JP2003188497A - Method of forming conductor circuit - Google Patents
Method of forming conductor circuitInfo
- Publication number
- JP2003188497A JP2003188497A JP2001385103A JP2001385103A JP2003188497A JP 2003188497 A JP2003188497 A JP 2003188497A JP 2001385103 A JP2001385103 A JP 2001385103A JP 2001385103 A JP2001385103 A JP 2001385103A JP 2003188497 A JP2003188497 A JP 2003188497A
- Authority
- JP
- Japan
- Prior art keywords
- insulating substrate
- conductor circuit
- water
- repellent film
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、所定の絶縁基板上
に、例えば線幅20μmの微細な配線パターンからなる
導体回路を形成するに好適な導体回路の形成方法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a conductor circuit suitable for forming a conductor circuit having a fine wiring pattern with a line width of 20 .mu.m on a predetermined insulating substrate.
【0002】[0002]
【関連する背景技術】半導体集積回路の高性能・高機能
化、更には各種抵抗やコンデンサ等からなるチップ部品
の微小化に伴い、これらの電子部品を搭載する印刷回路
基板における導体回路の配線パターン幅や、その接続端
子部をなすランド等の高密度微細化が進められている。
特にビルドアップ基板において多ピンフリップチップ接
続を実現するような場合には、導体回路の配線ピッチを
20μm、そのビア/ランド径を30/50μm程度に
微細化することが要求されている。[Related Background Art] With higher performance and higher functionality of semiconductor integrated circuits, and further miniaturization of chip components such as various resistors and capacitors, wiring patterns of conductor circuits in printed circuit boards on which these electronic components are mounted The miniaturization of the width and the land forming the connection terminal portion has been advanced.
In particular, in the case of realizing multi-pin flip chip connection on a build-up substrate, it is required to reduce the wiring pitch of the conductor circuit to 20 μm and the via / land diameter to about 30/50 μm.
【0003】[0003]
【発明が解決しようとする課題】しかしながら従来一般
的なサブトラクティブ法(導体膜のパターンエッチング
処理)やアディティブ法(例えばスクリーン印刷)によ
る導体回路の形成技術においては、導体回路のパターン
幅やそのスペース幅を30μm程度に設定することが限
界である。また最近では導電性の微粒子を含むトナーを
用い、レーザビーム照射により描画した静電潜像担持体
(感光体ドラム)を用いて導体回路を転写形成する技術
も提唱されている。しかしその装置自体の構成が大掛か
りである等の問題がある。However, in the conventional technique of forming a conductor circuit by a subtractive method (pattern etching treatment of a conductor film) or an additive method (for example, screen printing), the pattern width of the conductor circuit and its space are used. The limit is to set the width to about 30 μm. Recently, a technique has also been proposed in which a conductor circuit is transferred and formed using a toner containing conductive fine particles and an electrostatic latent image carrier (photosensitive drum) drawn by laser beam irradiation. However, there is a problem in that the structure of the device itself is large.
【0004】本発明はこのような事情を考慮してなされ
たもので、その目的は、簡易にして効果的に高密度で微
細な導体回路を形成するに好適な導体回路の形成方法を
提供することにある。The present invention has been made in view of the above circumstances, and an object thereof is to provide a conductor circuit forming method suitable for easily and effectively forming a high-density and fine conductor circuit. Especially.
