JP2003326131A - Gas cleaning apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a gas cleaning apparatus designed to efficiently clean the gas to be cleaned and capable of being installed in a highly reduced space. <P>SOLUTION: This apparatus to spray and clean the gas to be cleaned has an inlet port 111 to introduce the gas to be cleaned, and a spray means 112 to spray cleaning treatment liquid. The apparatus comprises a spraying and cleaning device 110 to carry out a primary cleaning of the gas to be cleaned by spraying the cleaning treatment liquid thereto, an inlet port 141 which is arranged inside the spraying and cleaning device 110 and introduces the gas to be cleaned after the primary cleaning from the spraying and cleaning device 110, an outlet port 142 to exhaust the gas to be cleaned, a supply means 143 to supply the cleaning treatment liquid, a means 144 to promote gas-liquid contact which is arranged on a passage for the gas to be cleaned and promotes gas-liquid contact of the cleaning treatment liquid and the gas to be cleaned, and a contact cleaning device 140 to carry out secondary cleaning of the gas to be cleaned. <P>COPYRIGHT: (C)2004,JPO

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a gas cleaning device for efficiently cleaning a gas to be cleaned.

[0002]

2. Description of the Related Art For example, for treating exhaust gas or the like generated in an incinerator for incinerating waste, a cleaning device having a plurality of scrubbers connected in series as shown in FIG. 6 or 7 has been used.

FIG. 6 is a schematic diagram for explaining a first example of a gas cleaning device 800 in the prior art, which is a spray cleaning device 810, a turbulent flow contact absorption tower 820 and a packed tower 83.
And an induction draft fan 840 that forms a flow of exhaust gas as the cleaning gas.

The inlet 811 is connected to, for example, an exhaust port of an incinerator for incinerating waste (not shown) or an exhaust port of a combustion device for high temperature combustion of exhaust gas. The exhaust gas introduced into the spray cleaning device 810 through the introduction port 811 is rapidly cooled by the processing liquid sprayed from the processing liquid spraying device 812, and fly ash or the like present in the exhaust gas comes into contact with the processing liquid. It is then captured and temporarily stored as a mixture with the processing liquid at the bottom of the apparatus, and then discharged from the discharge port 819. The purpose of rapidly cooling the exhaust gas is to prevent the re-synthesis of dioxins due to the dioxin-producing substances contained in the exhaust gas.

The exhaust gas subjected to the primary treatment is introduced into the turbulent flow contact absorption tower 820 from the lower part, forms an upward flow, and is discharged from the upper part of the apparatus. On the exhaust gas passage, there are one or a plurality of net shelves 821 (FIG. 6) having a large number of exhaust gas passage holes (not shown) for passing exhaust gas from the lower part to the upper part.
, Two stages are provided, and a plurality of spherical bodies 822 are placed on the upper side of the net rack 821. The spherical body 822 is the processing liquid supply device 8 arranged at the upper part of the apparatus.
The surface is wetted by the treatment liquid sprayed from 23, and in this state, the exhaust gas flowing upward causes a floating / turbulent motion.
The exhaust gas passing through the turbulent flow contact absorption tower 820 is secondarily treated by gas-liquid contact with the treatment liquid in a turbulent flow state on the surface of the turbulent spherical body 822, whereby fly ash contained in the exhaust gas, The harmful gas and the like are removed, and the treatment liquid drops to the bottom of the apparatus and is then discharged from the discharge port 829.

The exhaust gas that has been subjected to the secondary treatment is the packed tower 830.
Will be introduced from below. The packed tower 830 includes a packing section 831 filled with a packing material (not shown) and a packing section 831.
A processing liquid supply device 832 for supplying the processing liquid from above is provided, and the surface of the filler is wet with the processing liquid sprayed from the processing liquid supply device 832. The exhaust gas passing through the packed tower 831 forms an upward flow, and is subjected to the third treatment by coming into gas-liquid contact with the treatment liquid on the surface of the filling material of the filling portion 831. As a result, fly ash, harmful gas, and the like contained in the exhaust gas fall to the bottom of the apparatus together with the processing liquid, and are then discharged from the discharge port 839. Then, the exhaust gas detoxified by the third treatment is discharged to the atmosphere via the draft fan 840.

However, in such a gas treatment device 800, the overall configuration of the device becomes large, and it is difficult to install it in a business office or the like having a relatively small site. In addition, the packed tower 830 may cause a pressure loss, resulting in a large decrease in the gas treatment amount. Therefore, a large packed tower was required.

FIG. 7 is a schematic diagram for explaining a second example of the gas cleaning device 900 in the prior art, which has a spray cleaning device 810 and packed towers 830 and 830.
Further, an induction draft fan 940 for forming a flow of exhaust gas as a cleaning gas is provided. The same components as those in FIG. 6 are designated by the same reference numerals and the description thereof will be omitted.

However, this gas cleaning device 900 is shown in FIG.
As shown in Fig. 2, since a plurality of packed towers 830 and 830 (two in this example) are connected in series, the overall configuration of the device becomes large, and should be installed, for example, in a business office with a relatively small site. Is difficult. In addition, since the packed column generally has a large pressure loss, the exhaust gas treatment efficiency becomes low, and in order to improve the treatment efficiency, a large packed tower is required, and the entire apparatus becomes even larger. In addition, the filling portion 831
Since the clogging occurs at this time, it is necessary to periodically perform maintenance such as eliminating the clogging, and the frequency of this maintenance increases in the case of a gas such as fly ash. Further, in the case of incineration fly ash containing highly toxic dioxins, maintenance work is difficult.

[0010]

SUMMARY OF THE INVENTION The present invention has been made in view of such a problem. The problem is that the gas to be cleaned can be efficiently cleaned and the installation can be performed in a significantly space-saving manner. It is to provide a gas cleaning device.

[0011]

In order to solve the above problems, the invention of a gas cleaning apparatus according to claim 1 comprises an inlet for introducing a gas to be cleaned and a treatment liquid spraying means for spraying a cleaning treatment liquid. A spray cleaning device section for performing a primary cleaning of the gas to be cleaned by spraying a cleaning treatment liquid on the gas to be cleaned, and a primary cleaning provided inside the spray cleaning apparatus section. An inlet for introducing the cleaned gas to be cleaned from the spray cleaning device section, an outlet for discharging the cleaned gas, a processing liquid supply unit for supplying a cleaning processing liquid, and a cleaning gas disposed on the flow path of the cleaned gas. And a contact cleaning device section for performing a secondary cleaning of the gas to be cleaned, which has a gas-liquid contact promoting means for promoting gas-liquid contact between the cleaning treatment liquid and the gas to be cleaned.

