JP2003235437A - Oven unit - Google Patents

Oven unit

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Publication number
JP2003235437A
JP2003235437A JP2002045520A JP2002045520A JP2003235437A JP 2003235437 A JP2003235437 A JP 2003235437A JP 2002045520 A JP2002045520 A JP 2002045520A JP 2002045520 A JP2002045520 A JP 2002045520A JP 2003235437 A JP2003235437 A JP 2003235437A
Authority
JP
Japan
Prior art keywords
heat source
heat
oven
hot plate
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002045520A
Other languages
Japanese (ja)
Other versions
JP3701920B2 (en
Inventor
Keiji Ogawa
啓司 小川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KYUHAN KK
Original Assignee
KYUHAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KYUHAN KK filed Critical KYUHAN KK
Priority to JP2002045520A priority Critical patent/JP3701920B2/en
Publication of JP2003235437A publication Critical patent/JP2003235437A/en
Application granted granted Critical
Publication of JP3701920B2 publication Critical patent/JP3701920B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Baking, Grill, Roasting (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an oven unit capable of uniformly radiating heat all over processed materials so as not cause unevenness in roasting, by improving a heat reserving ratio and radiation efficiency of reflecting members. <P>SOLUTION: In this oven unit, reflection mechanism 10 is so structured that each of the reflecting members 17 attached to outsides of support rods 16 is formed out of a pipe material having higher thermal conductivity and higher thermal diffusivity, when compared with the support rod 16, for the purpose of giving high heat reserving properties and high radiation efficiency to the reflecting member, and heat reserving pipe materials 18 which have a lower specific heat, higher thermal conductivity, and higher thermal diffusivity, when compared with those of the pipe material for the reflecting member, are each inserted into each of inner spaces of the reflecting members 17. Roasting evenness controlling mechanisms each composed of a swinging-type mechanism, rotary-type mechanism, etc., are each positioned on upper heat sources 3 facing the reflecting members 17, so that radiation regions of the upper heat sources 3 are arbitrarily selected. Convection heat control mechanisms each having an adjustable partition structure which is openable, closable, and movable are mounted on both the right and left sides of a heat plate 2, so that heat power given by convection from a lower heat source 4 is finely controlled. A heat source cooling mechanism is installed, so that air is fed from the outside to the inside of an oven 1 through air inlets positioned on the rear side, or on the right and left sides, of the oven 1, and therefore back areas of the upper and lower heat sources are cooled by natural convection. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、製菓、製パン、ピ
ザ等の調理焼成加工等において使用される固定式、トン
ネル式等のガス・電気オーブンの改良に係り、特に熱源
から発生する遠近赤外線を熱板上の生地材等の被加工物
に満遍なく照射し、焼きムラが生ぜず、水分蒸発量を少
なくして表面の焼き色の良好性、内部の柔軟性等が得ら
れるようにし、またメンテナンスが容易なオーブン装置
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement of a fixed type or tunnel type gas / electric oven used in baking and baking of confectionery, bakery, pizza, etc., and particularly far-infrared infrared rays generated from a heat source. Irradiate evenly on the work material such as dough material on the hot plate to prevent uneven baking, reduce the amount of water evaporation and obtain good baking color on the surface, internal flexibility, etc. The present invention relates to an oven device that can be easily maintained.

【0002】[0002]

【従来の技術】従来から、製菓、製パン、ピザ等の調
理、焼成加工には一般的にガスオーブン装置が使用され
ており、例えば本出願人自身が提案した特開平12−1
16305号公報に開示されているように、オーブン窯
内の熱板上方の左右に配した遠赤外線シュバンクバーナ
ー等の上部熱源から発生した遠近赤外線をオーブン窯内
の天井内側面に配した反射機構によって反射させて熱板
上の被加工物に照射し、同時に熱板下方に配置した下部
熱源によって熱板上の被加工物を直接加熱することで、
熱板上のピザ、パン、カステラ、グラタン等の被加工物
を加熱処理するようにしている。この反射部材は例えば
アルミニウム製のパイプ材にて形成し、オーブン窯内の
前後に配置した支持部材相互間に架け渡した支持棒材部
分に挿通支持され、支持棒材を芯材として反射部材を支
持することで二重管状に構成してある。また被加工物に
対する反射の有無、反射率の調整、反射態様等を選定で
きるようにするために、例えば反射が強過ぎたり、反射
の必要がない部位等を設定したりする場合には反射部材
自体を取り外して配置しない等の反射部材の配列形態を
適宜に選定するようにしたり、また反射部材の反射率を
小さくする場合には反射部材自体の外表面を鏡面仕上げ
状態に加工し、逆に反射率を大きくする場合には反射部
材自体の外表面を粗面仕上げ状態に加工する等してい
た。
2. Description of the Related Art Conventionally, a gas oven apparatus has been generally used for cooking and baking confectionery, bread, pizza and the like. For example, JP-A-12-1 proposed by the present applicant.
As disclosed in Japanese Patent No. 16305, a reflection mechanism in which far-infrared rays generated from an upper heat source such as far-infrared ray schwank burners arranged on the left and right above a heating plate in an oven kiln are arranged on an inner surface of a ceiling in the oven kiln. By irradiating the workpiece on the hot plate by reflecting with, and simultaneously heating the workpiece on the hot plate by the lower heat source arranged under the hot plate at the same time,
Workpieces such as pizza, bread, castella, and gratin on a hot plate are heat-treated. This reflecting member is formed of, for example, an aluminum pipe material, and is inserted and supported by a supporting rod portion that is bridged between supporting members arranged in front of and behind the oven kiln. By supporting it, it has a double tubular structure. Further, in order to be able to select the presence / absence of reflection on the work piece, the adjustment of the reflectance, the reflection mode, etc., for example, when the reflection is too strong, or when setting a part that does not need reflection, a reflection member In order to properly select the arrangement form of the reflecting member such as not dismounting itself and arranging it, or to reduce the reflectance of the reflecting member, the outer surface of the reflecting member itself is processed into a mirror-finished state, and conversely In order to increase the reflectance, the outer surface of the reflecting member itself is processed into a roughened surface.

【0003】[0003]

【発明が解決しようとする課題】しかしながらこのよう
な従来提案のオーブン装置では、この反射機構による反
射に際し、上部熱源自体は位置や方向を変えることがで
きない固定式のものであって上部熱源による反射部材へ
の照射領域を任意に変更することができないため、被加
工物の全般のものに対して満遍なく照射することで焼き
ムラを微調整することは比較的に困難であった。しかも
従来では被加工物に対する反射の有無、反射率の調整、
反射態様等を選定できるようにするために、例えば反射
が強過ぎたり、反射の必要がない部位等を設定したりす
る場合には反射部材自体を取り外して配置しない等の反
射部材の配列形態を適宜に選定するようにしたり、また
反射部材の反射率を小さくする場合には反射部材自体の
外表面を鏡面仕上げ状態に加工し、逆に反射率を大きく
する場合には反射部材自体の外表面を粗面仕上げ状態に
加工したりする等の非常に手間が掛かり、しかも面倒な
対策が採られていた。
However, in the conventional oven device as described above, upon reflection by the reflection mechanism, the upper heat source itself is a fixed type whose position and direction cannot be changed, and the reflection by the upper heat source is not possible. Since it is not possible to arbitrarily change the irradiation area to the member, it is relatively difficult to finely adjust the baking unevenness by uniformly irradiating the whole workpiece. Moreover, conventionally, the presence or absence of reflection on the work piece, the adjustment of the reflectance,
In order to be able to select the reflection mode, etc., for example, when the reflection is too strong, or when setting a site that does not require reflection, the reflection member itself should not be removed and arranged. The outer surface of the reflection member itself is processed into a mirror-finished state when it is selected appropriately or the reflectance of the reflection member is reduced, and conversely when the reflectance is increased, the outer surface of the reflection member itself is processed. It took a lot of time and labor, such as processing the roughened surface to a rough surface, and took troublesome measures.

【0004】また、従来の反射部材は例えばアルミニウ
ム製のパイプ材にて形成し、オーブン窯内の前後に配置
した支持部材相互間に架け渡した支持棒材部分に挿通支
持され、支持棒材を芯材として反射部材を支持すること
で二重管状に構成してあるため、反射部材の蓄熱率・輻
射効率が共に低いものであった。
Further, the conventional reflecting member is formed of, for example, an aluminum pipe material, and is inserted into and supported by a supporting rod material portion which is provided between supporting members arranged in front and rear of the oven kiln. Since the reflecting member is supported as the core member to form a double tube, both the heat storage rate and the radiation efficiency of the reflecting member are low.

【0005】さらに、従来では下部熱源からの輻射によ
る対流熱をうまく調整することができないため熱板下方
のみが極端に高温となり、これによって熱板上の被加工
物の下面だけが極端に焦げてしまう等の問題点があっ
た。
Further, conventionally, since the convective heat due to the radiation from the lower heat source cannot be well adjusted, only the lower part of the hot plate becomes extremely hot, which causes only the lower surface of the workpiece on the hot plate to be extremely scorched. There was a problem such as being lost.

【0006】加えて、従来においては上部熱源の裏側後
方には何等の冷却システムもないために上部熱源の裏側
が高温状態となったままでいることが多く、その結果、
上部熱源である例えばヒーター部分自体の寿命が極端に
短くなってしまう虞も生じるのであった。
In addition, since there is no cooling system behind the upper heat source in the past, the back side of the upper heat source often remains in a high temperature state, and as a result,
There is a possibility that the life of the upper heat source, for example, the heater portion itself may be extremely shortened.

【0007】そこで本発明は叙上のような従来存した諸
事情に鑑み創出されたもので、上部熱源による反射部材
への照射領域を任意に変更すべく上部熱源の位置や方向
を任意に微調整可能にすることで、被加工物の全般のも
のに対して焼きムラを生じることなく満遍なく照射でき
ると共に、反射部材の蓄熱率・輻射効率を向上すること
ができて被加工物の全般のものに対して効率良く照射す
ることができ、さらに下部熱源からの輻射による対流熱
を調整することができて熱板下方のみが極端に高温状態
となるのを防止でき、これによって熱板上の被加工物の
下面だけが局部的に焦げてしまうようなことが回避で
き、また上部熱源の裏側後方に自然対流を利用した冷却
システムを配置させて上部熱源の裏側部位を冷却可能に
することで当該上部熱源の寿命を延ばすことができるよ
うにしたオーブン装置を提供することを目的とする。
Therefore, the present invention was created in view of the above existing circumstances, and the position and direction of the upper heat source can be arbitrarily adjusted in order to arbitrarily change the irradiation area of the reflecting member by the upper heat source. By making it adjustable, it is possible to irradiate evenly on all objects to be processed without unevenness of heating, and it is possible to improve the heat storage rate / radiation efficiency of the reflecting member, and to make it possible to apply to all objects to be processed. Can be efficiently radiated, and convective heat due to radiation from the lower heat source can be adjusted to prevent an extremely high temperature condition only under the hot plate. It is possible to avoid locally burning only the lower surface of the workpiece, and by placing a cooling system that uses natural convection behind the upper heat source to cool the backside of the upper heat source. Upper part And to provide an oven apparatus that can be extended source life.

【0008】[0008]

