JP2003272930A - Laminated chip and its manufacturing method - Google Patents
Laminated chip and its manufacturing methodInfo
- Publication number
- JP2003272930A JP2003272930A JP2002073519A JP2002073519A JP2003272930A JP 2003272930 A JP2003272930 A JP 2003272930A JP 2002073519 A JP2002073519 A JP 2002073519A JP 2002073519 A JP2002073519 A JP 2002073519A JP 2003272930 A JP2003272930 A JP 2003272930A
- Authority
- JP
- Japan
- Prior art keywords
- laminated
- plating
- chip
- external electrode
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Coils Or Transformers For Communication (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、多層構造の積層チ
ップ部品及びその製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multilayer chip component having a multilayer structure and a method for manufacturing the same.
【0002】[0002]
【従来の技術】従来の積層チップ部品では、外部電極を
形成する際に、まずチップ部品本体の焼成後に外部電極
となる導電性ペーストを塗布し、更に焼き付けることに
より外部電極パターンを形成し、その後形成した外部電
極パターンを鍍金して外部電極としていた。2. Description of the Related Art In a conventional multilayer chip component, when forming an external electrode, first, a conductive paste to be the external electrode is applied after firing of the chip component body, and further baked to form an external electrode pattern, and thereafter. The formed external electrode pattern was plated to form an external electrode.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、従来の
方法では、外部電極の形成のために、塗布工程と焼成工
程をチップ部品本体(積層チップ状部品)の製造工程と
は別に行わなければならず、製造工程も複雑でコストも
かかってしまっていた。However, in the conventional method, in order to form the external electrodes, the coating process and the firing process must be performed separately from the manufacturing process of the chip component body (multilayer chip component). However, the manufacturing process was complicated and costly.
【0004】更に、積層チップ部品では熱による影響が
無視できないにもかかわらず外部電極形成時の焼成工程
を行わなければならず、悪影響が問題となっていた。Further, in the case of the laminated chip part, the firing process at the time of forming the external electrodes has to be performed even though the influence of heat cannot be ignored, and the adverse effect has been a problem.
【0005】[0005]
【課題を解決するための手段】本発明は、上述した課題
を解決することを目的としてなされたもので、例えば、
外部電極形成のための塗布工程を焼成工程を無くし、製
造コストを低減すると共に、積層チップ本体に対する過
熱による悪影響を与えることのない積層チップ部品及び
その製造方法を提供することを目的とする。そして、係
る目的を達成し、上述した課題を解決する一手段として
例えば以下の構成を備える。The present invention has been made for the purpose of solving the above-mentioned problems.
An object of the present invention is to provide a laminated chip component and a manufacturing method thereof, which eliminates a coating step for forming external electrodes, eliminates a firing step, reduces manufacturing costs, and does not adversely affect the laminated chip body due to overheating. Then, for example, the following configuration is provided as one means for achieving the object and solving the problems described above.
【0006】即ち、積層チップ部品の各積層部材の少な
くとも外部電極形成部端部に導電部を形成した後前記導
電部を形成した各積層部材を積層することにより積層チ
ップ状とし、前記積層チップ状の積層部材の前記外部電
極形成部分を鍍金して形成した外部電極を有することを
特徴とする。That is, a laminated chip is formed by forming a conductive portion on at least an end of the external electrode forming portion of each laminated member of the laminated chip component and then laminating the laminated members on which the conductive portion is formed. It has an external electrode formed by plating the external electrode forming portion of the laminated member.
【0007】そして例えば、前記導電部は導電ペースト
を塗布することで形成され、前記各積層部材は前記導電
部形成後に積層して焼成することにより積層チップ状に
することを特徴とする。Further, for example, the conductive portion is formed by applying a conductive paste, and the respective laminated members are formed into a laminated chip by laminating and firing after forming the conductive portion.
【0008】また例えば、前記積層された積層チップ部
の前記外部電極形成部は、多層鍍金して積層状態にある
前記各積層部材の導電部間を電気的接続状態とすること
を特徴とする。あるいは、前記多層鍍金は、少なくとも
ニッケル鍍金を行った後更に錫鍍金を行うことを特徴と
する。Further, for example, the external electrode forming portion of the laminated multilayer chip portion is characterized by performing multi-layer plating to electrically connect the conductive portions of the laminated members in the laminated state. Alternatively, the multilayer plating is characterized in that at least nickel plating is performed and then tin plating is further performed.