According to the gas cleaning apparatus of the present invention, the spray cleaning apparatus section for the primary cleaning of the cleaning gas and the contact cleaning apparatus section for the secondary cleaning of the cleaning gas are provided. Since the part has a gas-liquid contact promoting means for promoting gas-liquid contact between the cleaning liquid and the gas to be cleaned, it is possible to perform a cleaning process on a large flow rate of the gas to be cleaned by making a gas-liquid contact with high efficiency. it can. As a result, the cross section of the flow path of the gas to be cleaned can be made relatively small, so that even if the contact cleaning device section is provided inside the spray cleaning apparatus section, the primary cleaning by the spray cleaning apparatus section can be prevented. Almost no loss of function.

Further, since the contact cleaning device section for performing the secondary cleaning of the gas to be cleaned is disposed inside the spray cleaning apparatus section for performing the primary cleaning, the gas cleaning apparatus as a whole is downsized. It is possible and requires a small installation area.

Further, the invention of the gas cleaning apparatus according to claim 2 has an inlet for introducing the gas to be cleaned and a treatment liquid spraying means for spraying the cleaning treatment liquid, and the cleaning treatment liquid is supplied to the cleaning gas. A spray cleaning device section for performing a primary cleaning of the gas to be cleaned by spraying, a spray cleaning device section downstream of the spray cleaning apparatus section, and arranged inside the spray cleaning apparatus section. An inlet for introducing the cleaned gas to be cleaned from the spray cleaning device section, an outlet for discharging the gas to be cleaned, a processing liquid supply means for supplying a cleaning processing liquid, and a cleaning gas disposed on the flow path of the gas to be cleaned. A contact cleaning device section for carrying out a secondary cleaning of the gas to be cleaned, and a downstream side of the contact cleaning apparatus section having a gas-liquid contact promoting means for promoting gas-liquid contact between the cleaning treatment liquid and the gas to be cleaned. And is provided on the outer peripheral portion of the spray cleaning device, The cleaning treatment liquid in the filling portion, which has a filling portion arranged on the channel of the filling material and filled with the filling material, and a treatment liquid supply means for supplying the cleaning treatment liquid to the filling portion to wet the filling material. And a filling and cleaning device section for performing third cleaning of the gas to be cleaned by gas-liquid contact with the gas to be cleaned.

According to the gas cleaning apparatus of the present invention, the spray cleaning device section for performing the primary cleaning of the cleaning gas, the contact cleaning apparatus section for performing the secondary cleaning of the cleaning gas, and the first cleaning gas for the cleaning gas. Three
Since the contact cleaning apparatus section is provided with a filling cleaning apparatus section for performing the next cleaning, and the contact cleaning apparatus section has a gas-liquid contact promoting means for promoting the gas-liquid contact between the cleaning treatment liquid and the gas to be cleaned, the gas-liquid contact is highly efficient. By doing so, a large amount of gas to be cleaned can be cleaned. As a result, the cross section of the flow path of the gas to be cleaned can be made relatively small, so that even if the contact cleaning device section is provided inside the spray cleaning apparatus section, the primary cleaning by the spray cleaning apparatus section can be prevented. Almost no loss of function.

Further, the contact cleaning device portion for performing the secondary cleaning of the gas to be cleaned is disposed inside the spray cleaning device portion for performing the primary cleaning, and the filling cleaning device portion for performing the tertiary cleaning is sprayed. Since it is provided on the outer periphery of the cleaning device, the gas cleaning device can be downsized as a whole and requires a small installation area.

Further, the invention of a gas cleaning device according to a third aspect of the invention is to provide an inlet for introducing the gas to be cleaned, an outlet for discharging the gas to be cleaned, and a processing liquid supply means for supplying a cleaning processing liquid. A contact cleaning device portion that is disposed on the flow path of the gas to be cleaned and that has gas-liquid contact promoting means for promoting gas-liquid contact between the cleaning treatment liquid and the gas to be cleaned, and that performs the primary cleaning of the gas to be cleaned;
A filling part, which is arranged on the outer periphery of the contact cleaning device part, is arranged on the flow path of the gas to be cleaned and is filled with the filling material, and the cleaning treatment liquid is supplied to the filling part to supply the filling material. And a filling / cleaning device section for performing secondary cleaning of the gas to be cleaned by gas-liquid contact between the cleaning processing liquid and the gas to be cleaned in the filling section. Characterize.

According to the gas cleaning apparatus of the present invention, a contact cleaning apparatus section for performing the primary cleaning of the gas to be cleaned and a filling cleaning apparatus section for performing the secondary cleaning of the gas to be cleaned are provided. Since the part has a gas-liquid contact promoting means for promoting gas-liquid contact between the cleaning liquid and the gas to be cleaned, it is possible to perform a cleaning process on a large flow rate of the gas to be cleaned by making a gas-liquid contact with high efficiency. it can. Further, since the filling and cleaning device section for performing the secondary cleaning of the gas to be cleaned is disposed on the outer peripheral portion of the contact cleaning apparatus section for performing the primary cleaning, the gas cleaning apparatus as a whole can be downsized. It is possible and requires a small installation area.

The invention of a gas cleaning device according to a fourth aspect is the gas cleaning device according to any one of the first to third aspects,
The gas-liquid contact promoting means is provided with a plurality of spherical bodies which make a turbulent motion according to the flow of the gas to be cleaned.

According to the gas cleaning apparatus of the present invention, in the contact cleaning apparatus section, since the gas-liquid contact frequency between the gas to be cleaned and the cleaning treatment liquid increases due to the spherical body, unnecessary substances can be reliably captured and removed. be able to. Further, for example, since there is no clogging as in the case of treating the gas to be cleaned using a bag filter or a packed tower, the pressure loss due to the gas flow velocity is small, and the maintenance frequency such as eliminating clogging is extremely high. Can be reduced. Further, even if the gas flow velocity is increased, the turbulent motion of the spherical body becomes active along with the gas flow velocity, so that the gas-liquid contact frequency also increases. Therefore, it has a high cleaning treatment power and can always maintain stable and high cleaning efficiency. Further, since the cleaning efficiency is high as described above, a large amount of gas to be cleaned can be cleaned, and the apparatus can be downsized.

