JP2003241180A - Image display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To precisely perform a matching of one substrate with the other substrate. <P>SOLUTION: On a liquid-crystal side surface of one of substrates which are arranged opposite to each other across a liquid crystal, respective areas encircled with a plurality of parallel gate signal lines and a plurality of parallel drain signal lines crossing the gate signal lines are formed as pixel areas, and in each pixel area, a switching element which operates with a scanning signal from a gate signal line and a pixel electrode supplied with a video signal from a drain signal line through the switching element are provided; and a black matrix is formed on a liquid-crystal side surface of the other substrate opposite to the gate signal lines and a projection part or recessed part is formed on at least one of sides nearly parallel to the gate signal lines of the black matrix at a position opposite to the drain signal lines. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an image display device, for example, a liquid crystal display device.

[0002]

2. Description of the Related Art For example, in a liquid crystal display device, a plurality of gate signal lines arranged in parallel with each other on the liquid crystal side surface of one of the substrates opposed to each other with a liquid crystal interposed therebetween and the gate signal lines intersect each other. Then, a plurality of drain signal lines arranged in parallel are formed.

Each region surrounded by each of these signal lines constitutes a pixel region, and in this pixel region, a thin film transistor operated by a scanning signal from the gate signal line and a video signal from the drain signal line via this thin film transistor are formed. Are provided.

An electric field is generated between the pixel electrode and the counter electrode so as to control the light transmittance of liquid crystal between these electrodes.

[0005]

However, in the liquid crystal display device having such a structure, it has been demanded that one substrate be accurately aligned with the other substrate with the recent trend toward higher definition.

Further, the above-mentioned signal line, thin film transistor, electrode or the like is formed by selectively etching a conductive layer, a semiconductor layer, and an insulating layer by a photolithography technique. There were variations, and measures for them were required.

Further, with the increase in definition, it has been demanded that a short-circuit between the signal line and the electrode or a disconnection of the signal line causes inconvenience, and that these can be repaired by a simple operation.

The present invention has been made under these circumstances, and an object thereof is to provide an image display device capable of accurately aligning one substrate with the other substrate.

Another object of the present invention is to provide an image display device in which variations in parasitic capacitance values of thin film transistors and the like are avoided.

Still another object of the present invention is to provide an image display device capable of repairing a short circuit between a signal line and an electrode, a disconnection of the signal line or the like by a simple operation.

[0011]

Among the inventions disclosed in the present application, a brief description will be given to the outline of typical ones.
It is as follows. Means 1. In the liquid crystal display device according to the present invention, for example, a plurality of gate signal lines juxtaposed to each other on the liquid crystal side surface of one of the substrates opposed to each other with the liquid crystal interposed therebetween and the gate signal lines intersecting the gate signal lines. Each region surrounded by a plurality of drain signal lines arranged in parallel is a pixel region, and in each pixel region, a switching element operated by a scanning signal from a gate signal line and a drain signal line via this switching element And a pixel electrode to which a video signal from
A black matrix is formed on the liquid crystal side surface of the other substrate of the respective substrates so as to face the gate signal lines, and at least one side of the sides of the black matrix substantially parallel to the gate signal lines is formed. It is characterized in that a convex portion or a concave portion is formed in a portion facing the drain signal line.

Means 2. In the liquid crystal display device according to the present invention, for example, on the premise of the configuration of means 1, a plurality of the convex portions or the concave portions formed in the black matrix are provided in each pixel region formed along the running direction of the drain signal line. In addition, a plurality of pixel regions are formed in each pixel region formed along the traveling direction of the gate signal line.

Means 3. In the liquid crystal display device according to the present invention, for example, a plurality of gate signal lines juxtaposed to each other on the liquid crystal side surface of one of the substrates opposed to each other with the liquid crystal interposed therebetween and the gate signal lines intersecting the gate signal lines. A region surrounded by a plurality of drain signal lines arranged in parallel is a pixel region, and a switching element having a gate electrode connected to the gate signal line and a drain electrode of this switching element are connected to each pixel region. And a pixel electrode to which a video signal from the drain signal line is supplied through the source electrode, and a black matrix is formed on the liquid crystal side surface of the other substrate of the substrates so as to face the gate signal line. In addition, a convex portion or a concave portion is formed in a portion of the black matrix, which is substantially parallel to the gate signal line, facing the source electrode. Than it is.

Means 4. In the image display device according to the present invention, for example, a plurality of gate signal lines arranged in parallel on the surface of the substrate and a plurality of drain signal lines arranged in parallel so as to intersect these gate signal lines are formed, and each of these signal lines is formed. A thin film transistor which operates by a scanning signal from one gate signal line of a pair of gate signal lines surrounding the pixel region in each pixel region, and a drain signal line through the thin film transistor. A display electrode to which the image signal is supplied, and a capacitive element formed by being superimposed on the other gate signal line of the pair of gate signal lines connected to the display electrode and surrounding the pixel region via an insulating film. One of the capacitance electrodes, and the display electrode is formed by being drawn from the source electrode of the thin film transistor formed on the one gate signal line. Both the capacitor electrodes is characterized in that it is formed to protrude from the pixel area and the adjacent pixel region side edge of the other gate signal lines.

Means 5. In the image display device according to the present invention, for example, on the premise of the configuration of the means 4, the other gate signal line has an extending portion on the pixel region side, and the capacitance electrode is the gate signal line which is the extending portion. It is characterized in that it is formed so as to be superimposed on.

Means 6. In the image display device according to the present invention, for example, on the premise of the configuration of any one of means 4 and 5, two capacitive elements formed in the pixel region are provided, and one of the capacitive elements is the capacitive electrode. Is characterized in that the capacitance of the capacitive element formed so as to project from the side of the other gate signal line adjacent to the pixel area on the pixel area side is smaller than the capacitance of the other capacitive element. .

Means 7. In the image display device according to the present invention, for example, a plurality of gate signal lines arranged in parallel on the surface of the substrate and a plurality of drain signal lines arranged in parallel so as to intersect these gate signal lines are formed. Each of the enclosed regions is used as a pixel region, and a switching element that operates by a scanning signal from the gate signal line and a display electrode to which a video signal from the drain signal line is supplied through the switching element are provided in the pixel region. A scanning signal drive circuit including a semiconductor device that supplies a scanning signal to each of the gate signal lines, and a video signal drive circuit including a semiconductor device that supplies a video signal to each of the drain signal lines. When at least one circuit of the scanning signal drive circuit and the video signal drive circuit is supported by a pillar-shaped protrusion formed on the substrate side. To, and is characterized in that it is connected to a corresponding signal line via the anisotropic conductive sheet disposed between the circuit and the substrate.

Means 8. The image display device according to the present invention is, for example, on the premise of the configuration of the means 7, characterized in that the semiconductor device is a TCP type semiconductor device.

Means 9. The image display device according to the present invention is, for example, on the premise of the configuration of the means 7, characterized in that the semiconductor device is a COG type semiconductor device.

