JP2003321800A - Electrolytic polishing method - Google Patents

Electrolytic polishing method

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Publication number
JP2003321800A
JP2003321800A JP2002128772A JP2002128772A JP2003321800A JP 2003321800 A JP2003321800 A JP 2003321800A JP 2002128772 A JP2002128772 A JP 2002128772A JP 2002128772 A JP2002128772 A JP 2002128772A JP 2003321800 A JP2003321800 A JP 2003321800A
Authority
JP
Japan
Prior art keywords
metal wire
electrolytic solution
container
electrolytic
counter electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2002128772A
Other languages
Japanese (ja)
Inventor
Hideshi Yamaguchi
秀史 山口
Toshihisa Anazawa
俊久 穴澤
Yuji Kataoka
祐治 片岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2002128772A priority Critical patent/JP2003321800A/en
Publication of JP2003321800A publication Critical patent/JP2003321800A/en
Withdrawn legal-status Critical Current

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  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electrolytic polishing method by which the sticking of generated bubbles on an article to be electrolytically polished can be reduced. <P>SOLUTION: The tip of a metal wire is immersed into an electrolytic solution from a lower surface of the electrolytic solution, and a counter electrode is brought into contact with the electrolytic solution. Thereafter, the tip of the metal wire is electrolytically polished by applying voltage between the metal wire and the counter electrode and passing a current through the electrolytic solution. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、電解研磨方法に関
し、特に金属線に尖鋭な先端を形成する電解研磨方法に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electropolishing method, and more particularly to an electropolishing method for forming a sharp tip on a metal wire.

【0002】[0002]

【従来の技術】尖鋭な先端を有する金属線が要求される
場合がある。例えば、走査型トンネル電子顕微鏡(ST
M)における解像度は、探針の先端の形状に大きく依存
する。先端の曲率半径が小さければ小さいほど解像度が
良くなる。理想的には、1原子程度の大きさが望まし
い。その他、原子間力顕微鏡の探針や、電界放射型電子
銃のカソードに尖鋭な先端を有する金属線が要求され
る。
BACKGROUND OF THE INVENTION Sometimes a metal wire with a sharp tip is required. For example, scanning tunneling electron microscope (ST
The resolution in M) largely depends on the shape of the tip of the probe. The smaller the radius of curvature of the tip, the better the resolution. Ideally, a size of about 1 atom is desirable. In addition, a probe of an atomic force microscope and a metal wire having a sharp tip are required for the cathode of a field emission electron gun.

【0003】尖鋭な先端を有する金属線を作成する方法
として、一般的に電解研磨が良く用いられている。従来
技術による電解研磨方法を図面を参照して説明する。図
5(A)に示すように、容器9内に電解液2を収容し、
例えば電解液2の表面層に環状電極3を浸す。
As a method of producing a metal wire having a sharp tip, electrolytic polishing is generally well used. A conventional electrolytic polishing method will be described with reference to the drawings. As shown in FIG. 5 (A), the electrolytic solution 2 is contained in the container 9,
For example, the annular electrode 3 is immersed in the surface layer of the electrolytic solution 2.

【0004】探針の材料となる金属線1の先端を環状電
極3で囲まれた液面内に1mm程度浸す。金属線1は、
例えば径0.1〜0.3mmの白金、白金−イリジウム
合金、タングステン等の線である。電解液2として、探
針材料との組合わせにより塩化カルシウム水溶液、シア
ン化化合物水溶液、アルカリ金属水酸化物水溶液、無機
酸等が用いられる。金属線1と環状電極3の間に電源4
から電圧を印加し、電解研磨を行う。電流検出器5で電
解研磨時の電流の変化を検出し、電流変化に基づいて電
源4の印加電圧を切り、電解研磨を終了させる。
The tip of the metal wire 1 which is the material of the probe is immersed in the liquid surface surrounded by the annular electrode 3 for about 1 mm. Metal wire 1
For example, a wire of platinum, platinum-iridium alloy, tungsten or the like having a diameter of 0.1 to 0.3 mm. As the electrolytic solution 2, a calcium chloride aqueous solution, a cyanide compound aqueous solution, an alkali metal hydroxide aqueous solution, an inorganic acid or the like is used in combination with the probe material. Power supply 4 between metal wire 1 and ring electrode 3
Voltage is applied to perform electrolytic polishing. The current detector 5 detects a change in current during electropolishing, and based on the change in current, the voltage applied to the power source 4 is turned off, and electropolishing is terminated.

【0005】電解研磨は、電解液2中に浸された金属線
1の先端を蝕刻する。電解液2と接触する金属線1の表
面積が減少するにつれ、電流は減少する。電解液2と接
触する金属線1の表面が蝕刻され尽くすと、電流は0と
なる。
In electropolishing, the tip of the metal wire 1 immersed in the electrolytic solution 2 is etched. The current decreases as the surface area of the metal wire 1 in contact with the electrolyte solution 2 decreases. When the surface of the metal wire 1 in contact with the electrolytic solution 2 is completely etched, the current becomes zero.

【0006】図5(B)に示すように、電流が0になる
前後に印加電圧を切ることにより、金属線1先端に尖鋭
な突起を残す。探針材料となる金属線の種類によって、
電解液の種類と濃度、環状電極の材質、印加電圧の大き
さと波形、電解研磨の終了条件等を選択する。
As shown in FIG. 5B, the applied voltage is cut off before and after the current becomes 0, so that a sharp projection is left at the tip of the metal wire 1. Depending on the type of metal wire used as the probe material,
The type and concentration of the electrolytic solution, the material of the annular electrode, the magnitude and waveform of the applied voltage, the electrolytic polishing termination conditions, etc. are selected.

【0007】所望の形状を有する探針を効率良く作成す
るためには、電解研磨を再現性良く実効できることが望
まれる。電解研磨の様相がその度に変化しては、再現性
良い電解研磨は困難である。
In order to efficiently manufacture a probe having a desired shape, it is desired that electrolytic polishing can be performed with good reproducibility. If the aspect of electrolytic polishing changes each time, electrolytic polishing with good reproducibility is difficult.