【0005】[0005]
【課題を解決するための手段】上述した目的を達成する
べく本発明に係る導体回路の形成方法は、所定の絶縁基
体上に導体回路を形成するに際して、前記絶縁基体の表
面に撥水加工膜を形成した後、前記絶縁基体上に形成す
べき導体回路の配線パターンに応じて上記撥水加工膜に
レーザ光を照射して該レーザ光照射部位の撥水加工膜を
除去し、次いで前記絶縁基体の上記撥水加工膜の除去に
より露出した領域に、インクジェットノズルを用いて導
電性の独立分散超微粒子を含むインク粒を噴射して前記
配線パターンを描画してなることを特徴としている。In order to achieve the above-mentioned object, the method for forming a conductor circuit according to the present invention is such that when a conductor circuit is formed on a predetermined insulating substrate, a water repellent film is formed on the surface of the insulating substrate. After the formation of the water-repellent film, the water-repellent film is irradiated onto the water-repellent film in accordance with the wiring pattern of the conductor circuit to be formed on the insulating substrate to remove the water-repellent film at the laser light irradiation site, It is characterized in that the wiring pattern is drawn by injecting ink particles containing electrically conductive independent dispersed ultrafine particles onto an area exposed by the removal of the water repellent film of the substrate by using an inkjet nozzle.
【0006】即ち、本発明に係る導体回路の形成方法
は、インクジェットノズルを用いて、例えば銅、銀、
金、パラジウム、ニッケル等の導電性素材をナノレベル
に微粒化した導電性超微粒子を含む微小径のインク粒を
噴射しながら所定の絶縁基体上に導体回路パターンを描
画していくものであって、特に上記絶縁基体の表面に、
予めフッ素系樹脂等をコーティングして撥水加工膜を形
成し、該絶縁基体に形成すべき導体回路の配線パターン
に応じて前記撥水加工膜にレーザ光を照射して該レーザ
光照射部位の撥水加工膜を除去し、この撥水加工膜の除
去により露出した領域に前記インク粒を噴射すること
で、前記撥水加工膜によりインク粒による描画パターン
幅を規定した高密度で微細な導体回路を形成することを
特徴としている。That is, the method for forming a conductor circuit according to the present invention uses an ink jet nozzle, for example, copper, silver,
A conductive circuit pattern is drawn on a predetermined insulating substrate while ejecting ink particles of a minute diameter containing conductive ultrafine particles of conductive materials such as gold, palladium, and nickel that are atomized to the nano level. , Especially on the surface of the insulating substrate,
A water-repellent film is formed in advance by coating with a fluororesin, and the water-repellent film is irradiated with laser light in accordance with the wiring pattern of the conductor circuit to be formed on the insulating substrate. The water-repellent film is removed, and the ink particles are jetted to the region exposed by the removal of the water-repellent film, so that the water-repellent film defines a drawing pattern width of the ink particles, and a high-density and fine conductor. It is characterized by forming a circuit.
【0007】[0007]
【発明の実施の形態】以下、図面を参照して本発明の一
実施形態に係る導体回路の形成方法について説明する。
図1はこの実施形態に係る導体回路の形成方法の概略的
な処理手順を示す図であって、1は導体回路の形成対象
とする絶縁基板(絶縁基体)を示している。この絶縁基
板1は、例えばポリイミド系やガラスエポキシ系の、い
わゆるプリント配線回路用基板からなる。DETAILED DESCRIPTION OF THE INVENTION A method of forming a conductor circuit according to an embodiment of the present invention will be described below with reference to the drawings.
FIG. 1 is a view showing a schematic processing procedure of a method for forming a conductor circuit according to this embodiment, and 1 shows an insulating substrate (insulating base) on which a conductor circuit is formed. The insulating substrate 1 is made of, for example, a so-called printed wiring circuit board of polyimide type or glass epoxy type.
【0008】この絶縁基板1に対する導体回路の形成
は、例えば銅、銀、金、パラジウム、ニッケル等の導電
性素材をナノレベルに微粒化した超微粒子(ナノ粒子)
を独立分散させたペースト状のインクを、図2に示すよ
うにインクジェットノズル2を用いて微小径のインク粒
3として噴射しながら、上記絶縁基板1上に所定の導体
パターン4を描画することによって行われる。この導体
パターン4の描画は、例えば絶縁基板1を載置したX-
Yテーブルを、該絶縁基板1に形成すべき導体回路の配
線パターンに応じて移動させながら行われる。尚、X-
Yテーブルを用いて絶縁基板1を移動することに代え
て、インクジェットノズル2をX-Y方向に変位させな
がら配線パターンを描画することも勿論可能である。The conductive circuit is formed on the insulating substrate 1 by ultrafine particles (nanoparticles) obtained by atomizing a conductive material such as copper, silver, gold, palladium and nickel to a nano level.