Means 10. The liquid crystal display device according to the present invention,
For example, a plurality of gate signal lines juxtaposed to each other and a plurality of drain signals juxtaposed to these gate signal lines on the liquid crystal side surface of one of the substrates opposed to each other via the liquid crystal. Lines are formed, and each region surrounded by these signal lines is a pixel region, and in this pixel region, a switching element operated by a scanning signal from the gate signal line and a drain signal line from the drain signal line via this switching element are formed. A pixel electrode to which a video signal is supplied and a counter electrode which is connected to a counter voltage signal line and generates an electric field between the pixel electrode and the pixel electrode are overlapped with the drain signal line through an insulating layer. And a counter voltage signal line formed by being overlapped with a gate signal line through an insulating layer, the counter voltage signal line being overlapped with a part of the pixel electrode through an insulating layer. Together and, the insulating layer without at least a multi-layer structure in which the upper layer comprises an organic material layer,
A part of the pixel electrode that overlaps with the counter voltage signal line has a removed portion of the organic material layer.

Means 11. The liquid crystal display device according to the present invention,
For example, a plurality of gate signal lines juxtaposed to each other and a plurality of drain signals juxtaposed to these gate signal lines on the liquid crystal side surface of one of the substrates opposed to each other via the liquid crystal. Lines are formed, and each region surrounded by these signal lines is a pixel region, and in this pixel region, a switching element operated by a scanning signal from the gate signal line and a drain signal line from the drain signal line via this switching element are formed. A wiring layer and an insulating layer, each of which is provided with a pixel electrode to which a video signal is supplied, and a part of the pixel electrode in the pixel region is drawn from the pixel electrode in the pixel region adjacent to the pixel region along the drain signal line. It is characterized in that it is superposed through.

Means 12. The liquid crystal display device according to the present invention,
For example, a plurality of gate signal lines juxtaposed to each other and a plurality of drain signals juxtaposed to these gate signal lines on the liquid crystal side surface of one of the substrates opposed to each other via the liquid crystal. Lines are formed, and each region surrounded by these signal lines is a pixel region, and in this pixel region, a switching element operated by a scanning signal from the gate signal line and a drain signal line from the drain signal line via this switching element are formed. A pixel electrode to which a video signal is supplied and a counter electrode which is connected to a counter voltage signal line and generates an electric field between the pixel electrode and the pixel electrode are overlapped with the drain signal line through an insulating layer. And a counter voltage signal line formed by being overlapped with the gate signal line via an insulating layer, and formed at the connection portion of the counter electrode with the counter voltage signal line. Has a part, is characterized in that the drain signal line is positioned between the branch portion.

[0023]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a liquid crystal display device according to the present invention will be described below with reference to the drawings. Example 1. << Overall Configuration >> FIG. 2 is a block diagram showing an embodiment of the liquid crystal display device according to the present invention. The figure shows an equivalent circuit, which corresponds to the actual geometrical arrangement.

In FIG. 2, there is a pair of transparent substrates SUB1 and SUB2 arranged to face each other with a liquid crystal interposed therebetween, and the liquid crystal is enclosed by a sealing material SL which also fixes one transparent substrate SUB1 to the other transparent substrate SUB2. ing.

On the liquid crystal side surface of the one transparent substrate SUB1 surrounded by the seal material SL, the gate signal lines GL extending in the x direction and juxtaposed in the y direction and the x extending in the y direction are provided. A drain signal line DL is formed side by side in the direction.

Each gate signal line GL and each drain signal line D
The region surrounded by L and L constitutes a pixel region, and the matrix-shaped aggregate of these pixel regions is the liquid crystal display unit A.
It constitutes R.

In each pixel region, a thin film transistor TFT which is operated by a scanning signal from the gate signal line GL on one side and a pixel electrode to which a video signal from the drain signal line DL on one side is supplied via the thin film transistor TFT. PX is formed.

This pixel electrode PX is the other transparent substrate SU.
An electric field is generated between the counter electrode CT (not shown) commonly formed in each pixel region on the surface of B2 on the liquid crystal side, and the light transmittance of the liquid crystal is controlled by this electric field.

One end of each of the gate signal lines GL extends beyond the sealing material SL, and the extended end constitutes a terminal to which the output terminal of the vertical scanning drive circuit V is connected. . Further, a signal from a printed circuit board arranged outside the liquid crystal display panel is inputted to an input terminal of the vertical scanning drive circuit V.

The vertical scanning drive circuit V comprises a plurality of semiconductor devices, a plurality of gate signal lines adjacent to each other are grouped, and one semiconductor device is applied to each of these groups. There is.

Similarly, one end of each of the drain signal lines DL extends beyond the sealing material SL, and the extended end constitutes a terminal to which the output terminal of the video signal driving circuit He is connected. Has become. Further, a signal from a printed circuit board arranged outside the liquid crystal display panel is input to the input terminal of the video signal drive circuit He.

The video signal driving circuit He is also composed of a plurality of semiconductor devices, and a plurality of drain signal lines adjacent to each other are grouped, and one semiconductor device is assigned to each of these groups. ing.

One of the gate signal lines GL is sequentially selected by a scanning signal from the vertical scanning drive circuit V.

A video signal is supplied to each of the drain signal lines DL by a video signal drive circuit He at the timing of selecting the gate signal line GL.

In the above-described embodiment, the vertical scanning drive circuit V and the video signal drive circuit He are the transparent substrate SUB1.
1 shows a semiconductor device mounted on a substrate (COG system), for example, a so-called tape carrier system (T) which is connected across the transparent substrate SUB1 and the printed circuit board.
(CP method) semiconductor device, and when the semiconductor layer of the thin film transistor TFT is made of polycrystalline silicon (p-Si), the semiconductor element made of polycrystalline silicon is provided on the surface of the transparent substrate SUB1. It may be formed with a layer.

<< Structure of Pixels on Transparent Substrate SUB1 Side >> FIG.
FIG. 6A is a plan view showing an example of a pixel region on the transparent substrate SUB1 side. Further, FIG. 1 (b) is shown in FIG. 1 (a).
1 is a cross-sectional view taken along line bb in FIG. 1, and FIG. 1C is a cross-sectional view taken along line cc in FIG.

In FIG. 1, a pair of gate signal lines GL extending in the x direction and arranged side by side in the y direction are first formed on the surface of the transparent substrate SUB1 on the liquid crystal side.

These gate signal lines GL surround a rectangular region together with a pair of drain signal lines DL which will be described later, and this region is configured as a pixel region.

An insulating film GI made of, for example, SiN is formed on the surface of the transparent substrate SUB1 on which the gate signal lines GL have been formed as described above so as to cover the gate signal lines GL as well.

The insulating film GI functions as an interlayer insulating film for the gate signal line GL in the formation region of the drain signal line DL described later, and functions as the gate insulation film in the formation region of the thin film transistor TFT described later. In the formation area of the capacitive element, which will be described later, it has a function as a dielectric film.

