JP2003149833A - Transfer member, method for manufacturing the same, electronic parts and pattern forming method - Google Patents

Transfer member, method for manufacturing the same, electronic parts and pattern forming method

Info

Publication number
JP2003149833A
JP2003149833A JP2001342911A JP2001342911A JP2003149833A JP 2003149833 A JP2003149833 A JP 2003149833A JP 2001342911 A JP2001342911 A JP 2001342911A JP 2001342911 A JP2001342911 A JP 2001342911A JP 2003149833 A JP2003149833 A JP 2003149833A
Authority
JP
Japan
Prior art keywords
insulating layer
transfer
transfer member
conductor
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001342911A
Other languages
Japanese (ja)
Other versions
JP4134552B2 (en
Inventor
Hiroshi Ono
裕志 大野
Shogo Nakayama
祥吾 中山
Hidekazu Uryu
英一 瓜生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2001342911A priority Critical patent/JP4134552B2/en
Publication of JP2003149833A publication Critical patent/JP2003149833A/en
Application granted granted Critical
Publication of JP4134552B2 publication Critical patent/JP4134552B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Ceramic Capacitors (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)
  • Coils Or Transformers For Communication (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a transfer member which suppresses defective formation and defective transfer of an electric conductor and can form and transfer a fine pattern and to provide a method for manufacturing the transfer member, electronic parts adaptable to high frequency and a pattern forming method. SOLUTION: In the transfer member comprising a base plate 11, at least the surface of which has electric conductivity, and an insulating layer 12 disposed on the base plate 11 and formed in a prescribed pattern and having transfer regions 15 in which the base plate 11 is exposed in the insulating layer 12, wherein a transfer pattern is formed in the transfer regions 15, an insulator releasing layer 17 is disposed on the surface of the insulating layer 12 by irradiating the surface of the insulating layer 12 with an energy beam.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、導電性のパターン
を作製する転写部材及びその製造方法に関するものであ
り、しかもその転写技術を用いることによって、デジタ
ル電子機器の小型化・薄型化に伴う高密度実装回路基板
からのノイズを抑制するノイズ対策部品のひとつである
電子部品及びパターン形成方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transfer member for producing a conductive pattern and a method for producing the transfer member, and by using the transfer technique, it is possible to improve the size and thickness of digital electronic equipment. The present invention relates to an electronic component and a pattern forming method, which are one of noise suppression components that suppress noise from a densely mounted circuit board.

【0002】[0002]

【従来の技術】転写部材と同一の導電体を形成する電鋳
技術は従来から広く行われている。また電鋳の際、絶縁
層を剥離して導電体のみを転写するのが一般的であった
が、絶縁層を剥離せずに転写する工法も発展し、転写部
材の連続使用も可能となった。
2. Description of the Related Art Electroforming techniques for forming the same conductor as a transfer member have been widely used. Also, during electroforming, it was common to peel off the insulating layer and transfer only the conductor, but the method of transferring without peeling the insulating layer has also been developed, and continuous use of transfer members is possible. It was

【0003】以下、従来の転写部材および電子部品とし
て積層チップ部品について、図面を参照しながら説明す
る。
Hereinafter, a conventional transfer member and a laminated chip component as an electronic component will be described with reference to the drawings.

【0004】図9は従来の転写部材の断面図である。FIG. 9 is a sectional view of a conventional transfer member.

【0005】従来の転写部材は図9に示すように、導電
性を有するベース板11の上面に絶縁層を設け、転写領
域15の絶縁物を除いて所定のパターンを持つ絶縁層1
2が設けられている。この転写部材をめっき液の中に含
浸してベース板11を通電することにより、ベース板1
1の絶縁層12に囲まれた転写領域15にめっき皮膜を
形成し所定のパターンを有する導電体18を転写部材に
形成していた。この転写部材の導電体を形成した面に転
写対象物19を圧着させ、導電体を転写領域15から引
き出し、転写対象物にこの導電体を転写していた。この
ように形成された導電体を転写対象物に埋設することに
より内部導体と引き出し電極を設け、端面に外部電極を
形成して積層チップ部品としていた。
As shown in FIG. 9, a conventional transfer member is provided with an insulating layer on the upper surface of a conductive base plate 11 and an insulating layer 1 having a predetermined pattern except for the insulating material in the transfer area 15.
Two are provided. By impregnating this transfer member in a plating solution and energizing the base plate 11, the base plate 1
A conductive film 18 having a predetermined pattern was formed on the transfer member by forming a plating film on the transfer region 15 surrounded by the first insulating layer 12. The transfer object 19 was pressure-bonded to the surface of the transfer member on which the conductor was formed, the conductor was pulled out from the transfer region 15, and the conductor was transferred to the transfer object. By embedding the conductor thus formed in an object to be transferred, an internal conductor and an extraction electrode are provided, and an external electrode is formed on an end face to form a laminated chip component.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上記従
来の転写部材では、図10に示すように導電体18を形
成する際(特に初めてめっき液に浸漬する際)、転写領
域のベース板表面のめっき液への濡れ性が悪く、またベ
ース板11表面の転写領域上の絶縁層を除く際に、絶縁
層の一部が絶縁物残渣16となって残留し、その結果導
電体の形成を阻害してしまうため、導電体18が正確に
形成されないという課題を有していた。
However, in the above-mentioned conventional transfer member, when the conductor 18 is formed as shown in FIG. 10 (especially when it is immersed in the plating solution for the first time), the plating of the surface of the base plate in the transfer region is performed. The wettability with the liquid is poor, and when the insulating layer on the transfer area on the surface of the base plate 11 is removed, a part of the insulating layer remains as an insulator residue 16 and, as a result, the formation of a conductor is hindered. Therefore, there is a problem that the conductor 18 is not accurately formed.

