JP2003291534A - Optical recording medium - Google Patents

Optical recording medium

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Publication number
JP2003291534A
JP2003291534A JP2002100540A JP2002100540A JP2003291534A JP 2003291534 A JP2003291534 A JP 2003291534A JP 2002100540 A JP2002100540 A JP 2002100540A JP 2002100540 A JP2002100540 A JP 2002100540A JP 2003291534 A JP2003291534 A JP 2003291534A
Authority
JP
Japan
Prior art keywords
recording
recording medium
layer
optical
resistant protective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002100540A
Other languages
Japanese (ja)
Other versions
JP3895629B2 (en
Inventor
Masato Harigai
眞人 針谷
Kazunori Ito
和典 伊藤
Hiroko Tashiro
浩子 田代
Miki Mizutani
未来 水谷
Michiaki Shinozuka
道明 篠塚
Hiroyuki Iwasa
博之 岩佐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP2002100540A priority Critical patent/JP3895629B2/en
Priority to US10/453,551 priority patent/US7260053B2/en
Publication of JP2003291534A publication Critical patent/JP2003291534A/en
Application granted granted Critical
Publication of JP3895629B2 publication Critical patent/JP3895629B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a phase transition type optical information recording medium which has the capacity equal to that of a DVD-ROM, can secure a sufficient modulation degree even in such a wide range of recording linear velocity as 3.5 m/s to 35 m/s, excellent overwrite repetition characteristics and high preservation reliability. <P>SOLUTION: In the phase transition type optical information recording medium which comprises a first heat resistant protective layer, a recording layer, a second heat resistant protective layer and a reflective layer in this order or in the reverse order, wherein the recording layer is caused to develop a phase change reversibly under the irradiation by an electromagnetic wave to execute the recording and reproduction of information using the optical change, the optical recording medium is constituted of Ga, Sb, Sn and Co (1). When the composition formula of the recording material is expressed by GaαSbβSnγCoδ (wherein, α, β, γ, δ are each an atom.%, α+β+γ+δ=100), the relation among α, β, γ, δ in the optical recording medium expressed in (1) satisfies formulas; 3≤α≤52; 42≤β≤92; 3≤γ≤25; 0.1≤δ≤2 (2). <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、電磁波を照射する
事により記録材料に光学的な変化を生じさせ、情報の記
録・再生を行ない、かつ書き換えが可能な相変化型光記
録媒体に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a phase change type optical recording medium capable of recording / reproducing information and rewriting it by causing an optical change in a recording material by irradiating an electromagnetic wave. is there.

【0002】[0002]

【従来の技術】光ビーム照射による情報の記録、再生、
消去を行い書き換えが可能な光記録媒体の一つとして、
結晶−非結晶相間、又は、結晶−結晶相間の相転移を利
用する、いわゆる相変化型光ディスクが知られている。
この光ディスクは単一ビームによるオーバーライトが可
能であり、ドライブ側の光学系が単純な為に、コンピュ
ーターやAV関連の記録媒体として使用されている。そ
の記録材料としては、Ge−Te、Ge−Te−Se、
In−Sb、Ga−Sb、Ge−Sb−Te、Ag−I
n−Sb−Te等が用いられている。中でもAg−In
−Sb−Teは高感度で記録マークのアモルファス部の
輪郭が明確であるという特徴を有し、マークエッジ記録
用材料として使用されている(特開平3−231889
号公報、特開平4−191089号公報、特開平4−2
32779号公報、特開平4-267192号公報、特
開平5−345478号公報等参照)。
2. Description of the Related Art Recording and reproduction of information by irradiation of a light beam,
As one of the erasable and rewritable optical recording media,
There is known a so-called phase change type optical disk which utilizes a phase transition between a crystalline-amorphous phase or a crystalline-crystalline phase.
This optical disc can be overwritten by a single beam, and is used as a recording medium for computers and AV because the optical system on the drive side is simple. As the recording material, Ge-Te, Ge-Te-Se,
In-Sb, Ga-Sb, Ge-Sb-Te, Ag-I
n-Sb-Te or the like is used. Above all, Ag-In
-Sb-Te is characterized by high sensitivity and a clear outline of an amorphous portion of a recording mark, and is used as a material for recording a mark edge (JP-A-3-231889).
Japanese Patent Laid-Open No. 4-1910989, Japanese Laid-Open Patent Publication No. 4-2
32779, JP-A-4-267192, JP-A-5-345478, etc.).

