JP2003202660A - Pellicle and producing method of mask with pellicle - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a pellicle and a production method of a mask with the pellicle by which the number of inspections can be reduced and the pellicle can be peeled off from the mask and used again after being stuck to the mask. <P>SOLUTION: A pellicle film 12 is stretched over and provided to one end face 11 of a pellicle frame 10, and an adhesion layer 14 is provided at the other end face 13. A main linear 21 is laminated to a sub-liner 22 so as to expose a part 23 of the main linear 21 from the sub liner 22, which is directly adhered to the adhesive layer 14. A part 23 of the main liner 21 exposed from the sub-liner 22 is also directly adhered to the adhesion layer 14. In the case of adhering the pellicle 1 to the mask, the main liner 21 is peeled off to temporarily adhere the pellicle 1 to the mask to perform inspection in the state. When the inspection is passed, the sub-liner 22 is peeled off to adhere the pellicle finally. When the inspection is not passed, the pellicle 1 is peeled off from the mask and used again. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a pellicle and a mask with a pellicle attached to a substrate such as a mask or a reticle (hereinafter, the mask and the reticle are generically referred to as "mask").

[0002]

2. Description of the Related Art In a photolithography process, a photomask or reticle having a circuit pattern formed on a glass plate surface by a vapor deposition film of chromium or the like is used, and the circuit pattern is transferred onto a resist-coated silicon wafer by exposure. Is done. In this process, if exposure is performed with foreign matter such as dust attached to the circuit pattern on the mask,
The foreign matter is also transferred onto the wafer, resulting in a defective product wafer. In particular, when the exposure is performed by a stepper, there is a high possibility that all the chips formed on the wafer will be defective, and adhesion of foreign matter to the circuit pattern of the mask poses a serious problem. Therefore, a pellicle that allows the exposure light to pass therethrough is attached to the mask to prevent dust from adhering to the mask.

[0003]

Generally, a mask is manufactured in the following manner. (1) A step of cleaning the mask (2) A step of inspecting the mask, that is, a step of inspecting whether or not foreign matter is attached in addition to whether or not a circuit as designed is formed, (3) Pellicle Attaching step, (4) step of inspecting mask with pellicle, (5)
It is carried out in five stages, the process of shipping. Usually step (2)
In step 1, the mask is inspected as to whether it is made as designed and whether foreign matter is attached. Then, only those that have passed the inspection proceed to step (3). After that, in the step (4), after the pellicle is pasted, it is inspected whether or not the mask has any defects and whether or not foreign matters are mixed in, and the passed ones are sent to the shipping step. . On the other hand, for rejected products, the pellicle is peeled from the mask and the mask is returned to the step (1) for reuse, but the pellicle may be damaged by the force at the time of peeling and is discarded.

However, although a system using a computer is used for the inspection, it must be judged by a person in the end, and the same inspection is required before shipment.
It is industrially expensive to carry out the operation repeatedly. In addition, the mask with pellicle that failed the inspection in step (4)
After the pellicle is peeled off, the mask is returned to the cleaning step (1), but the pellicle cannot be reused and must be discarded.

In Japanese Patent Laid-Open No. 7-120931, an adhesive whose adhesive force is reduced by heating and / or light irradiation is used in an adhesive layer for fixing a pellicle to a reticle, and the pellicle is adhered to the reticle with this type of adhesive layer. However, it is disclosed that when the pressure-sensitive adhesive layer is heated or the light is irradiated onto the pressure-sensitive adhesive layer, the pressure-sensitive adhesive force of the pressure-sensitive adhesive layer is reduced, so that the pellicle can be easily peeled from the reticle. However, in this technique, in order to peel the pellicle from the reticle, it is necessary to perform an operation such as changing the environmental condition of the masked pellicle.

A main object of the present invention is to provide a method for manufacturing a pellicle and a mask with a pellicle, which can reduce the number of inspections, and can be used after the pellicle is attached to the mask and then peeled off and used again. To do.

[0007]

According to a first aspect of the present invention, a pellicle film is stretched on one end face of a pellicle frame having an opening in the center and an adhesive layer is provided on the other end face. At least two or more liners are stuck on the adhesive layer, the at least two or more liners are respectively peelable from the adhesive layer, and the at least two or more liners are respectively peeled from the adhesive layer. As a result, a pellicle is provided in which the adhesive layer in a portion where each liner is attached to the adhesive layer is exposed.