【0009】更に例えば、前記積層部材はセラミック材
料であり、絶縁材料、誘電材料、磁性材料などからなる
ことを特徴とする。Further, for example, the laminated member is a ceramic material, and is made of an insulating material, a dielectric material, a magnetic material, or the like.
【0010】又は、積層チップ部品の各積層部材に必要
な導電パターン部と共に少なくとも外部電極形成部端部
に外部電極用導電部を形成し、前記導電部を形成した各
積層部材を積層して積層チップ状とし、前記積層チップ
の外部電極形成部分を鍍金して外部電極を形成してなる
積層チップ部品の製造方法であることを特徴とする。Alternatively, a conductive pattern portion necessary for each laminated member of the laminated chip component is formed with a conductive portion for an external electrode at least at an end portion of the external electrode forming portion, and the laminated members having the conductive portion are laminated and laminated. A method of manufacturing a laminated chip component, which is in the form of a chip and in which an external electrode forming portion of the laminated chip is plated to form an external electrode.
【0011】そして例えば、前記導電部は、導電ペース
トを塗布して形成し、導電ペーストの塗布された必要な
積層部材を積層して焼成して積層チップとする積層チッ
プ部品の製造方法であることを特徴とする。Further, for example, the conductive portion is a method for manufacturing a laminated chip component in which a conductive paste is applied to form a laminated chip and necessary laminated members coated with the conductive paste are laminated and fired to form a laminated chip. Is characterized by.
【0012】また例えば、前記外部電極は、前記積層さ
れた積層チップ部材の前記外部電極形成部を多層鍍金し
て前記各積層部材の導電部間を電気的接続状態として形
成する積層チップ部品の製造方法であることを特徴とす
る。Further, for example, the manufacturing of a laminated chip component in which the external electrodes are formed by multi-layer plating the external electrode forming portions of the laminated laminated chip members to electrically connect the conductive portions of the laminated members. It is a method.
【0013】更に例えば、前記多層鍍金は、少なくとも
ニッケル鍍金を行った後更に錫鍍金を行う多層チップ部
品の製造方法であることを特徴とする。Further, for example, the multilayer plating is characterized in that it is a method for manufacturing a multilayer chip component in which at least nickel plating is performed and then tin plating is further performed.
【0014】[0014]
【発明の実施の形態】以下、図面を参照して本発明に係
る一発明の実施の形態例を詳細に説明する。DETAILED DESCRIPTION OF THE INVENTION An embodiment of the present invention will be described in detail below with reference to the drawings.
【0015】図1は本発明に係る一発明の実施の形態例
の積層チップ部品の積層部材の積層状態を説明するため
の図、図2は本実施の形態例の外部電極形成過程を説明
するための図、図3は本実施の形態例の積層チップ部品
の製造方法を説明するためのフローチャート、図4はチ
ップ部品完成状態例を示す図である。FIG. 1 is a diagram for explaining a laminated state of a laminated member of a laminated chip part according to an embodiment of the present invention, and FIG. 2 is for explaining an external electrode forming process of the embodiment. FIG. 3 is a flow chart for explaining the method of manufacturing the laminated chip component of the present embodiment, and FIG. 4 is a diagram showing an example of a completed chip component.
【0016】本実施の形態例では多層(積層型)リアク
タンス部品に適用した例を説明する。しかし、外部電極
を必要とするあらゆる積層チップ部品の適用できること
は勿論である。例えばチップ型BPF、チップ型抵抗
器、チップ型ヒューズなど各種のチップ型部品にそのま
ま適用可能である。In this embodiment, an example applied to a multi-layer (laminated type) reactance component will be described. However, it goes without saying that it can be applied to all laminated chip components that require external electrodes. For example, it can be directly applied to various chip-type components such as a chip-type BPF, a chip-type resistor, and a chip-type fuse.
【0017】まず、図1を参照して本実施の形態例の積
層チップ部品の外部電極形成前の構造を説明する。以下
の説明は長方形の8つの積層部材を積層して部品を製作
し、短辺側の側面に外部電極を形成する場合を例として
説明する。しかし、形状及び積層数及び外部電極形成面
は一例であり以下に説明する例に限定されるものではな
い。First, referring to FIG. 1, the structure of the laminated chip component of this embodiment before the external electrodes are formed will be described. In the following description, a case where eight rectangular laminated members are laminated to manufacture a component and external electrodes are formed on the side surfaces on the short side will be described as an example. However, the shape, the number of stacked layers, and the surface on which the external electrodes are formed are examples, and the present invention is not limited to the examples described below.
