JP2003174156A - Solid-state imaging device - Google Patents

Solid-state imaging device

Info

Publication number
JP2003174156A
JP2003174156A JP2001369938A JP2001369938A JP2003174156A JP 2003174156 A JP2003174156 A JP 2003174156A JP 2001369938 A JP2001369938 A JP 2001369938A JP 2001369938 A JP2001369938 A JP 2001369938A JP 2003174156 A JP2003174156 A JP 2003174156A
Authority
JP
Japan
Prior art keywords
light receiving
solid
peripheral circuit
transfer
imaging device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001369938A
Other languages
Japanese (ja)
Inventor
Masao Takahashi
昌男 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Electronic Device Solutions Corp
Original Assignee
Toshiba Corp
Toshiba Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Microelectronics Corp filed Critical Toshiba Corp
Priority to JP2001369938A priority Critical patent/JP2003174156A/en
Publication of JP2003174156A publication Critical patent/JP2003174156A/en
Withdrawn legal-status Critical Current

Links

Abstract

<P>PROBLEM TO BE SOLVED: To provide a solid-state imaging device which has dark output nonuniformity improved. <P>SOLUTION: The device is constituted by providing a drain area 3, which stops excited electric charges from entering a photodetection part 1 from a peripheral circuit 2, in the space between the peripheral circuit 2 and photodetection part 1. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】この発明は、画像を読み取る
イメージセンサや、カメラ等に使用される固体撮像装置
に関し、暗時出力不均一性を改善した固体撮像装置に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a solid-state image pickup device used for an image sensor for reading an image, a camera and the like, and more particularly to a solid-state image pickup device with improved non-uniformity in dark output.

【0002】[0002]

【従来の技術】近年、CCDを用いた固体撮像装置は、
小型、軽量、高性能といった特徴から、画像を読み取る
イメージセンサや、ビデオカメラ等に広く用いられてい
る。CCDが用いられた固体撮像装置の内、インタライ
ントランスファ型の固体撮像装置の基本構成は、入射光
をフォトダイオード等で光電変換して得られる信号電荷
を蓄積する受光部(画素)と、移送ゲート(蓄積電極)
を介して、受光部に蓄積された信号電荷を受けて、この
信号電荷を垂直方向に転送する垂直CCD転送部と、垂
直CCD転送部により転送された1ラインの信号電荷を
水平方向に転送する水平CCD転送部と、移送ゲート、
垂直CCD転送部ならびに水平CCD転送部を駆動制御
する駆動制御回路と、水平CCD転送部によって転送さ
れた信号電荷を外部に出力する出力回路を備えている。
2. Description of the Related Art In recent years, solid-state image pickup devices using CCDs have
Because of its small size, light weight, and high performance, it is widely used in image sensors for reading images, video cameras, and the like. Among the solid-state image pickup devices using a CCD, the basic structure of the interline transfer type solid-state image pickup device has a light receiving part (pixel) for accumulating signal charges obtained by photoelectrically converting incident light by a photodiode or the like, and a transfer Gate (storage electrode)
Via the CCD, the vertical CCD transfer unit that receives the signal charge accumulated in the light receiving unit and transfers the signal charge in the vertical direction and the signal charge of one line transferred by the vertical CCD transfer unit in the horizontal direction Horizontal CCD transfer unit, transfer gate,
A drive control circuit for driving and controlling the vertical CCD transfer unit and the horizontal CCD transfer unit, and an output circuit for outputting the signal charges transferred by the horizontal CCD transfer unit to the outside are provided.