[0008] Preferably, the at least two or more liners have a structure in which a part of the liner farther from the adhesive layer is exposed and laminated from a liner closer to the adhesive layer than the liner. The liner closest to the adhesive layer is directly attached to the adhesive layer, and the liner farther from the adhesive layer than the liner closest to the adhesive layer is also directly attached to the adhesive layer in the exposed part. .

Also, preferably, the at least two liners comprise a main liner and a sub-liner,
Part of the main liner is exposed from the sub-liner, the sub-liner is directly attached to the adhesive layer, and the main liner is also directly attached to the adhesive layer at the part exposed from the sub-liner. The main liner and the sub liner can be peeled off from the adhesive layer.

Preferably, the exposed part of the liner far from the adhesive layer has a shape surrounding each of the openings.

Preferably, the at least two liners have different sizes.

[0012] Preferably, in the laminated at least two or more liners, the size of each liner is gradually reduced toward the adhesive layer.

According to the second aspect of the present invention, the pellicle having the pellicle film stretched on one end face of the pellicle frame having the opening in the center and the adhesive layer provided on the other end face thereof can be peeled off. Then, the mask is inspected in a state of being temporarily adhered to the mask, and if the inspection is passed, the pellicle is permanently adhered to the mask by the adhesive layer to manufacture a mask with a pellicle, and the inspection is performed. If the test fails, the pellicle is peeled off from the mask, and then the pellicle is reused to manufacture a mask with a pellicle.

According to the third aspect of the present invention, a pellicle film is stretched on one end face of a pellicle frame having an opening at the center, and an adhesive layer is provided on the other end face, and at least on the adhesive layer. A pellicle to which two or more liners are attached is prepared, and at least one liner of the at least two liners is removed from the pellicle frame to expose a part of the adhesive layer and the exposed adhesive layer. A method for manufacturing a mask with a pellicle is provided, in which the pellicle is temporarily adhered to the mask through the above, and at least one of the remaining liners is removed to main-bond the pellicle to the mask. .

Preferably, one of the at least two liners is removed from the pellicle frame to expose a part of the adhesive layer, and the pellicle is temporarily adhered to a mask through the exposed adhesive layer. Then, the pellicle is permanently bonded to the mask by removing all the remaining liner.

Preferably, the mask is inspected in the temporarily bonded state, and if the inspection is passed, the pellicle is permanently bonded to the mask to manufacture a mask with a pellicle, and the temporarily bonded state is obtained. Then, the mask is inspected. If the inspection is unsuccessful, the pellicle is peeled from the mask, and then the pellicle is used as another mask to manufacture a mask with a pellicle.

Further, preferably, a part of the adhesive layer exposed before the temporary adhesion has a shape surrounding the periphery of the opening.

According to the fourth aspect of the present invention, a pellicle film is stretched on one end surface of a pellicle frame having an opening in the center, and an adhesive layer is provided on the other end surface of the pellicle frame. Is laminated so that a part of the main liner is exposed from the sub-liner, the sub-liner is directly attached to the adhesive layer, and the main liner is also attached to the adhesive layer at the part exposed from the sub-liner. The main liner and the sub-liner are directly adhered to each other, and a pellicle is prepared that can be separately peeled from the adhesive layer, the main liner is peeled from the adhesive layer, and the adhesive layer is exposed from the sub-liner. By temporarily adhering the pellicle to the mask with the pellicle, and then peeling off the sub-liner from the adhesive layer in the temporarily adhered state. Method for manufacturing a pellicle mask, characterized by the adhesive by the adhesive layer Le on the mask is provided.

Preferably, the mask is inspected in the temporarily adhered state, and if the inspection is acceptable, the sub-liner is peeled from the adhesive layer in the temporarily adhered state, and the pellicle is attached to the mask. A mask with a pellicle is manufactured by adhering with an adhesive layer, and the mask is inspected in the temporarily adhered state. If the inspection is unsuccessful, the pellicle is peeled from the mask, and then the pellicle is attached to another A mask with a pellicle is manufactured using the mask.