【0003】しかし、これらの記録材料は、CD−RW
(Compact Disk−Rewritable)
等の比較的低い記録密度を有する記録媒体に用いられる
ものであって、DVD(Digtal Versati
le Disk)RAMやDVD−RW等に用いると、
記録線速が3.5m/s(1倍速)程度ではオーバーラ
イト可能であるが、2倍速以上になるとオーバーライト
特性が劣下するという問題を有する。これは、上記の記
録材料の結晶化速度が遅く、高線速下でのオーバーライ
トが困難になる為である。Sb量を増やして結晶化速度
を速くする事もできるが、そうするとSbの増加により
結晶化温度が低下して保存特性が劣下する。この問題を
解決する対策としては、特開平2000−322740
号公報に、Ag−In−Ge−Sb−Te系記録材料を
用いる方法が開示されている。この方法は、記録線速が
3.0〜20m/sの範囲では適用可能であるが、更な
る高線速化、例えば20m/s以上には対応する事がで
きない。
However, these recording materials are CD-RW.
(Compact Disk-Rewritable)
Used in a recording medium having a relatively low recording density such as a DVD (Digital Versati).
le Disk) When used for RAM, DVD-RW, etc.,
Overwriting is possible at a recording linear velocity of about 3.5 m / s (1 × speed), but there is a problem that the overwrite characteristic deteriorates at a recording linear velocity of 2 × or more. This is because the crystallization speed of the above recording material is slow and it becomes difficult to overwrite at a high linear velocity. Although the crystallization rate can be increased by increasing the amount of Sb, the increase in Sb lowers the crystallization temperature and deteriorates the storage characteristics. As a measure for solving this problem, Japanese Patent Laid-Open No. 2000-322740.
Japanese Patent Laid-Open Publication No. Hei 11-242242 discloses a method using an Ag-In-Ge-Sb-Te-based recording material. This method is applicable in the recording linear velocity range of 3.0 to 20 m / s, but cannot cope with a higher linear velocity, for example, 20 m / s or more.

【0004】一方、高速結晶化材料としてGaSbが提
案されている(“phase−change Opti
cal data storage in GaSb”
Applied optics/vol.26、No2
2115 November1987)。この合金系は
結晶化速度が極めて速いと報告されているが、結晶化温
度が350℃と極めて高い為に初期結晶化が困難であ
る。更に、GaSbにMo、W、Ta、Ni、Pd、P
t、Cu、Ag、Au、Zn、Cd、Al、Tl、S
i、Ge、Sn、Pb、As、Bi、S、Se、Te等
を添加し、特性の向上を試みたものが米国特許第4,8
18,666号、及び第5,072,423号に開示さ
れているが、高速記録におけるオーバーライト特性、変
調度、及び保存信頼性を同時に満足するものではない。
上記の様に種々の相変化記録材料が報告されているが、
何れも書き換え可能相変化型光記録媒体として要求され
る特性を全て満足し得るものとは云えなかつた。特に、
DVD−ROMと同様な高密度記録容量であり、しかも
記録線速が更に高速化(〜35m/s)された場合に対
応でき、オ−バライト特性、変調度、そして保存信頼性
を同時に満足するものではなかった。
On the other hand, GaSb has been proposed as a high-speed crystallization material ("phase-change Opti").
cal data storage in GaSb "
Applied optics / vol. 26, No2
2115 November 1987). It is reported that this alloy system has an extremely high crystallization rate, but initial crystallization is difficult because the crystallization temperature is extremely high at 350 ° C. Furthermore, Mo, W, Ta, Ni, Pd, P on GaSb
t, Cu, Ag, Au, Zn, Cd, Al, Tl, S
U.S. Pat. No. 4,8,8 is an attempt to improve the characteristics by adding i, Ge, Sn, Pb, As, Bi, S, Se, Te and the like.
No. 18,666 and No. 5,072,423, the overwrite characteristics, the modulation degree, and the storage reliability in high-speed recording are not satisfied at the same time.
As described above, various phase change recording materials have been reported.
None of them can satisfy all the characteristics required for a rewritable phase change type optical recording medium. In particular,
It has the same high-density recording capacity as DVD-ROM, and can cope with the case where the recording linear velocity is further increased (up to 35 m / s), and simultaneously satisfies the overwrite characteristic, the modulation degree, and the storage reliability. It wasn't something.

【0005】[0005]

【発明が解決しようとする課題】本発明は、上記従来技
術の問題点に鑑みてなされたもので、その目的は、DV
D−ROMの大容量で、記録線速が、3.5m/sから
35m/s広範囲かつ高線速においても、十分な変調度
を確保し、オ−バライトの繰り返し特性が良好で保存信
頼性の高い相変化型光記録媒体を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art, and its object is DV.
The D-ROM has a large capacity, the recording linear velocity is in a wide range of 3.5 m / s to 35 m / s, and a sufficient degree of modulation is ensured even in a high linear velocity, and the overwrite characteristics of the overwrite are good and the storage reliability is high. To provide a phase change type optical recording medium having high efficiency.