【0003】このような構成において、受光部、移送ゲ
ートならびに転送部を含むコア部に対して、コア部の周
辺に配置されて周辺回路となる駆動制御回路、出力回路
が動作すると、その動作に伴って周辺回路を構成する例
えばMOSFET等のトランジスタから励起電荷が発生
していた。この励起電荷は、例えば図5(A)ならびに
同図(B)(同図(A)のA−A線に沿った断面図)に
示すように、N型の受光部(画素)51と周辺回路52
が形成されたP型のウェル領域53を介して、周辺回路
52から受光部51に侵入し易くなっていた。このた
め、受光部51に入射光が与えられていない場合であっ
ても、励起電荷が侵入した受光部51ではこの励起電荷
が蓄積され、この蓄積された電荷が外部に読み出されて
いた。したがって、受光部51に入射光が与えられてい
ない(暗時)にもかかわらず、受光部51によっては出
力が生ずることになり、固体撮像装置の特性の一つであ
る暗時出力不均一性(DSNU)を劣化させていた。
In such a structure, when the drive control circuit and the output circuit, which are peripheral circuits arranged around the core section, operate with respect to the core section including the light receiving section, the transfer gate and the transfer section, the operation is performed. Along with this, excitation charges are generated from the transistors such as MOSFETs that constitute the peripheral circuit. As shown in FIG. 5 (A) and FIG. 5 (B) (a cross-sectional view taken along the line AA in FIG. 5 (A)), the excitation charge is generated in the N-type light receiving portion (pixel) 51 and its periphery. Circuit 52
It was easy for the peripheral circuit 52 to enter the light receiving portion 51 through the P-type well region 53 in which the holes were formed. For this reason, even when the incident light is not applied to the light receiving section 51, the excitation charge has accumulated in the light receiving section 51 into which the excitation charges have entered, and the accumulated charges have been read out to the outside. Therefore, although the incident light is not applied to the light receiving unit 51 (in the dark time), an output is generated depending on the light receiving unit 51, which is one of the characteristics of the solid-state imaging device, and the dark-time output nonuniformity. (DSNU) was deteriorating.

【0004】[0004]

【発明が解決しようとする課題】以上説明したように、
従来の固体撮像装置においては、受光部、移送ゲートな
らびに転送部を含むコア部の周辺に配置された周辺回路
が動作することで、周辺回路を構成するトランジスタで
発生する励起電荷が、受光部に侵入しやすくなってい
た。これにより、受光部に入射光が与えられていない暗
時であっても、受光部によっては電荷が蓄積されて出力
されることになり、暗時出力不均一性の特性が劣化する
といった不具合を招いていた。
As described above,
In the conventional solid-state imaging device, the peripheral circuits arranged around the core unit including the light receiving unit, the transfer gate, and the transfer unit operate, so that the excitation charges generated in the transistors forming the peripheral circuit are transferred to the light receiving unit. It was easy to break in. As a result, even in a dark time when the incident light is not applied to the light receiving portion, the light receiving portion accumulates and outputs the electric charge, which causes a problem that the characteristic of the output nonuniformity in the dark is deteriorated. I was invited.

【0005】そこで、この発明は、上記に鑑みてなされ
たものであり、その目的とするところは、暗時出力不均
一性を改善した固体撮像装置を提供することにある。
Therefore, the present invention has been made in view of the above, and an object of the present invention is to provide a solid-state image pickup device with improved non-uniformity in dark output.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に、課題を解決する手段は、入射光を光電変換して得ら
れる信号電荷を蓄積する受光部と、移送ゲートを介し
て、前記受光部に蓄積された信号電荷を受けて、該信号
電荷を転送する転送部と、前記移送ゲート、前記転送部
を駆動制御する駆動制御回路と、前記転送部によって転
送された信号電荷を外部に出力する出力回路と、前記受
光部、前記移送ゲートならびに前記転送部を含むコア部
と、前記駆動制御回路ならびに前記出力回路を含む周辺
回路との間に少なくとも設けられ、前記周辺回路で発生
した励起電荷を捕獲し、前記励起電荷の前記受光部への
侵入をブロックするドレイン領域とを有することを特徴
とする。
Means for Solving the Problems In order to achieve the above object, means for solving the problems are as follows: a light receiving section for accumulating signal charges obtained by photoelectrically converting incident light, and a light receiving section via a transfer gate. A signal charge accumulated in the transfer section, the transfer section transferring the signal charge, the transfer gate, a drive control circuit driving and controlling the transfer section, and outputting the signal charge transferred by the transfer section to the outside. And an excitation charge generated in the peripheral circuit, which is provided at least between the output circuit, the core unit including the light receiving unit, the transfer gate, and the transfer unit, and the peripheral circuit including the drive control circuit and the output circuit. And a drain region that blocks the excitation charges from entering the light receiving portion.