According to the invention of a gas cleaning device described in claim 5, in any one of claims 1 to 3,
The gas-liquid contact promoting means comprises a plurality of perforated plates provided with gas passage holes through which the gas to be cleaned passes.

According to the gas cleaning apparatus of the present invention, in the contact cleaning apparatus section, the perforated plate increases the frequency of gas-liquid contact between the gas to be cleaned and the cleaning treatment liquid, so that unwanted substances can be reliably captured and removed. be able to. In addition, since it is relatively unlikely to be clogged as in the case of treating a gas to be cleaned using a bag filter or a packed tower, for example, it is possible to reduce the maintenance frequency such as eliminating the clogging, and it is always stable. High cleaning efficiency can be maintained. Since the cleaning efficiency is high as described above, a large amount of gas to be cleaned can be cleaned, and the apparatus can be downsized.

[0023]

BEST MODE FOR CARRYING OUT THE INVENTION A gas cleaning apparatus of the present invention will be described below with reference to the drawings.

FIG. 1 is a schematic diagram of a first embodiment of a gas cleaning device 100 of the present invention. The arrow in the figure indicates the flow of the gas to be cleaned.

The gas cleaning apparatus 100 in this embodiment
Is mainly composed of a spray cleaning device section 110 for performing the first cleaning of the gas to be cleaned, a contact cleaning device section 140 disposed inside the spray cleaning device section 110 for performing the second cleaning, The suction induction device 170 for forming a flow in the gas to be cleaned is provided.

The spray cleaning device section 110 includes an inlet 111 for introducing a cleaning gas into the apparatus, and a processing liquid spraying device 1 as a processing liquid spraying unit for spraying a cleaning processing liquid onto the cleaning gas.
Have twelve. By the cleaning treatment liquid sprayed from the treatment liquid spraying device 112, unnecessary substances (for example, solid matter such as dust and dust and soluble gas for the cleaning treatment liquid) contained in the gas to be cleaned and harmful substances (incineration ash, dioxins). Such)
[Hereinafter, referred to as "unnecessary items, etc." ] Is captured and removed, and is dropped to the bottom of the apparatus together with the cleaning treatment liquid for primary cleaning. The cleaning treatment liquid containing the unnecessary substances and the like is temporarily stored in the bottom portion, and then discharged as the first discharged substance.
3 is discharged from the device. In some cases, the cleaning treatment liquid can be separated and recovered and recycled.

The contact cleaning device section 140 has an inlet 141 for introducing the cleaning gas, which has been primarily cleaned by the spray cleaning device section 110, into the spray cleaning device section 110 from the inside, and discharges the cleaning gas to the upper part. A discharge port 142 is formed. The introduction port 141 has an upper portion projecting laterally so that the cleaning treatment liquid sprayed from the treatment liquid spraying device 112 does not enter through the opening.

On the flow path of the gas to be cleaned flowing upward in the contact cleaning device section 140, a spherical body 144 is arranged as a gas-liquid contact promoting means. The spherical body 144 is placed on a net rack 145 having a plurality of ventilation holes (not shown) for passing the gas to be cleaned from the lower part to the upper part,
Processing liquid supply device 14 as processing liquid supply means above
The surface is wet with the cleaning treatment liquid sprayed from No. 3. The spherical body 144 can be made of, for example, a resin such as plastic, and is controlled so as to float / turbulently move by the upward flow gas to be cleaned.

Therefore, the gas to be cleaned passing through the contact cleaning device section 140 comes into gas-liquid contact with the cleaning treatment liquid in a highly turbulent state on the surface of the spherical body 144 which is turbulently moving in the device. As a result, unnecessary substances and the like contained in the gas to be cleaned are captured and removed by the cleaning treatment liquid, fall to the bottom of the apparatus together with the cleaning treatment liquid, and undergo secondary cleaning. The cleaning treatment liquid containing the unnecessary substances and the like is discharged as the second discharged substance from the discharge pipe 14
9 is discharged from the device. Further, the processed gas to be cleaned is discharged from the discharge port 142, and the suction guiding device 17
It is sucked toward 0 and released into the atmosphere. In some cases, the cleaning treatment liquid can be separated and recovered and recycled.

As described above, in the contact cleaning device section 140, the spherical body 144 increases the frequency of gas-liquid contact between the gas to be cleaned and the cleaning treatment liquid, so that unnecessary substances can be reliably captured and removed. Further, for example, since there is no clogging as in the case of treating the gas to be cleaned using a bag filter or a packed tower, the pressure loss due to the gas flow velocity is small, and the maintenance frequency such as eliminating clogging is extremely high. Can be reduced. Further, even if the gas flow velocity is increased, the turbulent motion of the spherical body 144 becomes active along with the gas flow velocity, so that the gas-liquid contact frequency also increases. Therefore, it has a high cleaning treatment power and can always maintain stable and high cleaning efficiency.

Since the cleaning efficiency is high as described above, a large amount of gas to be cleaned can be cleaned, and since the contact cleaning device section 140 is disposed inside the spray cleaning apparatus section 110, It is possible to reduce the size of the entire cleaning device.

In the contact cleaning device section 140, the flow rate of the gas to be cleaned and the flow rate of the gas to be cleaned can be adjusted by appropriately adjusting the number and size of the ventilation holes provided in the spherical body 144 or the net shelf 145, the number of installation stages of the spherical body 144 and the net shelf 145, and the like. Since the pressure loss can be controlled, it can be appropriately set according to the installation environment of the gas cleaning apparatus 100.

Any cleaning treatment liquid can be used without particular limitation as long as it can clean the gas to be cleaned. Although it can be appropriately set depending on the type of gas to be cleaned, for example, water, an alkaline solution, a liquid ceramic-containing solution, etc. can be exemplified. For example, when the gas to be cleaned contains an acidic component such as exhaust gas generated from an incinerator, it is preferable to use an alkaline solution.

Further, the gas-liquid contact promoting means is not limited to the above-mentioned spherical body, and for example, a plurality of perforated plates provided with gas passage holes through which the gas to be cleaned passes are provided on the flow path of the gas to be cleaned. By doing so, it is also possible to adopt a tray system that promotes gas-liquid contact between the cleaning treatment liquid flowing on the upper side of the perforated plate and the gas to be cleaned passing from the lower side of the perforated plate.

