JP2003176263A - Hydroxysulfone derivative and method for producing the same - Google Patents

Hydroxysulfone derivative and method for producing the same

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Publication number
JP2003176263A
JP2003176263A JP2001379813A JP2001379813A JP2003176263A JP 2003176263 A JP2003176263 A JP 2003176263A JP 2001379813 A JP2001379813 A JP 2001379813A JP 2001379813 A JP2001379813 A JP 2001379813A JP 2003176263 A JP2003176263 A JP 2003176263A
Authority
JP
Japan
Prior art keywords
general formula
formula
group
hydroxysulfone
derivative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001379813A
Other languages
Japanese (ja)
Inventor
Toshiya Takahashi
寿也 高橋
Shinzo Seko
信三 世古
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP2001379813A priority Critical patent/JP2003176263A/en
Publication of JP2003176263A publication Critical patent/JP2003176263A/en
Pending legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To obtain a hydroxysulfone derivative and provide a method for producing the same. <P>SOLUTION: The hydroxysulfone derivative is expressed by general formula (1) (wherein Ar expresses an aryl which may be substituted; R<SP>1</SP>expresses H or an OH-protecting group; a wave line expresses either one of E/Z geometrical isomers or a mixture thereof). The method for producing the hydroxysulfone derivative is to react a sulfone expressed by general formula (2) with an aldehyde expressed by general formula (3) in the presence of a base. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、医薬、飼料添加
物、食品添加物の中間体、例えばレチノール誘導体の中
間体として有用なヒドロキシスルホン誘導体およびその
製造方法に関する。
TECHNICAL FIELD The present invention relates to a hydroxysulfone derivative useful as an intermediate for medicines, feed additives and food additives, for example, an intermediate for retinol derivatives and a method for producing the same.

【0002】[0002]

【従来の技術および発明が解決しようとする課題】従
来、本発明のスルホン誘導体は、知られていない。ま
た、本発明者らは、一般式(2)で示されるスルホン類
とC10のアルコール類(ゲラニオールなど)から誘導
されるアリルハライド類とのカップリング反応によるビ
タミンAの重要中間体である新規なスルホン誘導体(特
開平11-222479号公報)を見出しているが、別途製造法
を開発すべくさらに鋭意検討した結果、本発明に至っ
た。
PRIOR ART AND PROBLEMS TO BE SOLVED BY THE INVENTION Conventionally, the sulfone derivative of the present invention has not been known. In addition, the inventors of the present invention have proposed a novel intermediate which is an important intermediate of vitamin A through a coupling reaction of sulfones represented by the general formula (2) and allyl halides derived from C10 alcohols (geraniol etc.). A sulfone derivative (Japanese Patent Laid-Open No. 11-222479) has been found, but as a result of further diligent studies to develop a separate production method, the present invention was completed.

【0003】[0003]

【課題を解決するための手段】すなわち、本発明は、一
般式(1) (式中、Arは置換基を有していてもよいアリール基を
示し、R1は水素原子または水酸基の保護基を示し、波
線はE/Z幾何異性体のいずれか一方またはそれらの混
合物であることを示す。)で示されるヒドロキシスルホ
ン誘導体;および一般式(2) (式中、Arは前記と同じ意味を表わす。)で示される
スルホン類と一般式(3) (式中、Rは水酸基の保護基を示し、波線は前記と同じ
意味を表わす。)で示されるアルデヒドとを塩基の存在
下に反応させる一般式(1)で示されるヒドロキシスル
ホン誘導体の製造方法を提供するものである。
That is, the present invention is based on the general formula (1) (In the formula, Ar represents an aryl group which may have a substituent, R 1 represents a hydrogen atom or a hydroxyl-protecting group, and the wavy line represents one of E / Z geometric isomers or a mixture thereof. A hydroxysulfone derivative represented by the general formula (2) (In the formula, Ar has the same meaning as described above.) And a sulfone represented by the general formula (3). (In the formula, R represents a hydroxyl-protecting group, and the wavy line has the same meaning as described above.) A method for producing a hydroxysulfone derivative represented by the general formula (1), which comprises reacting with an aldehyde represented by the formula (1). Is provided.