【課題を解決するための手段】上述した課題を達成する
ため、本発明にあっては、オーブン窯1内の熱板2上に
置かれた被加工物Wに対し上方に向けられている上部熱
源3からの遠近赤外線を反射機構10によって乱反射さ
せて熱板2上に拡散放射して加熱処理を行ない、熱板2
下方に配置した下部熱源4によって熱板2自体を加熱す
るオーブン装置において、反射機構10は、オーブン窯
1内の前後で対称的に配置形成した支持部材11によっ
てオーブン窯1の前後に沿って支持される支持棒材16
と、この支持棒材16外側に挿通されることで支持され
る反射部材17とを備え、反射部材17は、高蓄熱性・
高輻射効率を付与すべく支持棒材16に比し熱伝導率が
良好で且つ熱拡散率の大きなパイプ材にて形成され、そ
の内周面には比熱が当該パイプ材より小さく且つ熱伝導
率・熱拡散率が当該パイプ材より大きな蓄熱用パイプ材
18が貫挿されて成るものである。オーブン窯1内の熱
板2上に置かれた被加工物Wに対し上方に向けられてい
る上部熱源3からの遠近赤外線を反射機構10によって
乱反射させて熱板2上に拡散放射して加熱処理を行な
い、熱板2下方に配置した下部熱源4によって熱板2自
体を加熱するオーブン装置において、反射機構10の反
射部材17に対する上部熱源3の照射領域を任意に選定
するよう上部熱源3には摺動機構もしくは回転機構等に
よる焼きムラ調整機構20、30を備えて成るものとで
きる。摺動機構による焼きムラ調整機構20は、オーブ
ン窯1の内側壁と熱板2の縁端部との間に所要幅の間隙
を有して起立配置した仕切壁部21の上端に装架固定さ
せた固定基台22と、複数の上部熱源3が離間配設した
状態で固定配置され且つ固定基台22の上で前後に摺動
可能な摺動板23とを備えて成るものとできる。回転機
構による焼きムラ調整機構30は、オーブン窯1の内側
壁と熱板2の縁端部との間に所要幅の間隙を有して起立
配置した左右の仕切壁部31の上端に蝶番33を介して
回転可能となるように枢着され且つ一側片上に複数の上
部熱源3が離間配設した状態で固定された回転基台32
と、反射部材17から拡散放射してきた輻射熱を内側に
反射させるべく回転基台32の一側片上の縁端部とオー
ブン窯1内部の天井箇所との間に複数に隣接した状態で
連結配置された可撓性を有する仕切板36と、回転基台
32の直角縁部内側において歯部が外側に向くようにし
てネジ固定されたラックギヤ38と、ラックギヤ38の
歯部が噛合されるピニオンギヤ39Aを有する駆動モー
タ39と、回転基台32の他側片上の縁端部に延設され
た突起片32Aと、回転基台32の回転に伴い突起片3
2Aが当接することで駆動モータ39の停止制御を行な
うよう当該突起片32Aの移動軌跡上に配された上限・
下限の両リミットスイッチLS1,LS2とを備えて成
るものとできる。オーブン窯1内の熱板2上に置かれた
被加工物Wに対し上方に向けられている上部熱源3から
の遠近赤外線を反射機構10によって乱反射させて熱板
2上に拡散放射して加熱処理を行ない、熱板2下方に配
置した下部熱源4によって熱板2自体を加熱するオーブ
ン装置において、熱板2の左右両側には下部熱源4から
の対流による火力を微調整する開閉移動可能な仕切調整
板構造の対流熱調整機構40を備えて成るものとでき
る。対流熱調整機構40は、オーブン窯1の内側壁と熱
板2の縁端部との間に所要幅の間隙を有して起立配置し
且つ上端に上部熱源3を載置固定した固定基台42を装
架配置させて成る左右の仕切壁部41と、仕切壁部41
内側に位置する熱板2の縁端部から起立配置させた支持
フレーム43との間に隙間を形成することで、熱板2を
下側から直接加熱する下部熱源4に対し、上部熱源3を
通ってから熱板2上側へ輻射熱を誘導すべくこの隙間に
よって下部熱源4の輻射熱流路を形成し、上部熱源3か
ら熱板2上の被加工物W側へ向けて輻射熱が過度になら
ないように当該輻射熱を遮蔽すべく上部熱源3設置側に
対向して設けられた支持フレーム43の上端において任
意の高さに架設変更可能な横垂板46と、下部熱源4か
らの輻射熱流束を上部熱源3の輻射熱流束と合流させて
対流を生じさせることで熱板2上の被加工物W側への熱
伝達を向上させるよう支持フレーム43の上端側に調節
ネジ44を介して水平方向に移動自在に固定可能とした
調整板45とから構成することができる。オーブン窯1
内の熱板2上に置かれた被加工物Wに対し上方に向けら
れている上部熱源3からの遠近赤外線を反射機構10に
よって乱反射させて熱板2上に拡散放射して加熱処理を
行ない、熱板2下方に配置した下部熱源4によって熱板
2自体を加熱するオーブン装置において、オーブン窯1
の後側面もしくは左右側面に設けた給気口からオーブン
窯1内部に外気を送り込んで上下部熱源3,4自体の裏
側部分を自然対流によって冷却する熱源冷却機構50を
備えて成るものとできる。熱源冷却機構50は、外気を
取り入れる取入開口部53Aを有するオーブン窯1内部
の底面部53と、内側に断熱材54Aを貼着し且つ側面
部給気口54Cを有する側面壁部54と、側面壁部54
と所要幅の間隙を有して相対峙しオーブン窯1内側に隔
壁状となって起立配置した仕切壁部51と、仕切壁部5
1の上端においてオーブン窯1内側に向けて若干傾斜し
た段差状となって装架固定され上面には上部熱源3を離
間配設した固定基台52と、固定基台52の外縁端部か
ら直上に向けて配置された複数の孔部55Aが隣接形成
されて成る天井側垂直ダクト部55Bおよび当該天井側
垂直ダクト部55B上側に連通配置した略台形型中空状
の排気口55Cを備えて成るオーブン窯1内部の天井部
55と、オーブン窯1の操作盤56Aを備えた前面壁部
56と、外気を取り入れる背面部給気口57Aを有する
背面壁部57とのそれぞれによって囲繞形成された冷却
用熱交換室Pを備えることによって構成することができ
る。上下部熱源3,4は、セラミックヒーター、赤外線
シュバンクバーナー、ガスバーナー等の熱源部材を採用
することができる。
In order to achieve the above-mentioned object, according to the present invention, an upper part facing upward with respect to a workpiece W placed on a hot plate 2 in an oven kiln 1. The near-infrared rays from the heat source 3 are diffusely reflected by the reflection mechanism 10 and diffused and radiated onto the heat plate 2 to perform heat treatment.
In the oven device for heating the hot plate 2 itself by the lower heat source 4 arranged below, the reflection mechanism 10 is supported along the front and rear of the oven kiln 1 by the support members 11 symmetrically arranged in the front and rear of the oven kiln 1. Support bar 16
And a reflecting member 17 supported by being inserted into the outer side of the supporting rod member 16. The reflecting member 17 has a high heat storage property.
In order to provide high radiation efficiency, it is formed of a pipe material having a good thermal conductivity and a large thermal diffusivity as compared with the support rod material 16, and the inner peripheral surface thereof has a smaller specific heat and a lower thermal conductivity than the pipe material. A heat storage pipe material 18 having a thermal diffusivity higher than that of the pipe material is inserted. The infrared rays from the upper heat source 3 directed upward with respect to the workpiece W placed on the hot plate 2 in the oven kiln 1 are diffusely reflected by the reflection mechanism 10 and diffusely radiated onto the hot plate 2 for heating. In the oven apparatus that performs the treatment and heats the heating plate 2 itself by the lower heat source 4 arranged below the heating plate 2, the upper heat source 3 is set to arbitrarily select the irradiation area of the upper heat source 3 with respect to the reflection member 17 of the reflection mechanism 10. Can be provided with unevenness adjusting mechanisms 20 and 30 by a sliding mechanism or a rotating mechanism. The grilling unevenness adjusting mechanism 20 using a sliding mechanism is mounted and fixed on the upper end of a partition wall portion 21 which is vertically arranged with a gap having a required width between the inner wall of the oven kiln 1 and the edge of the hot plate 2. The fixed base 22 and the slide plate 23 that is fixedly arranged in a state where the plurality of upper heat sources 3 are spaced apart from each other and is slidable back and forth on the fixed base 22 can be provided. The baking unevenness adjusting mechanism 30 by the rotating mechanism has hinges 33 on the upper ends of the left and right partition wall portions 31 which are vertically arranged with a gap having a required width between the inner wall of the oven kiln 1 and the edge portion of the hot plate 2. A rotation base 32 that is rotatably attached via a pin and is fixed in a state in which a plurality of upper heat sources 3 are separately arranged on one side piece.
In order to reflect the radiant heat diffused and radiated from the reflecting member 17 to the inside, a plurality of them are connected and arranged between the edge portion on one side piece of the rotating base 32 and the ceiling portion inside the oven kiln 1 in a state of being adjacent to each other. A flexible partition plate 36, a rack gear 38 that is fixed by screws inside the right edge of the rotary base 32 so that the teeth face outward, and a pinion gear 39A that meshes with the teeth of the rack gear 38. The drive motor 39 that it has, the projection piece 32A that extends to the edge portion on the other side piece of the rotation base 32, and the projection piece 3 as the rotation base 32 rotates.
The upper limit, which is arranged on the movement locus of the projection piece 32A, controls the stop of the drive motor 39 by the contact of the 2A.
Both lower limit switches LS1 and LS2 may be provided. The infrared rays from the upper heat source 3 directed upward with respect to the workpiece W placed on the hot plate 2 in the oven kiln 1 are diffusely reflected by the reflection mechanism 10 and diffusely radiated onto the hot plate 2 for heating. In the oven device that performs the treatment and heats the heating plate 2 itself by the lower heat source 4 arranged below the heating plate 2, the left and right sides of the heating plate 2 can be opened and closed to finely adjust the thermal power due to convection from the lower heat source 4. A convection heat adjusting mechanism 40 having a partition adjusting plate structure may be provided. The convection heat adjustment mechanism 40 is a fixed base on which the upper heat source 3 is placed and fixed at an upper position with a gap of a required width between the inner wall of the oven kiln 1 and the edge of the hot plate 2. Left and right partition wall portions 41 formed by mounting and disposing 42, and the partition wall portion 41
By forming a gap between the edge of the heat plate 2 located inside and the support frame 43 which is arranged upright, the upper heat source 3 is opposed to the lower heat source 4 that directly heats the heat plate 2 from below. The radiant heat flow path of the lower heat source 4 is formed by this gap in order to guide the radiant heat to the upper side of the hot plate 2 after passing, so that the radiant heat does not become excessive from the upper heat source 3 toward the workpiece W side on the hot plate 2. In order to shield the radiant heat, a horizontal hanging plate 46 that can be erected at an arbitrary height at the upper end of the support frame 43 provided to face the upper heat source 3 installation side, and the radiant heat flux from the lower heat source 4 In order to improve heat transfer to the workpiece W side on the heat plate 2 by convection with the radiant heat flux of the heat source 3 in the horizontal direction via the adjustment screw 44 on the upper end side of the support frame 43. From the adjustment plate 45 that can be movably fixed It can be formed. Oven kiln 1
The far-infrared rays from the upper heat source 3 directed upward with respect to the workpiece W placed on the inner heat plate 2 are diffusely reflected by the reflection mechanism 10 and diffused and radiated on the heat plate 2 to perform the heat treatment. In the oven device for heating the hot plate 2 itself by the lower heat source 4 arranged below the hot plate 2, the oven kiln 1
The heat source cooling mechanism 50 may be provided to send the outside air into the oven kiln 1 from the air supply port provided on the rear side surface or the left and right side surfaces to cool the back side portions of the upper and lower heat sources 3 and 4 by natural convection. The heat source cooling mechanism 50 includes a bottom surface portion 53 inside the oven kiln 1 having an intake opening portion 53A for taking in outside air, a side wall portion 54 having a heat insulating material 54A attached inside and a side surface air supply port 54C, Side wall 54
And a partition wall portion 51 having a gap of a required width and placed inside the oven kiln 1 in the form of a partition so as to stand upright, and a partition wall portion 5.
A fixed base 52 on which the upper heat source 3 is spaced from the fixed base 52, which is mounted and fixed on the upper end of the oven kiln 1 so as to be slightly inclined toward the inside of the oven kiln 1, and directly above the outer edge of the fixed base 52. An oven comprising a ceiling-side vertical duct portion 55B formed by adjoining a plurality of holes 55A arranged toward each other, and a substantially trapezoidal hollow exhaust port 55C communicating with the ceiling-side vertical duct portion 55B. For cooling formed by a ceiling 55 inside the kiln 1, a front wall 56 having an operation panel 56A of the oven 1 and a back wall 57 having a back air supply port 57A for taking in outside air. It can be configured by including the heat exchange chamber P. As the upper and lower heat sources 3 and 4, a heat source member such as a ceramic heater, an infrared Schwank burner, or a gas burner can be adopted.

【0009】以上のように構成された本発明に係るオー
ブン装置において、支持棒材16に比し熱伝導率が大き
く且つ熱拡散率の大きなパイプ材にて形成され、その内
周面には比熱が当該パイプ材より小さく且つ熱伝導率・
熱拡散率が当該パイプ材より大きな蓄熱用パイプ材18
が貫挿されて成る反射部材17は、上部熱源3からの輻
射を反射する当該反射部材17に対し高蓄熱性・高輻射
効率を付与させ、熱板2上にある被加工物W全般に対し
ての輻射による照射加熱効率を向上させる。摺動機構に
よる焼きムラ調整機構20は、摺動板23を固定基台2
2の上で前後に摺動させることで上部熱源3による反射
部材17への照射領域を任意に変更可能にさせるものと
なって熱板2上の被加工物Wの焼きムラを防止させる。
回転機構による焼きムラ調整機構30は、駆動モータ3
9を作動させることによって回転基台32を回転させ
て、反射機構10の反射部材17に対する上部熱源3の
照射領域の選定を可能にさせる。このとき回転基台32
が略水平状態となるように回転位置した際には突起片3
2Aは下限リミットスイッチLS2の接点バネに当接す
ることで駆動モータ39による動作を停止させる。一
方、回転基台32が例えば回転角度が略90°と45°
との間の最大傾斜状態となるように回転位置した際には
突起片32Aは上限リミットスイッチLS1の接点バネ
に当接することで駆動モータ39による動作を停止させ
る。これによって過度の回転基台32の回転量を防止可
能にさせると共に、熱板2上に配置される各種の生地材
料等である被加工物Wに対し焼きムラを微妙に調整可能
にさせる。仕切調整板構造の対流熱調整機構40は、下
部熱源4の対流による火力を調整するに際し、火力を弱
める場合には、調節ネジ44の押し込み方向への捻回転
により調整板45Aが支持フレーム43上端側で仕切壁
部41側に近接して下部熱源4の輻射熱流路を塞ぐ方向
に移動させる。一方、火力を強める場合、調節ネジ44
の引き出し方向への捻回転により調整板45が支持フレ
ーム43上端側で仕切壁部41から離反して下部熱源4
の輻射熱流路を拡大する方向に移動させる。また支持フ
レーム43に対して架設高さを適宜変更させて上部熱源
3を遮蔽することが可能な横垂板46は、上部熱源3か
ら熱板2上の被加工物W側へ向けての輻射熱の過度の到
達を防止させる。このように調整板45による輻射熱流
路の閉塞乃至拡大、横垂板46の架設高さの変更等によ
って、焼成されるべき被加工物Wへの輻射熱を均等に分
散できるものとなって当該被加工物Wの焦げ付きを防止
させると共に、上下部熱源3,4からの輻射熱流束の合
流に伴う対流伝熱により、オーブン窯1内を焼成条件に
応じた対流熱伝達系とさせ、これにより被加工物Wに対
する焼きムラ等を防止させる。熱源冷却機構50は、側
面壁部54の側面部給気口54Aから底面部53の取入
開口部53Aを通して外気がオーブン窯1内部の冷却用
熱交換室Pに取り入れられる。同時に背面壁部57の背
面部給気口57Aからも外気がオーブン窯1内部の冷却
用熱交換室Pに取り入れられる。冷却用熱交換室Pに取
り入れられた外気は、上部熱源3の下面側の部分を冷却
した後、温められた外気は上昇しながら天井部55の天
井側垂直ダクト部55Bを経て排気口55Cから外側に
排気される。このようにして自然対流原理を利用した冷
却システムにより上部熱源3の高温による寿命の低下を
防止させる。セラミックヒーター、赤外線シュバンクバ
ーナー等の熱源部材を採用した上下部熱源3,4は、上
部熱源3からの遠近赤外線を反射機構10によって乱反
射させて熱板2上に拡散放射して加熱処理を行ない、下
部熱源4からの遠近赤外線によって熱板2自体を下方か
ら加熱するという蓄熱効果も高められ、メンテナンスも
容易なオーブン装置を提供させる。
In the oven apparatus according to the present invention having the above-described structure, the pipe material having a larger thermal conductivity and a larger thermal diffusivity than the supporting rod 16 is formed, and the inner peripheral surface thereof has a specific heat capacity. Is smaller than the pipe material and has a thermal conductivity
Heat storage pipe material 18 having a larger thermal diffusivity than the pipe material 18
The reflection member 17 formed by penetrating the above-mentioned material imparts high heat storage property and high radiation efficiency to the reflection member 17 that reflects the radiation from the upper heat source 3, and with respect to all the workpieces W on the hot plate 2. Improving the efficiency of irradiation heating by all the radiation. The grilling unevenness adjusting mechanism 20 using the sliding mechanism fixes the sliding plate 23 to the fixed base 2
By sliding it back and forth on the heating plate 2, the irradiation area of the reflecting member 17 by the upper heat source 3 can be arbitrarily changed, so that uneven baking of the workpiece W on the heating plate 2 can be prevented.
The roaming unevenness adjusting mechanism 30 using the rotating mechanism is the drive motor 3
The rotation base 32 is rotated by operating 9 so that the irradiation area of the upper heat source 3 with respect to the reflection member 17 of the reflection mechanism 10 can be selected. At this time, the rotation base 32
When the rotating position is such that the
2A stops the operation by the drive motor 39 by coming into contact with the contact spring of the lower limit switch LS2. On the other hand, the rotation base 32 has, for example, rotation angles of about 90 ° and 45 °.
When it is rotated so as to be in the maximum inclination state between and, the projection piece 32A comes into contact with the contact spring of the upper limit switch LS1 to stop the operation by the drive motor 39. This makes it possible to prevent an excessive amount of rotation of the rotary base 32, and to make it possible to finely adjust the baking unevenness of the workpiece W, which is various types of material materials and the like arranged on the hot plate 2. The convection heat adjusting mechanism 40 having the partition adjusting plate structure adjusts the heating power due to the convection of the lower heat source 4, and when the heating power is weakened, the adjusting plate 45A is rotated by pushing the adjusting screw 44 in the pushing direction so that the adjustment plate 45A is supported at the upper end of the support frame 43. It is moved in the direction of closing the radiant heat flow path of the lower heat source 4 on the side close to the partition wall portion 41 side. On the other hand, if you want to increase the firepower, adjust screw 44
The adjustment plate 45 is separated from the partition wall portion 41 on the upper end side of the support frame 43 by the twist rotation of the lower heat source 4
The radiant heat flow path is moved in the direction of expansion. Further, the horizontal hanging plate 46 capable of shielding the upper heat source 3 by appropriately changing the erection height with respect to the support frame 43 radiates heat from the upper heat source 3 toward the workpiece W side on the hot plate 2. Prevent the excessive arrival of. As described above, by closing or expanding the radiant heat flow path by the adjusting plate 45, changing the erection height of the horizontal plate 46, and the like, the radiant heat to the workpiece W to be fired can be evenly distributed. The work W is prevented from being burnt, and the convective heat transfer caused by the confluence of the radiant heat fluxes from the upper and lower heat sources 3 and 4 makes the inside of the oven kiln 1 a convective heat transfer system according to the firing conditions. Prevents uneven baking of the work W. In the heat source cooling mechanism 50, outside air is taken into the cooling heat exchange chamber P inside the oven kiln 1 from the side surface air supply port 54A of the side wall portion 54 through the intake opening portion 53A of the bottom surface portion 53. At the same time, outside air is also taken into the cooling heat exchange chamber P inside the oven kiln 1 from the rear surface air supply port 57A of the rear wall portion 57. The outside air taken into the cooling heat exchange chamber P cools the lower surface side portion of the upper heat source 3, and then the heated outside air rises while passing through the ceiling side vertical duct portion 55B of the ceiling portion 55 and the exhaust port 55C. Exhausted to the outside. In this way, the cooling system utilizing the principle of natural convection prevents the life of the upper heat source 3 from being shortened due to the high temperature. The upper and lower heat sources 3 and 4, which employ heat source members such as a ceramic heater and an infrared schwann burner, diffusely irradiate the near-infrared rays from the upper heat source 3 by the reflection mechanism 10 and diffusely radiate them on the heat plate 2 to perform heat treatment. Further, the heat storage effect of heating the heating plate 2 itself from below by the far-infrared rays from the lower heat source 4 is enhanced, and an oven device that is easy to maintain is provided.