On the surface of the insulating film GI,
A semiconductor layer AS made of, for example, amorphous Si is formed so as to overlap a part of the gate signal line GL.

This semiconductor layer AS is a thin film transistor T.
By forming the drain electrode SD1 and the source electrode SD2 on the upper surface of the FT, the MIS having the inverted stagger structure in which a part of the gate signal line GL is used as the gate electrode
A (metal insulator semiconductor) type transistor can be configured.

Here, the drain electrode SD1 and the source electrode SD2 are formed at the same time when the drain signal line DL is formed.

That is, the drain signal line DL extending in the y direction and arranged in parallel in the x direction is formed, and a part of the drain signal line DL extends to the upper surface of the semiconductor layer AS to form the drain electrode SD.
1 is formed, and the source electrode SD2 is formed apart from the drain electrode SD1 by the channel length of the thin film transistor TFT.

The source electrode SD2 extends slightly from the surface of the semiconductor layer AS to the upper surface of the insulating film GI on the pixel region side, and a contact portion CN for connecting to a pixel electrode PX described later is formed. .

On the surface of the transparent substrate SUB1 on which the thin film transistor TFT, the drain signal line DL, the drain electrode SD1 and the source electrode SD2 are thus formed, a protective film PAS made of, for example, SiN and an organic material layer such as a resin material are formed. A sequential laminated body of the protective film OPAS is formed. These protective films PAS and OPAS are layers for avoiding direct contact with the liquid crystal of the thin film transistor TFT, and prevent the characteristic deterioration of the thin film transistor.

Here, the reason why the protective film OPAS made of an organic material layer is used as the protective film is to reduce the dielectric constant of the protective film itself.

The pixel electrode PX is formed on the upper surface of the protective film O-PAS.
Are formed. This pixel electrode PX is, for example, ITO.
(Indium-Tin-Oxide) film is formed of a translucent conductive film. As the pixel electrode PX, the ITZO (I
ndium Tin Zinc Oxide), IZO (Indium Zinc Oxide), S
It may be a material such as nO ₂ (tin oxide), In ₂ O ₃ (indium oxide), or the like.

This pixel electrode PX is a thin film transistor T.
It is formed so as to avoid the FT formation region and occupy most of the pixel region. In this embodiment, the pixel electrode P
Each side of the X parallel to the drain signal line DL is formed so as to be overlapped with the drain signal line DL, and is formed separately from the pixel electrodes PX of other pixel regions adjacent to each other in the x direction. There is. Since the protective film O-PAS made of an organic material is used as the protective film, the drain signal line D
It is possible to avoid the parasitic capacitance generated between L and the pixel electrode PX.

Then, in a part of the pixel electrode PX, the source electrode SD2 of the thin film transistor TFT is provided through a contact hole penetrating the protective films O-PAS and PAS.
It is electrically connected to the (contact portion CN).

Further, the pixel electrode PX is a gate signal line G for driving the thin film transistor TFT connected thereto.
It extends up to another adjacent gate signal line GL different from L and forms a portion overlapping with the other gate signal line GL. In this portion, the pixel electrode PX
Of the protective film O-PAS, the protective film PAS, and the insulating film GI as a dielectric film between the gate and another gate signal line GL.
dd is formed.

The capacitive element Cadd has a function of storing the video signal supplied to the pixel electrode PX for a relatively long time, for example.

Then, an alignment film AL is formed on the upper surface of the transparent substrate SUB1 on which the pixel electrodes PX are formed so as to cover the pixel electrodes PX as well. The alignment film AL is a film that directly contacts the liquid crystal, and the rubbing formed on the surface of the alignment film AL determines the initial alignment direction of the molecules of the liquid crystal.

<< Structure of Pixels on Transparent Substrate SUB2 Side >> A black matrix BM is first formed on the surface of the transparent substrate SUB2 facing the transparent substrate SUB1 with a liquid crystal therebetween on the liquid crystal side.

The black matrix BM extends in the x direction, is arranged in parallel in the y direction, and is formed so as to sufficiently cover the gate signal line GL.

The black matrix BM is formed so as to improve the display contrast and sufficiently covers the thin film transistor TFT on the transparent substrate SUB1 side, and prevents the external light from illuminating the thin film transistor TFT. It is designed to avoid the deterioration of characteristics.

In this embodiment, the drain signal line DL
The reason why the black matrix BM is not formed so as to cover the above is that the drain signal line DL itself has the function of the black matrix.

Further, the black matrix BM covering the gate signal line GL in this way is a pattern having a triangular convex portion BMP whose extending end forms an acute angle on each side parallel to the gate signal line GL. Has been formed.

The tip of this convex portion BMP is formed so as to coincide with the central axis of the drain signal line DL.

That is, this convex portion BMP is the transparent substrate SU.
It functions as a positioning mark for arranging the transparent substrate SUB2 with respect to B1 without displacement in the x direction.

A color filter CF described later is a transparent substrate S.
This is because they can be arranged in the respective pixel areas on the UB1 side without being positioned.

A color filter CF is formed on the surface of the transparent substrate SUB2 on which the black matrix BM is formed so as to cover the black matrix BM.

The color filter CF is composed of filters of respective colors of red (R), green (G) and blue (B), and y
For example, a red (R) filter is commonly formed in each pixel region group arranged in parallel in the direction, and a green (G) color and a blue (B) color are commonly shared by the pixel region groups that are sequentially adjacent to the pixel region group in the x direction. )color,
They are formed in an array such as red (R) color ....

Therefore, the boundary between the adjacent color filters CF having different colors is located on the drain signal line DL.

A transparent conductive film made of, for example, an ITO film is formed on the surface of the transparent substrate CF on which the color filter CF is formed so as to cover the color filter CF. A common counter electrode CT is formed.

An alignment film AL is formed on the surface of the counter electrode CT, and the alignment film AL is a film that directly contacts the liquid crystal. The rubbing formed on the surface determines the initial alignment direction of the molecules of the liquid crystal. It is like this.

In the liquid crystal display device configured as described above, the alignment of the transparent substrate SUB2 with respect to the transparent substrate SUB1 is performed by the protrusion BMP of the black matrix BM and the drain signal line DL, so that it can be performed extremely accurately. .

In this case, displacement in the x direction can be avoided and displacement between the pixel region on the transparent substrate SUB1 side and the corresponding color filter CF can be eliminated.

Example 2. In the above-described embodiment, the convex portion BM formed on a part of the side of the opening of the black matrix BM.
Although P has a triangular shape, it is needless to say that it is not limited to this shape and may have a shape as shown in FIGS. 3 (a) to 3 (i), for example. In this case, the shape of the protrusion is the extension end (tip) extending in the y direction.
A shape that points to one point is preferable. This is because it is possible to easily confirm at which position in the width of the drain signal line DL the one point is located. Further, the modification shown in this embodiment can be similarly applied to the embodiment described later.