【0007】このためファインパターンの場合には正確
な導電体の形成は困難であった。このため転写部材を脱
脂処理していたが絶縁物残渣のない清浄な転写領域のベ
ース板表面が得られなかった。
Therefore, in the case of a fine pattern, it was difficult to form an accurate conductor. For this reason, the transfer member was degreased, but a clean transfer area of the base plate surface without insulating residue could not be obtained.

【0008】また別の課題として、図11に示すように
導電体が正確に形成された場合でも導電体18を転写対
象物に転写させる際に絶縁層12と転写対象物19も同
時に圧着され互いが密着してしまい転写対象物19が逆
に転写部材の絶縁層12に転写されて破壊され製品に欠
陥が発生する課題に加えて、転写部材の絶縁層12が転
写対象物19に転写され、転写部材の絶縁層が剥離して
転写部材を破壊してしまうという課題を有していた。
As another problem, even when the conductor is accurately formed as shown in FIG. 11, when the conductor 18 is transferred to the transfer object, the insulating layer 12 and the transfer object 19 are simultaneously pressed to each other. In addition to the problem that the transfer target object 19 is transferred to the insulating layer 12 of the transfer member and destroyed due to the close contact with the product, the insulating layer 12 of the transfer member is transferred to the transfer target object 19, There is a problem that the insulating layer of the transfer member is peeled off and the transfer member is destroyed.

【0009】本発明は上記従来の課題を解決するもの
で、導電体の形成不良と転写不良を低減させ、ファイン
パターンを形成、転写することができる転写部材及びそ
の製造方法と高周波に対応できる電子部品及びパターン
形成方法を提供することを目的としたものである。
The present invention solves the above-mentioned problems of the prior art. A transfer member capable of forming and transferring a fine pattern by reducing formation defects and transfer defects of conductors, a method of manufacturing the same, and an electronic device capable of handling high frequencies. It is intended to provide a component and a pattern forming method.

【0010】[0010]

【課題を解決するための手段】本発明は、少なくとも表
面に導電性を有するベースと、ベース上に設けられ所定
パターンで形成された絶縁層とを備え、絶縁層間にベー
スが露出した転写領域を設け、この転写領域に転写パタ
ーンを形成する転写部材であって、絶縁層の表面にエネ
ルギー線を照射することで絶縁層の表面に離型層を備え
た。
SUMMARY OF THE INVENTION The present invention comprises at least a conductive base on the surface and an insulating layer formed on the base and having a predetermined pattern, and a transfer region in which the base is exposed is provided between the insulating layers. A transfer member which is provided and forms a transfer pattern in the transfer area, and a release layer is provided on the surface of the insulating layer by irradiating the surface of the insulating layer with energy rays.

【0011】[0011]

【発明の実施の形態】請求項1記載の発明は、少なくと
も表面に導電性を有するベースと、前記ベース上に設け
られ所定パターンで形成された絶縁層とを備え、前記絶
縁層間に前記ベースが露出した転写領域を設け、この転
写領域に転写パターンを形成する転写部材であって、絶
縁層の表面にエネルギー線を照射することで、前記絶縁
層の表面に離型層を備えたことを特徴とする転写部材と
することで、離型部を設けるのに他の部材を塗布して形
成するなどの手間が不要となり、生産性が向上し、しか
も絶縁層の表面にエネルギー線を照射することで、転写
領域の絶縁物残渣を除去できるので、導体パターンを確
実にしかもダメージを与えることなく、特性の良い導電
体を転写させることができる。また、離型部を備えたこ
とで、被転写体に絶縁層の一部が付着したりすることを
防止できる。
According to a first aspect of the present invention, there is provided a base having conductivity at least on a surface thereof, and an insulating layer formed on the base and having a predetermined pattern, and the base is provided between the insulating layers. A transfer member having an exposed transfer area and forming a transfer pattern in the transfer area, wherein a release layer is provided on the surface of the insulating layer by irradiating the surface of the insulating layer with energy rays. By using the transfer member as described above, it is not necessary to apply another member to form the mold release portion, and the productivity is improved, and moreover, the surface of the insulating layer is irradiated with energy rays. Since the insulator residue in the transfer region can be removed, the conductor having good characteristics can be transferred reliably and without damaging the conductor pattern. In addition, since the mold release portion is provided, it is possible to prevent a part of the insulating layer from adhering to the transferred body.

【0012】請求項2記載の発明は、絶縁層をポジ型フ
ォトレジストとしたことを特徴とする請求項1記載の転
写部材とすることで、絶縁層のパターニングを容易に行
うことができる。
According to a second aspect of the invention, the transfer layer according to the first aspect is characterized in that the insulating layer is a positive photoresist, so that the insulating layer can be easily patterned.

【0013】請求項3記載の発明は、転写領域の幅Wを
4μm〜15μmとし、前記転写領域の深さをtとした
ときにt÷Wが1.0以上であることを特徴とする請求
項1記載の転写部材としたことで、特に導電体のファイ
ンパターンを形成する際に適しており、しかも導電体へ
のダメージを軽減させることができる。
According to a third aspect of the present invention, the width W of the transfer area is 4 μm to 15 μm, and when the depth of the transfer area is t, t / W is 1.0 or more. By using the transfer member according to item 1, it is particularly suitable for forming a fine pattern of a conductor, and moreover, damage to the conductor can be reduced.

