JP2003321798A - Method and apparatus for electrical treatment such as electroplating - Google Patents

Method and apparatus for electrical treatment such as electroplating

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Publication number
JP2003321798A
JP2003321798A JP2000401301A JP2000401301A JP2003321798A JP 2003321798 A JP2003321798 A JP 2003321798A JP 2000401301 A JP2000401301 A JP 2000401301A JP 2000401301 A JP2000401301 A JP 2000401301A JP 2003321798 A JP2003321798 A JP 2003321798A
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JP
Japan
Prior art keywords
substance
electrolytic
electrode
reaction
state
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000401301A
Other languages
Japanese (ja)
Other versions
JP3703132B2 (en
Inventor
Hideo Yoshida
英夫 吉田
Seizo Miyata
清蔵 宮田
Masato Sone
正人 曽根
Fumiko Iwao
文子 岩尾
Yoshihiro Asai
美博 浅井
Hiroshige Asai
大恵 浅井
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Individual
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Individual
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Priority to JP2000401301A priority Critical patent/JP3703132B2/en
Priority to AU2001275795A priority patent/AU2001275795A1/en
Priority to EP01953331.4A priority patent/EP1314799B1/en
Priority to PCT/JP2001/006525 priority patent/WO2002016673A1/en
Priority to US10/070,516 priority patent/US6793793B2/en
Priority to TW090120725A priority patent/TW588119B/en
Publication of JP2003321798A publication Critical patent/JP2003321798A/en
Application granted granted Critical
Publication of JP3703132B2 publication Critical patent/JP3703132B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and apparatus for electrical treatment such as electroplating which is suitably used for example, for the electrical treatment such as electroplating and in which each process is safely and reasonably performed using super critical or subcritical carbon dioxide, and carbon dioxide, a treating liquid and the like after being used are safely, reasonably and rapidly treated, the quantity of a pickling solution, a plating solution or the like to be used is reduced, the waste water produced by the plating is decreased and recycled to prevent the environmental pollution to improve the working environment and the productivity, the throwing power of the plating is remarkably improved and fine finish is attained. <P>SOLUTION: A super critical or subcritical state is formed in a reaction vessel 1 housing electrolytic materials and an electrolyte solution. An electrode material 3 is electrolyzed under the critical state or subcritical state or the electrolyzed electrode material and/or the electrolytic materials contained in the electrolyte solution are deposited and stuck on the other electrode material 4. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、例えば電気メッキ
等の電気化学的処理に好適で、超臨界または亜臨界二酸
化炭素を用いて、各処理工程を安全で合理的かつ速やか
に行なえ、使用後の二酸化炭素および処理溶液等を合理
的かつ迅速に処理するとともに、酸洗い液やメッキ液等
の使用量を抑制し、更にメッキ作業から発生する廃液量
を低減して、環境汚染を防止し、作業環境を改善して生
産性を向上するとともに、それらの再利用を図り、また
メッキのつき廻りを飛躍的に向上し、美麗な仕上がりを
得られるとともに、被処理物の裏面や凹部にも緻密かつ
一様なメッキを容易に実現し、その生産性を向上する一
方、各処理に要する浴槽を省略かつ小形軽量化し、設備
費の軽減と設置スペ−スのコンパクト化を図れるように
した電気メッキ等の電気化学的処理方法およびその電気
化学的反応装置に関する。
TECHNICAL FIELD The present invention is suitable for electrochemical treatment such as electroplating, and can perform each treatment step safely, rationally and promptly by using supercritical or subcritical carbon dioxide, and after use. Reasonably and promptly treats carbon dioxide and treatment solution, etc., suppresses the amount of pickling solution, plating solution, etc. used, and further reduces the amount of waste solution generated from plating work to prevent environmental pollution, In addition to improving the work environment to improve productivity, we plan to reuse them, and also dramatically improve the plating distribution, resulting in a beautiful finish and the denseness on the back surface and recesses of the workpiece. In addition, the uniform plating can be realized easily and its productivity can be improved, while the bath required for each treatment can be omitted and the size and weight can be reduced to reduce the equipment cost and the installation space. etc Electrochemical processing method and its electrochemical reactor.

【0002】[0002]

【従来の技術】従来の電気メッキ工程は大別すると、前
処理工程とメッキ工程、後処理工程に分けられる。この
うち、前処理工程は脱脂洗浄や酸洗いを伴い、これらは
通常、専用の浴槽に所定の処理液を収容して加温し、こ
の処理液に被処理物を所定時間浸漬して行なっている。
したがって、複数の浴槽とその作業スペ−スを要して設
備費が高価になるとともに、処理液の飛散や有害なガス
が発生する状況下での作業を強いられて作業環境が悪
く、しかも前記浸漬に長時間を要して生産性が悪い、と
いう問題があった
2. Description of the Related Art The conventional electroplating process is roughly divided into a pretreatment process, a plating process, and a posttreatment process. Of these, the pretreatment process involves degreasing and pickling, and these are usually performed by immersing the prescribed treatment liquid in a dedicated bath and heating it, and immersing the object to be treated in this treatment liquid for a prescribed time. There is.
Therefore, a plurality of baths and their work spaces are required, and the equipment cost is high, and the work environment is bad because the work is forced to be performed in a situation where the processing liquid is scattered and harmful gas is generated. There was a problem that it took a long time to soak and productivity was poor.

【0003】また、従来の脱脂洗浄にはアルカリ加熱、
電解洗浄、溶剤洗浄、エマルジョン洗浄等種々の洗浄法
が提案されているが、何れも薬剤の投入や特別の設備を
要し、しかも各処理液に被処理物を浸漬し、若しくは処
理液の蒸気中に晒すため、その後の水切りに時間が掛か
る問題がある。
For conventional degreasing cleaning, alkali heating,
Various cleaning methods such as electrolytic cleaning, solvent cleaning, and emulsion cleaning have been proposed, but all require chemical injection and special equipment. Furthermore, the object to be processed is immersed in each processing solution, or the processing solution vapor is vaporized. Since it is exposed to the inside, there is a problem that it takes time to drain the water thereafter.

【0004】このような問題を解決するものとして、例
えば特開2000−63891号公報では、被洗浄物を
収容する小容積のチャンバ−に超臨界状態の二酸化炭素
を供給して接触させ、同時に被洗浄物を加熱し若しくは
振動させて、被洗浄物に付着したPCBを溶解し除去す
るようにしている。
In order to solve such a problem, for example, in Japanese Unexamined Patent Publication No. 2000-63891, carbon dioxide in a supercritical state is supplied to and brought into contact with a small-volume chamber for containing an object to be cleaned, and at the same time, the object to be cleaned is contacted. The cleaning object is heated or vibrated to dissolve and remove the PCB adhering to the cleaning object.

【0005】しかし、この従来の洗浄装置は、洗浄後、
超臨界状態の二酸化炭素をすべて大気へ排出しているた
め、前記チャンバ−より大容積の電気メッキ製品の洗浄
には、前記二酸化炭素の消費量が増大して高価になり、
また前記二酸化炭素の排出に伴う作業環境の劣化が予想
されて、採用できない。
However, in this conventional cleaning device, after cleaning,
Since all the carbon dioxide in the supercritical state is discharged to the atmosphere, the consumption of carbon dioxide increases and the cost becomes high for cleaning the electroplating product having a larger volume than the chamber.
Further, deterioration of the working environment due to the emission of carbon dioxide is expected, and therefore it cannot be adopted.

【0006】また、従来のメッキ工程は、メッキ槽に隣
接して複数の水洗いを要し、その主要な水洗槽に常時給
水するため、設備費が高価になり水の使用料が嵩む等の
問題がある。更に、メッキ槽から被メッキ物を取り出す
際のメッキ液の回収、いわゆるくみ戻しが非常に煩雑で
手間が掛かり、しかもその回収液に濃縮を要する等し
て、生産性が非常に低かった。
Further, in the conventional plating process, a plurality of washings are required adjacent to the plating tank, and water is constantly supplied to the main washing tank, so that the equipment cost becomes high and the water usage fee increases. There is. Further, the recovery of the plating solution when taking out the object to be plated from the plating tank, so-called pumping back, is very complicated and troublesome, and the recovered solution needs to be concentrated, so that the productivity is very low.

【0007】一方、従来の電気メッキは、概してメッキ
のつき廻りが悪く、電流密度の低い被処理物の裏面や凹
部にはメッキが殆ど付かないため、当該部をメッキする
場合、それらの向きを変えてメッキするか、当該部に補
助極を配置する面倒があり、異形の被処理物のメッキに
対応し難い。また、従来の後処理工程は、メッキ後水洗
いし湯洗いして乾燥していたが、それらに時間が掛かり
生産性が悪かった。
On the other hand, in the conventional electroplating, the plating is generally poor in distribution, and almost no plating is applied to the back surface or the concave portion of the object having a low current density. Since it is troublesome to change the plating or dispose the auxiliary electrode on the relevant part, it is difficult to cope with the plating of the object having a different shape. Further, in the conventional post-treatment process, after plating, it was washed with water, washed with hot water, and dried, but it took time and productivity was poor.

【0008】更に、メッキ工場から排出される廃水は、
その水質を法規制されているが、メッキ作業から発生す
る排水のうち、洗浄排水は一般に所定の薬品を添加し無
害化処理してから、PH調整により重金属を水酸化物と
して除去し、濃厚排水は洗浄排水に少しづつ加えて処理
するか、別途処理し、その処理液を薄い洗浄排水中に混
合して処理していた。しかし、従来の排水処理は高価な
設備と種々の薬品、多量の水と多くの時間を要し、生産
性が非常に悪かった。
Furthermore, the wastewater discharged from the plating plant is
Although the quality of water is regulated by law, of the wastewater generated from plating work, cleaning wastewater is generally treated with a specified chemical to detoxify it, and then PH adjustment is used to remove heavy metals as hydroxides. Was treated by adding it to the wash drainage little by little, or treating it separately, and mixing the treatment liquid with a thin wash drainage for treatment. However, the conventional wastewater treatment requires expensive equipment, various chemicals, a large amount of water, and a lot of time, and the productivity is very poor.

【0009】[0009]

【発明が解決しようとする課題】本発明はこのような問
題を解決し、例えば電気メッキ等の電気化学的処理に好
適で、超臨界または亜臨界二酸化炭素を用いて、各処理
工程を安全で合理的かつ速やかに行なえ、使用後の二酸
化炭素および処理溶液等を合理的かつ迅速に処理すると
ともに、酸洗い液やメッキ液等の使用量を抑制し、更に
メッキ作業から発生する廃液量を低減して、環境汚染を
防止し、作業環境を改善して生産性を向上するととも
に、それらの再利用を図り、またメッキのつき廻りを飛
躍的に向上し、美麗な仕上がりを得られるとともに、被
処理物の裏面や凹部にも緻密かつ一様なメッキを容易に
実現し、その生産性を向上する一方、各処理に要する浴
槽を省略かつ小形軽量化し、設備費の軽減と設置スペ−
スのコンパクト化を図れるようにした電気メッキ等の電
気化学的処理方法およびその電気化学的反応装置を提供
することを目的とする。
The present invention solves such a problem and is suitable for electrochemical treatments such as electroplating, and uses supercritical or subcritical carbon dioxide to safely perform each treatment step. It can be done reasonably and promptly, and it can process the carbon dioxide and treatment solution after use reasonably and promptly, and can control the amount of pickling solution and plating solution used, and further reduce the amount of waste solution generated from plating work. In addition to preventing environmental pollution and improving the work environment to improve productivity, they can be reused and the plating distribution can be dramatically improved to achieve a beautiful finish and It facilitates precise and uniform plating on the back surface and recesses of the object to be processed, improving its productivity, while omitting the bathtub required for each process and making it smaller and lighter, reducing equipment costs and installation space.
It is an object of the present invention to provide an electrochemical treatment method such as electroplating and an electrochemical reaction apparatus for the same, which can achieve a compact size.

【0010】[0010]

【課題を解決するための手段】このため、請求項1の発
明は、電解物質を収容可能な反応浴槽に陰極および陽極
の電極物質を収容し、前記一方の電極物質を電解し、若
しくは前記電解した電極物質およびまたは電解質溶液に
含まれる電解物質を他方の電極物質に析出付着するよう
にした電気メッキ等の電気化学的処理方法において、前
記電解物質および電解質溶液を収容した反応浴槽を超臨
界状態または亜臨界状態に形成し、該状態の下で前記電
極物質を電解し、若しくは前記電解した電極物質および
または電解質溶液に含まれる電解物質を他方の電極物質
に析出付着するようにして、例えば電気メッキ等の電気
化学的処理に好適で、超臨界または亜臨界二酸化炭素を
用いて、各処理工程を安全で合理的かつ速やかに行な
え、使用後の二酸化炭素および処理溶液等を合理的かつ
迅速に処理するとともに、酸洗い液やメッキ液等の使用
量を抑制し、更にメッキ作業から発生する廃液量を低減
して、環境汚染を防止し、作業環境を改善して生産性を
向上するとともに、それらの再利用を図り、またメッキ
のつき廻りを飛躍的に向上し、美麗な仕上がりを得られ
るとともに、被処理物の裏面や凹部にも緻密かつ一様な
メッキを容易に実現し、その生産性を向上するととも
に、これを電鋳法や陽極酸化皮膜形成法、電解研磨法に
適用可能にし、その生産性の向上と良好な仕上がり状態
を得られるようにしている。
Therefore, according to the invention of claim 1, the cathode and anode electrode materials are contained in a reaction bath capable of containing the electrolyte material, and one of the electrode materials is electrolyzed, or the electrolysis is performed. In an electrochemical treatment method such as electroplating in which an electrolytic substance contained in the electrode substance and / or the electrolytic solution is deposited and adhered to the other electrode substance, a reaction bath containing the electrolytic substance and the electrolytic solution is placed in a supercritical state. Alternatively, it is formed in a subcritical state, and the electrode substance is electrolyzed under the state, or the electrolytic substance contained in the electrolyzed electrode substance and / or the electrolyte solution is deposited and adhered to the other electrode substance, and, for example, electric Suitable for electrochemical treatment such as plating, supercritical or subcritical carbon dioxide can be used to perform each treatment step safely, rationally and promptly Reasonably and swiftly process the raw materials and processing solutions, reduce the amount of pickling solution and plating solution used, and reduce the amount of waste liquid generated from plating work to prevent environmental pollution and work environment. In addition to improving productivity and reusing them, the plating distribution is dramatically improved to achieve a beautiful finish, and the back surface and recesses of the object to be processed are also minute and uniform. Such plating can be easily realized and its productivity can be improved, and it can be applied to electroforming, anodic oxide film forming, and electrolytic polishing to improve its productivity and obtain a good finished state. I am trying.