【0010】[0010]

【発明の実施の形態】以下図面を参照して本発明の一実
施の形態を説明すると、図において示される符号1は略
密閉構造に形成された断熱性のオーブン窯であり、例え
ば前面に付設の図示を省略した開閉扉61によって開閉
され、底部に配した例えば石綿性等の熱板2上にピザ、
パン、カステラ、グラタン等その他の調理焼成すべき各
種の生地材料である被加工物Wが載置されるようになっ
ている(図14参照)。そしてこのオーブン窯1内部の
左右には、後述する摺動機構もしくは回転機構等による
焼きムラ調整機構20、30を備えた例えば上方に向け
られている上部熱源3が配置され、また熱板2下方に配
置した下部熱源4によって熱板2自体を加熱する。尚、
上下部熱源3,4としては、例えばセラミックヒータ
ー、赤外線シュバンクバーナー、ガスバーナー等の熱源
部材を採用することができる。
BEST MODE FOR CARRYING OUT THE INVENTION An embodiment of the present invention will be described below with reference to the drawings. Reference numeral 1 shown in the drawings is a heat insulating oven kiln formed in a substantially closed structure, for example, attached to the front surface. Is opened and closed by an opening / closing door 61 (not shown), and a pizza is placed on the hot plate 2 of, for example, asbestos, which is arranged at the bottom.
Workpieces W, which are various types of dough materials to be cooked and baked, such as bread, castella, and gratin, are placed (see FIG. 14). On the left and right sides of the oven kiln 1, there are arranged upper heat sources 3 provided with, for example, an unevenness adjusting mechanism 20, 30 such as a sliding mechanism or a rotating mechanism, which will be described later. The heating plate 2 itself is heated by the lower heat source 4 arranged at. still,
As the upper and lower heat sources 3 and 4, for example, a heat source member such as a ceramic heater, an infrared Schwank burner, or a gas burner can be adopted.

【0011】これらの上下部熱源3,4によってオーブ
ン窯1内部が例えば300℃前後の温度、例えばピザの
場合には約5〜10分等の短時間にて約400℃の高温
で、パンや焼菓子の場合には約10〜40分等の長時間
にて約200℃前後の中温で加熱されるようにしてあ
る。特に上部熱源3による加熱に際しオーブン窯1上部
に配装された高蓄熱性および高輻射率を有する後述する
反射機構10によって所定の遠近赤外線を熱板2上の被
加工物Wに照射させて加熱するのであり、またオーブン
窯1内の天井に開閉自在な熱抜用開孔を設けることによ
り当該オーブン窯1内に対流を生じさせて所定の加熱雰
囲気が形成されるようにしてある。
By these upper and lower heat sources 3 and 4, the inside of the oven kiln 1 has a temperature of about 300 ° C., for example, in the case of pizza, at a high temperature of about 400 ° C. in a short time of about 5 to 10 minutes, bread or the like. In the case of baked confectionery, it is heated at a medium temperature of about 200 ° C. for a long time such as about 10 to 40 minutes. In particular, when the upper heat source 3 is used for heating, the workpiece W on the hot plate 2 is irradiated with a predetermined near-infrared ray by a reflecting mechanism 10 having a high heat storage property and a high emissivity, which is arranged above the oven kiln 1 and is heated. Further, by providing an openable hole for heat removal in the ceiling in the oven kiln 1, convection is generated in the oven kiln 1 to form a predetermined heating atmosphere.

【0012】また熱板2の左右両側には下部熱源4から
の対流による火力を微調整するための開閉移動可能な仕
切調整板構造の対流熱調整機構40を設けると共に、上
下部熱源3,4の寿命を伸ばすために、オーブン窯1の
後側面もしくは左右側面に設けた給気口からオーブン窯
1内部に外気を送り込んで上下部熱源3,4自体の裏側
部分を自然対流によって冷却するための熱源冷却機構5
0を備えている。
Further, a convection heat adjusting mechanism 40 having a partition adjusting plate structure which can be opened / closed for finely adjusting the heat generated by convection from the lower heat source 4 is provided on both right and left sides of the heating plate 2, and upper and lower heat sources 3, 4 are provided. In order to extend the life of the oven kiln, the outside air is sent into the oven kiln 1 from the air supply port provided on the rear side or left and right sides of the oven kiln 1 to cool the back side of the upper and lower heat sources 3 and 4 by natural convection. Heat source cooling mechanism 5
It has 0.

【0013】(反射機構10)以下に本発明に係るオー
ブン装置における反射機構10の具体的構成について図
1乃至図4に基づき説明する。反射機構10はその外表
面によって上部熱源3からの遠近赤外線による輻射熱を
乱反射させてシャワーの如く熱板2上に拡散放射し、熱
板2上に置かれている被加工物Wたる生地材料を包み込
むような熱回りで焼き上げるようにして加熱処理を行な
うものである。すなわち、反射機構10は、複数の取付
部15が配列されていて、オーブン窯1の例えば前後側
壁内側面に前後で対称的に配置形成した支持部材11
と、前後の取付部15それぞれによってオーブン窯1の
前後に沿って支持される例えばステンレス製芯棒材によ
る小径パイプ状の支持棒材16と、この支持棒材16外
側に挿通されることで支持される大径パイプ状の反射部
材17とを備えて成るものである(図3、図4参照)。
(Reflecting Mechanism 10) A specific structure of the reflecting mechanism 10 in the oven apparatus according to the present invention will be described below with reference to FIGS. 1 to 4. The reflection mechanism 10 diffuses the radiant heat from the near-infrared rays from the upper heat source 3 by its outer surface, diffuses and radiates it onto the hot plate 2 like a shower, and removes the material of the workpiece W that is placed on the hot plate 2. The heat treatment is performed by baking with a heat that wraps around. That is, in the reflection mechanism 10, a plurality of attachment portions 15 are arranged, and the support member 11 is formed symmetrically in the front and rear sides of the inner surface of the oven kiln 1, for example.
And a small-diameter pipe-shaped support rod 16 made of, for example, a stainless steel core rod supported along the front and rear of the oven kiln 1 by the front and rear mounting portions 15, and supported by being inserted outside the support rod 16. And a large-diameter pipe-shaped reflecting member 17 (see FIGS. 3 and 4).

【0014】支持部材11は反射部材17を装架支持す
るオーブン窯1内においての上部乃至その近傍に位置さ
せて例えばネジ止め、溶接等によって固着配置されてお
り、図示例にあってはオーブン窯1内の上部の中央部、
上部の左右両側部それぞれに分割して配置されている。
この支持部材11自体は、図3に示すようにオーブン窯
1の前後側壁内側面にネジ止め等によって当接固着され
る固着片12の下縁に略水平状にして折曲形成した連結
片13に、固着片12と略平行な取付支持片14を更に
折曲形成することで断面で略溝形状を呈すると共に、取
付支持片14にその上縁で開放されている溝状のあるい
は孔状の複数の取付部15を配列形成し、支持棒材16
は支持部材11相互間にその取付部15への嵌合によっ
て架け渡されるように支持されている。
The supporting member 11 is positioned in the upper part or in the vicinity of the oven kiln 1 for mounting and supporting the reflecting member 17 and fixedly arranged by, for example, screwing or welding. In the illustrated example, the oven kiln is shown. The central part of the upper part of 1,
It is divided into left and right side parts.
As shown in FIG. 3, the support member 11 itself has a connecting piece 13 formed into a substantially horizontal shape by bending at a lower edge of a fixing piece 12 that is fixedly contacted to the inner side surfaces of the front and rear side walls of the oven kiln 1 by screwing or the like. In addition, a mounting support piece 14 substantially parallel to the fixing piece 12 is further bent to form a groove shape in cross section, and the mounting support piece 14 has a groove-like or hole-like shape opened at its upper edge. A plurality of mounting portions 15 are formed in an array, and a supporting rod 16 is formed.
Are supported so as to be bridged between the support members 11 by fitting into the mounting portions 15.

【0015】図4に示すように、反射部材17は、蓄熱
を高め且つ輻射効率を大きくするため、支持棒材16に
比し大径の例えばアルミニウム製等の熱伝導率が良好で
且つ熱拡散率の大きなパイプ材にて形成されていて、そ
の内周面には比熱がアルミニウムより小さく且つ熱伝導
率・熱拡散率が共にアルミニウムより大きな例えば銅製
等の蓄熱用パイプ材18が貫挿されている。そして反射
部材17はオーブン窯1前後の支持部材11相互間に架
け渡した支持棒材16部分に挿通支持され、支持棒材1
6を芯材として反射部材17を支持することでその挿通
支持状態は例えば二重管状に構成されるものとなる。
尚、この反射部材17は支持棒材16に支持させずに配
置しない場合にはその反射作用は得られないのものとし
てあるから、例えば反射が強すぎたり、反射の必要がな
い部位等を設定したりする場合には反射部材17自体を
配置しない等とすることで、被加工物Wに対応する反射
の有無、反射率の調整、反射態様等を選定できるように
してある。
As shown in FIG. 4, since the reflecting member 17 enhances heat storage and increases radiation efficiency, the reflecting member 17 has a larger diameter than that of the supporting rod 16, for example, made of aluminum and has good thermal conductivity and thermal diffusion. It is formed of a pipe material having a large heat dissipation rate, and a heat storage pipe material 18 made of, for example, copper, which has a specific heat smaller than that of aluminum and a thermal conductivity and a thermal diffusivity of which are both larger than that of aluminum, is inserted into the inner peripheral surface thereof. There is. Then, the reflecting member 17 is inserted and supported by the supporting rod member 16 portion which is laid between the supporting members 11 in front of and behind the oven kiln 1.
By supporting the reflecting member 17 with 6 as the core material, the insertion and supporting state thereof becomes, for example, a double tubular shape.
It should be noted that the reflecting member 17 cannot obtain its reflecting action unless it is arranged without being supported by the supporting rod member 16, so that, for example, a portion where reflection is too strong, or where reflection is unnecessary is set. In such a case, the reflection member 17 itself is not arranged so that the presence or absence of reflection corresponding to the workpiece W, the adjustment of the reflectance, the reflection mode, etc. can be selected.

【0016】次に以上のように構成された実施の形態に
ついての使用、動作の一例を説明するに、図1に示すよ
うに、熱板2上に調理、焼成すべきピザ、パン等の被加
工物Wを載置する一方、この被加工物Wに対応する反射
の有無、反射率の大小等によって反射部材17の配列形
態を適宜に選定する。すなわち通常はオーブン窯1の前
後に配した支持部材11相互間に支持棒材16を装架支
持しておき、反射が必要な部位に対しては反射部材17
を挿通支持させるのである。そして上部熱源3によって
加熱するとき、これから発生した遠近赤外線は反射機構
10のそれぞれの反射部材17によって反射されて熱板
2上の被加工物Wに照射されるのである。このとき反射
部材17の蓄熱性の高く且つ輻射効率の大きな外表面に
よって上部熱源3からの遠近赤外線は特定区域に集中さ
れることなく散乱させられ、熱板2上ではその全体に略
均一に照射され、また被加工物Wの直上方向からのみで
なく側面方向からも照射されるものとする。しかもオー
ブン窯1のドア開放時に反射部材17の熱が外に逃げて
しまっても反射部材17の銅製等の蓄熱用パイプ材18
からの余熱によってオーブン窯1内を熱することができ
るのである。
Next, in order to explain an example of use and operation of the embodiment configured as described above, as shown in FIG. 1, pizza, bread, etc. to be cooked and baked on the heating plate 2 are to be covered. While placing the workpiece W, the arrangement form of the reflecting members 17 is appropriately selected depending on the presence / absence of reflection corresponding to the workpiece W, the magnitude of reflectance, and the like. That is, usually, the support rods 16 are mounted and supported between the support members 11 arranged in front of and behind the oven kiln 1, and the reflection member 17 is provided for a portion where reflection is necessary.
Is inserted and supported. When the upper heat source 3 heats the far-infrared rays, the far-infrared rays generated by the upper heat source 3 are reflected by the respective reflecting members 17 of the reflecting mechanism 10 and are applied to the workpiece W on the heat plate 2. At this time, the far-infrared rays from the upper heat source 3 are scattered without being concentrated in a specific area by the outer surface of the reflecting member 17 having a high heat storage property and a high radiation efficiency, and the whole is substantially uniformly irradiated on the heating plate 2. Further, the irradiation is performed not only from the direction directly above the workpiece W but also from the side direction. Moreover, even if the heat of the reflection member 17 escapes to the outside when the door of the oven kiln 1 is opened, the heat storage pipe material 18 made of copper or the like for the reflection member 17
The inside of the oven kiln 1 can be heated by the residual heat from.

