JP2003211616A - Ptfe resin laminated sheet and method for manufacturing the same - Google Patents

Ptfe resin laminated sheet and method for manufacturing the same

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Publication number
JP2003211616A
JP2003211616A JP2002013176A JP2002013176A JP2003211616A JP 2003211616 A JP2003211616 A JP 2003211616A JP 2002013176 A JP2002013176 A JP 2002013176A JP 2002013176 A JP2002013176 A JP 2002013176A JP 2003211616 A JP2003211616 A JP 2003211616A
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JP
Japan
Prior art keywords
ptfe resin
laminated sheet
manufacturing
ptfe
resin laminated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002013176A
Other languages
Japanese (ja)
Other versions
JP3909246B2 (en
Inventor
Takashi Ooyabe
隆 大矢部
Tsuneo Katayama
統夫 片山
Takashi Kobiya
隆 古比谷
Seiichi Nishimoto
清一 西本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Risho Kogyo Co Ltd
Original Assignee
Risho Kogyo Co Ltd
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Priority to JP2002013176A priority Critical patent/JP3909246B2/en
Publication of JP2003211616A publication Critical patent/JP2003211616A/en
Application granted granted Critical
Publication of JP3909246B2 publication Critical patent/JP3909246B2/en
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Expired - Lifetime legal-status Critical Current

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a PTFE resin laminated sheet modified so as to be made high in elastic modulus and low in the coefficient of thermal expansion. <P>SOLUTION: A laminated sheet, obtained by laminating a plurality of PTFE resin prepregs to heat them under pressure, is irradiated with radiation and subsequently subjected to annealing treatment. By this method, the PTFE resin laminated sheet is increased in elastic modulus, reduced in the coefficient of thermal expansion and improved in handleability or drilling precessability in a processing process and through-hole reliability. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】この発明は、弾性率が高く、
熱膨張率の低い、高周波機器等に使用して好適なPTF
E樹脂積層板を製造する方法に関するものである。
TECHNICAL FIELD The present invention has a high elastic modulus,
PTF with a low coefficient of thermal expansion and suitable for high frequency equipment
The present invention relates to a method for manufacturing an E resin laminated board.

【0002】[0002]

【従来の技術】フッ素樹脂は高分子化合物の中でも非常
に特異的な性質をもった工業用高分子材料であり、様々
な応用製品が市場に提供されている。
2. Description of the Related Art Fluororesin is an industrial polymer material having a very specific property among polymer compounds, and various applied products are provided on the market.

【0003】特に、フッ素樹脂需要の7割を占める代表
的なPTFE(ポリテトラフルオロエチレン)樹脂は融
点327℃、誘電率2.1(1MHz)など、他のエン
ジニアプラスチックにはない特質を備えている。その具
体的な特質としては、耐熱性、耐薬品性、耐溶剤性、耐
湿性、低誘電特性、絶縁性、耐摩耗性、滑性、非粘着
性、撥水性、耐候性、純度などに優れていることが挙げ
られる。
In particular, a typical PTFE (polytetrafluoroethylene) resin, which accounts for 70% of the demand for fluororesin, has characteristics not found in other engineering plastics, such as a melting point of 327 ° C. and a dielectric constant of 2.1 (1 MHz). There is. Its specific characteristics are excellent in heat resistance, chemical resistance, solvent resistance, moisture resistance, low dielectric properties, insulation, abrasion resistance, lubricity, non-adhesiveness, water repellency, weather resistance, purity, etc. Are listed.

【0004】これらの特質を生かした各種PTFE樹脂
製品は、多岐にわたり、フィルム、シート、積層板、金
属箔付き積層板、パイプ等のフッ素樹脂部品が多くの産
業分野で使用されており、これに変わるような材料は他
に見当たらない。
Various PTFE resin products that make use of these characteristics are diversified, and fluororesin parts such as films, sheets, laminates, laminates with metal foil, and pipes are used in many industrial fields. No other material is changing.

【0005】特に、高周波機器に使用される積層板の分
野においては、誘電特性の点で優れた銅張りPTFE樹
脂積層板が主として用いられており、今後高度情報通信
社会においてその需要は拡大するものと期待されてい
る。
In particular, in the field of laminated plates used for high-frequency equipment, copper-clad PTFE resin laminated plates, which are excellent in terms of dielectric properties, are mainly used, and their demand will increase in the advanced information and communication society in the future. Is expected.

