JP2003221651A - Fe-Ni-BASED AND Fe-Ni-Co-BASED ALLOY BAR FOR SHADOW MASK - Google Patents

Fe-Ni-BASED AND Fe-Ni-Co-BASED ALLOY BAR FOR SHADOW MASK

Info

Publication number
JP2003221651A
JP2003221651A JP2002237093A JP2002237093A JP2003221651A JP 2003221651 A JP2003221651 A JP 2003221651A JP 2002237093 A JP2002237093 A JP 2002237093A JP 2002237093 A JP2002237093 A JP 2002237093A JP 2003221651 A JP2003221651 A JP 2003221651A
Authority
JP
Japan
Prior art keywords
mass
less
degree
integration
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002237093A
Other languages
Japanese (ja)
Other versions
JP3740105B2 (en
Inventor
Yuko Kondo
祐幸 近藤
Kazuhiko Fukamachi
一彦 深町
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mining Holdings Inc
Eneos Corp
Original Assignee
Nippon Mining and Metals Co Ltd
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining and Metals Co Ltd, Nippon Mining Co Ltd filed Critical Nippon Mining and Metals Co Ltd
Priority to JP2002237093A priority Critical patent/JP3740105B2/en
Priority to KR10-2002-0067911A priority patent/KR100500490B1/en
Priority to CNB021527296A priority patent/CN1173064C/en
Publication of JP2003221651A publication Critical patent/JP2003221651A/en
Application granted granted Critical
Publication of JP3740105B2 publication Critical patent/JP3740105B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • C22C38/08Ferrous alloys, e.g. steel alloys containing nickel
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • C22C38/10Ferrous alloys, e.g. steel alloys containing cobalt
    • C22C38/105Ferrous alloys, e.g. steel alloys containing cobalt containing Co and Ni
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • C22C38/02Ferrous alloys, e.g. steel alloys containing silicon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • C22C38/04Ferrous alloys, e.g. steel alloys containing manganese
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • C22C38/06Ferrous alloys, e.g. steel alloys containing aluminium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/06Screens for shielding; Masks interposed in the electron stream
    • H01J29/07Shadow masks for colour television tubes

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a high-strength Fe-Ni-based and Fe-Ni-Co-based alloy bars with high strength for a shadow mask capable of effectively preventing the occurrence of mask unevenness. <P>SOLUTION: In the Fe-Ni-based and Fe-Ni-Co-based alloys which contain Ni of 34-38 mass%, Mn of 0.1-1.0 mass%, C of 0.10 mass% or less and Al of 0.05 mass% or less, the average value αAVE of the ä100} integration degree distribution in the plate thickness direction on a plate surface is 60% or less and the ä100} integration degree α<SB>c</SB>on the plate surface after removing up to 50% of the plate thickness by etching is larger than the ä100} integration degree α<SB>s</SB>on the plate surface. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、カラーテレビあるいは
パソコン用高精細ディスプレイのブラウン管内に配設さ
れる色別選別電極に用いられるシャドウマスク用条に関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a strip for a shadow mask used for a color-selective electrode arranged in a cathode ray tube of a high-definition display for a color television or a personal computer.

【0002】[0002]

【従来の技術】シャドウマスクに用いられる条は、溶解
および鋳造によって製鋼されたインゴットに熱間鍛造お
よび熱間圧延を施し、その後冷間圧延と焼鈍とを繰り返
した後、最終冷間圧延加工を施されて製造される。この
シャドウマスク用条は、エッチングメーカーにおいて脱
脂、整面処理後、フォトレジストを両面に塗付し、そし
てシャドウマスクパターンを焼き付けて現像後、塩化第
二鉄溶液を両面からスプレー噴射することにより穿孔さ
れてシャドウマスクが作製される。
2. Description of the Related Art A strip used for a shadow mask is obtained by subjecting an ingot produced by melting and casting to hot forging and hot rolling, and then repeating cold rolling and annealing, followed by final cold rolling. It is applied and manufactured. This shadow mask strip is degreased and surface-treated by an etching maker, coated with photoresist on both sides, and then baked with a shadow mask pattern and developed, and then perforated by spraying ferric chloride solution from both sides. Then, a shadow mask is produced.