【0014】請求項4記載の発明は、少なくとも表面に
導電性を有するベース上に絶縁層を形成し、前記絶縁層
をパターニングして所定の形状に加工して前記ベースの
一部を露出させた転写領域を形成し、前記絶縁層にエネ
ルギー線を照射することで転写領域に存在する絶縁物残
渣を除去するとともに、前記残った絶縁層の表面に離型
部を形成したことを特徴とする転写部材の製造方法とす
ることで、離型部を別途部材を設けなくても形成でき、
しかも絶縁物残渣も除去できるので、作業性が良くなり
生産性が向上する。
According to a fourth aspect of the present invention, an insulating layer is formed on at least a surface of the base having conductivity, and the insulating layer is patterned and processed into a predetermined shape to expose a part of the base. A transfer region is formed, and an insulating material residue existing in the transfer region is removed by irradiating the insulating layer with an energy ray, and a release part is formed on the surface of the remaining insulating layer. By using the manufacturing method of the member, the mold release portion can be formed without providing a separate member,
Moreover, since the insulator residue can be removed, the workability is improved and the productivity is improved.

【0015】請求項5記載の発明は、絶縁層をフォトレ
ジストで構成し、ベース上にフォトレジスト膜を形成
し、マスクを被せて第1の紫外線を照射し、現像するこ
とで所定パターンの絶縁層を設け、その後に前記第1の
紫外線よりも短波長の第2の紫外線を照射することで、
絶縁物残渣を除去するとともに、前記残った絶縁層の表
面に離型部を形成したことを特徴とする請求項4記載の
転写部材の製造方法とすることで、絶縁層のパターニン
グが容易で、しかも波長の異なる紫外線を利用するの
で、製造工程が簡単になる。
According to a fifth aspect of the present invention, the insulating layer is composed of a photoresist, a photoresist film is formed on the base, a mask is covered, the first ultraviolet ray is irradiated, and development is performed to insulate a predetermined pattern. By providing a layer and then irradiating a second ultraviolet ray having a shorter wavelength than the first ultraviolet ray,
By removing the insulator residue and forming a mold release portion on the surface of the remaining insulating layer, the method for producing a transfer member according to claim 4, wherein the patterning of the insulating layer is easy, Moreover, since ultraviolet rays having different wavelengths are used, the manufacturing process is simplified.

【0016】請求項6記載の発明は、基体と、前記基体
上に設けられた素子体と、前記導電体と電気的に接続し
た端子部とを備えた電子部品であって、素子体は請求項
1,いずれか1記載の転写部材の転写領域に導電体を形
成し、前記導電体を基体上に転写して構成したことを特
徴とする電子部品とすることで、ファインパターンの素
子部を形成することができるので、性能を向上させるこ
とができ、小型化も実現できる。
According to a sixth aspect of the present invention, there is provided an electronic component comprising a base body, an element body provided on the base body, and a terminal portion electrically connected to the conductor. Item 1. An electronic component characterized in that a conductor is formed in the transfer region of the transfer member, and the conductor is transferred onto a substrate, thereby forming an element part having a fine pattern. Since it can be formed, performance can be improved and miniaturization can be realized.

【0017】請求項7記載の発明は、基体はシートを積
層して構成され、前記シート間に素子体を挟み込んだこ
とを特徴とする請求項6記載の電子部品とすることで、
素子体を複数一つの基体中に設けることが可能となるの
で、特性の調整や電子部品の小型化を容易に行うことが
できる。
According to a seventh aspect of the present invention, there is provided an electronic component according to the sixth aspect, wherein the base is formed by laminating sheets, and the element body is sandwiched between the sheets.
Since it is possible to provide a plurality of element bodies in one substrate, it is possible to easily adjust the characteristics and downsize the electronic component.

【0018】請求項8記載の発明は、シートを磁性体と
し、前記素子体をスパイラル状導体とした請求項7記載
の電子部品とすることで、高周波域の特性を向上させる
ノイズ対策可能な電子部品を得ることができる。
According to an eighth aspect of the invention, the sheet is made of a magnetic material, and the element body is made of a spiral conductor, so that the electronic component capable of improving noise in a high frequency range can be improved. You can get the parts.

【0019】請求項9記載の発明は、少なくとも表面に
導電性を有するベース上に絶縁層を形成し、前記絶縁層
をパターニングして所定の形状に加工して前記ベースの
一部を露出させた転写領域を形成し、前記絶縁層にエネ
ルギー線を照射することで転写領域に存在する絶縁物残
渣を除去するとともに、前記残った絶縁層の表面に離型
部を形成した転写部材を用意し、前記転写領域に導電体
を成長させ、その後、被転写体に前記転写部材を押し当
てて前記被転写体に前記導電体を転写させたことを特徴
とするパターン形成方法とすることで、ファインパター
ンの導電体を形成でき、しかも導電体にダメージを加え
ないので、特性が向上する配線板や電子部品を得ること
ができる。
According to a ninth aspect of the present invention, an insulating layer is formed on at least a surface of the base having conductivity, and the insulating layer is patterned and processed into a predetermined shape to expose a part of the base. A transfer region is formed, and an insulating material residue existing in the transfer region is removed by irradiating the insulating layer with an energy beam, and a transfer member having a release part formed on the surface of the remaining insulating layer is prepared. By forming a conductor on the transfer area and then pressing the transfer member against the transfer target to transfer the conductor onto the transfer target, a fine pattern is formed. Since the conductor can be formed and the conductor is not damaged, it is possible to obtain a wiring board or an electronic component having improved characteristics.

【0020】本発明の一実施の形態における転写部材と
この転写部材を使用して作製した電子部品の一種である
積層チップインダクタを例にして図面を参照しながら説
明する。
A transfer member according to an embodiment of the present invention and a laminated chip inductor, which is a kind of electronic component manufactured by using the transfer member, will be described as an example with reference to the drawings.

【0021】図1は本発明の一実施の形態における転写
部材を示す断面図、図2は同転写部材の製造方法を示す
断面図である。
FIG. 1 is a sectional view showing a transfer member according to an embodiment of the present invention, and FIG. 2 is a sectional view showing a method of manufacturing the transfer member.