【0006】しかしながら、フッ素樹脂は本質的に可撓
性高分子鎖から成り、弾性率が低いという欠点を有して
いる。このため、例えば薄い積層板はコシがなく、たわ
み、反りが発生するなど、加工工程での取扱いを困難に
している。
However, the fluororesin is essentially composed of a flexible polymer chain and has a drawback of low elastic modulus. For this reason, for example, a thin laminated plate is not stiff, and warps or warps occur, which makes it difficult to handle in a processing step.

【0007】また、カシメが効かず特殊な工具・部品を
使用してカシメを行う必要があるなど、製造工程が複雑
になって、加工上の問題点が多い。
Further, since the caulking does not work and it is necessary to caulking using a special tool / part, the manufacturing process becomes complicated and there are many problems in processing.

【0008】他方、熱可塑性であるためにフッ素樹脂自
身の熱膨張率が大きいという問題もあり、スルーホール
信頼性が低く、熱履歴がかかる用途には使用できない。
On the other hand, since it is thermoplastic, there is a problem that the coefficient of thermal expansion of the fluororesin itself is large, the through-hole reliability is low, and it cannot be used in applications where heat history is required.

【0009】これらの問題に対してはいくつかの対策が
公開されており、例えば無機フィラーなどの充填材の添
加によってコンパウンド化し、補強する方法もとられて
いるが、ドリル加工性や誘電特性の低下、不純物増加等
の影響のほか、コストも上昇して十分な実用性能が得ら
れない。
Several measures have been published for these problems, and for example, a method of forming a compound by adding a filler such as an inorganic filler to reinforce it has been proposed. In addition to the effects of deterioration and increase of impurities, the cost also rises and sufficient practical performance cannot be obtained.

【0010】また、フッ素樹脂そのものの弾性率を向上
させるために、PTFE樹脂を無酸素下327℃直上の
高温で電子線を照射することによりPTFE分子間を共
有結合で架橋し、強度や弾性率を高める方法も報告され
ているが、無酸素高温条件は通常の積層板製造工程にお
いては不利になる。
Further, in order to improve the elastic modulus of the fluororesin itself, the PTFE resin is irradiated with an electron beam at a high temperature just above 327 ° C. in the absence of oxygen to cross-link the PTFE molecules with a covalent bond to obtain strength and elastic modulus. However, oxygen-free high temperature conditions are disadvantageous in a normal laminated plate manufacturing process.

【0011】したがって、高周波機器等に使用されるP
TFE樹脂積層板は、一般に弾性率が低く、熱膨張率が
高いという欠点を有している。
Therefore, P used in high-frequency equipment and the like
The TFE resin laminated plate generally has the drawbacks of low elastic modulus and high thermal expansion coefficient.

【0012】[0012]

【発明が解決しようとする課題】そこで、この発明は、
低誘電率、低誘電正接等の優れた電気特性を維持しつ
つ、加工性やスルーホール信頼性を向上させた、弾性率
が高く、熱膨張率の低い、高周波機器等の用途に好適に
使用することができるPTFE樹脂積層板を製造する方
法を提供しようとするものである。
Therefore, the present invention is
Suitable for applications such as high-frequency equipment with high elastic modulus, low thermal expansion coefficient, improved processability and through-hole reliability while maintaining excellent electrical characteristics such as low dielectric constant and low dielectric loss tangent. The present invention aims to provide a method for producing a PTFE resin laminated plate which can be manufactured.

【0013】[0013]

【課題を解決するための手段】前記課題を解決するため
に様々な検討を行った結果、この発明は、複数枚のPT
FE樹脂プリプレグを積層して加熱・加圧して得られる
積層板に、放射線を照射し、次いでアニーリング処理す
ることによって、PTFE樹脂積層板の弾性率を増大さ
せるとともに熱膨張率を低減させ、加工工程での取扱い
性やドリル加工性及びスルーホール信頼性を改善するこ
とができることを見出したのである。
As a result of various studies to solve the above-mentioned problems, the present invention has been made in consideration of a plurality of PTs.
A laminated plate obtained by laminating FE resin prepreg and heating / pressurizing it is irradiated with radiation and then annealed to increase the elastic modulus of the PTFE resin laminated plate and reduce the coefficient of thermal expansion. It has been found that it is possible to improve the handling property, drilling processability, and through hole reliability.