【0018】図1において、1は第1層の積層部材であ
り、表面側の両短辺側に所定幅の導電ペースト(例えば
銀ペースト)1a,1bを塗布し、外部電極パターンと
している。また第8層(最下層)の積層部材8も積層チ
ップ部品の表面側の面に第1層積層部材1と同様位置に
同様形状の外部電極パターンを形成している。In FIG. 1, reference numeral 1 denotes a first-layer laminated member, and conductive pastes (for example, silver paste) 1a and 1b having a predetermined width are applied to both short sides of the front surface to form an external electrode pattern. The eighth layer (lowermost layer) of the laminated member 8 also has an external electrode pattern of the same shape formed at the same position as the first layer laminated member 1 on the surface on the front surface side of the laminated chip component.
【0019】2は第2層の積層部材であり、両短辺側端
部から長辺の第1層の積層部材の導電ペースト幅と略同
じ長さまでやや幅狭のコ字型に第1層と同様の導電ペー
ストを塗布して端部導電パターンを形成している。この
端部導電パターンは、第3層の導電部材3から第7層の
導電部材7においても、第2層の積層部材と略同位置に
同形状の導電ペーストを塗布して同じような端部電極パ
ターン(3a,3b;4a,4b;5a,5b;6a,
6b;7a,7b)を形成している。Reference numeral 2 denotes a second-layer laminated member, and the first layer has a U-shape that is slightly narrower than the length of the conductive paste of the first-layer laminated member on both short sides to the long side. An end conductive pattern is formed by applying a conductive paste similar to the above. This end conductive pattern is applied to the third-layer conductive member 3 to the seventh-layer conductive member 7 by applying a conductive paste of the same shape at substantially the same position as that of the second-layer laminated member and similar end portions. Electrode patterns (3a, 3b; 4a, 4b; 5a, 5b; 6a,
6b; 7a, 7b).
【0020】第2層の積層部材2と第7層の積層部材7
は端部導電パターンの内側には何のパターンも形成され
ておらずほぼ同じ構成である。一方、第3層の積層部材
3から第6層の積層部材6には、チップ構造上必要な内
部導電パターン(3c,4c,5c,6c)が所定の材
料により形成されている。本例ではリアクタンス部品で
あるため、導電パターンの形成となり、例えば端部導電
パターンを形成する導電ペーストと同じ導電ペースト
(銀ペースト)でパターンを形成することができる。従
って、この場合には端部導電パターンの形成と部品構成
用の導電パターンとを同じ工程の1回の導電パターン塗
布で行うことができる。このため、従来の工程と同じ工
程で端部導電パターンを形成できる。Second layer laminated member 2 and seventh layer laminated member 7
No pattern is formed on the inside of the end conductive pattern, and the structure is almost the same. On the other hand, internal conductive patterns (3c, 4c, 5c, 6c) necessary for the chip structure are formed of a predetermined material on the third layer laminated member 3 to the sixth layer laminated member 6. In this example, since it is a reactance component, a conductive pattern is formed, and for example, the pattern can be formed with the same conductive paste (silver paste) as the conductive paste forming the end conductive pattern. Therefore, in this case, the formation of the end conductive pattern and the conductive pattern for component construction can be performed by applying the conductive pattern once in the same step. Therefore, the end conductive pattern can be formed in the same process as the conventional process.
【0021】第3層の積層部材3から第6層の積層部材
6における部品構成用の導電パターン端部の丸印はスル
ーホール形成部であり、この部分で隣接する積層部材の
部品構成用の導電パターン端部と電気的に接続する。The circles at the ends of the conductive patterns for component construction in the third-layer stacking member 3 to the sixth-layer stacking member 6 are through-hole forming portions, and in this portion, for the component construction of adjacent stacking members. It electrically connects to the end of the conductive pattern.
【0022】このようにして部品構成用の導電パターン
と端部導電パターンの形成された積層部材を積層してダ
イシングしその後焼成し、積層チップ状とする。その後
積層した積層部材の短辺側側面に対して、本実施の形態
例では例えば図2に示すようにして多層鍍金を施してT
外部電極を形成する。In this way, the laminated member on which the conductive pattern for component construction and the end conductive pattern are formed are laminated, diced, and then fired to form a laminated chip. In the present embodiment, for example, as shown in FIG. 2, multilayer plating is applied to the short-side surface of the laminated members, and then T is formed.
