by shifting the stripe or matrix pattern by one pitch.

Further, the temporary support K may be washed and dried after the completion of peeling and repeatedly used.

[0096]

EXAMPLE An example of manufacturing the substrate B using the pattern member manufacturing apparatus 10 will be described below.

Example 1 As a temporary support K, a thickness of 0.
A 1 mm PET film was used, and a master pattern M was pressed to form a rectangular pattern of grooves KA on substantially the entire surface of the temporary support K. Pattern size is 50 × 100μ
m, and the depth D of the groove KA was 30 μm. The space between adjacent patterns was 10 μm in each of the vertical and horizontal directions. The pressing condition at this time is that the pressure is 100 MPa (1000 k
g / cm ² ), the temperature was 200 ° C., and the holding time was 20 minutes. The master mold M used is a stainless steel plate having convex portions MA formed by an additive method.

A dispenser was used as the coating device (material injection means) 12. As the pattern material P, materials that develop R, G, and B when energized were applied as a solution using dichlorobenzene as a solvent. The conditions were such that the film thickness after drying was 50 nm.

PVA was used as the release layer material 22, and a solution was applied to the temporary support K by a die coater using methanol as a solvent (the release layer material 22 was adhered to the temporary support K and the release layer was formed in the groove KA). A part of the material 22 was inserted). The release layer material 22 was applied and cured so that the thickness (the thickness of the portion other than the groove KA) was 80 μm.

After the release layer material 22 is applied, the whole is 120 °.
While heating to C, 0.3 MPa (3 kg / c
The pressure was applied at m ² ), then the temperature was cooled to 30 ° C., and then the release layer material 22 was released from the temporary support K.

The release layer material 22 was transferred onto the glass substrate B by the transfer device (transfer means) 24 shown in FIG. On this substrate B, the ITO electrode and the hole transport layer were previously formed. The transfer condition is a linear pressing using a roller member (elastic roller such as a rubber roller), 0.3M
While pressing Pa (3 kg / cm ² ),
Heating at 0 ° C was performed. Roller feed rate is 0.0
It was set to 5 m / min.

Through the above steps, good R, G and B patterns could be formed on the glass substrate B.

[Embodiment 2] Instead of the glass plate as the substrate B of the above Embodiment 1, a film having a polyimide-aluminum-polyimide structure in which an ITO electrode and an electron transport layer are formed in advance is used as a pattern member. Was manufactured. The other conditions were the same as in Example 1. Good R, G, B on the substrate B made of film can also be obtained through this step.
Pattern could be formed.

[Example 3] Temporary support K and release layer material 22
3 sets were prepared and used respectively for R, G, and B. Therefore, the transfer was repeated 3 times. The space between adjacent patterns is 230μm in the vertical direction and 130μ in the horizontal direction.
m. That is, the pattern is formed every 3 pitches in the vertical and horizontal directions. The press conditions (roller pressure conditions) are
1 of Example 1 both when the master die M is pressed and when it is transferred.
The pressure was / 3. The other conditions were the same as in Example 1. Even through this step, good R, G, and B patterns could be formed on the glass substrate B.

Example 4 Instead of PVA, a PP (polypropylene) film having a thickness of 100 μm was used as the release layer material 22. The whole was heated to 120 ° C., pressurized at 10 MPa (100 kg / cm ² ), held for 1 minute and then cooled, and then the release layer material 22 was released from the temporary support K. The heating during transfer was 100 ° C. The other conditions were the same as in Example 1. Even through this step, good R, G, and B patterns could be formed on the glass substrate B.

[0106]

As described above, according to the present invention,
First, patterned grooves for a plurality of kinds of materials, for example, red (R), green (G), and blue (B) materials are formed on the surface of a flat plate-shaped temporary support. Then, the material is injected into the groove by various means. While the material is dried and stable, the release layer material is brought into close contact with the surface of the temporary support, and a part of the release layer material is fitted into this groove, and the release layer material is brought into close contact with the material in the groove, Then, the release layer material is released from the temporary support.

Thus, this material can be formed in a pattern on the release layer material. Then, by superposing this material on the substrate to be a product so as to face the substrate and pressing from the back surface of the substrate and / or the release layer material, the material can be transferred to the substrate in a pattern, and a pattern member (for example, Organic E
L element, a color filter of a liquid crystal display element) can be formed.

Therefore, according to the method of the present invention, both productivity and product quality (pattern accuracy) can be improved in the manufacture of a pattern member in which a plurality of different materials are formed in a pattern on a substrate. . Further, there is an advantage that the degree of freedom in selecting the type of material (ink) is large.