【0003】[0003]

【発明が解決しようとする課題】近年、パソコンディス
プレイの高精細化にともなう孔のファインピッチ化によ
り、シャドウマスク用条には、マスクムラの発生を抑制
する高エッチング穿孔性、高強度化、低熱膨張特性など
が強く求められてきている。マスクムラの発生を抑制し
つつファインピッチに穿孔するためには、材料の厚さを
薄くする必要があるが、厚さを薄くすると剛性が弱くな
り、ハンドリング時の変形やブラウン管組み込み後の耐
衝撃性が弱くなるなどの問題がある。このため、シャド
ウマスク用素材には、エッチング穿孔性と強度の優れる
ものが望まれている。
In recent years, due to the finer pitch of holes accompanying the higher definition of personal computer displays, in the shadow mask strip, high etching piercing property, high strength, and low thermal expansion for suppressing the occurrence of mask unevenness are achieved. Characteristics are strongly demanded. In order to perforate fine pitch while suppressing the occurrence of mask unevenness, it is necessary to reduce the thickness of the material, but if the thickness is reduced, the rigidity becomes weaker, deformation during handling and impact resistance after assembling the cathode ray tube. There is a problem such as weakening. Therefore, the material for the shadow mask is desired to have excellent etching perforation properties and strength.

【0004】エッチング穿孔性を評価する指標の一つと
してエッチングファクター(以下EFと称する)があ
る。EFとはサイドエッチング量(エッチング後の孔の
半径からレジスト開口の半径を引いた寸法)に対するエ
ッチング深さの割合であり、この値が大きい程エッチン
グ穿孔性は優れる。このEFを高くするためには、板面
における{100}方向の集積度(以下、「{100}
集積度」と称する)を高くすることが必要とされ、特
に、{100}集積度が60%以上のときに非常に優れ
たエッチング穿孔性が得られることが知られている。し
かしながら、板面に60%以上もの{100}集積度を
得るためには、最終冷間圧延での加工度を低く抑える必
要がある。このため、加工硬化の程度が制限されるため
に、高強度化への対応が図れない状況にある。
An etching factor (hereinafter referred to as EF) is one of the indexes for evaluating the etching perforation property. The EF is the ratio of the etching depth to the side etching amount (the size of the radius of the hole after etching minus the radius of the resist opening), and the larger this value, the better the etching piercing property. In order to increase this EF, the integration degree in the {100} direction on the plate surface (hereinafter, "{100}
It is known that a very good etching piercing property can be obtained especially when the {100} integration degree is 60% or more. However, in order to obtain a {100} integration degree of 60% or more on the plate surface, it is necessary to suppress the workability in the final cold rolling to be low. For this reason, since the degree of work hardening is limited, it is not possible to cope with high strength.

【0005】[0005]

【課題を解決するための手段】本発明者等は、板面に対
する{100}方向の集積度の板厚方向の分布とエッチ
ング穿孔性との関係について鋭意研究を重ねた結果、マ
スクムラを抑制するためには、エッチングファクターを
高くするよりも、板厚方向での{100}方向の集積度
分布を最適化することで,孔の断面形状を改善すること
が効果的であることを見い出した。
The inventors of the present invention have conducted extensive studies on the relationship between the distribution of the degree of integration in the {100} direction with respect to the plate surface in the plate thickness direction and the etching piercing property. As a result, the mask unevenness is suppressed. In order to achieve this, it was found that it is more effective to improve the cross-sectional shape of the holes by optimizing the integration distribution in the {100} direction in the plate thickness direction rather than increasing the etching factor.

【0006】本発明のシャドウマスク用Fe−Ni系合
金条は、上記知見に基づいてなされたもので、Ni:3
4〜38質量%、Mn:0.1〜1.0質量%を含有
し、C:0.10質量%以下、Si:0.1質量%以
下、Al:0.05質量%以下、不可避的不純物および
実質的Fe残部からなる組成を有し、板面での{10
0}集積度の板厚方向分布における平均値αAVEが6
0%以下であり、かつ板厚の50%までをエッチングで
除去した後の面における{100}集積度αが板面表
面の{100}集積度αよりも大きいことを特徴とし
ている。
The Fe-Ni alloy strip for a shadow mask of the present invention was made on the basis of the above findings. Ni: 3
4-38 mass%, Mn: 0.1-1.0 mass%, C: 0.10 mass% or less, Si: 0.1 mass% or less, Al: 0.05 mass% or less, unavoidable It has a composition consisting of impurities and a substantial balance of Fe, and has a composition of {10
0} The average value α AVE in the distribution in the plate thickness direction is 6
It is characterized in that it is 0% or less and the {100} integration degree α c on the surface after removing up to 50% of the plate thickness by etching is larger than the {100} integration degree α s on the plate surface.

