JP2003171766A - Silicon carbide coating member - Google Patents

Silicon carbide coating member

Info

Publication number
JP2003171766A
JP2003171766A JP2001369696A JP2001369696A JP2003171766A JP 2003171766 A JP2003171766 A JP 2003171766A JP 2001369696 A JP2001369696 A JP 2001369696A JP 2001369696 A JP2001369696 A JP 2001369696A JP 2003171766 A JP2003171766 A JP 2003171766A
Authority
JP
Japan
Prior art keywords
silicon carbide
film
composition
carbon
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001369696A
Other languages
Japanese (ja)
Other versions
JP3787084B2 (en
Inventor
Kazukiyo Tejima
一清 手嶋
Yasuhiro Akune
安博 阿久根
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Pillar Packing Co Ltd
Original Assignee
Nippon Pillar Packing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Pillar Packing Co Ltd filed Critical Nippon Pillar Packing Co Ltd
Priority to JP2001369696A priority Critical patent/JP3787084B2/en
Publication of JP2003171766A publication Critical patent/JP2003171766A/en
Application granted granted Critical
Publication of JP3787084B2 publication Critical patent/JP3787084B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06Construction of plunger or mould
    • C03B11/08Construction of plunger or mould for making solid articles, e.g. lenses
    • C03B11/084Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
    • C03B11/086Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/14Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/24Carbon, e.g. diamond, graphite, amorphous carbon
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/30Intermediate layers, e.g. graded zone of base/top material
    • C03B2215/31Two or more distinct intermediate layers or zones
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/30Intermediate layers, e.g. graded zone of base/top material
    • C03B2215/34Intermediate layers, e.g. graded zone of base/top material of ceramic or cermet material, e.g. diamond-like carbon
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/30Intermediate layers, e.g. graded zone of base/top material
    • C03B2215/38Mixed or graded material layers or zones

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a practical silicon carbide coating member, when used as a constituting material, e.g. for a forming mold for an optical element made of glass, capable of eliminating problems caused by a silicon carbide film therein. <P>SOLUTION: The silicon carbide coating member is obtained by forming a silicon carbide film 2 by chemical vapor deposition on the surface 2a of a substrate 2 formed as a silicon carbide sintered compact. The silicon carbide film 2 has a gradient composition in which the component part of carbon increases as it goes to the film surface, and consists of an adhesion layer 31 having a silicon-rich composition, an intermediate layer 32 having a stoichiometric composition, and a surface layer 33 having a carbon-rich composition. As the carbon-rich composition, e.g. an amorphous carbon composition such as a glassy carbon composition and a pyrolytic carbon composition can be cited. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、ガラス製光学素子
(CDドライブ,レーザ機器,カメラ,顕微鏡,望遠
鏡,光ファイバー用機器等に使用されるレンズ,プリズ
ム等)をワンモールド成形するための成形型、各種摺動
体(メカニカルシールの密封環,軸受等)又は各種光学
素子(レーザ反射鏡,回折格子等)等として好適に使用
される炭化珪素コーティング部材に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mold for one-mold molding of glass optical elements (lenses, prisms, etc. used in CD drives, laser devices, cameras, microscopes, telescopes, optical fiber devices, etc.). The present invention relates to a silicon carbide coating member suitable for use as various sliding bodies (sealing rings of mechanical seals, bearings, etc.), various optical elements (laser reflecting mirrors, diffraction gratings, etc.), and the like.

【0002】[0002]

【従来の技術】炭化珪素やカーボン等で構成される基体
の表面に化学蒸着による炭化珪素膜を被覆形成してなる
炭化珪素コーティング部材は、炭化珪素膜が高硬度性,
耐摩耗性,耐熱性,耐薬品性,導電性等に優れるもので
あることから、特に、表面に物理的,化学的,電気・電
子的な耐久性が要求される各種製品や部品として好適に
使用しうるものであり、従来からも多くの分野で実用さ
れている。
2. Description of the Related Art A silicon carbide coating member formed by coating a surface of a substrate made of silicon carbide or carbon with a silicon carbide film by chemical vapor deposition has a high hardness of the silicon carbide film.
Since it has excellent wear resistance, heat resistance, chemical resistance, and conductivity, it is particularly suitable for various products and parts that require physical, chemical, electrical / electronic durability on the surface. It can be used and has been practically used in many fields.

