JP2003205226A - Gas liquid mixing and feeding apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a gas liquid mixing and feeding apparatus in which a gas liquid mixing ratio in a liquid in a gas liquid mixture is stabilized and the total liquid is surely fed. <P>SOLUTION: The gas liquid mixing and feeding apparatus is equipped with a vessel 2 into the inside of which a liquid 20 is introduced, a pressurized gas introducing pipe 10 for introducing a pressurized gas 22 into the vessel, a nearly vertical liquid feed pipe 52 through which the liquid in the vessel pressurized by the pressurized gas flows upward and is discharged and a guide pipe 54 in which the inside diameter is larger than the outside diameter of the liquid feed pipe, a liquid flowing groove 56 is formed in the lower end part and which is arranged around the liquid feed pipe. The lower end surface of the guide pipe is brought into contact with the bottom surface of the vessel and the lower end surface of the liquid feed pipe is positioned at the upper side of the liquid flowing groove of the guide pipe. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas-liquid mixing and liquid feeding device for mixing a gas with a liquid to prepare a liquid in a gas-liquid mixed state and sending the liquid in the gas-liquid mixed state.
The gas-liquid mixing and feeding device of the present invention is used as, for example, a cleaning device for cleaning the detector by injecting a predetermined amount of chemical liquid in a gas-liquid mixed state onto the detector of the measuring device.

[0002]

2. Description of the Related Art For preserving or recovering electrode characteristics by removing a stain on an electrode by injecting a predetermined amount of a chemical liquid in a gas-liquid mixed state into an immersion type detector (electrode) of a pH measuring device. As the cleaning device, the one shown in FIG. 3 has been conventionally used.

In the cleaning apparatus shown in FIG. 3, 2 is a peripheral wall portion 4,
1 shows a container (measuring cup) with a top wall 6 and a bottom wall 8. A pressurized gas introducing pipe 10 and a liquid sending pipe 12 are attached to the upper wall portion 6 of the container 2 in a state of penetrating the upper wall portion 6, and the lower end surface of the pressurized gas introducing pipe 10 is an upper wall. It is located at almost the same height as the lower surface of the portion 6, the lower end surface of the liquid feeding pipe 12 is located slightly above the upper surface of the bottom wall portion 8, and the upper portion of the liquid feeding pipe 12 projects above the upper wall portion 6. There is. Further, the liquid supply pipe 12 is formed with a plurality of small-diameter air introduction holes 14 slightly below the lower surface of the upper wall portion 6. Further, a liquid feed tube 14 is connected to the upper end of the liquid feed pipe 12. A liquid inlet 16 is formed in the bottom wall 8 and the liquid inlet 1
A check valve 18 is provided at 6.

When the cleaning apparatus of FIG. 3 is used, first, the container 2 is immersed in a chemical solution in a chemical solution tank (not shown). As a result, the chemical liquid 20 flows into the container 2 through the liquid inlet 16 by the position head of the chemical liquid in the chemical liquid tank, and the chemical liquid 20 fills the container 2. When pressurized air 22 such as instrumentation air is introduced into the container 2 from the pressurized gas introduction pipe 10 in this state, the liquid surface 24 of the chemical liquid 20 in the container 2 is compressed by the pressurized air 2
2 is pressed and the liquid surface 24 descends, and the chemical liquid 20
From the lower end opening 26 of the liquid sending pipe 12
Into the container 2 by flowing upward in the liquid delivery pipe 12
It is discharged from inside.

Further, since the liquid surface 24 of the chemical liquid 20 in the container 2 descends as described above, the pressurized air 22 is supplied to the air introduction hole 1
4 into the liquid feed pipe 12 and the liquid feed pipe 1 by the aspirator effect due to the pressure of the pressurized gas and the flow of the liquid.
Air is mixed with the chemical liquid 20 flowing upward in 2 to prepare a chemical liquid 28 in a gas-liquid mixed state (a portion of the liquid supply pipe 12 where gas-liquid mixing is performed is indicated by reference numeral 30). The chemical liquid 28 in the gas-liquid mixed state passes through the liquid feeding tube 14 and becomes pH.
The liquid is transferred to the electrode installation place of the measuring device and the liquid transfer tube
It is sprayed onto the electrode from a nozzle provided at the tip of the electrode, whereby the electrode is cleaned.

[0006]

However, in the conventional cleaning device shown in FIG. 3, the flow rate of the chemical liquid flowing through the liquid supply pipe 12 is lowered depending on the load condition which varies depending on the length of the liquid supply tube 14 and the like. However, the gas-liquid mixing ratio in the prepared liquid-liquid mixed liquid 28 becomes unstable, and the liquid 28
There was a case where the cleaning ability of. Depending on the load condition, the chemical liquid 20 does not flow upward in the liquid feed pipe 12 and only air flows into the liquid feed pipe 12, and the total amount of the chemical liquid scheduled to be fed is fed. There were times when I couldn't.