【0004】[0004]

【発明の実施の形態】以下、本発明について詳細に説明
する。一般式(1)におけるR1は、水素原子または水
酸基の保護基を示し、一般式(3)におけるRは、水酸
基の保護基を示す。かかる水酸基の保護基としては、例
えばホルミル、アセチル、エトキシアセチル、フルオロ
アセチル、ジフルオロアセチル、トリフルオロアセチ
ル、クロロアセチル、ジクロロアセチル、トリクロロア
セチル、ブロモアセチル、ジブロモアセチル、トリブロ
モアセチル、プロピオニル、2−クロロプロピオニル、
3−クロロプロピオニル、ブチリル、2−クロロブチリ
ル、3−クロロブチリル、4−クロロブチリル、2−メ
チルブチリル、2−エチルブチリル、バレリル、2−メ
チルバレリル、4−メチルバレリル、ヘキサノイル、イ
ソブチリル、イソバレリル、ピバロイル、ベンゾイル、
o−クロロベンゾイル、m−クロロベンゾイル、p−ク
ロロベンゾイル、 o−ヒドロキシベンゾイル、m−ヒ
ドロキシベンゾイル、p−ヒドロキシベンゾイル、 o
−アセトキシベンゾイル、 o−メトキシベンゾイル、
m−メトキシベンゾイル、p−メトキシベンゾイル、p
−ニトロベンゾイル等のアシル基、トリメチルシリル、
トリエチルシリル、t−ブチルジメチルシリル、t−ブ
チルジフェニルシリルなどのシリル基、テトラヒドロピ
ラニル、メトキシメチル、メトキシエトキシメチル、1
−エトキシエチルなどのアルコキシメチル基、ベンジル
基、p−メトキシベンジル基、t−ブチル基、トリチル
基、2,2,2−トリクロロエトキシカルボニル基、ア
リルオキシカルボニル基等が挙げられ、通常、アセチル
基が好ましく用いられる。
BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below. R 1 in the general formula (1) represents a hydrogen atom or a hydroxyl protecting group, and R in the general formula (3) represents a hydroxyl protecting group. Examples of the protective group for the hydroxyl group include formyl, acetyl, ethoxyacetyl, fluoroacetyl, difluoroacetyl, trifluoroacetyl, chloroacetyl, dichloroacetyl, trichloroacetyl, bromoacetyl, dibromoacetyl, tribromoacetyl, propionyl, 2-chloro. Propionyl,
3-chloropropionyl, butyryl, 2-chlorobutyryl, 3-chlorobutyryl, 4-chlorobutyryl, 2-methylbutyryl, 2-ethylbutyryl, valeryl, 2-methylvaleryl, 4-methylvaleryl, hexanoyl, isobutyryl, isovaleryl, pivaloyl, benzoyl,
o-chlorobenzoyl, m-chlorobenzoyl, p-chlorobenzoyl, o-hydroxybenzoyl, m-hydroxybenzoyl, p-hydroxybenzoyl, o
-Acetoxybenzoyl, o-methoxybenzoyl,
m-methoxybenzoyl, p-methoxybenzoyl, p
-Acyl group such as nitrobenzoyl, trimethylsilyl,
A silyl group such as triethylsilyl, t-butyldimethylsilyl, t-butyldiphenylsilyl, tetrahydropyranyl, methoxymethyl, methoxyethoxymethyl, 1
An alkoxymethyl group such as ethoxyethyl, a benzyl group, a p-methoxybenzyl group, a t-butyl group, a trityl group, a 2,2,2-trichloroethoxycarbonyl group, an allyloxycarbonyl group and the like, and usually an acetyl group. Is preferably used.

【0005】一般式(1)および(2)におけるArは
置換基を有していてもよいアリール基を示し、アリール
基としてはフェニル基、ナフチル基等が挙げられ、置換
基としては、C1からC5の直鎖または分枝状のアルキ
ル基、C1からC5の直鎖または分枝状のアルコキシ
基、ハロゲン原子、ニトロ基等が挙げられる。置換基A
rの具体例としては、フェニル、ナフチル、o−トリ
ル,m−トリル,p−トリル、o−メトキシフェニル、
m−メトキシフェニル、p−メトキシフェニル、o−ク
ロロフェニル、m−クロロフェニル、p−クロロフェニ
ル、o−ブロモフェニル、m−ブロモフェニル、p−ブ
ロモフェニル、o−ヨードフェニル、m−ヨードフェニ
ル、p−ヨードフェニル、o−フルオロフェニル、m−
フルオロフェニル、p−フルオロフェニル、o−ニトロ
フェニル、m−ニトロフェニル、p−ニトロフェニル等
が挙げられる。
Ar in the general formulas (1) and (2) represents an aryl group which may have a substituent, and examples of the aryl group include a phenyl group and a naphthyl group. Examples thereof include a C5 straight chain or branched alkyl group, a C1 to C5 straight chain or branched alkoxy group, a halogen atom, and a nitro group. Substituent A
Specific examples of r include phenyl, naphthyl, o-tolyl, m-tolyl, p-tolyl, o-methoxyphenyl,
m-methoxyphenyl, p-methoxyphenyl, o-chlorophenyl, m-chlorophenyl, p-chlorophenyl, o-bromophenyl, m-bromophenyl, p-bromophenyl, o-iodophenyl, m-iodophenyl, p-iodo Phenyl, o-fluorophenyl, m-
Examples thereof include fluorophenyl, p-fluorophenyl, o-nitrophenyl, m-nitrophenyl, p-nitrophenyl and the like.