【0014】即ち、非晶領域のPTFE分子鎖は、アニ
ーリングによって熱運動が活発化し、近傍に結晶化領域
があると一部は二次結晶化する。また、適量の電子線ま
たは、γ線等の照射により一部切断された非晶領域のP
TFE分子鎖は運動しやすくなるため、近傍に結晶化領
域があれば室温でも二次結晶化することができる。
That is, in the amorphous PTFE molecular chain, thermal motion is activated by annealing, and if a crystallized region is present in the vicinity, a part of the crystallized secondary crystallizes. In addition, P in an amorphous region partially cut by irradiation with an appropriate amount of electron beam or γ-ray
Since the TFE molecular chain easily moves, secondary crystallization can be performed even at room temperature if there is a crystallization region in the vicinity.

【0015】このように、アニーリングと放射線照射の
併用により結晶と非晶の界面領域におけるPTFE分子
の熱再結晶化を促進することができる。
As described above, the thermal recrystallization of the PTFE molecules in the crystalline / amorphous interface region can be promoted by the combined use of the annealing and the radiation irradiation.

【0016】二次結晶化が進行することによりPTFE
樹脂の結晶化度が高まり、全体として分子間力は増大す
る。その結果、外部応力や熱に対する分子運動が抑制さ
れ、弾性率の増大と熱膨張率の低減につながるものと考
えられる。
By the progress of secondary crystallization, PTFE
The crystallinity of the resin is increased, and the intermolecular force is increased as a whole. As a result, it is considered that molecular motion due to external stress or heat is suppressed, leading to an increase in elastic modulus and a decrease in thermal expansion coefficient.

【0017】[0017]

【発明の実施の形態】以下、この発明の実施形態を説明
する。この発明で使用するPTFE樹脂プリプレグに
は、通常の方法で製造されたガラス繊維からなるガラス
基材が用いられている。ガラス繊維としては、限定する
ものではないが、電気特性、加工性、コストを考慮すれ
ばEガラスの使用が好ましい。価格の点は別にして、そ
の他にも絶縁用途で使用されるものとしてはQ、D、
T、NEなどのガラス繊維を用いれば、より一層の誘電
特性の向上が可能である。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below. The PTFE resin prepreg used in the present invention uses a glass base material made of glass fiber manufactured by a usual method. Although the glass fiber is not limited, it is preferable to use E glass in consideration of electrical characteristics, processability, and cost. Apart from the price, Q, D, and
If glass fibers such as T and NE are used, the dielectric characteristics can be further improved.

【0018】このようなガラス繊維を織布、または不織
布の形態として用いる。織布には平織り、綾織、繻子織
り、などがある。
Such glass fibers are used in the form of woven cloth or non-woven cloth. Woven fabrics include plain weave, twill weave, and satin weave.

【0019】PTFE樹脂は、通常ディスパージョンと
呼ばれる分散液として供給され、これにロール状に巻か
れた前記ガラス布基材を連続的に繰り出して含浸させ、
続く乾燥、焼成工程でガラス布基材にPTFE樹脂が固
定される。この含浸工程は必要に応じて複数回繰り返す
ことにより均一でムラのないPTFE樹脂プリプレグを
得ることができる。
The PTFE resin is usually supplied as a dispersion liquid called a dispersion, and the glass cloth base material wound in a roll shape is continuously fed out and impregnated therewith,
The PTFE resin is fixed to the glass cloth substrate in the subsequent drying and firing steps. This impregnation step can be repeated a plurality of times as necessary to obtain a uniform and even PTFE resin prepreg.