By injecting a paste-like ink in which the above are independently dispersed as ink droplets 3 having a small diameter using an inkjet nozzle 2 as shown in FIG. 2, a predetermined conductor pattern 4 is drawn on the insulating substrate 1. Done. The conductor pattern 4 is drawn by, for example, X-on which the insulating substrate 1 is placed.
This is performed while moving the Y table according to the wiring pattern of the conductor circuit to be formed on the insulating substrate 1. Incidentally, X-
Instead of moving the insulating substrate 1 using the Y table, it is of course possible to draw the wiring pattern while displacing the inkjet nozzle 2 in the XY direction.
【0009】ちなみに上記インクジェットノズル2は、
例えば発熱を伴うことなく駆動されて前記ナノ粒子の分
散を保ちながら20μm径程度の微小径のインク粒を噴
射するピエゾ駆動方式のインクジェットヘッドに組み込
まれたものからなる。そして前述したX-Yテーブルと
の相対的な移動により、その描画点の連なりとして導体
パターン4を形成していくように構成される。Incidentally, the ink jet nozzle 2 is
For example, it is built in a piezo drive type inkjet head that is driven without generating heat and ejects ink particles having a small diameter of about 20 μm while maintaining the dispersion of the nanoparticles. Then, the conductor pattern 4 is formed as a series of drawing points by the relative movement with the XY table described above.
【0010】この発明に係る導体回路の形成方法は、上
述したインクジェットノズル2を用いて導電性のナノ粒
子を含むインクをジェット噴射して前記絶縁基板1上に
導体回路を描画するに際し、図1に示すように先ず絶縁
基板1の表面をフッ素系樹脂を用いる等して撥水加工し
(撥水加工処理11)、図3(a)に示すように絶縁基板
1の表面を撥水加工膜5にてコーティングする。In the method of forming a conductor circuit according to the present invention, when a conductor circuit is drawn on the insulating substrate 1 by jetting an ink containing conductive nanoparticles using the above-mentioned ink jet nozzle 2, FIG. First, the surface of the insulating substrate 1 is treated to be water repellent by using a fluorine resin (water repellent treatment 11), and the surface of the insulating substrate 1 is treated to be a water repellent film as shown in FIG. 3 (a). Coating at 5.
【0011】そして絶縁基板1の表面に形成した撥水加
工膜5に、該絶縁基板1に形成すべき導体回路の配線パ
ターンに応じて図3(b)に示すようにレーザ光を照射
し、そのレーザ光照射部位の撥水加工膜5を除去し(レ
ーザ光描画処理12)、これによって前記配線パターン
に応じて絶縁基板1の表面を露出させる。このレーザ光
描画処理12は、前記撥水加工膜5にて表面がコーティ
ングされた絶縁基板1をX-Yテーブル12a上に載置
し、描画制御装置13の制御の下でX-Yテーブル12
aを移動駆動しながらレーザ装置12bからレーザ光を
照射することによって行われる。Then, the water repellent film 5 formed on the surface of the insulating substrate 1 is irradiated with laser light as shown in FIG. 3 (b) according to the wiring pattern of the conductor circuit to be formed on the insulating substrate 1, The water repellent film 5 at the laser light irradiation site is removed (laser light drawing processing 12), thereby exposing the surface of the insulating substrate 1 according to the wiring pattern. In the laser light drawing process 12, the insulating substrate 1 whose surface is coated with the water repellent film 5 is placed on the XY table 12a, and the XY table 12 is controlled under the control of the drawing controller 13.
It is performed by irradiating a laser beam from the laser device 12b while moving and driving a.