【0003】例えば、従来、カメラレンズ等を製作する
には、ガラス材を所定形状に型成形する工程の他、その
成形物の形状,精度を確保するための下地研磨工程やそ
の研磨物の表面を仕上げる仕上研磨工程等、多くの工程
が必要であった。したがって、かかる伝統的な製作方法
によれば、レンズ等を安価且つ大量に製作することがで
きず、また非球面形状のものを得ることが困難であっ
た。そこで、近時、CDピックアップレンズ等の汎用光
学素子のみならず、光ファイバーのカプラー部への非球
面マイクロレンズ等の高精度光学素子についても、精密
プレス型によりワンモールド成形することが行われてい
るが、かかるワンモールド成形に使用するガラス光学素
子用の成形型として炭化珪素コーティング部材からなる
ものが知られている。すなわち、この成形型(以下「従
来型」という)は、炭化珪素焼結材からなる型本体の型
部表面に化学蒸着により炭化珪素膜を形成し、その膜表
面を研磨して成形面としたものである。
For example, conventionally, in order to manufacture a camera lens or the like, in addition to a step of molding a glass material into a predetermined shape, a base polishing step for ensuring the shape and accuracy of the molded article and the surface of the polished article. Many steps were required, such as a finish polishing step for finishing. Therefore, according to such a traditional manufacturing method, it is difficult to manufacture a large amount of lenses and the like at low cost, and it is difficult to obtain an aspherical lens. Therefore, in recent years, not only general-purpose optical elements such as CD pickup lenses but also high-precision optical elements such as aspherical microlenses for optical fiber couplers are being one-molded by a precision press mold. However, a mold made of a silicon carbide coating member is known as a mold for a glass optical element used for such one-mold molding. That is, in this molding die (hereinafter referred to as "conventional mold"), a silicon carbide film is formed on the surface of a mold body made of a silicon carbide sintered material by chemical vapor deposition, and the film surface is polished to form a molding surface. It is a thing.

【0004】[0004]

【発明が解決しようとする課題】しかし、従来型は、耐
熱性,耐久性等に優れるものであるが、離型性に問題が
あり、光学素子材料たるガラスが炭化珪素膜の表面(成
形面)に付着,残留し易く、安定した成形を行なうこと
ができないといった問題があった。
However, although the conventional type is excellent in heat resistance, durability, etc., it has a problem of releasability, and the glass as an optical element material has a surface (molding surface) of the silicon carbide film. However, there is a problem in that stable molding cannot be performed.

【0005】このような問題は炭化珪素膜に起因して生
じるものであるが、かかる炭化珪素膜の性状が原因とな
る問題は、ガラス製光学素子用の成形型のみならず、炭
化珪素コーティング部材を使用する各種製品,機器にあ
って指摘されているところであり、従来の炭化珪素コー
ティング部材は、それが使用される製品,機器の用途,
機能によっては必ずしも満足できるものではないのが実
情である。
Although such a problem is caused by the silicon carbide film, the problem caused by the properties of the silicon carbide film is not limited to the molding die for the glass optical element, but the silicon carbide coating member. It has been pointed out in various products and equipments using the conventional silicon carbide coating member,
The fact is that some functions are not always satisfactory.

【0006】本発明は、かかる実情に鑑みなされたもの
で、ガラス製光学素子用の成形型等の構成材として使用
した場合において、それらが有していた炭化珪素膜に起
因する問題を排除することができる実用的な炭化珪素コ
ーティング部材を提供することを目的とするものであ
る。
The present invention has been made in view of the above circumstances, and eliminates the problems caused by the silicon carbide film which they have when used as a constituent material of a molding die or the like for a glass optical element. It is an object of the present invention to provide a practical silicon carbide coating member that can be used.

【0007】[0007]

【課題を解決するための手段】本発明は、基体の表面に
化学蒸着による炭化珪素膜を形成してなる炭化珪素コー
ティング部材において、上記した目的を達成すべく、特
に、炭化珪素膜を、その膜厚方向において膜表面に向か
うに従って炭素成分が増大する傾斜状組成をなすものと
しておくことを提案するものである。すなわち、炭化珪
素膜を、その膜厚方向において、膜表面に近づくにつれ
て炭素成分が漸次増加すると共に珪素成分が漸次減少す
るような傾斜状組成をなすものとしておくことを提案す
るものである。
The present invention provides a silicon carbide coating member comprising a substrate and a silicon carbide film formed by chemical vapor deposition on the surface thereof. It is proposed that the carbon composition has a graded composition in which the carbon component increases toward the film surface in the film thickness direction. That is, it is proposed that the silicon carbide film has a graded composition in which the carbon component gradually increases and the silicon component gradually decreases as the film surface is approached.