【0008】図5(C)に示すように、電解研磨に伴
い、電解液2は電気分解され、金属線1及び環状電極3
の表面から気泡6が発生する。気泡6は互いに接触する
と、結合した大きな気泡を形成し得る。
As shown in FIG. 5C, the electrolytic solution 2 is electrolyzed by the electrolytic polishing, and the metal wire 1 and the annular electrode 3 are formed.
Bubbles 6 are generated from the surface of the. When the bubbles 6 come into contact with each other, they can form large bubbles that are bound together.

【0009】図5(D)に示すように、電解液表面8で
気泡6が互いに結合すると、大気泡7へと成長すること
がある。大気泡7は金属線1に吸着して気泡部分での電
解研磨を妨げる。大気泡がどんどん成長していき、最終
的には破裂消滅する。この時、電解研磨の電流は、大気
泡7の成長と共に減少して行き、大気泡7の消滅により
元の値に戻る。大気泡7の発生は、電解研磨中に不規則
に生じるために、探針ごとの電解研磨反応の履歴が異な
り、尖鋭な探針を歩留まり良く作成することが困難であ
った。
As shown in FIG. 5D, when the bubbles 6 are bonded to each other on the surface 8 of the electrolytic solution, they sometimes grow into large bubbles 7. The large bubbles 7 adsorb to the metal wire 1 and hinder the electrolytic polishing in the bubble portion. Large bubbles grow steadily and eventually burst and disappear. At this time, the electropolishing current decreases with the growth of the large bubbles 7, and returns to the original value due to the disappearance of the large bubbles 7. Since the large bubbles 7 are irregularly generated during the electropolishing, the history of the electropolishing reaction differs for each probe, and it is difficult to produce a sharp probe with high yield.

【0010】特許第2965180号は、電解液の液面
形状に変化を与えることを提案している。図6に示すよ
うに、環状電極3を電解液2に浸した後、環状電極3を
持ち上げる。表面張力により、電解液2の液面8は、環
状電極3と共にもち上がる。図に示すように環状電極3
の内部では中心部分に向って下方に下がった液面が形成
される。金属線1の電解研磨に伴って発生する気泡6
は、上方に浮上するが、液面8に勾配が形成されている
ため、金属1の近傍から環状電極3の方向に向って移動
する。このため、気泡が探針材料に吸着してエッチング
に支障をきたすことが無いと説明されている。
Japanese Patent No. 2965180 proposes to change the liquid surface shape of the electrolytic solution. As shown in FIG. 6, after the annular electrode 3 is immersed in the electrolytic solution 2, the annular electrode 3 is lifted. Due to the surface tension, the liquid surface 8 of the electrolytic solution 2 rises together with the annular electrode 3. Ring electrode 3 as shown
Inside, the liquid surface is formed that is lowered downward toward the central portion. Bubbles 6 generated by electrolytic polishing of the metal wire 1
Flies upward, but moves toward the annular electrode 3 from the vicinity of the metal 1 because the liquid surface 8 has a gradient. Therefore, it is described that the bubbles do not stick to the probe material and hinder the etching.

【0011】本発明者等は、この方法を実施しようとし
たが、良好に実施することは容易でなかった。大気泡の
発生を簡単、確実に防止でき、制御性良い電解研磨を行
なうことのできる電解研磨方法が望まれる。
The present inventors tried to carry out this method, but it was not easy to carry out it well. There is a demand for an electrolytic polishing method that can easily and surely prevent the generation of large bubbles and can perform electrolytic polishing with good controllability.

【0012】[0012]

【発明が解決しようとする課題】本発明の目的は、金属
線の端部に尖鋭な先端を制御性良く形成することのでき
る電解研磨方法を提供することである。
SUMMARY OF THE INVENTION It is an object of the present invention to provide an electrolytic polishing method capable of forming a sharp tip at the end of a metal wire with good controllability.

【0013】本発明の他の目的は、発生する気泡が電解
研磨対象物に付着することを減少した電解研磨方法を提
供することである。
Another object of the present invention is to provide an electropolishing method in which bubbles generated are reduced from adhering to an electropolishing object.

【0014】[0014]

【課題を解決するための手段】本発明の1観点によれ
ば、電解液の下面から、金属線の先端を電解液中に浸
し、対向電極を前記電解液に接触させ、前記金属線と前
記対向電極との間に電圧を印加し、電解液を介して電流
を流すことにより、前記金属線の先端を電解研磨する電
解研磨方法が提供される。
According to one aspect of the present invention, from the lower surface of the electrolytic solution, the tip of the metal wire is dipped in the electrolytic solution to bring the counter electrode into contact with the electrolytic solution, and the metal wire and the There is provided an electrolytic polishing method for electrolytically polishing the tip of the metal wire by applying a voltage between the counter electrode and a current flowing through the electrolytic solution.

【0015】[0015]

【発明の実施の形態】図1(A)は、本発明の実施例に
よる電解研磨方法を示す概略断面図である。容器9a
は、倒立した状態で示している。容器9aは、ガラス、
合成樹脂などの絶縁性材料で形成され、約10mm程度
の内径と一端部20の開口とを有し、底部30に対向電
極10aを備えている。容器9aに例えば塩化カルシウ
ム水溶液の電解液2を収容し、開口を下向きにして固定
する。容器9aの底は密閉して塞がれているため、容器
の開口を下向きにしても電解液2は落下しない。
1A is a schematic sectional view showing an electrolytic polishing method according to an embodiment of the present invention. Container 9a
Indicates an inverted state. The container 9a is glass,
It is made of an insulating material such as synthetic resin, has an inner diameter of about 10 mm and an opening at one end 20, and has a counter electrode 10a at the bottom 30. The electrolytic solution 2 of, for example, an aqueous solution of calcium chloride is stored in the container 9a and fixed with the opening facing downward. Since the bottom of the container 9a is hermetically closed, the electrolytic solution 2 does not drop even if the opening of the container faces downward.