The gas cleaning apparatus 100 of this embodiment can be suitably used for cleaning the exhaust gas generated from an incinerator for incinerating waste. In this case, the exhaust gas introduced through the inlet 111 is the treatment liquid spraying device 112.
It is rapidly cooled by the cleaning treatment liquid sprayed from and is subjected to the primary cleaning as described above. That is, when a high-temperature gas such as exhaust gas (for example, 600 to 1200 ° C.) is subjected to cleaning treatment as a gas to be cleaned, the cleaning treatment liquid also functions as a cooling treatment liquid to efficiently cool the exhaust gas,
For example, re-synthesis of dioxins can be suppressed. In addition, when cleaning a high temperature gas, it is preferable that the vicinity of the inlet 111 be formed of a heat resistant member.

FIG. 2 is a schematic diagram of a second embodiment of the gas cleaning apparatus 200 of the present invention. Gas cleaning device 10 shown in FIG.
The same components as those of 0 are designated by the same reference numerals, and the description thereof will be omitted. Differences will be mainly described. The arrow in the figure indicates the flow of the gas to be cleaned.

The gas cleaning device 200 in this embodiment
Is mainly composed of a spray cleaning device section 110 for performing the first cleaning of the gas to be cleaned, a contact cleaning device section 140 disposed inside the spray cleaning device section 110 for performing the second cleaning, The spray cleaning device unit 110 is provided with a filling cleaning device unit 260 that is disposed on the outer periphery of the spray cleaning device unit 110 and performs a third cleaning, and a suction induction device 170 that forms a flow in the gas to be cleaned. Spray cleaning device section 110 and contact cleaning device 14
Since 0 is the same as that in FIG. 1, description thereof will be omitted.

The filling and cleaning device section 260 includes a filling section 261 filled with a filling material (not shown), and the filling section 26.
1 has a processing liquid supply device 262 as a processing liquid supply means for spraying the cleaning processing liquid from above to wet the filler.

The second treated gas to be cleaned is introduced from the lower portion of the filling and cleaning device section 260 and flows upward in the filling section 261. A baffle (not shown) is arranged inside the filling section 261 to prevent the nonuniform flow of the gas to be cleaned.
When the gas to be cleaned passes through the filling portion 261, unnecessary substances and the like are captured and removed by gas-liquid contact between the cleaning treatment liquid and the gas to be cleaned on the surface of the filler material wet with the cleaning treatment liquid, and the third cleaning is performed. It The cleaning treatment liquid containing this unnecessary substance is the third
Is discharged from the device by a discharge pipe (not shown) at the bottom of the device. Further, the processed gas to be cleaned is sucked toward the suction guide device 170 and released to the atmosphere. In some cases, the cleaning treatment liquid can be separated and recovered and recycled.

As described above, in the filling and cleaning apparatus section 260, the gas-liquid contact frequency between the gas to be cleaned and the cleaning treatment liquid is increased by the filler, so that unnecessary substances can be reliably captured and removed. Further, the filling and cleaning device section 260 is
Since it is provided on the downstream side of the spray cleaning device unit 110 and the contact cleaning device unit 140, the cleaning target gas to be cleaned is in a state of being cleaned to some extent, and a relatively small gas can be arranged. The degree of clogging is greatly improved. Therefore, it is possible to reduce the frequency of maintenance such as elimination of clogging.

Since the cleaning efficiency is high as described above, a large amount of gas to be cleaned can be cleaned, and the contact cleaning device section 140 is disposed inside the spray cleaning device section 110, and the filling cleaning device section is installed. Since 260 is provided on the outer peripheral portion of the spray cleaning device section 110, it is possible to reduce the size of the entire gas cleaning device.

In the contact cleaning device section 140, the flow rate and pressure of the gas to be cleaned can be adjusted by appropriately adjusting the number and size of the ventilation holes provided in the spherical body 144 or the net shelf 145, the number of installation stages of the spherical body 144 and the net shelf 145, and the like. Since the loss can be controlled, it can be appropriately set according to the installation environment of the gas cleaning apparatus 200.

Any cleaning treatment liquid can be used without particular limitation as long as it can clean the gas to be cleaned. Although it can be appropriately set depending on the type of gas to be cleaned, for example, water, an alkaline solution, a liquid ceramic-containing solution, etc. can be exemplified. For example, when the gas to be cleaned contains an acidic component such as exhaust gas generated from an incinerator, it is preferable to use an alkaline solution.

Further, the gas-liquid contact promoting means is not limited to the above-mentioned spherical body, and for example, a plurality of perforated plates having gas passage holes through which the gas to be cleaned passes are provided on the gas flow path to be cleaned. By doing so, it is also possible to adopt a tray system that promotes gas-liquid contact between the cleaning treatment liquid flowing on the upper side of the perforated plate and the gas to be cleaned passing from the lower side of the perforated plate.

The gas cleaning apparatus 200 of this embodiment can be suitably used for cleaning exhaust gas generated from an incinerator for incinerating waste, for example. In this case, the exhaust gas introduced through the inlet 111 is the treatment liquid spraying device 112.
It is rapidly cooled by the cleaning treatment liquid sprayed from and is subjected to the primary cleaning as described above. That is, when a high-temperature gas such as exhaust gas (for example, 600 to 1200 ° C.) is subjected to cleaning treatment as a gas to be cleaned, the cleaning treatment liquid also functions as a cooling treatment liquid to efficiently cool the exhaust gas,
For example, re-synthesis of dioxins can be suppressed. In addition, when cleaning a high temperature gas, it is preferable that the vicinity of the inlet 111 be formed of a heat resistant member.

FIG. 3 is a schematic diagram of a third embodiment of the gas cleaning apparatus 300 of the present invention. The arrow in the figure indicates the flow of the gas to be cleaned.

The gas cleaning device 300 in this embodiment
The main components are a contact cleaning device section 340 that performs a primary cleaning of the gas to be cleaned, and a filling cleaning apparatus section 360 that is disposed on the outer periphery of the contact cleaning apparatus section 340 and performs a secondary cleaning. And a suction induction device 370 for forming a flow in the gas to be cleaned.