【0008】具体的には、炭化珪素膜の表面層が炭素リ
ッチ組成をなすようにしておく。ここに、炭素リッチ組
成とは、炭素成分が化学当量比をなす化学量論組成より
多くなる(一方、珪素成分については化学量論組成より
少なくなる)組成であり、グラッシカーボン(Glas
sy Carbon,無定形炭素)組成,パイロリテッ
クカーボン(Pyrolytic Carbon,熱分
解炭素)組成等のアモルファスカーボン組成を含むもの
である。このような炭素リッチ組成をなす膜表面におい
ては、化学量論組成をなす一般的な炭化珪素膜の表面に
比して、炭素的性質がより強く現われることになると共
に珪素的性質が抑制されることになる。したがって、か
かる炭化珪素膜を基体表面に形成した炭化珪素コーティ
ング部材は、ガラス製光学素子用の成形型やメカニカル
シール用の密封環のような摺動体等の構成部材として好
適に使用することができる。例えば、膜表面を成形面と
するガラス製光学素子用の成形型にあっては、成形面が
ガラスとの付着性(反応性)を阻害する炭素成分を多量
に含み且つガラスとの付着性を阻害しない珪素成分を多
量に含まないものとなっていることから、冒頭で述べた
従来型に比して離型性が大幅に向上することになる。ま
た、膜表面を密封端面とするメカニカルシール用の密封
環にあっては、その密封端面が炭素的性質である自己潤
滑性を有するものとなり、相手密封環との摺動性が大幅
に向上することになる。
Specifically, the surface layer of the silicon carbide film is made to have a carbon-rich composition. Here, the carbon-rich composition is a composition in which the carbon component is greater than the stoichiometric composition forming the chemical equivalence ratio (while the silicon component is less than the stoichiometric composition), and it is a glassy carbon (Glass) composition.
Amorphous carbon compositions such as sy Carbon and amorphous carbon compositions and Pyrolytic carbon (pyrolytic carbon) compositions are included. On the surface of the film having such a carbon-rich composition, the carbon-like property appears more strongly and the silicon-like property is suppressed as compared with the surface of the general silicon carbide film having the stoichiometric composition. It will be. Therefore, the silicon carbide coating member having such a silicon carbide film formed on the surface of the substrate can be suitably used as a constituent member such as a molding die for a glass optical element or a sliding body such as a sealing ring for a mechanical seal. . For example, in a mold for a glass optical element having a film surface as a molding surface, the molding surface contains a large amount of a carbon component which hinders the adhesion (reactivity) with glass and has an adhesion property with glass. Since it does not contain a large amount of silicon components that do not inhibit, the releasability is greatly improved as compared with the conventional type described at the beginning. Further, in the case of the seal ring for the mechanical seal having the film surface as the seal end face, the seal end face has a self-lubricating property which is a carbon property, and the slidability with the mating seal ring is significantly improved. It will be.

【0009】一方、珪素成分については、膜厚方向にお
いて膜表面に近づくにつれて漸次減少することになる
が、特に、基体が炭化珪素材(例えば、炭化珪素焼結
材)で構成されている場合には、炭化珪素膜における基
体への接着層を、珪素成分が化学量論組成より多い珪素
リッチ組成をなすようにしておくことが好ましい。この
ように接着層を珪素リッチ組成となしておくことによ
り、炭化珪素材で構成される基体と炭化珪素膜との密着
性が、炭化珪素膜を化学量論組成とした場合に比して、
大幅に向上する。
On the other hand, the silicon component gradually decreases as it approaches the film surface in the film thickness direction. Especially, when the substrate is made of a silicon carbide material (for example, a silicon carbide sintered material). It is preferable that the adhesion layer of the silicon carbide film to the substrate has a silicon-rich composition in which the silicon component is larger than the stoichiometric composition. By thus forming the adhesive layer with the silicon-rich composition, the adhesion between the silicon carbide film and the base body made of the silicon carbide material is higher than that in the case where the silicon carbide film has the stoichiometric composition.
Greatly improved.

【0010】[0010]

【発明の実施の形態】以下、本発明の実施の形態を図面
に基づいて具体的に説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be specifically described below with reference to the drawings.

【0011】図1及び図2は第1の実施の形態を示して
おり、この実施の形態にあっては本発明に係る炭化珪素
コーティング部材を使用してガラス製光学素子の成形型
1が構成されている。
FIGS. 1 and 2 show a first embodiment. In this embodiment, a glass optical element molding die 1 is constructed using a silicon carbide coating member according to the present invention. Has been done.

【0012】すなわち、成形型1は、図1に示す如く、
型本体2を所定形状に成形し(A図)、この型本体2の
型部2aの表面に化学蒸着により炭化珪素膜3を形成し
(B図)、さらに炭化珪素膜3を表面研磨して、その研
磨面を成形面3aとなしたものである(C図)。
That is, the molding die 1 is, as shown in FIG.
The mold body 2 is molded into a predetermined shape (Fig. A), a silicon carbide film 3 is formed on the surface of the mold portion 2a of the mold body 2 by chemical vapor deposition (Fig. B), and the surface of the silicon carbide film 3 is polished. The polishing surface is the molding surface 3a (Fig. C).

【0013】型本体2は、図1(A)に示す如く、例え
ば、無加圧焼結,ホットプレス焼結,ホットアイソスタ
ティックプレス等の手法により得られたβ型炭化珪素
(又はα型炭化珪素)の焼結体(例えば、嵩密度3.0
以上)を所定形状に研削加工してなるものである。な
お、型部2aの形状は、炭化珪素膜3をコーティングす
ることによって得られる最終的な形状に応じたものとさ
れている。
As shown in FIG. 1 (A), the die body 2 is made of β-type silicon carbide (or α-type carbonized) obtained by, for example, pressureless sintering, hot press sintering, hot isostatic pressing or the like. A sintered body of silicon (for example, a bulk density of 3.0)
The above is ground into a predetermined shape. It should be noted that the shape of the mold portion 2a is adapted to the final shape obtained by coating the silicon carbide film 3.