Example 3. Further, the convex portion BMP formed on the black matrix BM shown in the first embodiment is shown in FIG.
As shown in FIG. 4, it is formed for each pixel.
It goes without saying that they may be formed for each of a plurality of pixels as shown in (b) to (d).

Further, as shown in FIG. 4E, it may be formed for each pixel in charge of a specific color. In this case, by forming each pixel in charge of green (G), which has a relatively high transmittance, the effect of balancing the amount of transmitted light with other colors is achieved. Further, the modified example shown in this embodiment can be applied to the embodiment described later.

Example 4. FIG. 5 is a constitutional view showing another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG. 1 (a).

In this embodiment, the black matrix BM
The convex portion BMP formed at is positioned so as to face the source electrode SD2 of the thin film transistor TFT. Even in this case, the same effect as that of the first embodiment can be obtained.

Example 5. FIG. 6 is a constitutional view showing another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG. 1 (a).

In this embodiment, the black matrix BM
The convex portion BMP formed at is positioned so as to face the convex portion GLP formed at the gate signal line GL.

Example 6. FIG. 7 is a constitutional view showing another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG. 1 (a).

In this embodiment, for example, a square visible material layer MK1 is formed in the pixel region on the transparent substrate SUB1 side, and at the same time as the black matrix BM is formed in the pixel region on the transparent substrate SUB2 side. The material layer MK2 is positioned so as to face the material layer MK1.

In this case, it is preferable that the material layer MK1 and the material layer MK2 are not completely overlapped, but formed so that the position of the material layer MK2 can be recognized with respect to the material layer MK1.

Example 7. FIG. 8 shows another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG. 1 (a).

In this embodiment, the black matrix BM formed on the transparent substrate SUB2 side is formed so as to sufficiently cover the thin film transistor TFT formed on the transparent substrate SUB1 side. The convex portion BMP is formed so as to face the arranged drain signal line DL.

Example 8. FIG. 9 shows another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG.

The structure different from the case of FIG. 7 is that not only the convex portion BMP is formed in the black matrix BM so as to face the drain signal line DL, but also the black matrix BM is formed so as to face the gate signal line GL. The raised convex portion BMP is also formed.

In this case, since the gate signal line GL is formed to have a line width larger than that of the drain signal line DL,
A pair of convex portions BMP facing the respective longitudinal sides
It is composed of. As a result, the accuracy can be improved even in the y-direction alignment in the drawing.

Example 9. FIG. 10 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention. This figure is a diagram showing a configuration of a pixel referred to as a horizontal electric field system, while a pixel according to each of the above-described embodiments is referred to as a so-called vertical electric field system.

In the liquid crystal display device called the horizontal electric field system, the pixel electrode PX and the pixel electrode PX are provided in the pixel region on the liquid crystal side surface of one transparent substrate SUB1 of each transparent substrate which is opposed to each other with the liquid crystal interposed therebetween. Counter electrode CT that generates an electric field between
And the liquid crystal behaves by a component of the electric field that is substantially parallel to the transparent substrate SUB1.

The pixel electrode PX is a thin film transistor TFT operated by a scanning signal from the gate signal line GL.
The video signal is supplied from the drain signal line DL via the same as in the pixel configuration shown in FIG.

Here, the pixel electrode PX and the counter electrode CT are each formed as a strip-shaped pattern extending in one direction, and two or more of these electrodes are formed and arranged alternately.

The counter electrode CT is the drain signal line DL.
Is formed on the upper surface of the insulating film formed so as to cover the drain signal line, and the central axis of the drain signal line is substantially aligned with the drain signal line and has a width larger than the width of the drain signal line. ing.

The line of electric force from the drain signal line DL facilitates termination to the counter electrode CT above it, and the pixel electrode PX
This is to prevent the terminal from being terminated. This is because if the line of electric force terminates at the pixel electrode PX, it becomes noise.

In such a structure, the transparent substrate SUB
In the black matrix BM formed on the second side, the convex portion BMP is formed so as to face the one pixel electrode PX.

Example 10. FIG. 11 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention and corresponds to FIG.

The configuration different from that of FIG. 10 is that the black matrix BM formed on the transparent substrate SUB2 side is provided with the convex portion BMP so as to face one counter electrode CT.

Example 11. FIG. 12 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention and corresponds to FIG.

The configuration different from that of FIG. 11 is that the black matrix BM formed on the transparent substrate SUB2 side is opposed to one side of one pixel electrode PX.
And a convex portion BMP facing the other side of the one counter electrode CT.

Example 12. FIG. 13 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention and corresponds to FIG.

The configuration different from that of FIG. 12 is that the black matrix BM formed on the transparent substrate SUB2 side is provided with a convex portion BM which is opposed to one side of one pixel electrode PX.
P and a convex portion BMP that is opposed to one side of one counter electrode CT are formed.

Example 13 FIG. 14 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention and corresponds to FIG.

The structure different from that of FIG. 13 is that the black matrix BM formed on the transparent substrate SUB2 side is formed with a convex portion BMP so as to face the drain signal line DL.

Example 14. FIG. 15 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.
It is a diagram corresponding to (a).

A different structure from the case of FIG. 1A is that the source electrode SD2 of the thin film transistor TFT extends in the pixel region, and the extending end is part of the gate signal line GL on the other side. The second capacitive element Cadd2 is formed by being overlapped.

In this case, the overlapping area of the extending end of the second capacitive element Cadd2 and the gate signal line GL on the other side is formed between the pixel electrode PX and the gate signal line GL on the other side. It is set smaller than the overlapping area of the pixel electrode PX of the capacitive element Cadd and the gate signal line GL.

Example 15. 16 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention and corresponds to FIG.

The structure different from that of FIG. 15 is different from that of the source electrode SD2 of the thin film transistor TFT to the second electrode.
The bent portion is formed so as to have a portion parallel to the gate signal line GL in the extending portion reaching the electrode of the capacitive element Cadd2.

In this case, it is desirable that the extending portion of the portion which is parallel to the gate signal line GL is separated from the gate signal line GL by a width equal to or larger than the width of the gate signal line. This is for reducing the parasitic capacitance Cgs of the thin film transistor TFT.

Example 16. FIG. 17 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention and corresponds to FIG.

The structure different from the case of FIG. 15 is that when the second capacitive element Cadd2 to be one electrode is formed by the extended end of the source electrode SD2 of the thin film transistor TFT, the other gate electrode is used. Line GL
Is to provide a dedicated electrode formed by protruding a part thereof.

In this case, the dedicated electrode is the gate signal line G
It has a hook shape with a part extending parallel to L,
The one electrode on the side of the source electrode SD2 that overlaps with this portion is formed so as to project from the side of the dedicated electrode adjacent to the pixel region on the pixel region side.