【0006】本発明の原料化合物であるスルホン類
(2)は、Chem.Lett. 479 (1975)に記載された方法に
より、またアルデヒド(3)は、J. Org. Chem., 44,
9451(1979)に記載された方法により製造することがで
きる。
Sulfones (2), which are the raw material compounds of the present invention, are prepared by the method described in Chem. Lett. 479 (1975), and aldehydes (3) are prepared by J. Org. Chem., 44 ,
It can be produced by the method described in 9451 (1979).

【0007】本発明の製造方法に用いられる塩基として
は、例えばアルキルリチウム、アルカリ金属のアルコキ
シド、グルニヤール試薬等が挙げられ、具体的には、例
えばn−ブチルリチウム、s−ブチルリチウム、t−ブ
チルリチウム、ナトリウムメトキシド、カリウムメトキ
シド、カリウムt−ブトキシド、ナトリウムt−ブトキ
シド、エチルマグネシウムブロマイド、エチルマグネシ
ウムクロライド、メチルマグネシウムブロマイド、メチ
ルマグネシウムクロライド、イソプロピルマグネシウム
ブロマイド、イソプロピルマグネシウムクロライド等が
挙げられる。かかる塩基の使用量はスルホン類(2)に
対して通常、0.5〜3モル倍程度である。
Examples of the base used in the production method of the present invention include alkyllithium, alkali metal alkoxide, Grignard reagent, and the like. Specifically, for example, n-butyllithium, s-butyllithium, t-butyl. Examples thereof include lithium, sodium methoxide, potassium methoxide, potassium t-butoxide, sodium t-butoxide, ethyl magnesium bromide, ethyl magnesium chloride, methyl magnesium bromide, methyl magnesium chloride, isopropyl magnesium bromide and isopropyl magnesium chloride. The amount of such a base used is usually about 0.5 to 3 mol times the sulfone (2).

【0008】上記反応は、通常、有機溶媒中で実施さ
れ、使用される溶媒としてはアセトニトリル、N,N−
ジメチルホルムアミド、ヘキサメチルホスホリックトリ
アミド、スルホラン、1,3−ジメチル−2−イミダゾ
リジノン、1−メチル−2−ピロリジノン等の非プロト
ン性極性溶媒、ジエチルエーテル、テトラヒドロフラ
ン、1,4−ジオキサン、ジメトキシエタン、アニソー
ル等のエーテル系溶媒、n-ヘキサン、シクロヘキサ
ン、n-ペンタン、ベンゼン、トルエン、キシレン等の
炭化水素系溶媒などが挙げられる。これらは単一であっ
ても2種以上の混合溶媒で使用してもよい。
The above reaction is usually carried out in an organic solvent, and the solvent used is acetonitrile, N, N-
Aprotic polar solvents such as dimethylformamide, hexamethylphosphoric triamide, sulfolane, 1,3-dimethyl-2-imidazolidinone, 1-methyl-2-pyrrolidinone, diethyl ether, tetrahydrofuran, 1,4-dioxane, Examples thereof include ether solvents such as dimethoxyethane and anisole, and hydrocarbon solvents such as n-hexane, cyclohexane, n-pentane, benzene, toluene and xylene. These may be used alone or as a mixed solvent of two or more kinds.

【0009】反応温度は通常、−78℃から溶媒の沸点
までの範囲内で任意に選択できるが、好ましくは−60
〜60℃程度の範囲である。また、反応時間は、用いる
塩基の種類ならびに反応温度によって異なるが、通常
0.5時間から10時間程度の範囲である。反応後、通
常の後処理、例えば水洗浄、抽出、晶析、各種クロマト
グラフィーなどの操作をすることによりヒドロキシスル
ホン誘導体(1)を製造することができる。
The reaction temperature can usually be arbitrarily selected within the range from -78 ° C to the boiling point of the solvent, but is preferably -60.
It is in the range of about 60 ° C. The reaction time varies depending on the type of base used and the reaction temperature, but is usually in the range of about 0.5 hours to 10 hours. After the reaction, the hydroxysulfone derivative (1) can be produced by a usual post-treatment such as washing with water, extraction, crystallization and various chromatographies.