Preferably, the part of the main liner exposed from the sub-liner has a shape surrounding the periphery of the opening.

[0021]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, embodiments of the present invention will be described with reference to the drawings. FIG. 1 is a diagram for explaining a pellicle according to an embodiment of the present invention. FIG. 1 (A) is a schematic partial vertical cross-sectional view of a pellicle according to an embodiment of the present invention, FIG. 1 (B). FIG. 1 is a schematic plan view of a pellicle liner according to an embodiment of the present invention, and FIG. 1C is a schematic side view of a pellicle liner according to an embodiment of the present invention. FIG. 2 is a schematic side view for explaining an embodiment of the present invention and a conventional method for measuring the peeling force from a mask of a pellicle. FIG. 3 is a diagram for explaining a conventional pellicle, and FIG. 3A is a schematic partial vertical sectional view of the conventional pellicle.
FIG. 3B is a schematic plan view of a conventional pellicle liner, and FIG. 3C is a schematic side view of a conventional pellicle liner. FIG. 4 is a schematic perspective view of a pellicle liner according to another embodiment of the present invention.

As shown in FIG. 1, a pellicle 1 of the present invention.
Covers the opening 16 of the pellicle frame 10 and covers the pellicle frame 1
The pellicle film 12 is stretched on the end surface 11 of the 0. The pellicle frame 10 used in the present invention may be one normally used as a pellicle frame. Examples of the pellicle frame 10 include a pellicle frame made of aluminum alloy, stainless steel, polyethylene, alumite-treated black aluminum, or the like. Alternatively, the entire surface of the pellicle frame may be coated with an amorphous fluoropolymer or the like. Of these, preferably an aluminum alloy,
An example is a pellicle frame made of black aluminum that has been anodized.

The thin film used as the pellicle film 12 in the present invention may be one normally used as a pellicle film. For example, the thin film used as the pellicle film 12 may be nitrocellulose, cellulose acetate, an amorphous fluoropolymer, or the like. Thin film is pellicle frame 1
The pellicle film 12 is formed so as to be stretched on one end surface 11 of 0. The pellicle film 12 can be fixed to the pellicle frame 10 with a film adhesive, for example.

In the pellicle 1 according to the embodiment of the present invention, the adhesive layer 14 is provided on the end surface 13 opposite to the end surface 11, and the sub-liner 22 and the main liner 21 are laminated on the adhesive layer 14. Liner, main liner 2
1 is laminated on the side opposite to the pellicle film 12. That is, pellicle film 12 / pellicle frame 10 / adhesive layer 14
The sub liner 22 and the main liner 21 are provided in this order. The sub liner 22 is smaller than the main liner 21, and a part 23 of the main liner 21 is exposed from the sub liner 22 and laminated. Subliner 22
Is directly attached to the adhesive layer 14, and the main liner 21 is also directly attached to the adhesive layer 14 at the portion 23 exposed from the sub-liner 22. This subliner 22
The exposed portion 23 has a shape surrounding the opening 16 of the pellicle frame. The thickness of the main liner 21 is usually 50 to 300 μm, preferably 50 to 150 μm.
Is. The thickness of the sub-liner 22 is usually 10
It is 300 μm, preferably 15 to 150 μm. The main liner 21 is provided with a tab 212, and the sub-liner 22 is provided with a tab 221 and a cut 222.

In order to manufacture a mask with a pellicle by bonding the pellicle 1 having the sub-liner 22 and the main liner 21 laminated in this way and adhered to the adhesive layer 14 to a mask, first the main liner 21 is bonded. The pellicle 1 is temporarily adhered to the mask by the adhesive layer 14 which is peeled from the layer 14 and exposed from the subliner 22. The inspection is performed in the state of temporary adhesion, and if the inspection is acceptable, the sub-liner 22 is peeled from the adhesive layer 14 in the state of temporary adhesion, and the pellicle 1 is permanently adhered to the mask by the adhesive layer 14. If the inspection fails, the pellicle 1 is peeled off from the mask, and then the pellicle 1 is used for another mask to manufacture a mask with a pellicle.