【0020】次に得られたPTFE樹脂プリプレグを所
定のサイズにカットし必要に応じて1枚もしくは複数枚
重ねあわせた後、これらの積層体を一般的には真空で3
00℃程度の温度で所定圧力下に、所定時間プレスしP
TFE樹脂積層板を得る。プリント配線板用の場合は銅
箔をPTFE樹脂プリプレグの外層に重ね合わせた後、
同様に加熱加圧して銅張り積層板を得る。
Next, the obtained PTFE resin prepreg is cut into a predetermined size and, if necessary, one or a plurality of layers are laminated, and then these laminated bodies are generally vacuumed to 3
Press at a temperature of about 00 ° C under a predetermined pressure for a predetermined time, and press P
Obtain a TFE resin laminate. In the case of printed wiring board, after stacking copper foil on the outer layer of PTFE resin prepreg,
Similarly, heat and pressure are applied to obtain a copper clad laminate.

【0021】これらの工程において積層板の厚さは特に
限定されるものではなく、また銅箔は片面のみ使用して
も、あるいは使用しなくてもよい。
In these steps, the thickness of the laminated plate is not particularly limited, and the copper foil may be used on only one side or may not be used.

【0022】また、プレスは前述のバッチ方式が一般的
であるが、連続的にロールを用いた銅箔をラミネートす
る方法であったとしても何ら支障はない。
Although the above-mentioned batch method is generally used for the press, there is no problem even if it is a method of continuously laminating copper foil using rolls.

【0023】さらに得られた銅張積層板の表面を所定の
回路パターンにエッチングし、穴開け加工等を施した
後、再びPTFE樹脂プリプレグと共に所定回数プレス
して得られる多層板であっても一向に問題はない。
Further, even if the multilayer board obtained by etching the surface of the obtained copper clad laminate to a predetermined circuit pattern, punching it, etc., and then again pressing it with PTFE resin prepreg a predetermined number of times, No problem.

【0024】この発明では、以上の方法で製造されたP
TFE樹脂積層板に対し常温・常圧で所定線量の放射線
を照射する。放射線はα線、β線、γ線、電子線、X線
などを用いることができるが、α線、β線は透視力が弱
く効率が劣るため、望ましくはγ線、電子線を用いる。
この発明ではγ線を用いたが、放射線源を必要とせず線
量のコントロールが比較的容易な電子線を使用する方が
商業的にさらに好ましい。
In the present invention, the P produced by the above method is used.
Irradiate the TFE resin laminate with a predetermined dose of radiation at room temperature and pressure. As the radiation, α rays, β rays, γ rays, electron rays, X rays and the like can be used. However, α rays and β rays preferably use γ rays and electron rays because they have a low see-through power and are poor in efficiency.
Although γ rays were used in the present invention, it is commercially more preferable to use an electron beam which does not require a radiation source and whose dose can be controlled relatively easily.

【0025】γ線照射量として吸収線量1〜500kG
yの範囲を利用できるが、効率の点では10kGy以上
が適当であり、また100kGyを越えるとPTFE樹
脂の物性が低下することから10〜100kGyが好ま
しい。
Absorbed dose of 1 to 500 kG as γ-ray irradiation dose
The range of y can be used, but from the viewpoint of efficiency, 10 kGy or more is suitable, and when it exceeds 100 kGy, the physical properties of the PTFE resin are deteriorated, so 10 to 100 kGy is preferable.

【0026】積層板単独でも複数枚を重ねあわせても照
射可能であり、適宜最適条件を選択することができる。
Irradiation can be performed with a single laminated plate or a plurality of laminated plates, and the optimum conditions can be appropriately selected.

【0027】また、PTFE樹脂積層板にアニーリング
処理することもこの発明の特徴である。具体的にはPT
FE樹脂積層板を空気中・常圧の条件下で一般に使用さ
れる加熱炉に入れてアニーリングする。温度及び時間の
組合せは特に限定されるものではないが、効率を考慮す
れば250〜320℃で1〜5時間が好ましい。
Another feature of the present invention is to subject the PTFE resin laminated plate to an annealing treatment. Specifically, PT
The FE resin laminated plate is put in a generally used heating furnace under the conditions of air and normal pressure for annealing. The combination of temperature and time is not particularly limited, but considering efficiency, it is preferably 250 to 320 ° C. and 1 to 5 hours.

【0028】放射線照射とアニーリングは併用すること
により目的とする効果を得ることができる。
The intended effect can be obtained by using radiation irradiation and annealing in combination.