【0017】(摺動機構による焼きムラ調整機構20)
以下に本発明に係るオーブン装置における左右の上部熱
源3を前後方向に水平摺動させるための摺動機構による
焼きムラ調整機構20の具体的構成について図5に基づ
き説明する。すなわちオーブン窯1内部の左右に配置さ
れる上部熱源3の摺動機構は、オーブン窯1の内側壁
と、熱板2の縁端部との間に所要幅の間隙を有して起立
配置した左右の仕切壁部21によってそれぞれ支持され
ており、仕切壁部21の上端に装架固定させた若干傾斜
したアングル帯板状の固定基台22の上に帯板状の摺動
板23が長手方向に沿って前後に摺動可能となるように
配置されている。そして摺動板23の上面には矩形状を
呈する複数の上部熱源3としての例えば4台のセラミッ
クヒーターが長手方向に離間配設した状態で固定金具2
4により固定されている。また摺動板23の移動量を示
すために、摺動板23の一端側には目盛用の指針23A
を付設し、また固定基台22には指針23Aによって示
される目盛用スケール22Aを付設してある。
(Baking unevenness adjusting mechanism 20 using a sliding mechanism)
Hereinafter, a specific configuration of the baking unevenness adjusting mechanism 20 including a sliding mechanism for horizontally sliding the left and right upper heat sources 3 in the oven device according to the present invention will be described with reference to FIG. That is, the sliding mechanism of the upper heat sources 3 arranged on the left and right inside the oven kiln 1 was erected with a gap of a required width between the inner wall of the oven kiln 1 and the edge of the heating plate 2. The strip-shaped sliding plate 23 is supported on the left and right partition wall portions 21, respectively, and the strip-shaped sliding plate 23 is mounted on the slightly slanted angle strip-shaped fixed base 22 mounted and fixed to the upper end of the partition wall portion 21. It is arranged to be slidable back and forth along the direction. Then, on the upper surface of the sliding plate 23, for example, four ceramic heaters serving as a plurality of rectangular upper heat sources 3 are arranged in the longitudinal direction with a distance from each other so as to be fixed.
It is fixed by 4. Further, in order to show the amount of movement of the sliding plate 23, a scale pointer 23A is provided on one end side of the sliding plate 23.
In addition, the fixed base 22 is provided with a scale 22A for scale indicated by a pointer 23A.

【0018】この摺動機構の具体例としては、例えば固
定基台22の左右両側に所定の長さをもって離間配設し
た複数のネジ孔25に、当該ネジ孔25に対向すべく摺
動板23の左右両側に所定の間隔をもって穿設形成した
複数の長孔26をそれぞれ合致配置させ、この長孔26
に貫挿させた固定ネジ27を固定基台22のネジ孔25
に捩じ込ませることにより、摺動板23が摺動自在に固
定されている。これにより固定基台22上において長孔
26の長さ分のストローク距離だけ例えば手動操作もし
くは不図示の駆動源による作動等によって摺動板23が
前後に摺動できるものとなって、反射機構10の反射部
材17に対する上部熱源3の照射領域を任意に選定する
ようになっている。尚、本実施の形態においては摺動板
23の上面に配した上部熱源3としてセラミックヒータ
ーが使用されているが、これに限らず赤外線シュバンク
バーナーもしくはガスバーナー等の熱源部材を使用して
も良いことは勿論である。
A specific example of this sliding mechanism is, for example, a plurality of screw holes 25 which are spaced apart from each other on the left and right sides of the fixed base 22 with a predetermined length and are spaced from each other. A plurality of elongated holes 26 formed at predetermined intervals on both the left and right sides of the
The fixing screw 27 inserted in the
The sliding plate 23 is slidably fixed by being screwed into. As a result, the sliding plate 23 can be slid back and forth on the fixed base 22 by a stroke distance corresponding to the length of the long hole 26, for example, by manual operation or operation by a drive source (not shown). The irradiation area of the upper heat source 3 with respect to the reflection member 17 is arbitrarily selected. In the present embodiment, a ceramic heater is used as the upper heat source 3 arranged on the upper surface of the sliding plate 23, but the present invention is not limited to this, and a heat source member such as an infrared Schbank burner or a gas burner may be used. Of course good things.

【0019】次に以上のように構成された実施の形態に
ついての使用、動作の一例を説明するに、図5に示すよ
うに、手動操作もしくは不図示の駆動源による作動等に
よって固定基台22上において摺動板23を前後に摺動
させることにより、反射機構10の反射部材17に対す
る上部熱源3の照射領域を予め選定しておく。このとき
摺動板23の移動量は、摺動板23の目盛用の指針23
Aを固定基台22の目盛用スケール22Aに合わせるこ
とにより容易に設定することができる。これによって熱
板2上に配置される各種の生地材料等である被加工物W
に対し焼きムラを微妙に調整することができるのであ
る。
Next, to explain an example of use and operation of the embodiment configured as described above, as shown in FIG. 5, the fixed base 22 is manually operated or operated by a drive source (not shown). The irradiation area of the upper heat source 3 with respect to the reflection member 17 of the reflection mechanism 10 is selected in advance by sliding the sliding plate 23 back and forth. At this time, the moving amount of the sliding plate 23 is determined by the pointer 23 for the scale of the sliding plate 23.
It can be easily set by adjusting A to the scale 22A for scale of the fixed base 22. As a result, the workpieces W, which are various kinds of cloth materials and the like, arranged on the hot plate 2
On the other hand, it is possible to finely adjust the unevenness of baking.

【0020】(回転機構による焼きムラ調整機構30)
以下に本発明に係るオーブン装置における反射機構10
のそれぞれの反射部材17に向けられている上部熱源3
の照射角度を変更させるための回転機構による焼きムラ
調整機構30の具体的構成について図6、図7に基づき
説明する。すなわちオーブン窯1内部の左右に配置され
る上部熱源3の回転機構は、オーブン窯1の内側壁と、
熱板2の縁端部との間に所要幅の間隙を有して起立配置
した左右の仕切壁部31にそれぞれ支持されている。こ
の仕切壁部31の上端には帯板を長手方向に沿って直角
に折曲した所謂アングル状の回転基台32の直角縁部外
側が蝶番33を介して回転可能となるように枢着されて
おり、この回転基台32の一側片上に矩形状を呈する複
数の上部熱源3としての例えば4台のセラミックヒータ
ーが長手方向に離間配設した状態で固定金具34により
固定されている。
(Baking unevenness adjusting mechanism 30 using a rotating mechanism)
The reflection mechanism 10 in the oven device according to the present invention will be described below.
Upper heat source 3 directed to each of the reflective members 17 of
A specific configuration of the baking unevenness adjusting mechanism 30 using a rotating mechanism for changing the irradiation angle of will be described with reference to FIGS. 6 and 7. That is, the rotating mechanism of the upper heat source 3 arranged on the left and right inside the oven kiln 1 is the inner wall of the oven kiln 1,
It is supported by the left and right partition wall portions 31 which are arranged upright with a gap having a required width between them and the edge of the heat plate 2. On the upper end of the partition wall portion 31, the outside of the right-angled edge of a so-called angle-shaped rotary base 32 in which a strip is bent at a right angle along the longitudinal direction is pivotally mounted via a hinge 33 so as to be rotatable. On one side of the rotary base 32, for example, four ceramic heaters as a plurality of rectangular upper heat sources 3 are fixed by fixing fittings 34 in a state of being spaced apart in the longitudinal direction.

【0021】回転基台32の一側片上の縁端部には左右
一対の可撓性部材として例えば板リンク状のチェーン部
材35の各一端が連結され、且つ両チェーン部材35の
各他端が回転基台32の直上に位置するオーブン窯1内
部の天井箇所に連結されており、反射部材17から拡散
放射してきた輻射熱を内側に反射させるための複数の横
長の仕切板36がこの左右のチェーン部材35に跨がる
ようにして下側から上側にかけて順次隙間無く装架配設
されている。
One end of a pair of left and right flexible members, for example, a plate link-shaped chain member 35 is connected to the edge portion on one side of the rotary base 32, and the other ends of both chain members 35 are connected. A plurality of laterally long partition plates 36 for reflecting the radiant heat diffused and radiated from the reflecting member 17 to the inside are connected to the ceiling portion inside the oven kiln 1 located immediately above the rotary base 32, and the left and right chains are The members 35 are mounted and arranged in order from the lower side to the upper side so as to straddle the member 35.

【0022】回転基台32の直角縁部内側にはこれの左
右いずれか一端側に形成した扇状のフランジ部37を介
して円弧状のラックギヤ38が歯部が外側に向くように
してネジ固定され、回転基台32下側に配した駆動モー
タ39の出力軸に固着したピニオンギヤ39Aにこのラ
ックギヤ38の歯部が噛合されている。また回転基台3
2の他側片上の縁端部には突起片32Aが延設され、回
転基台32の回転に伴う当該突起片32Aの移動軌跡上
に配した上限・下限の両リミットスイッチLS1,LS
2の接点バネそれぞれに当接することで駆動モータ39
による動作が停止するようにしてある。すなわち回転基
台32が略水平状態となるように回転位置した場合には
突起片32Aは下限リミットスイッチLS2の接点バネ
に当接することで駆動モータ39による動作が停止して
それ以上の回転を防止する。一方、回転基台32が例え
ば回転角度が略90°〜45°間の最大傾斜状態となる
ように回転位置した場合には突起片32Aは上限リミッ
トスイッチLS1の接点バネに当接することで駆動モー
タ39による動作が停止してそれ以上の傾斜方向への回
転を防止するのである。尚、オーブン窯1の外壁面等に
配設したスイッチの操作でもって駆動モータ39が作動
されるようにしてある。
An arcuate rack gear 38 is screwed to the inside of the right-angled edge portion of the rotary base 32 via a fan-shaped flange portion 37 formed at one end of the right or left side of the rotary base 32 so that the tooth portions face outward. The tooth portion of the rack gear 38 is meshed with the pinion gear 39A fixed to the output shaft of the drive motor 39 arranged below the rotary base 32. Also the rotating base 3
A projection piece 32A is extended at an edge portion on the other side piece of 2, and both upper and lower limit switches LS1 and LS arranged on the movement locus of the projection piece 32A accompanying the rotation of the rotation base 32.
The drive motor 39 by contacting each of the two contact springs
The operation by is stopped. That is, when the rotation base 32 is rotated so as to be in a substantially horizontal state, the projection piece 32A comes into contact with the contact spring of the lower limit switch LS2 to stop the operation by the drive motor 39 and prevent further rotation. To do. On the other hand, when the rotation base 32 is rotated so that the rotation angle is, for example, the maximum tilt state between approximately 90 ° and 45 °, the projection piece 32A comes into contact with the contact spring of the upper limit switch LS1 to drive the drive motor. The operation by 39 is stopped to prevent further rotation in the tilt direction. The drive motor 39 is operated by operating a switch provided on the outer wall surface of the oven kiln 1.

【0023】こうして回転基台32と共に上部熱源3が
若干内側に傾いた略水平位置(図6参照)から内側に向
けて約90°〜45°範囲内の任意の角度に傾倒した状
態(図7参照)となることで、上部熱源3による反射部
材17側への照射領域を選定可能にすると同時に、回転
基台32の回転に伴い仕切板36が内側に屈曲すること
で反射部材17から拡散放射してきた輻射熱を内側に反
射させようにしてある。尚、回転基台32の回転量を示
すために、回転基台32の蝶番側一端部には目盛用の指
針32Bを付設し、一方、オーブン窯1の内側壁には指
針32Bによって示される円弧状の目盛用スケール32
Cを付設してある。
Thus, the state in which the upper heat source 3 together with the rotary base 32 are inclined inward from a substantially horizontal position (see FIG. 6) to an arbitrary angle within the range of about 90 ° to 45 ° (FIG. 7) (See the above), it becomes possible to select the irradiation area of the upper heat source 3 to the reflecting member 17 side, and at the same time, the partition plate 36 bends inward as the rotation base 32 rotates, so that the diffused radiation from the reflecting member 17 occurs. The radiant heat that has come is reflected inside. In order to indicate the rotation amount of the rotary base 32, a pointer 32B for scale is attached to one end of the rotary base 32 on the hinge side, while a circle indicated by the pointer 32B is provided on the inner wall of the oven kiln 1. Arc scale scale 32
C is attached.

【0024】図8、図9は上部熱源3が赤外線シュバン
クバーナーもしくはガスバーナーである場合を示すもの
であり、上部熱源3の照射角度を変更させるための回転
機構による焼きムラ調整機構30の具体的構成について
は上記した上部熱源3としてセラミックヒーターを採用
した場合と略同じである。なお図中符号39Bは、赤外
線シュバンクバーナーもしくはガスバーナーである上部
熱源3においての角度調整がなされるときの供給管路の
角度を追随調整するための可撓管である。
FIGS. 8 and 9 show the case where the upper heat source 3 is an infrared Schwank burner or a gas burner, and a concrete example of the baking unevenness adjusting mechanism 30 by a rotating mechanism for changing the irradiation angle of the upper heat source 3. The general structure is substantially the same as that when a ceramic heater is adopted as the upper heat source 3. Reference numeral 39B in the drawing is a flexible tube for following the angle of the supply pipeline when the angle is adjusted in the upper heat source 3 which is an infrared Schbank burner or a gas burner.

【0025】次に以上のように構成された実施の形態に
ついての使用、動作の一例を説明するに、オーブン窯1
の外壁面等に配設したスイッチの操作で駆動モータ39
を作動させることによって回転基台32を回転させて、
反射機構10の反射部材17に対する上部熱源3の照射
領域を予め選定しておく。このとき図6または図8に示
すように、回転基台32が略水平状態となるように回転
位置した場合には、突起片32Aは下限リミットスイッ
チLS2の接点バネに当接することで駆動モータ39に
よる動作が停止する。一方、図7または図9に示すよう
に、回転基台32が例えば回転角度が略90°と45°
との間の最大傾斜状態となるように回転位置した場合に
は、突起片32Aは上限リミットスイッチLS1の接点
バネに当接することで駆動モータ39による動作が停止
する。回転基台32の回転量は当該回転基台32の目盛
用の指針32Bを目盛用スケール32Cの任意の目盛位
置に合わせることにより容易に設定することができる。
これによって熱板2上に配置される各種の生地材料等で
ある被加工物Wに対し焼きムラを微妙に調整することが
できるのである。
Next, to explain an example of use and operation of the embodiment configured as described above, the oven kiln 1 will be described.
The drive motor 39 is operated by operating a switch provided on the outer wall surface of the
The rotary base 32 is rotated by operating the
The irradiation area of the upper heat source 3 with respect to the reflection member 17 of the reflection mechanism 10 is selected in advance. At this time, as shown in FIG. 6 or FIG. 8, when the rotation base 32 is rotated so as to be in a substantially horizontal state, the projection piece 32A comes into contact with the contact spring of the lower limit switch LS2 to drive the motor 39. The operation by stops. On the other hand, as shown in FIG. 7 or 9, the rotation base 32 has, for example, rotation angles of about 90 ° and 45 °.
When the rotational position is such that the maximum inclination state is between the and, the protruding piece 32A comes into contact with the contact spring of the upper limit switch LS1 to stop the operation by the drive motor 39. The rotation amount of the rotary base 32 can be easily set by aligning the scale pointer 32B of the rotary base 32 with an arbitrary scale position of the scale 32C.
As a result, it is possible to finely adjust the unevenness of baking with respect to the workpiece W, which is various kinds of cloth materials and the like arranged on the hot plate 2.