According to such a configuration, for example, FIG.
As shown in, when the formation of the source electrode SD2 with respect to the gate signal line GL and the semiconductor layer AS deviates upward in the y direction in the drawing, the capacitance value of the second capacitance element Cadd2 decreases. However, along with this, the parasitic capacitance Cgs of the thin film transistor TFT also decreases (FIG. 1).
8 (b)). Similarly, the formation of the source electrode SD2 is y in the figure.
If a shift in the downward direction occurs, the second capacitive element Cad
Although the capacitance value of d2 increases, the parasitic capacitance Cgs of the thin film transistor TFT also increases accordingly (FIG. 18C).

In the liquid crystal display device having such a structure, even if the drain signal line DL (source electrode SD1) is formed with a shift in the y direction with respect to the gate signal line GL, the parasitic capacitance of the thin film transistor TFT is mainly present. It becomes possible to prevent the fluctuation of the pixel constant.

Such effects can be obtained not only by the configuration shown in FIG. 17 but also by the configurations shown in FIGS. 19A to 19F, for example.

Here, in FIGS. 19C and 19D, the gate signal line GL is not provided with an extending portion and a part of the original gate signal line GL is used as an electrode, FIG. 19E. In and (f), the gate signal line GL is provided with an opening or a notch. In either case, one capacitance electrode is formed so as to project from a side of the gate signal line GL (including a pattern in which an extension, an opening, and a cutout are formed) on the side of another pixel region adjacent to the pixel region. Is configured as follows.

Further, for the same purpose, for example, as shown in FIG. 20, the pixel electrode PX is formed from the thin film transistor TFT to y.
When extending in the direction, the gate signal line GL is formed with an extending portion having a side in the y direction, and one capacitance electrode is formed so as to overlap with the side of the extending portion, and the same effect is obtained. Can be played.

In this embodiment, the second capacitive element Ca
The dedicated electrode of dd2 is formed on the gate signal line GL.
Although it is connected to the gate signal line GL
The capacitance signal line is not limited to the above, and may be a capacitance signal line to which a constant voltage is applied.

In this embodiment, the pixel region of the liquid crystal display device has been described as an example, but the present invention is not necessarily limited to the liquid crystal display device, and may be applied to an image display device using an organic EL, an inorganic EL or the like. It is applicable.

Example 17 FIG. 21A shows the configuration of the scanning signal drive circuit V or the video signal drive circuit He as T
When the CP method is used, it is a diagram showing a cross section of a connecting portion between a wiring terminal on the surface of the transparent substrate SUB1 and an output terminal of the TCP type semiconductor device TCP.

As is clear from the figure, the transparent substrate SUB
A pillar-shaped protrusion SP is formed on the substrate 1. The protrusion SP supports the semiconductor device TCP, and the conductive sheet ACF is interposed therebetween.

The conductive sheet ACF is a resin sheet in which a large number of conductive beads are scattered, and electrically connects the wiring terminals on the surface of the transparent substrate SUB1 and the output terminals of the semiconductor device TCP through the conductive beads. .

The protrusion SP formed on the surface of the transparent substrate SUB1 is, as shown in FIG. 21 (b) which is a plan view,
It is formed on both sides of the wiring terminal on the surface of the transparent substrate SUB1 and is formed with a plurality of island-shaped patterns arranged in parallel in the extending direction of the wiring terminal.

By forming in this way, the transparent substrate SUB1 and the semiconductor device T via the conductive sheet ACF.
Adhesive force with CP can be controlled, for example, transparent substrate SUB1
On the other hand, when the semiconductor device TCP is bonded and then must be peeled off again, the work can be facilitated, and the conductive sheet ACF can be peeled off easily.

Here, when the projection SP is formed in a line shape so as to extend along the wiring terminal without being formed in an island shape, there is no escape place for the conductive sheet ACF and the conductive sheet ACF rises, resulting in swelling. This results in the disadvantage of increased contact resistance.

The projections SP formed in an island shape are
For example, as shown in FIG. 21C, it goes without saying that they may be arranged alternately. In this case, the conductive beads in the conductive sheet ACF are uniformly arranged, and the reliability of electrical connection can be improved.

Example 18. FIG. 22A shows the configuration of the scanning signal drive circuit V or the video signal drive circuit He as C.
When the OG method is used, it is a view showing a cross section of a connection portion between the wiring terminal on the transparent substrate SUB1 surface and the output terminal of the COG method semiconductor device COG, and corresponds to FIG.

FIG. 22B shows a plan view, and pillar-shaped projections are arranged so as to sandwich each bump of the semiconductor device therebetween. In addition, FIG. 22 (c) or FIG.
2 (d), pillar-shaped projections are arranged in the vicinity of each bump in the three directions or four directions with respect to each bump of the semiconductor device COG. In order to reduce the stress concentration on the bumps, it is desirable to provide a large number of protrusions around the bumps in this way. However, the distance between the protrusions in this case is about 2 times that of the conductive beads in the conductive sheet ACF.
It is desirable to make the value equivalent to twice or more.

In this case as well, similarly to the above-mentioned embodiment, the pillar-shaped projection SP is formed on the transparent substrate SUB1, and the projection SP supports the semiconductor device COG, and the conductive sheet ACF is interposed therebetween. It is like this.

With this structure, the flow of the conductive sheet ACF at the time of thermocompression bonding can be suppressed, and the expansion and contraction between the semiconductor device COG and the transparent substrate SUB1 (particularly when it is composed of a glass substrate). You will be able to reduce the difference.

When the pillar-shaped protrusion SP is not formed, the semiconductor device COG and the transparent substrate SUB during thermocompression bonding are formed.
The transparent substrate SUB1 is distorted due to the difference in thermal expansion of No. 1 and the photoelastic effect causes light leakage in the periphery of the semiconductor device COG. The present embodiment can eliminate such inconvenience.

Example 19 FIG. 23A is a sectional view showing another embodiment of the liquid crystal display device according to the present invention. In the figure, as shown in the above-described embodiment, when the pillar-shaped projection SP is formed in the mounting region of the semiconductor layer device, the projection SP is formed in the liquid crystal display unit AR as the transparent substrate SUB1 and the transparent substrate SUB2. It is configured to be formed at the same time as the spacer, which is a pillar-shaped projection SP1 for ensuring a gap (corresponding to the layer thickness of the liquid crystal) between them.

With this structure, the pillar-shaped projection SP formed in the mounting region of the semiconductor layer device can be formed without increasing the number of steps.

Example 20. FIG. 23B is a sectional view showing another embodiment of the liquid crystal display device according to the present invention.
It is a diagram corresponding to (a).

23A is different from that shown in FIG. 23A in that a color filter CF is provided in the liquid crystal display portion AR on the liquid crystal side surface of the transparent substrate SUB1 and a pillar-shaped projection is provided on the upper surface of the color filter CF. This is in forming a spacer made of SP1.

By forming the color filter CF on the side of the transparent substrate SUB1 on which the thin film transistor TFT and the like are formed, the alignment margin with respect to the transparent substrate SUB2 is significantly improved, and the aperture ratio of the pixel can be increased to 100 dpi or more. It becomes easy to achieve high definition.