【0011】請求項2の発明は、電解物質を収容可能な
反応浴槽に陰極および陽極の電極物質を収容し、前記電
解物質を電解し、これを他方の電極物質側で採集するよ
うにした電気メッキ等の電気化学的処理方法において、
電解物質を収容した反応浴槽を超臨界状態または亜臨界
状態に形成し、該状態の下で前記電解物質を電解し、こ
れを他方の電極物質側で採集するようにして、金属の電
解抽出、精錬法に適用可能にし、生産性の向上と良好な
仕上がり状態を得られるようにしている。請求項3の発
明、電解物質を収容可能な反応浴槽に被処理物を収容
し、電解質溶液に含まれる電解物質を前記被処理物に析
出付着するようにした電気メッキ等の電気化学的処理方
法において、電解物質を収容した反応浴槽を超臨界状態
または亜臨界状態に形成し、該状態の下で前記電解物質
を被処理物に析出付着するようにして、外部電界を要し
ない無電界メッキや化成処理法に適用可能にし、その生
産性の向上と良好な仕上がり状態を得られるようにして
いる。
According to a second aspect of the present invention, an electrode material for a cathode and an anode is housed in a reaction bath capable of housing an electrolytic material, the electrolytic material is electrolyzed, and the electrolyzed material is collected on the side of the other electrode material. In electrochemical treatment methods such as plating,
A reaction bath containing an electrolytic substance is formed in a supercritical state or a subcritical state, the electrolytic substance is electrolyzed under the state, and is collected on the other electrode substance side, and electrolytic extraction of metal is performed, It is applicable to the refining method to improve productivity and obtain a good finished state. The invention according to claim 3, wherein an object to be treated is contained in a reaction bath capable of accommodating an electrolytic substance, and an electrolytic treatment method such as electroplating in which the electrolytic substance contained in an electrolyte solution is deposited and adhered to the object to be treated. In, a reaction bath containing an electrolytic substance is formed in a supercritical state or a subcritical state, and under the state, the electrolytic substance is deposited and adhered to an object to be treated, and electroless plating that does not require an external electric field or It is applicable to the chemical conversion treatment method to improve its productivity and obtain a good finished state.

【0012】請求項4の発明は、電極物質を電解し、若
しくは前記電解した電極物質およびまたは電解質溶液に
含まれる電解物質を他方の電極物質に析出付着後、若し
くは前記電解物質を電解し、これを他方の電極物質側で
採集後、前記反応浴槽を超臨界状態または亜臨界状態か
ら前記臨界点以下の状態へ移行し、電解質溶液と超臨界
または亜臨界物質を二層状態に戻し、それらの排出を実
現するとともに、前記移行時に反応浴槽等の系内に急激
な流れを形成し、被処理物の洗浄および乾燥を促すよう
にしている。請求項5の発明は、前記電極物質若しくは
電解物質の電解後に、超臨界状態の物質または亜臨界状
態の物質を前記反応浴槽に導入し、前記電極物質を洗浄
し、若しくは酸化皮膜を除去するようにして、それらの
処理を合理的かつ迅速に行ない、その乾燥を促すように
している。
According to a fourth aspect of the present invention, the electrode material is electrolyzed, or the electrolyzed electrode material and / or the electrolytic material contained in the electrolyte solution is deposited and adhered to the other electrode material, or the electrolytic material is electrolyzed. After collecting on the other electrode material side, the reaction bath is transferred from the supercritical state or subcritical state to the state below the critical point, the electrolyte solution and the supercritical or subcritical material are returned to a two-layer state, and those At the same time as discharging, a rapid flow is formed in the system such as the reaction bath at the time of the above-mentioned transition to promote cleaning and drying of the object to be treated. According to a fifth aspect of the invention, after electrolysis of the electrode substance or the electrolytic substance, a substance in a supercritical state or a substance in a subcritical state is introduced into the reaction bath to wash the electrode substance or remove an oxide film. Therefore, the treatment is carried out reasonably and promptly to promote the drying.

【0013】請求項6の発明は、前記電極物質若しくは
電解物質の電解後に、超臨界状態の物質または亜臨界状
態の物質を前記反応浴槽に導入し、前記電極物質若しく
は電解物質採集側を洗浄し、若しくは乾燥するようにし
て、それらの処理を合理的かつ迅速に行ない、その乾燥
を促すようにしている。請求項7の発明は、電極物質の
電解時に、前記反応浴槽に超臨界状態の物質または亜臨
界状態の物質と電解物質と界面活性剤とを導入し、前記
反応浴槽内を超臨界状態または亜臨界で乳濁させて、電
極物質または電解物質の析出付着を均一で迅速かつ高密
度に行ない、例えばメッキのつき廻りを飛躍的に向上
し、美麗な仕上がりを得られるとともに、被処理物の裏
面や凹部にも緻密かつ一様なメッキを容易に実現し、そ
の生産性を向上するようにしている。
According to a sixth aspect of the present invention, after electrolysis of the electrode substance or electrolytic substance, a substance in a supercritical state or a substance in a subcritical state is introduced into the reaction bath to wash the electrode substance or the electrolyte substance collecting side. Or, it is dried so that the treatment can be performed reasonably and quickly to promote the drying. The invention of claim 7 introduces a substance in a supercritical state or a substance in a subcritical state, an electrolytic substance and a surfactant into the reaction bath at the time of electrolysis of the electrode substance, so that the inside of the reaction bath is in a supercritical state or a subcritical state. By emulsifying at a critical level, the deposition and deposition of electrode materials or electrolytes can be performed uniformly, quickly and with high density. For example, the plating coverage can be dramatically improved, and a beautiful finish can be obtained, and the back surface of the object to be treated can be obtained. Dense and uniform plating can be easily realized on the and concave portions to improve the productivity.

【0014】請求項8の発明は、電極物質若しくは電解
物質の電解前に、前記反応浴槽に超臨界状態の物質また
は亜臨界状態の物質と酸化皮膜除去溶液と界面活性剤と
を導入し、前記反応浴槽内を超臨界状態または亜臨界状
態で乳濁させるようにして、それらの処理を合理的かつ
迅速に、しかも高密度に行なうようにしている。請求項
9の発明は、反応浴槽の外部に前記反応浴槽に連通可能
な貯留槽を設け、該貯留槽に使用後の超臨界物質または
亜臨界物質、電解物質または洗浄若しくは酸化皮膜除去
物質を貯留させるようにして、それらの排出を制止し、
その再生や合理的かつ有効な使用を図るようにしてい
る。請求項10の発明は、貯留槽に貯留した使用後の超
臨界物質または亜臨界物質を再生して反応浴槽に還流
し、または前記貯留槽に貯留した使用後の電解物質また
は洗浄若しくは酸化皮膜除去物質等を再生して各溶液槽
に還流するようにして、使用後の超臨界物質または亜臨
界物質や、使用後の電解物質または洗浄若しくは酸化皮
膜除去物質等の有効利用を図るようにしている。
According to the invention of claim 8, before the electrolysis of the electrode substance or the electrolytic substance, the substance in the supercritical state or the substance in the subcritical state, the oxide film removing solution and the surfactant are introduced into the reaction bath, The reaction bath is emulsified in a supercritical state or a subcritical state so that the treatments can be performed reasonably, rapidly and with high density. According to the invention of claim 9, a storage tank is provided outside the reaction bath which can communicate with the reaction bath, and the used supercritical substance or subcritical substance, electrolytic substance or cleaning or oxide film removing substance is stored in the storage bath. To stop their emissions,
We try to recycle and use it reasonably and effectively. The invention according to claim 10 regenerates the used supercritical substance or subcritical substance stored in the storage tank and recirculates it to the reaction bath, or the used electrolytic substance or cleaning or oxide film removal stored in the storage tank. The substances are regenerated and refluxed in each solution tank, so that the supercritical substances or subcritical substances after use, the electrolytic substances after use, the cleaning or oxide film removing substances, etc. are effectively utilized. .

【0015】請求項11の発明は、電極物質の析出付着
およびその前処理工程または前記電解物質の電解および
採集並びにその前処理工程を、単一の反応浴槽で処理し
て、前記処理工程毎の浴槽を廃し、設備費の低減と設置
スペースのコンパクト化を図るとともに、前記浴槽毎に
被処理物を移動する煩雑を解消し、その作業能率を向上
するようにしている。請求項12の発明は、電極物質の
析出付着およびその前後の処理工程または前記電解物質
の電解および採集並びにその前後の処理工程を実行可能
な少なくとも二つの反応浴槽を設け、この一方の反応浴
槽で前記処理工程の一部を実行し、他方の反応浴槽で前
記処理工程の残部を実行し、かつこれらの処理を前記反
応浴槽間で交互に実行するようにして、複数の反応浴槽
で一連の処理工程を二つに分け、これを処理を交互に行
わせて、一連の処理作業を合理的かつ迅速に行なうよう
にしている。請求項13の発明は、電極物質を電解し、
または前記電解した電極物質を他方の電極物質に析出付
着後、前記反応浴槽を使用して、他方の電極物質に複数
層の電極物質を析出付着するようにして、被処理物を反
応浴槽から搬出することなく、次層の電極物質の前処
理、析出付着を続行可能にし、作業性および生産性を向
上するようにしている。
According to an eleventh aspect of the present invention, the deposition and deposition of the electrode material and the pretreatment step thereof, or the electrolysis and collection of the electrolytic material and the pretreatment step thereof are carried out in a single reaction bath, and each treatment step is performed. The bath tub is abolished, the facility cost is reduced and the installation space is made compact, the complexity of moving the object to be treated for each bath is improved, and the work efficiency is improved. According to the invention of claim 12, at least two reaction baths capable of carrying out the deposition and deposition of the electrode substance and the treatment process before and after it or the electrolysis and collection of the electrolytic substance and the treatment process before and after it are provided. A series of treatments in a plurality of reaction baths such that some of the treatments are performed, the other of the treatments is performed in the other reaction bath, and these treatments are performed alternately between the reaction baths. The process is divided into two and the processes are alternately performed so that a series of processing operations can be performed reasonably and quickly. The invention of claim 13 electrolyzes an electrode material,
Alternatively, after the electrolyzed electrode substance is deposited and adhered to the other electrode substance, the reaction bath is used to deposit and attach a plurality of layers of electrode substances to the other electrode substance, and the object to be treated is carried out from the reaction bath. Without doing so, pretreatment of the electrode material of the next layer, deposition and adhesion can be continued, and workability and productivity are improved.

【0016】請求項14の発明は、電解物質を収容可能
な反応浴槽に陰極および陽極の電極物質を収容し、前記
一方の電極物質を電解し、若しくは前記電解した電極物
質およびまたは電解質溶液に含まれる電解物質を他方の
電極物質に析出付着するようにした電気メッキ等の電気
化学的反応装置において、電解物質を収容した反応浴槽
を超臨界状態または亜臨界状態に形成し、該状態の下で
前記電極物質を電解し、若しくは前記電解した電極物質
およびまたは電解質溶液に含まれる電解物質を他方の電
極物質に析出付着するようにして、例えば電気メッキ等
の電気化学的処理に好適で、超臨界または亜臨界二酸化
炭素を用いて、各処理工程を安全で合理的かつ速やかに
行なえ、使用後の二酸化炭素および処理溶液等を合理的
かつ迅速に処理するとともに、酸洗い液やメッキ液等の
使用量を抑制し、更にメッキ作業から発生する廃液量を
低減して、環境汚染を防止し、作業環境を改善して生産
性を向上するとともに、それらの再利用を図り、またメ
ッキのつき廻りを飛躍的に向上し、美麗な仕上がりを得
られるとともに、被処理物の裏面や凹部にも緻密かつ一
様なメッキを容易に実現し、その生産性を向上するとと
もに、これを電鋳法や陽極酸化皮膜形成法、電解研磨法
に適用可能にし、その生産性の向上と良好な仕上がり状
態を得られるようにしている。
According to a fourteenth aspect of the present invention, a cathode and an anode electrode materials are contained in a reaction bath capable of containing an electrolyte material, one of the electrode materials is electrolyzed, or the electrolyzed electrode material and / or the electrolyte solution is contained. In an electrochemical reaction device such as electroplating in which an electrolytic substance to be deposited and adhered to the other electrode substance is formed, a reaction bath containing the electrolytic substance is formed in a supercritical state or a subcritical state, and under the state, It is suitable for electrochemical treatment such as electroplating, for example, by electrolyzing the electrode material, or by depositing and depositing the electrolyzed electrode material and / or the electrolytic material contained in the electrolyte solution on the other electrode material, and it is supercritical. Or, by using subcritical carbon dioxide, each treatment step can be performed safely, rationally and promptly, and the carbon dioxide and treatment solution after use can be treated rationally and promptly. At the same time, it suppresses the amount of pickling solution and plating solution used, further reduces the amount of waste solution generated from plating work, prevents environmental pollution, improves the work environment and improves productivity, and In addition to reusing and dramatically improving the plating distribution, a beautiful finish can be obtained, and precise and uniform plating can be easily achieved on the back surface and recesses of the object to be processed, which improves productivity. While improving, it is applicable to the electroforming method, the anodic oxide film forming method, and the electrolytic polishing method, so that the productivity can be improved and a good finished state can be obtained.

【0017】請求項15の発明は、電解物質を収容可能
な反応浴槽に陰極および陽極の電極物質を収容し、前記
電解物質を電解し、これを他方の電極物質側で採集する
ようにした電気メッキ等の電気化学的反応装置におい
て、電解物質を収容した反応浴槽を超臨界状態または亜
臨界状態に形成し、該状態の下で前記電解物質を電解
し、これを他方の電極物質側で採集するようにして、金
属の電解抽出、精錬法に適用可能にし、生産性の向上と
良好な仕上がり状態を得られるようにしている。請求項
16の発明は、電解物質を収容可能な反応浴槽に被処理
物を収容し、電解質溶液に含まれる電解物質を前記被処
理物に析出付着するようにした電気メッキ等の電気化学
的反応装置において、電解物質を収容した反応浴槽を超
臨界状態または亜臨界状態に形成し、該状態の下で前記
電解物質を被処理物に析出付着するようにして、外部電
界を要しない無電界メッキや化成処理法に適用可能に
し、その生産性の向上と良好な仕上がり状態を得られる
ようにしている。
According to a fifteenth aspect of the present invention, the cathode and anode electrode materials are contained in a reaction bath capable of containing the electrolyte material, the electrolyte material is electrolyzed, and the other electrode material side is collected. In an electrochemical reaction device such as plating, a reaction bath containing an electrolytic substance is formed in a supercritical state or a subcritical state, the electrolytic substance is electrolyzed under the state, and this is collected on the other electrode substance side. In this way, it can be applied to the electrolytic extraction and refining methods of metals so that the productivity is improved and a good finished state is obtained. According to a sixteenth aspect of the invention, an electrochemical reaction such as electroplating in which an object to be treated is contained in a reaction bath capable of accommodating an electrolytic substance and the electrolytic substance contained in an electrolyte solution is deposited and adhered to the object to be treated. In the apparatus, electroless plating that does not require an external electric field by forming a reaction bath containing an electrolytic substance in a supercritical state or a subcritical state and depositing and depositing the electrolytic substance on an object to be treated under the state. It is also applicable to chemical conversion treatment methods to improve its productivity and obtain a good finished state.