Form external electrodes.
【0023】積層した状態の積層部材の短辺側側面は、
積層部材の積層境界部に端部導電パターンの一部が露出
した状態となっている。例えば厚さ20μm〜30μm
の積層部材層と数μm以下の端部導電パターン層が交互
に配置された状態となっている。The short side surface of the laminated members in the laminated state is
A part of the end conductive pattern is exposed at the stacking boundary portion of the stacking member. For example, a thickness of 20 μm to 30 μm
The laminated member layers and the end conductive pattern layers having a thickness of several μm or less are alternately arranged.
【0024】各積層部材は、シート状に成形されてお
り、例えば、絶縁材料、誘電材料、磁性材料からなるセ
ラミック材料で構成されており、フェライト生シート、
誘電体生シート、あるいはセラミック生シートなどが用
いられる。チップ部品の求める要求に答えるものであれ
ばこの材質に限定されるものではない。Each laminated member is formed into a sheet shape, and is made of, for example, a ceramic material including an insulating material, a dielectric material, and a magnetic material.
A dielectric green sheet or a ceramic green sheet is used. The material is not limited to this material as long as it can meet the requirements of chip components.
【0025】この端部にそのまま、あるいは表面研磨な
どの表面処理を行った後、まず第1層の金属鍍金(例え
ばニッケル鍍金)を行う。この第1層の鍍金を行った状
態を図2の(A)に示す。図2の(A)中のCが端部導
電パターン部、50が第1層の鍍金部である。The end portion is directly or after being subjected to surface treatment such as surface polishing, first, metal plating (for example, nickel plating) of the first layer is performed. A state in which the first layer is plated is shown in FIG. In FIG. 2A, C is an end conductive pattern portion, and 50 is a first layer plated portion.
【0026】続いて同じ金属で第2層の鍍金を行ない、
鍍金層を厚肉化して積層部材各層の端部電極パターンC
間に確実に鍍金層が形成されるようにする。この第2層
の鍍金を行った状態を図2の(B)に示す。図2の
(B)中の60が第2層までの鍍金を行った鍍金層であ
る。なお、以上の説明では2層の鍍金を行って鍍金層6
0を形成したが、1回の鍍金で十分な厚さが確保できる
ようであれば1回のみで足り、逆に厚さを更に肉厚とす
る場合には3回以上必要回数の鍍金を行えばよい。Subsequently, a second layer is plated with the same metal,
The plating layer is made thicker so that the end portion electrode pattern C of each layer of the laminated member
Make sure that a plating layer is formed between them. A state in which the plating of the second layer is performed is shown in FIG. Reference numeral 60 in FIG. 2B is a plated layer obtained by plating up to the second layer. It should be noted that in the above description, two layers are plated and the plating layer 6 is
Although 0 was formed, if it is possible to secure a sufficient thickness with one plating, it is sufficient to perform only once, and conversely, if the thickness is made thicker, the plating should be performed three times or more as many times as necessary. I'll do it.
【0027】そしてその後更に表面に錫鍍金を行って外
部電極形成を完成させる。錫鍍金を行った状態を図2の
(C)に示す。図2の(C)において、70が表面の錫
鍍金層である。なお、先の鍍金層60は各端部電極パタ
ーン間を塞ぐ程度の厚さとし、この錫鍍金層を肉厚に形
成してもよい。この場合には容易にかつ廉価で肉厚鍍金
層を形成することができる。Then, after that, tin plating is further performed on the surface to complete the external electrode formation. The state after the tin plating is shown in FIG. In FIG. 2C, reference numeral 70 denotes a tin plating layer on the surface. The plating layer 60 may be thick enough to close the space between the end electrode patterns, and the tin plating layer may be formed thick. In this case, the thick plating layer can be formed easily and inexpensively.
【0028】例えば、フェライト生シートを利用すれ
ば、フェライトが一般的には誘電体などと比較して絶縁
抵抗値が小さく、鍍金が伸び易い。この特徴を生かすこ
とにより、積層部材上の端部電極パターン部を露出した
部分をきっかけとして鍍金のみでも各端部電極間を連結
した外部電極が容易に形成できる。For example, when a green ferrite sheet is used, ferrite generally has a smaller insulation resistance value as compared with a dielectric or the like, and the plating is easy to stretch. By making use of this feature, the external electrodes connecting the end electrodes can be easily formed only by plating using the exposed portion of the end electrode pattern portion on the laminated member as a trigger.