According to the study by the present inventors, the above phenomenon occurs in the cleaning apparatus of FIG. 3 when the liquid surface 24 of the chemical solution 20 in the container 2 is pressurized by the air 22 and at the same time 2 through the air introduction hole 14 provided in the upper part of the liquid delivery pipe 1
Since air is mixed with the chemical liquid in the liquid 2 inside, the amount of air entering the liquid supply pipe 12 from the air introduction hole 14 increases depending on the load condition determined by the length of the liquid supply tube 14 and the like. It is considered that the cause is that the force that pressurizes the liquid surface 24 becomes weak.

The present invention has been made in view of the above-described circumstances, and a gas is mixed with a liquid to prepare a liquid in a gas-liquid mixed state, and a liquid in the gas-liquid mixed state is sent. A liquid-sending device, which has a stable gas-liquid mixing ratio in a liquid in a gas-liquid mixed state to be prepared, and is capable of reliably sending the entire amount of the liquid scheduled to be sent. An object is to provide a mixed liquid feeding device.

[0009]

In order to achieve the above object, the present invention provides a container into which a liquid is introduced and a pressurized gas which is attached to the container and pressurizes the liquid surface of the liquid in the container from above. And a pressurized gas introduction pipe for introducing into the container, the liquid in the container, which is attached to the container and whose liquid surface is pressurized by the pressurized gas, flows into the inside from the lower end opening, and flows upward in the inside. A liquid sending pipe that flows and is discharged to the outside of the container, an inner diameter that is larger than the outer diameter of the liquid sending pipe, and a liquid inflow groove or liquid inflow hole is formed at the lower end, and is placed around the liquid sending pipe. A lower end surface of the guide pipe is in contact with the bottom surface of the container, and the lower end surface of the liquid delivery pipe is located above the liquid inflow groove or liquid inflow hole of the guide pipe. Provided is a gas-liquid mixture sending device.

In the gas-liquid mixture sending apparatus of the present invention, when a pressurized gas such as instrumentation air is introduced into the container through the pressurized gas introduction pipe, the liquid surface of the liquid in the container is pressurized by the pressurized gas. The liquid flows into the guide pipe through the liquid inflow groove or the liquid inflow hole of the guide pipe, and then flows into the liquid delivery pipe from the lower end opening of the liquid delivery pipe. In addition, the pressurized gas flows into the lower part of the liquid transfer pipe through a gap formed between the outer surface of the liquid transfer pipe and the inner surface of the guide pipe, and the gas is mixed with the liquid at a position below the liquid transfer pipe in the guide pipe. Then, a liquid in a gas-liquid mixed state is prepared. The liquid in the gas-liquid mixed state flows upward in the liquid sending pipe, is discharged from the container, and is transferred to a predetermined location.

In the gas-liquid mixing and liquid feeding apparatus of the present invention, the liquid and the gas come into contact with each other at a position lower than the liquid feeding pipe in the guide pipe as described above. Therefore, the liquid to be fed and the gas always come into contact with each other. . Therefore, the gas-liquid mixing ratio of the prepared liquid in the gas-liquid mixed state becomes stable, and it becomes possible to reliably send the entire amount of the liquid scheduled to be sent. In this case, in the gas-liquid mixing and feeding device of the present invention, when the guide pipe is arranged around the liquid feeding pipe in a free state, that is, in a vertically movable and rotatable state, when the pressurized gas is introduced into the container. In addition, a gap is well formed between the outer surface of the liquid delivery pipe and the inner surface of the guide pipe. However, if the guide pipe is arranged in a free state, the guide pipe may move up and down due to shaking of the container and turbulent flow of liquid. In such a case, the guide pipe can be prevented from moving up and down by fixing the guide pipe to the bottom surface of the liquid supply pipe or the container with screws or screwing. The pressurized gas flows into the lower part of the liquid delivery pipe through the gap due to the combined action of the pressure of the pressurized gas and the aspirator effect of the liquid flow.

The gas-liquid mixing and feeding apparatus of the present invention can preferably employ the following constitution, as shown in the embodiments described later. (1) The lower end surface of the liquid supply pipe is located slightly above the liquid inflow groove or liquid inflow hole of the guide pipe. (2) The upper end surface of the guide pipe is located slightly below the top surface of the container. (3) A configuration in which a plurality of guide pipes having different inner diameters are provided and the guide pipes can be replaced. (4) A configuration in which a plurality of guide pipes having different sizes of the liquid inflow groove or the liquid inflow hole are provided and the guide pipes can be replaced. (5) The container has a peripheral wall portion, an upper wall portion, and a bottom wall portion, and the pressurized gas introduction pipe and the liquid feed pipe are attached to the upper wall portion of the container in a state of penetrating the upper wall portion. (6) The container is immersed in a liquid, and a liquid inlet having a check valve is formed in the bottom wall of the container.