【0014】炭化珪素膜3は、図1(B)に示す如く、
非酸化雰囲気において純粋のβ型炭化珪素(又はα型炭
化珪素)を減圧CVD法等により化学蒸着することによ
って、型本体2の型部2aの表面に被覆形成されるが、
蒸着条件を制御することにより、特に反応ガスにおける
Si源(SiCl4等)及びC源(C38等)の流量,
モル比及びキャリアガスであるH2との還元比をマスフ
ローコントローラにより制御して、成膜の進行に伴って
膜組成における珪素成分量が漸次減少し且つ炭素成分量
が漸次増加するように調整することによって、図2に示
す如く、膜厚方向において膜表面に向かうに従って炭素
成分が増大する傾斜状組成をなすものに成膜される。
The silicon carbide film 3 is formed as shown in FIG.
By chemically vapor-depositing pure β-type silicon carbide (or α-type silicon carbide) in a non-oxidizing atmosphere by a low pressure CVD method or the like, the surface of the mold portion 2a of the mold body 2 is coated and formed.
By controlling the vapor deposition conditions, in particular, the flow rates of the Si source (SiCl 4 etc.) and C source (C 3 H 8 etc.) in the reaction gas,
The molar ratio and the reduction ratio with H 2 which is a carrier gas are controlled by a mass flow controller so that the amount of silicon components in the film composition gradually decreases and the amount of carbon components gradually increases as the film formation progresses. As a result, as shown in FIG. 2, a film having a graded composition in which the carbon component increases in the film thickness direction toward the film surface is formed.

【0015】まず、成膜の初期段階(第1段階)におい
ては、炭化珪素の化学当量比より多量の珪素成分を含む
珪素リッチ組成の第1層31が基体たる型本体2の表面
(型部2aの表面)に形成される。第2段階において
は、第1層31上に、これより珪素成分が減少すると共
に炭素成分が増加する化学量論組成をなす第2層32が
形成される。そして、第3段階においては、珪素成分の
減少と炭素成分の増加とが更に行なわれて、第2層32
上に炭素リッチ組成(例えば、グラッシカーボン組成,
パイロリテックカーボン組成等のアモルファスカーボン
組成)をなす第3層33が形成され、成膜が終了する。
なお、図2においては、便宜上、各層31,32,33
間の境界が示されているが、かかる境界は明瞭に現われ
るものでないことは勿論である。
First, in the initial stage (first stage) of film formation, the surface of the mold body 2 (the mold portion) on which the first layer 31 having a silicon-rich composition containing a silicon component in a larger amount than the chemical equivalent ratio of silicon carbide is the substrate. 2a). In the second step, the second layer 32 having a stoichiometric composition in which the silicon content is decreased and the carbon content is increased is formed on the first layer 31. Then, in the third stage, the silicon component is further decreased and the carbon component is further increased, so that the second layer 32 is formed.
Carbon-rich composition (eg, glassy carbon composition,
A third layer 33 having an amorphous carbon composition such as a pyrolithic carbon composition) is formed, and the film formation is completed.
In FIG. 2, for convenience, each layer 31, 32, 33
Although boundaries between are shown, it should be understood that such boundaries are not apparent.

【0016】ところで、炭素リッチ組成の化学量論組成
に対する炭素増量は、X線回折装置では検出できない程
度に僅かであるが、レーザラマン分光装置等によるラマ
ンスペクトル分光法によれば炭素リッチ組成の確認を容
易に行うことができる。例えば、図5及び図6に示す如
く、グラッシカーボン組成及び化学量論組成のラマンス
ペクトルは明瞭に異なる。すなわち、図5に示すグラッ
シカーボン組成のラマンスペクトルでは、炭化珪素のラ
マン線ピークa,bの他、グラッシカーボンのラマン線
ピークc(1360cm−1付近),d(1590cm
−1付近)が顕著に現れている。一方、図6に示す化学
量論組成のラマンスペクトルでは、炭化珪素のピーク
e,f,g,hのみが現れている。
By the way, the amount of carbon added to the stoichiometric composition of the carbon-rich composition is so small that it cannot be detected by an X-ray diffractometer, but the carbon-rich composition can be confirmed by Raman spectrum spectroscopy using a laser Raman spectroscope or the like. It can be done easily. For example, as shown in FIGS. 5 and 6, the Raman spectra of the glassy carbon composition and the stoichiometric composition are clearly different. That is, in the Raman spectrum of the glassy carbon composition shown in FIG. 5, in addition to Raman line peaks a and b of silicon carbide, Raman line peaks c (around 1360 cm −1) and d (1590 cm) of glassy carbon are obtained.
(Around -1) is prominent. On the other hand, in the Raman spectrum of the stoichiometric composition shown in FIG. 6, only peaks e, f, g and h of silicon carbide appear.