【0016】このように、一端が開放した容器内に電解
液を収容し、大気圧、又は大気圧と表面張力の作用を利
用し、開口を下方にしつつ電解液を容器内に保持するこ
とができる。電解液に、露出した下面が形成される。電
解研磨対象物を電解液の下面から電解液中に浸すことが
可能となる。
As described above, the electrolytic solution is contained in the container having one end opened, and the electrolytic solution can be held in the container while keeping the opening downward by utilizing the atmospheric pressure or the action of the atmospheric pressure and the surface tension. it can. An exposed lower surface is formed in the electrolytic solution. It becomes possible to immerse the electrolytic polishing object in the electrolytic solution from the lower surface of the electrolytic solution.

【0017】金属線は、開口中に挿入することが可能
な、直径0.1〜0.5mm程度の金属線である。例え
ば、直径0.15mmの白金−イリジウム合金(白金9
0%−イリジウム10%)線を用いる。金属線1を下方
から、例えば垂直に、電解液2の露出した下面7中に浸
し、約1mm程電解液中に侵入させる。
The metal wire is a metal wire having a diameter of about 0.1 to 0.5 mm which can be inserted into the opening. For example, a platinum-iridium alloy (platinum 9
0% -iridium 10%) line is used. The metal wire 1 is dipped from below, for example, vertically into the exposed lower surface 7 of the electrolytic solution 2 and penetrates into the electrolytic solution by about 1 mm.

【0018】この状態で、金属線1と対向電極10aと
を配線L1、L2、L3を用いて電源4及び電流検出器
5に接続する。電源4から金属線1、対向電極10a間
に電圧を印加し、電解液2を介して電流を例えば直流
状、交流状、もしくはパルス状に流す。電解液2中を電
流が流れることにより、電解液2は電気分解され、金属
線1の先端が電解研磨される。電流検出器5は、流れる
電流を検出する。電流変化をモニターし、所望の時点で
電流を遮断する。このようにして金属線1先端の電解研
磨を行う。
In this state, the metal wire 1 and the counter electrode 10a are connected to the power source 4 and the current detector 5 using the wires L1, L2 and L3. A voltage is applied between the metal wire 1 and the counter electrode 10a from the power source 4, and a current is caused to flow through the electrolytic solution 2, for example, in the form of direct current, alternating current, or pulse. When an electric current flows through the electrolytic solution 2, the electrolytic solution 2 is electrolyzed and the tip of the metal wire 1 is electropolished. The current detector 5 detects the flowing current. Monitor the current change and shut off the current at the desired time. In this way, the electrolytic polishing of the tip of the metal wire 1 is performed.

【0019】電解研磨中金属線1の表面から発生する気
泡6は、浮力に従って上方に向う。すなわち、下方から
電解液2中に挿入した金属線1の表面には吸着せず、気
泡は金属線1表面から離れて上方に向う。容器9aの上
部に気泡が集積し、気相空間が形成されても対向電極1
0aは電解液2と十分な接触面積を保つように配置され
ている。
Bubbles 6 generated from the surface of the metal wire 1 during electrolytic polishing are directed upward due to buoyancy. That is, the bubbles are not adsorbed on the surface of the metal wire 1 inserted into the electrolytic solution 2 from below, and the bubbles move upward away from the surface of the metal wire 1. Even if air bubbles are accumulated in the upper part of the container 9a and a gas phase space is formed, the counter electrode 1
0a is arranged so as to maintain a sufficient contact area with the electrolytic solution 2.

【0020】なお、対向電極10aは、容器9aの底部
に埋め込む必要は無く、電解液2と接触する場所であれ
ばどこに設けても良い。例えば、容器9aの中間部に破
線10bで示すように対向電極を設けてもよい。また、
対向電極10aは、金属栓の直上以外の位置に設けるこ
とが好ましい。金属栓から上昇する気泡6が対向電極1
0aに吸着して流れる電流を減少させる可能性を低減す
ることができる。
The counter electrode 10a does not have to be embedded in the bottom of the container 9a, and may be provided at any place where it comes into contact with the electrolytic solution 2. For example, a counter electrode may be provided in the middle portion of the container 9a as shown by the broken line 10b. Also,
The counter electrode 10a is preferably provided at a position other than directly above the metal stopper. Bubble 6 rising from the metal stopper is the counter electrode 1
It is possible to reduce the possibility of reducing the current flowing by adsorbing to 0a.

【0021】気泡は、電解液中で浮力を有するため、必
ず電解液中を上方に向って移動する。電解研磨する金属
線を電解液の上方から侵入させると、金属線の下端近傍
で発生する気泡は、上方に移動する際に金属線1の側壁
に触れ、吸着することが避け難い。多くの気泡が結合す
ると大気泡が発生してしまう。金属線1を電解液2の下
方から侵入させれば、上昇する気泡は金属線1の表面に
吸着することが少ない。
Since bubbles have buoyancy in the electrolytic solution, they always move upward in the electrolytic solution. When the metal wire to be electrolytically polished is introduced from above the electrolytic solution, it is unavoidable that the bubbles generated near the lower end of the metal wire come into contact with the side wall of the metal wire 1 and are adsorbed when moving upward. Large bubbles are generated when many bubbles are combined. If the metal wire 1 is made to enter from below the electrolytic solution 2, rising bubbles are less likely to be adsorbed on the surface of the metal wire 1.

【0022】このため、大気泡が発生する可能性も小さ
く、気泡6によって電解研磨が妨げられることが減少す
る。従って、制御性良く金属線1の端部に尖鋭な先端を
形成することができる。
Therefore, the possibility that large bubbles are generated is small, and the electrolytic polishing is prevented from being hindered by the bubbles 6. Therefore, a sharp tip can be formed at the end of the metal wire 1 with good controllability.

