JP2003246825A5 - - Google Patents

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Publication number
JP2003246825A5
JP2003246825A5 JP2002340817A JP2002340817A JP2003246825A5 JP 2003246825 A5 JP2003246825 A5 JP 2003246825A5 JP 2002340817 A JP2002340817 A JP 2002340817A JP 2002340817 A JP2002340817 A JP 2002340817A JP 2003246825 A5 JP2003246825 A5 JP 2003246825A5
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Japan
Prior art keywords
monomer
polymerization
copolymer
resist
polymerization vessel
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JP2002340817A
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Japanese (ja)
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JP4000295B2 (en
JP2003246825A (en
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Priority to JP2002340817A priority Critical patent/JP4000295B2/en
Priority claimed from JP2002340817A external-priority patent/JP4000295B2/en
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Publication of JP2003246825A5 publication Critical patent/JP2003246825A5/ja
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Claims (6)

脂環式骨格を有する単量体単位（Ａ）、ラクトン骨格を有する単量体単位（Ｂ）、およびこれらの単量体単位と共重合可能な他のビニル系単量体単位（Ｃ）よりなる群から選ばれた少なくとも２種類以上の単量体単位を含むレジスト用共重合体であって、各々の単量体単位の３連子の割合が共重合体中それぞれ１５モル％未満であることを特徴とするレジスト用共重合体。  From a monomer unit (A) having an alicyclic skeleton, a monomer unit (B) having a lactone skeleton, and other vinyl monomer units (C) copolymerizable with these monomer units A copolymer for resist containing at least two or more types of monomer units selected from the group consisting of a proportion of triads of each monomer unit of less than 15 mol% in the copolymer. A resist copolymer characterized by the above. 請求項１記載の共重合体を製造するための方法であって、各々の単量体単位を構成する単量体を有機溶剤に溶解させた単量体溶液を少なくとも２つ以上の滴下装置を用いて重合容器に滴下することを特徴とするレジスト用共重合体の製造方法。A method for producing the copolymer according to claim 1 , wherein at least two dropping devices are used for dissolving a monomer solution in which a monomer constituting each monomer unit is dissolved in an organic solvent. A method for producing a resist copolymer, wherein the resist copolymer is dropped into a polymerization vessel . 請求項１記載の共重合体を製造するための方法であって、各々の単量体単位を構成する単量体の一部を予め重合容器に仕込み、重合容器を所定の重合温度まで加熱して重合を開始した後、残りの単量体を重合容器に滴下することを特徴とするレジスト用共重合体の製造方法。It is a method for manufacturing the copolymer of Claim 1 , Comprising: A part of monomer which comprises each monomer unit was previously charged to the polymerization container, and the polymerization container was heated to predetermined polymerization temperature. Then, after the polymerization is started, the remaining monomer is dropped into the polymerization vessel. 請求項１記載の共重合体を製造するための方法であって、単量体組成比が異なる、少なくとも２種類以上の単量体溶液を順次重合容器に滴下することを特徴とするレジスト用共重合体の製造方法。A method for producing a copolymer according to claim 1 , wherein at least two types of monomer solutions having different monomer composition ratios are sequentially dropped into a polymerization vessel. A method for producing a polymer. 各々の単量体単位を構成する単量体の一部を予め重合容器に仕込み、重合容器を所定の重合温度まで加熱して重合を開始した後、残りの単量体を重合容器に滴下することを特徴とする請求項４記載の方法。A part of the monomer constituting each monomer unit is previously charged in a polymerization vessel, the polymerization vessel is heated to a predetermined polymerization temperature and polymerization is started, and then the remaining monomer is dropped into the polymerization vessel. The method of claim 4 wherein: 請求項１記載のレジスト用共重合体を含むことを特徴とするレジスト組成物。A resist composition comprising the resist copolymer according to claim 1 .
JP2002340817A 2001-12-21 2002-11-25 Copolymer for resist, method for producing the same, and resist composition Expired - Lifetime JP4000295B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002340817A JP4000295B2 (en) 2001-12-21 2002-11-25 Copolymer for resist, method for producing the same, and resist composition

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001389720 2001-12-21
JP2001-389720 2001-12-21
JP2002340817A JP4000295B2 (en) 2001-12-21 2002-11-25 Copolymer for resist, method for producing the same, and resist composition

Publications (3)