【0006】[0006]

【課題を解決するための手段】本発明者らは、上記課題
を解決する為、記録材料に着目して鋭意研究を重ねた結
果、記録材料として、Ga、Sb、Sn、Coから成る
合金を用いた時に上記課題を解決できること、更に、こ
の合金にAg、Cu、In、Ge、C、Bから選ばれる
一つの元素を添加する事により保存信頼性の一層の向上
を実現できることを見出し、この知見に基づいて本発明
を完成するに至った。即ち、上記課題は、次の1)〜
4)の発明によって解決できる。 1) 基板上に少なくとも第一耐熱保護層、記録層、第
二耐熱保護層、反射層をこの順に或いは逆順に有し、電
磁波の照射により記録層に可逆的な相変化を生じ、その
光学的な変化を利用して情報の記録、再生、消去及び書
き換えが行われる相変化型光記録媒体において、記録材
料が、Ga、Sb、Sn、Coから成る事を特徴とする
光記録媒体。 2) 記録材料の組成式をGaαSbβSnγCoδと
する時(但し、α、β、γ、δは原子%、α+β+γ+
δ=100)、α、β、γ、δが次の条件を満たす事を
特徴とする1)記載の光記録媒体。 3≦α≦52 42≦β≦92 3≦γ≦25 0.1≦δ≦2 3) 記録材料に、Ag、Cu、In、Ge、C、Bの
中から選ばれる一つの元素が添加されている事を特徴と
する1)又は2)記載の光記録媒体。 4) 記録材料に添加される元素の添加量をM(原子
%)として、Mが、0.1〜10の範囲にある事を特徴
とする3)記載の光記録媒体。
In order to solve the above-mentioned problems, the inventors of the present invention have conducted intensive studies focusing on recording materials, and as a result, as the recording material, an alloy composed of Ga, Sb, Sn, and Co is used. It has been found that the above problems can be solved when used, and further improvement of storage reliability can be realized by adding one element selected from Ag, Cu, In, Ge, C and B to this alloy. The present invention has been completed based on the findings. That is, the above-mentioned subject is the following 1)-
It can be solved by the invention of 4). 1) At least a first heat-resistant protective layer, a recording layer, a second heat-resistant protective layer, and a reflective layer are provided on the substrate in this order or in reverse order, and the recording layer undergoes a reversible phase change upon irradiation with electromagnetic waves, and its optical In a phase change type optical recording medium in which information is recorded, reproduced, erased and rewritten by utilizing such changes, the recording material is Ga, Sb, Sn, Co. 2) When the composition formula of the recording material is GaαSbβSnγCoδ (where α, β, γ, δ are atomic%, α + β + γ +
The optical recording medium according to 1), wherein δ = 100), α, β, γ, and δ satisfy the following conditions. 3 ≦ α ≦ 52 42 ≦ β ≦ 92 3 ≦ γ ≦ 25 0.1 ≦ δ ≦ 2 3) One element selected from Ag, Cu, In, Ge, C and B is added to the recording material. The optical recording medium as described in 1) or 2) above. 4) The optical recording medium according to 3), wherein M is in the range of 0.1 to 10, where M (atomic%) is the amount of the element added to the recording material.

【0007】以下、上記本発明について詳細に説明す
る。前記課題を解決するための手段として、本発明で
は、Ga、Sb、Sn、Coから成る新規な記録材料を
開発した。先ず、非晶相と結晶相との間の相転移を利用
する光記録媒体において、35m/sの高線速下でもオ
ーバーライトできる為には、レーザビーム径を1μmφ
として、結晶化時間が約29ns(ナノ秒)でなければ
ならない事が計算できる。更にDVDの様な高密度記録
では、使用するレーザの波長が650nmであって、従
来の780nmよりも短くなる為に、そのビーム径も1
μmφより小さくなり、レーザビームが35m/sの線
速で回転デスク上の一点を横切る速度は29nsより更
に短くなる。例えば、ビーム径を0.7μmφとする
と、その時間は約20nsとなり、この時間内でオーバ
ーライト〔古いマークを消去(結晶化)して新しいマー
クを書く〕しなければならない。即ち、20nsで結晶
化する必要がある。従来技術であるAg−In−Sb−
Te系やGaSb系、更にはGe−Sb−Te系におい
ても、この時間内で高速結晶化することは可能である
が、保存信頼性や初期結晶化の問題があり、35m/s
の線速で全ての特性を満足できる様な記録材料はなかっ
た。
The present invention will be described in detail below. As a means for solving the above problems, the present invention has developed a novel recording material composed of Ga, Sb, Sn and Co. First, in an optical recording medium that utilizes a phase transition between an amorphous phase and a crystalline phase, in order to be able to overwrite even at a high linear velocity of 35 m / s, the laser beam diameter is 1 μmφ.
It can be calculated that the crystallization time must be about 29 ns (nanosecond). Further, in high density recording such as DVD, the wavelength of the laser used is 650 nm, which is shorter than the conventional 780 nm, so the beam diameter is 1
When the linear velocity is 35 m / s, the laser beam traverses a point on the rotating desk at a linear velocity of 35 m / s, which is shorter than 29 ns. For example, when the beam diameter is 0.7 μmφ, the time is about 20 ns, and overwriting (erasing (crystallizing) old marks and writing new marks) must be performed within this time. That is, it is necessary to crystallize in 20 ns. Prior art Ag-In-Sb-
Even in the Te system, GaSb system, and Ge-Sb-Te system, it is possible to perform high-speed crystallization within this time, but there are problems of storage reliability and initial crystallization, and 35 m / s
There was no recording material that could satisfy all the characteristics at the linear velocity.