As a result, the number of gate signal lines GL or drain signal lines DL is increased, and the semiconductor devices connected to these are also repaired more frequently. Therefore, it is extremely effective to form the pillar-shaped projection SP1 between the semiconductor device and the transparent substrate SUB1.

Example 21. In this embodiment, the transparent substrate SU
An input signal is supplied to a plurality of semiconductor devices mounted on B1 via a flexible printed circuit board.
This is based on the premise that the transparent substrate SUB1 is provided with a data transfer wiring for transferring data between the semiconductor devices forming the scanning signal drive circuit V or the video signal drive circuit He.

That is, in such a structure, as shown in FIG. 24A, for example, the terminal portion of the flexible printed circuit board FPC and the terminal portion of the transparent substrate SUB1 are brought into surface contact with each other through the conductive sheet to be connected. The columnar projections are formed between them so that they are physically separated from each other.

The parasitic capacitance between the wiring layer of the flexible printed circuit board FPC and the data transfer wiring DTS of the transparent substrate SUB1 is reduced, thereby suppressing the waveform distortion of the signal transmitted to the data transfer wiring DTS. is there.

FIG. 24 (b) is a sectional view taken along line bb of FIG. 24 (a). The data transfer wiring DTS is provided at the connection point of the flexible printed circuit board FPC of the transparent substrate SUB1.
Are formed, and a plurality of pillar-shaped projections SP are formed at the connection points. The transparent substrate SUB1 is connected to the flexible printed circuit board FPS by a conductive sheet interposed therebetween.

Further, while the projections SP shown in FIG. 24 (b) are shown to be scattered, FIG.
(C) shows the case where the strip-shaped projections SP are arranged in parallel, and the same effect is obtained in this case as well.

It is desirable that the pillar-shaped projections SP formed between the transparent substrate SUB1 and the flexible substrate FPC are arranged in parallel along the sides of the transparent substrate SUB1.

Flexible substrate FPC is replaced with transparent substrate SUB
When bent to the 1st side, the wiring layer formed on the flexible substrate FPC may rub against the corners of the transparent substrate SUB1 to cause disconnection.
The flexible substrate FPC is replaced by the transparent substrate SUB1
This is for preventing the rubbing by floating it.

It is needless to say that in such a structure, the corners of the transparent substrate SUB1 may be chamfered together so as to obtain a further effect.

Example 22. FIG. 25A is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention. Further, FIG. 25B is a cross-sectional view taken along the line bb of FIG.

FIG. 25 (a) is a diagram corresponding to FIG. 10. The structure different from that of FIG. 10 has, for example, a protective film which overlaps a part of the two pixel electrodes which are connected to each other. The removal region (opening) is formed in the O-PAS.

With such a configuration, when an electrical short circuit occurs between the drain signal line DL and the pixel electrode PX as shown in the figure due to the remaining foreign matter, the pixel electrode PX is disconnected from the drain signal line DL and , Counter electrode CT
And the same electric potential.

As described above, the pixel electrode PX and the counter electrode C
By providing an opening in a part of the protective film OPAS in the overlapping region with T, the pixel electrode PX and the counter electrode CT can be connected by irradiating this part with laser light.

The reason why the opening is formed in advance in the protective film OPAS is that when the protective film OPAS made of an organic material is directly irradiated with laser light, a large hole is formed by the gas generated at that time and the pixel electrode PX and the counter electrode are formed. This is because reliable connection with C cannot be achieved.

Of the pixel electrode PX between the source electrode SD2 of the thin film transistor TFT and the opening,
Laser cutting is performed on the side farther from the source electrode SD2 with respect to the short-circuit generating portion.

Example 23. FIG. 26 (a) is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention and corresponds to FIG. 25 (a). In addition, FIG. 26B is a cross-sectional view taken along the line bb of FIG.

In FIG. 26A, the pixel electrode PX of one pixel and the pixel electrode of another pixel adjacent to the one pixel in the y direction are overlapped with each other. There is.

That is, the pixel electrode PX of one pixel is provided with a pixel electrode PX _P (same as the counter electrode CT) on the protective film OPAS through a through hole formed penetrating the protective film OPAS and the protective film PAS in the upper layer. Made of material).

On the other hand, the pixel electrode PX of another pixel is extended, for example, from the source electrode SD2 of the thin film transistor TFT, and the extension end thereof is the pixel electrode PX of the one pixel.
The tip of _P is overlapped with the protective film OPAS and the protective film PAS.

As shown in the figure, when foreign matter remains between the drain signal line DL and the pixel electrode PX adjacent to it in one pixel and the drain signal line DL and the pixel electrode PX are short-circuited, Before and after the portion of the pixel electrode PX where the foreign matter exists, the pixel electrode PX is cut by, for example, irradiation with laser light, and the connection with the pixel electrode PX of another adjacent pixel which overlaps with the pixel electrode PX _P is irradiated with laser light. Try to do it.

When no video signal is supplied to the pixel electrode PX, that portion is relatively easily visible, and even if it is the video signal of another adjacent pixel, it is supplied.

FIG. 26C is a diagram corresponding to FIG. 26B and shows a protective film OPA at the tip of the pixel electrode PX _P.
A hole is formed in S to reduce the layer thickness of the intervening layer between the tip and the pixel electrode PX of another pixel adjacent thereto. This is to facilitate connection by irradiation with laser light.

Example 24. FIG. 27A is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention and corresponds to FIG. 26A. 27B is a sectional view taken along the line bb of FIG. 27A, and FIG. 27C is a sectional view taken along the line cc of FIG. 27A.

26A is different from that shown in FIG. 26A in that the pixel electrode PX of the pixel electrode PX of one pixel formed in a substantial pixel region is the same as the counter electrode CT on the upper surface of the protective film OPAS. It is formed of the material of. As a result, the effect of lower voltage driving can be achieved.

Further, when the counter electrode CT is made of a translucent material such as ITO, there is an effect that the aperture ratio of the pixel can be improved. Further, the effect shown in the twenty-third embodiment can be directly obtained.

Example 25. FIG. 28 is a constitutional view showing another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG.

FIG. 28 shows the capacitive element C of the pixel electrode PX.
The part that constitutes the electrode of stg, that is, the protective film OPAS
The removal portion of the protective film OPAS is formed in a portion of the portion overlapping the upper counter electrode CT.

Source electrode SD of thin film transistor TFT
When 2 is short-circuited with the gate signal line GL in the lower layer, the pixel electrode P on the side opposite to the source electrode SD2 with respect to the short-circuited portion.
X is cut, and the counter electrode CT and the pixel electrode PX are connected to each other at the removed portion of the protective film OPAS.

Example 26. FIG. 29 is a constitutional view showing another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG. 27 (a).