The contact cleaning device section 340 has an inlet 341 for introducing the gas to be cleaned in the lower part and an outlet 342 for discharging the gas in the upper part. A spherical body 344 is disposed as a gas-liquid contact promoting means on the flow path of the upward flow gas to be cleaned. This spherical body 344 is placed on a net shelf 345 having a plurality of ventilation holes (not shown) for passing the gas to be cleaned from the lower part to the upper part, and is a processing liquid supply means above the processing liquid supply means. Supply device 343
The surface is wet with the cleaning solution sprayed from.
The spherical body 344 can be made of, for example, a resin such as plastic, and is controlled so as to float / turbulently move by the upward flow gas to be cleaned.

Therefore, the gas to be cleaned passing through the contact cleaning device section 340 comes into gas-liquid contact with the cleaning treatment liquid in a highly turbulent state on the surface of the spherical body 344 which is turbulently moving in the device. As a result, unnecessary substances and the like contained in the gas to be cleaned are captured and removed by the cleaning treatment liquid, undergoing primary cleaning, and fall to the bottom of the apparatus together with the cleaning treatment liquid. The cleaning treatment liquid containing the unnecessary substances and the like is discharged as the first discharge by the discharge pipe 34.
9 is discharged from the device. In some cases, the cleaning treatment liquid can be separated and recovered and recycled.

As described above, in the contact cleaning device section 340, the gas-liquid contact frequency between the gas to be cleaned and the cleaning treatment liquid is increased by the spherical body 344, so that it is possible to reliably capture and remove the unwanted substances and the like. Further, for example, since there is no clogging as in the case of treating the gas to be cleaned using a bag filter or a packed tower, the pressure loss due to the gas flow velocity is small, and the maintenance frequency such as eliminating clogging is extremely high. Can be reduced. Further, even if the gas flow velocity is increased, the turbulent motion of the spherical bodies 344 becomes active along with the gas flow velocity, so that the gas-liquid contact frequency also increases. Therefore, it has a high cleaning treatment power and can always maintain stable and high cleaning efficiency. Since the cleaning efficiency is high as described above, the device unit can be downsized.

In the contact cleaning device section 340, the flow rate of the gas to be cleaned and the flow rate of the gas to be cleaned can be adjusted by appropriately adjusting the number and size of the ventilation holes provided in the spherical body 344 or the mesh shelf 345, the number of installation stages of the spherical body 344 and the mesh shelf 345, and the like. Since the pressure loss can be controlled, it can be appropriately set according to the installation environment of the gas cleaning device 300.

The filling and cleaning device section 360 includes a filling section 361 filled with a filling material (not shown) and the filling section 36.
1 has a processing liquid supply device 362 as a processing liquid supply means for supplying the cleaning processing liquid from above to wet the filler.

The cleaning gas subjected to the primary treatment is introduced from the lower portion of the filling and cleaning device section 360 and flows upward in the filling section 361. A baffle (not shown) that prevents uneven flow of the gas to be cleaned is arranged inside the filling section 361.
When the gas to be cleaned passes through the filling portion 361, unnecessary substances and the like are captured and removed by the gas-liquid contact between the cleaning treatment liquid and the gas to be cleaned on the surface of the filler wetted with the cleaning treatment liquid, and the second cleaning is performed. It The cleaning treatment liquid containing this unnecessary substance is
Is discharged from the device by a discharge pipe (not shown) at the bottom of the device. Further, the processed gas to be cleaned is sucked toward the suction guide device 370 and released to the atmosphere. In some cases, the cleaning treatment liquid can be separated and recovered and recycled.

As described above, in the filling and cleaning device section 360, the gas-liquid contact frequency between the gas to be cleaned and the cleaning treatment liquid is increased by the filler, so that the unnecessary substances can be reliably captured and removed. Further, since the filling and cleaning apparatus section 360 is provided on the downstream side of the contact cleaning apparatus section 340, the cleaning target gas to be cleaned is in a state of being cleaned to some extent, and a relatively small one should be provided. In addition, the degree of clogging is greatly improved. Therefore, it is possible to reduce the frequency of maintenance such as elimination of clogging.

Since the cleaning efficiency is high as described above, a large amount of gas to be cleaned can be cleaned, and since the filling cleaning device section 360 is provided on the outer periphery of the contact cleaning apparatus section 340, the gas It is possible to reduce the size of the entire cleaning device.

Any cleaning treatment liquid can be used without particular limitation as long as it can clean the gas to be cleaned. Depending on the type of gas to be cleaned, for example, water, an alkaline solution, a liquid ceramic-containing solution, etc. can be exemplified.

FIG. 4 is a schematic diagram of the fourth embodiment of the gas cleaning apparatus 400 of the present invention. Gas cleaning device 30 shown in FIG.
The same components as those of 0 are designated by the same reference numerals, and the description thereof will be omitted. Differences will be mainly described. The arrow in the figure indicates the flow of the gas to be cleaned.

The gas cleaning device 400 in this embodiment
The main components are the contact cleaning device section 440 for performing the primary cleaning of the gas to be cleaned, and the filling cleaning apparatus section 360 arranged on the outer periphery of the contact cleaning apparatus section 440 for the secondary cleaning. And a suction induction device 370 for forming a flow in the gas to be cleaned. The filling and cleaning device section 360 is the same as that shown in FIG.

The contact cleaning device section 440 employs a gas cleaning system generally called a "tray system", and an inlet 441 for introducing the cleaning gas to the lower part and an exhaust port 442 for discharging the cleaning gas to the upper part. Are formed. A perforated plate 444 as a gas-liquid contact promoting means is disposed substantially horizontally on the flow path of the upward flow gas to be cleaned. This perforated plate 4
The reference numeral 44 is provided with gas vent holes (not shown) for passing the gas to be cleaned from the lower side to the upper side, and a predetermined amount of cleaning treatment is applied to the end portion on the side not locked to the inner wall of the apparatus. A dam plate 445 protruding upward is arranged so that the liquid can be temporarily stored on the upper side of the porous plate.

Treatment liquid supply device 4 as treatment liquid supply means
A predetermined amount of the cleaning treatment liquid supplied from 43 is temporarily stored on the upper side of the uppermost perforated plate, and the non-storable one falls down the treatment liquid descending path 446 and is retained on the upper side of each of the next and subsequent perforated plates. It As a result, the cleaning treatment liquid held on the upper side of the perforated plate 440 is brought into gas-liquid contact with the gas to be cleaned passing through the perforated plate 440 from the lower side.