【0008】本発明ではGaSbの持つ高速結晶化性能
に注目し、この2元素を高速結晶化の為の構成元素と
し、Snを加えて結晶化温度を下げる事により、GaS
bの欠点である高い結晶温度からくる初期結晶化の困難
さを解決すると同時に、GaSbに比べて更なる高速結
晶化を実現し、十分な変調度を獲得する事に成功した。
またCoを加える事により保存信頼性とオーバーライト
特性の向上を実現した。GaとSbから成る記録材料が
何故に高速で結晶化するのかは現在解析中であるが、一
つの考え方として、GaSbの最隣接原子間距離が、非
晶相の場合に2.65Å、結晶相の場合に2.64Åと
極めて近い為、非晶相から結晶相への相転移が容易に行
なわれるのではないかと推測される。また、Snは共有
結合性が弱い為、共有結合をしているGaSbに対して
結合力を弱める働きをし、結晶化温度を低下させると同
時に原子の再配列を容易にして結晶化速度を速める事が
できる。また、Snを加える事により、GaSbと比較
してその非晶相と結晶相の構造の変化が大きくなる為
に、相転移に伴う二相間の光学定数の変化が大きくな
り、十分な変調度を実現する事ができる。なお、Coの
添加により保存信頼性とオーバーライト特性が向上する
理由は、今のところ不明であるが、Coの添加により不
動態を作り酸化の進行を防止する為でないかと考えられ
In the present invention, attention is paid to the high-speed crystallization performance of GaSb, and these two elements are used as constituent elements for high-speed crystallization, and Sn is added to lower the crystallization temperature.
In addition to solving the difficulty of initial crystallization due to the high crystallization temperature, which is a defect of b, at the same time, it has succeeded in achieving a further high speed crystallization as compared with GaSb and obtaining a sufficient modulation degree.
Moreover, by adding Co, the storage reliability and overwrite characteristics are improved. The reason why the recording material composed of Ga and Sb crystallizes at high speed is currently being analyzed. One idea is that the distance between the nearest neighbor atoms of GaSb is 2.65Å when the amorphous phase is In this case, since it is extremely close to 2.64Å, it is speculated that the phase transition from the amorphous phase to the crystalline phase may be easily performed. In addition, Sn has a weak covalent bond, and therefore acts to weaken the covalent bond with GaSb forming a covalent bond, lowering the crystallization temperature and facilitating the rearrangement of atoms to accelerate the crystallization speed. I can do things. Further, by adding Sn, the change in the structure of the amorphous phase and the crystal phase becomes larger than that in GaSb, so that the change in the optical constant between the two phases due to the phase transition becomes large and a sufficient modulation degree is obtained. Can be realized. The reason why the addition of Co improves the storage reliability and the overwrite characteristic is not known so far, but it is thought that the addition of Co may cause passivation to prevent the progress of oxidation.

【0009】上記記録材料としては、組成式を、Gaα
SbβSnγCoδ(但し、α、β、γ、δは原子%、
α+β+γ+δ=100)として、次の条件を満足する
ものが好ましい。 3≦α≦52 42≦β≦92 3≦γ≦25 0.1≦δ≦2 ここで、αとβがそれぞれ3原子%及び42原子%より
少ないと、結晶化速度が低下し、35m/sの線速下で
オーバーライトが困難となり、αとβがそれぞれ52原
子%及び92原子%より多いと、オーバーライトの繰り
返し回数が低下する。また、γが3より少ないと結晶化
温度が低くならず初期結晶化が困難になると同時に十分
な変調度を確保し難くなり、γが25より多いと保存信
頼性が低下する。更に、δが0.1より少ないと保存信
頼性とオーバーライト性能が低下し、2より多いと記録
感度が低下する。
The composition of the recording material is represented by Gaα
SbβSnγCoδ (where α, β, γ and δ are atomic%,
It is preferable that α + β + γ + δ = 100) satisfy the following conditions. 3 ≤ α ≤ 52 42 ≤ β ≤ 92 3 ≤ γ ≤ 25 0.1 ≤ δ ≤ 2 Here, when α and β are less than 3 atom% and 42 atom%, respectively, the crystallization speed is lowered, and 35 m / Overwriting becomes difficult under the linear velocity of s, and when α and β are greater than 52 atom% and 92 atom%, respectively, the number of overwrite repetitions decreases. Further, when γ is less than 3, the crystallization temperature is not lowered and the initial crystallization becomes difficult, and at the same time, it becomes difficult to secure a sufficient degree of modulation, and when γ is more than 25, the storage reliability decreases. Further, when δ is less than 0.1, storage reliability and overwrite performance are deteriorated, and when it is more than 2, recording sensitivity is deteriorated.