【0022】転写部材は、ベース板11の上面に転写領
域15を除く所定のパターンを形成する絶縁物からなる
絶縁層12と前記絶縁層12の少なくとも表面に同絶縁
物を処理してできる絶縁物離型部17を備えている。
The transfer member is an insulating layer 12 made of an insulating material that forms a predetermined pattern on the upper surface of the base plate 11 excluding the transfer region 15, and an insulating material obtained by treating the insulating material on at least the surface of the insulating layer 12. A mold release part 17 is provided.

【0023】ベース板11は少なくとも絶縁層12を形
成する面が導電性を有していることが必要であり、
(1)ベース板11全体が導電性を示す金属材料で形成
したり、或いは(2)絶縁基板上に導電性基板を張り付
けて構成しても良いし、導電性基板を複数枚積層して構
成しても良い。更に、(3)絶縁基板或いは導電性基板
上にメッキ,スパッタリング,蒸着などを用いて、導電
性薄膜単層形成或いは複数層積層したものでも良い。ま
た、(4)絶縁基板或いは導電性基板上に導電性の箔を
張り付けたりする構成でもよい。
At least the surface of the base plate 11 on which the insulating layer 12 is formed needs to be conductive,
(1) The entire base plate 11 may be formed of a conductive metal material, or (2) a conductive substrate may be attached to an insulating substrate, or a plurality of conductive substrates may be laminated. You may. Further, (3) a conductive thin film may be formed in a single layer or a plurality of layers may be laminated on an insulating substrate or a conductive substrate by using plating, sputtering, vapor deposition or the like. Alternatively, (4) a conductive foil may be attached to the insulating substrate or the conductive substrate.

【0024】上記(1)の構成では、ベース板11を単
一材料の板状体で構成するので、構造が簡単で生産性が
良い。上記(2)の構成では、例えば、絶縁層12を形
成する導電性基板の機械的強度等が低い場合に、機械的
強度が高く撓みに強いガラスエポキシ基板を張り付けて
も良い。また、同様の理由で、絶縁層12を形成するの
に適した導電性基板と機械的強度に優れた導電性基板を
積層して構成しすることで、機械的強度の優れた転写部
材を得ることができる。上記(3)の場合には、絶縁基
板あるいは導電性基板の表面状態が悪くても、導電性薄
膜を形成することで、表面状態を良好とすることができ
るので、導電性基板或いは絶縁基板の表面処理に大幅な
時間をかけなくても、良好な転写部材を生産でき、しか
も転写に適した導電性薄膜を任意に形成できるので、作
業性が良くなる。上記(4)の場合には、薄膜形成装置
などを用いなくても、基板上に導体を形成できるので、
製造設備などのコストを抑えることができる。
In the above configuration (1), since the base plate 11 is made of a plate-shaped body made of a single material, the structure is simple and the productivity is good. In the configuration of (2), for example, when the conductive substrate forming the insulating layer 12 has low mechanical strength and the like, a glass epoxy substrate having high mechanical strength and resistance to bending may be attached. Further, for the same reason, a conductive substrate suitable for forming the insulating layer 12 and a conductive substrate having excellent mechanical strength are laminated to form a transfer member having excellent mechanical strength. be able to. In the case of the above (3), even if the surface condition of the insulating substrate or the conductive substrate is bad, the surface condition can be made good by forming the conductive thin film. A good transfer member can be produced without spending a lot of time on the surface treatment, and a conductive thin film suitable for transfer can be arbitrarily formed, so that workability is improved. In the case of (4) above, since the conductor can be formed on the substrate without using a thin film forming apparatus,
The cost of manufacturing equipment can be reduced.

【0025】具体的には、ベース板11としてたとえば
ニッケル板、ステンレス板、プラスチックの上面にニッ
ケルめっきを施したものもしくはたとえばニッケル箔を
クラッドしたものなどが使用できる。
Specifically, as the base plate 11, for example, a nickel plate, a stainless steel plate, a plastic plated with nickel on the upper surface, or a clad with a nickel foil can be used.

【0026】なお、本実施の形態では、ベース板11を
方形の板状体としたが、円形板状,多角形板状,楕円板
状としても良く、或いは板状体ではなく、バルク状体や
円柱(或いは円筒)状体(ローラー状体)や角柱状体で
も用いることができる。
In this embodiment, the base plate 11 is a rectangular plate, but may be a circular plate, a polygonal plate, an elliptical plate, or a bulk rather than a plate. Also, a columnar (or cylindrical) body (roller body) or a prismatic body can be used.

【0027】絶縁層12はベース板11の上面に備えら
れ、所定の厚みになっている。転写領域15はベース板
11の上面に開口を有するように設けられ、後に図6の
ように転写領域15を埋めるように導電体18が形成さ
れる。
The insulating layer 12 is provided on the upper surface of the base plate 11 and has a predetermined thickness. The transfer region 15 is provided so as to have an opening on the upper surface of the base plate 11, and a conductor 18 is formed later so as to fill the transfer region 15 as shown in FIG.