【0007】図1は本発明の作用を説明するための図で
あり、エッチングにより穿孔された孔の断面を示してい
る。図1(A)は、条の板面での{100}集積度の板
厚方向分布における平均値αが60%以下の場合、図1
(B)は、条の板面での{100}集積度の板厚方向分
布における平均値αが60%を上回る場合の孔の断面形
状を示している。これらの図から、図1(B)の場合の
方が図1(A)の場合よりもEFが高いことが判る。ま
た、EFが低い図1(A)の場合には、孔の内周面と表
面との境界が鋭利な断面形状となり、図2(A)に示す
ように、孔の形状が真円ではなくいびつな形状となる。
その結果、マスクムラが発生し易くなる。
FIG. 1 is a view for explaining the operation of the present invention, showing a cross section of a hole punched by etching. FIG. 1 (A) shows that when the average value α of the {100} integration degree in the plate thickness direction distribution on the strip plate surface is 60% or less,
(B) shows the cross-sectional shape of the hole when the average value α in the thickness direction distribution of the {100} integration degree on the strip plate surface exceeds 60%. From these figures, it can be seen that the case of FIG. 1B has a higher EF than the case of FIG. Further, in the case of FIG. 1 (A) where the EF is low, the boundary between the inner peripheral surface and the surface of the hole has a sharp cross-sectional shape, and as shown in FIG. 2 (A), the shape of the hole is not a perfect circle. The shape becomes distorted.
As a result, mask unevenness is likely to occur.

【0008】一方、{100}集積度を高くするために
は、前述の通り、最終冷間圧延での加工度を低く抑える
必要があり、高強度化への対応が図れない。本発明は、
{100}集積度の板厚方向分布における平均値αを6
0%以下としながら、図1(B)および図2(B)に示
すような孔を得るものである。すなわち、本発明のシャ
ドウマスク用Fe−Ni系合金条では、板厚表層部の
{100}集積度を内部よりも低く(EFを小さく)し
ているので、表層近傍では、スプレー噴射方向に対して
水平方向へのエッチング速度が増すために、図1(B)
に示すように、孔の縁がなめらかな断面形状が得られ、
図2(B)に示すように、真円に近い孔を得ることがで
きる。このように、スプレー噴射により孔を穿孔する場
合、板厚方向での{100}集積度の分布は、表層近傍
が小さく、内部が高いほうが良好な孔断面形状が得られ
る。また、板厚方向の内側では{100}集積度が高い
ためEFが高く、良好なエッチング穿孔性を得ることが
できる。
On the other hand, in order to increase the {100} integration degree, as described above, it is necessary to suppress the workability in the final cold rolling to be low, and it is not possible to cope with the high strength. The present invention is
The average value α in the thickness direction distribution of {100} integration is 6
The hole as shown in FIG. 1 (B) and FIG. 2 (B) is obtained while the content is 0% or less. That is, in the Fe—Ni-based alloy strip for shadow masks of the present invention, the {100} integration degree of the plate thickness surface layer portion is lower than the inside (the EF is small). 1 (B) because the horizontal etching rate is increased.
As shown in, a smooth cross-sectional shape of the edge of the hole is obtained,
As shown in FIG. 2 (B), a hole close to a perfect circle can be obtained. As described above, when the holes are formed by spray injection, the distribution of the {100} integration degree in the plate thickness direction is small near the surface layer, and the higher the inside, the better the hole cross-sectional shape. Further, since the {100} integration degree is high on the inner side in the plate thickness direction, the EF is high and a good etching piercing property can be obtained.

【0009】また、本発明では、板面での{100}集
積度の板厚方向分布における平均値αAVEが60%以
下であるため、最終圧延での加工硬化の度合いが高く、
したがって、強度を高めることができる。ここで、{1
00}集積度とは、下記数1によって算出される。ま
た、各結晶面の積分強度I(hkl)はX線回折(以下
XRDという。)により、それぞれ方位ピーク位置(2
θ)の±3°の範囲における積分強度からバックグラウ
ンドを引いた強度である。
Further, in the present invention, since the average value α AVE in the distribution in the plate thickness direction of the {100} integration degree on the plate surface is 60% or less, the degree of work hardening in the final rolling is high,
Therefore, the strength can be increased. Where {1
00} degree of integration is calculated by the following mathematical expression 1. Further, the integrated intensity I (hkl) of each crystal plane is determined by X-ray diffraction (hereinafter referred to as XRD), and the azimuth peak position (2) is obtained.
θ) is the intensity obtained by subtracting the background from the integrated intensity in the range of ± 3 °.