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JP2003246825A JP2003246825A (en) 2003-09-05
JP2003246825A5 true JP2003246825A5 (en) 2005-06-30
JP4000295B2 JP4000295B2 (en) 2007-10-31

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JP2002340817A Expired - Lifetime JP4000295B2 (en) 2001-12-21 2002-11-25 Copolymer for resist, method for producing the same, and resist composition

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Families Citing this family (26)

* Cited by examiner, † Cited by third party
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JP4632345B2 (en) * 2004-05-12 2011-02-16 三菱レイヨン株式会社 Method for analyzing copolymer composition distribution of resist copolymer
JP4881566B2 (en) * 2005-03-10 2012-02-22 丸善石油化学株式会社 POSITIVE PHOTOSENSITIVE RESIN, PROCESS FOR PRODUCING THE SAME AND RESIST COMPOSITION CONTAINING POSITIVE PHOTOSENSITIVE RESIN
JP4743426B2 (en) * 2006-05-12 2011-08-10 信越化学工業株式会社 Polymer for resist material and manufacturing method thereof, resist material, pattern forming method
JP5588095B2 (en) 2006-12-06 2014-09-10 丸善石油化学株式会社 Copolymer for semiconductor lithography and method for producing the same
JP4882788B2 (en) * 2007-02-21 2012-02-22 Ｊｓｒ株式会社 Radiation-sensitive resin composition, spacer, production method thereof, and liquid crystal display device
JP2008239889A (en) * 2007-03-28 2008-10-09 Fujifilm Corp Resin, method of manufacturing the same, positive photosensitive composition employing it, and pattern forming method
JP5270189B2 (en) * 2008-02-22 2013-08-21 株式会社クラレ Novel alcohols and their derivatives
JP5466511B2 (en) * 2008-02-22 2014-04-09 株式会社クラレ High molecular compound
JP5270187B2 (en) 2008-02-22 2013-08-21 株式会社クラレ Novel (meth) acrylic acid ester derivatives, haloester derivatives and polymer compounds
JP5270188B2 (en) * 2008-02-22 2013-08-21 株式会社クラレ Novel acrylic ester derivatives and polymer compounds
JP5568963B2 (en) * 2008-11-28 2014-08-13 Ｊｓｒ株式会社 Polymer and radiation-sensitive resin composition
JP5631550B2 (en) 2009-02-27 2014-11-26 丸善石油化学株式会社 Method for producing copolymer for photoresist
JP5394119B2 (en) * 2009-04-24 2014-01-22 三菱レイヨン株式会社 Method for producing polymer, method for producing resist composition, and method for producing substrate
JP4955732B2 (en) 2009-05-29 2012-06-20 信越化学工業株式会社 Negative resist composition and pattern forming method using the same
JP4950252B2 (en) 2009-07-01 2012-06-13 信越化学工業株式会社 Positive resist composition and pattern forming method
US9023578B2 (en) 2009-07-07 2015-05-05 Mitsubishi Rayon Co., Ltd. Copolymer for lithography and method for evaluating the same
KR101432395B1 (en) 2009-07-07 2014-08-20 미츠비시 레이온 가부시키가이샤 Polymer production method, polymer for use in lithography, resist composition and substrate production method
JP5707699B2 (en) * 2009-12-28 2015-04-30 三菱レイヨン株式会社 Method for producing polymer, method for producing resist composition, and method for producing substrate
KR101805239B1 (en) * 2010-10-18 2017-12-05 미쯔비시 케미컬 주식회사 Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions
JP5771942B2 (en) * 2010-10-18 2015-09-02 三菱レイヨン株式会社 Lithographic polymer manufacturing method, resist composition manufacturing method, and substrate manufacturing method
JP2012145868A (en) * 2011-01-14 2012-08-02 Tokyo Ohka Kogyo Co Ltd Resist composition and method for forming resist pattern
JP2012207218A (en) * 2011-03-16 2012-10-25 Sumitomo Chemical Co Ltd Method of producing resin for resist composition
JP6439270B2 (en) * 2013-05-17 2018-12-19 三菱ケミカル株式会社 Lithographic polymer manufacturing method, resist composition manufacturing method, and pattern-formed substrate manufacturing method
JP6349407B2 (en) * 2014-09-29 2018-06-27 富士フイルム株式会社 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and electronic device manufacturing method

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