【0028】まず図2に示すようにベース板11の上面
にスピンコータ等を用いてポジ型フォトレジストを15
μm程度の膜厚になるように塗布した後、85℃〜11
0℃で30分間オーブンによってプリベークを行い、絶
縁層12を形成する。次に図3に示すように絶縁層12
の上面に所定のパターンが形成されたマスク13を載置
して上方より第1の紫外線を所定のエネルギー量照射し
てベース板11面上に幅が10μm程度の絶縁物溶解部
14を形成する。次に図4に示すようにマスク13を取
り除き、露光したベース板11を現像液に浸漬して絶縁
物溶解部14を除去して所定のパターンである転写領域
15を形成する。しかし、この段階では転写領域15の
ベース板11上にに絶縁物残渣16がわずかに残ってい
る。この絶縁層12が形成されたベース板を100〜1
20℃、30分と200〜220℃、30分オーブンで
焼付硬化を行う。この絶縁層12が形成された転写部材
の全面に第1の紫外線よりも短波長の254nm(22
0nm〜290nm)を主とする第2の紫外線を1〜5
分間(好ましくは2.5分間〜3.5分間:3分間)程
度照射して絶縁物残渣16を除去し、絶縁物の表面に絶
縁物離型層17を形成して図1に示す転写部材を得る。
First, as shown in FIG. 2, a positive type photoresist 15 is formed on the upper surface of the base plate 11 using a spin coater or the like.
85 ℃ ~ 11 after coating to a film thickness of about μm
Prebaking is performed in an oven at 0 ° C. for 30 minutes to form the insulating layer 12. Next, as shown in FIG.
A mask 13 having a predetermined pattern formed thereon is placed, and a first ultraviolet ray is irradiated from above with a predetermined energy amount to form an insulator dissolving portion 14 having a width of about 10 μm on the surface of the base plate 11. . Next, as shown in FIG. 4, the mask 13 is removed, the exposed base plate 11 is dipped in a developing solution to remove the insulator dissolving portion 14, and a transfer area 15 having a predetermined pattern is formed. However, at this stage, a small amount of the insulating residue 16 remains on the base plate 11 in the transfer region 15. The base plate on which the insulating layer 12 is formed is 100 to 1
It is baked and cured in an oven at 20 ° C. for 30 minutes and 200 to 220 ° C. for 30 minutes. The entire surface of the transfer member on which the insulating layer 12 is formed has a wavelength of 254 nm (22 nm, which is shorter than the first ultraviolet light).
0 to 290 nm) and a second ultraviolet ray having a wavelength of 1 to 5
1 minute irradiation (preferably 2.5 minutes to 3.5 minutes: 3 minutes) to remove the insulator residue 16 and form an insulator release layer 17 on the surface of the insulator to form the transfer member shown in FIG. To get

【0029】なお、第2の紫外線すなわち第1の紫外線
よりも波長の短い紫外線を照射することで、絶縁物残渣
16は分解されると考えられ、転写領域15にはほとん
ど絶縁物残渣16は除去され、しかもパターニングする
際に用いられる第1の紫外線の波長よりも短波長の第2
の紫外線を照射することによって、絶縁層12の表面に
絶縁物離型部17が形成される。第2の紫外線を照射す
ることで、絶縁物離型部17が形成されることのメカニ
ズムは具体的には判らないが、第2の紫外線を照射する
ことで、絶縁層12の表面部が固くなることが考えら
れ、これによって絶縁層12の離型性が向上すると考え
られる。従って、後述する導電体の離型性が良くなると
ともに、転写対象物に絶縁層12が付着することはほと
んどない。この様な構成では、絶縁物離型部17を別材
料で設けるのではなく、絶縁層12の一部に離型性を持
たせる構成としたことで、部品点数が減るとともに、工
数が減り、生産性などを向上させることができる。
It is considered that the insulator residue 16 is decomposed by irradiating the second ultraviolet ray, that is, the ultraviolet ray having a shorter wavelength than the first ultraviolet ray, and almost all the insulator residue 16 is removed in the transfer region 15. And a second wavelength shorter than the first ultraviolet wavelength used for patterning.
By irradiating the ultraviolet rays of, the insulating material releasing portion 17 is formed on the surface of the insulating layer 12. Although the mechanism by which the insulator releasing portion 17 is formed by irradiating the second ultraviolet ray is not specifically known, the surface portion of the insulating layer 12 is hardened by irradiating the second ultraviolet ray. It is considered that the release property of the insulating layer 12 is improved. Therefore, the releasability of the conductor to be described later is improved, and the insulating layer 12 hardly adheres to the transfer target. In such a configuration, the insulator releasing portion 17 is not provided with a different material, but a part of the insulating layer 12 has a releasing property, so that the number of parts is reduced and the man-hour is reduced. Productivity and the like can be improved.

【0030】なお、本実施の形態では、特にファインパ
ターンを形成する場合に特に有効である。具体的には図
1に示すように、転写部材の絶縁層12間で形成される
転写領域15の幅Wが4μm〜15μmであり、絶縁層
12の厚さtが、t÷Wが1.0以上となるように設定
された転写部材を用いたファインパターンの形成に有効
である。また、換言すれば転写領域15の断面形状(最
小の断面形状)がWとtで表される転写部材に特に有効
である。
The present embodiment is particularly effective for forming a fine pattern. Specifically, as shown in FIG. 1, the width W of the transfer region 15 formed between the insulating layers 12 of the transfer member is 4 μm to 15 μm, and the thickness t of the insulating layer 12 is t / W is 1. This is effective for forming a fine pattern using a transfer member set to be 0 or more. In other words, it is particularly effective for a transfer member in which the cross-sectional shape (minimum cross-sectional shape) of the transfer area 15 is represented by W and t.

【0031】次に、上記転写部材を用いた電子部品の製
造方法について説明する。なお、電子部品としては、基
板の主面にスパイラル状の導電体を設け基板両端にその
スパイラル状の導電体と接続する端子部を設けた平面イ
ンダクタや、磁性シートの間にスパイラル状の導電体を
挟み込みスパイラル状の導電体を磁性シートに設けられ
たスルーホールを介して接続し、やはり導電体の両端と
接続される端子部を設けた積層型電子部品(ノイズ除去
素子)等が挙げられる。
Next, a method of manufacturing an electronic component using the above transfer member will be described. As the electronic component, a planar inductor having a spiral conductor provided on the main surface of the substrate and terminal portions connected to the spiral conductor at both ends of the substrate, or a spiral conductor between magnetic sheets There is a laminated electronic component (noise elimination element) in which spiral conductors are sandwiched between and are connected via through holes provided in a magnetic sheet, and terminal portions which are also connected to both ends of the conductors are provided.