In particular, since the dry process can be performed, the pattern material is not corroded by a liquid such as an etching liquid (etchant) or a resist stripping liquid, and high-precision pixels can be formed.
In addition, since the electron transport layer, the light emitting layer, the hole transport layer, and the like can be laminated by a dry method, there is no mixing between layers as in the multi-layer coating / printing method, and highly accurate and highly efficient pixels can be formed.

Further, there is an advantage that minute pixels can be formed with high precision without leakage from a mask during vapor deposition in the vapor deposition system and restrictions due to ejection accuracy in the inkjet system.

In the present invention, if the patterned groove for the material is formed by pressing the master die having the convex portion of the inverted shape of the groove on the surface of the temporary support,
It facilitates the formation of patterned grooves for the material.

Further, in the present invention, the material to be injected into the groove is one kind of each material, and a plurality of kinds of release layer materials are formed to correspond to the plurality of kinds of materials, and the pattern is formed. If the operation of transferring to the substrate is repeated for a plurality of types of release layer materials, the transfer operation and the like can be easily managed.

In the present invention, if the substrate is a strip-shaped flexible support, the substrate can be easily transported and the productivity is excellent. If the substrate is a strip-shaped flexible support, organic E
It can be applied to various uses such as L.

[Brief description of drawings]

FIG. 1 is a conceptual diagram showing a flow of a method for manufacturing a pattern member of the present invention.

FIG. 2 is a conceptual diagram showing a layout of a pattern member manufacturing apparatus.

FIG. 3 is a block diagram of a transfer unit.

FIG. 4 is a conceptual diagram showing a detailed flow of a manufacturing process.

FIG. 5 is a block diagram of the substrate after transfer is completed.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 10 ... Pattern member manufacturing device, 12 ... Coating device (material injection means), 14 ... Coating liquid dryer (drying means), 20 ... Transfer device, 22 ... Release layer material, 24 ... Transfer device (transfer means), 30 ... Peeling layer material support table, 32 ... Peeling layer material forming means, 34 ... Peeling means, B ... Substrate, K ... Temporary support, K
A ... Groove, M ... Master type, MA ... Convex portion, P ... Pattern material

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Shotaro Ogawa             200, Onakazato, Fujinomiya City, Shizuoka Prefecture Fuji Photo             Within Film Co., Ltd. (72) Inventor Hideo Nagano             200, Onakazato, Fujinomiya City, Shizuoka Prefecture Fuji Photo             Within Film Co., Ltd. F-term (reference) 2H048 BA02 BA66 BB02 BB42                 3K007 AB18 BA07 CA06 DB03 FA01

Claims (7)

[Claims] 1. A method of manufacturing a pattern member, wherein a plurality of different materials are formed in a pattern on a substrate, the step of forming a pattern groove for the material on the surface of a flat temporary support, A step of injecting the material into the groove, and bringing the release layer material into close contact with the surface of the temporary support, fitting a part of the release layer material into the groove, and placing the release layer material in the groove. A step of bringing the release layer material into contact with the material, a step of releasing the release layer material from the temporary support, the release layer material is superposed on the substrate so that the pattern comes into contact with the substrate, and the substrate and And / or a step of transferring the pattern to the substrate by pressing from the back surface of the release layer material, and forming the plurality of different kinds of materials on the substrate in a pattern shape. How to make . 2. The pattern according to claim 1, wherein the patterned groove for the material is formed by pressing a master die having a convex portion having an inverted shape of the groove on the surface of the temporary support. A method of manufacturing a member. 3. The material to be injected into the groove is one kind of the respective materials, and the plurality of kinds of the release layer materials are formed to correspond to the plurality of kinds of materials, and the pattern is formed. The method for manufacturing a pattern member according to claim 1, wherein the operation of transferring to the substrate is repeated for a plurality of types of the release layer material. 4. The method of manufacturing a pattern member according to claim 1, wherein the substrate is a strip-shaped flexible support. 5. The plurality of types of different materials include at least materials for colors of red (R), green (G) and blue (B). Item 8. A method for manufacturing a pattern member according to item. 6. The method for producing a pattern member according to claim 1, wherein the pattern member is a member for an organic EL element. 7. A pattern member manufacturing apparatus for forming a plurality of different materials in a pattern on a substrate, and a groove forming means for forming a pattern groove for the material on the surface of a plate-shaped temporary support. A material injecting means for injecting the material into the groove, and a release layer material in close contact with the surface of the temporary support, and a part of the release layer material fitted in the groove, and the release layer material A peeling layer forming means for bringing the peeling layer material into close contact with the material in the groove, a peeling means for peeling the peeling layer material from the temporary support, and the peeling layer material on the substrate so that the pattern contacts the substrate. An apparatus for manufacturing a pattern member, comprising: a transfer unit that adjusts the alignment position and transfers the pattern to the substrate by pressing from the back surface of the substrate and / or the release layer material.