【0010】[0010]

【数1】{100}集積度(%)α=I(200)/
{I(111)+I(200)+I(220)+I(3
11)}×100
## EQU1 ## {100} Accumulation degree (%) α = I (200) /
{I (111) + I (200) + I (220) + I (3
11)} × 100

【0011】また、板面での{100}集積度の板厚方
向分布における平均値αAVEは下記数2で定義され
る。また、図3は、本発明における{100}集積度の
分布を示す図である。
Further, the average value α AVE in the distribution in the plate thickness direction of the {100} integration degree on the plate surface is defined by the following expression 2. Further, FIG. 3 is a diagram showing the distribution of the {100} integration degree in the present invention.

【0012】[0012]

【数2】 [Equation 2]

【0013】実際には、平均値αAVEは図4に示すよ
うに近似的に求めることができる。各合金の表面,およ
びスプレーエッチングで片面から12μm(板厚の10
%相当)、36μm(板厚の30%相当)、60μm
(板厚の50%相当)除去した面で、XRDを用いて測
定した。
In practice, the average value α AVE can be approximately calculated as shown in FIG. 12 μm from the surface of each alloy and one side by spray etching (plate thickness 10
%), 36 μm (30% of plate thickness), 60 μm
The measured surface (corresponding to 50% of the plate thickness) was measured using XRD.

【0014】上記したような本発明の作用、効果を確実
に得るためには、板厚の50%までをエッチングで除去
した後の面における{100}集積度αの板面表面の
{100}集積度αに対する割合は、1.2以上であ
ることが望ましい。
In order to surely obtain the above-described action and effect of the present invention, {100} of the plate surface having {100} integration degree α c on the surface after removing up to 50% of the plate thickness by etching {100}. } The ratio to the integration degree α s is preferably 1.2 or more.

【0015】また、上記したシャドウマスク用Fe−N
i系合金条はアンバー合金の範疇に入るものであるが、
Fe−Ni−Co系合金条は、Fe−Ni系合金条より
さらに低熱膨張であり、また、強度も高くシャドウマス
ク用として優れていることから本発明の特徴の一つであ
る。すなわち、本発明のシャドウマスク用Fe−Ni−
Co系合金条は、Ni:28〜34質量%、Co:2〜
7質量%、Mn:0.1〜1.0質量%を含有し、C:
0.10質量%以下、Si:0.1質量%以下、Al:
0.05質量%以下、不可避的不純物および実質的Fe
残部からなる組成を有し、板面での{100}集積度の
板厚方向分布における平均値αAVEが60%以下であ
り、かつ板厚の50%までをエッチングで除去した後の
{100}集積度αが板面表面の{100}集積度α
よりも大きいことを特徴としている。なお、上記合金
条ではNiと類似した作用を有するCoを添加すること
から、Niの含有量を28〜34質量%に減らしてい
る。
Further, the above-mentioned Fe-N for shadow mask is used.
i-type alloy strips fall into the category of amber alloys,
The Fe-Ni-Co alloy strip has a lower thermal expansion than the Fe-Ni alloy strip, and also has high strength and is excellent for a shadow mask, which is one of the features of the present invention. That is, Fe-Ni- for the shadow mask of the present invention
The Co-based alloy strip has Ni: 28 to 34 mass% and Co: 2 to
7% by mass, Mn: 0.1 to 1.0% by mass, and C:
0.10 mass% or less, Si: 0.1 mass% or less, Al:
0.05 mass% or less, inevitable impurities and substantial Fe
It has a composition consisting of the balance, the average value α AVE in the thickness direction distribution of the {100} integration degree on the plate surface is 60% or less, and {100} after removing up to 50% of the plate thickness by etching. } The degree of integration α c is {100} the degree of integration α of the plate surface
It is characterized by being larger than s . In addition, since Co having a similar action to Ni is added to the above alloy strip, the content of Ni is reduced to 28 to 34 mass%.

【0016】上記のシャドウマスク用合金条も前記のも
のと同等の作用、効果を得ることができる。また、その
ような本発明の作用、効果を確実に得るためには、板厚
の50%までをエッチングで除去した後の面における
{100}集積度αの板面表面の{100}集積度α
に対する割合は、1.2以上であることが望ましい。
また、上記のシャドウマスク用Fe−Ni系およびFe
−Ni−Co系合金条において、「実質的Fe残部」と
は、Fe以外にも本発明の合金条の特性を変化させない
元素であれば含有し得ることを意味している。
The above-mentioned alloy strip for shadow masks can also obtain the same actions and effects as those described above. Further, in order to surely obtain the action and effect of the present invention, {100} integration on the plate surface having {100} integration degree α c on the surface after removing up to 50% of the plate thickness by etching is performed. Degree α
The ratio to s is preferably 1.2 or more.
Further, the above-mentioned Fe-Ni system for shadow mask and Fe
In the —Ni—Co alloy strip, “substantially Fe balance” means that other than Fe, any element that does not change the properties of the alloy strip of the present invention can be contained.