【0018】請求項17の発明は、電極物質を電解し、
若しくは前記電解した電極物質およびまたは電解質溶液
に含まれる電解物質を他方の電極物質に析出付着後、若
しくは前記電解物質を電解し、これを他方の電極物質側
で採集後、前記反応浴槽を超臨界状態または亜臨界状態
から低圧側へ移行可能にして、電解質溶液と超臨界また
は亜臨界物質を二層状態に戻し、それらの排出を実現す
るとともに、前記移行時に反応浴槽等の系内に急激な流
れを形成し、被処理物の洗浄および乾燥を促すようにし
ている。請求項18の発明は、反応浴槽の外部に前記反
応浴槽に連通可能な貯留槽を設け、該貯留槽に使用後の
超臨界状態の物質または亜臨界状態の物質若しくは電解
物質または洗浄若しくは酸化皮膜除去物質を貯留させる
ようにして、それらの排出を制止し、その再生や合理的
かつ有効な使用を図るようにしている。
According to a seventeenth aspect of the present invention, the electrode material is electrolyzed,
Alternatively, after depositing and adhering the electrolyzed electrode substance and / or the electrolytic substance contained in the electrolyte solution to the other electrode substance, or after electrolyzing the electrolytic substance and collecting this on the other electrode substance side, the reaction bath is supercritical. From the state or subcritical state to the low pressure side, the electrolyte solution and the supercritical or subcritical substance are returned to the two-layer state, and their discharge is realized, and at the time of the transition, it is rapidly changed into the system such as the reaction bath. A stream is formed to facilitate cleaning and drying of the material to be processed. According to the invention of claim 18, a storage tank, which can communicate with the reaction bath, is provided outside the reaction bath, and a substance in a supercritical state, a substance in a subcritical state or an electrolytic substance, or a cleaning or oxide film is used in the storage bath. The removed substances are stored so that their emission can be controlled, and they can be regenerated or used reasonably and effectively.

【0019】請求項19の発明は、貯留槽に貯留した使
用後の超臨界物質または亜臨界物質を再生して反応浴槽
に還流し、または前記貯留槽に貯留した使用後の電解物
質または洗浄若しくは酸化皮膜除去物質を再生して反応
浴槽に還流するようにして、使用後の超臨界物質または
亜臨界物質や、使用後の電解物質または洗浄若しくは酸
化皮膜除去物質等の有効利用を図るようにしている。請
求項20の発明は、電極物質の析出付着およびその前処
理工程または前記電解物質の電解および採集並びにその
前処理工程を、単一の反応浴槽で処理可能にして、前記
処理工程毎の浴槽を廃し、設備費の低減と設置スペース
のコンパクト化を図るとともに、前記浴槽毎に被処理物
を移動する煩雑を解消し、その作業能率を向上するよう
にしている。
According to a nineteenth aspect of the present invention, the used supercritical substance or subcritical substance stored in the storage tank is regenerated and returned to the reaction bath, or the used electrolytic material or cleaning or stored in the storage tank is used. Regenerate the oxide film removal substance and reflux it to the reaction bath so that the supercritical substance or subcritical substance after use, the electrolytic substance after use or the cleaning or oxide film removal substance etc. can be effectively utilized. There is. According to the invention of claim 20, the deposition / adhesion of the electrode material and the pretreatment step thereof or the electrolysis and collection of the electrolytic material and the pretreatment step thereof can be processed in a single reaction bath, and a bath for each of the treatment steps can be provided. It is abolished, the facility cost is reduced, the installation space is made compact, the complexity of moving the object to be treated for each bath is improved, and the work efficiency is improved.

【0020】請求項21の発明は、電極物質の析出付着
およびその前後の処理工程または前記電解物質の電解お
よび採集並びにその前後の処理工程を実行可能な少なく
とも二つの反応浴槽を設け、この一方の反応浴槽で前記
処理工程の一部を実行し、他方の反応浴槽で前記処理工
程の残部を実行し、かつこれらの処理を前記反応浴槽間
で交互に実行可能にし、複数の反応浴槽で一連の処理工
程を二つに分け、これを処理を交互に行わせて、一連の
処理作業を合理的かつ迅速に行なうようにしている。請
求項22の発明は、前記電極物質を電解し、または前記
電解した電極物質を他方の電極物質に析出付着後、前記
反応浴槽を使用して、他方の電極物質に複数層の電極物
質を析出付着するようにして、被処理物を反応浴槽から
搬出することなく、次層の電極物質の前処理、析出付着
を続行可能にし、作業性をおよび生産性を向上するよう
にしている。
According to a twenty-first aspect of the present invention, at least two reaction baths are provided, which are capable of carrying out the deposition and deposition of the electrode material and the processing steps before and after it, or the electrolysis and collection of the electrolytic material and the processing steps before and after it, one of which is provided. A reaction bath carries out a part of the treatment steps, the other reaction bath carries out the rest of the treatment steps, and these treatments can be carried out alternately between the reaction baths, with a series of reaction baths The treatment process is divided into two and the treatments are alternately performed so that a series of treatment work can be performed reasonably and quickly. In the invention of claim 22, the electrode material is electrolyzed, or the electrolyzed electrode material is deposited and adhered to the other electrode material, and then the reaction bath is used to deposit a plurality of layers of electrode material on the other electrode material. By adhering, it is possible to continue the pretreatment and deposition adhesion of the electrode material of the next layer without carrying out the object to be treated from the reaction bath, thereby improving workability and productivity.

【0021】[0021]

【発明の実施の形態】以下、本発明を電気化学的処理法
である電気メッキ(ニッケルメッキ)に適用した図示の
実施形態について説明すると、図1乃至図7において1
は電気化学的反応浴槽であるステンレス鋼製のメッキ槽
で、その内面を塩化ビニ−ルや硬質ゴムでライニングし
ており、その上側の開口部に蓋体(図示略)が気密かつ
着脱可能に装着されている。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a preferred embodiment in which the present invention is applied to electroplating (nickel plating) which is an electrochemical treatment method will be described.
Is a stainless steel plating bath that is an electrochemical reaction bath, the inner surface of which is lined with vinyl chloride or hard rubber, and the lid (not shown) is airtight and removable in the upper opening. It is installed.

【0022】前記メッキ槽1の外部に外部電界である直
流電源2が設けられ、その正極側に導通する電極物質で
ある陽極3と、負極側に導通する、電極物質でかつ被処
理物である陰極4とがメッキ槽1に収容可能にされてい
る。実施形態では陽極3に純ニッケル板、陰極4にハル
セル試験用真鍮板が使用されている。
A direct current power source 2 which is an external electric field is provided outside the plating tank 1, and an anode 3 which is an electrode material which conducts to the positive electrode side thereof and an electrode material which conducts to the negative electrode side and which is an object to be treated. The cathode 4 and the plating tank 1 can be housed. In the embodiment, a pure nickel plate is used for the anode 3 and a brass plate for Hull cell test is used for the cathode 4.

【0023】図中、5は電源2の給電回路に挿入された
スイッチで、電気化学的反応時、つまり電気メッキ時に
のみONされ、陽極3および陰極4に通電可能にしてい
る。6はメッキ槽1の底部に設けたスタ−ラ等の攪拌子
2で、メッキ槽1に導入された超臨界物質である後述の
二酸化炭素と、界面活性剤を含む電解質溶液若しくは酸
溶液とを攪拌可能にしている。
In the figure, reference numeral 5 is a switch inserted in the power supply circuit of the power source 2, and is turned on only during an electrochemical reaction, that is, during electroplating, so that the anode 3 and the cathode 4 can be energized. Reference numeral 6 is a stirrer 2 such as a stirrer provided at the bottom of the plating tank 1 for introducing carbon dioxide, which will be described later, which is a supercritical substance introduced into the plating tank 1, and an electrolyte solution or an acid solution containing a surfactant. It is possible to stir.

【0024】前記メッキ槽1の外部に、超臨界物質であ
る二酸化炭素7を高圧に加圧して収容したガス容器8
と、互いに異種の電解質溶液9、10を収容した電解質
溶液槽11,12と、PH7およびそれ以下の酸溶液1
3を収容した酸溶液槽14と、使用後の二酸化炭素15
を収容するガス溜槽16と、使用後の界面活性剤を含む
酸溶液17、若しくは使用後の界面活性剤を含む電解質
溶液18,19を収容する、複数の貯留槽である液溜槽
20〜22が配置されている。
A gas container 8 in which carbon dioxide 7 as a supercritical substance is pressurized and stored in a high pressure outside the plating tank 1
, Electrolyte solution tanks 11 and 12 containing electrolyte solutions 9 and 10 of different kinds, and an acid solution 1 of PH7 and below
Acid solution tank 14 containing 3 and carbon dioxide 15 after use
And a gas reservoir 16 for storing the used acid solution 17 containing a surfactant after use, or liquid reservoirs 20 to 22 as a plurality of reservoirs containing the electrolyte solutions 18 and 19 containing a surfactant after use. It is arranged.

【0025】これらの液溜槽20〜22には、前記各溶
液槽11,12,14に連通するリターンパイプ49〜
51が接続され、使用後の各溶液17〜19を界面活性
剤と分離し、または分離せずに若干高濃度に調製して再
生後、これを各溶液槽9,10,13へ還流させてい
る。
Return pipes 49 to communicating with the solution tanks 11, 12 and 14 are connected to the liquid reservoirs 20 to 22.
51 is connected, and each of the used solutions 17 to 19 is separated from the surfactant or is prepared to have a slightly high concentration without being separated and is regenerated, and then the solution is refluxed to each of the solution tanks 9, 10 and 13. There is.

【0026】前記ガス容器8は導管23を介してメッキ
槽1の上部に連通し、該管23に圧縮ポンプ24とバル
ブ25が介挿されている。前記圧縮ポンプ24は、二酸
化炭素7を所定圧、実施形態では二酸化炭素7をその臨
界圧7.38MPa以上の10.0MPaに加圧可能に
している。この場合、二酸化炭素7を超臨界に限らず、
亜臨界状態に加圧して以降の処理を実行することも可能
である。
The gas container 8 communicates with the upper part of the plating tank 1 via a conduit 23, and a compression pump 24 and a valve 25 are inserted in the pipe 23. The compression pump 24 is capable of pressurizing carbon dioxide 7 to a predetermined pressure, in the embodiment, carbon dioxide 7 to 10.0 MPa, which is a critical pressure of 7.38 MPa or more. In this case, the carbon dioxide 7 is not limited to supercritical,
It is also possible to pressurize to a subcritical state and execute the subsequent processing.

【0027】前記バルブ25は、メッキ作業の各処理工
程、つまり脱脂処理、酸化皮膜除去、いわゆる酸洗い処
理、メッキ処理、乾燥の各処理前と、前記各工程の間に
実行する陰極4の洗浄工程時に一定時間開弁し、超臨界
状態の二酸化炭素7をメッキ槽1に導入可能にしてい
る。前記導管23の下流側にヒ−タ等の加熱手段26が
配置され、前記二酸化炭素7をその臨界温度31.1℃
以上に加熱可能にしている。
The valve 25 is for cleaning the cathode 4 which is carried out between each processing step of the plating operation, that is, before each processing such as degreasing processing, oxide film removal, so-called pickling processing, plating processing and drying. During the process, the valve is opened for a certain period of time so that carbon dioxide 7 in a supercritical state can be introduced into the plating tank 1. A heating means 26 such as a heater is arranged on the downstream side of the conduit 23 to remove the carbon dioxide 7 from the critical temperature 31.1 ° C.
It is possible to heat above.

【0028】前記各槽11〜13は導管27〜29を介
してメッキ槽1の下部に連通し、該管27〜29にバル
ブ30〜32と、共用の送液ポンプ33が介挿されてい
る。このうち、前記バルブ30,31は、メッキ処理前
に一定時間開弁し、所定の界面活性剤を含む電解質溶液
9,10を、送液ポンプ33を介してメッキ槽1に導入
可能にしている。
Each of the tanks 11 to 13 communicates with the lower portion of the plating tank 1 via conduits 27 to 29, and valves 30 to 32 and a common liquid feed pump 33 are inserted in the tubes 27 to 29. . Among them, the valves 30 and 31 are opened for a certain period of time before the plating process, and the electrolyte solutions 9 and 10 containing a predetermined surfactant can be introduced into the plating tank 1 via the liquid feed pump 33. .

【0029】前記バルブ32は酸洗い前に一定時間開弁
し、所定の界面活性剤を含む酸溶液13を、送液ポンプ
33を介してメッキ槽1に導入可能にしている。図中、
34〜36は前記電解質溶液9,10および酸溶液13
に添加する界面活性剤で、前記溶液9,10,13の供
給時に適宜ポンプ(図示略)を介して導入可能にしてい
る。
The valve 32 is opened for a certain period of time before pickling so that the acid solution 13 containing a predetermined surfactant can be introduced into the plating tank 1 via the liquid feed pump 33. In the figure,
34 to 36 are the electrolyte solutions 9 and 10 and the acid solution 13
The surface active agent added to the solution can be introduced through a pump (not shown) when the solutions 9, 10, and 13 are supplied.

【0030】前記ガス溜槽15は導管37を介してメッ
キ槽1の上部に連通し、該管37にバルブ38が介挿さ
れている。前記バルブ38は脱脂処理、酸洗い、メッキ
処理、乾燥の各処理前、およびそれらの間に行なう被処
理物4の洗浄前に一定時間開弁し、使用後の二酸化炭素
15をガス溜槽15に導入可能にしている。
The gas reservoir 15 communicates with the upper portion of the plating tank 1 via a conduit 37, and a valve 38 is inserted in the pipe 37. The valve 38 is opened for a certain period of time before degreasing treatment, pickling treatment, plating treatment, and drying treatment, and before washing the object 4 to be performed therebetween, and the carbon dioxide 15 after use is stored in the gas storage tank 15. It is possible to introduce.

【0031】図中、39は前記ガス溜槽15に一端を接
続したリターンパイプで、他端を前記圧縮ポンプ24に
接続し、該パイプ39に水および油脂分を吸収可能なカ
ラム40を挿入している。そして、ガス溜槽15に所定
量の二酸化炭素15が貯留された際、前記二酸化炭素1
5をカラム40へ導いて初期状態に再生し、これを前記
圧縮機24へ還流可能にしている。
In the figure, 39 is a return pipe having one end connected to the gas reservoir 15, the other end is connected to the compression pump 24, and a column 40 capable of absorbing water and fats and oils is inserted into the pipe 39. There is. When a predetermined amount of carbon dioxide 15 is stored in the gas storage tank 15, the carbon dioxide 1
5 is introduced into the column 40 to be regenerated to the initial state, which can be returned to the compressor 24.

【0032】前記液溜槽20〜22は導管41〜43を
介してメッキ槽1の下部に連通し、これらの各管41〜
43にバルブ44〜46が介挿されている。このうち、
前記バルブ44は陰極4の酸洗い後、一定時間開弁し、
使用後の酸洗い溶液17を界面活性剤36と一緒に液溜
槽20へ導入可能にしている。また、前記バルブ45,
46は各メッキ処理後、一定時間開弁し、使用後の電解
質溶液18,19を界面活性剤34,35と一緒に液溜
槽21,22へ導入可能にしている。
The liquid storage tanks 20 to 22 communicate with the lower part of the plating tank 1 via conduits 41 to 43, and the pipes 41 to 41
Valves 44 to 46 are inserted in 43. this house,
After the pickling of the cathode 4, the valve 44 is opened for a certain period of time,
The pickling solution 17 after use can be introduced into the liquid reservoir 20 together with the surfactant 36. In addition, the valve 45,
The valve 46 is opened for a certain period of time after each plating process so that the used electrolyte solutions 18 and 19 can be introduced into the liquid reservoirs 21 and 22 together with the surfactants 34 and 35.