【0017】炭化珪素膜3の表面層たる第3層33は、
図1(C)に示す如く、適宜の機械的加工法により所望
の超平滑面(例えば、表面粗度:1nmRMS程度,形
状精度:λ/4以下)3aに表面研磨される。かかる表
面研磨は、例えば、炭化珪素膜3の表面をダイヤモンド
砥粒による粗形状出しを行った上、更にダイヤモンド砥
粒による精密研磨を施すことによって行なわれる。な
お、上記した成形型1は上型であるが、下型についても
同一の工程を経て製作される。
The third layer 33, which is the surface layer of the silicon carbide film 3, is
As shown in FIG. 1 (C), the surface is polished to a desired ultra-smooth surface (for example, surface roughness: about 1 nm RMS, shape accuracy: λ / 4 or less) 3a by an appropriate mechanical processing method. Such surface polishing is performed, for example, by roughening the surface of the silicon carbide film 3 with diamond abrasive grains and then performing precision polishing with diamond abrasive grains. Although the molding die 1 is the upper die, the lower die is also manufactured through the same steps.

【0018】而して、かかる成形型1は、研磨された膜
表面たる成形面3aがグラッシカーボン組成,パイロリ
テックカーボン組成等の炭素リッチ組成とされているこ
とから、成形時におけるガラス付着を生じることのない
離型性に優れたものであり、光学素子を良好且つ高精度
に大量生産することができる。すなわち、成形面3a
は、ガラスとの反応を阻害する炭素成分を多量に含み且
つ当該反応を阻害しない珪素成分が微量であることか
ら、ガラスが付着することがない。
In this molding die 1, since the molding surface 3a, which is the polished film surface, has a carbon-rich composition such as a glassy carbon composition and a pyrolithic carbon composition, glass adhesion occurs during molding. It is excellent in releasability without any damage, and it is possible to mass-produce optical elements satisfactorily and with high accuracy. That is, the molding surface 3a
Does not adhere to the glass because it contains a large amount of carbon component that inhibits the reaction with glass and the amount of silicon component that does not inhibit the reaction is very small.

【0019】一方、第1層たる接着層31が珪素リッチ
組成をなしていることから、化学量論組成をなす場合に
比して、炭化珪素焼結材である型本体2との密着性が向
上し、成形型1の耐久性が向上する。
On the other hand, since the adhesive layer 31 as the first layer has a silicon-rich composition, the adhesiveness to the die body 2, which is a silicon carbide sintered material, is higher than that of the stoichiometric composition. And the durability of the mold 1 is improved.

【0020】また、図3及び図4は第2の実施の形態を
示しており、この実施の形態にあっては、密封環として
本発明に係る炭化珪素コーティング部材を使用してい
る。
3 and 4 show a second embodiment. In this embodiment, the silicon carbide coating member according to the present invention is used as a sealing ring.

【0021】すなわち、図3に示すメカニカルシール
は、シールケース4に固定保持された密封環(以下「固
定環」という)5と、回転軸6に軸線方向移動可能に且
つ相対回転不能に保持された密封環(以下「回転環」と
いう)7と、回転軸6に固定されたスプリングリテーナ
8と回転環7との間に介装されて回転環7を固定環5へ
と押圧附勢するスプリング9とからなり、両密封環5,
7の対向端面たる密封端面5a,7aの相対回転摺接作
用により、その相対回転摺接部分の外周側領域たる機内
領域Aとその内周側領域たる機外領域(大気領域)Bと
をシールするように構成された端面接触型のものであ
る。
That is, the mechanical seal shown in FIG. 3 is held by a seal ring 4 (hereinafter referred to as a "fixed ring") fixedly held in a seal case 4 and by a rotary shaft 6 so as to be movable in the axial direction and not relatively rotatable. A spring which is interposed between a sealing ring (hereinafter referred to as "rotating ring") 7, a spring retainer 8 fixed to the rotating shaft 6 and the rotating ring 7, and presses the rotating ring 7 toward the fixed ring 5. 9 and the both sealing rings 5,
By the relative rotational sliding contact action of the sealed end surfaces 5a, 7a, which are the opposing end surfaces of 7, the inner peripheral area A, which is the outer peripheral side area of the relative rotational sliding contact portion, and the outer peripheral area (atmosphere area) B, which is the inner peripheral side area, are sealed. It is of an end face contact type.