【0017】シャドウマスクに用いられる条には、エッ
チング後の熱処理工程におけるシャドウマスクどうしの
密着(焼付き)を防ぐことを目的として圧延面にダル目
と称される凹凸模様が施される。このダル目模様は、例
えばショット加工などにより表面に適当な凹凸加工を施
された圧延ロール(以後ダルロールと称す)によって圧
延することで得られる。圧延加工においては、加工度を
高くするに従って表層部と内部とで変形量差が生じ、特
に、ダルロールではブライトロールに比べて材料表面と
の摩擦力が高いためにその傾向が顕著である。本発明の
シャドウマスク用合金条では、そのようなダルロールを
用いて、最終の圧延加工度、ダルロールの直径を制御す
ることで、表層部の{100}集積度を低く制御した最
適な{100}集積度分布を得ることができる。なお、
本発明では上記のように成分を規定しているが、添加さ
れる元素はそのような成分に限定されるものではなく、
NiやMn等の機能を損なわない限り任意の成分を含有
することができる。また、請求項1はFe−Ni系合金
であるが、Niの添加に随伴して微量の(0.02%以
下)Coが含有される。したがって、Coが0.02%
以下で含まれる場合には、Fe−Ni系合金の範疇に含
まれる。
The strips used for the shadow mask are provided with a concavo-convex pattern called a dull on the rolling surface for the purpose of preventing the shadow masks from adhering (burning) to each other in the heat treatment process after etching. This dull pattern can be obtained by rolling with a rolling roll (hereinafter referred to as a dull roll) whose surface is appropriately roughened by shot processing or the like. In the rolling process, a deformation amount difference occurs between the surface layer portion and the inside as the workability is increased, and this tendency is particularly remarkable in the dull roll because the friction force with the material surface is higher than that in the bright roll. In the alloy strip for shadow masks of the present invention, such a dull roll is used to control the final rolling degree and the diameter of the dull roll, and thus the {100} integration degree of the surface layer portion is controlled to be the optimum {100}. An integration degree distribution can be obtained. In addition,
Although the present invention defines the components as described above, the added element is not limited to such components,
Any component can be contained as long as the functions of Ni, Mn, etc. are not impaired. Further, although claim 1 is an Fe-Ni-based alloy, a trace amount (0.02% or less) of Co is contained with the addition of Ni. Therefore, Co is 0.02%
When included below, it is included in the category of Fe-Ni based alloys.

【0018】[0018]

【実施例】次に、実施例により本発明をさらに詳細に説
明する。表1に示す組成の合金A,Bを真空溶解にて溶
製し、次にインゴットを熱間鍛造、熱間圧延した。この
場合において、合金Aは請求項1,2に規定する組成で
あり、合金Bは請求項3,4に規定する組成である。つ
いで表面の酸化スケール除去後に冷間圧延と焼鈍とを繰
り返した後、最終冷間圧延を施し0.12mm厚さの合
金条を製造した。最終の冷間圧延の加工度とその冷間圧
延で用いたダルロールの直径を表2に示した。また、各
合金条の0.2%耐力を測定し、その結果を表2に併記
した。さらに、各合金の表面,およびスプレーエッチン
グで片面から12μm(板厚の10%相当)、36μm
(板厚の30%相当)、60μm(板厚の50%相当)
除去した面で、XRDを用いて測定した。
EXAMPLES Next, the present invention will be described in more detail by way of examples. Alloys A and B having the compositions shown in Table 1 were melted by vacuum melting, and then the ingot was hot forged and hot rolled. In this case, alloy A has the composition defined in claims 1 and 2, and alloy B has the composition defined in claims 3 and 4. Then, after removing the oxide scale on the surface, cold rolling and annealing were repeated, and finally cold rolling was performed to manufacture an alloy strip having a thickness of 0.12 mm. Table 2 shows the final cold workability and the diameter of the dull roll used in the cold rolling. Further, the 0.2% proof stress of each alloy strip was measured, and the results are also shown in Table 2. Furthermore, the surface of each alloy and 12 μm from one side by spray etching (corresponding to 10% of the plate thickness), 36 μm
(Equivalent to 30% of plate thickness), 60 μm (Equivalent to 50% of plate thickness)
The removed surface was measured using XRD.