【0010】更に、本発明では、Ga、Sb、Sn、C
oから成る記録材料に、Ag、Cu、In、Ge、C、
Bの中から選ばれた一つの元素を加える事により、保存
特性の一層の向上を図る事ができる。その理由は、G
e、C、Bの場合には共存結合性が強いので母材の未結
合手と結合し、酸化を防止する為と考えられる。Ag、
Cu、Inについては不明であるが、同様に母材の未結
合手と結合し、酸化を防止する為と考えている。これら
の元素の好ましい添加量は、0.1〜10原子%の範囲
にあり、0.1原子%よりも少ないと効果が少なく、1
0原子%よりも多いと結晶化速度が遅くなり35m/s
の線速下でのオーバーライトが困難となる。
Further, in the present invention, Ga, Sb, Sn, C
The recording material consisting of o, Ag, Cu, In, Ge, C,
By adding one element selected from B, the storage characteristics can be further improved. The reason is G
In the case of e, C, and B, since the coexisting bond strength is strong, it is considered that they bond with the dangling bonds of the base material and prevent oxidation. Ag,
Although it is unknown about Cu and In, it is considered that Cu and In are similarly bonded to the dangling bonds of the base material to prevent oxidation. The preferable addition amount of these elements is in the range of 0.1 to 10 atom%, and if the amount is less than 0.1 atom%, the effect is small and 1
If it is more than 0 atom%, the crystallization speed will be slow and will be 35 m / s.
It becomes difficult to overwrite under the linear velocity.

【0011】[0011]

【発明の実施の形態】次に、本発明の光記録媒体の構成
例を図面に基づいて説明する。図1は、本発明の光記録
媒体の構成例を示すもので、基板1上に第一耐熱保護層
2、記録層3、第二耐熱保護層4、反射放熱層5が設け
られている。耐熱保護層は、必ずしも記録層の両側に設
ける必要はないが、基板1がポリカボネート樹脂のよう
に耐熱性が低い材料からなる場合には、第一耐熱保護層
を設けることが望ましい。更に、図示していないが、必
要に応じて環境保護層を設けてもよい。基板1の材料
は、通常、ガラス、セラミックス又は樹脂であり、成形
性、コストの点から樹脂基板が好適である。樹脂の代表
例としては、ポリカーボネート樹脂、アクリル樹脂、エ
ポキシ樹脂、ポリスチレン樹脂、アクリロニトリル−ス
チレン共重合体樹脂、ポリエチレン樹脂、ポリプロピレ
ン樹脂、シリコーン樹脂、フッ素樹脂、ABS樹脂、ウ
レタン樹脂等が挙げられるが、加工性、光学特性等の点
からポリカーボネート樹脂が好ましい。また、基板の形
状は、ディスク状、カード状、シート状などの何れでも
よい。
BEST MODE FOR CARRYING OUT THE INVENTION Next, a structural example of an optical recording medium of the present invention will be described with reference to the drawings. FIG. 1 shows an example of the configuration of the optical recording medium of the present invention, in which a substrate 1 is provided with a first heat resistant protective layer 2, a recording layer 3, a second heat resistant protective layer 4, and a reflective heat dissipation layer 5. The heat-resistant protective layers are not necessarily provided on both sides of the recording layer, but when the substrate 1 is made of a material having low heat resistance such as a polycarbonate resin, it is desirable to provide the first heat-resistant protective layer. Further, although not shown, an environmental protection layer may be provided if necessary. The material of the substrate 1 is usually glass, ceramics or resin, and a resin substrate is preferable in terms of moldability and cost. Typical examples of the resin include polycarbonate resin, acrylic resin, epoxy resin, polystyrene resin, acrylonitrile-styrene copolymer resin, polyethylene resin, polypropylene resin, silicone resin, fluororesin, ABS resin, urethane resin, and the like. Polycarbonate resin is preferable from the viewpoints of workability and optical characteristics. The substrate may have any shape such as a disk shape, a card shape, and a sheet shape.