FIG. 29 has the same structure as FIG. 27 (a). In this case, when the source electrode SD2 of the thin film transistor TFT is short-circuited with the gate signal line GL in the lower layer, the source electrode SD2 and the pixel electrode PX are cut and separated, and the pixel electrode PX of the pixel and the pixel are separated from each other. The connection is made with the pixel electrode PX of another pixel adjacent in the y direction.

Example 27. FIG. 30 is a constitutional view showing another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG.

FIG. 30 shows the gate signal line GL in the counter electrode CT formed so as to overlap the drain signal line DL.
In order to be completely separated from the counter voltage signal line CL superimposed on the counter voltage signal line CL, a branch portion is formed at a position close to the counter voltage signal line CL, and the drain signal line DL is run between the branch portions. I am trying to do it.

When a short circuit occurs between the drain signal line DL and the counter electrode CT superimposed on the drain signal line DL, the drain signal line DL becomes the reference potential (common potential), resulting in a drain signal line defect.

Therefore, the branched portion of the counter electrode CT is cut by, for example, a laser beam, and the counter electrode CT in which the short circuit has occurred is generated.
Is separated from the counter voltage signal line CL.

In this case, it is desirable to leave the protective film OPAS. This is to prevent the conductive layer cut by the gas emission of the protective film OPAS due to the laser light irradiation from being widely scattered and to prevent conduction at the cut portion.

Although the branch portion of the counter electrode CT is formed by forming a rectangular opening in the counter electrode CT, for example, as shown in FIG. 31 with respect to the drain signal line DL.
It is preferable to form the structure as shown in FIG. 31B rather than the structure as shown in FIG.

That is, as shown in FIG. 31 (b), the branch portion formed by the opening formed in the counter electrode CT exists in a line shape that crosses the counter electrode CT.

This is based on the fact that the scanning control of the laser light requires high accuracy in order to cut only the counter electrode CT without cutting the drain signal line DL. Scanning of the transparent substrate SUB1 with the laser light need only be performed in the x direction, and no movement in the y direction is required. Therefore, control can be performed with high positional accuracy.

Example 28. FIG. 32 is a constitutional view showing another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG.

Although the configuration is almost the same as that of the case of FIG. 30, in this case, when a short circuit occurs between the gate signal line GL and the counter voltage signal line CL superimposed on the gate signal line GL, Each counter electrode CT in each pixel region in the vertical direction with the gate signal line GL as a boundary is connected to the counter voltage signal line CL.
I'm trying to separate it from.

Example 29. FIG. 33 is a constitutional view showing another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG. 28.

The structure different from that of FIG. 28 is that a part of the pixel electrode PX is provided between the gate signal line GL and the capacitive element Cad.
to have d. Incidentally, in FIG. 33, a part of the pixel electrode PX is formed between the counter electrode CT and the capacitive element Cst.
It also has g.

In this case, when a disconnection occurs in the pixel electrode PX, the region for connecting the pixel electrode PX in the vicinity of the capacitive element Cadd to the counter electrode CT is formed as the removal region of the protective film OPAS.

Pixel electrode P connected to the capacitive element Cadd
When X is broken, the pixel electrode PX becomes floating and approaches the potential of the scanning signal applied to the gate signal line GL, which causes flickering in the pixel.

For this reason, the pixel electrode PX in which the disconnection is positively generated is connected to the counter electrode CT.

Example 30. FIG. 34 is a constitutional view showing another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG. A different structure from that of FIG. 29 is that one end of the pixel electrode PX forms a capacitive element Cadd between the pixel electrode PX and the gate signal line GL.

In this case, when a short circuit occurs between the pixel electrode PX and the source electrode SD2 of the thin film transistor TFT, the pixel electrode PX is connected to the source electrode SD2 of the thin film transistor TFT of another pixel adjacent in the y direction. It is like this.

Example 31. FIG. 35 is a constitutional view showing another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG.

When the drain signal line DL is disconnected, each part of the drain signal line DL with the disconnection point in between is connected to the counter electrode CT, and the counter electrode CT is disconnected from the counter voltage signal line CL. There is.

As a result, the counter electrode CT separated from the counter voltage signal line CL loses its function and
It can be a conductive layer for connecting the drain signal line DL.

Example 32. FIG. 36 is a constitutional view showing another embodiment of the liquid crystal display device according to the present invention and corresponds to FIG.

A structure different from that of FIG. 35 is that a wide portion is provided in a part of the drain signal line DL to facilitate connection with the counter electrode CT.

The drain signal line DL having a relatively small width is formed with the above-described wide portion to facilitate repair.

[0185]

As is apparent from the above description,
According to the image display device of the present invention, it is possible to accurately align one substrate with the other substrate.

Further, it is possible to avoid variations in the parasitic capacitance value of the thin film transistor.

Furthermore, a short circuit between the signal line and the electrode, a disconnection of the signal line, or the like can be repaired by a simple operation.

[Brief description of drawings]

FIG. 1 is a configuration diagram showing an embodiment of a pixel of a liquid crystal display device according to the present invention.

FIG. 2 is a configuration diagram showing an embodiment of a liquid crystal display device according to the present invention.

FIG. 3 is a view showing various patterns of convex portions formed on a black matrix of the liquid crystal display device according to the present invention.

FIG. 4 is a view showing various arrangement modes of convex portions formed on a black matrix of the liquid crystal display device according to the present invention.

FIG. 5 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 6 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 7 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 8 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 9 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 10 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 11 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 12 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 13 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 14 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 15 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 16 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 17 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 18 is an explanatory diagram showing an effect of the liquid crystal display device according to the present invention.

FIG. 19 is a main part configuration diagram showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 20 is a main part configuration diagram showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 21 is a configuration diagram showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 22 is a configuration diagram showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 23 is a cross-sectional view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 24 is a configuration diagram showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 25 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 26 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 27 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 28 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 29 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 30 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 31 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 32 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 33 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 34 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 35 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

FIG. 36 is a plan view showing another embodiment of the pixel of the liquid crystal display device according to the present invention.

[Explanation of symbols]

SUB1, SUB2 ... Transparent substrate, GL ... Gate signal line,
DL ... Drain signal line, TFT ... Thin film transistor, C
add, Cstg ... Capacitance element, PX ... Pixel electrode, CT ...
Counter electrode, BM ... Black matrix, BMP ... Black matrix convex portion, V ... Scan signal driving circuit, He ... Video signal driving circuit, SP ... Column-shaped projection portion.