【0012】この際、レーザ光の照射により絶縁基板1
の表面が図3(c)に示すように掘削されて粗地化される
ような場合には、絶縁基板11の表面を洗浄してその掘
削カスを除去した後(洗浄処理14)、絶縁基板1を乾
燥させる(乾燥処理15)。しかしレーザ光の照射によ
り絶縁基板1上の撥水加工膜5を除去し、絶縁基板1の
表面のレーザ光照射部位を露出させるだけであるなら
ば、上述した洗浄・乾燥処理14,15は不要である。At this time, the insulating substrate 1 is irradiated with laser light.
If the surface of the insulating substrate 11 is excavated and roughened as shown in FIG. 3C, the surface of the insulating substrate 11 is cleaned to remove the excavated dust (cleaning process 14), and then the insulating substrate 1 is dried (drying process 15). However, if only the water repellent film 5 on the insulating substrate 1 is removed by irradiation of laser light and the laser light irradiation site on the surface of the insulating substrate 1 is exposed, the above-mentioned cleaning / drying treatments 14 and 15 are unnecessary. Is.
【0013】しかる後、レーザ光の照射により撥水加工
膜5を配線パターンに応じて部分的に除去した絶縁基板
1をX-Yテーブル16aに載置し、前述したインクジ
ェットノズル2を備えたインクジェット装置16bを用
いて前記導電性ナノ粒子を含むインク粒を上記絶縁基板
1に噴射して導体回路を描画形成する(導体回路描画処
理16)。この導体回路の描画は、前記描画制御装置1
3の制御の下で絶縁基板1上に形成すべき配線パターン
に応じてX-Yテーブル16aを駆動しながら行われ
る。特にこのインク粒の噴射による導体回路の描画は、
予めX-Yテーブル16aに対する絶縁基板1の載置位
置を、例えば絶縁基板1に設けた位置合わせマーク等を
利用して高精度に規定した上で行われる。これによって
前述したレーザ光の照射によって絶縁基板1を露出させ
た領域だけにインク粒が噴射され、図3(d)に示すよう
に導電性ナノ粒子を含むインク6による導体回路の描画
が行われる。Thereafter, the insulating substrate 1 from which the water repellent film 5 has been partially removed according to the wiring pattern by laser light irradiation is placed on the XY table 16a, and the ink jet nozzle 2 having the above-mentioned ink jet nozzle 2 is placed. Ink particles containing the conductive nanoparticles are jetted onto the insulating substrate 1 using the device 16b to draw and form a conductor circuit (conductor circuit drawing process 16). This conductor circuit is drawn by the drawing control device 1
Under the control of 3, the XY table 16a is driven according to the wiring pattern to be formed on the insulating substrate 1. Especially, the drawing of the conductor circuit by the ejection of ink particles
The mounting position of the insulating substrate 1 with respect to the XY table 16a is defined in advance with high accuracy by using, for example, a positioning mark provided on the insulating substrate 1. As a result, ink particles are ejected only on the region where the insulating substrate 1 is exposed by the above-mentioned laser light irradiation, and as shown in FIG. 3D, a conductor circuit is drawn with the ink 6 containing conductive nanoparticles. .
【0014】その後、必要に応じて前記撥水加工膜5を
洗浄除去し(洗浄処理17)、絶縁基板1を乾燥させる
ことで(乾燥処理18)、図3(e)に示すように絶縁基
板1上に導電性ナノ粒子を含むインク6により描画され
た導体回路が形成されることになる。尚、撥水加工膜5
が絶縁性のあるフッ素系樹脂からなる場合には、この撥
水加工膜5をそのまま残しておくことも可能である。従
ってこの場合には、上記洗浄・乾燥処理17,18が不
要となる。Thereafter, if necessary, the water repellent film 5 is washed and removed (washing treatment 17), and the insulating substrate 1 is dried (drying treatment 18). As shown in FIG. A conductive circuit drawn with the ink 6 containing the conductive nanoparticles is formed on the surface 1. The water repellent film 5
When the water-repellent film 5 is made of an insulating fluororesin, the water-repellent film 5 can be left as it is. Therefore, in this case, the washing / drying processes 17 and 18 are unnecessary.