As a result, it is not necessary to inspect the mask twice before and after attaching the pellicle as in the conventional case, and only the inspection after attaching the pellicle is sufficient. Even if the inspection fails, the pellicle 1 can be peeled from the mask, and then the pellicle 1 can be reused as another mask to manufacture a mask with a pellicle.

Further, as shown in FIG. 4, the subliner may be divided into subliner 223 and subliner 224. In this case, after the main liner 21 is first peeled off, a pellicle-equipped mask can be manufactured by the same operation as described above. That is, the sub-liner 223 is peeled off, the pellicle is temporarily adhered to the mask by the exposed adhesive layer, and the inspection is performed in the temporarily adhered state.
If the inspection is successful, the mask with a pellicle is manufactured by peeling off the sub-liner 224 and performing main adhesion.

The adhesive layer 14 is provided on the end surface 13 of the pellicle frame 3 opposite to the end surface 11 on which the pellicle film 12 is stretched. The adhesive layer 14 may be any means that can fix the pellicle 1 to the mask. For example, an adhesive material may be applied to form the adhesive layer 14 on the pellicle frame 10, or the adhesive material may be a polyester film. Alternatively, it may be applied as an adhesive tape to the pellicle frame 10 and attached. The adhesive material preferably contains an adhesive synthetic resin (hereinafter referred to as "base polymer"). As the base polymer, ethylene vinyl acetate copolymer, butyl methacrylic resin, polystyrene, styrene-butylene copolymer, polyisobutylene and the like are preferable, and styrene-butylene copolymer and the like are particularly preferable.

When the adhesive means is made of an antistatic material, an antistatic adhesive material (hereinafter referred to as "antistatic adhesive material") may be used. For example, an adhesive material containing the above base polymer may be used. It is preferable to blend an antistatic agent to obtain an antistatic adhesive material. As the antistatic agent to be blended with the base polymer, a kneading type antistatic agent suitable for mixing with a polymer compound such as a synthetic resin is suitable, and specifically, carbon black, glycerin fatty acid ester, polyoxy Ethylene alkyl ether, polyoxyethylene alkyl phenyl ether, N, N-bis (2
-Hydroxyethyl) alkylamine, N-2-hydroxyethyl-N-2-hydroxyalkylamine, polyoxyethylenealkylamine, polyoxyethylenealkylamine fatty acid ester, alkyldiethanolamine, alkylsulfonate, alkylbenzenesulfonate, alkyl Phosphate and the like are preferably exemplified.

In general, hydrophilic polymers have antistatic properties, and hydrophilic polymers having antistatic properties are also included in the kneading type antistatic agent. Further, among hydrophilic polymers, there are particularly excellent durability of antistatic effect, for example, polyethylene glycol-based polymers and the like, specifically, preferably polyethylene glycol, polyethylene glycol methacrylate copolymer, Poly (ethylene oxide / propylene oxide) copolymer,
Examples thereof include polyethylene glycol-based polyesteramides and poly (epichlorohydrin / ethylene oxide) copolymers.

The kneading type antistatic agent may be used as a mixture of two or more kinds, and a mixture of alkyldiethanolamine and glycerin fatty acid ester, a mixture of alkylbenzene sulfonate and polyethylene glycol or higher alcohol may be kneading type antistatic agent. It can be used particularly preferably as an inhibitor.

The kneading type antistatic agent may be selected according to the kind of the base polymer. The content of the kneading type antistatic agent in the antistatic adhesive material is preferably 0.05 to
It is suitable to add 10% by weight, particularly preferably 0.1 to 5% by weight.

[0033]

[Example] (Example 1) 100 μm in thickness and 2.6 mm in width
Main liner 21 made of PET resin and thickness 25μ
Subliner 2 made of PET resin with m and width of 1.0 mm
2 was stuck together to form a 122 × 149 mm two-layer structure liner (see FIGS. 1B and 1C). After that, using an orthogonal robot (Matsushita Electric FR-A102X),
SEBS-based adhesive dissolved in 200 ° C (Asahi Chemical Synthesis A
131) is applied to the end surface 13 of the aluminum frame 10 having a height of 5.8 mm and a width of 2 mm, and the two-layer structure liner is placed on the adhesive material 14 so that the sub-liner surface of the two-layer structure liner and the adhesive material layer face each other. I put it on. From the top of the two-layer structure liner, a plate having a temperature of 100 to 110 degrees was pressed and forcedly cooled by a cooling plate at 25 ° C., and the whole was molded to a height of 6.3 mm (see FIG. 1 (A)).