【0032】本実施の形態では、積層型遠視部品を例に
挙げて説明する。
In the present embodiment, a laminated type hyperopic component will be described as an example.

【0033】まず図6に示すように前記転写部材の酸活
性を行い、めっき液中でベース板11を通電することに
よってベース板11の絶縁層12に囲まれた転写領域1
5に銀,銀合金,銅,銅合金,金,金合金などの導電性
材料で構成されためっき皮膜による所定のパターンを有
する導電体18を形成する。これにより絶縁物開口幅w
が10μmで絶縁層厚みtが15μmの転写領域を得る
ことができるためt/wが1.0以上の転写領域15に
導電体18を形成できる。図7に示すようにこの導電体
18を形成した転写部材を磁性体シート19に熱圧着さ
せ、転写部材を磁性体シート19から剥がすとスパイラ
ル状パターンの導電体18が形成された磁性体シート1
9を得る。この様な磁性体シート19を一つ或いは複数
用意し(本実施の形態では2つの磁性体シート19を用
意した)、一対の磁性体シート19の間に導電体18を
形成していない磁性体シート20cを挟み込み、しかも
磁性体シート19を更に挟み込むように一乃至複数の磁
性体シート20aを設け、積層体とする。
First, as shown in FIG. 6, the transfer member 1 is acid-activated and the base plate 11 is energized in a plating solution to transfer the transfer region 1 surrounded by the insulating layer 12 of the base plate 11.
On 5, an electric conductor 18 having a predetermined pattern is formed by a plating film made of an electrically conductive material such as silver, silver alloy, copper, copper alloy, gold, gold alloy or the like. As a result, the insulator opening width w
Is 10 μm and the insulating layer thickness t is 15 μm, a conductor 18 can be formed in the transfer region 15 having t / w of 1.0 or more. As shown in FIG. 7, the transfer member having the conductor 18 formed thereon is thermocompression-bonded to the magnetic sheet 19, and the transfer member is peeled off from the magnetic sheet 19. The magnetic sheet 1 having the conductor 18 having a spiral pattern is formed.
Get 9. A magnetic body in which one or a plurality of such magnetic body sheets 19 are prepared (two magnetic body sheets 19 are prepared in the present embodiment) and the conductor 18 is not formed between the pair of magnetic body sheets 19 One or a plurality of magnetic material sheets 20a are provided so as to sandwich the sheet 20c and further sandwich the magnetic material sheet 19 to form a laminated body.

【0034】この時、図8に示すように磁性体シート1
9及び磁性体シート20cに貫通孔21を設け、この貫
通孔21に銀ペーストなどの導電材料を充填することに
よって導電スルホールを形成し、この導電スルホールに
て、一対の磁性シート19上に形成された導電体18を
電気的に接続する。、導電体18には積層体の外縁間で
の見た部分が形成されているので、積層体の外周部に非
接触の端子部を形成する。端子部は例えば積層体上に銀
ペーストなどの導電材料を塗布し、その上面にニッケ
ル、スズなどのめっきを施して形成される。
At this time, as shown in FIG.
9 and the magnetic substance sheet 20c are provided with through holes 21, and conductive through holes are formed by filling the through holes 21 with a conductive material such as silver paste. The conductive through holes are formed on the pair of magnetic sheets 19. The conductor 18 is electrically connected. Since the conductor 18 has a portion as seen between the outer edges of the laminated body, a non-contact terminal portion is formed on the outer peripheral portion of the laminated body. The terminal portion is formed, for example, by applying a conductive material such as silver paste on the laminated body and plating the upper surface thereof with nickel, tin, or the like.

【0035】以下この様に構成された積層型電子部品の
製造途中の不良発生率を、(表1)に示す。
The defective occurrence rate during the manufacture of the laminated electronic component thus constructed is shown in Table 1 below.

【0036】[0036]

【表1】 [Table 1]

【0037】(表1)から判るように、本実施の形態の
転写部材を用いて形成した積層型電子部品においては、
製造途中の不良はほとんど発生しておらず、良好な特性
を示していることが判る。メッキ形成不良については、
絶縁物残渣16を確実に除去できるため、ほぼメッキ形
成不良は抑えられており、しかも絶縁層12の表面に絶
縁物離型部17が形成されているので、導電体18の離
型不良などを低減できるので、転写対象物の破壊や絶縁
層12の破壊も防止できる。
As can be seen from Table 1, in the laminated electronic component formed by using the transfer member of this embodiment,
It can be seen that there are almost no defects during the manufacturing process, and good characteristics are exhibited. For defective plating,
Since the insulator residue 16 can be reliably removed, defective plating formation is substantially suppressed, and since the insulator release portion 17 is formed on the surface of the insulating layer 12, the release failure of the conductor 18 is prevented. Since it can be reduced, it is possible to prevent destruction of the transfer target and destruction of the insulating layer 12.

【0038】また、上記転写部材を用いて、導電体18
を形成することで、導電体18は、線幅が細くしかも狭
ピッチのスパイラル状パターンを形成でき、しかも転写
部材には絶縁物残渣16がなく、しかも離型性が良いた
めに、導電体18に欠陥や損傷が発生するのを防止する
ことができるので、図9に示すように、特に高周波域で
の特性を向上させることができる。
Further, by using the above transfer member, a conductor 18 is formed.
By forming the conductor 18, the conductor 18 can form a spiral pattern having a narrow line width and a narrow pitch, and the transfer member does not have the residue of the insulator 16 and has good releasability. Since it is possible to prevent the occurrence of defects and damages, it is possible to improve the characteristics particularly in a high frequency region as shown in FIG.