【0026】(対流熱調整機構40)以下に本発明に係
るオーブン装置における対流熱調整機構40の具体的構
成について図10および図11に基づき説明する。オー
ブン窯1内部の左右に配置される対流熱調整機構40
は、上部熱源3設置側に対向して設けられ、上部熱源3
から熱板2上の被加工物W側へ向けて輻射熱が過度にな
らないように当該輻射熱を遮蔽するための例えば石綿を
メッシュ状の鉄網板表面に貼着して成る横垂板46と、
下部熱源4からの輻射熱流束を上部熱源3の輻射熱流束
と合流させて対流を生じさせることで熱板2上の被加工
物W側への熱伝達を向上するための調整板45とから構
成されている。
(Convection Heat Adjusting Mechanism 40) The specific structure of the convection heat adjusting mechanism 40 in the oven apparatus according to the present invention will be described below with reference to FIGS. 10 and 11. Convection heat adjusting mechanism 40 arranged on the left and right inside the oven kiln 1.
Are provided so as to face the upper heat source 3 installation side, and the upper heat source 3
A horizontal hanging plate 46 formed by adhering, for example, asbestos on the surface of the mesh-like iron net plate for shielding the radiant heat from the above to the workpiece W side on the hot plate 2 so as not to become excessive.
From the adjusting plate 45 for improving the heat transfer to the workpiece W side on the hot plate 2 by combining the radiant heat flux from the lower heat source 4 with the radiant heat flux of the upper heat source 3 to generate convection. It is configured.

【0027】すなわち、オーブン窯1の内側壁と、熱板
2の縁端部との間に所要幅の間隙を有して起立配置し且
つ上端に上部熱源3を載置固定するための固定基台42
を装架配置させて成る左右の仕切壁部41に対して、内
側に位置する熱板2の縁端部から横長帯板上の支持フレ
ーム43を起立配置させて仕切壁部41と支持フレーム
43との間に隙間を形成することで、熱板2を下側から
直接加熱するための下部熱源4に対し、上部熱源3を通
ってから熱板2上側へ輻射熱を誘導すべくこの隙間によ
って下部熱源4の輻射熱流路を形成してある。そして支
持フレーム43の上端側には、左右に配した調節ネジ4
4を介して水平方向に移動自在に固定可能とした水平面
部45Aと垂直面部45Bとから成るL字型帯板状の調
整板45を配置してある。またこの調整板45の垂直面
部45Bの左右両端側にそれぞれ調節ネジ44が取り付
けられており、この調節ネジ44の押し込み方向への捻
回転により調整板45の水平面部45Aが支持フレーム
43上端側で仕切壁部41側に近接して下部熱源4の輻
射熱流路を塞ぐ方向に移動できると共に、調節ネジ44
の引き出し方向への捻回転により調整板45の水平面部
45Aが支持フレーム43上端側で仕切壁部41から離
反して下部熱源4の輻射熱流路を拡大する方向に移動で
きるようにしてあり、これによって下部熱源4の対流に
よる火力を微妙に調整できるものとしてある。
That is, a fixing base for standing and arranging the inner wall of the oven kiln 1 and the edge of the heating plate 2 with a gap having a required width and mounting and fixing the upper heat source 3 on the upper end. Stand 42
With respect to the left and right partition wall portions 41 that are mounted and mounted, the support frame 43 on the horizontally long strip plate is erected from the edge portion of the heat plate 2 located inside to partition the partition wall portion 41 and the support frame 43. By forming a gap between the heat plate 2 and the lower heat source 4 for directly heating the heat plate 2 from the lower side, the lower part is provided by this gap to guide the radiant heat to the upper side of the heat plate 2 after passing through the upper heat source 3. A radiant heat flow path of the heat source 4 is formed. Then, on the upper end side of the support frame 43, the adjusting screws 4 arranged on the left and right are provided.
An L-shaped strip-shaped adjusting plate 45, which is composed of a horizontal surface portion 45A and a vertical surface portion 45B, which can be fixed in such a manner as to be movable in the horizontal direction, is arranged. Further, the adjusting screws 44 are attached to the left and right ends of the vertical surface portion 45B of the adjusting plate 45, respectively, and the horizontal plane portion 45A of the adjusting plate 45 is moved to the upper end side of the support frame 43 by the twist rotation of the adjusting screw 44 in the pushing direction. The adjustment screw 44 can be moved close to the partition wall portion 41 side in a direction to close the radiant heat flow path of the lower heat source 4.
The horizontal plane portion 45A of the adjusting plate 45 can be moved away from the partition wall portion 41 on the upper end side of the support frame 43 by the twist rotation in the pulling-out direction of the adjusting plate 45 so as to move in the direction in which the radiant heat flow path of the lower heat source 4 is expanded. By this, the heat power due to the convection of the lower heat source 4 can be finely adjusted.

【0028】また支持フレーム43の上端には横垂板4
6の下縁部両端側に設けた二股状の脚部47を介して当
該横垂板46を任意の高さに架設配置できるようにして
ある。すなわち横垂板46の下縁部の左右両端側には、
外形が矩形柱状でしかも下端には支持フレーム43の厚
さ分に相当するスリット幅を有する挿入用溝部48が脚
部47下面に形成されている。そして脚部47の側面に
は挿入用溝部48を貫通するようにして係架用のピン部
材49が貫挿されるための複数の孔部48Aが縦方向に
隣接形成してあり、これによって支持フレーム43の上
端に脚部47の挿入用溝部48が嵌め込まれた際に、支
持フレーム43がピン部材49によって係止されるので
ある。したがって支持フレーム43に対する横垂板46
の架設高さを適宜変更する場合には、ピン部材49を貫
挿させる複数の孔部48Aを選定することで容易に行な
われるのである。尚、横垂板46の脚部47を支持フレ
ーム43上端に嵌装させるに際し、調整板45の水平面
部45Aが障壁にならないように水平面部45A両側に
は凹部45Cが設けられている。また、仕切壁部41に
は目盛用の指針41Aが取付けられ、一方、調整板45
の水平面部45Aには指針41Aによって示される目盛
用スケール41Bが付設されている。
At the upper end of the support frame 43, a horizontal hanging plate 4 is provided.
The horizontal hanging plate 46 can be erected and arranged at an arbitrary height via the bifurcated leg portions 47 provided on both ends of the lower edge portion of the reference numeral 6. That is, on the left and right end sides of the lower edge of the horizontal plate 46,
An insertion groove portion 48 having a rectangular columnar outer shape and a slit width corresponding to the thickness of the support frame 43 is formed on the lower surface of the leg portion 47 at the lower end. A plurality of holes 48A for vertically inserting the engaging pin members 49 are formed adjacent to each other in the vertical direction on the side surface of the leg portion 47 so as to pass through the insertion groove portion 48, whereby the support frame is formed. The support frame 43 is locked by the pin member 49 when the insertion groove portion 48 of the leg portion 47 is fitted into the upper end of the 43. Therefore, the horizontal plate 46 with respect to the support frame 43
In the case of appropriately changing the erection height of (1), it can be easily performed by selecting a plurality of holes 48A through which the pin member 49 is inserted. When fitting the leg portion 47 of the horizontal hanging plate 46 to the upper end of the support frame 43, recesses 45C are provided on both sides of the horizontal plane portion 45A so that the horizontal plane portion 45A of the adjusting plate 45 does not act as a barrier. Further, a scale pointer 41A is attached to the partition wall portion 41, while the adjustment plate 45 is provided.
A scale 41B for scale indicated by a pointer 41A is attached to the horizontal plane portion 45A.

【0029】次に以上のように構成された実施の形態に
ついての使用、動作の一例を説明するに、図11に示す
ように、下部熱源4の対流による火力を調整するに際
し、火力を弱める場合には、調節ネジ44の押し込み方
向への捻回転により調整板45の水平面部45Aが支持
フレーム43上端側で仕切壁部41側に近接して下部熱
源4の輻射熱流路を塞ぐ方向に移動する。一方、火力を
強める場合には、調節ネジ44の引き出し方向への捻回
転により調整板45の水平面部45Aが支持フレーム4
3上端側で仕切壁部41から離反して下部熱源4の輻射
熱流路を拡大する方向に移動する。これによって下部熱
源4の対流による火力を微妙に調整することができる。
また、支持フレーム43に対する横垂板46の架設高さ
を適宜変更する場合には、複数の孔部48Aのいずれか
を選定し、そこにピン部材49を貫挿しておいてから横
垂板46の脚部47を支持フレーム43上端に嵌装させ
れば良い。このように調整板45の水平面部45Aによ
る輻射熱流路の閉塞乃至拡大、横垂板46の架設高さの
変更等によって、焼成されるべき被加工物Wへの輻射熱
を均等に分散できるので当該被加工物Wが焦げ付くこと
が無くなると共に、上下部熱源3,4からの輻射熱の対
流伝熱により、オーブン窯1内を焼成条件に応じた対流
熱伝達系とすることができるので被加工物Wに対し焼き
ムラ等を生じることが無くなるのである。
Next, in order to explain an example of the use and operation of the embodiment configured as described above, as shown in FIG. 11, when the heating power is weakened when the heating power by the convection of the lower heat source 4 is adjusted. The horizontal plane portion 45A of the adjusting plate 45 moves toward the partition wall portion 41 side on the upper end side of the support frame 43 and closes the radiant heat flow path of the lower heat source 4 by twisting the adjusting screw 44 in the pushing direction. . On the other hand, when the heating power is to be increased, the horizontal plane portion 45A of the adjusting plate 45 is rotated by twisting the adjusting screw 44 in the pull-out direction so that the supporting frame 4 is supported.
3 The upper end side moves away from the partition wall portion 41 and moves in a direction in which the radiant heat flow path of the lower heat source 4 is expanded. With this, it is possible to finely adjust the thermal power generated by the convection of the lower heat source 4.
Further, when the installation height of the horizontal hanging plate 46 with respect to the support frame 43 is appropriately changed, any one of the plurality of hole portions 48A is selected, and the pin member 49 is inserted there, and then the horizontal hanging plate 46 is inserted. The legs 47 of the above may be fitted to the upper end of the support frame 43. In this way, the radiant heat to the workpiece W to be fired can be evenly dispersed by closing or expanding the radiant heat flow path by the horizontal plane portion 45A of the adjusting plate 45, changing the erection height of the horizontal hanging plate 46, and the like. The work W does not burn, and the convective heat transfer of the radiant heat from the upper and lower heat sources 3 and 4 makes it possible to form a convective heat transfer system in the oven kiln 1 according to the firing conditions. On the other hand, burning unevenness and the like are eliminated.

【0030】(熱源冷却機構50)以下に本発明に係る
オーブン装置における熱源冷却機構50の具体的構成に
ついて図12、図13に基づき説明する。先ず上部熱源
3としてセラミックヒーターを採用している場合につい
て説明する。すなわちオーブン窯1内部の左右に設けら
れた上部熱源3の熱源冷却機構50は、後述する側面部
給気口54Cから底面部側ダクト部を経て外気を取り入
れるための複数の矩形状の取入開口部53Aを有するオ
ーブン窯1内部の底面部53と、内側に断熱材54Aを
貼着し且つ底面部53の複数の小孔を横一列に隣接形成
して成る側面部給気口54Bを露出させてオーブン窯1
の左右側面の外壁を形成する側面壁部54と、側面壁部
54と所要幅の間隙を有して相対峙しオーブン窯1内側
に隔壁状となって起立配置した仕切壁部51と、仕切壁
部51の上端においてオーブン窯1内側に向けて若干傾
斜した段差状となって装架固定され上面には矩形状を呈
する複数の上部熱源3としての例えば4台のセラミック
ヒーターが長手方向に離間配設した帯板状の固定基台5
2と、固定基台52の外縁端部から直上に向けて配置さ
れた複数の矩形状の孔部55Aが隣接形成されて成る天
井側垂直ダクト部55Bおよび当該天井側垂直ダクト部
55B上側に連通配置した略台形型中空状の排気口55
Cを備えて成るオーブン窯1内部の天井部55と、オー
ブン窯1の操作盤56Aを備えた前面壁部56と、外気
を取り入れるための略矩形状の背面部給気口57Aを形
成した背面壁部57とのそれぞれによって囲繞形成され
た略矩形空間状の冷却用熱交換室Pを備えることによっ
て構成されている。
(Heat Source Cooling Mechanism 50) The specific configuration of the heat source cooling mechanism 50 in the oven apparatus according to the present invention will be described below with reference to FIGS. 12 and 13. First, a case where a ceramic heater is used as the upper heat source 3 will be described. That is, the heat source cooling mechanism 50 of the upper heat source 3 provided on the left and right inside the oven kiln 1 has a plurality of rectangular intake openings for taking in outside air from the side surface air supply port 54C described later through the bottom surface side duct portion. Exposing a bottom surface portion 53 inside the oven kiln 1 having a portion 53A, and a side surface air supply port 54B formed by adhering a heat insulating material 54A inside and forming a plurality of small holes of the bottom surface portion 53 adjacently in a horizontal row. Te oven kiln 1
Side wall portions 54 that form the outer walls of the left and right side surfaces, a partition wall portion 51 that has a gap of a required width with the side wall portions 54, and is erected as a partition wall inside the oven kiln 1 to stand upright, At the upper end of the wall portion 51, for example, four ceramic heaters as a plurality of upper heat sources 3 which are mounted and fixed in a stepped shape slightly inclined toward the inside of the oven kiln and have a rectangular shape on the upper surface are separated in the longitudinal direction. Arranged strip-shaped fixed base 5
2 and a ceiling side vertical duct part 55B formed by adjoining a plurality of rectangular hole parts 55A arranged directly upward from the outer edge part of the fixed base 52 and communicating with the ceiling side vertical duct part 55B upper side. Arranged substantially trapezoidal hollow exhaust port 55
A ceiling 55 inside the oven kiln 1 including C, a front wall 56 provided with an operation panel 56A of the oven kiln 1, and a rear surface having a substantially rectangular back face air supply port 57A for taking in outside air. The cooling heat exchange chamber P has a substantially rectangular shape and is surrounded by the wall portion 57 and the wall portion 57.

【0031】次に以上のように構成された実施の形態に
ついての使用、動作の一例を説明するに、図12に示す
ように、側面壁部54の側面部給気口54Aから底面部
側ダクト部を経て底面部53の取入開口部53Aを通し
て外気がオーブン窯1内部の冷却用熱交換室Pに取り入
れられる。同時に背面壁部57の背面部給気口57Aか
らも外気がオーブン窯1内部の冷却用熱交換室Pに取り
入れられる。冷却用熱交換室Pに取り入れられた外気
は、上部熱源3の下面側の部分である例えばセラミック
ヒーターの場合は通電用のニクロム配線部を冷却した
後、温められた外気は上昇しながら天井部55の天井側
垂直ダクト部55Bを経て排気口55Cから外側に排気
される。このようにして自然対流原理を利用した冷却シ
ステムにより上部熱源3の高温による寿命の低下を防止
するものとしてある。
Next, in order to explain an example of use and operation of the embodiment configured as described above, as shown in FIG. 12, from the side air supply port 54A of the side wall 54 to the bottom side duct. The outside air is taken into the heat exchange chamber P for cooling inside the oven kiln 1 through the intake opening 53A of the bottom surface part 53 through the section. At the same time, outside air is also taken into the cooling heat exchange chamber P inside the oven kiln 1 from the rear surface air supply port 57A of the rear wall portion 57. The outside air taken into the cooling heat exchange chamber P is a portion on the lower surface side of the upper heat source 3, for example, in the case of a ceramic heater, after cooling the energizing nichrome wiring part, the heated outside air rises and the ceiling part rises. The air is exhausted to the outside from the exhaust port 55C through the ceiling-side vertical duct portion 55B of 55. In this way, the cooling system utilizing the principle of natural convection prevents the life of the upper heat source 3 from being shortened due to the high temperature.