As the work, first, the main liner 21
Only the tab 212 (see FIG. 1 (B)) is peeled off, and the sub-liner 22 is left on the surface of the adhesive material 14, while the exposed portion of the adhesive material is limited, and the pellicle is applied with a force of 400 g for 30 seconds. 1 was attached to the mask (temporarily attached). The adhesion width between the exposed part of the pellicle adhesive and the mask is 0.3 to 0.5.
It was mm. Further, as shown in FIG. 2, while inserting the one end 42 into the jig hole 15 of the pellicle 1 and pushing down the other end 43 of the peeling jig 44 attached at a speed of 50 mm / min, the pellicle 1 and The peeling force of the mask 30 is the load cell 41 (manufactured by Orientec / BT-2L
-B). As a result, the peeling force is 30-100g
It was about. Also, the mask 30 of the pellicle 1 at that time
With respect to the peeled state from 5 sheets, the shape of the adhesive was not broken in all 5 sheets, and clean peeling was performed with almost no stain on the mask 30. Further, the peeling force was such that it could be peeled off manually without using a peeling jig.

(Example 2) The pellicle 1 was attached to the mask 30 in the same manner as in Example 1. After confirming a state where air and the like are not mixed (complete adhesion) over the entire circumference between the exposed adhesive and the mask, the tab 221 (see FIG. 1B) of the sub-liner 22 is gripped and the liner peeling direction 30 ~ 6
The subliner 22 was pulled out along the outer periphery of the aluminum frame with an inclination of 0 degree and 10 to 20 degrees from the mask surface.
At that time, the sub-liner 22 could be smoothly pulled out over the entire circumference of all five of the five sheets without affecting the attachment state of the completely adhered portion and without being caught by the adhesive. After that, apply a load of 30 kg for 3 minutes all around,
Normal pellicle attachment (main attachment) was performed. As a result, it was confirmed that the pasted state was the same as the current pellicle (completely adhered all around).

<Comparative Example> As shown in FIGS. 3B and 3C, a one-layer structure liner 20 having a thickness of 125 μm and a width of 2.6 mm is used, and the liner is the same as in Example 1 except that the liner is different. , SEBS adhesive (Asahi Chemical Synthetic A131) was applied to the aluminum frame 10 and the liner 20 was attached and molded (see FIG. 3 (A)). Next, the tab 201 of the liner 20
(See FIG. 3B) was gripped and peeled, and temporary attachment was performed, and the peeling force was measured. At this time, the contact width between the exposed portion of the pellicle adhesive material and the mask was 0.8 to 0.9 mm, and the peeling force from the mask was about 250 g, which was large compared with the case of using the two-layer structure liner. The value was up to 8.3 times. The pellicle could not be peeled from the mask without the peeling jig. In addition, I tried to peel the pellicle using a peeling jig,
In all of the five sheets, the pressure-sensitive adhesive in the peeled portion stretched and the shape collapsed, and the pellicle could not be peeled in a reusable state.

As described above, even if the single-layer structure liner is temporarily attached, the adhesion between the mask and the pellicle is strong, and it is difficult to peel off the pellicle cleanly. However, the two-layer structure of the sub-liner and the main liner is used. By using a liner, temporary attachment with a limited exposed area of the adhesive material and light pellicle peeling became possible, and the pellicle could be reused after peeling.

When the pellicle of the present invention is used, the pellicle can be bonded in two steps, and if the pellicle is acceptable, only the liner in the second step can be peeled off while the pellicle and the mask are kept in close contact with each other. You can paste the book without worrying about it. Further, when the mask with the pellicle fails in the inspection of foreign matters and the like, both can be peeled off and the mask and the pellicle can be reused. Also,
If it passes, only the first pellicle can be peeled off while the second-stage liner is kept in close contact with the mask, so that the main bonding can be performed without the risk of foreign matter mixing.
Further, the pellicle of the present invention eliminates the need for inspecting a foreign substance only in the mask, and the foreign substance inspection can be performed only once in the manufacturing process of the mask with a pellicle.