【0039】なお、本実施の形態では、電子部品に応用
したが、単板配線板や積層配線板などの導体パターンを
上記転写部材を用いて形成しても良く、非常にファイン
ピッチの配線パターンを構成できるので、実装密度など
を向上させることができる。
Although the present embodiment is applied to an electronic component, a conductor pattern such as a single wiring board or a laminated wiring board may be formed by using the transfer member, and a wiring pattern with a very fine pitch can be obtained. Since it can be configured, the mounting density and the like can be improved.

【0040】[0040]

【発明の効果】本発明は、少なくとも表面に導電性を有
するベースと、ベース上に設けられ所定パターンで形成
された絶縁層とを備え、絶縁層間に前記ベースが露出し
た転写領域を設け、この転写領域に転写パターンを形成
する転写部材であって、絶縁層の表面にエネルギー線を
照射することで絶縁層の表面に離型層を備えたことで、
離型部を設けるのに他の部材を塗布して形成するなどの
手間が不要となり、生産性が向上し、しかも絶縁層の表
面にエネルギー線を照射することで、転写領域の絶縁物
残渣を除去できるので、導体パターンを確実にしかもダ
メージを与えることなく、特性の良い導電体を転写させ
ることができる。また、離型部を備えたことで、被転写
体に絶縁層の一部が付着したりすることを防止できる。
According to the present invention, at least a conductive base is provided on the surface, and an insulating layer provided on the base and having a predetermined pattern is provided, and a transfer region where the base is exposed is provided between the insulating layers. A transfer member that forms a transfer pattern in a transfer area, and by providing a release layer on the surface of the insulating layer by irradiating the surface of the insulating layer with energy rays,
Eliminating the trouble of applying another member to form the mold release part improves productivity, and by irradiating the surface of the insulating layer with energy rays, the insulating residue in the transfer area can be removed. Since it can be removed, the conductor having good characteristics can be transferred reliably and without damaging the conductor pattern. In addition, since the mold release portion is provided, it is possible to prevent a part of the insulating layer from adhering to the transferred body.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施の形態における転写部材を示す
断面図
FIG. 1 is a cross-sectional view showing a transfer member according to an embodiment of the present invention.

【図2】本発明の一実施の形態における転写部材の製造
方法を示す断面図
FIG. 2 is a sectional view showing a method of manufacturing a transfer member according to an embodiment of the present invention.

【図3】本発明の一実施の形態における転写部材の製造
方法を示す断面図
FIG. 3 is a sectional view showing a method of manufacturing a transfer member according to the embodiment of the present invention.

【図4】本発明の一実施の形態における転写部材の製造
方法を示す断面図
FIG. 4 is a sectional view showing a method of manufacturing a transfer member according to the embodiment of the present invention.

【図5】本発明の一実施の形態における転写部材の製造
方法を示す断面図
FIG. 5 is a cross-sectional view showing the method for manufacturing the transfer member according to the embodiment of the present invention.

【図6】同転写部材に導電体を形成した断面図FIG. 6 is a cross-sectional view in which a conductor is formed on the transfer member.

【図7】同転写部材を用いて導電体を転写対象物に転写
する方法を示す断面図
FIG. 7 is a cross-sectional view showing a method of transferring a conductor to a transfer target using the transfer member.

【図8】本発明の一実施の形態における積層型電子部品
の製造方法を示す分解斜視図
FIG. 8 is an exploded perspective view showing a method for manufacturing a laminated electronic component according to an embodiment of the present invention.

【図9】従来の転写部材の断面図FIG. 9 is a sectional view of a conventional transfer member.

【図10】従来の転写部材に導電体を形成した断面図FIG. 10 is a cross-sectional view in which a conductor is formed on a conventional transfer member.

【図11】従来の転写部材を用いて導電体を転写対象物
に転写する方法を示す断面図
FIG. 11 is a cross-sectional view showing a method for transferring a conductor to a transfer target using a conventional transfer member.

【図12】本発明の一実施の形態及び従来の電子部品の
特性を示すグラフ
FIG. 12 is a graph showing characteristics of one embodiment of the present invention and a conventional electronic component.

【符号の説明】 11 ベース板 12 絶縁層 13 マスク 14 絶縁物溶解部 15 転写領域 16 絶縁物残渣 17 絶縁物離型層 18 導電体 19,20a,20b,20c 磁性シート 21 貫通孔[Explanation of symbols] 11 base plate 12 Insulation layer 13 masks 14 Insulator melting part 15 Transfer area 16 Insulator residue 17 Insulator release layer 18 conductor 19, 20a, 20b, 20c Magnetic sheet 21 through holes

フロントページの続き (72)発明者 瓜生 英一 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 Fターム(参考) 2H096 AA27 BA09 EA02 HA03 HA07 HA27 JA04 LA30 5E001 AB03 AC01 AH01 AH09 AJ01 5E070 AA01 AB02 BA12 CB03 CB08 CB13 CB15 5E082 AA01 AB03 Continued front page    (72) Inventor Eiichi Uryu             1006 Kadoma, Kadoma-shi, Osaka Matsushita Electric             Sangyo Co., Ltd. F term (reference) 2H096 AA27 BA09 EA02 HA03 HA07                       HA27 JA04 LA30                 5E001 AB03 AC01 AH01 AH09 AJ01                 5E070 AA01 AB02 BA12 CB03 CB08                       CB13 CB15                 5E082 AA01 AB03

