JP2003194748A5 - - Google Patents
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- Publication number
- JP2003194748A5 JP2003194748A5 JP2002355558A JP2002355558A JP2003194748A5 JP 2003194748 A5 JP2003194748 A5 JP 2003194748A5 JP 2002355558 A JP2002355558 A JP 2002355558A JP 2002355558 A JP2002355558 A JP 2002355558A JP 2003194748 A5 JP2003194748 A5 JP 2003194748A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01870272-0 | 2001-12-06 | ||
EP01870272A EP1318394B1 (en) | 2001-12-06 | 2001-12-06 | Method and apparatus for local surface analysis |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2003194748A JP2003194748A (ja) | 2003-07-09 |
JP2003194748A5 true JP2003194748A5 (ja) | 2006-02-02 |
JP4163938B2 JP4163938B2 (ja) | 2008-10-08 |
Family
ID=8185065
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002355558A Expired - Fee Related JP4163938B2 (ja) | 2001-12-06 | 2002-12-06 | サンプルの表面分析を行う方法及びこれを実施する装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6809317B2 (ja) |
EP (1) | EP1318394B1 (ja) |
JP (1) | JP4163938B2 (ja) |
AT (1) | ATE386264T1 (ja) |
DE (1) | DE60132788T2 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4777006B2 (ja) * | 2004-08-10 | 2011-09-21 | 富士通株式会社 | 3次元微細領域元素分析方法 |
JP2006260807A (ja) * | 2005-03-15 | 2006-09-28 | Fujitsu Ltd | 元素測定装置及び方法 |
JP4777088B2 (ja) * | 2006-02-24 | 2011-09-21 | 富士通株式会社 | 3次元微細領域元素分析方法 |
US20070278180A1 (en) * | 2006-06-01 | 2007-12-06 | Williamson Mark J | Electron induced chemical etching for materials characterization |
US7791055B2 (en) | 2006-07-10 | 2010-09-07 | Micron Technology, Inc. | Electron induced chemical etching/deposition for enhanced detection of surface defects |
US7807062B2 (en) * | 2006-07-10 | 2010-10-05 | Micron Technology, Inc. | Electron induced chemical etching and deposition for local circuit repair |
US7892978B2 (en) | 2006-07-10 | 2011-02-22 | Micron Technology, Inc. | Electron induced chemical etching for device level diagnosis |
US7791071B2 (en) | 2006-08-14 | 2010-09-07 | Micron Technology, Inc. | Profiling solid state samples |
US7718080B2 (en) | 2006-08-14 | 2010-05-18 | Micron Technology, Inc. | Electronic beam processing device and method using carbon nanotube emitter |
US7833427B2 (en) | 2006-08-14 | 2010-11-16 | Micron Technology, Inc. | Electron beam etching device and method |
US10627352B2 (en) | 2011-08-22 | 2020-04-21 | Exogenesis Corporation | Methods and apparatus for employing an accelerated neutral beam for improved surface analysis |
CN108426758B (zh) * | 2017-02-14 | 2020-10-30 | 无锡华瑛微电子技术有限公司 | 晶圆局部处理方法 |
CN114599968A (zh) * | 2019-06-18 | 2022-06-07 | 富鲁达加拿大公司 | 改进型质谱流式细胞术 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3567927A (en) * | 1969-04-11 | 1971-03-02 | Nasa | Ion microprobe mass spectrometer for analyzing fluid materials |
US4393311A (en) * | 1980-06-13 | 1983-07-12 | Bell Telephone Laboratories, Incorporated | Method and apparatus for surface characterization and process control utilizing radiation from desorbed particles |
US4496449A (en) * | 1983-12-16 | 1985-01-29 | Colromm, Inc. | Electron beam etching of integrated circuit structures |
US4733073A (en) * | 1983-12-23 | 1988-03-22 | Sri International | Method and apparatus for surface diagnostics |
US5272338A (en) * | 1992-05-21 | 1993-12-21 | The Pennsylvania Research Corporation | Molecular imaging system |
US6204189B1 (en) * | 1999-01-29 | 2001-03-20 | The Regents Of The University Of California | Fabrication of precision high quality facets on molecular beam epitaxy material |
-
2001
- 2001-12-06 EP EP01870272A patent/EP1318394B1/en not_active Expired - Lifetime
- 2001-12-06 DE DE60132788T patent/DE60132788T2/de not_active Expired - Lifetime
- 2001-12-06 AT AT01870272T patent/ATE386264T1/de not_active IP Right Cessation
-
2002
- 2002-12-06 JP JP2002355558A patent/JP4163938B2/ja not_active Expired - Fee Related
- 2002-12-06 US US10/313,945 patent/US6809317B2/en not_active Expired - Fee Related