【0007】[0007]

【発明の実施の形態】以下、図面を用いてこの発明の実
施形態を説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

【0008】図1はこの発明の一実施形態に係る固体撮
像装置の構成を示す図であり、同図(A)は平面図、同
図(B)は同図(A)のA−A線に沿った断面図であ
る。図1において、この実施形態の固体撮像装置は、入
射光を光電変換して得られる信号電荷を蓄積する受光部
(画素)1、ならびに移送ゲートを介して受光部1に蓄
積された信号電荷を受けて、この信号電荷を転送する例
えばCCDのシフトレジスタで構成された転送部を含む
コア部と、移送ゲート、転送部を駆動制御する駆動制御
回路、ならびに転送部によって転送された信号電荷を外
部に出力する出力回路を含み、コア部の周辺に配置形成
された周辺回路2と、ドレイン領域3を備えて構成され
ている。
FIG. 1 is a diagram showing the configuration of a solid-state image pickup device according to an embodiment of the present invention. FIG. 1A is a plan view and FIG. 1B is a line AA in FIG. It is sectional drawing along. In FIG. 1, the solid-state imaging device according to the present embodiment shows a light receiving portion (pixel) 1 for accumulating signal charges obtained by photoelectrically converting incident light, and a signal charge accumulated in the light receiving portion 1 via a transfer gate. A core unit including a transfer unit configured to receive and transfer the signal charge, for example, a CCD shift register, a transfer gate, a drive control circuit for driving and controlling the transfer unit, and the signal charge transferred by the transfer unit to the outside And a drain region 3.

【0009】ドレイン領域3は、固体撮像装置が例えば
N型の半導体基板に形成されている場合には、N型の半
導体基板に形成されたP型のウェル領域4に形成された
N型の受光部1、ならびに周辺回路2を構成している例
えばMOSFET等のトランジスタに対して、P型のウ
ェル領域4にP型の不純物が注入されて形成されてい
る。ドレイン領域3は、コア部と周辺回路2との間に少
なくとも設けられ、例えば図2〜図4に示すように配置
形成されている。図2に示す実施形態では、ドレイン領
域3は、駆動制御回路5ならびに出力回路6を含む周辺
回路に対して、コア部7の周辺を取り囲むように配置形
成されている。図3に示す実施形態では、ドレイン領域
3は、コア部7と駆動制御回路5とが対向しているコア
部7と駆動制御回路5との間の領域、ならびにコア部7
と出力回路6が対向しているコア部7と出力回路6との
間の領域に配置形成されている。図4に示す実施形態で
は、ドレイン領域3は、コア部7と駆動制御回路5なら
びに出力回路6とが対向していないコア部7と駆動制御
回路5ならびに出力回路6と間を除いて、駆動制御回路
5ならびに出力回路6の一部周辺を取り囲むように配置
形成されている。
When the solid-state image pickup device is formed on an N-type semiconductor substrate, the drain region 3 forms an N-type light receiving region formed on a P-type well region 4 formed on the N-type semiconductor substrate. P-type impurities are formed in the P-type well region 4 by implanting P-type well regions 4 into the transistors, such as MOSFET, that form the portion 1 and the peripheral circuit 2. The drain region 3 is provided at least between the core portion and the peripheral circuit 2, and is arranged and formed, for example, as shown in FIGS. In the embodiment shown in FIG. 2, the drain region 3 is arranged and formed so as to surround the periphery of the core portion 7 with respect to the peripheral circuits including the drive control circuit 5 and the output circuit 6. In the embodiment shown in FIG. 3, the drain region 3 includes a region between the core unit 7 and the drive control circuit 5 where the core unit 7 and the drive control circuit 5 face each other, and the core unit 7.
And the output circuit 6 are arranged and formed in a region between the core portion 7 and the output circuit 6 facing each other. In the embodiment shown in FIG. 4, the drain region 3 is driven except for the core portion 7 and the drive control circuit 5 and the output circuit 6 where the core portion 7 and the drive control circuit 5 and the output circuit 6 do not face each other. The control circuit 5 and the output circuit 6 are arranged and formed so as to surround part of them.