【0033】この他、図中47は前記送液ポンプ33お
よび導管27〜29に並列に介挿した洗浄水槽で、各溶
液9,10,13をメッキ槽1に送液後、前記ポンプ3
3内を洗浄可能にしている。48はアルコール等の有機
溶媒からなるエントレーナで、ガス容器8と圧縮機24
との間の導管23に選択的に導入し、しつこい油脂分を
脱脂可能にしている。
In addition, reference numeral 47 in the drawing denotes a washing water tank which is inserted in parallel with the liquid feeding pump 33 and the conduits 27 to 29, and after feeding the respective solutions 9, 10, 13 to the plating tank 1, the pump 3
The inside of 3 can be washed. Reference numeral 48 is an entrainer made of an organic solvent such as alcohol, which is a gas container 8 and a compressor 24.
It is selectively introduced into the conduit 23 between and to allow the persistent oil and fat component to be degreased.

【0034】このように構成した電気メッキ等の電気化
学的反応装置は、メッキ前処理、つまり脱脂、酸洗い、
洗浄の各処理、メッキ処理、メッキ後処理、つまり被処
理物4の回収、乾燥の多工程を単一のメッキ槽1で行っ
ているから、各処理毎に専用の浴槽を要する従来のメッ
キ処理法および設備に比べて、構成が簡単で設置スペ−
スがコンパクトになり、設備費の低減を図れる。
The electrochemical reaction apparatus for electroplating or the like thus constructed has a pretreatment for plating, that is, degreasing, pickling,
Since each process of cleaning, plating, and post-plating, that is, multiple steps of collecting and drying the object 4 is performed in a single plating tank 1, a conventional plating process that requires a dedicated bath for each process Easy to configure and installation space
The space becomes compact and the equipment cost can be reduced.

【0035】また、本発明装置は、前記脱脂、酸洗い、
洗浄、メッキ処理乾燥の各作業から排出する種々の排出
物、つまり二酸化炭素や界面活性剤を含む酸洗い溶液や
電解質溶液をガス溜槽16や複数の液溜槽20〜22に
排出し、外部への排出を回避するとともに、これを合理
的に処理しているから、従来のような高価かつ大形の排
水処理設備を要しない。
In addition, the device of the present invention, the degreasing, pickling,
Various kinds of wastes discharged from each work of cleaning and plating treatment, that is, a pickling solution containing carbon dioxide and a surfactant and an electrolyte solution are discharged to the gas storage tank 16 and a plurality of liquid storage tanks 20 to 22 to be discharged to the outside. Since the waste is avoided and it is reasonably treated, it does not require expensive and large-scale wastewater treatment facilities as in the past.

【0036】しかも、前記各処理は非常に良好な拡散性
を有する超臨界二酸化炭素を利用して行なっているか
ら、メッキ液に被処理物を浸漬する従来のメッキ法に比
べて、酸溶液や電解質溶液の使用量が非常に少量で足
り、したがってそれらの使用量の節減と排出処理設備の
小形軽量化を図れる。更に、前記各処理を超臨界二酸化
炭素を利用して行ない、溶液や水の使用を可及的に抑制
したから、前記排水処理設備の省略化を図れるととも
に、被処理物の洗浄や回収、乾燥、電解質溶液の回収を
容易かつ速やかに行える。
Moreover, since each of the above treatments is carried out using supercritical carbon dioxide having a very good diffusivity, compared with the conventional plating method in which the object to be treated is immersed in the plating solution, an acid solution or A very small amount of the electrolyte solution is sufficient, so that the amount of the electrolyte solution used can be reduced and the emission treatment facility can be made compact and lightweight. Furthermore, since each of the treatments is performed using supercritical carbon dioxide and the use of the solution or water is suppressed as much as possible, the wastewater treatment facility can be omitted, and the cleaning, recovery, and drying of the object to be treated can be achieved. The electrolyte solution can be easily and quickly recovered.

【0037】また、本発明装置は超臨界物質として、比
較的低温かつ低圧の臨界点を持つ二酸化炭素を使用して
いるから、超臨界状態を比較的小さなエネルギ−で容易
かつ速やかに得られ、その使用コストの低減を図れると
ともに、メッキ槽1の耐圧強度の緩和を図れ、これを安
価に製作できる。
Further, since the apparatus of the present invention uses carbon dioxide having a critical point at a relatively low temperature and a low pressure as a supercritical substance, a supercritical state can be easily and quickly obtained with a relatively small energy. The cost of use can be reduced and the pressure resistance of the plating tank 1 can be relaxed, which can be manufactured at low cost.

【0038】このような電気化学的反応装置を使用して
電気メッキを行なう場合は、電極3,4の通電停止状況
の下で、先ずメッキ槽1の負極側に、例えば表面を研磨
処理し終えた被処理物4を取り付け、蓋(図示略)を閉め
てメッキ槽1を密閉する。次に圧縮ポンプ24を駆動
し、加熱手段26を作動してガス容器8を開弁し、内部
の二酸化炭素を圧縮ポンプ24へ導き、これを臨界圧以
上の高圧に加圧し、更に加熱手段26で臨界温度以上に
加熱して、超臨界二酸化炭素を生成し、これをバルブ2
5の開弁を介してしてメッキ槽1へ導入する。
When electroplating is carried out using such an electrochemical reaction apparatus, the negative electrode side of the plating tank 1 is first polished, for example, the surface is finished under the condition where the electrodes 3 and 4 are not energized. The object 4 to be treated is attached, the lid (not shown) is closed, and the plating tank 1 is sealed. Next, the compression pump 24 is driven, the heating means 26 is operated to open the gas container 8, the carbon dioxide inside is guided to the compression pump 24, and the carbon dioxide is pressurized to a pressure higher than the critical pressure. At a temperature above the critical temperature to generate supercritical carbon dioxide,
It is introduced into the plating tank 1 through the opening valve of No. 5.

【0039】前記超臨界二酸化炭素はメッキ槽1に高速
に拡散し、該槽1内の二酸化炭素も超臨界状態になって
前記被処理物4に接触し、該被処理物4および陽極3に
付着している油脂分や水分、異物等を高速かつ効率良く
洗浄する。その際、撹拌子6を作動して超臨界二酸化炭
素を撹拌すれば、前記拡散が一様化され洗浄能率が向上
する。しかも、従来のエマルジョン洗浄のような水、溶
液の使用を廃しているから、その分被処理物4の乾燥が
促される。
The supercritical carbon dioxide diffuses into the plating tank 1 at a high speed, and the carbon dioxide in the tank 1 is brought into a supercritical state to come into contact with the object 4 to be processed and to the object 4 and the anode 3. High-speed and efficient cleaning of adhering oils and fats, water and foreign substances. At this time, if the stirrer 6 is operated to stir the supercritical carbon dioxide, the diffusion is made uniform and the cleaning efficiency is improved. Moreover, since the use of water and solution as in the conventional emulsion cleaning is abolished, the drying of the object 4 is promoted accordingly.

【0040】このように本発明は超臨界状態の下で被処
理物4の脱脂洗浄を行なっているから、被処理物を脱脂
液に浸漬する従来の方法に比べて、有害な脱脂剤の使用
をなくし、作業環境を改善して、これを安全で迅速かつ
容易に行えるとともに、メッキ槽1で脱脂洗浄を行なっ
ているから、従来のような専用の脱脂槽を要せず、その
分設備費の低減を図れる。
As described above, according to the present invention, since the object 4 to be processed is degreased and washed under the supercritical state, the use of harmful degreasing agent is more difficult than the conventional method of immersing the object 4 in the degreasing liquid. Eliminates the need to improve the working environment, and can do this safely, quickly and easily, and because degreasing cleaning is performed in the plating tank 1, there is no need for a dedicated degreasing tank as in the past, and the equipment costs correspondingly. Can be reduced.

【0041】そして、所定時間洗浄後、バルブ38を開
弁し、代わりにバルブ25を閉じて圧縮ポンプ24の駆
動を停止する。このようにすると、前記二酸化炭素が減
圧されて臨界点以下の状態に移行し、急激に気化または
液化してメッキ槽1内を上方へ移動し、導管37に導か
れてガス溜槽16へ移動する。この状況は図2のようで
ある。
After washing for a predetermined time, the valve 38 is opened, and instead the valve 25 is closed to stop the drive of the compression pump 24. By doing so, the carbon dioxide is decompressed and moves to a state below the critical point, and is rapidly vaporized or liquefied to move upward in the plating tank 1, and is guided to the conduit 37 and moved to the gas reservoir 16. . This situation is as shown in FIG.

【0042】したがって、前記二酸化炭素に捕集された
油脂分や水分、異物等がガス溜槽16へ移動し、かつ前
記二酸化炭素の移動時に系に流れが発生して、陽極3お
よび被処理物4を洗浄し、前述の洗浄と相俟って洗浄精
度を高める。こうして使用後の二酸化炭素15をガス溜
槽16へ排出後、バルブ38を閉じる。
Therefore, the fats and oils, the water content, the foreign matters and the like collected in the carbon dioxide move to the gas reservoir 16 and a flow is generated in the system when the carbon dioxide moves, so that the anode 3 and the object to be treated 4 are processed. To improve the cleaning accuracy in combination with the above cleaning. In this way, after the used carbon dioxide 15 is discharged to the gas storage tank 16, the valve 38 is closed.

【0043】次に前記洗浄後、被処理物4を酸洗いす
る。この酸洗いに際しては、前記通電停止状態とメッキ
槽1の気密状態の下でバルブ32を開弁し、酸溶液槽1
4内の酸溶液13を送液ポンプ33へ送り出し、同時に
前記酸溶液13に所定の界面活性剤36を加えて、これ
らをメッキ槽1内へ送り込む。
After the cleaning, the object 4 to be processed is pickled. At the time of this pickling, the valve 32 is opened under the condition where the energization is stopped and the plating tank 1 is hermetically sealed, and the acid solution tank 1
The acid solution 13 in 4 is sent to the liquid feed pump 33, and at the same time, a predetermined surfactant 36 is added to the acid solution 13 and these are sent into the plating tank 1.

【0044】前記酸溶液13と界面活性剤36は、図3
(a)のようにメッキ槽1内で二層を形成する。この状
況の下で圧縮ポンプ24を駆動し、加熱手段26を作動
してガス容器8を開弁し、内部の二酸化炭素を圧縮ポン
プ24へ導き、これを臨界圧以上の高圧に加圧し、更に
前記二酸化炭素を加熱手段26で臨界温度以上に加熱し
て、超臨界二酸化炭素を生成し、これをバルブ25を開
弁してメッキ槽1へ導入する。
The acid solution 13 and the surfactant 36 are shown in FIG.
As shown in (a), two layers are formed in the plating tank 1. Under this circumstance, the compression pump 24 is driven, the heating means 26 is operated to open the gas container 8, and the carbon dioxide inside is guided to the compression pump 24, and this is pressurized to a pressure higher than the critical pressure. The carbon dioxide is heated to a critical temperature or higher by the heating means 26 to generate supercritical carbon dioxide, which is introduced into the plating tank 1 by opening the valve 25.

【0045】こうして、超臨界二酸化炭素がメッキ槽1
へ導かれると、これがメッキ槽1に高速に拡散して、前
記酸溶液13と界面活性剤36に急速に混合して乳濁さ
せ、その微粒子が被処理物4の表面に接触し、被処理物
4表面の錆を落とし酸化皮膜を除去して、表面を活性化
する。この状況は図3(b)のようで、その際撹拌子6
を作動し、前記乳濁物質を撹拌すれば、前記拡散が均一
化され、酸化皮膜が均一かつ効率良く除去されて、酸洗
い能率が向上する。
Thus, the supercritical carbon dioxide is added to the plating tank 1
When it is introduced into the plating tank 1, it diffuses into the plating tank 1 at a high speed, and is rapidly mixed with the acid solution 13 and the surfactant 36 to make it emulsify. Rust on the surface of the object 4 is removed and the oxide film is removed to activate the surface. This situation is as shown in Fig. 3 (b), in which case the stirring bar 6
When the emulsion substance is stirred and the emulsion substance is stirred, the diffusion is made uniform, the oxide film is uniformly and efficiently removed, and the pickling efficiency is improved.

【0046】そして、所定時間酸洗い後、バルブ44を
開弁すると、臨界二酸化炭素が減圧されて臨界点以下の
状態に移行し、メッキ槽1内に使用後の酸溶液13と界
面活性剤36との二層状態が回復される。この状況は図
3(c)のようである。その間、バルブ25から高圧の
二酸化炭素がメッキ槽1内に導入され、その圧力によっ
て使用後の酸溶液13と界面活性剤36とが押し出さ
れ、これが導管41に導かれて液溜槽20へ移動して収
容される。この状況は図4のようである。
When the valve 44 is opened after pickling for a predetermined time, the critical carbon dioxide is decompressed to a state below the critical point, and the acid solution 13 and the surfactant 36 used in the plating tank 1 are used. The two-layer state with is restored. This situation is as shown in FIG. During that time, high-pressure carbon dioxide is introduced into the plating tank 1 through the valve 25, and the pressure causes the used acid solution 13 and the surfactant 36 to be extruded, which is guided to the conduit 41 and moved to the liquid reservoir 20. Be accommodated. This situation is as shown in FIG.

【0047】このように本発明は超臨界状態の下で被処
理物4の酸化皮膜を除去しているから、被処理物を酸溶
液に浸漬する従来の酸洗い法に比べて、酸溶液の使用量
を低減し、これを迅速かつ容易に行えるとともに、メッ
キ槽1で酸洗いを行なっているから、従来のような専用
の酸洗い槽を要せず、その分設備費の低減を図れる。
As described above, according to the present invention, since the oxide film of the object 4 to be processed is removed under the supercritical condition, the acid solution of the acid solution is more easily compared with the conventional pickling method in which the object is immersed in the acid solution. The amount used can be reduced and this can be performed quickly and easily, and since the pickling tank 1 performs pickling, a dedicated pickling tank as in the conventional case is not required, and the equipment cost can be reduced accordingly.

【0048】こうして、酸溶液17を排出し終えたとこ
ろで、前記バルブ44を閉弁し、代わりにバルブ38を
開弁して、メッキ槽1内の使用後の二酸化炭素を前記導
入下の二酸化炭素によって押し出し、これを導管37に
導いてガス溜槽15へ移動し、収容する。その際、前記
二酸化炭素の移動時に系に流れが発生して、陽極3およ
び被処理物4を洗浄する。この状況は図4のようであ
る。この場合、酸溶液17と使用後の二酸化炭素の排出
順序を前述と反対にしても良いが、前述のようにすれば
両者を能率良く精密に排出できる。
Thus, when the acid solution 17 is completely discharged, the valve 44 is closed and the valve 38 is opened instead, so that the used carbon dioxide in the plating tank 1 is replaced with the carbon dioxide under the introduction. Is pushed out, and this is guided to the conduit 37, moved to the gas storage tank 15, and accommodated. At that time, a flow is generated in the system during the movement of the carbon dioxide, and the anode 3 and the object to be treated 4 are washed. This situation is as shown in FIG. In this case, the order of discharging the acid solution 17 and the carbon dioxide after use may be reversed from the above order, but if both are done as described above, both can be discharged efficiently and precisely.