【0023】図1(B)は、対向電極の変形例を示す。
容器9aの開放端近傍に、環状電極10cが設けられて
いる。金属線1は、環状電極10cの画定する空間内に
向って挿入される。図1(A)に示す実施例同様、金属
線1表面に気泡が吸着される可能性を減少させることが
できる。この構成によれば、金属線1表面から発生する
気泡が、対向電極10cと電解液2の接触面積を減少さ
せることも防止できる。
FIG. 1B shows a modification of the counter electrode.
An annular electrode 10c is provided near the open end of the container 9a. The metal wire 1 is inserted toward the space defined by the annular electrode 10c. Similar to the embodiment shown in FIG. 1A, it is possible to reduce the possibility that bubbles are adsorbed on the surface of the metal wire 1. According to this configuration, it is possible to prevent bubbles generated from the surface of the metal wire 1 from decreasing the contact area between the counter electrode 10c and the electrolytic solution 2.

【0024】図1(C)は、容器のさらなる変形例を示
す。容器9bは、両端20、30が開放している。上端
30は大径部を形成し、下端20が小径部を形成してい
る。小径部は、容器9b内に電解液2を収容した時、電
解液が流下しない寸法、形状に選択されている。
FIG. 1C shows a further modification of the container. Both ends 20, 30 of the container 9b are open. The upper end 30 forms a large diameter portion, and the lower end 20 forms a small diameter portion. The small-diameter portion is selected to have a size and shape such that the electrolytic solution does not flow down when the electrolytic solution 2 is contained in the container 9b.

【0025】図に示した形状においては、容器9bは下
端20から一定距離小径部が形成され、階段状に径を拡
大して大径部へと連続している。大径部の下端に環状電
極10dが設けられている。この構成を用いても、図1
(A)に示す実施例と同様、金属線表面から発生する気
泡が金属線1表面に吸着せず、上方に向うため、電解研
磨を制御性良く行なうことができる。
In the shape shown in the figure, the container 9b is formed with a small diameter portion at a constant distance from the lower end 20, and the diameter is stepwise enlarged to be continuous with the large diameter portion. An annular electrode 10d is provided at the lower end of the large diameter portion. Even with this configuration, FIG.
Similar to the embodiment shown in (A), bubbles generated from the surface of the metal wire are not adsorbed on the surface of the metal wire 1 and face upward, so that electrolytic polishing can be performed with good controllability.

【0026】対向電極10dも金属線1の延在方向から
側方に大きく離れた位置に配置されており、対向電極1
0dから発生する気泡が金属線1表面に吸着する可能性
は著しく低く、金属線1表面から発生する気泡が対向電
極10dに吸着する可能性も著しく低い。
The counter electrode 10d is also arranged at a position largely separated laterally from the extending direction of the metal wire 1.
The possibility that the bubbles generated from 0d will be adsorbed on the surface of the metal wire 1 is extremely low, and the possibility that the bubbles generated from the surface of the metal wire 1 will be adsorbed to the counter electrode 10d is also extremely low.

【0027】図1(D)は、さらなる変形例を示す。容
器9cは、上部に小径開口21と大径開口22を有し、
底部30が密閉した瓶形状である。小径開口21は、容
器9c内に電解液2を収容し、倒立させても電解液2が
流下しない寸法、形状に選択されている。大径開口22
は、電解液2を注入するのに適した形状を有し、栓11
aで塞ぐことができる。栓11aは、対向電極10eが
表面に形成され、リード部分が栓11aを貫通して外部
に引き出されている。
FIG. 1D shows a further modified example. The container 9c has a small diameter opening 21 and a large diameter opening 22 at the top,
The bottom portion 30 has a closed bottle shape. The small-diameter opening 21 is selected in such a size and shape that the electrolytic solution 2 does not flow down even if the electrolytic solution 2 is housed in the container 9c and inverted. Large diameter opening 22
Has a shape suitable for injecting the electrolytic solution 2, and the stopper 11
It can be closed with a. A counter electrode 10e is formed on the surface of the plug 11a, and a lead portion penetrates the plug 11a and is drawn to the outside.

【0028】容器9c内に電解液2を収容し、大径開口
22を栓11aで塞ぎ、容器2を倒立させて図の状態と
する。小径開口21に電解液の下面7が露出する。金属
線1を小径開口21に露出された電解液の下面7から電
解液中に浸す。金属線1、対向電極10e間に電圧を印
加して電解研磨を行う。前述の実施例同様、金属線1表
面で発生する気泡は、金属線表面に吸着することが少な
い。
The electrolytic solution 2 is contained in the container 9c, the large-diameter opening 22 is closed by the plug 11a, and the container 2 is inverted to obtain the state shown in the drawing. The lower surface 7 of the electrolytic solution is exposed in the small-diameter opening 21. The metal wire 1 is immersed in the electrolytic solution from the lower surface 7 of the electrolytic solution exposed in the small-diameter opening 21. Electrolytic polishing is performed by applying a voltage between the metal wire 1 and the counter electrode 10e. As in the above-described embodiment, bubbles generated on the surface of the metal wire 1 are less likely to be adsorbed on the surface of the metal wire.

【0029】図1(A)〜(D)に示した実施例におい
ては、電解液に露出した下面7が形成され、この露出し
た下面7中に電解研磨する金属線1を下方から侵入させ
る。従って、金属線1表面から発生する気泡は上方に移
動するに従って金属線1表面から離れ、金属線1表面に
吸着することが少ない。図1(A)、(B)において
は、一端は閉じ、他端が開放した筒状容器を用い、主に
大気圧によって電解液を容器中に保持している。図1
(C)、(D)においては、容器の上端は開放しても密
閉してもよい。小径開口21中の電解液2は、主に表面
張力によって保持されている。
In the embodiment shown in FIGS. 1A to 1D, the lower surface 7 exposed to the electrolytic solution is formed, and the metal wire 1 to be electrolytically polished penetrates into the exposed lower surface 7 from below. Therefore, the bubbles generated from the surface of the metal wire 1 separate from the surface of the metal wire 1 as they move upward, and are less likely to be adsorbed on the surface of the metal wire 1. In FIGS. 1A and 1B, a cylindrical container having one end closed and the other end open is used, and the electrolytic solution is held in the container mainly by atmospheric pressure. Figure 1
In (C) and (D), the upper end of the container may be open or closed. The electrolytic solution 2 in the small-diameter opening 21 is retained mainly by surface tension.