Continuation of front page (51) Int.Cl. ⁷ Identification code FI theme code (reference) G09F 9/00 348 G09F 9/00 348L 348Z 9/30 349 9/30 349C 9/35 9/35 (72) Inventor Kazuhiko Yanagawa 3300 Hayano, Mobara-shi, Chiba F-term in the Hitachi, Ltd. display group (reference) 2H090 HA02 HB03X JB01 JC02 KA04 LA01 2H091 FA35Y FD03 GA02 LA30 2H092 GA40 GA51 GA59 GA60 HA06 JA24 JB23 JB52 NA12 NA43 DB02 BA23 BA02 BA03 4A09A4 EC03 EC10 ED15 FA01 FA02 HA08 5G435 AA17 BB12 CC09 EE32 EE36 EE37 EE42 EE47 FF13 LL06 LL07 LL08

Claims (12)

[Claims] 1. A plurality of gate signal lines juxtaposed to each other and a plurality of gate signal lines juxtaposed to these gate signal lines on a liquid crystal side surface of one of the substrates opposed to each other with a liquid crystal interposed therebetween. Each region surrounded by the drain signal line of is a pixel region, and in each pixel region, a switching element operated by a scanning signal from the gate signal line and a video signal from the drain signal line are passed through this switching element. A pixel electrode to be supplied is provided, and a black matrix is formed on the liquid crystal side surface of the other substrate of the respective substrates so as to face the gate signal line, and the black matrix is formed to be substantially the same as the gate signal line of the black matrix. A liquid crystal display device, wherein a convex portion or a concave portion is formed at a portion facing the drain signal line on at least one of the parallel sides. 2. The convex portions or the concave portions formed on the black matrix are formed at every plural pixel regions formed along the running direction of the drain signal line and along the running direction of the gate signal line. The liquid crystal display device according to claim 1, wherein a plurality of pixels are formed in each of the formed pixel regions. 3. A plurality of gate signal lines juxtaposed to each other and a plurality of gate signal lines juxtaposed to these gate signal lines on a liquid crystal side surface of one of the substrates opposed to each other with a liquid crystal interposed therebetween. Each region surrounded by the drain signal line of is a pixel region, and in each pixel region, a switching element having a gate electrode connected to the gate signal line and a drain signal line connected to the drain electrode of this switching element And a pixel electrode to which the video signal is supplied through a source electrode, and a black matrix is formed on the surface of the other substrate of the substrates on the liquid crystal side so as to face the gate signal line. 2. A liquid crystal display device, wherein a convex portion or a concave portion is formed in a portion facing the source electrode on a side substantially parallel to the gate signal line. 4. A plurality of gate signal lines juxtaposed on the surface of the substrate and a plurality of drain signal lines juxtaposed to intersect these gate signal lines are formed, and each region surrounded by these signal lines. Is a pixel region, and a thin film transistor which operates by a scanning signal from one of the pair of gate signal lines surrounding the pixel region and a video signal from the drain signal line is supplied to the pixel region through the thin film transistor. Display electrodes,
One of the pair of gate signal lines that is connected to the display electrode and surrounds the pixel region and is overlapped with the other gate signal line via an insulating film, and one capacitance electrode of the capacitance element is provided. The electrode is formed by being drawn out from the source electrode of the thin film transistor formed on the one gate signal line, and the capacitance electrode is formed from the side of the other gate signal line on the pixel region side adjacent to the pixel region. An image display device, which is formed so as to project. 5. The other gate signal line has an extending portion on the pixel region side, and the capacitance electrode is formed so as to overlap with the gate signal line that is the extending portion. The image display device according to claim 4. 6. The capacitive element formed in the pixel region is 2
One of the capacitive elements is provided, and the capacitance of the capacitive element formed by projecting the capacitive electrode from the side of the other gate signal line on the pixel area side adjacent to the pixel area is the other capacitive element. The image display device according to claim 4, wherein the image display device has a capacity smaller than that of the image display device. 7. A plurality of gate signal lines juxtaposed on the surface of the substrate and a plurality of drain signal lines juxtaposed to intersect these gate signal lines are formed, and each region surrounded by these signal lines. And a switching element that operates by a scanning signal from the gate signal line in the pixel area, and a display electrode to which a video signal from the drain signal line is supplied via the switching element, and A scanning signal drive circuit including a semiconductor device that supplies a scanning signal to a gate signal line; and a video signal drive circuit that includes a semiconductor device that supplies a video signal to each drain signal line. And at least one circuit of the video signal drive circuit is supported by a pillar-shaped projection formed on the board side, and between the circuit and the board. An image display device, characterized in that the image display device is connected to a corresponding signal line through an arranged anisotropic conductive sheet. 8. The image display device according to claim 7, wherein the semiconductor device is a TCP type semiconductor device. 9. The image display device according to claim 7, wherein the semiconductor device is a COG type semiconductor device. 10. A plurality of gate signal lines juxtaposed to each other and a plurality of gate signal lines juxtaposed to these gate signal lines on a liquid crystal side surface of one of the substrates opposed to each other with a liquid crystal interposed therebetween. Drain signal line is formed, and each region surrounded by these signal lines is defined as a pixel region. In this pixel region, a switching element that operates by a scanning signal from the gate signal line and a drain signal via this switching element are formed. A pixel electrode supplied with a video signal from a line, and a counter electrode connected to a counter voltage signal line and generating an electric field between the pixel electrode and the pixel electrode, the counter electrode via a drain signal line and an insulating layer. Including those to be overlapped, the gate signal line is formed to be connected to the counter voltage signal line formed to be overlapped via the insulating layer,
The counter voltage signal line overlaps with a part of the pixel electrode via an insulating layer, and the insulating layer has a multilayer structure in which at least an upper layer thereof is an organic material layer, and overlaps with the counter voltage signal line. A liquid crystal display device, wherein a part of the pixel electrode has a removed portion of the organic material layer. 11. A plurality of gate signal lines juxtaposed to each other and a plurality of juxtaposed these gate signal lines on a liquid crystal side surface of one of the substrates opposed to each other with a liquid crystal interposed therebetween. Drain signal line is formed, and each region surrounded by these signal lines is defined as a pixel region. In this pixel region, a switching element that operates by a scanning signal from the gate signal line and a drain signal via this switching element are formed. And a pixel electrode to which a video signal from the line is supplied, and a part of the pixel electrode in the pixel region is drawn out from the pixel electrode in the pixel region adjacent to the pixel region along the drain signal line. And a liquid crystal display device, which is overlapped with an insulating layer. 12. A plurality of gate signal lines juxtaposed to each other and a plurality of gate signal lines juxtaposed to the gate signal lines on a liquid crystal side surface of one of the substrates opposed to each other with a liquid crystal interposed therebetween. Drain signal line is formed, and each region surrounded by these signal lines is defined as a pixel region. In this pixel region, a switching element that operates by a scanning signal from the gate signal line and a drain signal via this switching element are formed. A pixel electrode supplied with a video signal from a line, and a counter electrode connected to a counter voltage signal line and generating an electric field between the pixel electrode and the pixel electrode, the counter electrode via a drain signal line and an insulating layer. Including a portion to be overlapped, the gate signal line is formed to be connected to a counter voltage signal line which is formed to be overlapped via an insulating layer, and a connecting portion of the counter electrode with the counter voltage signal line. A liquid crystal display device, characterized in that the liquid crystal display device has a branch portion, and a drain signal line is positioned between the branch portions.