【0010】本発明のヒドロキシスルホン誘導体(1)
(R1が水素原子の場合は保護基を導入する)は、下記
スキームに従って、ビタミンA中間体へ誘導することが
できる。すなわち、ヒドロキシスルホン誘導体(1)
を還元的脱離反応(TetrahedronLetters 4833(197
3))により化合物(4)に変換できる。化合物(4)
は、さらにPure & Appl.Chem., 66, 1509(1994)など
に記載の方法により、ビタミンAなどに誘導することも
可能である。
Hydroxysulfone derivative of the present invention (1)
(When R 1 is a hydrogen atom, a protecting group is introduced) can be introduced into the vitamin A intermediate according to the scheme below. That is, hydroxysulfone derivative (1)
Reductive elimination reaction (Tetrahedron Letters 4833 (197
It can be converted to compound (4) by 3)). Compound (4)
Can be further induced to vitamin A and the like by the method described in Pure & Appl. Chem., 66 , 1509 (1994) and the like.

【0011】[0011]

【発明の効果】本発明の製造方法によれば、イソプレン
から3工程で簡便に製造でき、かつ低沸点で精製が比較
的容易であるアルデヒド(3)とスルホン類(2)とを
カップリング反応に供することによりレチノール誘導体
の有用な中間体となりうるヒドロキシスルホン誘導体
(1)を製造できる。
EFFECTS OF THE INVENTION According to the production method of the present invention, a coupling reaction of an aldehyde (3) with a sulfone (2), which can be easily produced from isoprene in 3 steps, and has a low boiling point and is relatively easy to purify. The hydroxysulfone derivative (1), which can be a useful intermediate of the retinol derivative, can be produced by subjecting the product to

【0012】[0012]

【実施例】以下、実施例により、本発明をさらに詳細に
説明するが、本発明はこれらにより限定されるものでは
ない。
The present invention will be described in more detail with reference to the following examples, but the present invention is not limited thereto.

【0013】(実施例1)スルホン(I)0.29g(1.0mm
ol)をテトラヒドロフラン(THF)2mlに溶解し、-60℃
に冷却した。次いで、1.6M n-BuLiのヘキサン溶液0.63m
l(1.0mmol)を滴下し、同温度で1時間保温した。その
後、アルデヒド(II)0.15g(1.0mmol)のTHF 2mlに溶
解した溶液を同温度で滴下し3時間攪拌した。反応後、
飽和塩化アンモニウム水溶液に注加し、酢酸エチルにて
抽出した。得られた有機層は飽和炭酸水素ナトリウム水
溶液、飽和食塩水で順次洗浄し、無水硫酸マグネシウム
で乾燥後、溶媒を留去することにより淡黄色固体の粗生
成物を得た。得られた粗生成物を高速液体クロマトグラ
フィーにて定量したところ、ヒドロキシスルホン(II
I)の収率は51.5%であった。 ヒドロキシスルホン(III)1 H-NMR δ(CDCl3)0.68(3H, s),0.87(3H,s), 1.31
-1.58(4H,m), 1.59(3H,s), 1.63(3H,s), 2.03(3H,s),
2.11-2.15(2H, m), 2.44(3H, m), 3.86(1H, d, J=4Hz),
3.99(1H, d, J=7Hz), 4.55(2H,d,J=6Hz), 5.09(1H, d
d, J=4Hz,8Hz), 5.53(1H, t, J=6Hz), 7.33(2H, d, J=8
Hz), 7.89(2H, d, J=8Hz)
(Example 1) 0.29 g (1.0 mm) of sulfone (I)
ol) is dissolved in 2 ml of tetrahydrofuran (THF), -60 ℃
Cooled to. Then 1.6M n-BuLi in hexane 0.63m
l (1.0 mmol) was added dropwise and the mixture was kept at the same temperature for 1 hour. Then, a solution of 0.15 g (1.0 mmol) of aldehyde (II) dissolved in 2 ml of THF was added dropwise at the same temperature and stirred for 3 hours. After the reaction
It was poured into a saturated aqueous solution of ammonium chloride and extracted with ethyl acetate. The obtained organic layer was washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous magnesium sulfate, and the solvent was evaporated to give a crude product as a pale yellow solid. The resulting crude product was quantified by high performance liquid chromatography to find that hydroxysulfone (II
The yield of I) was 51.5%. Hydroxysulfone (III) 1 H-NMR δ (CDCl 3 ) 0.68 (3H, s), 0.87 (3H, s), 1.31
-1.58 (4H, m), 1.59 (3H, s), 1.63 (3H, s), 2.03 (3H, s),
2.11-2.15 (2H, m), 2.44 (3H, m), 3.86 (1H, d, J = 4Hz),
3.99 (1H, d, J = 7Hz), 4.55 (2H, d, J = 6Hz), 5.09 (1H, d
d, J = 4Hz, 8Hz), 5.53 (1H, t, J = 6Hz), 7.33 (2H, d, J = 8
Hz), 7.89 (2H, d, J = 8Hz)