【0030】走査型トンネル顕微鏡や原子間力顕微鏡で
探針を用いる場合、探針は探針固定冶具に保持されてい
る。冶具に結合した状態で金属線の電解研磨を行うこと
もできる。尚、治具は絶縁性とする。
When the probe is used in a scanning tunneling microscope or an atomic force microscope, the probe is held by a probe fixing jig. It is also possible to carry out electrolytic polishing of a metal wire in a state of being connected to a jig. The jig is insulative.

【0031】図2(A)は、本発明の他の実施例による
電解研磨方法を示す概略断面図である。容器9dは両端
23、32が開放した筒状容器である。金属線1を冶具
12に固定し、冶具12表面から1mm程度突出させ
る。容器9dの一端23を、金属線1を固定した冶具2
で塞ぐ。容器9d内に電解液2を収容し、上方から対向
電極10を電解液2中に接触させる。電源4から対向電
極10、金属線1間に電流を流し、流れる電流を電流検
出器5で検出し、電解研磨を行う。
FIG. 2A is a schematic sectional view showing an electrolytic polishing method according to another embodiment of the present invention. The container 9d is a cylindrical container with both ends 23 and 32 open. The metal wire 1 is fixed to the jig 12, and projected from the surface of the jig 12 by about 1 mm. A jig 2 in which one end 23 of the container 9d is fixed to the metal wire 1
Close with. The electrolytic solution 2 is housed in the container 9d, and the counter electrode 10 is brought into contact with the electrolytic solution 2 from above. A current is caused to flow from the power source 4 between the counter electrode 10 and the metal wire 1, the flowing current is detected by the current detector 5, and electrolytic polishing is performed.

【0032】本実施例においては、図1(A)に示す実
施例の露出した電解液下面7の代りに金属線を固定した
冶具を用い、電解液の下面から金属線を電解液中に挿入
している。対向電極10は、電解液2の上方より電解液
中に挿入されている。その他の点は、図1(A)に示し
た実施例と同様である。
In this embodiment, a jig having a fixed metal wire is used instead of the exposed lower surface 7 of the electrolytic solution of the embodiment shown in FIG. 1A, and the metal wire is inserted into the electrolytic solution from the lower surface of the electrolytic solution. is doing. The counter electrode 10 is inserted into the electrolytic solution from above the electrolytic solution 2. The other points are the same as those of the embodiment shown in FIG.

【0033】図2(B)は、図1(C)に示す実施例の
露出した電解液下面7の代りに金属線1を固定した冶具
12を用いる。対向電極10fは、環状電極であり、上
方から電解液2中に侵入されている。その他の点は、図
1(C)に示した実施例と同様である。
In FIG. 2B, a jig 12 to which the metal wire 1 is fixed is used instead of the exposed electrolytic solution lower surface 7 of the embodiment shown in FIG. 1C. The counter electrode 10f is an annular electrode and penetrates into the electrolytic solution 2 from above. Other points are the same as those of the embodiment shown in FIG.

【0034】なお、金属線を固定した冶具12を用い
て、図1(B)、図1(D)に示すような電解研磨を行
うことも可能であることは当業者に自明であろう。これ
らの態様においても、図1(A)〜(D)に示した実施
例同様、金属線表面で発生する気泡は金属線表面に吸着
することが少ない。
It will be apparent to those skilled in the art that the electropolishing as shown in FIGS. 1B and 1D can be performed by using the jig 12 to which the metal wire is fixed. Also in these modes, as in the examples shown in FIGS. 1A to 1D, bubbles generated on the metal wire surface are less likely to be adsorbed on the metal wire surface.

【0035】図3(A)〜(C)は、本発明のさらに他
の実施例を示す概略断面図である。図3(A)に示すよ
うに、内径が5mm程度で、両端23、32が開放した
筒状容器9dの一端32を蓋14で塞ぎ、容器9d内に
電解液2を中途まで収容する。金属線1を固定した栓1
3を用い、容器9dの他端23の開口を塞ぎ、金属線1
先端を電解液2中に約1mm程度侵入させる。電解液表
面と栓13との間には、気相空間14が形成されてい
る。
FIGS. 3A to 3C are schematic sectional views showing still another embodiment of the present invention. As shown in FIG. 3 (A), one end 32 of a cylindrical container 9d having an inner diameter of about 5 mm and open at both ends 23, 32 is closed with a lid 14 to accommodate the electrolytic solution 2 in the container 9d halfway. Stopper 1 with metal wire 1 fixed
3, the opening of the other end 23 of the container 9d is closed, and the metal wire 1
The tip is penetrated into the electrolytic solution 2 by about 1 mm. A vapor phase space 14 is formed between the surface of the electrolytic solution and the plug 13.

【0036】図3(B)に示すように、容器9dを上下
反転させ、金属線1を固定した栓13を下方に配置す
る。電解液2上方に形成されていた気相空間14は、栓
13から離れず、そのままの位置に保持される。
As shown in FIG. 3 (B), the container 9d is turned upside down, and the stopper 13 to which the metal wire 1 is fixed is placed below. The gas phase space 14 formed above the electrolytic solution 2 is not separated from the stopper 13 and is held at the position as it is.

【0037】従って、金属線1の先端が電解液2と接触
する長さは変わらない。栓13から突出した金属線1の
根元部分は、気相空間14で包まれ、電解液2には接触
しない。次に、上方に配置された蓋14を除去する。
Therefore, the length of contact of the tip of the metal wire 1 with the electrolytic solution 2 does not change. The root portion of the metal wire 1 protruding from the plug 13 is wrapped in the gas phase space 14 and does not come into contact with the electrolytic solution 2. Next, the lid 14 arranged above is removed.