【0012】耐熱保護層、即ち誘電体層は、(ZnS)
・(SiO)を用いてスパッタ法により膜形成を行
う。この誘電体層は、耐熱保護層としての機能と光干渉
層としての機能を有することから、これらの機能を最大
限に活かすことが必要であり、そのためには、膜厚を、
200〜3000Å、好ましくは、350〜2000Å
とする。200Å未満の場合は、耐熱保護層としての機
能が失われ、また、3000Åを越えると界面剥離が生
じ易くなるので好ましくない。また、本発明の記録層
は、通常スパッタ法により膜形成が行なわれ、その膜厚
は、100〜1000Å、好ましくは、200〜350
Åである。100Åより薄いと、光吸収能が低下して記
録層としての機能を失い、1000Åより厚いと透過光
が少なくなるため、干渉効果が期待できなくなる。本発
明の反射層にはAg合金が用いられ、その膜形成は、ス
パッタ法により行うことができる。反射層は放熱層とし
ての機能も有する。膜厚は、500〜2000Å、好ま
しくは、700〜1500Åである。
The heat-resistant protective layer, that is, the dielectric layer is made of (ZnS).
A film is formed by a sputtering method using (SiO 2 ). Since this dielectric layer has a function as a heat-resistant protective layer and a function as an optical interference layer, it is necessary to make the most of these functions.
200-3000Å, preferably 350-2000Å
And If it is less than 200Å, the function as a heat-resistant protective layer is lost, and if it exceeds 3000Å, interfacial peeling tends to occur, which is not preferable. The recording layer of the present invention is usually formed by a sputtering method, and the film thickness is 100 to 1000Å, preferably 200 to 350.
It is Å. When the thickness is less than 100 Å, the light absorption ability is lowered and the function as a recording layer is lost, and when the thickness is more than 1000 Å, the transmitted light is reduced, and the interference effect cannot be expected. An Ag alloy is used for the reflective layer of the present invention, and its film can be formed by a sputtering method. The reflective layer also has a function as a heat dissipation layer. The film thickness is 500 to 2000Å, preferably 700 to 1500Å.

【0013】[0013]

【実施例】以下、実施例及び比較例を挙げて本発明を更
に詳しく説明するが、本発明は、これらの実施例によっ
て何ら限定されるものではない。
The present invention will be described in more detail below with reference to examples and comparative examples, but the present invention is not limited to these examples.

【0014】実施例1〜10、比較例1〜5 トラックピッチ0.7μm、溝深さ400Å、厚さ0.
6mm、直径120mmφのポリカーボネート基板上
に、第一耐熱保護層(厚さ650Å)、記録層(厚さ1
50Å)、第二耐熱保護層(厚さ250Å)、反射層
(厚さ1000Å)をスパッタ法により順次設け、更
に、反射層の上に、スピンコート法により環境保護層を
設けて光記録媒体を作製した。記録層には、下記〔表
1〕に示す材料を用い、第一及び第二耐熱保護層には、
ZnS・SiO(20:80モル%)を用い、反射層
には、Ag96CuNiを用いた。次いで、得られ
た光記録媒体を初期結晶化した後、記録線速及び記録パ
ワーを3.5m/s(10mW)、15m/s(16m
W)、25m/s(26mW)、35m/s(36m
W)で記録した。この時の記録用レーザの波長は650
nmとし、EFMランダムパターンでオーバーライトの
繰り返しを行い、再生信号特性の評価は、3T信号のジ
ッタ値と、14T信号の変調度で行ない、保存特性は1
000回オーバーライトした光記録媒体を80℃、85
%の温度下で300時間保持した後のオーバーライト1
回目の3T信号ジッタ値と14T信号の変調度で評価し
た。その結果を下記〔表2〕、〔表3〕に示す。
Examples 1 to 10, Comparative Examples 1 to 5 Track pitch 0.7 μm, groove depth 400 Å, thickness 0.
On a polycarbonate substrate with a diameter of 6 mm and a diameter of 120 mmφ, a first heat-resistant protective layer (thickness 650Å) and a recording layer (thickness 1
50 Å), a second heat-resistant protective layer (thickness 250 Å), a reflective layer (thickness 1000 Å) are sequentially formed by a sputtering method, and an environmental protection layer is further provided on the reflective layer by a spin coating method to form an optical recording medium. It was made. For the recording layer, the materials shown in the following [Table 1] were used, and for the first and second heat-resistant protective layers,
ZnS.SiO 2 (20:80 mol%) was used, and Ag 96 Cu 2 Ni 2 was used for the reflective layer. Then, after the obtained optical recording medium was initially crystallized, the recording linear velocity and recording power were 3.5 m / s (10 mW) and 15 m / s (16 m).
W), 25 m / s (26 mW), 35 m / s (36 m
W). The wavelength of the recording laser at this time is 650.
The reproduction signal characteristics are evaluated by the jitter value of the 3T signal and the modulation factor of the 14T signal, and the storage characteristic is 1
Optical recording medium overwritten 000 times at 80 ℃, 85
Overwrite 1 after holding at a temperature of 300% for 300 hours
The 3T signal jitter value at the second time and the modulation factor of the 14T signal were evaluated. The results are shown in [Table 2] and [Table 3] below.