【0032】図13には上部熱源3としてセラミックヒ
ーターに替わって赤外線シュバンクバーナーもしくはガ
スバーナーを採用している場合が示されている。すなわ
ち上部熱源3の下面側の部分に配置されている例えば赤
外線シュバンクバーナーもしくはガスバーナー等の混合
管58は高温になるとバーナー自体の寿命が極端に短く
なってしまうのであり、これを回避すべく混合管58を
冷却することでバーナーの寿命を延ばす必要がある。
FIG. 13 shows a case where an infrared Schwank burner or a gas burner is adopted as the upper heat source 3 instead of the ceramic heater. That is, when the temperature of the mixing tube 58 such as an infrared Schwank burner or a gas burner arranged on the lower surface side of the upper heat source 3 becomes extremely high, the life of the burner itself becomes extremely short. Cooling the mixing tube 58 should extend the life of the burner.

【0033】具体的にはこの混合管58の1次空気取入
口58Aに本体外側を断熱した上で充分な空気を送り込
む所謂自然対流原理を利用した冷却システムが利用され
る。例えば固定基台52に配置された赤外線シュバンク
バーナーもしくはガスバーナーの下部側に備えた混合管
58の1次空気取入口58Aを背面壁部57の背面部給
気口57Aに臨ませてある。そして側面壁部54の側面
部給気口54Aから底面部側ダクト部を経て底面部53
の複数の矩形開口部53Aを通して外気がオーブン窯1
内部の冷却用熱交換室Pに取り入れられる。同時に背面
壁部57の背面部給気口57Aからも外気がオーブン窯
1内部の冷却用熱交換室Pに取り入れられる。冷却用熱
交換室Pに取り入れられた外気は、上部熱源3の下面側
の部分である混合管58の1次空気取入口58Aに送ら
れて混合管58自体を冷却した後、温められた外気は上
昇しながら天井部55の天井側垂直ダクト部55Bを経
て排気口55Cから外側に排気される。このように自然
対流原理を利用した冷却システムにより上部熱源3の高
温による寿命の低下を防止するものとしてある。
Specifically, a cooling system utilizing the so-called natural convection principle is used in which sufficient heat is sent to the primary air inlet 58A of the mixing tube 58 while the outside of the main body is insulated. For example, the primary air inlet 58A of the mixing tube 58 provided on the lower side of the infrared Schwank burner or the gas burner arranged on the fixed base 52 is made to face the rear air supply port 57A of the rear wall 57. Then, from the side surface air supply port 54A of the side wall portion 54 to the bottom surface portion 53 via the bottom surface side duct portion.
Outside air through the plurality of rectangular openings 53A of the oven kiln 1
It is taken into the internal heat exchange chamber P for cooling. At the same time, outside air is also taken into the cooling heat exchange chamber P inside the oven kiln 1 from the rear surface air supply port 57A of the rear wall portion 57. The outside air taken into the cooling heat exchange chamber P is sent to the primary air intake port 58A of the mixing pipe 58 which is the lower surface side of the upper heat source 3 to cool the mixing pipe 58 itself, and then the warmed outside air. While rising, the air is exhausted to the outside from the exhaust port 55C through the ceiling side vertical duct portion 55B of the ceiling portion 55. As described above, the cooling system using the principle of natural convection prevents the life of the upper heat source 3 from being shortened due to the high temperature.

【0034】[0034]

【発明の効果】本発明は以上のように構成されているた
めに、上部熱源3による反射部材17への照射領域を任
意に変更すべく上部熱源3の位置や方向を任意に微調整
可能にすることで、被加工物Wの全般のものに対して焼
きムラを生じることなく満遍なく照射できるのである。
また、反射部材17の蓄熱率・輻射効率を向上すること
ができて被加工物Wの全般のものに対して効率良く照射
することができ、さらに下部熱源4からの輻射による対
流熱を調整することができて熱板2下方のみが極端に高
温状態となるのを防止でき、これによって熱板2上の被
加工物Wの下面だけが局部的に焦げてしまうようなこと
を回避できる。また上部熱源3の裏側後方に自然対流を
利用した冷却システムを配置させて上部熱源3の裏側部
位を冷却可能にすることで当該上部熱源3の寿命を延ば
すことができるようにしたオーブン装置を提供すること
ができる。
Since the present invention is configured as described above, the position and direction of the upper heat source 3 can be arbitrarily finely adjusted in order to arbitrarily change the irradiation area of the reflecting member 17 by the upper heat source 3. By doing so, it is possible to uniformly irradiate all the workpieces W without causing unevenness in baking.
Further, the heat storage rate / radiation efficiency of the reflecting member 17 can be improved, and the entire workpiece W can be efficiently irradiated, and convective heat due to radiation from the lower heat source 4 can be adjusted. As a result, it is possible to prevent only the lower side of the hot plate 2 from reaching an extremely high temperature state, and thus it is possible to avoid locally burning only the lower surface of the workpiece W on the hot plate 2. Also, an oven device is provided in which a cooling system using natural convection is arranged behind the upper heat source 3 to enable cooling of the rear side portion of the upper heat source 3, thereby extending the life of the upper heat source 3. can do.

【0035】すなわち、オーブン窯1内の熱板2上に置
かれた被加工物Wに対し上方に向けられている上部熱源
3からの遠近赤外線を乱反射させて熱板2上に拡散放射
して加熱処理を行なうための反射機構10は、オーブン
窯1内の前後で対称的に配置形成した支持部材11によ
ってオーブン窯1の前後に沿って支持される支持棒材1
6外側に挿通されることで支持される反射部材17を備
え、反射部材17は、高蓄熱性・高輻射効率を付与すべ
く支持棒材16に比し熱伝導率が大きく且つ熱拡散率の
大きなパイプ材にて形成され、その内周面には比熱が当
該パイプ材より小さく且つ熱伝導率・熱拡散率が当該パ
イプ材より大きな蓄熱用パイプ材18が貫挿されて成る
ので、オーブン窯1内の蓄熱空間状態を長時間維持させ
ておくことができ、熱板2上にある被加工物Wの全般に
対しての輻射熱による照射加熱効率を従来に比して更に
向上することができる。
That is, the near-infrared rays from the upper heat source 3 directed upward with respect to the workpiece W placed on the hot plate 2 in the oven kiln 1 are diffusely reflected and diffusely radiated onto the hot plate 2. The reflection mechanism 10 for performing the heat treatment is a support rod 1 supported along the front and rear of the oven kiln 1 by a support member 11 symmetrically arranged in the front and rear of the oven kiln 1.
6 is provided with a reflecting member 17 supported by being inserted to the outside, and the reflecting member 17 has a large thermal conductivity and a large thermal diffusivity as compared with the supporting rod 16 in order to provide high heat storage and high radiation efficiency. It is formed of a large pipe material, and a heat storage pipe material 18 having a specific heat smaller than that of the pipe material and a thermal conductivity and a thermal diffusivity larger than that of the pipe material is inserted into the inner peripheral surface of the pipe material. The heat storage space state in 1 can be maintained for a long time, and the irradiation heating efficiency by the radiant heat to all the workpieces W on the hot plate 2 can be further improved as compared with the conventional case. .

【0036】オーブン窯1内の熱板2上に置かれた被加
工物Wに対し上方に向けられている上部熱源3からの遠
近赤外線を反射機構10によって乱反射させて熱板2上
に拡散放射して加熱処理を行ない、熱板2下方に配置し
た下部熱源4によって熱板2自体を加熱するオーブン装
置において、反射機構10の反射部材17に対する上部
熱源3の照射領域を任意に選定するよう上部熱源3には
摺動機構もしくは回転機構等による焼きムラ調整機構2
0、30を備えて成るので、上部熱源3による反射部材
17への照射領域を任意に変更すべく上部熱源3の位置
や方向を容易に微調整することができ、被加工物Wの全
般のものに対して焼きムラ等を生じることなく満遍なく
照射することができる。
Far-infrared rays from the upper heat source 3 directed upward with respect to the workpiece W placed on the hot plate 2 in the oven kiln 1 are diffusely radiated onto the hot plate 2 by being diffusely reflected by the reflecting mechanism 10. In the oven apparatus that heats the heating plate 2 itself by the lower heat source 4 arranged below the heating plate 2, the upper heat source 3 is arbitrarily selected for the reflecting member 17 of the reflecting mechanism 10. As the heat source 3, a baking unevenness adjusting mechanism 2 such as a sliding mechanism or a rotating mechanism is used.
Since 0 and 30 are provided, the position and direction of the upper heat source 3 can be easily fine-tuned to arbitrarily change the irradiation area of the reflecting member 17 by the upper heat source 3, and It is possible to uniformly irradiate an object without causing unevenness of baking.

【0037】摺動機構による焼きムラ調整機構20は、
オーブン窯1の内側壁と熱板2の縁端部との間に所要幅
の間隙を有して起立配置した仕切壁部21の上端に装架
固定させた固定基台22と、複数の上部熱源3が離間配
設した状態で固定配置され且つ固定基台22の上で前後
に摺動可能な摺動板23とを備えて成るので、上部熱源
3による反射部材17への照射領域を任意に変更すべく
上部熱源3の位置を前後水平方向に容易に微調整するこ
とができ、被加工物Wの全般のものに対して焼きムラ等
を生じることなく満遍なく照射することができる。
The unevenness adjusting mechanism 20 using a sliding mechanism is
A fixed base 22 fixedly mounted on the upper end of a partition wall portion 21 standing upright with a gap of a required width between the inner wall of the oven kiln 1 and the edge portion of the heating plate 2, and a plurality of upper portions. Since the heat source 3 is fixedly arranged in a separated state and includes a sliding plate 23 that can slide back and forth on the fixed base 22, the irradiation area of the reflecting member 17 by the upper heat source 3 can be arbitrarily set. The position of the upper heat source 3 can be easily finely adjusted in the front-rear horizontal direction so that the entire workpiece W can be uniformly irradiated without causing unevenness in baking.

【0038】回転機構による焼きムラ調整機構30は、
オーブン窯1の内側壁と熱板2の縁端部との間に所要幅
の間隙を有して起立配置した左右の仕切壁部31の上端
に蝶番33を介して回転可能となるように枢着され且つ
一側片上に複数の上部熱源3が離間配設した状態で固定
された回転基台32と、反射部材17から拡散放射して
きた輻射熱を内側に反射させるべく回転基台32の一側
片上の縁端部とオーブン窯1内部の天井箇所との間に複
数に隣接した状態で連結配置された可撓性を有する仕切
板36と、回転基台32の直角縁部内側において歯部が
外側に向くようにしてネジ固定されたラックギヤ38
と、ラックギヤ38の歯部が噛合されるピニオンギヤ3
9Aを有する駆動モータ39と、回転基台32の他側片
上の縁端部に延設された突起片32Aと、回転基台32
の回転に伴い突起片32Aが当接することで駆動モータ
39の停止制御を行なうよう当該突起片32Aの移動軌
跡上に配された上限・下限の両リミットスイッチLS
1,LS2とを備えて成るので、上部熱源3による反射
部材17への照射領域を任意に変更すべく上部熱源3の
照射方向を略水平状態から例えば回転角度が90°〜4
5°間の最大傾斜状態まで容易に微調整することがで
き、被加工物Wの全般のものに対して焼きムラ等を生じ
ることなく満遍なく照射することができる。
The grilling unevenness adjusting mechanism 30 based on the rotating mechanism is
The inner wall of the oven kiln 1 and the edge of the heating plate 2 are pivoted so as to be rotatable via hinges 33 at the upper ends of the left and right partition wall portions 31 which are vertically arranged with a gap having a required width. The rotary base 32 that is attached and fixed on one side with a plurality of upper heat sources 3 spaced apart from each other, and one side of the rotary base 32 that reflects the radiant heat diffused and radiated from the reflecting member 17 to the inside. A plurality of flexible partition plates 36 are connected and arranged in a state of being adjacent to each other between the edge portion on one side and the ceiling portion inside the oven kiln 1, and the tooth portion is formed inside the right-angled edge portion of the rotary base 32. Rack gear 38 screwed so as to face outward
And the tooth portion of the rack gear 38 meshes with the pinion gear 3
9A, a drive motor 39, a protrusion piece 32A extending to an edge portion on the other side piece of the rotation base 32, and a rotation base 32.
Both the upper and lower limit switches LS arranged on the movement locus of the protrusion 32A so that the drive motor 39 is stopped by the protrusion 32A coming into contact with the rotation of the protrusion 32A.
1 and LS2, the irradiation direction of the upper heat source 3 is changed from a substantially horizontal state in order to arbitrarily change the irradiation area of the reflection member 17 by the upper heat source 3, for example, the rotation angle is 90 ° to 4 °.
Fine adjustment can be easily performed up to the maximum inclination state of 5 °, and the entire workpiece W can be uniformly irradiated without causing unevenness in baking.

【0039】オーブン窯1内の熱板2上に置かれた被加
工物Wに対し上方に向けられている上部熱源3からの遠
近赤外線を反射機構10によって乱反射させて熱板2上
に拡散放射して加熱処理を行ない、熱板2下方に配置し
た下部熱源4によって熱板2自体を加熱するオーブン装
置において、熱板2の左右両側には下部熱源4からの対
流による火力を微調整する開閉移動可能な仕切調整板構
造の対流熱調整機構40を備えて成るので、下部熱源4
からの輻射による対流熱を容易に調整することができて
熱板2下方のみが極端に高温状態となるのを防止でき、
これによって熱板2上の被加工物Wの下面だけが極端に
焦げてしまうようなことが回避できる。
Far infrared rays from the upper heat source 3 directed upward with respect to the workpiece W placed on the heating plate 2 in the oven kiln 1 are diffusely radiated onto the heating plate 2 by being diffusely reflected by the reflection mechanism 10. In the oven device that heats the heating plate 2 itself by the lower heat source 4 disposed below the heating plate 2, the left and right sides of the heating plate 2 are opened and closed to finely adjust the heat generated by convection from the lower heat source 4. Since the convection heat adjusting mechanism 40 having a movable partition adjusting plate structure is provided, the lower heat source 4
It is possible to easily adjust the convective heat due to the radiation from the heat plate 2 and prevent only the lower part of the heat plate 2 from becoming extremely hot.
As a result, it is possible to prevent the lower surface of the workpiece W on the hot plate 2 from being extremely burnt.