【0049】そして、使用後の二酸化炭素を排出後、バ
ルブ38を閉じ、所定時間高圧の二酸化炭素7をメッキ
槽1内に導入する。このようにすると、メッキ槽1内が
加圧かつ加温され、二酸化炭素の臨界状態が形成され
て、この超臨界二酸化炭素が被処理物4に接触し、該被
処理物4および陽極3に付着している水分を高速かつ効
率良く洗浄し乾燥する。その際、撹拌子6を作動して超
臨界二酸化炭素を撹拌すれば、前記拡散が増進され洗浄
能率が向上する。
Then, after the used carbon dioxide is discharged, the valve 38 is closed and the high pressure carbon dioxide 7 is introduced into the plating tank 1 for a predetermined time. By doing so, the inside of the plating tank 1 is pressurized and heated, a critical state of carbon dioxide is formed, and this supercritical carbon dioxide comes into contact with the object 4 to be processed, and the object 4 and the anode 3 are processed. Quickly and efficiently clean the adhering moisture and dry it. At this time, if the stirrer 6 is operated to stir the supercritical carbon dioxide, the diffusion is enhanced and the cleaning efficiency is improved.

【0050】こうして被処理物4を洗浄し乾燥後、圧縮
ポンプ24を停止しバルブ25を閉じて、二酸化炭素の
導入を停止し、代わりにバルブ38を開弁し、メッキ槽
1内の使用後の二酸化炭素を導管37に導き、ガス溜槽
15へ移動して収容する。その際、前記二酸化炭素の移
動時に系に流れが発生して、陽極3および被処理物4を
洗浄する。この状況は図4のようである。したがって、
メッキ槽1内に前記種々の前処理を終え、乾燥された被
処理物4が置かれている。
After washing and drying the object to be treated 4 in this way, the compression pump 24 is stopped and the valve 25 is closed to stop the introduction of carbon dioxide, and instead the valve 38 is opened, after the use in the plating tank 1 is finished. Of carbon dioxide is introduced into the conduit 37 and moved to the gas storage tank 15 for storage. At that time, a flow is generated in the system during the movement of the carbon dioxide, and the anode 3 and the object to be treated 4 are washed. This situation is as shown in FIG. Therefore,
An object to be processed 4 that has been dried after the above various pretreatments is placed in the plating tank 1.

【0051】このような状況の下でバルブ30または3
1、この例ではバルブ30を開弁し、電解質溶液槽11
内の電解質溶液9を送液ポンプ33へ送り出し、同時に
前記溶液9に所定の界面活性剤34を加えて、これらを
メッキ槽1内へ送り込む。
Under such circumstances, the valve 30 or 3
1. In this example, the valve 30 is opened and the electrolyte solution tank 11 is opened.
The electrolyte solution 9 therein is sent out to the solution sending pump 33, and at the same time, a predetermined surfactant 34 is added to the solution 9 and sent into the plating tank 1.

【0052】前記電解質溶液9と界面活性剤34は、図
5(a)のようにメッキ槽1内で二層を形成する。この
状況の下で圧縮ポンプ24を駆動し、加熱手段26を作
動してガス容器8を開弁し、内部の二酸化炭素7を圧縮
ポンプ24へ導き、これを臨界圧以上の高圧に加圧し、
更に前記二酸化炭素を加熱手段26で臨界温度以上に加
熱して、超臨界二酸化炭素を生成し、これをバルブ25
の開弁を介してしてメッキ槽1へ導入する。
The electrolyte solution 9 and the surfactant 34 form two layers in the plating tank 1 as shown in FIG. Under this circumstance, the compression pump 24 is driven, the heating means 26 is operated to open the gas container 8, guide the internal carbon dioxide 7 to the compression pump 24, and pressurize the carbon dioxide 7 to a pressure higher than the critical pressure,
Further, the carbon dioxide is heated to a critical temperature or higher by the heating means 26 to generate supercritical carbon dioxide, which is then supplied to the valve 25.
It is introduced into the plating tank 1 through the opening valve.

【0053】こうして、超臨界二酸化炭素がメッキ槽1
へ導かれると、これがメッキ槽1に高速に拡散し、前記
電解質溶液9と界面活性剤34に急速に混合して乳濁化
し、電解質溶液9の微粒子がメッキ槽1内に高密度に拡
散し、被処理物4の表面に接触する。
Thus, the supercritical carbon dioxide is added to the plating tank 1
When it is introduced into the plating tank 1, it diffuses into the plating tank 1 at high speed, rapidly mixes with the electrolyte solution 9 and the surfactant 34 and becomes an emulsion, and the fine particles of the electrolyte solution 9 diffuse into the plating tank 1 at high density. , Contact the surface of the object 4 to be processed.

【0054】この状況の下でスイッチ5を閉じ、陽極3
および陰極4に通電すると、陽極片である純ニッケルが
電解して乳濁化した電解質溶液9に析出し、これが被処
理物4の表面に付着する。その際、撹拌子6を作動し、
前記乳濁物質を撹拌して前記電解ニッケルイオンを均一
に分布させ、被処理物4の表面に緻密に付着させる。こ
の状況は図5(b)のようである。
Under this condition, the switch 5 is closed and the anode 3
When the cathode 4 and the cathode 4 are energized, pure nickel as the anode piece is electrolyzed and deposited in the emulsified electrolyte solution 9, which adheres to the surface of the object to be treated 4. At that time, the stirrer 6 is activated,
The emulsion substance is agitated to evenly distribute the electrolytic nickel ions so that they are densely adhered to the surface of the object to be treated 4. This situation is as shown in FIG.

【0055】しかも、前記電解ニッケルイオンの電解、
析出および付着を超臨界状態で行なっているから、電解
ニッケルイオンがメッキ槽1内を速やかに拡散し、かつ
高密度で均一に分布して、被処理物4の表面および裏面
に付着する。したがって、電解質溶液中で陽極物質を電
解し析出、付着する従来のメッキ法に比べて、いわゆる
メッキのつき廻りが非常に良く、被処理物4の表面およ
び裏面に均一かつ緻密なメッキ状態を得られ、良好な仕
上がり面を得られる。
Moreover, the electrolysis of the electrolytic nickel ions,
Since the deposition and the deposition are performed in the supercritical state, the electrolytic nickel ions diffuse quickly in the plating tank 1 and are evenly distributed at a high density to be deposited on the front surface and the back surface of the object to be treated 4. Therefore, compared with the conventional plating method in which an anode material is electrolyzed and deposited in an electrolyte solution, the so-called plating contact is very good, and a uniform and dense plating state is obtained on the front and back surfaces of the object to be treated 4. And a good finished surface can be obtained.

【0056】このため、従来のメッキ法のように、被処
理物4の表面と裏面のメッキを分けて行なう面倒がな
く、その分生産性を向上でき、しかも被処理物4が複雑
な形状の場合でも、補助極を要することなく容易に対応
できる。
Therefore, unlike the conventional plating method, there is no need to separately plate the front surface and the back surface of the object to be processed 4, the productivity can be improved accordingly, and the object 4 to be processed has a complicated shape. Even in such a case, it is possible to easily cope with it without requiring an auxiliary electrode.

【0057】前記メッキ工程終了後、スイッチ5をOF
Fし、撹拌子6を停止してバルブ45を開弁すると、前
記二酸化炭素が減圧されて臨界点以下の状態に移行し、
急激に気化または液化するとともに、電解質溶液10と
界面活性剤34とが二層状態を回復する。この状況は図
5(c)のようである。
After the plating process is completed, the switch 5 is turned off.
F, when the stirrer 6 is stopped and the valve 45 is opened, the carbon dioxide is decompressed and moves to a state below the critical point,
The electrolytic solution 10 and the surfactant 34 are restored to the two-layer state while being vaporized or liquefied rapidly. This situation is as shown in FIG.

【0058】この後、バルブ45を開弁し、使用後の電
解質溶液18を界面活性剤34と一緒にメッキ槽1から
押し出し、これを導管42から液溜槽21へ導いて収容
するそして、電解質溶液18を排出後、バルブ45を閉
じ、代わりにバルブ38を開いて使用後の二酸化炭素を
メッキ槽1から押し出し、これを導管37からガス溜槽
16へ導いて収容する。その際、前記二酸化炭素の移動
時に系に流れが発生して、陽極3および被処理物4を洗
浄する。
After that, the valve 45 is opened, the used electrolyte solution 18 is pushed out together with the surfactant 34 from the plating tank 1, and this is introduced from the conduit 42 to the liquid storage tank 21 to be accommodated therein. After discharging 18, the valve 45 is closed and the valve 38 is opened instead to push out the used carbon dioxide from the plating tank 1 and guide it through the conduit 37 to the gas reservoir 16 for storage. At that time, a flow is generated in the system during the movement of the carbon dioxide, and the anode 3 and the object to be treated 4 are washed.

【0059】使用後の二酸化炭素を排出後、バルブ38
を閉じ、かつその間バルブ25を開弁して、高圧の二酸
化炭素7をメッキ槽1に導入する。このようにすると、
メッキ槽1内が加圧かつ加温され、二酸化炭素の超臨界
状態が形成されて、この超臨界二酸化炭素が被処理物4
に接触し、該被処理物4および陽極3に付着している水
分を高速かつ効率良く洗浄し乾燥する。その際、撹拌子
6を作動して超臨界二酸化炭素を撹拌すれば、前記拡散
が増進され洗浄能率が向上する。
After discharging the carbon dioxide after use, the valve 38
Is closed and the valve 25 is opened during that time to introduce high-pressure carbon dioxide 7 into the plating tank 1. This way,
The inside of the plating tank 1 is pressurized and heated to form a supercritical state of carbon dioxide.
To remove the moisture adhering to the object to be treated 4 and the anode 3 at high speed and efficiently and to dry it. At this time, if the stirrer 6 is operated to stir the supercritical carbon dioxide, the diffusion is enhanced and the cleaning efficiency is improved.

【0060】こうして被処理物4を洗浄し乾燥後、圧縮
ポンプ24を停止しバルブ25を閉じて、二酸化炭素の
導入を停止し、メッキ槽1の蓋(図示略)を開けて、メッ
キ処理後の被処理物4を取り出せば、一連のメッキ作業
が終了する。
After the object 4 is washed and dried in this way, the compression pump 24 is stopped, the valve 25 is closed, the introduction of carbon dioxide is stopped, the lid (not shown) of the plating tank 1 is opened, and the plating process is performed. When the object 4 to be processed is taken out, a series of plating work is completed.

【0061】なお、使用後の二酸化炭素がガス溜槽16
に所定量貯留されると、その外部のバルブを開弁し、前
記使用後の二酸化炭素をリターンパイプ39を介してカ
ラム40へ導き、該カラム40で前記ニ酸化炭素中の水
および油脂分を吸収し、初期状態に再生して適時、圧縮
ポンプ24へ還流し、再利用する。したがって、使用後
の二酸化炭素を大気中へ放出する無駄を解消し、また前
記放出による作業環境の悪化を未然に防止し得る。
It should be noted that the carbon dioxide after use is the gas storage tank 16
When a predetermined amount is stored in the column, the external valve is opened, the used carbon dioxide is introduced to the column 40 through the return pipe 39, and the column 40 removes the water and the oil / fat content in the carbon dioxide. It is absorbed, regenerated to the initial state, and when appropriate, returned to the compression pump 24 and reused. Therefore, it is possible to eliminate the waste of releasing the carbon dioxide after use into the atmosphere and prevent the deterioration of the working environment due to the release.

【0062】また、使用後の酸溶液17および電解質溶
液18,19が液溜槽20〜22に所定量貯留される
と、これらを混入した界面活性剤と分離し、または分離
せずに若干高濃度に調製して再生後、各溶液槽11,1
2,14へ還流する。したがって、従来のように被処理
物4を回収後、メッキ液等の煩雑な汲み戻しや濃縮調整
の面倒がない。
When the acid solution 17 and the electrolyte solutions 18 and 19 after use are stored in the liquid storage tanks 20 to 22 in a predetermined amount, they are separated from the mixed surfactant, or they are not separated and have a slightly high concentration. After preparation and regeneration, each solution tank 11,1
Reflux to 2,14. Therefore, there is no trouble of complicated pumping back of the plating solution or the like and concentration adjustment after the object 4 is collected as in the conventional case.

【0063】なお、被処理物4に複数のメッキ層を形成
する、いわゆる重ねメッキを行なう場合は、一層目のメ
ッキ終了後、被処理物4をメッキ槽1から取り出すこと
なく、前述の前処理を実行してメッキ処理すれば良い。
したがって従来の重ねメッキのように、メッキ終了後、
被処理物4をメッキ槽からいちいち取り出し、これを各
槽へ移動して前処理を行なう面倒がなく、生産性が向上
する。
When a plurality of plating layers are formed on the object 4 to be processed, that is, when so-called layered plating is performed, after the first layer is plated, the object 4 to be processed is not taken out of the plating tank 1 and the above-mentioned pretreatment is performed. It suffices to carry out and perform the plating process.
Therefore, like the conventional overplating, after plating,
The object 4 to be treated is taken out of the plating tank one by one, and it is moved to each tank to perform pretreatment, which improves productivity.

【0064】図8は本発明の他の実施形態を示し、前述
の実施形態と対応する構成部分には同一の符号を用いて
いる。なお、図8は実施形態の要部のみを図示し、各反
応浴槽1,1aに対する超臨界または亜臨界ニ酸化炭素
の供給と排出、並びに貯留部分の構成、および各種溶液
の供給と排出、並びに貯留部分の構成は図示を省略して
おり、当該部は図1と実質的に同一である。
FIG. 8 shows another embodiment of the present invention, and the same reference numerals are used for the components corresponding to those of the above-mentioned embodiment. Note that FIG. 8 illustrates only a main part of the embodiment, and supplies and discharges of supercritical or subcritical carbon dioxide to and from the reaction baths 1 and 1a, a configuration of a storage portion, supply and discharge of various solutions, and The structure of the storage portion is not shown, and the portion is substantially the same as that in FIG.

【0065】この実施形態は、実質的に同一な反応浴槽
1,1aを複数、実施形態では2つ並設し、これらを導
管52,53で連通し、該導管52,53にバルブ5
4,55を介挿する。これらの反応浴槽1,1aは、同
一の処理工程を交互に実行可能で、一方の反応浴槽1で
一連のメッキ処理工程の一部、例えば前処理、他方の反
応浴槽1aで一連のメッキ処理工程の残部、例えばメッ
キ処理と後処理とを実行させ、一連のメッキ処理を実現
させている。
In this embodiment, a plurality of reaction baths 1 and 1a which are substantially the same, two in the embodiment, are arranged in parallel, and these are connected by conduits 52 and 53, and the valves 5 and 5 are connected to the conduits 52 and 53.
Insert 4,55. These reaction baths 1 and 1a can alternately execute the same treatment process, and a part of a series of plating treatment processes in one reaction bath 1, for example, pretreatment, a series of plating treatment processes in the other reaction bath 1a. The remaining part, for example, the plating process and the post-process are executed to realize a series of plating processes.