Therefore, the gas to be cleaned passing through the contact cleaning device section 440 passes through the perforated plate 444 in the device to efficiently come into gas-liquid contact with the cleaning treatment liquid. This allows
Unwanted substances and the like contained in the gas to be cleaned are captured by the cleaning treatment liquid and subjected to the primary cleaning, and fall to the bottom of the apparatus together with the cleaning treatment liquid. The cleaning treatment liquid containing the unnecessary substances and the like is discharged from the device as a first discharge by the discharge pipe 449 at the bottom of the device. By always supplying the fresh cleaning treatment liquid by the treatment liquid supply device 443, the cleaning treatment liquid held on the upper side of the perforated plate 444 is always replaced with a new one, and a high cleaning treatment power can be maintained. .
In some cases, the cleaning treatment liquid can be separated and recovered and recycled.

As described above, in the contact cleaning device section 440, the perforated plate 444 increases the frequency of gas-liquid contact between the gas to be cleaned and the cleaning treatment liquid, so that unnecessary substances can be reliably captured and removed. In addition, there is almost no clogging as in the case of treating a gas to be cleaned using a bag filter or a packed tower, and the frequency of maintenance such as elimination of clogging can be reduced, and consistently high cleaning The efficiency can be maintained.

Since the cleaning efficiency is high as described above, a large amount of gas to be cleaned can be cleaned, and since the filling cleaning device section 360 is provided on the outer peripheral part of the contact cleaning apparatus section 440, gas cleaning is performed. It is possible to reduce the size of the entire device.

In this gas cleaning device 400, the flow rate and pressure loss of the gas to be cleaned can be controlled by appropriately adjusting the number of stages and the shape of the perforated plate 444, the passage area of the gas to be cleaned, etc. It can be appropriately set according to the installation environment of the cleaning device 400.

As the cleaning liquid, any gas can be used without particular limitation as long as the gas to be cleaned can be cleaned. Depending on the type of gas to be cleaned, for example, water, an alkaline solution, a liquid ceramic-containing solution, etc. can be exemplified.

[0066]

EXAMPLES Next, as an example of using the gas cleaning apparatus of the present invention, an embodiment of a treatment system for treating exhaust gas discharged from an incinerator and incinerated ash will be described. Here, FIG. 5 is a system diagram of the processing system 1 including the gas cleaning apparatus 100 of the present invention. This treatment system 1 can be suitably used particularly for treating exhaust gas containing dioxin and incineration ash.

The treatment system 1 has an exhaust gas inlet 3, which is an exhaust gas outlet 24 of the incinerator 2.
And toxic substances such as fly ash, toxic gases, heavy metals, etc.
It is called "fly ash, etc." ) Is introduced. An attracting draft fan 10 as a suction induction device is arranged near the air outlet 22 that releases the exhaust gas after processing to the atmosphere, and forms a flow from the exhaust gas inlet 3 of the exhaust gas to the air outlet 22. There is. Note that reference numeral 23 indicates a waste material input port for inputting waste material to the incinerator 2.

An exhaust gas combustion device 4 is arranged in the immediate vicinity of the exhaust gas inlet 3. The exhaust gas combustion device 4 has a combustion burner 4a and an exhaust gas retention chamber 4b, and retains the exhaust gas for a predetermined time while performing combustion processing in a temperature range in which the dioxins can be decomposed by the combustion burner 4a. As a result, incompletely burned substances and harmful substances contained in the exhaust gas are completely burned and decomposed, and dioxins are decomposed.

The exhaust gas combustion device 4 is a gas cleaning device 100.
Connected to. This gas cleaning device 100 is the same as that shown and described in FIG. 1, and therefore, the same components are designated by the same reference numerals and detailed description thereof will be omitted.

The processing liquid prepared in the external processing liquid tank 18 is transported by the pump P1 and the processing liquid spraying device 112 is used.
The treatment liquid is mixed with compressed air and supplied, and the treatment liquid is injected toward the exhaust gas, whereby the exhaust gas is rapidly cooled to a temperature range where dioxins cannot be recombined. At the same time, the fly ash and the like contained in the exhaust gas are captured by the treatment liquid and removed to be subjected to the primary cleaning, and fall to the bottom of the apparatus together with the treatment liquid. The processing liquid containing the fly ash and the like is the first discharge product, and the discharge product pipe 1 at the bottom of the apparatus.
It is discharged from the apparatus by 13 and processed by the agglomeration processing means described later.

The spray amount of the treatment liquid can be adjusted mainly from the viewpoint of the exhaust gas cooling effect, and the opening / closing degree of the valve 43 is adjusted while the temperature is monitored by the thermometer 41 provided in the spray cleaning device section 110. By doing so, it is appropriately set so that a sufficient cooling effect can be obtained.

In the spray cleaning device section 110,
By adjusting the pipe diameter in the vicinity of the inlet 111 into which the exhaust gas flows, a spiral circulation of the exhaust gas is generated in the upper part of the device so that the exhaust gas reaches the spray cleaning device part 110 from the upper part to the lower part. . At this time, fly ash and the like in the exhaust gas can be efficiently dropped to the bottom of the device by centrifugal force due to the so-called cyclone effect.

The treatment liquid supplied from the treatment liquid tank 18 to the spray cleaning device section 110 by the pump P1 is not particularly limited, but in the present embodiment, for example, water, an alkaline aqueous solution, a liquid ceramic-containing solution or the like can be used. The alkaline aqueous solution is preferable because it can neutralize the acidic components contained in the exhaust gas and suppress the resynthesis of dioxins. Further, the treatment liquid is supplied from the treatment liquid tank 18 to the settling tank 11 by the pump P2, and then supplied to the contact cleaning device section 140 described later by the pump P3.