【0029】以上のように、PTFE樹脂積層板の製造
に通常用いられる装置に、この発明の目的である弾性率
増加及び熱膨張率低減の改質工程を併用することによっ
て、改質PTFE樹脂積層板を容易に製造することがで
きる。
As described above, the modified PTFE resin laminate is obtained by using the apparatus normally used for producing a PTFE resin laminate with the modification process of increasing the elastic modulus and decreasing the thermal expansion coefficient, which is the object of the present invention. The plate can be easily manufactured.

【0030】[0030]

【実施例】以下にこの発明の実施例を具体的に説明する
が、この発明はこれに限定されるものではない。
EXAMPLES Examples of the present invention will be specifically described below, but the present invention is not limited thereto.

【0031】実施例 PTFE樹脂ディスパージョン(ポリフロン:ダイキン
製)を0.05mm厚さの平織りガラス布(WE−0
5:日東紡製)に含浸、乾燥、焼成することを数回繰り
返して、プリプレグを作成した。このプリプレグシート
を所定寸法にカットしたものを19枚重ねた積層体を真
空下で300℃程度の温度で加熱・加圧して1.6mm
厚のPTFE樹脂積層板を得た。この積層板に50kG
yに相当するγ線量を照射し、300℃×2時間のアニ
ーリング処理を行った。
Example PTFE resin dispersion (Polyflon: made by Daikin) was used as a plain woven glass cloth (WE-0) having a thickness of 0.05 mm.
5: Nitto Boseki) was impregnated, dried and fired several times to prepare a prepreg. A stack of 19 sheets of this prepreg sheet cut to a predetermined size is heated and pressed at a temperature of about 300 ° C. under vacuum to 1.6 mm.
A thick PTFE resin laminate was obtained. 50kG on this laminate
A γ-ray dose corresponding to y was irradiated and an annealing treatment was performed at 300 ° C. for 2 hours.

【0032】比較例1 PTFE樹脂ディスパージョン(ポリフロン:ダイキン
製)を0.05mm厚さの平織りガラス布(WE−0
5:日東紡製)に含浸、乾燥、焼成することを数回繰り
返して、プリプレグを作成した。このプリプレグシート
を所定寸法にカットしたものを19枚重ねた積層体を真
空下で300℃程度の温度で加熱・加圧して1.6mm
厚のPTFE樹脂積層板を得た。
Comparative Example 1 PTFE resin dispersion (Polyflon: made by Daikin) was used as a plain weave glass cloth (WE-0) having a thickness of 0.05 mm.
5: Nitto Boseki) was impregnated, dried and fired several times to prepare a prepreg. A stack of 19 sheets of this prepreg sheet cut to a predetermined size is heated and pressed at a temperature of about 300 ° C. under vacuum to 1.6 mm.
A thick PTFE resin laminate was obtained.

【0033】比較例2 50kGyに相当するγ線量を照射した以外は比較例1
と同様に行った。
Comparative Example 2 Comparative Example 1 except that a γ dose equivalent to 50 kGy was applied.
I went the same way.

【0034】比較例3 300℃×2時間のアニーリング処理を行うこと以外は
比較例1と同様に行った。実施例と比較例で得た試料に
ついて、曲げ弾性率及び熱膨張率を測定した。結果を表
1に示す。
Comparative Example 3 The procedure of Comparative Example 1 was repeated except that the annealing treatment was carried out at 300 ° C. for 2 hours. The flexural modulus and the coefficient of thermal expansion of the samples obtained in Examples and Comparative Examples were measured. The results are shown in Table 1.

【0035】[0035]

【表1】 [Table 1]

【0036】試験方法 曲げ弾性率:JIS規格K69115.17(熱硬化性
プラスチック一般試験方法)に準拠して行った。 熱膨張率:リガク製TMA試験記を用いて、30℃〜2
60℃間厚さ方向の膨張を測定し、原厚に対する変化率
で示した。
Test method Flexural modulus: The test was carried out according to JIS standard K69115.17 (General test method for thermosetting plastics). Coefficient of thermal expansion: 30 ° C to 2 using RMA's TMA test report
The expansion in the thickness direction was measured between 60 ° C., and it was shown as the rate of change relative to the original thickness.