【0019】[0019]

【表1】 [Table 1]

【0020】得られた集積度を表2に併記した。また、
それらの集積度から、板厚方向分布における平均値を図
4に示すように厚さの0〜50%までの深さの割合で近
似的に求め、平均値αAVEとして表2に併記した。さ
らに、表面の{100}集積度αに対する板厚の中心
における{100}集積度αの割合を求め、その結果
を表2に併記した。
The obtained degree of integration is also shown in Table 2. Also,
The average value in the distribution in the plate thickness direction was approximately calculated from the degree of accumulation in the depth ratio of 0 to 50% of the thickness as shown in FIG. 4, and the average value α AVE is also shown in Table 2. Further, the ratio of the {100} integration degree α c at the center of the plate thickness to the {100} integration degree α s of the surface was determined, and the results are also shown in Table 2.

【0021】[0021]

【表2】 [Table 2]

【0022】次に、公知のフォトエッチング法によりこ
れら合金条の両面にフォトレジストを塗付し、そしてパ
ターンを焼き付けて現像後、塩化第二鉄溶液を両面から
スプレーすることにより穿孔し、シャドウマスクを作製
した。得られたシャドウマスクを暗室内で透過光あるい
は反射光による観察をおこないマスクムラの有無を確認
した。マスクムラが発生した場合を「×」、発生しなか
った場合を「○」、マスクムラの発生はあるが使用上問
題ない場合を「△」として表2に併記した。さらに、測
定した0.2%耐力からマスク強度を評価し、マスク強
度が不充分な場合を「×」、充分な場合を「○」として
表2に併記した。
Next, a photoresist is applied to both sides of these alloy strips by a known photoetching method, and after a pattern is baked and developed, a ferric chloride solution is sprayed from both sides to perforate a shadow mask. Was produced. The obtained shadow mask was observed in a dark room with transmitted light or reflected light to confirm the presence or absence of mask unevenness. The results are shown in Table 2 as "X" when the mask unevenness occurs, "O" when the mask unevenness does not occur, and "Δ" when the mask unevenness occurs but there is no problem in use. Further, the mask strength was evaluated from the measured 0.2% proof stress, and when the mask strength was insufficient, it was shown as "x", and when it was sufficient, it was shown in Table 2 together.

【0023】表2から判るように、実施例では、40%
の最終加工を行ったために合金条の加工硬化が充分にな
され、充分なマスク強度が得られた。また、加工度が高
いため、{100}集積度の板厚方向分布における平均
値αAVEが60%以下となった。さらに、実施例で
は、直径が50〜60mmのダルロールを用いたため、
合金条の表層部の加工歪が大きくなり、表面の{10
0}集積度αが小さくなり、α/αが1を上回っ
た。直径が60mmの実施例5〜6はマスクムラの発生
はあったが使用上問題なく,直径が50mmの実施例1
〜4はマスクムラが発生しなかった。また,いずれもマ
スク強度が充分だった。
As can be seen from Table 2, in the embodiment, 40%
Since the final processing was performed, the work hardening of the alloy strip was sufficiently performed and sufficient mask strength was obtained. Further, since the workability was high, the average value α AVE in the distribution in the plate thickness direction of the {100} integration degree was 60% or less. Further, in the example, since the dull roll having a diameter of 50 to 60 mm was used,
The work strain of the surface layer of the alloy strip becomes large, and the surface {10
0} The degree of integration α s decreased, and α c / α s exceeded 1. In Examples 5 to 6 with a diameter of 60 mm, mask unevenness occurred, but there was no problem in use, and Example 1 with a diameter of 50 mm was used.
In Nos. 4 to 4, no mask unevenness occurred. In addition, the mask strength was sufficient in all cases.

【0024】これに対して、比較例7〜10では、最終
加工度が30%と低く、板厚方向の{100}集積度α
の分布が60%を超えるので、ロールの直径に係らずマ
スクムラは発生しなかった。しかしながら、最終加工度
が低いため、マスク強度は不充分であった。なお、B合
金の比較例8,10のマスク強度はA合金の実施例1,
2より高いが、高いマスク強度も要求されることのある
B合金としては不充分である。一方、最終加工度を大き
くした比較例11,12では、マスク強度が充分であっ
たが、ロールの直径が大きいためにマスクムラが発生し
た。最終加工でのダルロールの直径が大きいと加工歪層
が深くなるためにα/αが小さくなり、その結果、
マスクムラが発生する。
On the other hand, in Comparative Examples 7 to 10, the final workability was as low as 30%, and the {100} integration degree α in the plate thickness direction was obtained.
Distribution of more than 60%, no mask unevenness occurred regardless of the diameter of the roll. However, since the final workability was low, the mask strength was insufficient. The mask strengths of the B alloys of Comparative Examples 8 and 10 are the same as those of the A alloy of Example 1,
Although it is higher than 2, it is insufficient as a B alloy which may require high mask strength. On the other hand, in Comparative Examples 11 and 12 in which the final workability was increased, the mask strength was sufficient, but the mask diameter was large, so that mask unevenness occurred. If the diameter of the dull roll in the final processing is large, the processing strained layer becomes deeper, so that α c / α s becomes smaller, and as a result,
Mask unevenness occurs.