[0013]

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in more detail with reference to the drawings. FIG. 1 shows an embodiment of a gas-liquid mixing and feeding device according to the present invention, and this gas-liquid mixing and feeding device is configured as a cleaning device for an immersion type detector (electrode) of a pH measuring device. In FIG. 1, the same components as those of the cleaning device of FIG. 3 are designated by the same reference numerals and the description thereof will be omitted.

In the cleaning apparatus of this embodiment, 52 is a liquid delivery pipe. The liquid delivery pipe 52 is attached to the upper wall portion 6 in a state of penetrating the upper wall portion 6, and the upper portion thereof projects above the upper wall portion 6. Further, unlike the liquid delivery pipe shown in FIG. 3, no air introduction hole is formed in the liquid delivery pipe 52 of this example.

In the cleaning apparatus of this embodiment, 54 is a guide pipe. The guide pipe 54 is formed such that the inner diameter is larger than the outer diameter of the liquid delivery pipe 52 and the two liquid inflow grooves 56 face each other at the lower end (FIG. 2).
(See enlarged front view and enlarged bottom view). The guide pipe 54 is arranged around the liquid delivery pipe 52 in a free state, that is, in a vertically movable and rotatable state. Therefore, the lower end surface of the guide pipe 54 contacts the upper surface of the bottom wall portion 8 (bottom surface of the container) by its own weight.

In the cleaning apparatus of this embodiment, the lower end surface of the liquid supply pipe 52 is located slightly above the liquid inflow groove 56 of the guide pipe 54, and the upper end surface of the guide pipe 54 is the lower surface of the upper wall portion 6 (the top of the container). It is located slightly below the surface). Although the number of the liquid inflow grooves 56 is two in this example, the number is not limited to two. Further, instead of the liquid inflow groove or together with the liquid inflow groove, a liquid inflow hole may be provided at the tip end portion of the guide pipe.

When the cleaning apparatus of this example is used, first, the container 2 is immersed in the chemical liquid in the chemical liquid tank (not shown). As a result, the chemical liquid 20 flows into the container 2 through the liquid inlet 16 by the position head of the chemical liquid in the chemical liquid tank, and the chemical liquid 20 fills the container 2. When pressurized air 22 such as instrumentation air is introduced into the container 2 from the pressurized gas introduction pipe 10 in this state, the liquid surface 24 of the chemical liquid 20 in the container 2 is compressed by the pressurized air 2
2 is pressed and the liquid surface 24 descends, and the chemical liquid 20
After flowing into the guide pipe 54 through the liquid inflow groove 56, it flows into the liquid sending pipe 52 from the lower end opening 26 of the liquid sending pipe 52 and flows in the liquid sending pipe 52 in an upward flow.

Further, since the liquid surface 24 of the chemical liquid 20 in the container 2 descends as described above, the pressurized air 22 transfers the pressurized air 22 to the liquid delivery pipe 5.
2 flows through the gap 58 formed between the outer surface of the guide pipe 54 and the inner surface of the guide pipe 54 into the lower portion of the liquid feed pipe 52, and air is introduced into the chemical liquid 20 at a position below the liquid feed pipe 52 in the guide pipe 54. Chemical liquid 2 mixed and mixed in gas-liquid state
8 is prepared (the part in the guide pipe 54 where gas-liquid mixing is performed is indicated by reference numeral 62). The chemical liquid 28 in the gas-liquid mixed state is sequentially passed through the liquid feeding pipe 52 and the liquid feeding tube 14 to be transferred to the electrode installation place of the pH measuring device, and is transferred from the nozzle provided at the tip of the liquid feeding tube 14 to the electrode. It is sprayed, and the electrode is cleaned thereby.

By the way, the amount of air flowing into the lower part of the liquid feed pipe through the gap formed between the outer surface of the liquid feed pipe and the inner surface of the guide pipe changes depending on the cross-sectional area of the gap. Therefore, the gas-liquid mixing and feeding apparatus of the present invention includes a plurality of guide pipes having different inner diameters, and the guide pipes are made replaceable to adjust the gas-liquid mixing ratio of the liquid in the gas-liquid mixing state to be prepared. be able to.

The flow rate of the chemical liquid flowing into the guide pipe through the liquid inflow groove or liquid inflow hole of the guide pipe changes depending on the size of the liquid inflow groove or liquid inflow hole. Therefore, the gas-liquid mixing and delivering apparatus of the present invention includes a plurality of guide pipes having different sizes of the liquid inflow groove or the liquid inflow hole, and the guide pipes can be exchanged to prepare a gas-liquid mixed state. The gas-liquid mixing ratio in the liquid can be adjusted.