【0022】かかるメカニカルシールにあっては、回転
環5を炭化珪素焼結材で構成すると共に、固定密封環5
を本発明に係る炭化珪素コーティング材で構成してあ
る。すなわち、固定密封環5は、図4に示す如く、炭化
珪素焼結材で構成された基体10の表面(密封端面5a
を形成すべき部分の表面)に、化学蒸着により炭化珪素
膜11を形成して、その膜表面を研磨して密封端面5a
としたものである。炭化珪素膜11は、前記した成形型
1と同様組成をなすものであり、図4に示す如く、基体
10の表面上に珪素リッチ組成をなす第1層111を形
成し、第1層111上に化学量論組成をなす第2層11
2を形成し、第2層112上に炭素リッチ組成(例え
ば、グラッシカーボン組成,パイロリテックカーボン組
成等のアモルファスカーボン組成)をなす第3層113
を形成したものであり、表面層たる第3層113の表面
は密封端面5aに研磨されている。
In such a mechanical seal, the rotary ring 5 is made of a silicon carbide sintered material and the fixed seal ring 5 is used.
Is composed of the silicon carbide coating material according to the present invention. That is, as shown in FIG. 4, the fixed sealing ring 5 has a surface (sealing end surface 5a) of the substrate 10 made of a silicon carbide sintered material.
A silicon carbide film 11 is formed by chemical vapor deposition on the surface of the portion where the film is to be formed, and the film surface is polished to form the sealed end surface 5a.
It is what The silicon carbide film 11 has a composition similar to that of the molding die 1 described above. As shown in FIG. 4, a first layer 111 having a silicon-rich composition is formed on the surface of the base 10 and the first layer 111 is formed. Second layer 11 having a stoichiometric composition
2 to form a carbon-rich composition (for example, an amorphous carbon composition such as a glassy carbon composition or a pyrolithic carbon composition) on the second layer 112.
And the surface of the third layer 113, which is a surface layer, is polished to the sealed end surface 5a.

【0023】ところで、端面接触型メカニカルシールと
して、一般に、相対回転摺接する2つの密封環の一方を
炭化珪素で構成すると共に他方の密封環をカーボンで構
成するもの(以下「C/SiCシール」という)と、両
密封環を共に炭化珪素で構成するもの(以下「SiC/
SiCシール」という)とが周知であるが、C/SiC
シールでは、炭化珪素に比して軟質であるカーボン製の
密封環が摩耗し易く、特に、固形成分を含むスラリ流体
については良好にシールできない。一方、SiC/Si
Cシールでは、炭化珪素が硬質で耐摩耗性に優れるもの
であり、熱的,化学的,機械的特性にも優れたものであ
ることから、被密封流体が固形成分を含むスラリ流体で
ある等の過酷なシール条件下においても、良好なシール
機能が発揮される。しかし、炭化珪素はカーボンのよう
な自己潤滑性を有しないものであり、相手密封環との摺
動性(潤滑性)に劣るものであるから、SiC/SiC
シールでは、密封端面間に所謂鳴きと称する騒音が生じ
たり、密封端面同士の固着(焼付)現象が生じる虞れが
ある。
By the way, as an end-face contact type mechanical seal, generally, one of two sealing rings that make relative rotational sliding contact is made of silicon carbide and the other sealing ring is made of carbon (hereinafter referred to as "C / SiC seal"). ) And both sealing rings are made of silicon carbide (hereinafter “SiC /
"SiC seal") is well known, but C / SiC
In the sealing, the carbon sealing ring, which is softer than silicon carbide, is easily worn, and particularly the slurry fluid containing the solid component cannot be sealed well. On the other hand, SiC / Si
In the C-seal, since the silicon carbide is hard and has excellent wear resistance, and also has excellent thermal, chemical, and mechanical properties, the sealed fluid is a slurry fluid containing solid components, etc. Even under severe sealing conditions, the good sealing function can be achieved. However, since silicon carbide does not have self-lubricating properties like carbon, and is inferior in slidability (lubricity) with the mating sealing ring, SiC / SiC
In the seal, there is a possibility that noise, so-called squeal, may occur between the sealing end faces, or that the sealing end faces may stick (seize).

【0024】これに対して、上記したメカニカルシール
では、固定密封環5の密封端面5aが、炭素的性質(特
に自己潤滑性)が強く現われる炭素リッチ組成をなして
いることから、一般的な化学量論組成をなす炭化珪素製
の密封環と異なって、炭化珪素製の相手密封環7との摺
動性が高くなり、SiC/SiCシールのような問題は
生じない。勿論、C/SiCシールにおける問題もな
く、固形成分を含有するスラリー流体に対しても良好な
シール機能を発揮できる。
On the other hand, in the mechanical seal described above, the sealing end surface 5a of the fixed sealing ring 5 has a carbon-rich composition in which carbon-like properties (particularly self-lubricating property) are strongly exhibited, and therefore the general chemical composition is used. Unlike the silicon carbide sealing ring having a stoichiometric composition, the slidability with the mating sealing ring 7 made of silicon carbide is high, and problems such as the SiC / SiC seal do not occur. Of course, there is no problem in C / SiC sealing, and a good sealing function can be exhibited even for a slurry fluid containing a solid component.

【0025】なお、C/SiCシールが好適に使用され
るシール条件下においては、相手密封環7をカーボン製
のものとできるが、この場合にも、両密封環5,7間の
摺動性能が大幅に向上し、カーボン製密封環の摩耗やプ
リスタ現象をより効果的に防止することができる。ま
た、両密封環5,7を共に本発明に係る炭化珪素コーテ
ィング部材で構成しておくこともできる。
Under the sealing conditions in which the C / SiC seal is preferably used, the mating sealing ring 7 can be made of carbon. In this case as well, the sliding performance between the sealing rings 5 and 7 is good. Is significantly improved, and wear of the carbon seal ring and the pristor phenomenon can be more effectively prevented. Alternatively, both the sealing rings 5 and 7 may be made of the silicon carbide coating member according to the present invention.