【0025】[0025]

【発明の効果】以上説明したように本発明によれば、板
面での{100}集積度の板厚方向分布における平均値
αAVEが60%以下であり、かつ板厚の50%までを
エッチングで除去した後の面における{100}集積度
αが板面表面の{100}集積度αよりも大きいか
ら、高強度でかつマスクムラの発生を有効に防止するこ
とができるという効果が得られる。
As described above, according to the present invention, the average value α AVE in the thickness direction distribution of the {100} integration degree on the plate surface is 60% or less, and up to 50% of the plate thickness. Since the {100} integration degree α c on the surface after removal by etching is larger than the {100} integration degree α s on the plate surface, it is possible to effectively prevent generation of mask unevenness with high strength. can get.

【図面の簡単な説明】[Brief description of drawings]

【図1】 エッチングで穿孔した孔の断面形状を示す図
である。
FIG. 1 is a diagram showing a cross-sectional shape of a hole punched by etching.

【図2】 エッチングで穿孔した孔の平面形状を示す図
である。
FIG. 2 is a diagram showing a planar shape of holes punched by etching.

【図3】 本発明における{100}集積度の分布を示
す図である。
FIG. 3 is a diagram showing a distribution of {100} integration degree in the present invention.

【図4】 板面での{100}集積度の板厚方向分布に
おける平均値αAV を近似的に求める方法を示す線図
である。
FIG. 4 is a diagram showing a method of approximately obtaining an average value α AV E in a plate thickness direction distribution of {100} integration degree on a plate surface.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 Ni:34〜38質量%、Mn:0.1
〜1.0質量%を含有し、C:0.10質量%以下、S
i:0.1質量%以下、Al:0.05質量%以下、不
可避的不純物および実質的Fe残部からなる組成を有
し、板面での{100}集積度の板厚方向分布における
平均値αAVEが60%以下であり、かつ板厚の50%
までをエッチングで除去した後の面における{100}
集積度α が板面表面の{100}集積度αよりも大
きいことを特徴とするシャドウマスク用Fe−Ni系合
金条。
1. Ni: 34 to 38 mass%, Mn: 0.1
To 1.0% by mass, C: 0.10% by mass or less, S
i: 0.1 mass% or less, Al: 0.05 mass% or less, not
It has a composition consisting of inevitable impurities and the substantial balance of Fe.
However, in the distribution in the thickness direction of the {100} integration degree on the plate surface
Average value αAVEIs 60% or less and 50% of the plate thickness
Up to {100} on the surface after removal by etching
Degree of accumulation α cIs the {100} integration degree α of the plate surfacesGreater than
Fe-Ni compound for shadow masks characterized by a threshold
Gold strip.
【請求項2】 Ni:34〜38質量%、Mn:0.1
〜1.0質量%を含有し、C:0.10質量%以下、S
i:0.1質量%以下、Al:0.05質量%以下、不
可避的不純物および実質的Fe残部からなる組成を有
し、板面での{100}集積度の板厚方向分布における
平均値αAVEが60%以下であり、かつ板厚の50%
までをエッチングで除去した後の面における{100}
集積度α の板面表面の{100}集積度αに対する
割合が1.2以上であることを特徴とするシャドウマス
ク用Fe−Ni系合金条。
2. Ni: 34 to 38 mass%, Mn: 0.1
To 1.0% by mass, C: 0.10% by mass or less, S
i: 0.1 mass% or less, Al: 0.05 mass% or less, not
It has a composition consisting of inevitable impurities and the substantial balance of Fe.
However, in the distribution in the thickness direction of the {100} integration degree on the plate surface
Average value αAVEIs 60% or less and 50% of the plate thickness
Up to {100} on the surface after removal by etching
Degree of accumulation α c{100} accumulation degree α of the plate surface ofsAgainst
Shadow mass characterized by a ratio of 1.2 or more
Fe-Ni alloy strips for steel.
【請求項3】 Ni:28〜34質量%、Co:2〜7
質量%、Mn:0.1〜1.0質量%を含有し、C:
0.10質量%以下、Si:0.1質量%以下、Al:
0.05質量%以下、不可避的不純物および実質的Fe
残部からなる組成を有し、板面での{100}集積度の
板厚方向分布における平均値αAVEが60%以下であ
り、かつ板厚の50%までをエッチングで除去した後の
{100}集積度αが板面表面の{100}集積度α
よりも大きいことを特徴とするシャドウマスク用Fe
−Ni−Co系合金条。
3. Ni: 28 to 34% by mass, Co: 2 to 7
% By weight, Mn: 0.1-1.0% by weight, C:
0.10 mass% or less, Si: 0.1 mass% or less, Al:
0.05 mass% or less, inevitable impurities and substantial Fe
It has a composition consisting of the balance, the average value α AVE in the thickness direction distribution of the {100} integration degree on the plate surface is 60% or less, and {100} after removing up to 50% of the plate thickness by etching. } The degree of integration α c is {100} the degree of integration α of the plate surface
Fe for shadow mask characterized by being larger than s
-Ni-Co alloy strip.
【請求項4】 Ni:28〜34質量%、Co:2〜7
質量%、Mn:0.1〜1.0質量%を含有し、C:
0.10質量%以下、Si:0.1質量%以下、Al:
0.05質量%以下、不可避的不純物および実質的Fe
残部からなる組成を有し、板面での{100}集積度の
板厚方向分布における平均値αAVEが60%以下であ
り、かつ板厚の50%までをエッチングで除去した後の
{100}集積度αの板面表面の{100}集積度α
に対する割合が1.2以上であることを特徴とするシ
ャドウマスク用Fe−Ni−Co系合金条。
4. Ni: 28 to 34% by mass, Co: 2 to 7
% By weight, Mn: 0.1-1.0% by weight, C:
0.10 mass% or less, Si: 0.1 mass% or less, Al:
0.05 mass% or less, inevitable impurities and substantial Fe
It has a composition consisting of the balance, the average value α AVE in the thickness direction distribution of the {100} integration degree on the plate surface is 60% or less, and {100} after removing up to 50% of the plate thickness by etching. } {100} degree of integration α of the plate surface with degree of integration α c
A Fe-Ni-Co alloy strip for a shadow mask, characterized in that the ratio to s is 1.2 or more.
JP2002237093A 2001-11-20 2002-08-15 Fe-Ni and Fe-Ni-Co alloy strips for shadow mask Expired - Fee Related JP3740105B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002237093A JP3740105B2 (en) 2001-11-20 2002-08-15 Fe-Ni and Fe-Ni-Co alloy strips for shadow mask
KR10-2002-0067911A KR100500490B1 (en) 2001-11-20 2002-11-04 Fe-Ni BASED ALLOY STRIP AND Fe-Ni-Co BASED ALLOY STRIP FOR SHADOW MASK
CNB021527296A CN1173064C (en) 2001-11-20 2002-11-20 Fe-Ni and Fe-Ni-Co alloy strip for shadow mask plate