【0015】かくして上述した如くして導電性ナノ粒子
を含むインク6をインクジェットノズル2から噴出して
絶縁基板1上に導体回路を形成するに際して、予め絶縁
基板1の表面に撥水加工膜5を形成し、この撥水加工膜
5にレーザ光を照射して前記絶縁基板1上に形成すべき
導体回路の配線パターンに応じた露出領域を形成した
後、この露出領域に導電性ナノ粒子を含むインク6を噴
出するので、該インク6が絶縁基板1の表面に拡がって
その描画線幅が太くなることがない。Thus, as described above, when the ink 6 containing the conductive nanoparticles is jetted from the ink jet nozzle 2 to form the conductor circuit on the insulating substrate 1, the water repellent film 5 is previously formed on the surface of the insulating substrate 1. After forming and irradiating the water repellent film 5 with a laser beam to form an exposed region corresponding to the wiring pattern of the conductor circuit to be formed on the insulating substrate 1, the exposed region contains conductive nanoparticles. Since the ink 6 is ejected, the ink 6 does not spread on the surface of the insulating substrate 1 and the drawing line width does not become thick.
【0016】即ち、その表面を撥水加工することなく絶
縁基板1の表面に導電性ナノ粒子を含むインク6をジェ
ット噴射した場合、図4に模式的に示すようにインクジ
ェットノズル2から噴出されたインク粒6が直径20μ
m程度の微小径なものであっても、絶縁基板1の濡れ性
により該絶縁基板1の表面に付着した際、そのインク塊
7は直径100μm程度に拡がることが否めない。この
点、上述したように絶縁基板1の表面にコーティングし
た撥水加工膜5にレーザ光を照射し、絶縁基板1に形成
すべき導体回路の配線パターン幅に応じた領域だけを露
出させ、この露出領域にインク粒6を噴射すれば、その
インクは撥水加工膜5により撥水されて絶縁基板1の露
出領域にだけ付着することになる。この結果、微小径の
インク粒6は絶縁基板1の表面に拡がることなく、レー
ザ光の照射により撥水加工膜5を除去して開口した絶縁
基板1の露出領域にだけ付着することになり、ここに微
細な線幅の導体回路を高精度に描画形成することが可能
となる。That is, when the ink 6 containing the conductive nanoparticles is jet-jetted onto the surface of the insulating substrate 1 without making the surface water-repellent, it is jetted from the inkjet nozzle 2 as schematically shown in FIG. Ink grain 6 has a diameter of 20μ
Even if the diameter is as small as m, it cannot be denied that the ink mass 7 spreads to a diameter of about 100 μm when attached to the surface of the insulating substrate 1 due to the wettability of the insulating substrate 1. In this regard, as described above, the water repellent film 5 coated on the surface of the insulating substrate 1 is irradiated with laser light to expose only the region corresponding to the wiring pattern width of the conductor circuit to be formed on the insulating substrate 1. When the ink particles 6 are ejected to the exposed area, the ink is repelled by the water repellent film 5 and adheres only to the exposed area of the insulating substrate 1. As a result, the ink particles 6 having a minute diameter do not spread on the surface of the insulating substrate 1, but adhere to only the exposed region of the insulating substrate 1 which is opened by removing the water repellent film 5 by the irradiation of laser light. It is possible to draw and form a conductor circuit having a fine line width with high accuracy.