【0038】図3(C)に示すように、上方から対向電
極10を電解液2中に侵入させ、電解液2と接触させ
る。この状態で対向電極10と金属線1とを電源4及び
電流検出器5に接続し、電解研磨を行なう。電解研磨は
上述の実施例と同様に行われる。金属線1表面から発生
する気泡は、上方に移動して、金属線1表面に吸着する
ことが少ない。気相空間に包まれていた金属線部分は電
解研磨されないため、その部分をその後の取り扱いで把
持することができ、金属線の取り扱いが容易となる。
As shown in FIG. 3C, the counter electrode 10 is inserted into the electrolytic solution 2 from above and brought into contact with the electrolytic solution 2. In this state, the counter electrode 10 and the metal wire 1 are connected to the power source 4 and the current detector 5, and electrolytic polishing is performed. The electropolishing is carried out in the same way as in the above-mentioned embodiment. The bubbles generated from the surface of the metal wire 1 rarely move upward and are adsorbed on the surface of the metal wire 1. Since the metal wire portion surrounded by the vapor phase space is not electrolytically polished, the metal wire portion can be gripped by the subsequent handling, and the metal wire can be easily handled.

【0039】図3(D)は、容器9dの変形例を示す。
容器9dは、一端23が小径開放部を形成し、他端32
が大径開放部を形成している。小径開放部を金属線を固
定した栓で塞ぎ、上方から対向電極を侵入させる。容器
9dの下部を小径とすることにより、気相空間の保持を
確実にすることができる。容器9dの上方部を大径とす
ることにより、気泡が結合し、大気泡が形成される可能
性を低減することができる。
FIG. 3D shows a modified example of the container 9d.
One end 23 of the container 9d forms a small-diameter open portion, and the other end 32
Forms a large diameter open part. The small-diameter open portion is closed with a stopper to which a metal wire is fixed, and the counter electrode is inserted from above. By keeping the lower portion of the container 9d small in diameter, it is possible to reliably hold the gas phase space. By making the upper portion of the container 9d to have a large diameter, it is possible to reduce the possibility that bubbles are combined and large bubbles are formed.

【0040】図4は、本発明の他の実施例を説明するた
めの概略断面図である。容器9eは、一端35が開放し
た筒状容器であり、底面には金属線1が固定されてい
る。先ず、容器9eに絶縁性液体15を注入し、金属線
1の上端が約1mm程度絶縁性液体15の表面から上方
に露出するようにする。例えば、絶縁性液体として4塩
化炭素を用いることができる。
FIG. 4 is a schematic sectional view for explaining another embodiment of the present invention. The container 9e is a cylindrical container with one end 35 opened, and the metal wire 1 is fixed to the bottom surface. First, the insulating liquid 15 is poured into the container 9e so that the upper end of the metal wire 1 is exposed above the surface of the insulating liquid 15 by about 1 mm. For example, carbon tetrachloride can be used as the insulating liquid.

【0041】次に、容器9e内に電解液2を収容する。
絶縁性液体15は、電解液2よりも比重が高く、かつ電
解液2と混和しないものを選ぶ。従って、絶縁性液体1
5は容器9eの底部に配置された状態を保つ。金属線1
は、その上端のみが電解液2中に侵入している。栓13
から突出した金属線1の根元部分は、絶縁性液体15に
包まれている。
Next, the electrolytic solution 2 is placed in the container 9e.
The insulating liquid 15 has a higher specific gravity than the electrolytic solution 2 and is immiscible with the electrolytic solution 2. Therefore, the insulating liquid 1
5 keeps the state arranged at the bottom of the container 9e. Metal wire 1
Has penetrated into the electrolyte solution 2 only at its upper end. Stopper 13
The root portion of the metal wire 1 protruding from is covered with the insulating liquid 15.

【0042】上方より対向電極10を電解液2中に接触
させ、電源4から電流を流し、電解研磨を行う。電解液
2に接触している金属線1が電解研磨される。絶縁性液
体15に浸っている金属線1の根元部分においては電解
研磨は行われず、金属線1は蝕刻されない。このように
して、金属線1の先端部のみに電解研磨を行うことがで
きる。なお、対向電極、容器形状等は種々に選択するこ
とができる。
The counter electrode 10 is brought into contact with the electrolytic solution 2 from above, and a current is supplied from the power source 4 to carry out electrolytic polishing. The metal wire 1 in contact with the electrolytic solution 2 is electropolished. Electrolytic polishing is not performed on the root portion of the metal wire 1 which is immersed in the insulating liquid 15, and the metal wire 1 is not etched. In this way, electrolytic polishing can be performed only on the tip of the metal wire 1. The counter electrode, the container shape, etc. can be selected in various ways.

【0043】絶縁性液体は、4塩化炭素に限らず、絶縁
性で電解液中で浮上せず、電解液と混和しないものであ
れば種々のものを利用することができる。例えば、4塩
化炭素以外のハロゲン化炭化水素やゾル状、ゲル状の物
質でも構わない。金属線1の絶縁性液体に浸っていた部
分は電解研磨されないため、その部分をその後の取り扱
いで把持することができ、金属線の取り扱いが容易とな
る。
The insulating liquid is not limited to carbon tetrachloride, and various liquids can be used as long as they are insulating, do not float in the electrolytic solution, and are immiscible with the electrolytic solution. For example, a halogenated hydrocarbon other than carbon tetrachloride or a sol-like or gel-like substance may be used. Since the portion of the metal wire 1 that was immersed in the insulating liquid is not electropolished, the portion can be gripped by subsequent handling, and the metal wire can be handled easily.

【0044】以上実施例に従って本発明を説明したが、
本発明はこれらに限定されるものではない。例えば種々
の変更、改良、組合わせが可能なことは当業者に自明で
あろう。
The present invention has been described above according to the embodiments.
The present invention is not limited to these. For example, it will be apparent to those skilled in the art that various modifications, improvements, and combinations can be made.