【0029】また、以上の説明は鍍金で外部電極を形成
する例を説明したが、加熱工程(焼成工程)を含まない
で導電層を形成できる方法であれば鍍金に限定されるも
のではない。例えば蒸着で形成しても良い。In the above description, an example of forming the external electrode by plating has been described, but the method is not limited to plating as long as it is a method capable of forming a conductive layer without including a heating step (firing step). For example, it may be formed by vapor deposition.
【0030】以上に説明した本実施の形態例の積層チッ
プ部品の製造方法を、図3のフローチャートを参照して
以下に説明する。The method of manufacturing the layered chip component of the present embodiment described above will be described below with reference to the flowchart of FIG.
【0031】まずステップS1において図1に示したよ
うに各積層部材(セラミック材料生シート)上に導電ペ
ースト、例えば銀ペーストを端部電極パターン形成部位
に塗布する。同じくチップ部品の機能を実現するための
構成素子パターンを必要な形成部位に塗布する。リアク
タンス素子を形成する場合には、例えば渦巻き状導電パ
ターンを形成する必要があるため、各積層部材ごとに特
有のパターン形状で例えば端部電極パターン部と同じ金
属ペースト(例えば銀ペースト)を導電パターン部位に
塗布する。即ち、図1の場合では一回の塗布で必要な導
電パターンのすべてを塗布することができ、作業負荷が
増えることはほとんどない。First, in step S1, as shown in FIG. 1, a conductive paste, for example, a silver paste, is applied to each end member pattern forming portion on each laminated member (ceramic material green sheet). Similarly, a constituent element pattern for realizing the function of the chip component is applied to a necessary formation site. When forming a reactance element, for example, it is necessary to form a spiral conductive pattern. Therefore, for example, the same metal paste (for example, silver paste) as the end electrode pattern portion is used as a conductive pattern in a pattern shape unique to each laminated member. Apply to the site. That is, in the case of FIG. 1, all the necessary conductive patterns can be applied by one application, and the work load hardly increases.
【0032】続いてステップS2において、ステップS
1で電極パターンなどが塗布された各積層部材を積層す
る。そしてステップS3において積層した積層部材をダ
イシングして焼成し、積層チップ状に形成する。この状
態では、例えば単辺側面に端部電極パターン端部が上述
した図2に示すように露出した状態である。Then, in step S2, step S
The laminated members coated with the electrode patterns and the like in 1 are laminated. Then, in step S3, the laminated members laminated are diced and fired to form laminated chips. In this state, for example, the end portion of the end electrode pattern is exposed on the side surface of one side as shown in FIG. 2 described above.
【0033】次にステップS4において外部電極形成部
を2度に分けてニッケル鍍金する。上述したように、一
回目の鍍金で図2の(A)に示すような状態とし、二回
目の鍍金で図2の(B)に示すように外部電極形成面の
一面が鍍金層で覆われる状態とする。Next, in step S4, the external electrode forming portion is divided into two parts and nickel-plated. As described above, the first plating is performed as shown in FIG. 2A, and the second plating is performed to cover one surface of the external electrode forming surface with the plating layer as shown in FIG. 2B. State.
【0034】続いてステップS5において、ニッケル鍍
金された外部電極部上に更に所定厚さに錫鍍金する。例
えば上述した図2の(C)に示す状態とする。このよう
にして完成した積層チップ部品の外観例を図4に示す。Then, in step S5, the external electrode portion plated with nickel is further plated with tin to a predetermined thickness. For example, the state shown in FIG. FIG. 4 shows an appearance example of the laminated chip component thus completed.
【0035】このようにして積層チップ部品を製造後、
ステップS6に置いて製品が規格内の特性を有している
か否かを検査し、規格を満足する場合には製品として完
成とする。After manufacturing the laminated chip component in this manner,
In step S6, it is inspected whether or not the product has the characteristics within the standard, and when the standard is satisfied, the product is completed.