【0066】すなわち、一方の反応浴槽1で被処理物4
のメッキ処理工程の一部、例えば脱脂洗浄、酸洗い等の
前処理を行ない、使用後の各種ガスおよび溶液を前記貯
留槽(図示略)に収容する。他方の反応浴槽1aでは既に
前記前処理工程を終えてメッキ処理を実行し、かつメッ
キ処理後の被処理物4を回収、洗浄、乾燥し、使用後の
各種ガスおよび溶液を前記貯留槽(図示略)に収容する。
この状況はステップ1のようである。この場合、反応浴
槽1aに対する二酸化炭素は、バルブ54より下流側の
導管52に導入する。
That is, the object to be treated 4 is placed in one of the reaction baths 1.
Pretreatment such as degreasing cleaning, pickling, etc. is performed in part of the plating treatment step, and various gases and solutions after use are stored in the storage tank (not shown). In the other reaction bath 1a, the pretreatment process has already been completed, the plating process is performed, and the object 4 to be treated after the plating process is collected, washed and dried, and various gases and solutions after use are stored in the storage tank (shown in the figure). (Omitted).
This situation is like step 1. In this case, carbon dioxide for the reaction bath 1a is introduced into the conduit 52 on the downstream side of the valve 54.

【0067】次にステップ2では、反応浴槽1が既に前
処理工程を終えてメッキ処理を実行し、かつメッキ処理
後の被処理物4を回収、洗浄、乾燥し、使用後の各種ガ
スおよび溶液を前記貯留槽(図示略)に収容する。一方、
反応浴槽1aでは前記メッキ処理を終えて、新たな被処
理物4を取り付け、該被処理物4の脱脂洗浄、酸洗い等
の前処理を行ない、使用後の各種ガスおよび溶液を前記
貯留槽(図示略)に収容する。
Next, in step 2, the reaction bath 1 has already completed the pretreatment process and has carried out the plating treatment, and the object 4 to be treated after the plating treatment is recovered, washed and dried, and various gases and solutions after use are used. Is stored in the storage tank (not shown). on the other hand,
In the reaction bath 1a, after the plating treatment is completed, a new object 4 is attached, pretreatment such as degreasing cleaning and pickling of the object 4 is performed, and various gases and solutions after use are stored in the storage tank ( (Not shown).

【0068】このようにこの実施形態では、複数の反応
浴槽1,1aでメッキ処理工程の前後処理、つまり全処
理工程の一部とその残部処理を交互に行わせて、一連の
メッキ作業を合理的かつ迅速に行なうようにしている。
As described above, in this embodiment, the series of plating operations are rationalized by alternately performing the pre-processing and post-processing of the plating process, that is, a part of the whole process and the rest of the process in the plurality of reaction baths 1 and 1a. I try to do it quickly and objectively.

【0069】なお、前述の実施形態のように電解した電
極物質を他方の電極物質に析出付着する方法は、原理的
に同様な電鋳および陽極酸化皮膜形成法に適用すること
ができ、前述と同様な効果を得られる。また、反応浴槽
に電解物質と電極物質を収容し、一方の電極物質を電解
し、これを他方の電極物質側で採集する電解法にも、本
発明を適用することが可能であり、そのようにすること
で、例えば金属の電解精製、電解抽出、電解研磨等に適
用することができ、前述と同様な効果を得られる。
The method of depositing and depositing the electrolyzed electrode substance on the other electrode substance as in the above-described embodiment can be applied to the same electroforming and anodic oxide film forming methods in principle. Similar effects can be obtained. The present invention can also be applied to an electrolysis method in which an electrolytic substance and an electrode substance are accommodated in a reaction bath, one electrode substance is electrolyzed, and this is collected on the other electrode substance side. With this, it can be applied to, for example, electrolytic refining of metals, electrolytic extraction, electrolytic polishing, etc., and the same effects as described above can be obtained.

【0070】また、電解物質を収容可能な反応浴槽に被
処理物を収容し、電解質溶液に含まれる電解物質を前記
被処理物に析出付着し、外部電界を加えない無電解メッ
キや化成処理法にも本発明を適用することが可能であ
り、そのようにすることで前述と同様な効果を得られ
る。
Further, an object to be treated is contained in a reaction bath capable of accommodating an electrolytic substance, and the electrolytic substance contained in the electrolyte solution is deposited and adhered on the object to be treated, and electroless plating or chemical conversion treatment method without applying an external electric field. The present invention can also be applied to this, and by doing so, the same effect as described above can be obtained.

【0071】[0071]

【発明の効果】以上のように、請求項1の発明は、電解
物質および電解質溶液を収容した反応浴槽を超臨界状態
または亜臨界状態に形成し、該状態の下で前記電極物質
を電解し、若しくは前記電解した電極物質およびまたは
電解質溶液に含まれる電解物質を他方の電極物質に析出
付着するようにしたから、例えば電気メッキ等の電気化
学的処理に好適で、超臨界または亜臨界二酸化炭素を用
いて、各処理工程を安全で合理的かつ速やかに行なえ、
使用後の二酸化炭素および処理溶液等を合理的かつ迅速
に処理するとともに、酸洗い液やメッキ液等の使用量を
抑制し、更にメッキ作業から発生する廃液量を低減し
て、環境汚染を防止し、作業環境を改善して生産性を向
上するとともに、それらの再利用を図ることができる。
また、メッキのつき廻りを飛躍的に向上し、美麗な仕上
がりを得られるとともに、被処理物の裏面や凹部にも緻
密かつ一様なメッキを容易に実現し、その生産性を向上
することができ、これを電鋳法や陽極酸化皮膜形成法、
電解研磨法に適用可能にし、その生産性の向上と良好な
仕上がり状態を得られる効果がある。
As described above, the invention of claim 1 forms a reaction bath containing an electrolytic substance and an electrolyte solution in a supercritical state or a subcritical state, and electrolyzes the electrode substance under the state. Alternatively, the electrolyzed electrode material and / or the electrolyte material contained in the electrolyte solution is deposited and adhered to the other electrode material, so that it is suitable for electrochemical treatment such as electroplating, and is supercritical or subcritical carbon dioxide. , You can perform each processing step safely, reasonably and promptly,
Reasonably and quickly treats carbon dioxide and treatment solutions after use, suppresses the amount of pickling solution and plating solution used, and further reduces the amount of waste liquid generated from plating work to prevent environmental pollution. However, it is possible to improve the working environment to improve productivity and reuse them.
In addition, the distribution of plating can be dramatically improved, and a beautiful finish can be achieved, and precise and uniform plating can be easily achieved on the back surface and concave portions of the object to be processed, and the productivity can be improved. You can do this, electroforming method or anodic oxide film forming method,
It is applicable to the electrolytic polishing method, and has the effect of improving its productivity and obtaining a good finished state.

【0072】請求項2の発明は、電解物質を収容した反
応浴槽を超臨界状態または亜臨界状態に形成し、該状態
の下で前記電解物質を電解し、これを他方の電極物質側
で採集するようにしたから、金属の電解抽出、精錬法に
適用可能にし、生産性の向上と良好な仕上がり状態を得
られる。請求項3の発明、電解物質を収容した反応浴槽
を超臨界状態または亜臨界状態に形成し、該状態の下で
前記電解物質を被処理物に析出付着するようにしたか
ら、外部電界を要しない無電界メッキや化成処理法に適
用可能にし、その生産性の向上と良好な仕上がり状態を
得られる。請求項4の発明は、電極物質を電解し、若し
くは前記電解した電極物質およびまたは電解質溶液に含
まれる電解物質を他方の電極物質に析出付着後、若しく
は前記電解物質を電解し、これを他方の電極物質側で採
集後、前記反応浴槽を超臨界状態または亜臨界状態から
前記臨界点以下の状態へ移行したから、電解質溶液と超
臨界または亜臨界物質を二層状態に戻し、それらの排出
を実現するとともに、前記移行時に反応浴槽等の系内に
急激な流れを形成し、被処理物の洗浄および乾燥を促す
ことができる。
According to the second aspect of the present invention, the reaction bath containing the electrolytic substance is formed in a supercritical state or a subcritical state, the electrolytic substance is electrolyzed under the state, and this is collected on the other electrode substance side. By doing so, it can be applied to the electrolytic extraction and refining methods of metals, and the productivity can be improved and a good finished state can be obtained. According to the invention of claim 3, the reaction bath containing the electrolytic substance is formed in a supercritical state or a subcritical state, and the electrolytic substance is deposited and adhered to the object to be treated under the state, so that an external electric field is required. It can be applied to electroless plating and chemical conversion treatment methods, and its productivity can be improved and a good finished state can be obtained. In the invention of claim 4, the electrode material is electrolyzed, or after the electrolyzed electrode material and / or the electrolytic material contained in the electrolyte solution is deposited and adhered to the other electrode material, or the electrolytic material is electrolyzed, and the other is electrolyzed. After collecting on the electrode material side, since the reaction bath transitioned from the supercritical state or subcritical state to the state below the critical point, the electrolyte solution and the supercritical or subcritical substance were returned to the two-layer state, and their discharge was performed. At the same time, it is possible to realize a rapid flow in the system such as a reaction bath at the time of the above-mentioned transition to promote cleaning and drying of the object to be treated.

【0073】請求項5の発明は、前記電極物質若しくは
電解物質の電解後に、超臨界状態の物質または亜臨界状
態の物質を前記反応浴槽に導入し、前記電極物質を洗浄
し、若しくは酸化皮膜を除去するようにしたから、それ
らの処理を合理的かつ迅速に行ない、その乾燥を促すこ
とができる。請求項6の発明は、前記電極物質若しくは
電解物質の電解後に、超臨界状態の物質または亜臨界状
態の物質を前記反応浴槽に導入し、前記電極物質若しく
は電解物質採集側を洗浄し、若しくは乾燥するようにし
たから、それらの処理を合理的かつ迅速に行ない、その
乾燥を促すことができる。請求項7の発明は、電極物質
の電解時に、前記反応浴槽に超臨界状態の物質または亜
臨界状態の物質と電解物質と界面活性剤とを導入し、前
記反応浴槽内を超臨界状態または亜臨界で乳濁させたか
ら、電極物質または電解物質の析出付着を均一で迅速か
つ高密度に行ない、例えばメッキのつき廻りを飛躍的に
向上し、美麗な仕上がりを得られるとともに、被処理物
の裏面や凹部にも緻密かつ一様なメッキを容易に実現
し、その生産性を向上することができる。
According to a fifth aspect of the present invention, after electrolysis of the electrode substance or electrolytic substance, a substance in a supercritical state or a substance in a subcritical state is introduced into the reaction bath to wash the electrode substance or to form an oxide film. Since they are removed, they can be treated reasonably and quickly to promote their drying. In the invention of claim 6, after electrolysis of the electrode substance or the electrolytic substance, a substance in a supercritical state or a substance in a subcritical state is introduced into the reaction bath, and the electrode substance or the electrolyte substance collecting side is washed or dried. By doing so, it is possible to perform such treatment reasonably and quickly and promote the drying thereof. The invention of claim 7 introduces a substance in a supercritical state or a substance in a subcritical state, an electrolytic substance and a surfactant into the reaction bath at the time of electrolysis of the electrode substance, so that the inside of the reaction bath is in a supercritical state or a subcritical state. Since it is emulsified at a critical level, electrode substances or electrolytic substances can be deposited and adhered uniformly and quickly and with high density. For example, the plating coverage can be dramatically improved and a beautiful finish can be obtained, and the back surface of the object to be treated can be obtained. It is possible to easily realize precise and uniform plating on the concave portion and the concave portion and improve the productivity.

【0074】請求項8の発明は、電極物質若しくは電解
物質の電解前に、前記反応浴槽に超臨界状態の物質また
は亜臨界状態の物質と酸化皮膜除去溶液と界面活性剤と
を導入し、前記反応浴槽内を超臨界状態または亜臨界状
態で乳濁させるようにしたから、それらの処理を合理的
かつ迅速に、しかも高密度に行なうことができる。請求
項9の発明は、反応浴槽の外部に前記反応浴槽に連通可
能な貯留槽を設け、該貯留槽に使用後の超臨界物質また
は亜臨界物質、電解物質または洗浄若しくは酸化皮膜除
去物質を貯留させるようにしたから、それらの排出を制
止し、その再生や合理的かつ有効な使用を図ることがで
きる。請求項10の発明は、貯留槽に貯留した使用後の
超臨界物質または亜臨界物質を再生して反応浴槽に還流
し、または前記貯留槽に貯留した使用後の電解物質また
は洗浄若しくは酸化皮膜除去物質を再生して各溶液槽に
還流するようにしたから、使用後の超臨界物質または亜
臨界物質や、使用後の電解物質または洗浄若しくは酸化
皮膜除去物質等の有効利用を図ることができる。
According to the eighth aspect of the present invention, before the electrolysis of the electrode substance or the electrolytic substance, the substance in the supercritical state or the substance in the subcritical state, the oxide film removing solution, and the surfactant are introduced into the reaction bath. Since the inside of the reaction bath is emulsified in a supercritical state or a subcritical state, these treatments can be performed reasonably, quickly and with high density. According to the invention of claim 9, a storage tank is provided outside the reaction bath which can communicate with the reaction bath, and the used supercritical substance or subcritical substance, electrolytic substance or cleaning or oxide film removing substance is stored in the storage bath. By doing so, it is possible to suppress the discharge of them, and to recycle them and promote rational and effective use. The invention according to claim 10 regenerates the used supercritical substance or subcritical substance stored in the storage tank and recirculates it to the reaction bath, or the used electrolytic substance or cleaning or oxide film removal stored in the storage tank. Since the substance is regenerated and refluxed in each solution tank, it is possible to effectively use the supercritical substance or subcritical substance after use, the electrolytic substance after use, or the cleaning or oxide film removing substance.

【0075】請求項11の発明は、電極物質の析出付着
およびその前処理工程または前記電解物質の電解および
採集並びにその前処理工程を、単一の反応浴槽で処理し
たから、前記処理工程毎の浴槽を廃し、設備費の低減と
設置スペースのコンパクト化を図るとともに、前記浴槽
毎に被処理物を移動する煩雑を解消し、その作業能率を
向上することができる。請求項12の発明は、電極物質
の析出付着およびその前後の処理工程または前記電解物
質の電解および採集並びにその前後の処理工程を実行可
能な少なくとも二つの反応浴槽を設け、この一方の反応
浴槽で前記処理工程の一部を実行し、他方の反応浴槽で
前記処理工程の残部を実行し、かつこれらの処理を前記
反応浴槽間で交互に実行するようにしたから、複数の反
応浴槽で一連の処理工程を二つに分けて、これを交互に
行わせ、一連の処理作業を合理的かつ迅速に行なうこと
ができる。請求項13の発明は、電極物質を電解し、ま
たは前記電解した電極物質を他方の電極物質に析出付着
後、前記反応浴槽を使用して、他方の電極物質に複数層
の電極物質を析出付着するようにしたから、被処理物を
反応浴槽から搬出することなく、次層の電極物質の前処
理、析出付着を続行可能にし、作業性および生産性を向
上することができる。
In the eleventh aspect of the present invention, since the deposition and deposition of the electrode material and the pretreatment step thereof, or the electrolysis and collection of the electrolytic material and the pretreatment step thereof are performed in a single reaction bath, each of the treatment steps is performed. It is possible to eliminate the bathtub, reduce the facility cost and make the installation space compact, eliminate the complexity of moving the object to be treated for each bath, and improve the work efficiency. According to the invention of claim 12, at least two reaction baths capable of carrying out the deposition and deposition of the electrode substance and the treatment process before and after it or the electrolysis and collection of the electrolytic substance and the treatment process before and after it are provided. Since a part of the treatment process is executed, the rest of the treatment process is executed in the other reaction bath, and these treatments are alternately executed between the reaction baths, a series of reaction baths is used. It is possible to perform a series of processing operations reasonably and quickly by dividing the processing steps into two and alternately performing these. According to a thirteenth aspect of the present invention, the electrode material is electrolyzed, or after the electrolyzed electrode material is deposited and adhered to the other electrode material, the reaction bath is used to deposit and adhere a plurality of layers of electrode material to the other electrode material. By doing so, it is possible to continue the pretreatment and deposition adhesion of the electrode material of the next layer without carrying out the object to be treated from the reaction bath, and it is possible to improve workability and productivity.