【0040】対流熱調整機構40は、オーブン窯1の内
側壁と熱板2の縁端部との間に所要幅の間隙を有して起
立配置し且つ上端に上部熱源3を載置固定した固定基台
42を装架配置させて成る左右の仕切壁部41と、仕切
壁部41内側に位置する熱板2の縁端部から起立配置さ
せた支持フレーム43との間に隙間を形成することで、
熱板2を下側から直接加熱する下部熱源4に対し、上部
熱源3を通ってから熱板2上側へ輻射熱を誘導すべくこ
の隙間によって下部熱源4の輻射熱流路を形成し、上部
熱源3から熱板2上の被加工物W側へ向けて輻射熱が過
度にならないように当該輻射熱を遮蔽すべく上部熱源3
設置側に対向して設けられた支持フレーム43の上端に
おいて任意の高さに架設変更可能な横垂板46と、下部
熱源4からの輻射熱流束を上部熱源3の輻射熱流束と合
流させて対流を生じさせることで熱板2上の被加工物W
側への熱伝達を向上させるよう支持フレーム43の上端
側に調節ネジ44を介して水平方向に移動自在に固定可
能とした調整板45とから構成したので、下部熱源4の
対流による火力を調整するに際し、火力を弱める場合に
は、調節ネジ44の押し込み方向への捻回転により調整
板45Aが支持フレーム43上端側で仕切壁部41側に
近接して下部熱源4の輻射熱流路を塞ぐ方向に移動させ
ることが容易に行える。
The convection heat adjusting mechanism 40 is vertically arranged with a gap having a required width between the inner wall of the oven kiln 1 and the edge of the heating plate 2, and the upper heat source 3 is placed and fixed on the upper end. A gap is formed between the left and right partition wall portions 41 in which the fixed base 42 is mounted and arranged, and the support frame 43 which is arranged upright from the edge of the heat plate 2 located inside the partition wall portion 41. By that,
With respect to the lower heat source 4 which directly heats the heat plate 2 from the lower side, the radiant heat flow path of the lower heat source 4 is formed by this gap to guide the radiant heat to the upper side of the heat plate 2 after passing through the upper heat source 3. From the upper heat source 3 to shield the radiant heat from the heat plate 2 toward the workpiece W so that the radiant heat does not become excessive.
At the upper end of the support frame 43 provided facing the installation side, a horizontal hanging plate 46 that can be erected at an arbitrary height can be installed, and the radiant heat flux from the lower heat source 4 can be combined with the radiant heat flux of the upper heat source 3. Workpiece W on hot plate 2 by generating convection
Since it is composed of an adjusting plate 45 which can be horizontally movably fixed to the upper end side of the support frame 43 through an adjusting screw 44 so as to improve heat transfer to the side, the heat power due to the convection of the lower heat source 4 is adjusted. In this case, when the heating power is weakened, the adjusting plate 45A approaches the partition wall 41 side on the upper end side of the support frame 43 by the twist rotation of the adjusting screw 44 in the pushing direction to close the radiant heat flow path of the lower heat source 4. It can be easily moved to.

【0041】一方、火力を強める場合、調節ネジ44の
引き出し方向への捻回転により調整板45が支持フレー
ム43上端側で仕切壁部41から離反して下部熱源4の
輻射熱流路を拡大する方向に移動させることが容易に行
える。また支持フレーム43に対して架設高さを適宜変
更させて上部熱源3を遮蔽することが可能な横垂板46
によって上部熱源3から熱板2上の被加工物W側へ向け
ての輻射熱の過度の到達を防止させることができる。こ
のように調整板45による輻射熱流路の閉塞乃至拡大、
横垂板46の架設高さの変更等によって、焼成されるべ
き被加工物Wへの輻射熱を均等に分散させることがで
き、当該被加工物Wの焦げ付きを防止できる。また上下
部熱源3,4からの輻射熱流束の合流に伴う対流伝熱に
より、オーブン窯1内を焼成条件に応じた対流熱伝達系
とさせ、これにより被加工物Wに対する焼きムラ等を防
止することができる。
On the other hand, when the heating power is strengthened, the adjusting plate 45 is separated from the partition wall portion 41 on the upper end side of the support frame 43 by the twist rotation of the adjusting screw 44 in the pull-out direction to expand the radiant heat flow path of the lower heat source 4. It can be easily moved to. Further, a horizontal hanging plate 46 capable of shielding the upper heat source 3 by appropriately changing the erection height with respect to the support frame 43.
Thus, it is possible to prevent the radiant heat from excessively reaching from the upper heat source 3 toward the workpiece W on the hot plate 2. In this way, the adjustment plate 45 closes or expands the radiant heat flow path,
By changing the erection height of the horizontal hanging plate 46 or the like, the radiant heat to the workpiece W to be fired can be evenly dispersed, and the burning of the workpiece W can be prevented. In addition, the convection heat transfer due to the confluence of the radiant heat fluxes from the upper and lower heat sources 3 and 4 makes the inside of the oven kiln 1 a convection heat transfer system according to the firing conditions, thereby preventing baking unevenness on the workpiece W. can do.

【0042】オーブン窯1内の熱板2上に置かれた被加
工物Wに対し上方に向けられている上部熱源3からの遠
近赤外線を反射機構10によって乱反射させて熱板2上
に拡散放射して加熱処理を行ない、熱板2下方に配置し
た下部熱源4によって熱板2自体を加熱するオーブン装
置において、オーブン窯1の後側面もしくは左右側面に
設けた給気口からオーブン窯1内部に外気を送り込んで
上下部熱源3,4自体の裏側部分を自然対流によって冷
却する熱源冷却機構50を備えて成るので、上部熱源3
の裏側後方における自然対流により上部熱源3の裏側部
位を効率よく冷却することができ、当該上部熱源3の寿
命を延ばすことができる。
Far infrared rays from the upper heat source 3 directed upward with respect to the workpiece W placed on the hot plate 2 in the oven kiln 1 are diffusely radiated onto the hot plate 2 by being diffusely reflected by the reflecting mechanism 10. In the oven device that heats the hot plate 2 itself by the lower heat source 4 arranged below the hot plate 2, the inside of the oven kiln 1 is supplied from the air inlet provided on the rear side or the left and right side of the oven kiln 1. The upper heat source 3 is provided with the heat source cooling mechanism 50 that sends the outside air and cools the back side portions of the upper and lower heat sources 3 and 4 by natural convection.
The backside portion of the upper heat source 3 can be efficiently cooled by natural convection on the rear side of the upper heat source 3, and the life of the upper heat source 3 can be extended.

【0043】熱源冷却機構50は、外気を取り入れる取
入開口部53Aを有するオーブン窯1内部の底面部53
と、内側に断熱材54Aを貼着し且つ側面部給気口54
Cを有する側面壁部54と、側面壁部54と所要幅の間
隙を有して相対峙しオーブン窯1内側に隔壁状となって
起立配置した仕切壁部51と、仕切壁部51の上端にお
いてオーブン窯1内側に向けて若干傾斜した段差状とな
って装架固定され上面には上部熱源3を離間配設した固
定基台52と、固定基台52の外縁端部から直上に向け
て配置された複数の孔部55Aが隣接形成されて成る天
井側垂直ダクト部55Bおよび当該天井側垂直ダクト部
55B上側に連通配置した略台形型中空状の排気口55
Cを備えて成るオーブン窯1内部の天井部55と、オー
ブン窯1の操作盤56Aを備えた前面壁部56と、外気
を取り入れる背面部給気口57Aを有する背面壁部57
とのそれぞれによって囲繞形成された冷却用熱交換室P
を備えることによって構成したので、側面壁部54の側
面部給気口54Aから底面部53の取入開口部53Aを
通して外気がオーブン窯1内部の冷却用熱交換室Pに取
り入れられると同時に背面壁部57の背面部給気口57
Aからも外気がオーブン窯1内部の冷却用熱交換室Pに
取り入れられるものとなり、冷却用熱交換室Pに取り入
れられた外気によって上部熱源3の下面側の部分を効率
良く冷却することができる。また温められた外気は上昇
しながら天井部55の天井側垂直ダクト部55Bを経て
排気口55Cから外側に容易に排気することができる。
これにより高温な加熱雰囲気中に晒される上下部熱源
3,4自体の裏側部分を他に対流用ファン装置や冷媒機
構による冷却装置等を利用しなくても自然対流によって
効率良く冷却することができ、当該上下部熱源3,4自
体の寿命を延ばすことができる。
The heat source cooling mechanism 50 has a bottom surface 53 inside the oven kiln 1 having an intake opening 53A for taking in outside air.
And the heat insulating material 54A is attached to the inside and the side air supply port 54
A side wall portion 54 having C, a partition wall portion 51 having a gap of a required width with the side wall portion 54 and standing up and arranged as a partition wall inside the oven kiln 1, and an upper end of the partition wall portion 51. In the oven kiln 1, a fixed base 52 having a step shape slightly inclined toward the inside of the oven kiln 1 is fixedly mounted on the upper surface, and an upper heat source 3 is provided on the upper surface at a distance. A ceiling-side vertical duct 55B in which a plurality of arranged holes 55A are formed adjacent to each other, and a substantially trapezoidal hollow exhaust port 55 that is arranged in communication with the upper side of the ceiling-side vertical duct 55B.
A ceiling 55 inside the oven kiln 1 including C, a front wall 56 having an operation panel 56A of the oven kiln 1, and a back wall 57 having a back air supply port 57A for taking in outside air.
And the heat exchange chamber P for cooling that is surrounded by
Since it is configured by including the outside air from the side surface air supply port 54A of the side wall portion 54 through the intake opening portion 53A of the bottom surface portion 53 into the heat exchange chamber P for cooling inside the oven kiln 1, at the same time the rear wall Rear part air supply port 57 of the part 57
The outside air from A is also taken into the cooling heat exchange chamber P inside the oven kiln 1, and the outside air taken into the cooling heat exchange chamber P can efficiently cool the lower surface side portion of the upper heat source 3. . Further, the warmed outside air can be easily exhausted to the outside from the exhaust port 55C via the ceiling side vertical duct portion 55B of the ceiling portion 55 while rising.
As a result, the backside portions of the upper and lower heat sources 3 and 4 exposed to the high-temperature heating atmosphere can be efficiently cooled by natural convection without using a convection fan device or a cooling device with a refrigerant mechanism. It is possible to extend the life of the upper and lower heat sources 3 and 4 themselves.

【0044】上下部熱源3,4は、セラミックヒータ
ー、赤外線シュバンクバーナー等の熱源部材を採用した
ので、上部熱源3からの遠近赤外線を反射機構10によ
って乱反射させて熱板2上に拡散放射して加熱処理を行
ない、下部熱源4からの遠近赤外線によって熱板2自体
を下方から加熱するという蓄熱効果も高められメンテナ
ンスも容易なオーブン装置を提供することができる。
Since the upper and lower heat sources 3 and 4 employ heat source members such as ceramic heaters and infrared Schwank burners, the near-infrared rays from the upper heat source 3 are diffusely reflected by the reflecting mechanism 10 and diffusely radiated onto the hot plate 2. It is possible to provide an oven device in which the heat storage effect is enhanced by performing heat treatment by heating and heating the heating plate 2 itself from below by far-infrared rays from the lower heat source 4, and maintenance is easy.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施の形態におけるオーブン装置の
オーブン窯内部を示す縦断面図である。
FIG. 1 is a vertical cross-sectional view showing the inside of an oven kiln of an oven device according to an embodiment of the present invention.

【図2】同じく上部熱源の傾倒状態の異なる形態を示す
オーブン窯内部の縦断面図である。
FIG. 2 is a vertical cross-sectional view of the inside of an oven kiln showing a configuration in which the upper heat source is tilted differently.

【図3】同じく反射機構の要部概略斜視図である。FIG. 3 is a schematic perspective view of an essential part of the reflection mechanism.

【図4】同じく反射機構における反射部材の要部拡大斜
視図である。
FIG. 4 is an enlarged perspective view of an essential part of a reflection member of the reflection mechanism.

【図5】摺動機構による焼きムラ調整機構の一形態を示
すもので、(a)は摺動状態を説明する斜視図、(b)
は(a)におけるX−X断面図である。
5A and 5B show an embodiment of an unevenness adjusting mechanism using a sliding mechanism, in which FIG. 5A is a perspective view illustrating a sliding state, and FIG.
FIG. 7A is a cross-sectional view taken along line XX in FIG.

【図6】上部熱源がセラミックヒーターである場合の回
転機構による焼きムラ調整機構の一形態を示すもので、
(a)は回転動作前の状態を示す正面図、(b)は回転
動作前の状態を示す側面図である。
FIG. 6 shows an embodiment of a baking unevenness adjusting mechanism by a rotating mechanism when the upper heat source is a ceramic heater,
(A) is a front view showing a state before a rotating operation, and (b) is a side view showing a state before the rotating operation.

【図7】同じく回転動作後の状態を示す正面図である。FIG. 7 is a front view showing the state after the rotation operation.

【図8】上部熱源が赤外線シュバンクバーナーもしくは
ガスバーナーである場合の回転機構による焼きムラ調整
機構の一形態を示すもので、(a)は回転動作前の状態
を示す正面図、(b)は回転動作前の状態を示す側面図
である。
FIG. 8 is a view showing one form of a baking unevenness adjusting mechanism by a rotating mechanism when the upper heat source is an infrared Schbank burner or a gas burner, and (a) is a front view showing a state before rotating operation; [Fig. 6] is a side view showing a state before a rotating operation.

【図9】同じく回転動作後の状態を示す正面図である。FIG. 9 is a front view showing a state after the same rotation operation.

【図10】オーブン装置のオーブン窯内部における対流
熱調整機構の一形態を示す斜視図である。
FIG. 10 is a perspective view showing one form of a convection heat adjustment mechanism inside the oven kiln of the oven device.

【図11】図10中のA部断面図である。11 is a cross-sectional view of a portion A in FIG.

【図12】上部熱源がセラミックヒーターである場合の
オーブン窯内部における熱源冷却機構の一形態を示す斜
視図である。
FIG. 12 is a perspective view showing one form of a heat source cooling mechanism inside the oven kiln when the upper heat source is a ceramic heater.

【図13】上部熱源が赤外線シュバンクバーナーもしく
はガスバーナーである場合のオーブン窯内部における熱
源冷却機構の一形態を示す斜視図である。
FIG. 13 is a perspective view showing one form of a heat source cooling mechanism inside the oven kiln when the upper heat source is an infrared Schwank burner or a gas burner.

【図14】オーブン装置全体の概略斜視図である。FIG. 14 is a schematic perspective view of the entire oven apparatus.