[0039]

According to the present invention, the number of inspections can be reduced, and after the pellicle is attached to the mask, the pellicle can be peeled off and used again, and a method for manufacturing a pellicle-equipped mask. To be done.

[Brief description of drawings]

FIG. 1 is a diagram for explaining a pellicle according to an embodiment of the present invention, FIG. 1 (A) is a schematic partial vertical cross-sectional view of a pellicle according to an embodiment of the present invention, and FIG. 1 (B). 1 is a schematic plan view of a liner of a pellicle according to an embodiment of the present invention, FIG.
FIG. 3C is a schematic side view of the liner of the pellicle according to the embodiment of the present invention.

FIG. 2 is a schematic side view for explaining a method for measuring a peeling force from a mask of a pellicle according to an embodiment of the present invention.

FIG. 3 is a diagram for explaining a conventional pellicle, and FIG. 3A is a schematic partial vertical cross-sectional view of the conventional pellicle.
FIG. 3B is a schematic plan view of a conventional pellicle liner, and FIG. 3C is a schematic side view of a conventional pellicle liner.

FIG. 4 is a schematic perspective view of a pellicle liner according to another embodiment of the present invention.

[Explanation of symbols]

1 ... Pellicle 10 ... Pellicle frame 11, 13 ... End face 12 ... Pellicle film 14 ... Adhesive layer 15 ... Jig hole 16 ... Opening 20 ... Liner 21 ... Main liner 22, 223, 224 ... Subliner 201, 211, 221 ... tabs 222 ... notch 30 ... Quartz (mask) 41 load cell 42, 43 ... End 44 ... Peeling jig

Claims (5)

[Claims] 1. A pellicle film having one end face of a pellicle frame having an opening at the center, an adhesive layer provided on the other end face, and at least two or more liners adhered to the adhesive layer. , The at least two or more liners are respectively peelable from the pressure-sensitive adhesive layer, and the liner is adhered to the pressure-sensitive adhesive layer by peeling each of the at least two or more liners from the pressure-sensitive adhesive layer. The pellicle, wherein the adhesive layer is exposed. 2. The at least two or more liners have a structure in which a part of the liner far from the adhesive layer is exposed and laminated from a liner closer to the adhesive layer than the liner. The closest liner is directly attached to the adhesive layer, and the liner farther from the adhesive layer than the liner closest to the adhesive layer is also directly attached to the adhesive layer in the exposed part. The pellicle according to claim 1, wherein: 3. A pellicle having a pellicle film stretched on one end surface of a pellicle frame having an opening in the center and an adhesive layer provided on the other end surface is tentatively adhered to a mask in a releasable state. The mask is inspected in the adhered state, and if the inspection passes, the pellicle is permanently adhered to the mask by the adhesive layer to manufacture a mask with a pellicle, and if the inspection fails, the pellicle Is peeled off from the mask, and then the pellicle is reused to manufacture a pellicle-equipped mask. 4. A pellicle film is stretched on one end surface of a pellicle frame having an opening in the center, an adhesive layer is provided on the other end surface, and at least two or more liners are attached on the adhesive layer. A pellicle is prepared, at least one of the at least two liners is removed from the pellicle frame to expose a part of the adhesive layer, and the pellicle is temporarily masked through the exposed adhesive layer. A method for manufacturing a pellicle-equipped mask, characterized in that the pellicle is permanently adhered to the mask by adhering and removing at least one of the remaining liners. 5. A pellicle film is stretched on one end face of a pellicle frame having an opening in the center, and an adhesive layer is provided on the other end face, and a main liner and a sub-liner have a part of the main liner. The sub-liner is laminated so as to be exposed, and the sub-liner is directly attached to the adhesive layer, and the main liner is also directly attached to the adhesive layer at the part exposed from the sub-liner, and the main liner And, the sub-liner prepares a pellicle that can be separately peeled from the adhesive layer, peels the main liner from the adhesive layer, and temporarily adheres the pellicle to a mask by the adhesive layer exposed from the sub-liner. After that, the sub-liner is peeled off from the adhesive layer in the temporarily bonded state, and the pellicle is adhered to the mask. Method for manufacturing a pellicle mask, which comprises the adhesive by.