【0076】請求項14の発明は、電解物質を収容した
反応浴槽を超臨界状態または亜臨界状態に形成し、該状
態の下で前記電極物質を電解し、若しくは前記電解した
電極物質およびまたは電解質溶液に含まれる電解物質を
他方の電極物質に析出付着するようにしたから、するよ
うにしたから、例えば電気メッキ等の電気化学的処理に
好適で、超臨界または亜臨界二酸化炭素を用いて、各処
理工程を安全で合理的かつ速やかに行なえ、使用後の二
酸化炭素および処理溶液等を合理的かつ迅速に処理する
とともに、酸洗い液やメッキ液等の使用量を抑制し、更
にメッキ作業から発生する廃液量を低減して、環境汚染
を防止し、作業環境を改善して生産性を向上するととも
に、それらの再利用を図ることができる。また、メッキ
のつき廻りを飛躍的に向上し、美麗な仕上がりを得られ
るとともに、被処理物の裏面や凹部にも緻密かつ一様な
メッキを容易に実現し、その生産性を向上することがで
き、これを電鋳法や陽極酸化皮膜形成法、電解研磨法に
適用可能にし、その生産性の向上と良好な仕上がり状態
を得られる効果がある。
According to a fourteenth aspect of the present invention, a reaction bath containing an electrolytic substance is formed in a supercritical state or a subcritical state, and the electrode substance is electrolyzed under the state, or the electrolyzed electrode substance and / or electrolyte. Since the electrolytic substance contained in the solution is deposited and adhered to the other electrode substance, it is so suitable for electrochemical treatment such as electroplating, using supercritical or subcritical carbon dioxide, Each treatment process can be performed safely, rationally and promptly, carbon dioxide and treatment solution after use can be treated rationally and promptly, and the amount of pickling solution and plating solution used can be reduced, It is possible to reduce the amount of waste liquid generated, prevent environmental pollution, improve the working environment to improve productivity, and reuse them. In addition, the distribution of plating can be dramatically improved, and a beautiful finish can be achieved, and precise and uniform plating can be easily achieved on the back surface and concave portions of the object to be processed, and the productivity can be improved. This can be applied to the electroforming method, the anodic oxide film forming method, and the electrolytic polishing method, and there is an effect that the productivity can be improved and a good finished state can be obtained.

【0077】請求項15の発明は、電解物質を収容した
反応浴槽を超臨界状態または亜臨界状態に形成し、該状
態の下で前記電解物質を電解し、これを他方の電極物質
側で採集するようにしたから、金属の電解抽出、精錬法
に適用可能にし、生産性の向上と良好な仕上がり状態を
得ることができる。請求項16の発明は、電解物質を収
容した反応浴槽を超臨界状態または亜臨界状態に形成
し、該状態の下で前記電解物質を被処理物に析出付着す
るようにしたから、外部電界を要しない無電界メッキや
化成処理法に適用可能にし、その生産性の向上と良好な
仕上がり状態を得られる効果がある。請求項17の発明
は、電極物質を電解し、若しくは前記電解した電極物質
およびまたは電解質溶液に含まれる電解物質を他方の電
極物質に析出付着後、若しくは前記電解物質を電解し、
これを他方の電極物質側で採集後、前記反応浴槽を超臨
界状態または亜臨界状態から低圧側へ移行可能にしたか
ら、電解質溶液と超臨界または亜臨界物質を二層状態に
戻し、それらの排出を実現するとともに、前記移行時に
反応浴槽等の系内に急激な流れを形成し、被処理物の洗
浄および乾燥を促すことができる。
According to a fifteenth aspect of the present invention, a reaction bath containing an electrolytic substance is formed in a supercritical state or a subcritical state, the electrolytic substance is electrolyzed under the state, and this is collected on the other electrode substance side. Therefore, the method can be applied to the electrolytic extraction and refining methods of metals, and the productivity can be improved and a good finished state can be obtained. According to the sixteenth aspect of the invention, the reaction bath containing the electrolytic substance is formed in a supercritical state or a subcritical state, and the electrolytic substance is deposited and adhered to the object to be treated under the state. It is applicable to electroless plating and chemical conversion treatment methods that do not require it, and has the effect of improving its productivity and obtaining a good finished state. In the invention of claim 17, the electrode material is electrolyzed, or after the electrolyzed electrode material and / or the electrolytic material contained in the electrolyte solution is deposited on the other electrode material, or the electrolytic material is electrolyzed,
After collecting this on the other electrode material side, since it was possible to transfer the reaction bath from the supercritical state or subcritical state to the low pressure side, the electrolyte solution and the supercritical or subcritical substance were returned to the two-layer state, and those At the same time as the discharge, it is possible to form a rapid flow in the system such as the reaction bath at the time of the above-mentioned transition to promote cleaning and drying of the object to be treated.

【0078】請求項18の発明は、反応浴槽の外部に前
記反応浴槽に連通可能な貯留槽を設け、該貯留槽に使用
後の超臨界状態の物質または亜臨界状態の物質若しくは
電解物質または洗浄若しくは酸化皮膜除去物質を貯留さ
せるようにしたから、それらの排出を制止し、その再生
や合理的かつ有効な使用を図ることができる。請求項1
9の発明は、貯留槽に貯留した使用後の超臨界物質また
は亜臨界物質を再生して反応浴槽に還流し、または前記
貯留槽に貯留した使用後の電解物質または洗浄若しくは
酸化皮膜除去物質を再生して反応浴槽に還流するように
したから、使用後の超臨界物質または亜臨界物質や、使
用後の電解物質または洗浄若しくは酸化皮膜除去物質等
の有効利用を図ることができる。請求項20の発明は、
電極物質の析出付着およびその前処理工程または前記電
解物質の電解および採集並びにその前処理工程を、単一
の反応浴槽で処理可能にしたから、前記処理工程毎の浴
槽を廃し、設備費の低減と設置スペースのコンパクト化
を図るとともに、前記浴槽毎に被処理物を移動する煩雑
を解消し、その作業能率を向上することができる。
According to the eighteenth aspect of the present invention, a storage tank, which can communicate with the reaction bath, is provided outside the reaction bath, and the supercritical state substance or subcritical state substance or electrolytic substance after use or cleaning is used in the storage bath. Alternatively, since the oxide film-removing substance is stored, it is possible to prevent the discharge of the substance and to regenerate it or to use it reasonably and effectively. Claim 1
The invention of 9 is to regenerate a used supercritical substance or subcritical substance stored in a storage tank and recirculate it to a reaction bath, or to use an electrolytic substance or a cleaning or oxide film removal substance stored in the storage tank after use. Since it is regenerated and refluxed in the reaction bath, it is possible to effectively use the supercritical substance or subcritical substance after use, the electrolytic substance after use, or the cleaning or oxide film removing substance. The invention of claim 20 is
Since the deposition and adhesion of electrode material and its pretreatment step or the electrolysis and collection of the electrolytic material and its pretreatment step can be treated in a single reaction bath, the bath for each treatment step is eliminated and the equipment cost is reduced. Thus, the installation space can be made compact, the complexity of moving the object to be treated for each bath can be eliminated, and the work efficiency thereof can be improved.

【0079】請求項21の発明は、電極物質の析出付着
およびその前後の処理工程または前記電解物質の電解お
よび採集並びにその前後の処理工程を実行可能な少なく
とも二つの反応浴槽を設け、この一方の反応浴槽で前記
処理工程の一部を実行し、他方の反応浴槽で前記処理工
程の残部を実行し、かつこれらの処理を前記反応浴槽間
で交互に実行可能にしたから、複数の反応浴槽で一連の
処理工程を二つに分けて、これを交互に行わせ、一連の
処理作業を合理的かつ迅速に行なうことができる。請求
項22の発明は、前記電極物質を電解し、または前記電
解した電極物質を他方の電極物質に析出付着後、前記反
応浴槽を使用して、他方の電極物質に複数層の電極物質
を析出付着するようにしたから、被処理物を反応浴槽か
ら搬出することなく、次層の電極物質の前処理、析出付
着を続行可能にし、作業性をおよび生産性を向上するこ
とができる。
According to a twenty-first aspect of the present invention, at least two reaction baths capable of carrying out the deposition and deposition of electrode material and the treatment steps before and after it or the electrolysis and collection of the electrolytic material and the treatment steps before and after it are provided. Since a part of the treatment process is performed in the reaction bath, the rest of the treatment process is performed in the other reaction bath, and these treatments can be performed alternately between the reaction baths, a plurality of reaction baths can be used. A series of processing steps can be divided into two and performed alternately, and a series of processing operations can be performed reasonably and quickly. In the invention of claim 22, the electrode material is electrolyzed, or the electrolyzed electrode material is deposited and adhered to the other electrode material, and then the reaction bath is used to deposit a plurality of layers of electrode material on the other electrode material. Since the adhesion is performed, the pretreatment of the electrode material of the next layer and the deposition adhesion can be continued without carrying out the object to be treated from the reaction bath, and the workability and the productivity can be improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施形態を示す説明図で、単一の反応
浴槽を用いてメッキ処理の多工程を実施させている。
FIG. 1 is an explanatory view showing an embodiment of the present invention, in which a single reaction bath is used to carry out multiple steps of plating treatment.

【図2】前記メッキ処理の脱脂および洗浄処理工程を示
す説明図である。
FIG. 2 is an explanatory diagram showing a degreasing and cleaning treatment step of the plating treatment.

【図3】前記メッキ処理の酸化皮膜除去および被処理物
活性化処理工程を順に示す説明図である。
FIG. 3 is an explanatory diagram sequentially showing an oxide film removal process and an object activation process of the plating process.

【図4】前記メッキ処理の酸溶液排出および洗浄工程を
示す説明図である。
FIG. 4 is an explanatory diagram showing an acid solution discharging and cleaning step of the plating process.

【図5】前記メッキ処理のメッキ工程を順に示す説明図
である。
FIG. 5 is an explanatory view sequentially showing a plating process of the plating process.

【図6】前記メッキ処理の電解質溶液排出および洗浄工
程を示す説明図である。
FIG. 6 is an explanatory diagram showing an electrolyte solution discharging and cleaning step of the plating treatment.

【図7】前記メッキ処理の乾燥および洗浄工程を示す説
明図である。
FIG. 7 is an explanatory diagram showing a drying and cleaning step of the plating process.

【図8】本発明の第2の実施形態の要部を示す説明図
で、二つの反応浴槽を用いてメッキ処理の前後処理工程
を実施させている。
FIG. 8 is an explanatory diagram showing a main part of a second embodiment of the present invention, in which two reaction baths are used to perform pre-processing and post-processing steps of a plating process.

【符号の説明】[Explanation of symbols]

1,1a 反応浴槽 3 電極物質(陽極) 4 電極物質(陰極) 9,11 電解質溶液 13 酸溶液(酸化皮膜除去溶
液) 20〜22 貯留槽 34〜36 界面活性剤
1,1a Reaction bath 3 Electrode material (anode) 4 Electrode material (cathode) 9,11 Electrolyte solution 13 Acid solution (oxide film removal solution) 20-22 Storage tanks 34-36 Surfactant

───────────────────────────────────────────────────── フロントページの続き (72)発明者 吉田 英夫 東京都東村山市久米川町5−33−6 (72)発明者 宮田 清蔵 東京都保谷市下保谷3丁目18番26号 (72)発明者 曽根 正人 東京都小金井市本町3−11−8 (72)発明者 岩尾 文子 千葉県習志野市香澄4−3−5−4 (72)発明者 浅井 美博 東京都小金井市東町2−11−4 (72)発明者 浅井 大恵 東京都小金井市東町2−11−4   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Hideo Yoshida             5-33-6 Kumegawa-cho, Higashimurayama-shi, Tokyo (72) Inventor Seizo Miyata             3-18-18 Shimohoya, Hoya-shi, Tokyo (72) Inventor Masato Sone             3-11-8 Honmachi, Koganei-shi, Tokyo (72) Inventor Fumiko Iwao             4-3-5-4 Kasumi, Narashino City, Chiba Prefecture (72) Inventor Yoshihiro Asai             2-11-4 Higashimachi, Koganei-shi, Tokyo (72) Inventor Daie Asai             2-11-4 Higashimachi, Koganei-shi, Tokyo

Claims (22)