【0045】なお、本発明の特徴を以下に記載する。 (付記1) 電解液の下面から、金属線の先端を電解液
中に浸し、対向電極を前記電解液に接触させ、前記金属
線と前記対向電極との間に電圧を印加し、電解液を介し
て電流を流すことにより、前記金属線の先端を電解研磨
する電解研磨方法。
The features of the present invention will be described below. (Supplementary Note 1) From the lower surface of the electrolytic solution, the tip of the metal wire is immersed in the electrolytic solution, the counter electrode is brought into contact with the electrolytic solution, and a voltage is applied between the metal wire and the counter electrode to remove the electrolytic solution. An electropolishing method of electropolishing the tip of the metal wire by passing an electric current therethrough.

【0046】(付記2) 前記対向電極を前記金属線の
直上以外の位置に配置する付記1記載の電解研磨方法。 (付記3) 内部に前記対向電極を備え、電解液の落下
を防止できる開口を有する容器中に、前記電解液を収容
する工程と、前記開口を下にして前記電解液に前記開口
で露出した液面を形成させ、下方から前記金属線の先端
を前記露出した液面に浸す工程と、を含む付記1または
2記載の電解研磨方法。
(Supplementary Note 2) The electrolytic polishing method according to Supplementary Note 1, wherein the counter electrode is arranged at a position other than directly above the metal wire. (Supplementary Note 3) A step of accommodating the electrolytic solution in a container having the counter electrode therein and having an opening capable of preventing the electrolytic solution from falling, and exposing the electrolytic solution with the opening facing downward through the opening. 3. The electrolytic polishing method according to appendix 1 or 2, further comprising: forming a liquid surface, and immersing the tip of the metal wire in the exposed liquid surface from below.

【0047】(付記4) 前記容器が、一端が開放し、
他端が閉じた筒状容器である付記1〜3のいずれか1項
記載の電解研磨方法。 (付記5) 前記容器が、1端に前記開口を形成する小
径部を有し、他端に前記小径部より径が大きい大径部を
有する付記1〜3のいずれか1項記載の電解研磨方法。
(Supplementary Note 4) One end of the container is opened,
4. The electrolytic polishing method according to any one of appendices 1 to 3, which is a cylindrical container having the other end closed. (Supplementary note 5) The electrolytic polishing according to any one of Supplementary notes 1 to 3, wherein the container has a small diameter portion that forms the opening at one end and a large diameter portion that has a larger diameter than the small diameter portion at the other end. Method.

【0048】(付記6) 前記容器が、前記開口を形成
する小径開口と、栓で塞ぐことができ、前記小径開口よ
り径の大きい大径開口とを有する付記1〜3のいずれか
1項記載の電解研磨方法。
(Supplementary Note 6) The supplementary note 1 to any one of Supplementary Notes 1 to 3, wherein the container has a small-diameter opening forming the opening and a large-diameter opening that can be closed with a plug and has a larger diameter than the small-diameter opening. Electrolytic polishing method.

【0049】(付記7) 両端が開放した筒状容器の一
端を前記金属線を貫通させた冶具を用いて封じる工程
と、前記筒状容器を前記一端を下にして配置し、上方か
ら前記電解液を前記筒状容器内に収容する工程と、前記
対向電極を前記電解液に接触させる工程と、を含む付記
1又は2記載の電解研磨方法。
(Supplementary Note 7) A step of sealing one end of a cylindrical container having open both ends by using a jig having the metal wire penetrating, the cylindrical container being arranged with the one end facing downward, and the electrolysis from above. 3. The electropolishing method according to appendix 1 or 2, including a step of housing a liquid in the cylindrical container, and a step of bringing the counter electrode into contact with the electrolytic solution.

【0050】(付記8) 両端が開放した筒状容器の一
端を第1の栓でふさぎ、前記一端を下方にして前記筒状
容器内に前記電解液を収容する工程と、前記金属線を貫
通させた第2の栓を用いて、前記電解液に前記金属線の
先端を浸し、かつ前記電解液上方に気相を残すように前
記筒状容器の他端を塞ぐ工程と、前記一端が上方になる
ように前記筒状容器を反転させ、前記第1の栓を取り去
る工程と、前記対向電極を前記電解液に接触させる工程
とを含み、前記筒状容器の他端と前記電解液とが前記他
端の気相を保持するように選択されている付記1または
2記載の電解研磨方法。
(Supplementary Note 8) A step of closing one end of a cylindrical container having open both ends with a first stopper and placing the electrolytic solution in the cylindrical container with the one end facing downward, and penetrating the metal wire A step of immersing the tip of the metal wire in the electrolytic solution and closing the other end of the cylindrical container so as to leave a gas phase above the electrolytic solution by using the second stopper that has been set; And the step of contacting the counter electrode with the electrolytic solution, the other end of the cylindrical container and the electrolytic solution 3. The electropolishing method according to appendix 1 or 2, which is selected so as to maintain the vapor phase at the other end.

【0051】(付記9) 前記金属線が底面に固定され
ている容器に、絶縁性で前記電解液と混和せず、前記電
解液より比重の高い液体を収容し、前記金属線の先端の
みを前記電解液上方に露出させる工程と、前記液体の上
に前記電解液を収容する工程と、を含む付記1または2
記載の電解研磨方法。
(Supplementary Note 9) In a container in which the metal wire is fixed to the bottom surface, a liquid that is insulative and immiscible with the electrolyte solution and has a higher specific gravity than the electrolyte solution is stored, and only the tip of the metal wire is stored. Appendix 1 or 2 including a step of exposing the electrolyte solution above the electrolyte solution and a step of accommodating the electrolyte solution above the liquid solution
The electrolytic polishing method described.

【0052】(付記10) 前記液体が4塩化炭素であ
る付記9記載の電解研磨方法。
(Supplementary Note 10) The electrolytic polishing method according to Supplementary Note 9, wherein the liquid is carbon tetrachloride.