【0014】(実施例2)スルホン(I)0.29g(1mmo
l)をTHF 2mlに溶解し、次いで、1M EtMgBrのTHF溶液を
1ml(1mmol)を仕込み、50℃で3時間保温した。その後、-
30℃に冷却して、アルデヒド(II)0.15g(1.0mmol)を
THF2mlに溶解した溶液を同温度で滴下し、3時間攪拌し
た。反応後、飽和塩化アンモニウム水溶液に注加し、酢
酸エチルにて抽出した。得られた有機層は飽和炭酸水素
ナトリウム水溶液、飽和食塩水で順次洗浄し、無水硫酸
マグネシウムで乾燥後、溶媒を留去することにより淡黄
色固体の粗生成物を得た。得られた粗生成物を高速液体
クロマトグラフィーにて定量したところ、ヒドロキシス
ルホン(III)の収率は20.9%であった。
(Example 2) 0.29 g (1 mmo of sulfone (I)
l) in 2 ml of THF and then 1M EtMgBr in THF.
1 ml (1 mmol) was charged and kept at 50 ° C. for 3 hours. afterwards,-
After cooling to 30 ° C, 0.15 g (1.0 mmol) of aldehyde (II) was added.
A solution dissolved in 2 ml of THF was added dropwise at the same temperature and stirred for 3 hours. After the reaction, the mixture was poured into saturated aqueous ammonium chloride solution and extracted with ethyl acetate. The obtained organic layer was washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous magnesium sulfate, and the solvent was evaporated to give a crude product as a pale yellow solid. When the obtained crude product was quantified by high performance liquid chromatography, the yield of hydroxysulfone (III) was 20.9%.

【0015】以下に実施例の化合物の構造式を記す。但
し、Tsは、p−トリルスルホニル基を示す。
The structural formulas of the compounds of the examples are shown below. However, Ts represents a p-tolylsulfonyl group.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】一般式(1) (式中、Arは置換基を有していてもよいアリール基を
示し、R1は水素原子または水酸基の保護基を示し、波
線はE/Z幾何異性体のいずれか一方またはそれらの混
合物であることを示す。)で示されるヒドロキシスルホ
ン誘導体。
1. A general formula (1) (In the formula, Ar represents an aryl group which may have a substituent, R 1 represents a hydrogen atom or a hydroxyl-protecting group, and the wavy line represents one of E / Z geometric isomers or a mixture thereof. A hydroxysulfone derivative represented by the formula (1).
【請求項2】一般式(2) (式中、Arは前記と同じ意味を表わす。)で示される
スルホン類と一般式(3) (式中、Rは水酸基の保護基を示し、波線は前記と同じ
意味を表わす。)で示されるアルデヒドとを塩基の存在
下に反応させることを特徴とする一般式(1) (式中、Ar、R1および波線は前記と同じ意味を表わ
す。)で示されるヒドロキシスルホン誘導体の製造方
法。
2. General formula (2) (In the formula, Ar has the same meaning as described above.) And a sulfone represented by the general formula (3). (In the formula, R represents a hydroxyl-protecting group, and the wavy line has the same meaning as described above.) The aldehyde represented by the general formula (1) is reacted in the presence of a base. (Wherein Ar, R 1 and the wavy line have the same meanings as described above).
【請求項3】塩基が、アルキルリチウム、アルカリ金属
のアルコキシド、またはグルニヤール試薬である請求項
2に記載の製造方法。
3. The method according to claim 2, wherein the base is an alkyllithium, an alkali metal alkoxide, or a Grignard reagent.
【請求項4】アルカリ金属のアルコキシドがナトリウム
t−ブトキシドまたはカリウムt−ブトキシドである請
求項3に記載の製造方法。
4. The production method according to claim 3, wherein the alkali metal alkoxide is sodium t-butoxide or potassium t-butoxide.
【請求項5】Rがアセチルである請求項2、3または4
に記載の製造方法。
5. The method according to claim 2, wherein R is acetyl.
The manufacturing method described in.
JP2001379813A 2001-12-13 2001-12-13 Hydroxysulfone derivative and method for producing the same Pending JP2003176263A (en)

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