【0037】[0037]

【発明の効果】以上のように、この発明によると、PT
FE樹脂積層板に放射線を照射し、これをアニーリング
することによって曲げ弾性率を増大させるとともに熱膨
張率を低減させることが可能となり、これにより従来高
周波機器用に用いられているPTFE樹脂積層板の問題
点である加工工程中の取扱い性やドリル加工性、さらに
スルーホール信頼性を改善することが可能となる。
As described above, according to the present invention, PT
It is possible to increase the flexural modulus and reduce the coefficient of thermal expansion by irradiating the FE resin laminated plate with radiation and annealing it. As a result, the PTFE resin laminated plate conventionally used for high-frequency equipment can be manufactured. It is possible to improve the handling property during the working process, the drill workability, and the through hole reliability, which are problems.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 3/00 H05K 3/00 R (72)発明者 古比谷 隆 兵庫県尼崎市南塚口町4−2−37 利昌工 業株式会社開発本部内 (72)発明者 西本 清一 奈良県奈良市朱雀1−17−20 Fターム(参考) 4F100 AB17C AB33C AK42A AK42B BA03 BA07 BA10A BA10C DH01A DH01B EJ172 EJ413 EJ422 EJ523 EJ822 GB41─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) H05K 3/00 H05K 3/00 R (72) Inventor Takashi Kobiya 4-Minamitsukaguchi-cho, Amagasaki-shi, Hyogo 2-37 Risho Industry Co., Ltd. Development Headquarters (72) Inventor Seiichi Nishimoto 1-17-20 Suzaku, Nara City, Nara Prefecture F-17 (Reference) 4F100 AB17C AB33C AK42A AK42B BA03 BA07 BA10A BA10C DH01A DH01B EJ172 EJ413 EJ422 EJ523 EJ822 GB41

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 複数枚のPTFE樹脂プリプレグを積層
して加熱・加圧して得られる積層板に放射線を照射し、
次いでアニーリング処理するPTFE樹脂積層板の製造
方法。
1. A laminated plate obtained by laminating a plurality of PTFE resin prepregs, heating and pressurizing them, and irradiating with radiation.
Then, a method of manufacturing a PTFE resin laminate, which is subjected to an annealing treatment.
【請求項2】 複数枚のPTFE樹脂プリプレグの外層
に銅箔を積層する請求項1記載のPTFE樹脂積層板の
製造方法。
2. The method for producing a PTFE resin laminate according to claim 1, wherein a copper foil is laminated on the outer layers of a plurality of PTFE resin prepregs.
【請求項3】 前記放射線として、γ線を使用する請求
項1又は2に記載のPTFE樹脂積層板の製造方法。
3. The method for producing a PTFE resin laminate according to claim 1, wherein gamma rays are used as the radiation.
【請求項4】 請求項1〜3の製造方法によって得られ
るPTFE樹脂積層板。
4. A PTFE resin laminate obtained by the manufacturing method according to claim 1.
JP2002013176A 2002-01-22 2002-01-22 PTFE resin laminate manufacturing method and PTFE resin laminate Expired - Lifetime JP3909246B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012244056A (en) * 2011-05-23 2012-12-10 Sumitomo Electric Fine Polymer Inc Method for manufacturing fluororesin substrate
KR20140031161A (en) * 2011-05-23 2014-03-12 스미토모덴코파인폴리머 가부시키가이샤 High-frequency circuit substrate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT202000030995A1 (en) * 2020-12-16 2022-06-16 Guarniflon S P A COMPOSITE MATERIAL, METHOD OF PREPARATION, AND USES

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012244056A (en) * 2011-05-23 2012-12-10 Sumitomo Electric Fine Polymer Inc Method for manufacturing fluororesin substrate
KR20140031161A (en) * 2011-05-23 2014-03-12 스미토모덴코파인폴리머 가부시키가이샤 High-frequency circuit substrate
JPWO2012161162A1 (en) * 2011-05-23 2014-07-31 住友電工ファインポリマー株式会社 High frequency circuit board
US9497852B2 (en) 2011-05-23 2016-11-15 Sumitomo Electric Fine Folymer, Inc. High-frequency circuit substrate
KR101883677B1 (en) * 2011-05-23 2018-07-31 스미토모덴코파인폴리머 가부시키가이샤 High-frequency circuit substrate

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