[0021]

EXAMPLE Using the cleaning apparatus shown in FIG. 1, an experiment was conducted in which air was mixed with a chemical liquid to prepare a chemical liquid in a gas-liquid mixed state, and the chemical liquid in the mixed state was sent. In this case, the liquid feeding tube 52 has an outer diameter of 8 mm, and the guide pipe 54 has a length of 40 mm and an inner diameter of 9.3 mm. Further, the length of the liquid feeding tube 14 is 5.5.
The load was changed as m, 7 m, and 13 m. The time required from the start to the end of the injection was examined while visually confirming that the gas-liquid mixed state of the chemical liquid injected from the liquid supply tube 14 was stable. As a result, when the length of the liquid feeding tube 14 is 5.5 m, it is 41 seconds, and when it is 7 m, it is 47 seconds.
It was found that the total amount of the chemical liquid in the container can be sent in a good gas-liquid mixed state in 55 seconds at 13 seconds and 55 seconds. Therefore, according to the present experiment, according to the gas-liquid mixture sending apparatus of the present invention, the gas-liquid mixing ratio in the liquid in the gas-liquid mixed state to be prepared is stable, and the total amount of the liquid scheduled to be sent is It was confirmed that the liquid can be reliably sent.

[0022]

As described above, the gas-liquid mixing and feeding apparatus of the present invention has a stable gas-liquid mixing ratio in the liquid in the gas-liquid mixing state to be prepared and the liquid to be fed. It is possible to reliably deliver the entire amount of.

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing an embodiment of a gas-liquid mixing and feeding device according to the present invention.

2A and 2B show a guide pipe of the gas-liquid mixing and feeding device of FIG. 1, wherein FIG. 2A is an enlarged front view and FIG. 2B is an enlarged bottom view.

FIG. 3 is a cross-sectional view showing an example of a conventional gas-liquid mixing and feeding device.

[Explanation of symbols]

2 containers 4 peripheral wall 6 Upper wall 8 bottom wall 10 Pressurized gas introduction pipe 16 Liquid inlet 18 Check valve 20 chemicals 22 Pressurized air 24 liquid level 26 Lower end opening 28 Chemical liquid in gas-liquid mixture 52 Liquid transfer pipe 54 Guide pipe 56 Liquid inflow groove 58 Gap

   ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 4F033 QA09 QB02Y QB03X QB12Y                       QB15X QD05 QD11 QD16                       QE21 QF02Y QF07Y QF15Y                 4G035 AB05 AC16 AE13                 4G037 AA01 EA01

Claims (9)

[Claims] 1. A container into which a liquid is introduced, a pressurized gas introduction pipe which is attached to the container and introduces a pressurized gas into the container for pressurizing a liquid surface of the liquid in the container from above, A substantially vertical liquid delivery pipe in which the liquid in the container, which is attached and whose liquid surface is pressurized by the pressurized gas, flows into the interior from the lower end opening, flows upward in the interior, and is discharged to the outside of the container. The inner diameter is larger than the outer diameter of the liquid sending pipe, and the liquid inflow groove or the liquid inflow hole is formed at the lower end, and the guide pipe is arranged around the liquid sending pipe. Is in contact with the bottom surface of the liquid feeding pipe, and the lower end surface of the liquid feeding pipe is located above the liquid inflow groove or the liquid inflow hole of the guide pipe. 2. The gas-liquid mixing and liquid feeding apparatus according to claim 1, wherein the guide pipe is arranged around the liquid feeding pipe in a free state. 3. The gas-liquid mixing and liquid sending apparatus according to claim 1, wherein the guide pipe is fixed to the bottom surface of the liquid sending pipe or the container. 4. The gas-liquid according to claim 1, wherein the lower end surface of the liquid delivery pipe is located slightly above the liquid inflow groove or liquid inflow hole of the guide pipe. Mixing and sending device. 5. The gas-liquid mixing and delivering apparatus according to claim 1, wherein the upper end surface of the guide pipe is located slightly below the top surface of the container. 6. A plurality of guide pipes having different inner diameters are provided,
The gas-liquid mixing and liquid sending device according to any one of claims 1 to 5, wherein the guide pipe is replaceable. 7. The gas according to claim 1, further comprising a plurality of guide pipes having different sizes of liquid inflow grooves or liquid inflow holes, the guide pipes being replaceable. Liquid mixing and feeding device. 8. A container is provided with a peripheral wall portion, an upper wall portion and a bottom wall portion, and a pressurized gas introducing pipe and a liquid feed pipe are attached to the upper wall portion of the container while penetrating the upper wall portion. The gas-liquid mixture sending device according to any one of claims 1 to 7, characterized in that. 9. The gas according to claim 8, wherein the container is immersed in a liquid, and a liquid inlet having a check valve is formed in the bottom wall of the container. Liquid mixing and feeding device.