【0053】[0053]

【発明の効果】以上説明したように、本発明によれば、
電界研磨により発生する気泡が研磨対象の材料表面上に
吸着することを効率的に防止することができる。
As described above, according to the present invention,
It is possible to effectively prevent bubbles generated by electropolishing from adsorbing on the surface of the material to be polished.

【0054】制御性良く電解研磨を行うことができる。Electrolytic polishing can be performed with good controllability.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の実施例による電解研磨方法を説明す
るための概略断面図である。
FIG. 1 is a schematic cross-sectional view for explaining an electrolytic polishing method according to an embodiment of the present invention.

【図2】 本発明の他の実施例による電解研磨方法を説
明するための概略断面図である。
FIG. 2 is a schematic cross-sectional view for explaining an electrolytic polishing method according to another embodiment of the present invention.

【図3】 本発明のさらに他の実施例による電解研磨方
法を説明するための概略断面図である。
FIG. 3 is a schematic cross-sectional view for explaining an electrolytic polishing method according to still another embodiment of the present invention.

【図4】 本発明の別の実施例による電解研磨方法を説
明するための概略断面図である。
FIG. 4 is a schematic cross-sectional view for explaining an electrolytic polishing method according to another embodiment of the present invention.

【図5】 従来技術による電解研磨方法を説明するため
の概略断面図である。
FIG. 5 is a schematic cross-sectional view for explaining an electrolytic polishing method according to a conventional technique.

【図6】 従来技術による他の電解研磨方法を説明する
ための概略断面図である。
FIG. 6 is a schematic cross-sectional view for explaining another electrolytic polishing method according to the related art.

【符号の説明】[Explanation of symbols]

1 金属線 2 電解液 4 電源 5 電流検出器 6 気泡 7 (電解液の)下面 9 容器 10 対向電極 11 栓 12 冶具 13 栓 14 蓋 L リード 1 metal wire 2 Electrolyte 4 power supply 5 Current detector 6 bubbles 7 Lower surface (of electrolyte) 9 containers 10 Counter electrode 11 stoppers 12 jigs 13 stopper 14 Lid L lead

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) B23H 9/08 B23H 9/08 C25F 3/00 C25F 3/00 C (72)発明者 片岡 祐治 神奈川県川崎市中原区上小田中4丁目1番 1号 富士通株式会社内 Fターム(参考) 3C059 AA02 AB01 GC01 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) B23H 9/08 B23H 9/08 C25F 3/00 C25F 3/00 C (72) Inventor Yuji Kataoka Kawasaki, Kanagawa Prefecture 4-1-1 Kamiodanaka, Nakahara-ku, Yokohama F-Term inside Fujitsu Limited (reference) 3C059 AA02 AB01 GC01

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 電解液の下面から、金属線の先端を電解
液中に浸し、対向電極を前記電解液に接触させ、前記金
属線と前記対向電極との間に電圧を印加し、電解液を介
して電流を流すことにより、前記金属線の先端を電解研
磨する電解研磨方法。
1. From the lower surface of the electrolytic solution, the tip of the metal wire is immersed in the electrolytic solution, the counter electrode is brought into contact with the electrolytic solution, and a voltage is applied between the metal wire and the counter electrode. An electrolytic polishing method in which the tip of the metal wire is electrolytically polished by passing an electric current therethrough.
【請求項2】 前記対向電極を前記金属線の直上以外の
位置に配置する請求項1記載の電解研磨方法。
2. The electrolytic polishing method according to claim 1, wherein the counter electrode is arranged at a position other than directly above the metal wire.
【請求項3】 内部に前記対向電極を備え、電解液の落
下を防止できる開口を有する容器中に、前記電解液を収
容する工程と、前記開口を下にして前記電解液に前記開
口で露出した液面を形成させ、下方から前記金属線の先
端を前記露出した液面に浸す工程と、を含む請求項1ま
たは2記載の電解研磨方法。
3. A step of accommodating the electrolytic solution in a container having the counter electrode therein and having an opening capable of preventing the electrolytic solution from falling, and exposing the electrolytic solution to the electrolytic solution with the opening facing downward. 3. The electrolytic polishing method according to claim 1, further comprising the step of: forming a liquid surface of the metal wire and immersing the tip of the metal wire in the exposed liquid surface from below.
【請求項4】 前記容器が、一端が開放し、他端が閉じ
た筒状容器である請求項1〜3のいずれか1項記載の電
解研磨方法。
4. The electrolytic polishing method according to claim 1, wherein the container is a cylindrical container having one end open and the other end closed.
【請求項5】 前記容器が、1端に前記開口を形成する
小径部を有し、他端に前記小径部より径が大きい大径部
を有する請求項1〜3のいずれか1項記載の電解研磨方
法。
5. The container according to claim 1, wherein the container has a small diameter portion that forms the opening at one end and a large diameter portion that has a diameter larger than the small diameter portion at the other end. Electropolishing method.
JP2002128772A 2002-04-30 2002-04-30 Electrolytic polishing method Withdrawn JP2003321800A (en)

Priority Applications (1)

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Country Link
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009202320A (en) * 2008-02-29 2009-09-10 Naotake Mori Method and device for manufacturing minute tool
JP2011072563A (en) * 2009-09-30 2011-04-14 Terumo Corp Method of manufacturing long body for medical use
KR101786378B1 (en) 2016-08-23 2017-10-18 주식회사 포스코 Vertical type electroysis apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009202320A (en) * 2008-02-29 2009-09-10 Naotake Mori Method and device for manufacturing minute tool
JP2011072563A (en) * 2009-09-30 2011-04-14 Terumo Corp Method of manufacturing long body for medical use
KR101786378B1 (en) 2016-08-23 2017-10-18 주식회사 포스코 Vertical type electroysis apparatus
WO2018038430A1 (en) * 2016-08-23 2018-03-01 주식회사 포스코 Vertical electrolytic device

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