【0036】以上説明したように本実施の形態例によれ
ば、従来は必要であった外部電極生成のための金属ペー
スト塗布工程、その後の焼成工程がいずれも不要となる
ため、製造方法が簡略化できると共に、製造単価も抑え
ることができる。As described above, according to the present embodiment, the metal paste coating step for forming the external electrodes and the subsequent firing step, which have been conventionally required, are not required, so that the manufacturing method is simplified. It is possible to reduce the production unit price as well as to reduce the cost.
【0037】更に、外部電極のための焼成工程が省略で
きるため、焼成工程による積層チップ部分への加熱によ
るチップ特性への影響をなくすことができる。Furthermore, since the firing process for the external electrodes can be omitted, it is possible to eliminate the influence on the chip characteristics due to the heating of the laminated chip portion due to the firing process.
【0038】なお、以上の説明では、第1層と第8層の
積層部材1、8と第2層と第7層の積層部材2、7とを
別構成としたが、例えば第2層と第7層の積層部材2、
7あるいは第1層と大8層の積層部材1、8のいずれか
の積層部材を省略してもよい。In the above description, the laminated members 1 and 8 of the first layer and the eighth layer and the laminated members 2 and 7 of the second layer and the seventh layer have different structures. A laminated member 2 of the seventh layer,
Alternatively, any one of the laminated members 1 or 8 of 7 or the first layer and the large 8 layers may be omitted.
【0039】[0039]
【発明の効果】以上説明したように本発明によれば、従
来は必要であった外部電極生成のための金属ペースト塗
布工程、その後の焼成工程がいずれも不要な、製造工程
が簡略化された、製造単価を抑えることができる積層チ
ップ部品及び積層チップ部品の製造方法を提供すること
ができる。As described above, according to the present invention, the manufacturing process is simplified, which does not require the metal paste coating process for forming the external electrodes and the subsequent firing process which are conventionally required. It is possible to provide a laminated chip component and a method for manufacturing a laminated chip component that can reduce the manufacturing unit price.
【図1】本発明に係る一発明の実施の形態例の積層チッ
プ部品の積層部材の積層状態を説明するための図であ
る。FIG. 1 is a diagram for explaining a laminated state of a laminated member of a laminated chip component according to an embodiment of the present invention.
【図2】本実施の形態例の外部電極形成過程を説明する
ための図である。FIG. 2 is a diagram for explaining a process of forming external electrodes according to the present embodiment.
【図3】本実施の形態例の積層チップ部品の製造方法を
説明するためのフローチャートであるFIG. 3 is a flowchart for explaining a method of manufacturing a layered chip component according to the present embodiment.
【図4】本実施の形態例のチップ部品完成状態例を示す
図である。FIG. 4 is a diagram showing an example of a chip component completed state according to the present embodiment.
1 第1層の積層部材
1a,1b,8a,8b 導電ペースト(外部電極パ
ターン)
2 第2層の積層部材
3 第3層の積層部材
4 第4層の積層部材
5 第5層の積層部材
6 第6層の積層部材
7 第7層の積層部材
8 第8層の積層部材
3a,3b;4a,4b;5a,5b;6a,6b;7
a,7b 端部電極パターン
3c,4c,5c,6c 内部導電パターン
50 第1層の鍍金層
60 第2層の鍍金層
70 表面の錫鍍金層
C 端部導電パターン部DESCRIPTION OF SYMBOLS 1 1st layer laminated member 1a, 1b, 8a, 8b Conductive paste (external electrode pattern) 2 2nd layer laminated member 3 3rd layer laminated member 4 4th layer laminated member 5 5th layer laminated member 6 Sixth layer laminated member 7 Seventh layer laminated member 8 Eighth layer laminated member 3a, 3b; 4a, 4b; 5a, 5b; 6a, 6b; 7
a, 7b end electrode pattern 3c, 4c, 5c, 6c internal conductive pattern 50 first plating layer 60 second plating layer 70 surface tin plating layer C end conductive pattern portion
フロントページの続き Fターム(参考) 5E062 FG01 FG11 5E070 AA01 CB13 CB18 EA01 5E082 AA01 AB03 BB07 BC38 BC40 FG26 GG10 GG11 LL02 MM22 MM24 Continued front page F term (reference) 5E062 FG01 FG11 5E070 AA01 CB13 CB18 EA01 5E082 AA01 AB03 BB07 BC38 BC40 FG26 GG10 GG11 LL02 MM22 MM24
Claims (9)
も外部電極形成部端部に導電部を形成した後前記導電部
を形成した各積層部材を積層することにより積層チップ
状とし、前記積層チップ状の積層部材の前記外部電極形
成部分を鍍金して形成した外部電極を有することを特徴
とする積層チップ部品。1. A laminated chip shape is obtained by forming a conductive portion at least at an end portion of an external electrode forming portion of each laminated member of a laminated chip component and then laminating the laminated members having the conductive portion formed thereon to form a laminated chip shape. A laminated chip part having an external electrode formed by plating the external electrode forming portion of the laminated member.