【0017】特に前述したようにレーザ光の照射により
絶縁基板1の表面を粗地化しておけばインクの付着強度
を効果的に高めることができるので、耐剥離性(密着
性)に優れた導体回路を容易に形成することが可能とな
る等の実用上多大なる効果が奏せられる。また導電性の
ナノ粒子を含むインク粒6をジェット噴射して導電回路
を描画形成するので、電気伝導度の高い、つまり導電抵
抗の小さい微細パターンからなる導電回路を容易に形成
することができる等の効果が奏せられる。Particularly, as described above, if the surface of the insulating substrate 1 is roughened by the irradiation of the laser beam, the adhesion strength of the ink can be effectively increased, so that the conductor excellent in peeling resistance (adhesion). A great practical effect is obtained such that a circuit can be easily formed. Further, since the ink particles 6 containing conductive nanoparticles are jet-jetted to form a conductive circuit by drawing, a conductive circuit having a high electric conductivity, that is, a fine pattern having a small conductive resistance can be easily formed. The effect of.
【0018】尚、本発明は上述した実施形態に限定され
るものではない。例えばナノ粒子を含むインクの粘性
は、インクジェットノズル2のノズル径やインク噴出力
等に応じて定めれば良いものである。また撥水加工膜5
の種別やその厚みについては、絶縁基板1の種別や導体
回路の配線パターン幅等に応じて定めれば良いものであ
る。またここではプリント配線回路用の印刷基板に導体
回路を形成する例について示したが、その他の絶縁体上
に導体回路を形成する場合にも同様に適用することがで
きる。The present invention is not limited to the above embodiment. For example, the viscosity of the ink containing nanoparticles may be determined according to the nozzle diameter of the inkjet nozzle 2 and the ink ejection output. In addition, water repellent film 5
The type and the thickness thereof may be determined according to the type of the insulating substrate 1, the wiring pattern width of the conductor circuit, and the like. Further, here, the example in which the conductor circuit is formed on the printed circuit board for the printed wiring circuit is shown, but the same can be applied to the case where the conductor circuit is formed on another insulator.
【0019】また撥水加工膜5にレーザ光を照射する際
に描画制御するX-Yテーブル12aと、絶縁基板1に
ナノ粒子を含むインク粒6を噴射する際に用いるX-Y
テーブル16aとして同じものを用いることの勿論可能
である。その他、本発明はその要旨を逸脱しない範囲で
種々変形して実施することができる。Further, an XY table 12a for drawing control when irradiating the water repellent film 5 with a laser beam, and an XY table used for ejecting ink particles 6 containing nanoparticles on the insulating substrate 1.
Of course, the same table 16a can be used. In addition, the present invention can be variously modified and implemented without departing from the scope of the invention.
【0020】[0020]
【発明の効果】以上説明したように本発明によれば、絶
縁基体の表面に設けた撥水加工膜にレーザ光を照射し、
上記絶縁基体に形成すべき導体回路の配線パターンに応
じて上記撥水加工膜をパターニングして絶縁基体を露出
させ、この絶縁基体の露出領域に導電性の独立分散超微
粒子を含むインク粒をジェット噴射して導体回路を描画
するので、簡易にして効果的に微細な配線パターンから
なる導体回路を高精度に形成することができる。従って
その実用的利点が多大である。As described above, according to the present invention, the water repellent film provided on the surface of the insulating substrate is irradiated with laser light,
The water repellent film is patterned according to the wiring pattern of the conductor circuit to be formed on the insulating substrate to expose the insulating substrate, and ink particles containing electrically conductive independent dispersed ultrafine particles are jetted to the exposed region of the insulating substrate. Since the conductor circuit is drawn by jetting, it is possible to simply and effectively form the conductor circuit having a fine wiring pattern with high accuracy. Therefore, its practical advantages are great.
【図1】本発明の一実施形態に係る導体回路の形成方法
の概略的な処理手順を示す図。FIG. 1 is a diagram showing a schematic processing procedure of a method for forming a conductor circuit according to an embodiment of the present invention.
【図2】インクジェットノズルを用いたインク粒の噴射
による導体回路の描画形成の概念を示す図。FIG. 2 is a diagram showing a concept of drawing formation of a conductor circuit by ejecting ink particles using an inkjet nozzle.