The exhaust gas subjected to the primary treatment is introduced into the contact cleaning device section 140 and subjected to the secondary treatment as described above. That is, the exhaust gas undergoes turbulent movement in the device, and the net rack 14
On the surface of the spherical body 144 placed on No. 5, gas-liquid contact with the treatment liquid under a highly turbulent state. As a result, fly ash and the like contained in the exhaust gas are captured and removed by the treatment liquid, and fall to the bottom of the apparatus together with the treatment liquid for secondary cleaning. The treatment liquid containing the fly ash or the like is discharged from the device as a second discharge by the discharge discharge pipe 149 at the bottom of the device and processed by the agglomeration processing means described later. Although the exhaust gas may contain sulfur oxides and nitrogen oxides, these oxides are desulfurized and denitrated by being captured and removed by the treatment liquid. Then, the exhaust gas that has been secondarily treated and rendered harmless is discharged into the atmosphere from the atmosphere discharge port 22 via the attracting draft fan 10.

In this contact cleaning device section 140, the flow rate of the gas to be cleaned and the flow rate of the gas to be cleaned can be adjusted by appropriately adjusting the number and size of the ventilation holes provided in the spherical body 144 or the net shelf 145, the number of installation stages of the spherical body 144 and the net shelf 145, and the like. Since the pressure loss can be controlled, it can be appropriately set according to the installation environment of the gas cleaning apparatus 100.

Since the exhaust gas is rapidly cooled in the spray cleaning device section 110, the specific volume of the exhaust gas to be cleaned is greatly reduced.
The size of 40 can be reduced. As described above, the gas cleaning apparatus 100 of the present invention can be suitably used when the specific volume changes greatly in the treatment process.

Further, in the contact cleaning device section 140, the frequency of gas-liquid contact between the exhaust gas and the treatment liquid is increased by the spherical body 144, so fly ash and the like can be reliably captured and removed. Further, since there is no clogging as in the case of treating the gas to be cleaned using a bag filter or a packed tower, the frequency of maintenance such as elimination of clogging can be extremely reduced. Further, even if the exhaust gas flow rate is increased, the turbulent motion of the spherical body 144 becomes active along with the gas flow rate, so that the gas-liquid contact frequency also increases. Therefore, it has a high cleaning treatment power and can always maintain stable and high cleaning efficiency.

On the other hand, from the incinerator 2, the spray cleaning device section 110 and the contact cleaning device section 140, the incineration ash containing fly ash such as dioxins, the first discharge and the second discharge are discharged. Is discharged.

Second discharged from the contact cleaning device section 140
The discharge part of the is a polluted liquid in which fly ash or the like and the treatment liquid are mixed as described above, and is transferred to the precipitation separation tank 11. The second effluent transferred to the precipitation separation tank 11 has a fly ash component settled in the precipitation separation tank 11 due to the difference in specific gravity, and the treatment liquid and the fly ash are separated. The supernatant liquid is circulated and reused as the treatment liquid by the pump P3 to the contact cleaning device section 140 after the alkalinity is adjusted. As a result, the precipitation separation tank 11 has a function of separating and circulating the treatment liquid, and the treatment liquid can be used efficiently.

On the other hand, the fly ash separated and settled is transferred from the lower part of the settling / separation tank 11 to the slurry tank 13 and is temporarily stored therein. Then, it is conveyed to the stirring tank 14 by the pump P5. Further, in order to adjust the sludge viscosity at the time of mixing the first discharge discharged from the spray cleaning device section 110 via the discharge discharge pipe 113, to the stirring tank 14. Processing liquid is processing liquid tank 1
It is turned on from 9 by a pump P6.

The treatment liquid is stirred from the treatment liquid tank 19 to the stirring tank 14
The feeding pipe 29 for supplying to the above is disposed so as to extend to the bottom portion of the stirring tank 14, and when a feeding pressure is generated by the pump P6, the stirring tank 14 is turbulently stirred to generate the first discharge. The product, the second effluent and the treatment liquid can be mixed by stirring.

The mixture sufficiently stirred and mixed in the stirring tank 14 is rotated by a pump P7 in a rotary granulator 15 (so-called,
Granulator). Also, this granulator 15
The incineration ash generated in the incinerator 2 is charged into the exhaust gas through the discharge port 25. Then, the granulator 15 processes and forms the mixture and the incinerated ash into spherical pellets as a lump.

The pellets are used in the screw feeder 1
It is conveyed by 6 and is charged into the rotary kiln 17 from the charging port 30. The rotary kiln 17 as a secondary incinerator decomposes dioxins by burning a pellet containing fly ash such as dioxins in a temperature range where harmful substances are burned and decomposed, and decomposes the decomposed products. It is included in the exhaust gas and discharged to detoxify the pellets.

The rotary kiln 17 has a combustion burner 34 and a cylindrical combustion chamber 35 which is rotatable. The combustion chamber 35 includes a pellet charging port 30 to a pellet discharging port 33.
It is arranged to incline downward toward. With such a configuration, the pellets charged from the pellet charging port 30 are transferred to the pellet discharging port 33 while rolling in the rotating combustion chamber 35 for a predetermined time, and are burned by the combustion burner 34 during that time. At this time, the combustion chamber 3
By adjusting the rotation speed of No. 5, the residence time of the pellet in the combustion chamber 35, that is, the combustion time is adjusted. Then, the burned and detoxified pellets are discharged from the pellet discharge port 33 to the outside of the processing system 1.

The second exhaust gas produced by the pellet combustion in the combustion chamber 35 contains harmful substances such as dioxins decomposed products decomposed by the combustion process.
This second exhaust gas may cause re-synthesis of dioxins.

Therefore, the exhaust port 32 for the second exhaust gas is
The exhaust gas inlet 3 and the exhaust gas feedback pipe 36 described above
Connected by. Therefore, the second exhaust gas generated by the combustion of the pellets is subjected to cleaning treatment in the gas cleaning device 100 similarly to the exhaust gas generated from the incinerator 2 described above, and then released into the atmosphere. Therefore, it is not necessary to separately provide an exhaust gas processing device for processing the second exhaust gas, and it is possible to efficiently perform a cleaning process on all the exhaust gas generated in the processing system 1.

As described above, the treatment system 1 can treat harmful substances such as dioxins, fly ash, and incineration ash generated in the incinerator 2 in the closed system of the treatment system 1. Therefore, only the detoxified exhaust gas and incineration substance (lump) can be discharged from this treatment system 1.

[0088]

According to the present invention, since the cleaning liquid and the gas to be cleaned can be efficiently brought into gas-liquid contact with each other, a large flow rate of the gas to be cleaned can be cleaned. In addition, the gas cleaning device as a whole can be downsized, and thus can be installed in a significantly space-saving manner.