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】少なくとも表面に導電性を有するベース
と、前記ベース上に設けられ所定パターンで形成された
絶縁層とを備え、前記絶縁層間に前記ベースが露出した
転写領域を設け、この転写領域に転写パターンを形成す
る転写部材であって、絶縁層の表面にエネルギー線を照
射することで、前記絶縁層の表面に離型層を備えたこと
を特徴とする転写部材。
1. A transfer region having a conductive base on at least a surface thereof and an insulating layer formed on the base and having a predetermined pattern, wherein a transfer region exposing the base is provided between the insulating layers. A transfer member for forming a transfer pattern on the surface of the insulating layer, wherein the surface of the insulating layer is irradiated with energy rays to provide a release layer on the surface of the insulating layer.
【請求項2】絶縁層をポジ型フォトレジストとしたこと
を特徴とする請求項1記載の転写部材。
2. The transfer member according to claim 1, wherein the insulating layer is a positive photoresist.
【請求項3】転写領域の幅Wを4μm〜15μmとし、
前記転写領域の深さをtとしたときにt÷Wが1.0以
上であることを特徴とする請求項1記載の転写部材。
3. The width W of the transfer area is 4 μm to 15 μm,
The transfer member according to claim 1, wherein t / W is 1.0 or more, where t is the depth of the transfer region.
【請求項4】少なくとも表面に導電性を有するベース上
に絶縁層を形成し、前記絶縁層をパターニングして所定
の形状に加工して前記ベースの一部を露出させた転写領
域を形成し、前記絶縁層にエネルギー線を照射すること
で転写領域に存在する絶縁物残渣を除去するとともに、
前記残った絶縁層の表面に離型部を形成したことを特徴
とする転写部材の製造方法。
4. An insulating layer is formed on a base having conductivity at least on the surface, and the insulating layer is patterned and processed into a predetermined shape to form a transfer region exposing a part of the base, By irradiating the insulating layer with energy rays, the insulating residue present in the transfer region is removed,
A method of manufacturing a transfer member, characterized in that a release part is formed on the surface of the remaining insulating layer.
【請求項5】絶縁層をフォトレジストで構成し、ベース
上にフォトレジスト膜を形成し、マスクを被せて第1の
紫外線を照射し、現像することで所定パターンの絶縁層
を設け、その後に前記第1の紫外線よりも短波長の第2
の紫外線を照射することで、絶縁物残渣を除去するとと
もに、前記残った絶縁層の表面に離型部を形成したこと
を特徴とする請求項4記載の転写部材の製造方法。
5. An insulating layer is composed of a photoresist, a photoresist film is formed on a base, a mask is covered, the first ultraviolet ray is irradiated, and development is performed to provide an insulating layer having a predetermined pattern. A second wavelength shorter than the first ultraviolet ray
5. The method for producing a transfer member according to claim 4, wherein the insulating residue is removed by irradiating the ultraviolet ray of 1. and a mold release portion is formed on the surface of the remaining insulating layer.
【請求項6】基体と、前記基体上に設けられた素子体
と、前記導電体と電気的に接続した端子部とを備えた電
子部品であって、素子体は請求項1,いずれか1記載の
転写部材の転写領域に導電体を形成し、前記導電体を基
体上に転写して構成したことを特徴とする電子部品。
6. An electronic component comprising a base body, an element body provided on the base body, and a terminal portion electrically connected to the conductor, wherein the element body is any one of claims 1 and 2. An electronic component, characterized in that a conductor is formed in a transfer region of the transfer member described above, and the conductor is transferred onto a substrate.
【請求項7】基体はシートを積層して構成され、前記シ
ート間に素子体を挟み込んだことを特徴とする請求項6
記載の電子部品。
7. The substrate is constructed by stacking sheets, and the element body is sandwiched between the sheets.
Electronic components listed.
【請求項8】シートを磁性体とし、前記素子体をスパイ
ラル状導体としたことを特徴とする請求項7記載の電子
部品。
8. The electronic component according to claim 7, wherein the sheet is made of a magnetic material and the element body is made of a spiral conductor.
【請求項9】少なくとも表面に導電性を有するベース上
に絶縁層を形成し、前記絶縁層をパターニングして所定
の形状に加工して前記ベースの一部を露出させた転写領
域を形成し、前記絶縁層にエネルギー線を照射すること
で転写領域に存在する絶縁物残渣を除去するとともに、
前記残った絶縁層の表面に離型部を形成した転写部材を
用意し、前記転写領域に導電体を成長させ、その後、被
転写体に前記転写部材を押し当てて前記被転写体に前記
導電体を転写させたことを特徴とするパターン形成方
法。
9. An insulating layer is formed on a base having conductivity on at least the surface, and the insulating layer is patterned and processed into a predetermined shape to form a transfer region exposing a part of the base, By irradiating the insulating layer with energy rays, the insulating residue present in the transfer region is removed,
A transfer member having a release part formed on the surface of the remaining insulating layer is prepared, a conductor is grown in the transfer region, and then the transfer member is pressed against the transfer target to transfer the conductive material to the transfer target. A pattern forming method characterized in that a body is transferred.
JP2001342911A 2001-11-08 2001-11-08 Transfer member, manufacturing method thereof, electronic component, and pattern forming method Expired - Fee Related JP4134552B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001342911A JP4134552B2 (en) 2001-11-08 2001-11-08 Transfer member, manufacturing method thereof, electronic component, and pattern forming method

Publications (2)

Publication Number Publication Date
JP2003149833A true JP2003149833A (en) 2003-05-21
JP4134552B2 JP4134552B2 (en) 2008-08-20

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ID=19156691

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Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008109141A (en) * 2006-10-25 2008-05-08 Samsung Electro-Mechanics Co Ltd Method of forming transcriptional circuit and method of manufacturing circuit board

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008109141A (en) * 2006-10-25 2008-05-08 Samsung Electro-Mechanics Co Ltd Method of forming transcriptional circuit and method of manufacturing circuit board
JP4635224B2 (en) * 2006-10-25 2011-02-23 サムソン エレクトロ−メカニックス カンパニーリミテッド. Circuit board manufacturing method
US8418355B2 (en) * 2006-10-25 2013-04-16 Samsung Electro-Mechanics Co., Ltd. Method for manufacturing circuit board

Also Published As

Publication number Publication date
JP4134552B2 (en) 2008-08-20

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