【0010】このように、コア部7と周辺回路2との間
に配置形成されたドレイン領域3には、少なくとも受光
部1のポテンシャル電位以上の電位が与えられ、好まし
くは受光部1のポテンシャル電位の2倍以上の電位が与
えられ、一般的には高位電源電位が与えられる。
As described above, the drain region 3 formed between the core portion 7 and the peripheral circuit 2 is applied with a potential at least higher than the potential potential of the light receiving portion 1, preferably the potential potential of the light receiving portion 1. 2 times or more, and generally a high power supply potential is applied.

【0011】このような構成において、周辺回路のトラ
ンジスタが動作することによって励起電荷が発生する
と、発生した励起電荷の内、ウェル領域4を介して周辺
回路2から受光部1に向かおうとする励起電荷は、ドレ
イン領域3において捕獲吸収される。
In such a structure, when the excitation charge is generated by the operation of the transistor of the peripheral circuit, the excitation charge, which is generated from the peripheral circuit 2 toward the light receiving section 1 through the well region 4, among the generated excitation charges. The charges are trapped and absorbed in the drain region 3.

【0012】これにより、励起電荷はブロックされて受
光部1への侵入は阻止され、暗時において、励起電荷が
受光部1に蓄積されることは防止される。この結果、暗
時出力不均一性(DSNU)の特性を改善することがで
きる。
As a result, the excitation charges are blocked and prevented from entering the light receiving portion 1, and the excitation charges are prevented from being accumulated in the light receiving portion 1 in the dark. As a result, the dark output nonuniformity (DSNU) characteristic can be improved.

【0013】このような実施形態の固体撮像装置は、ラ
インセンサー、エリアセンサーであっても実施すること
が可能であり、同様の効果を得ることができる。また、
信号電荷を転送する転送部を構成する例えばCCDシフ
トレジスタが、奇数列の画素に蓄積された信号電荷を転
送するシフトレジスタと、偶数列の画素に蓄積された信
号電荷を転送するシフトレジスタとの2列のシフトレジ
スタで構成されているような場合であっても、上記実施
形態と同様に実施することは可能であり、同様の効果を
得ることができる。
The solid-state image pickup device of such an embodiment can be implemented with a line sensor or area sensor, and similar effects can be obtained. Also,
For example, a CCD shift register that constitutes a transfer unit that transfers signal charges includes a shift register that transfers signal charges accumulated in pixels in odd columns and a shift register that transfers signal charges accumulated in pixels in even columns. Even in the case where the shift register is composed of two columns, it can be carried out in the same manner as the above-mentioned embodiment, and the same effect can be obtained.

【0014】[0014]

【発明の効果】以上説明したように、この発明によれ
ば、周辺回路から受光部へ侵入しようとする励起電荷を
阻止するドレイン領域を設けたので、暗時において、励
起電荷が受光部に蓄積されることは防止され、暗時出力
不均一性(DSNU)の特性を改善することができる。
As described above, according to the present invention, since the drain region for blocking the excitation charge that tries to enter the light receiving portion from the peripheral circuit is provided, the excitation charge is accumulated in the light receiving portion in the dark. Can be prevented and the characteristics of dark output non-uniformity (DSNU) can be improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の一実施形態に係る固体撮像装置の構
成を示す図である。
FIG. 1 is a diagram showing a configuration of a solid-state imaging device according to an embodiment of the present invention.

【図2】ドレイン領域の配置例を示す図である。FIG. 2 is a diagram showing an arrangement example of drain regions.

【図3】ドレイン領域の他の配置例を示す図である。FIG. 3 is a diagram showing another arrangement example of drain regions.