[Brief description of drawings]

FIG. 1 is a schematic view of a first embodiment of a gas cleaning device of the present invention.

FIG. 2 is a schematic view of a second embodiment of the gas cleaning device of the present invention.

FIG. 3 is a schematic view of a third embodiment of the gas cleaning device of the present invention.

FIG. 4 is a schematic view of a fourth embodiment of the gas cleaning device of the present invention.

FIG. 5 is a system diagram of a processing system including the gas cleaning device of the present invention.

FIG. 6 is a schematic diagram for explaining a first example of a gas cleaning device in the related art.

FIG. 7 is a schematic diagram for explaining a second example of the gas cleaning device in the related art.

[Explanation of symbols]

1 processing system 2 incinerator 3 Exhaust gas inlet 4 Combustion device 10 Attract draft fan 11 settling tank 13 Slurry tank 14 stirring tank 15 granulator 16 screw feeder 17 Rotary Kiln 18, 19 Processing liquid tank 22 Atmosphere outlet 23 Waste input port 24 Exhaust gas exhaust port 29 feeding pipe 30 Pellet input port 32 Second exhaust gas outlet 33 Pellet outlet 34 combustion burner 35 Combustion chamber 36 Exhaust gas feedback pipe 41 Thermometer 100,200,300,400 gas cleaning equipment 110 Spray cleaning unit 111 inlet 112 Treatment liquid spraying device 113 Discharge pipe 140,340 Contact cleaning device section 141 Inlet 142 outlet 143, 343 Treatment liquid supply device 144,344 spherical bodies 145,345 net rack 149,349 Emission pipe 170,370 suction induction device 260,360 Filling and cleaning device section 261,361 filling section 262,362 Treatment liquid supply device 341 Inlet 342 outlet 440 Contact cleaning device section 441 inlet 442 outlet 443 Treatment liquid supply device 444 Perforated plate 445 dam plate 446 Processing liquid descending path 449 Emission pipe

   ─────────────────────────────────────────────────── ─── Continued front page    (71) Applicant 599140460             Masakatsu Yamada             1-15-1 Mori, Isogo-ku, Yokohama-shi, Kanagawa             No. 211 No. 1 Isogo Heights (72) Inventor Koji Araki             805-4, Kushibikicho, Omiya City, Saitama Prefecture (72) Inventor Nakamura Etsuko             2-8-4 Toyohama, Nishi-ku, Fukuoka City, Fukuoka Prefecture (72) Inventor Shota Yamada             Kanagawa Prefecture Fujisawa City Yen Line 1-1-3 Surpass             Fujisawa Shonandai No. 2 402 (72) Inventor Masakatsu Yamada             1-15-1 Mori, Isogo-ku, Yokohama-shi, Kanagawa             No. 211 No. 1 Isogo Heights F-term (reference) 4D002 AA21 AC04 BA02 BA14 CA01                       CA02 CA07 CA09 CA13 DA01                       DA12 DA35 DA70 EA03                 4D020 AA08 BA01 BA23 BA30 BB03                       CB08 CB12 CB18 CB25 CC06                       CD02                 4G075 AA03 AA37 BB04 BD13 BD22                       BD23 DA02 EB01 EB04 EB09                       EC01 EE05

Claims (5)

[Claims] 1. A primary cleaning of a gas to be cleaned by having an inlet for introducing a gas to be cleaned and a treatment liquid spraying means for spraying a cleaning treatment liquid, and spraying the cleaning treatment liquid onto the gas to be cleaned. Spray cleaning device part, an inlet provided inside the spray cleaning device part for introducing the primary cleaning target cleaning gas from the spray cleaning device part, and discharging the cleaning gas. An outlet, a processing liquid supply means for supplying a cleaning processing liquid, and a gas-liquid contact promoting means arranged on the flow path of the gas to be cleaned for promoting gas-liquid contact between the cleaning processing liquid and the gas to be cleaned, Second gas to be cleaned
A gas cleaning device, comprising: a contact cleaning device section for subsequent cleaning. 2. A first cleaning of the gas to be cleaned by having an inlet for introducing the gas to be cleaned and a treatment liquid spraying means for spraying the cleaning treatment liquid, and spraying the cleaning treatment liquid onto the gas to be cleaned. And a spray cleaning device section that is located downstream of the spray cleaning device section and inside the spray cleaning apparatus section. An inlet for introducing, an outlet for discharging the gas to be cleaned, a processing liquid supply means for supplying the cleaning liquid, and a gas-liquid contact between the cleaning liquid and the gas to be cleaned which is arranged on the flow path of the gas to be cleaned. A gas-liquid contact promoting means for promoting the
A contact cleaning device section for performing the next cleaning, and a downstream side of the contact cleaning apparatus section, and is arranged on the outer periphery of the spray cleaning apparatus section, and is arranged on the flow path of the gas to be cleaned, and the filler is It has a filling part that is filled and a processing liquid supply means that supplies the cleaning treatment liquid to the filling part to wet the filling material, and by the gas-liquid contact between the cleaning treatment liquid and the gas to be cleaned in the filling part. A gas cleaning device, comprising: a filling and cleaning device section that performs a third cleaning of the gas to be cleaned. 3. An inlet for introducing the gas to be cleaned, an outlet for discharging the gas to be cleaned, a processing liquid supply means for supplying the cleaning liquid, and a cleaning liquid disposed on the flow path of the gas to be cleaned. And a to-be-cleaned gas, and a gas-liquid contact promoting means for promoting the gas-liquid contact between the gas and the to-be-cleaned gas. And a filling portion which is arranged on the flow path of the gas to be cleaned and filled with the filling material, and a treatment liquid supply means which supplies the cleaning treatment liquid to the filling portion to wet the filling material. A gas cleaning device, comprising: a filling and cleaning device section for performing secondary cleaning of the gas to be cleaned by gas-liquid contact between the cleaning treatment liquid and the gas to be cleaned. 4. The gas-liquid contact promoting means according to claim 1, wherein the gas-liquid contact promoting means is provided with a plurality of spherical bodies which make turbulent movements in accordance with the flow of the gas to be cleaned. Gas scrubber. 5. The gas-liquid contact promoting means according to claim 1, further comprising a plurality of perforated plates provided with gas passage holes through which the gas to be cleaned passes. Characteristic gas cleaning device.