【特許請求の範囲】[Claims] 【請求項1】 電解物質を収容可能な反応浴槽に陰極お
よび陽極の電極物質を収容し、前記一方の電極物質を電
解し、若しくは前記電解した電極物質およびまたは電解
質溶液に含まれる電解物質を他方の電極物質に析出付着
するようにした電気メッキ等の電気化学的処理方法にお
いて、前記電解物質および電解質溶液を収容した反応浴
槽を超臨界状態または亜臨界状態に形成し、該状態の下
で前記電極物質を電解し、若しくは前記電解した電極物
質およびまたは電解質溶液に含まれる電解物質を他方の
電極物質に析出付着するようにしたことを特徴とする電
気メッキ等の電気化学的処理方法。
1. A reaction bath capable of accommodating an electrolytic substance accommodates electrode materials of a cathode and an anode, electrolyzes one electrode substance, or electrolyzes the electrode substance and / or the electrolytic substance contained in an electrolyte solution. In the electrochemical treatment method such as electroplating so as to deposit and adhere to the electrode substance, the reaction bath containing the electrolytic substance and the electrolyte solution is formed in a supercritical state or a subcritical state, and under the state, An electrochemical treatment method such as electroplating, characterized in that an electrode material is electrolyzed, or the electrolyzed electrode material and / or an electrolyte material contained in an electrolyte solution is deposited and attached to the other electrode material.
【請求項2】 電解物質を収容可能な反応浴槽に陰極お
よび陽極の電極物質を収容し、前記電解物質を電解し、
これを他方の電極物質側で採集するようにした電気メッ
キ等の電気化学的処理方法において、電解物質を収容し
た反応浴槽を超臨界状態または亜臨界状態に形成し、該
状態の下で前記電解物質を電解し、これを他方の電極物
質側で採集するようにしたことを特徴とする電気メッキ
等の電気化学的処理方法。
2. A reaction bath capable of accommodating an electrolytic substance, accommodating cathode and anode electrode substances, and electrolyzing the electrolytic substance,
In an electrochemical treatment method such as electroplating in which this is collected on the other electrode material side, a reaction bath containing an electrolyte is formed in a supercritical state or a subcritical state, and the electrolysis is performed under the state. A method for electrochemical treatment such as electroplating, characterized in that a substance is electrolyzed and collected on the side of the other electrode substance.
【請求項3】 電解物質を収容可能な反応浴槽に被処理
物を収容し、電解質溶液に含まれる電解物質を前記被処
理物に析出付着するようにした電気メッキ等の電気化学
的処理方法において、電解物質を収容した反応浴槽を超
臨界状態または亜臨界状態に形成し、該状態の下で前記
電解物質を被処理物に析出付着するようにしたことを特
徴とする電気メッキ等の電気化学的処理方法。
3. An electrochemical treatment method such as electroplating in which an object to be treated is contained in a reaction bath capable of containing an electrolytic substance, and the electrolytic substance contained in an electrolyte solution is deposited and adhered to the object to be treated. An electrochemistry such as electroplating, characterized in that a reaction bath containing an electrolytic substance is formed in a supercritical state or a subcritical state, and under the state, the electrolytic substance is deposited and adhered to an object to be treated. Processing method.
【請求項4】 前記電極物質を電解し、若しくは前記電
解した電極物質およびまたは電解質溶液に含まれる電解
物質を他方の電極物質に析出付着後、若しくは前記電解
物質を電解し、これを他方の電極物質側で採集後、前記
反応浴槽を超臨界状態または亜臨界状態から前記臨界点
以下の状態へ移行する請求項1または2または3記載の
電気メッキ等の電気化学的処理方法。
4. The electrode material is electrolyzed, or the electrolyzed electrode material and / or the electrolyte material contained in an electrolyte solution is deposited and adhered to the other electrode material, or the electrolyte material is electrolyzed, and the other electrode is electrolyzed. The method for electrochemical treatment such as electroplating according to claim 1, 2 or 3, wherein the reaction bath is transferred from a supercritical state or a subcritical state to a state below the critical point after collection on the material side.
【請求項5】 前記電極物質若しくは電解物質の電解前
に、超臨界状態の物質または亜臨界状態の物質を前記反
応浴槽に導入し、前記電極物質を洗浄し、若しくは酸化
皮膜を除去する請求項1または2または3記載の電気メ
ッキ等の電気化学的処理方法。
5. Prior to electrolysis of the electrode substance or electrolytic substance, a substance in a supercritical state or a substance in a subcritical state is introduced into the reaction bath to wash the electrode substance or remove an oxide film. An electrochemical treatment method such as electroplating according to 1 or 2 or 3.
【請求項6】 前記電極物質若しくは電解物質の電解後
に、超臨界状態の物質または亜臨界状態の物質を前記反
応浴槽に導入し、前記電極物質若しくは電解物質採集側
を洗浄し、若しくは乾燥する請求項1または2または3
記載の電気メッキ等の電気化学的処理方法。
6. After electrolysis of the electrode substance or electrolytic substance, a substance in a supercritical state or a substance in a subcritical state is introduced into the reaction bath, and the electrode substance or electrolytic substance collecting side is washed or dried. Item 1 or 2 or 3
An electrochemical treatment method such as the electroplating described.
【請求項7】 前記電極物質の電解時に、前記反応浴槽
に超臨界状態の物質または亜臨界状態の物質と電解物質
と界面活性剤とを導入し、前記反応浴槽内を超臨界状態
または亜臨界で乳濁させる請求項1記載の電気メッキ等
の電気化学的処理方法。
7. When the electrode material is electrolyzed, a supercritical substance or a subcritical substance, an electrolytic substance and a surfactant are introduced into the reaction bath so that the inside of the reaction bath is in the supercritical state or the subcritical state. The method for electrochemical treatment such as electroplating according to claim 1, wherein the method is emulsified.
【請求項8】 前記電極物質若しくは電解物質の電解前
に、前記反応浴槽に超臨界状態の物質または亜臨界状態
の物質と酸化皮膜除去溶液と界面活性剤とを導入し、前
記反応浴槽内を超臨界状態または亜臨界状態で乳濁させ
る請求項5記載の電気メッキ等の電気化学的処理方法。
8. Prior to electrolysis of the electrode substance or electrolytic substance, a substance in a supercritical state or a substance in a subcritical state, an oxide film removing solution, and a surfactant are introduced into the reaction bath, The electrochemical treatment method such as electroplating according to claim 5, wherein the emulsion is emulsified in a supercritical state or a subcritical state.
【請求項9】 前記反応浴槽の外部に前記反応浴槽に連
通可能な貯留槽を設け、該貯留槽に使用後の超臨界物質
または亜臨界物質、電解物質または洗浄若しくは酸化皮
膜除去物質を貯留させる請求項1または2または3また
は5記載の電気メッキ等の電気化学的処理方法。
9. A storage tank, which is capable of communicating with the reaction bath, is provided outside the reaction bath, and the used supercritical substance or subcritical substance, electrolytic substance or cleaning or oxide film removing substance is stored in the storage bath. An electrochemical treatment method such as electroplating according to claim 1, 2 or 3 or 5.
【請求項10】 前記貯留槽に貯留した使用後の超臨界
物質または亜臨界物質を再生して反応浴槽に還流し、ま
たは前記貯留槽に貯留した使用後の電解物質または洗浄
若しくは酸化皮膜除去物質を再生して各溶液槽に還流す
る請求項9記載の電気メッキ等の電気化学的処理方法。
10. The used supercritical substance or subcritical substance stored in the storage tank is regenerated and refluxed in a reaction bath, or the used electrolytic substance or cleaning or oxide film removal substance stored in the storage tank is used. 10. The electrochemical treatment method such as electroplating according to claim 9, wherein the solution is regenerated and refluxed in each solution tank.
【請求項11】 前記電極物質の析出付着およびその前
処理工程または前記電解物質の電解および採集並びにそ
の前処理工程を、単一の反応浴槽で処理した請求項1ま
たは2または3記載の電気メッキ等の電気化学的処理方
法。
11. The electroplating according to claim 1, 2 or 3, wherein the deposition and deposition of the electrode material and the pretreatment step thereof or the electrolysis and collection of the electrolytic material and the pretreatment step are performed in a single reaction bath. Etc. Electrochemical treatment method.
【請求項12】 前記電極物質の析出付着およびその前
後の処理工程または前記電解物質の電解および採集並び
にその前後の処理工程を実行可能な少なくとも二つの反
応浴槽を設け、この一方の反応浴槽で前記処理工程の一
部を実行し、他方の反応浴槽で前記処理工程の残部を実
行し、かつこれらの処理を前記反応浴槽間で交互に実行
するようにした請求項1または2または3記載の電気メ
ッキ等の電気化学的処理方法。
12. At least two reaction baths capable of carrying out the deposition and attachment of the electrode substance and the treatment process before and after it or the electrolysis and collection of the electrolytic substance and the treatment process before and after it are provided, and one of the reaction baths is used for the reaction. The electricity according to claim 1 or 2 or 3, wherein a part of the treatment steps is executed, the rest of the treatment steps is executed in the other reaction bath, and these treatments are alternately executed between the reaction baths. Electrochemical treatment method such as plating.
【請求項13】 前記電極物質を電解し、または前記電
解した電極物質を他方の電極物質に析出付着後、前記反
応浴槽を使用して、他方の電極物質に複数層の電極物質
を析出付着する請求項1記載の電気メッキ等の電気化学
的処理方法。
13. The electrode material is electrolyzed, or after the electrolyzed electrode material is deposited and adhered to the other electrode material, the reaction bath is used to deposit and adhere a plurality of layers of electrode material to the other electrode material. An electrochemical treatment method such as electroplating according to claim 1.
【請求項14】 電解物質を収容可能な反応浴槽に陰極
および陽極の電極物質を収容し、前記一方の電極物質を
電解し、若しくは前記電解した電極物質およびまたは電
解質溶液に含まれる電解物質を他方の電極物質に析出付
着するようにした電気メッキ等の電気化学的反応装置に
おいて、電解物質を収容した反応浴槽を超臨界状態また
は亜臨界状態に形成し、該状態の下で前記電極物質を電
解し、若しくは前記電解した電極物質およびまたは電解
質溶液に含まれる電解物質を他方の電極物質に析出付着
するようにしたことを特徴とする電気メッキ等の電気化
学的反応装置。
14. A reaction bath capable of containing an electrolytic substance contains electrode materials for a cathode and an anode, and one of the electrode substances is electrolyzed, or the electrolyzed electrode substance and / or an electrolytic substance contained in an electrolyte solution is added to the other. In an electrochemical reaction device such as electroplating that deposits and adheres to the electrode substance, the reaction bath containing the electrolytic substance is formed in a supercritical state or a subcritical state, and the electrode substance is electrolyzed under the state. Or an electrolytic reaction device such as electroplating, characterized in that the electrolyzed electrode substance and / or the electrolytic substance contained in the electrolyte solution is deposited and adhered to the other electrode substance.
【請求項15】 電解物質を収容可能な反応浴槽に陰極
および陽極の電極物質を収容し、前記電解物質を電解
し、これを他方の電極物質側で採集するようにした電気
メッキ等の電気化学的反応装置において、電解物質を収
容した反応浴槽を超臨界状態または亜臨界状態に形成
し、該状態の下で前記電解物質を電解し、これを他方の
電極物質側で採集するようにしたことを特徴とする電気
メッキ等の電気化学的反応装置。
15. Electrochemistry such as electroplating in which a cathode and an anode electrode materials are contained in a reaction bath capable of containing an electrolyte material, and the electrolyte material is electrolyzed and collected on the side of the other electrode material. In a dynamic reaction apparatus, a reaction bath containing an electrolytic substance is formed in a supercritical state or a subcritical state, the electrolytic substance is electrolyzed under the state, and the electrolytic substance is collected on the other electrode substance side. An electrochemical reaction device for electroplating, etc.
【請求項16】 電解物質を収容可能な反応浴槽に被処
理物を収容し、電解質溶液に含まれる電解物質を前記被
処理物に析出付着するようにした電気メッキ等の電気化
学的反応装置において、電解物質を収容した反応浴槽を
超臨界状態または亜臨界状態に形成し、該状態の下で前
記電解物質を被処理物に析出付着するようにしたことを
特徴とする電気メッキ等の電気化学的反応装置。
16. An electrochemical reaction device such as electroplating, wherein an object to be treated is contained in a reaction bath capable of containing an electrolytic substance, and the electrolytic substance contained in an electrolyte solution is deposited and adhered to the object to be treated. An electrochemistry such as electroplating, characterized in that a reaction bath containing an electrolytic substance is formed in a supercritical state or a subcritical state, and under the state, the electrolytic substance is deposited and adhered to an object to be treated. Reaction device.
【請求項17】 前記電極物質を電解し、若しくは前記
電解した電極物質およびまたは電解質溶液に含まれる電
解物質を他方の電極物質に析出付着後、若しくは前記電
解物質を電解し、これを他方の電極物質側で採集後、前
記反応浴槽を超臨界状態または亜臨界状態から低圧側へ
移行可能にした請求項14または15または16記載の
電気メッキ等の電気化学的反応装置。
17. The electrode material is electrolyzed, or after the electrolyzed electrode material and / or the electrolytic material contained in the electrolyte solution is deposited and adhered to the other electrode material, or the electrolytic material is electrolyzed, and the other electrode is electrolyzed. The electrochemical reaction apparatus for electroplating or the like according to claim 14, 15 or 16, wherein the reaction bath is allowed to shift from a supercritical state or a subcritical state to a low pressure side after collection on the substance side.
【請求項18】 前記反応浴槽の外部に前記反応浴槽に
連通可能な貯留槽を設け、該貯留槽に使用後の超臨界状
態の物質または亜臨界状態の物質若しくは電解物質また
は洗浄若しくは酸化皮膜除去物質を貯留させる請求項1
4または15または16記載の電気メッキ等の電気化学
的反応装置。
18. A storage tank, which is capable of communicating with the reaction bath, is provided outside the reaction bath, and a supercritical substance, a subcritical substance, an electrolytic substance, cleaning, or oxide film removal after use in the storage bath. Claim 1 which stores a substance
An electrochemical reaction device such as electroplating according to 4 or 15 or 16.
【請求項19】 前記貯留槽に貯留した使用後の超臨界
物質または亜臨界物質を再生して反応浴槽に還流し、ま
たは前記貯留槽に貯留した使用後の電解物質または洗浄
若しくは酸化皮膜除去物質を再生して再利用する請求項
16記載の電気メッキ等の電気化学的反応装置。
19. The used supercritical substance or subcritical substance stored in the storage tank is regenerated and refluxed to the reaction bath, or the used electrolytic substance or cleaning or oxide film removal substance stored in the storage tank is used. The electrochemical reaction device for electroplating or the like according to claim 16, which recycles and reuses.
【請求項20】 前記電極物質の析出付着およびその前
処理工程または前記電解物質の電解および採集並びにそ
の前処理工程を、単一の反応浴槽で処理可能にした請求
項14または15または16記載の電気メッキ等の電気
化学的反応装置。
20. The process according to claim 14 or 15 or 16, wherein the deposition and deposition of the electrode material and the pretreatment step thereof or the electrolysis and collection of the electrolytic material and the pretreatment step thereof can be processed in a single reaction bath. Electrochemical reaction device such as electroplating.
【請求項21】 前記電極物質の析出付着およびその前
後の処理工程または前記電解物質の電解および採集並び
にその前後の処理工程を実行可能な少なくとも二つの反
応浴槽を設け、この一方の反応浴槽で前記処理工程の一
部を実行し、他方の反応浴槽で前記処理工程の残部を実
行し、かつこれらの処理を前記反応浴槽間で交互に実行
可能にした請求項14または15または16記載の電気
メッキ等の電気化学的反応装置。
21. At least two reaction baths capable of carrying out the deposition and deposition of the electrode material and the treatment steps before and after it, or the electrolysis and collection of the electrolytic material and the treatment steps before and after it are provided, and one of the reaction baths is used for the reaction. The electroplating according to claim 14 or 15 or 16, wherein a part of the treatment steps is carried out, the rest of the treatment steps are carried out in the other reaction bath, and these treatments can be performed alternately between the reaction baths. Electrochemical reaction device such as.
【請求項22】 前記電極物質を電解し、または前記電
解した電極物質を他方の電極物質に析出付着後、前記反
応浴槽を使用して、他方の電極物質に複数層の電極物質
を析出付着する請求項14または15または16記載の
電気メッキ等の電気化学的反応装置。
22. Electrolyzing the electrode material, or depositing and depositing the electrolyzed electrode material onto the other electrode material, and then depositing and depositing a plurality of layers of electrode material onto the other electrode material using the reaction bath. An electrochemical reaction device such as electroplating according to claim 14 or 15.
JP2000401301A 2000-08-24 2000-12-28 Electrochemical treatment method such as electroplating and electrochemical reaction apparatus thereof Expired - Lifetime JP3703132B2 (en)

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EP01953331.4A EP1314799B1 (en) 2000-08-24 2001-07-30 Electrochemical treating method such as electroplating and electrochemical reaction device therefor
PCT/JP2001/006525 WO2002016673A1 (en) 2000-08-24 2001-07-30 Electrochemical treating method such as electroplating and electrochemical reaction device therefor
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