JP2003192680A5 - - Google Patents

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Publication number
JP2003192680A5
JP2003192680A5 JP2001398672A JP2001398672A JP2003192680A5 JP 2003192680 A5 JP2003192680 A5 JP 2003192680A5 JP 2001398672 A JP2001398672 A JP 2001398672A JP 2001398672 A JP2001398672 A JP 2001398672A JP 2003192680 A5 JP2003192680 A5 JP 2003192680A5
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JP
Japan
Prior art keywords
group
groups
hydrogen peroxide
range
selectivity
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JP2001398672A
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Japanese (ja)
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JP4067823B2 (en
JP2003192680A (en
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Priority to JP2001398672A priority Critical patent/JP4067823B2/en
Priority claimed from JP2001398672A external-priority patent/JP4067823B2/en
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Publication of JP2003192680A5 publication Critical patent/JP2003192680A5/ja
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Expired - Fee Related legal-status Critical Current

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Description

【0004】
【発明が解決しようとする課題】
上記の方法(1)では、反応系で生成する過ギ酸などの過酸は爆発性が高く取扱いが危険であり、エポキシ体が反応系内に存在するカルボン酸と反応することによりエステル体等が生成してしまい、目的とするエポキシ体の選択率が低下する。方法(2)では、高価な貴金属触媒を使用しており、また加水分解反応が進行してエポキシ化選択率は低い。方法(3)では、基質特異性が激しく、親水性の低いオレフィンではエポキシ化選択率は低い。
[0004]
[Problems to be solved by the invention]
In the above method (1), the peracid such as formic acid generated in the reaction system is highly explosive and handling is dangerous, and the ester forms by reacting with the carboxylic acid present in the reaction system. It forms, and the selectivity of the target epoxy body falls. In the method (2), an expensive noble metal catalyst is used, and the hydrolysis reaction proceeds and the epoxidation selectivity is low. In the method (3), the substrate specificity is high, and the low hydrophilicity olefin has low epoxidation selectivity.

【0013】
【発明の実施の形態】
上記一般式において、R 、R 、R 、R 、R 、R 、R 、R 、R およびR10 が表すハロゲン原子としては、例えばフッ素原子、塩素原子、臭素原子などが挙げられる。R 、R 、R 、R 、R 、R 、R 、R 、R およびR10 が表すアルキル基としては、炭素数1〜20のアルキル基が好ましく、例えば、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、sec−ブチル基、tert−ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、セチル基、ステアリル基などの直鎖状アルキル基;シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロオクチル基などのシクロアルキル基などが挙げられる。これらのアルキル基は置換基を有していてもよく、置換基としては、例えば、フッ素原子、塩素原子、臭素原子などのハロゲン原子;メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、ブトキシ基などのアルコキシル基;ニトロ基;カルボキシル基;メトキシカルボニル基、エトキシカルボニル基などのアルコキシカルボニル基;アセチルオキシ基、プロピオニルオキシ基などのエステル基などが挙げられる。
[0013]
BEST MODE FOR CARRYING OUT THE INVENTION
Examples of the halogen atom represented by R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 and R 10 in the above general formula include, for example, a fluorine atom, a chlorine atom and a bromine atom Etc. The alkyl group represented by R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 , R 9 and R 10 is preferably an alkyl group having 1 to 20 carbon atoms, for example, methyl Group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, cetyl group, stearyl And a linear alkyl group such as a group; and a cycloalkyl group such as a cyclobutyl group, a cyclopentyl group, a cyclohexyl group and a cyclooctyl group. These alkyl groups may have a substituent, and examples of the substituent include halogen atoms such as fluorine atom, chlorine atom and bromine atom; methoxy group, ethoxy group, propoxy group, isopropoxy group, butoxy group And the like; nitro groups; carboxyl groups; alkoxycarbonyl groups such as methoxycarbonyl groups and ethoxycarbonyl groups; and ester groups such as acetyloxy groups and propionyloxy groups.

【0023】
反応に使用される過酸化水素は、10〜60重量%過酸化水素水溶液として工業的に容易に入手でき、一般に市販されている水溶液をそのまま、または水で希釈して用いることができる。過酸化水素の濃度は特に限定されないが、安全性、容積効率などの観点から、0.01〜60重量%の範囲であるのが好ましく、0.1〜50重量%の範囲であるのがより好ましい。過酸化水素の使用量は、炭素数6以上の環状モノオレフィンに対して0.1〜5.0モルの範囲であるのが好ましく、反応効率、選択率などの観点から、0.3〜2.0モルの範囲であるのがより好ましい。
[0023]
The hydrogen peroxide used in the reaction can be easily obtained industrially as a 10 to 60% by weight aqueous hydrogen peroxide solution, and a generally commercially available aqueous solution can be used as it is or diluted with water. The concentration of hydrogen peroxide is not particularly limited, but is preferably in the range of 0.01 to 60% by weight, more preferably in the range of 0.1 to 50% by weight, from the viewpoint of safety, volumetric efficiency, etc. preferable. The amount of hydrogen peroxide used is preferably in the range of 0.1 to 5.0 times the molar amount with respect to the cyclic monoolefin having 6 or more carbon atoms, and from the viewpoint of reaction efficiency, selectivity, etc. and more preferably a range of 2.0 times mole.

JP2001398672A 2001-12-28 2001-12-28 Process for epoxidation of cyclic monoolefins Expired - Fee Related JP4067823B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001398672A JP4067823B2 (en) 2001-12-28 2001-12-28 Process for epoxidation of cyclic monoolefins

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001398672A JP4067823B2 (en) 2001-12-28 2001-12-28 Process for epoxidation of cyclic monoolefins

Publications (3)

Publication Number Publication Date
JP2003192680A JP2003192680A (en) 2003-07-09
JP2003192680A5 true JP2003192680A5 (en) 2004-11-25
JP4067823B2 JP4067823B2 (en) 2008-03-26

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001398672A Expired - Fee Related JP4067823B2 (en) 2001-12-28 2001-12-28 Process for epoxidation of cyclic monoolefins

Country Status (1)

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JP (1) JP4067823B2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4444642B2 (en) 2003-12-15 2010-03-31 高砂香料工業株式会社 Novel multi-component oxidation catalyst and method for producing epoxy compound using the same
JP5243123B2 (en) * 2007-12-28 2013-07-24 日本化薬株式会社 Epoxy composition, method for producing epoxy composition, curable resin composition, and cured product
JP2010229065A (en) * 2009-03-26 2010-10-14 Daicel Chem Ind Ltd Method for producing oxidized compound
US8742145B2 (en) 2009-07-24 2014-06-03 Arakawa Chemical Industries, Ltd. Method for manufacturing an epoxy compound and method for epoxidizing a carbon—carbon double bond
JP5780627B2 (en) * 2009-09-16 2015-09-16 日本化薬株式会社 Method for producing epoxy compound
TWI614239B (en) * 2012-11-28 2018-02-11 捷恩智股份有限公司 Norbornene derivative and manufacturing method of norbornene derivative
JP7345034B1 (en) 2022-10-11 2023-09-14 株式会社ビズリーチ Document creation support device, document creation support method, and document creation support program

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