とで形成され、前記各積層部材は前記導電部形成後に積
層して焼成することにより積層チップ状にすることを特
徴とする請求項1記載の積層チップ部品。2. The conductive portion is formed by applying a conductive paste, and each of the laminated members is formed into a laminated chip by laminating and firing after forming the conductive portion. Multilayer chip parts.
電極形成部は、多層鍍金して積層状態にある前記各積層
部材の導電部間を電気的接続状態とすることを特徴とす
る請求項1又は請求項2記載の積層チップ部品。3. The external electrode forming portion of the laminated multilayer chip portion is subjected to multilayer plating to electrically connect the conductive portions of the laminated members in the laminated state. The laminated chip component according to claim 1 or claim 2.
金を行った後更に錫鍍金を行うことを特徴とする請求項
3記載の多層チップ部品。4. The multilayer chip component according to claim 3, wherein the multilayer plating is performed by at least nickel plating and then tin plating.
絶縁材料、誘電材料、磁性材料などからなることを特徴
とする請求項1乃至請求項3のいずれかに記載の積層チ
ップ部品。5. The laminated member is a ceramic material,
The laminated chip component according to any one of claims 1 to 3, which is made of an insulating material, a dielectric material, a magnetic material, or the like.
電パターン部と共に少なくとも外部電極形成部端部に外
部電極用導電部を形成し、 前記導電部を形成した各積層部材を積層して積層チップ
状とし、 前記積層チップの外部電極形成部分を鍍金して外部電極
を形成してなることを特徴とする積層チップ部品の製造
方法。6. A conductive pattern portion necessary for each laminated member of a laminated chip component and an external electrode conductive portion are formed at least at an end portion of the external electrode forming portion, and the laminated members on which the conductive portion is formed are laminated and laminated. A method of manufacturing a laminated chip component, which is in the form of a chip, and the external electrode forming portion of the laminated chip is plated to form external electrodes.
形成し、 導電ペーストの塗布された必要な積層部材を積層して焼
成して積層チップとすることを特徴とする請求項6記載
の積層チップ部品の製造方法。7. The conductive part is formed by applying a conductive paste, and a necessary laminated member coated with the conductive paste is laminated and fired to form a laminated chip. Manufacturing method of laminated chip component.
ップ部材の前記外部電極形成部を多層鍍金して前記各積
層部材の導電部間を電気的接続状態として形成すること
を特徴とする請求項5又は請求項6記載の積層チップ部
品の製造方法。8. The external electrode is formed by performing multi-layer plating on the external electrode forming portion of the laminated multilayer chip member so as to electrically connect the conductive portions of each of the multilayer members. Item 5. A method for manufacturing a laminated chip component according to claim 5 or 6.
金を行った後更に錫鍍金を行うことを特徴とする請求項
7記載の多層チップ部品の製造方法。9. The method of manufacturing a multilayer chip component according to claim 7, wherein the multilayer plating is at least nickel plating and then tin plating.
Priority Applications (1)
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Application Number | Priority Date | Filing Date | Title |
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JP2002073519A JP2003272930A (en) | 2002-03-18 | 2002-03-18 | Laminated chip and its manufacturing method |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103151158A (en) * | 2013-03-27 | 2013-06-12 | 深圳顺络电子股份有限公司 | Metallizing method of high-frequency magnetic core |
CN106716567A (en) * | 2014-09-19 | 2017-05-24 | 株式会社村田制作所 | Inductor component and method for manufacturing inductor component |
-
2002
- 2002-03-18 JP JP2002073519A patent/JP2003272930A/en not_active Withdrawn
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103151158A (en) * | 2013-03-27 | 2013-06-12 | 深圳顺络电子股份有限公司 | Metallizing method of high-frequency magnetic core |
CN106716567A (en) * | 2014-09-19 | 2017-05-24 | 株式会社村田制作所 | Inductor component and method for manufacturing inductor component |
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