【0015】[0015]

【表1】 [Table 1]

【0016】[0016]

【表2】 [Table 2]

【0017】[0017]

【表3】 [Table 3]

【0018】上記〔表2〕、〔表3〕から明らかな様
に、本発明の記録材料を用いて構成された光記録媒体
は、3.5m/s、15m/s、25m/s、35m/
sの広い範囲の線速、特に従来技術では困難であった2
5m/sを越える線速においてもオーバーライトが可能
で、その再生信号のジッタ値と変調度が良好であり、保
存信頼性とオーバーライトの繰り返し特性に優れている
事が分る。これに対し、従来技術である、記録材料とし
てGa50Sb50化合物、又は共晶組成のGa12
88を用いた光記録媒体(比較例1、2)の場合に
は、高線速下でのオーバーライトは可能であるが、本発
明の記録材料を用いた光記録媒体と比較して、ジッタ
値、変調度、保存信頼性、オーバーライトの繰り返し特
性が劣り、初期結晶化し難く、また、共晶組成のGa
12Sb88に添加元素としてSnを加えた比較例3の
場合は、変調度と初期結晶は改善されているもののオー
バーライトによる繰り返し特性と保存信頼性が低下す
る。また、共晶組成のGa12Sb88に添加元素とし
てGeを加えた比較例4の場合は、保存信頼性は良好で
あるが変調度が低く、オーバーライトの繰り返し特性も
比較例3より悪い。また、比較例5のAg−In−Sb
−Te記録材料の場合は、線速25m/s、35m/s
におけるオーバーライトが不可能である。
As is apparent from [Table 2] and [Table 3] above, the optical recording medium constituted by using the recording material of the present invention is 3.5 m / s, 15 m / s, 25 m / s, 35 m. /
a wide range of linear velocity of s, which was difficult especially in the prior art 2
It can be seen that overwriting is possible even at a linear velocity exceeding 5 m / s, the reproduced signal has a good jitter value and a good modulation factor, and the storage reliability and repetitive overwrite characteristics are excellent. On the other hand, a Ga 50 Sb 50 compound or a eutectic composition Ga 12 S as a recording material, which is a conventional technique, is used.
When the optical recording medium using a b 88 (Comparative Examples 1 and 2) is susceptible overwriting at high linear velocity is different from the optical recording medium using the recording material of the present invention, Jitter value, modulation factor, storage reliability, overwrite overwrite characteristics are poor, initial crystallization is difficult, and eutectic composition Ga
In the case of Comparative Example 3 in which Sn is added to 12 Sb 88 as an additional element, the modulation factor and the initial crystal are improved, but the repetitive property due to overwriting and the storage reliability are deteriorated. Further, in the case of Comparative Example 4 in which Ge is added as an additional element to Ga 12 Sb 88 having a eutectic composition, the storage reliability is good, but the modulation degree is low, and the repetitive overwrite characteristic is worse than that of Comparative Example 3. Moreover, Ag-In-Sb of Comparative Example 5 was used.
-In case of Te recording material, linear velocity is 25 m / s, 35 m / s
Overwriting in is impossible.

【0019】[0019]

【発明の効果】本発明によれば、DVD−ROMと同容
量で、記録線速が3.5m/s〜35m/sという広い
範囲において十分な変調度を確保でき、オーバーライト
の繰り返し特性が良好で保存信頼性に優れた相変化型光
記録媒体を提供でき、光情報記録分野に寄与するところ
は極めて大きい。
According to the present invention, with the same capacity as a DVD-ROM, it is possible to secure a sufficient degree of modulation in a wide range of a recording linear velocity of 3.5 m / s to 35 m / s, and an overwrite repetitive characteristic. It is possible to provide a good phase change type optical recording medium having excellent storage reliability, and it is extremely important to contribute to the field of optical information recording.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の光記録媒体の構成例を示す断面図であ
る。
FIG. 1 is a cross-sectional view showing a configuration example of an optical recording medium of the present invention.

【符号の説明】[Explanation of symbols]

1 基板 2 第一耐熱保護層 3 記録層 4 第二耐熱保護層 5 反射層 1 substrate 2 First heat-resistant protective layer 3 recording layers 4 Second heat-resistant protective layer 5 Reflective layer

───────────────────────────────────────────────────── フロントページの続き (72)発明者 田代 浩子 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 (72)発明者 水谷 未来 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 (72)発明者 篠塚 道明 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 (72)発明者 岩佐 博之 東京都大田区中馬込1丁目3番6号 株式 会社リコー内 Fターム(参考) 2H111 EA05 EA23 FA01 FA12 FA14 FB05 FB06 FB09 FB17 FB21 FB23 FB29 FB30 5D029 JA01    ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Hiroko Tashiro             1-3-3 Nakamagome, Ota-ku, Tokyo Stocks             Company Ricoh (72) Inventor Mizutani Mirai             1-3-3 Nakamagome, Ota-ku, Tokyo Stocks             Company Ricoh (72) Inventor Michiaki Shinozuka             1-3-3 Nakamagome, Ota-ku, Tokyo Stocks             Company Ricoh (72) Inventor Hiroyuki Iwasa             1-3-3 Nakamagome, Ota-ku, Tokyo Stocks             Company Ricoh F term (reference) 2H111 EA05 EA23 FA01 FA12 FA14                       FB05 FB06 FB09 FB17 FB21                       FB23 FB29 FB30                 5D029 JA01