【0026】本発明は、上記した各実施の形態に限定さ
れるものではなく、本発明の基本原理を逸脱しない範囲
において、適宜に改良,変更することができる。
The present invention is not limited to the above-mentioned respective embodiments, but can be appropriately improved and changed without departing from the basic principle of the present invention.

【0027】本発明に係る炭化珪素コーティング部材
は、上記した成形型及び密封環の他、膜表面に炭素的性
質(潤滑性ないし摺動性)が要求される部材、膜表面の
珪素成分量が少ないことが要求される部材、炭化珪素膜
と基体との密着性が要求される部材等、一般的な化学量
論組成の炭化珪素膜では問題を生じる虞れのある部材に
好適に使用することができる。例えば、膜表面に潤滑性
ないし摺動性が要求される部材としては、メカニカルシ
ール用の密封環以外に、軸受部材等の摺動体がある。
The silicon carbide-coated member according to the present invention, in addition to the molding die and the sealing ring described above, is a member whose film surface is required to have carbon-like properties (lubricity or slidability), and the amount of silicon components on the film surface. Suitable for use in members that are required to have a small amount, members that are required to have adhesion between a silicon carbide film and a substrate, and the like that may cause problems with a silicon carbide film having a general stoichiometric composition. You can For example, in addition to a sealing ring for a mechanical seal, there is a sliding member such as a bearing member as a member whose film surface is required to have lubricity or slidability.

【0028】また、膜表面に珪素成分量が少ないことが
要求される部材としては、レーザ反射鏡,回折格子等の
光学素子がある。例えば、レーザ反射鏡としては、炭化
珪素焼結体又はカーボン焼結体である基体の表面に化学
蒸着による炭化珪素膜を形成してなるものが周知である
が、従来のものでは、膜表面を研磨して得られる鏡面に
高エネルギビームを照射すると、照射箇所に白濁(曇
り)が生じることがあり、ビーム反射率の低下を招く等
の問題があった。かかる白濁の発生原因は主として珪素
の析出にあり、白濁箇所では珪素が細かい液滴状をなし
て析出している。しかし、鏡面たる膜表面を珪素成分量
の少ない炭素リッチ組成(例えば、グラッシカーボン組
成,パイロリテックカーボン組成等のアモルファスカー
ボン組成)としておくことにより、このような珪素析出
による問題を解決することができる。
Further, as a member required to have a small amount of silicon component on the film surface, there are optical elements such as a laser reflecting mirror and a diffraction grating. For example, as a laser reflecting mirror, it is well known that a silicon carbide film is formed by chemical vapor deposition on the surface of a substrate which is a silicon carbide sintered body or a carbon sintered body. When a high-energy beam is applied to the mirror surface obtained by polishing, white turbidity (cloudiness) may occur at the irradiation location, causing a problem such as a decrease in beam reflectance. The cause of such white turbidity mainly lies in the precipitation of silicon, and silicon is deposited in the form of fine droplets at the white turbid portion. However, by setting the surface of the film, which is a mirror surface, to a carbon-rich composition with a small amount of silicon component (for example, an amorphous carbon composition such as a glassy carbon composition or a pyrolithic carbon composition), the problem due to such silicon precipitation can be solved. .

【0029】[0029]

【発明の効果】以上の説明から容易に理解されるよう
に、本発明の炭化珪素コーティング部材によれば、基体
上に形成される炭化珪素膜を、その膜厚方向において膜
表面に向かうに従って炭素成分が増大する傾斜状組成を
なすもの(一種の傾斜機能材料)としたから、化学量論
組成をなす一般的な炭化珪素膜では得ることのできない
特性(例えば、ガラス製光学素子用の成形型における離
型性の向上やメカニカルシール用の密封環における相手
密封環との摺動性向上等)を発揮させることができ、成
形型,密封環等における炭化珪素膜に起因する問題を解
決して、その性能を大幅に向上させることができる。
As can be easily understood from the above description, according to the silicon carbide coating member of the present invention, the silicon carbide film formed on the substrate is carbonized in the film thickness direction toward the film surface. Since the composition has a graded composition with increasing components (a kind of functionally graded material), characteristics that cannot be obtained with a general silicon carbide film having a stoichiometric composition (for example, a molding die for a glass optical element) And the sliding property of the sealing ring for mechanical seal with the mating sealing ring) can be exhibited, and the problems caused by the silicon carbide film in the molding die, sealing ring, etc. can be solved. , Its performance can be greatly improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明をガラス製光学素子用の成形型に適用し
た例を示すもので、当該成形型の製作工程図である。
FIG. 1 shows an example in which the present invention is applied to a molding die for a glass optical element, and is a process drawing of the molding die.

【図2】図1の要部(炭化珪素膜)を拡大して示す詳細
図である。
FIG. 2 is a detailed view showing an enlarged main part (silicon carbide film) of FIG.

【図3】本発明を密封環に適用した例を示すもので、当
該密封環を使用するメカニカルシールの一例を示す要部
の断面図である。
FIG. 3 shows an example in which the present invention is applied to a sealing ring, and is a cross-sectional view of a main part showing an example of a mechanical seal using the sealing ring.