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001-354603 2001-11-20
JP2001354603 2001-11-20
JP2002237093A JP3740105B2 (en) 2001-11-20 2002-08-15 Fe-Ni and Fe-Ni-Co alloy strips for shadow mask

Publications (2)

Publication Number Publication Date
JP2003221651A true JP2003221651A (en) 2003-08-08
JP3740105B2 JP3740105B2 (en) 2006-02-01

Family

ID=26624612

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (3)

Country Link
JP (1) JP3740105B2 (en)
KR (1) KR100500490B1 (en)
CN (1) CN1173064C (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI621719B (en) * 2015-11-04 2018-04-21 Jx Nippon Mining & Metals Corp Metal mask material and metal mask

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6314841A (en) * 1986-07-04 1988-01-22 Nippon Mining Co Ltd Shadow mask material and shadow mask
JP2929881B2 (en) * 1992-01-31 1999-08-03 日本鋼管株式会社 Metal sheet for shadow mask with excellent etching processability
CN1035778C (en) * 1993-07-22 1997-09-03 日本钢管株式会社 An alloy sheet having high etching performance
JPH08273433A (en) * 1995-03-29 1996-10-18 Nikko Kinzoku Kk Raw material for fe-ni alloy lead frame
MY123398A (en) * 1997-05-09 2006-05-31 Toyo Kohan Co Ltd Invar alloy steel sheet for shadow mask, method for producing same, shadow mask, and color picture tube

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI621719B (en) * 2015-11-04 2018-04-21 Jx Nippon Mining & Metals Corp Metal mask material and metal mask

Also Published As

Publication number Publication date
KR20030043635A (en) 2003-06-02
CN1173064C (en) 2004-10-27
KR100500490B1 (en) 2005-07-12
CN1420196A (en) 2003-05-28
JP3740105B2 (en) 2006-02-01

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