【図4】ドレイン領域の他の配置例を示す図である。FIG. 4 is a diagram showing another arrangement example of drain regions.

【図5】従来の固体撮像装置の構成を示す図である。FIG. 5 is a diagram showing a configuration of a conventional solid-state imaging device.

【符号の説明】[Explanation of symbols]

1 受光部 2 周辺回路 3 ドレイン領域 4 Pウェル 5 駆動制御回路 6 出力回路 7 コア部 1 Light receiving part 2 peripheral circuits 3 drain region 4 P well 5 Drive control circuit 6 Output circuit 7 core part

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 入射光を光電変換して得られる信号電荷
を蓄積する受光部と、 移送ゲートを介して、前記受光部に蓄積された信号電荷
を受けて、該信号電荷を転送する転送部と、 前記移送ゲート、前記転送部を駆動制御する駆動制御回
路と、 前記転送部によって転送された信号電荷を外部に出力す
る出力回路と、 前記受光部、前記移送ゲートならびに前記転送部を含む
コア部と、前記駆動制御回路ならびに前記出力回路を含
む周辺回路との間に少なくとも設けられ、前記周辺回路
で発生した励起電荷を捕獲し、前記励起電荷の前記受光
部への侵入をブロックするドレイン領域とを有すること
を特徴とする固体撮像装置。
1. A light receiving section for accumulating signal charges obtained by photoelectrically converting incident light, and a transfer section for receiving the signal charges accumulated in the light receiving section via a transfer gate and transferring the signal charges. A drive control circuit that drives and controls the transfer gate and the transfer unit; an output circuit that outputs the signal charges transferred by the transfer unit to the outside; and a core that includes the light receiving unit, the transfer gate, and the transfer unit. A drain region that is provided at least between a drive circuit and a peripheral circuit including the drive control circuit and the output circuit, captures the excitation charge generated in the peripheral circuit, and blocks the intrusion of the excitation charge into the light receiving unit. And a solid-state image pickup device.
【請求項2】 前記ドレイン領域は、前記コア部を取り
囲むように配置形成されてなることを特徴とする請求項
1記載の固体撮像装置。
2. The solid-state imaging device according to claim 1, wherein the drain region is arranged and formed so as to surround the core portion.
【請求項3】 前記ドレイン領域は、前記コア部と前記
周辺回路とが対向する領域に配置形成されてなることを
特徴とする請求項1記載の固体撮像装置。
3. The solid-state imaging device according to claim 1, wherein the drain region is arranged and formed in a region where the core portion and the peripheral circuit face each other.
【請求項4】 前記ドレイン領域は、前記コア部と前記
周辺回路とが対向する領域を含む前記周辺回路の一部周
辺に配置形成されてなることを特徴とする請求項1記載
の固体撮像装置。
4. The solid-state imaging device according to claim 1, wherein the drain region is arranged and formed around a part of the peripheral circuit including a region where the core portion and the peripheral circuit face each other. .
JP2001369938A 2001-12-04 2001-12-04 Solid-state imaging device Withdrawn JP2003174156A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001369938A JP2003174156A (en) 2001-12-04 2001-12-04 Solid-state imaging device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001369938A JP2003174156A (en) 2001-12-04 2001-12-04 Solid-state imaging device

Publications (1)

Publication Number Publication Date
JP2003174156A true JP2003174156A (en) 2003-06-20

Family

ID=19179250

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001369938A Withdrawn JP2003174156A (en) 2001-12-04 2001-12-04 Solid-state imaging device

Country Status (1)

Country Link
JP (1) JP2003174156A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7612392B2 (en) 2005-10-04 2009-11-03 Samsung Electronics Co., Ltd. Image sensor with a gate electrode between the photoelectric conversion region and the charge detection region, the gate electrode comprising p-type and n-type regions adjacent to one another and method of fabricating the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7612392B2 (en) 2005-10-04 2009-11-03 Samsung Electronics Co., Ltd. Image sensor with a gate electrode between the photoelectric conversion region and the charge detection region, the gate electrode comprising p-type and n-type regions adjacent to one another and method of fabricating the same

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