【図4】図3の要部(固定環の密封端面)を拡大して示
す詳細図である。
FIG. 4 is a detailed view showing an enlarged main part (sealing end surface of the fixed ring) of FIG.

【図5】炭素リッチ組成(グラッシカーボン組成)をな
す炭化珪素膜のラマンスペクトル図である。
FIG. 5 is a Raman spectrum diagram of a silicon carbide film having a carbon-rich composition (glassy carbon composition).

【図6】化学量論組成をなす炭化珪素膜のラマンスペク
トル図である。
FIG. 6 is a Raman spectrum diagram of a silicon carbide film having a stoichiometric composition.

【符号の説明】[Explanation of symbols]

1…成形型、2…型本体(基体)、2a…型部、3,1
1…炭化珪素膜、3a…成形面、5…固定環(密封
環)、5a…密封端面、10…基体、31,111…珪
素リッチ組成をなす第1層(接着層)、32,112…
化学量論組成をなす第2層、33,113…炭素リッチ
組成をなす第3層(表面層)。
1 ... Mold, 2 ... Mold body (base), 2a ... Mold part, 3, 1
DESCRIPTION OF SYMBOLS 1 ... Silicon carbide film, 3a ... Molding surface, 5 ... Fixed ring (sealing ring), 5a ... Sealing end surface, 10 ... Base, 31,111 ... 1st layer (adhesive layer) having a silicon-rich composition, 32, 112 ...
Second layer having stoichiometric composition, 33, 113 ... Third layer having carbon-rich composition (surface layer).

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2K009 BB01 CC01 DD04 EE00 4K030 AA03 AA06 AA09 AA17 BA37 CA05 FA10 JA06 JA08 LA11   ─────────────────────────────────────────────────── ─── Continued front page    F term (reference) 2K009 BB01 CC01 DD04 EE00                 4K030 AA03 AA06 AA09 AA17 BA37                       CA05 FA10 JA06 JA08 LA11

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 基体の表面に化学蒸着による炭化珪素膜
を形成してなる炭化珪素コーティング部材において、炭
化珪素膜が、その膜厚方向において膜表面に向かうに従
って炭素成分が増大する傾斜状組成をなすものであるこ
とを特徴とする炭化珪素コーティング部材。
1. A silicon carbide coating member comprising a silicon carbide film formed by chemical vapor deposition on the surface of a substrate, wherein the silicon carbide film has a graded composition in which the carbon component increases in the film thickness direction toward the film surface. A silicon carbide coating member characterized by being an eggplant.
【請求項2】 炭化珪素の表面層が炭素リッチ組成をな
していることを特徴とする、請求項1に記載する炭化珪
素コーティング部材。
2. The silicon carbide coating member according to claim 1, wherein the surface layer of silicon carbide has a carbon-rich composition.
【請求項3】 基体が炭化珪素材で構成されており、炭
化珪素膜における基体への接着層が珪素リッチ組成をな
していることを特徴とする、請求項1又は請求項2に記
載する炭化珪素コーティング部材。
3. The carbonization according to claim 1 or 2, wherein the substrate is made of a silicon carbide material, and the adhesive layer to the substrate in the silicon carbide film has a silicon-rich composition. Silicon coating member.
【請求項4】 炭化珪素膜の表面を成形面とするガラス
製光学素子用の成形型であることを特徴とする請求項
1、請求項2又は請求項3に記載する炭化珪素コーティ
ング部材。
4. The silicon carbide coating member according to claim 1, which is a molding die for a glass optical element having a surface of a silicon carbide film as a molding surface.
【請求項5】 炭化珪素膜の表面を相手密封環との摺動
面とするメカニカルシール用の密封環であることを特徴
とする、請求項1、請求項2又は請求項3に記載する炭
化珪素コーティング部材。
5. The carbonized film according to claim 1, wherein the silicon carbide film is a sealing ring for a mechanical seal in which the surface of the silicon carbide film is a sliding surface with a mating sealing ring. Silicon coating member.
JP2001369696A 2001-12-04 2001-12-04 Silicon carbide coating material Expired - Fee Related JP3787084B2 (en)

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JP2003171766A true JP2003171766A (en) 2003-06-20
JP3787084B2 JP3787084B2 (en) 2006-06-21

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ID=19179046

Family Applications (1)

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Country Status (1)

Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009120447A (en) * 2007-11-16 2009-06-04 Osaka Prefecture Molding die for glass lens, and its manufacturing method
CN110965042A (en) * 2019-12-03 2020-04-07 巩义市泛锐熠辉复合材料有限公司 Preparation method of gradient SiC coating

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009120447A (en) * 2007-11-16 2009-06-04 Osaka Prefecture Molding die for glass lens, and its manufacturing method
CN110965042A (en) * 2019-12-03 2020-04-07 巩义市泛锐熠辉复合材料有限公司 Preparation method of gradient SiC coating

Also Published As

Publication number Publication date
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