【図3】本発明に係る導体回路の形成手順を段階的に示
す模式図。FIG. 3 is a schematic diagram showing stepwise a procedure for forming a conductor circuit according to the present invention.
【図4】絶縁基板に付着するインク粒の濡れ性による拡
がりの様子を示す図。FIG. 4 is a diagram showing how ink particles adhering to an insulating substrate spread due to their wettability.
1 絶縁基板(絶縁基体) 2 インクジェットノズル 3 導電性のナノ粒子を含むインク粒 5 撥水加工膜 12 レーザ光描画処理 16 導体回路描画処理 1 Insulating substrate (insulating substrate) 2 inkjet nozzle 3 Ink particles containing conductive nanoparticles 5 Water repellent film 12 Laser light drawing processing 16 Conductor circuit drawing process
フロントページの続き Fターム(参考) 4E351 AA03 AA04 BB01 BB31 CC11 DD04 DD05 DD06 DD19 DD20 DD52 EE01 GG20 5E343 AA02 AA15 AA17 AA18 AA37 BB03 BB23 BB24 BB25 BB44 BB48 BB72 DD17 EE32 FF05 GG08 Continued front page F-term (reference) 4E351 AA03 AA04 BB01 BB31 CC11 DD04 DD05 DD06 DD19 DD20 DD52 EE01 GG20 5E343 AA02 AA15 AA17 AA18 AA37 BB03 BB23 BB24 BB25 BB44 BB48 BB72 DD17 EE32 FF05 GG08
Claims (2)
に際し、 前記絶縁基体の表面に撥水加工膜を形成した後、前記絶
縁基体上に形成すべき導体回路の配線パターンに応じて
上記撥水加工膜にレーザ光を照射して該レーザ光照射部
位の撥水加工膜を除去し、 次いで前記絶縁基体の上記撥水加工膜の除去により露出
した領域に、インクジェットノズルを用いて導電性の超
微粒子を含むインク粒を噴射して前記配線パターンを描
画してなることを特徴とする導体回路の形成方法。1. When forming a conductor circuit on a predetermined insulating substrate, a water-repellent film is formed on the surface of the insulating substrate, and then the conductive circuit is formed according to the wiring pattern of the conductor circuit to be formed on the insulating substrate. The water-repellent processed film is irradiated with laser light to remove the water-repellent processed film at the laser-beam-irradiated portion, and then the region of the insulating substrate exposed by the removal of the water-repellent processed film is made conductive using an inkjet nozzle. 2. A method for forming a conductor circuit, comprising: ejecting ink particles containing ultrafine particles to draw the wiring pattern.
なり、 前記導電性の超微粒子は、銅、銀、金、パラジウム、ニ
ッケル等の導電性素材をナノレベルに微粒化したもので
あって、前記インクジェットノズルは、上記超微粒子を
独立分散させて含有したペースト状のインクを粒子化し
て噴射するものである請求項1に記載の導体回路の形成
方法。2. The water-repellent film is made of a fluorine-based material, and the conductive ultrafine particles are nano-sized particles of a conductive material such as copper, silver, gold, palladium and nickel. 2. The method for forming a conductor circuit according to claim 1, wherein the inkjet nozzle is for forming a paste-like ink containing the ultrafine particles independently dispersed into particles and ejecting the particles.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001385103A JP2003188497A (en) | 2001-12-18 | 2001-12-18 | Method of forming conductor circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001385103A JP2003188497A (en) | 2001-12-18 | 2001-12-18 | Method of forming conductor circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2003188497A true JP2003188497A (en) | 2003-07-04 |
Family
ID=27594651
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001385103A Pending JP2003188497A (en) | 2001-12-18 | 2001-12-18 | Method of forming conductor circuit |
Country Status (1)
Country | Link |
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JP (1) | JP2003188497A (en) |
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