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 基板上に少なくとも第一耐熱保護層、記
録層、第二耐熱保護層、反射層をこの順に或いは逆順に
有し、電磁波の照射により記録層に可逆的な相変化を生
じ、その光学的な変化を利用して情報の記録、再生、消
去及び書き換えが行われる相変化型光記録媒体におい
て、記録材料がGa、Sb、Sn、Coから成る事を特
徴とする光記録媒体。
1. A substrate having at least a first heat-resistant protective layer, a recording layer, a second heat-resistant protective layer, and a reflective layer in this order or in reverse order, which causes a reversible phase change in the recording layer upon irradiation with electromagnetic waves, A phase change type optical recording medium in which information is recorded, reproduced, erased, and rewritten by utilizing the optical change, wherein the recording material is Ga, Sb, Sn, Co.
【請求項2】 記録材料の組成式をGaαSbβSnγ
Coδとする時(但し、α、β、γ、δは原子%、α+
β+γ+δ=100)、α、β、γ、δが次の条件を満
たす事を特徴とする請求項1記載の光記録媒体。 3≦α≦52 42≦β≦92 3≦γ≦25 0.1≦δ≦2
2. The composition formula of the recording material is GaαSbβSnγ
When Coδ (where α, β, γ, δ are atomic%, α +
The optical recording medium according to claim 1, wherein β + γ + δ = 100), α, β, γ, and δ satisfy the following conditions. 3 ≦ α ≦ 52 42 ≦ β ≦ 92 3 ≦ γ ≦ 25 0.1 ≦ δ ≦ 2
【請求項3】 記録材料に、Ag、Cu、In、Ge、
C、Bの中から選ばれる一つの元素が添加されている事
を特徴とする請求項1又は2記載の光記録媒体。
3. A recording material containing Ag, Cu, In, Ge,
The optical recording medium according to claim 1 or 2, wherein one element selected from C and B is added.
【請求項4】 記録材料に添加される元素の添加量をM
(原子%)として、Mが、0.1〜10の範囲にある事
を特徴とする請求項3記載の光記録媒体。
4. The addition amount of the element added to the recording material is M
4. The optical recording medium according to claim 3, wherein M is (atomic%) in the range of 0.1 to 10.
JP2002100540A 2002-04-02 2002-04-02 Optical recording medium Expired - Fee Related JP3895629B2 (en)

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Cited By (10)

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US7081289B2 (en) 2003-03-24 2006-07-25 Mitsubishi Kagaku Media Co., Ltd. Phase-change recording material and information recording medium
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US7166415B2 (en) 2002-03-05 2007-01-23 Mitsubishi Kagaku Media Co., Ltd. Phase-change recording material used for information recording medium and information recording medium employing it
US7313070B2 (en) 2002-02-13 2007-12-25 Mitsubishi Kagaku Media Co., Ltd. Rewritable optical recording medium and optical recording method
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US7313070B2 (en) 2002-02-13 2007-12-25 Mitsubishi Kagaku Media Co., Ltd. Rewritable optical recording medium and optical recording method
US7858167B2 (en) 2002-02-13 2010-12-28 Mitsubishi Kagaku Media Co., Ltd. Rewritable optical recording medium and optical recording method
US7659049B2 (en) 2002-03-05 2010-02-09 Mitsubishi Kagaku Media Co., Ltd. Phase-change recording material used for information recording medium and information recording medium employing it
US7166415B2 (en) 2002-03-05 2007-01-23 Mitsubishi Kagaku Media Co., Ltd. Phase-change recording material used for information recording medium and information recording medium employing it
US7081289B2 (en) 2003-03-24 2006-07-25 Mitsubishi Kagaku Media Co., Ltd. Phase-change recording material and information recording medium
US7105217B2 (en) 2003-04-30 2006-09-12 Mitsubishi Chemical Corporation Phase-change recording material and information recording medium
EP1685971A1 (en) * 2003-10-16 2006-08-02 Ricoh Company, Ltd. Phase transition type optical recording medium, process for producing the same, sputtering target, method of using optical recording medium and optical recording apparatus
WO2005037566A1 (en) * 2003-10-16 2005-04-28 Ricoh Company, Ltd. Phase transition type optical recording medium, process for producing the same, sputtering target, method of using optical recording medium and optical recording apparatus
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