【符号の説明】[Explanation of symbols]

1…オーブン窯 2…熱板 3…上部熱源 4…下部熱源 10…反射機構 11…支持部材 12…固着片 13…連結片 14…取付支持片 15…取付部 16…支持棒材 17…反射部材 18…蓄熱用パイプ材 W…被加工物 20…摺動機構による焼きムラ調整機構 21…仕切壁部 22…固定基台 22A…目盛用スケール 23…摺動板 23A…指針 24…固定金具 25…ネジ孔 26…長孔 27…固定ネジ 30…回転機構による焼きムラ調整機構 31…仕切壁部 32…回転基台 32A…突起片 32B…指針 32C…目盛用スケール 33…蝶番 34…固定金具 35…チェーン
部材 36…仕切板 37…フランジ
部 38…ラックギヤ 39…駆動モー
タ 39A…ピニオンギア 39B…可撓管 LS1…上限リミットスイッチ LS2…下限リ
ミットスイッチ 40…対流熱調整機構 41…仕切壁部 41A…指針 41B…目盛用スケール 42…固定基台 43…支持フレーム 44…調節ネジ 45…調整板 45A…水平面
部 45B…垂直面部 45C…凹部 46…横垂板 47…脚部 48…挿入用溝部 48A…孔部 49…ピン部材 50…熱源冷却機構 51…仕切壁部 52…固定基台 53…底面部 53A…取入開
口部 54…側面壁部 54A…断熱材 54B…側面部給気口 55…天井部 55A…孔部 55B…天井側
垂直ダクト部 55C…排気口 56…前面壁部 56A…操作盤 57…背面壁部 57A…背面部給気口 58…混合管 58A…1次空気取入口 P…冷却用熱交
換室 61…開閉扉
DESCRIPTION OF SYMBOLS 1 ... Oven kiln 2 ... Heating plate 3 ... Upper heat source 4 ... Lower heat source 10 ... Reflection mechanism 11 ... Supporting member 12 ... Fixing piece 13 ... Connecting piece 14 ... Mounting supporting piece 15 ... Mounting part 16 ... Supporting rod 17 ... Reflecting member 18 ... Pipe material for heat storage W ... Workpiece 20 ... Adjusting unevenness mechanism 21 by sliding mechanism 21 ... Partition wall 22 ... Fixed base 22A ... Scale for scale 23 ... Sliding plate 23A ... Pointer 24 ... Fixing metal 25 ... Screw hole 26 ... Slot 27 ... Fixing screw 30 ... Rotation mechanism unevenness adjusting mechanism 31 ... Partition wall portion 32 ... Rotation base 32A ... Projection piece 32B ... Pointer 32C ... Scale for scale 33 ... Hinge 34 ... Fixing metal fitting 35 ... Chain member 36 ... Partition plate 37 ... Flange portion 38 ... Rack gear 39 ... Drive motor 39A ... Pinion gear 39B ... Flexible tube LS1 ... Upper limit switch LS2 ... Lower limit switch 40 ... Convection heat adjusting mechanism 41 ... Partition wall 41A ... Pointer 41B ... Scale 42 ... Fixed base 43 ... Support frame 44 ... Adjusting screw 45 ... Adjusting plate 45A ... Horizontal plane 45B ... Vertical surface 45C ... Recess 46 ... Horizontal drip Plate 47 ... Leg 48 ... Inserting groove 48A ... Hole 49 ... Pin member 50 ... Heat source cooling mechanism 51 ... Partition wall 52 ... Fixed base 53 ... Bottom 53A ... Intake opening 54 ... Side wall 54A ... Heat insulating material 54B ... Side air supply port 55 ... Ceiling part 55A ... Hole part 55B ... Ceiling side vertical duct part 55C ... Exhaust port 56 ... Front wall part 56A ... Operation panel 57 ... Back wall part 57A ... Back part air supply port 58 ... Mixing pipe 58A ... Primary air intake P ... Cooling heat exchange chamber 61 ... Opening / closing door

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 オーブン窯内の熱板上に置かれた被加工
物に対し上方に向けられている上部熱源からの遠近赤外
線を反射機構によって乱反射させて熱板上に拡散放射し
て加熱処理を行ない、熱板下方に配置した下部熱源によ
って熱板自体を加熱するオーブン装置において、反射機
構は、オーブン窯内の前後で対称的に配置形成した支持
部材によってオーブン窯の前後に沿って支持される支持
棒材と、この支持棒材外側に挿通されることで支持され
る反射部材とを備え、反射部材は、高蓄熱性・高輻射効
率を付与すべく支持棒材に比し熱伝導率が大きく且つ熱
拡散率の大きなパイプ材にて形成され、その内周面には
比熱が当該パイプ材より小さく且つ熱伝導率・熱拡散率
が当該パイプ材より大きな蓄熱用パイプ材が貫挿されて
成ることを特徴とするオーブン装置。
1. A heat treatment by diffusely radiating near-infrared rays from an upper heat source directed upward with respect to a workpiece placed on a hot plate in an oven kiln by a reflection mechanism to diffusely radiate on the hot plate. In the oven device that heats the hot plate itself by the lower heat source arranged below the hot plate, the reflection mechanism is supported along the front and rear of the oven kiln by the supporting members symmetrically arranged in the front and rear of the oven kiln. The supporting member has a supporting member and a reflecting member supported by being inserted outside the supporting member, and the reflecting member has a thermal conductivity higher than that of the supporting member in order to provide high heat storage and high radiation efficiency. Is formed of a pipe material having a large thermal conductivity and a large thermal diffusivity, and a heat storage pipe material having a smaller specific heat and a larger thermal conductivity / thermal diffusivity than the pipe material is inserted into the inner peripheral surface of the pipe material. Characterized by Oven equipment.
【請求項2】 オーブン窯内の熱板上に置かれた被加工
物に対し上方に向けられている上部熱源からの遠近赤外
線を反射機構によって乱反射させて熱板上に拡散放射し
て加熱処理を行ない、熱板下方に配置した下部熱源によ
って熱板自体を加熱するオーブン装置において、反射機
構の反射部材に対する上部熱源の照射領域を任意に選定
するよう上部熱源には摺動機構もしくは回転機構等によ
る焼きムラ調整機構を備えて成ることを特徴とするオー
ブン装置。
2. A heat treatment is performed by diffusely radiating near-infrared rays from an upper heat source directed upward with respect to a workpiece placed on a hot plate in an oven kiln by a reflection mechanism to diffusely radiate on the hot plate. In the oven device that heats the hot plate itself by the lower heat source arranged below the hot plate, the upper heat source has a sliding mechanism or a rotating mechanism so that the irradiation area of the upper heat source with respect to the reflecting member of the reflecting mechanism can be arbitrarily selected. An oven device characterized by comprising a baking unevenness adjusting mechanism according to.
【請求項3】 摺動機構による焼きムラ調整機構は、オ
ーブン窯の内側壁と熱板の縁端部との間に所要幅の間隙
を有して起立配置した仕切壁部の上端に装架固定させた
固定基台と、複数の上部熱源が離間配設した状態で固定
配置され且つ固定基台の上で前後に摺動可能な摺動板と
を備えて成る請求項2記載のオーブン装置。
3. A baking unevenness adjusting mechanism using a sliding mechanism is mounted on an upper end of a partition wall portion which is arranged upright with a gap having a required width between an inner wall of an oven kiln and an edge portion of a hot plate. The oven apparatus according to claim 2, further comprising: a fixed base that is fixed, and a slide plate that is fixedly arranged in a state in which a plurality of upper heat sources are spaced apart from each other and that can slide back and forth on the fixed base. .
【請求項4】 回転機構による焼きムラ調整機構は、オ
ーブン窯の内側壁と熱板の縁端部との間に所要幅の間隙
を有して起立配置した左右の仕切壁部の上端に蝶番を介
して回転可能となるように枢着され且つ一側片上に複数
の上部熱源が離間配設した状態で固定された回転基台
と、反射部材から拡散放射してきた輻射熱を内側に反射
させるべく回転基台の一側片上の縁端部とオーブン窯内
部の天井箇所との間に複数に隣接した状態で連結配置さ
れた可撓性を有する仕切板と、回転基台の直角縁部内側
において歯部が外側に向くようにしてネジ固定されたラ
ックギヤと、ラックギヤの歯部が噛合されるピニオンギ
ヤを有する駆動モータと、回転基台の他側片上の縁端部
に延設された突起片と、回転基台の回転に伴い突起片が
当接することで駆動モータの停止制御を行なうよう当該
突起片の移動軌跡上に配された上限・下限の両リミット
スイッチとを備えて成る請求項2記載のオーブン装置。
4. A mechanism for adjusting uneven baking by a rotating mechanism comprises hinges on the upper ends of the left and right partition walls which are vertically arranged with a gap having a required width between the inner wall of the oven kiln and the edge of the hot plate. In order to reflect the radiant heat diffused and radiated from the reflecting member to the inside, the rotary base is rotatably pivoted through and fixed on one side piece with a plurality of upper heat sources spaced apart from each other. Inside the right-angled edge of the rotary base, a flexible partition plate is connected and arranged in a plurality of adjacent positions between the edge on one side of the rotary base and the ceiling location inside the oven kiln. A rack gear fixed with screws so that the teeth face outward, a drive motor having a pinion gear with which the teeth of the rack gear are meshed, and a projection piece extending to an edge portion on the other side piece of the rotation base. , As the rotating base rotates, The oven apparatus according to claim 2, further comprising: an upper limit switch and a lower limit switch disposed on a movement locus of the protrusion so as to perform stop control of the data.
【請求項5】 オーブン窯内の熱板上に置かれた被加工
物に対し上方に向けられている上部熱源からの遠近赤外
線を反射機構によって乱反射させて熱板上に拡散放射し
て加熱処理を行ない、熱板下方に配置した下部熱源によ
って熱板自体を加熱するオーブン装置において、熱板の
左右両側には下部熱源からの対流による火力を微調整す
る開閉移動可能な仕切調整板構造の対流熱調整機構を備
えて成ることを特徴とするオーブン装置。
5. A heat treatment is performed by diffusely radiating near-infrared rays from an upper heat source directed upward with respect to a workpiece placed on a hot plate in an oven kiln by a reflection mechanism to diffusely radiate on the hot plate. In the oven device that heats the hot plate itself by the lower heat source placed below the hot plate, the convection of the partition adjustment plate structure that can be opened and closed can be finely adjusted on the left and right sides of the hot plate due to the convection from the lower heat source. An oven apparatus comprising a heat adjusting mechanism.
【請求項6】 対流熱調整機構は、オーブン窯の内側壁
と熱板の縁端部との間に所要幅の間隙を有して起立配置
し且つ上端に上部熱源を載置固定した固定基台を装架配
置させて成る左右の仕切壁部と、仕切壁部内側に位置す
る熱板の縁端部から起立配置させた支持フレームとの間
に隙間を形成することで、熱板を下側から直接加熱する
下部熱源に対し、上部熱源を通ってから熱板上側へ輻射
熱を誘導すべくこの隙間によって下部熱源の輻射熱流路
を形成し、上部熱源から熱板上の被加工物側へ向けて輻
射熱が過度にならないように当該輻射熱を遮蔽すべく上
部熱源設置側に対向して設けられた支持フレームの上端
において任意の高さに架設変更可能な横垂板と、下部熱
源からの輻射熱流束を上部熱源の輻射熱流束と合流させ
て対流を生じさせることで熱板上の被加工物側への熱伝
達を向上させるよう支持フレームの上端側に調節ネジを
介して水平方向に移動自在に固定可能とした調整板とか
ら構成した請求項5記載のオーブン装置。
6. The convection heat adjusting mechanism is a fixed base in which an inner side wall of an oven kiln and an edge portion of a hot plate are vertically arranged with a gap having a required width, and an upper heat source is placed and fixed on the upper end. By forming a gap between the left and right partition walls formed by mounting and placing the stand and the support frame standing upright from the edge of the heat plate located inside the partition wall, the heat plate is lowered. The radiant heat flow path of the lower heat source is formed by this gap to guide the radiant heat to the upper side of the hot plate after passing through the upper heat source to the lower heat source that is directly heated from the side, and the upper heat source to the work piece side on the hot plate. The radiant heat from the lower heat source and the horizontal hanging plate that can be erected at any height at the upper end of the support frame that is installed facing the upper heat source installation side so as to shield the radiant heat toward the upper side Convection by combining the flux with the radiant heat flux of the upper heat source 6. An adjusting plate which is movably fixed in the horizontal direction via an adjusting screw on the upper end side of the supporting frame so as to improve heat transfer to the workpiece side on the hot plate. Oven equipment.
【請求項7】 オーブン窯内の熱板上に置かれた被加工
物に対し上方に向けられている上部熱源からの遠近赤外
線を反射機構によって乱反射させて熱板上に拡散放射し
て加熱処理を行ない、熱板下方に配置した下部熱源によ
って熱板自体を加熱するオーブン装置において、オーブ
ン窯の後側面もしくは左右側面に設けた給気口からオー
ブン窯内部に外気を送り込んで上下部熱源自体の裏側部
分を自然対流によって冷却する熱源冷却機構を備えて成
ることを特徴とするオーブン装置。
7. A heat treatment by diffusely radiating near-infrared rays from an upper heat source directed upward with respect to an object to be processed placed on a hot plate in an oven kiln by a reflection mechanism to diffusely radiate on the hot plate. In the oven device that heats the hot plate itself by the lower heat source arranged below the hot plate, the outside air is sent into the oven kiln from the air supply port provided on the rear side or the left and right side surfaces of the oven kiln, and An oven apparatus comprising a heat source cooling mechanism for cooling the back side portion by natural convection.
【請求項8】 熱源冷却機構は、外気を取り入れる取入
開口部を有するオーブン窯内部の底面部と、内側に断熱
材を貼着し且つ側面部給気口を有する側面壁部と、側面
壁部と所要幅の間隙を有して相対峙しオーブン窯内側に
隔壁状となって起立配置した仕切壁部と、仕切壁部の上
端においてオーブン窯内側に向けて若干傾斜した段差状
となって装架固定され上面には上部熱源を離間配設した
固定基台と、固定基台の外縁端部から直上に向けて配置
された複数の孔部が隣接形成されて成る天井側垂直ダク
ト部および当該天井側垂直ダクト部上側に連通配置した
略台形型中空状の排気口を備えて成るオーブン窯内部の
天井部と、オーブン窯の操作盤を備えた前面壁部と、外
気を取り入れる背面部給気口を有する背面壁部とのそれ
ぞれによって囲繞形成された冷却用熱交換室を備えるこ
とによって構成した請求項7記載のオーブン装置。
8. The heat source cooling mechanism has a bottom surface inside the oven kiln having an intake opening for taking in outside air, a side wall having a side air supply port and a heat insulator attached inside, and a side wall. Section and a partition wall part that has a required width and is placed upright inside the oven kiln as a partition wall, and a stepped shape that is slightly inclined toward the inside of the oven kiln at the upper end of the partition wall part. A ceiling-side vertical duct part that is fixedly mounted on the upper surface and has a plurality of holes arranged directly upward from the outer edge end of the fixed base and a fixed base on which an upper heat source is spaced apart, and The ceiling part inside the oven kiln, which is provided with a generally trapezoidal hollow exhaust port, which is connected to the upper side of the ceiling side vertical duct part, the front wall part equipped with the operation panel of the oven kiln, and the rear part intake for taking in outside air. Surrounded by each with a back wall that has a vent The oven device according to claim 7, wherein the oven device is provided with a cooling heat exchange chamber formed.
【請求項9】 上下部熱源は、セラミックヒーター、赤
外線シュバンクバーナー等の熱源部材を採用した請求項
1乃至8のいずれか記載のオーブン装置。
9. The oven apparatus according to claim 1, wherein the upper and lower heat sources employ a heat source member such as a ceramic heater or an infrared schwank burner.
JP2002045520A 2002-02-22 2002-02-22 Oven equipment Expired - Fee Related JP3701920B2 (en)

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JP2002045520A JP3701920B2 (en) 2002-02-22 2002-02-22 Oven equipment

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Application Number Title Priority Date Filing Date
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008306964A (en) * 2007-06-14 2008-12-25 Kyuhan Kk Oven apparatus
CN104542751A (en) * 2014-12-31 2015-04-29 广州焙欧机械设备有限公司 Far-infrared reflection device
KR101543471B1 (en) 2009-03-04 2015-08-10 엘지전자 주식회사 Oven range
CN114277237A (en) * 2021-12-28 2022-04-05 江苏百德特种合金有限公司 Heat treatment device for stainless steel bar

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4642872B2 (en) * 2008-04-03 2011-03-02 東京瓦斯株式会社 Oven equipment
JP5346179B2 (en) * 2008-06-16 2013-11-20 キュウーハン株式会社 Oven equipment

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008306964A (en) * 2007-06-14 2008-12-25 Kyuhan Kk Oven apparatus
KR101543471B1 (en) 2009-03-04 2015-08-10 엘지전자 주식회사 Oven range
CN104542751A (en) * 2014-12-31 2015-04-29 广州焙欧机械设备有限公司 Far-infrared reflection device
CN114277237A (en) * 2021-12-28 2022-04-05 江苏百德特种合金有限公司 Heat treatment device for stainless steel bar

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