JP2003147591A - Surface treatment method for object to be treated and treatment equipment for the same - Google Patents

Surface treatment method for object to be treated and treatment equipment for the same

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Publication number
JP2003147591A
JP2003147591A JP2001348787A JP2001348787A JP2003147591A JP 2003147591 A JP2003147591 A JP 2003147591A JP 2001348787 A JP2001348787 A JP 2001348787A JP 2001348787 A JP2001348787 A JP 2001348787A JP 2003147591 A JP2003147591 A JP 2003147591A
Authority
JP
Japan
Prior art keywords
surface treatment
treated
fluid
reaction tank
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001348787A
Other languages
Japanese (ja)
Other versions
JP4745571B2 (en
Inventor
Hideo Yoshida
英夫 吉田
Seizo Miyata
清蔵 宮田
Masato Sone
正人 曽根
Nobuyoshi Sato
信義 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Engineering Corp
Original Assignee
Asahi Engineering Co Ltd Osaka
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Engineering Co Ltd Osaka filed Critical Asahi Engineering Co Ltd Osaka
Priority to JP2001348787A priority Critical patent/JP4745571B2/en
Priority to PCT/JP2002/011203 priority patent/WO2003042434A1/en
Priority to EP02777985A priority patent/EP1445353A4/en
Priority to US10/416,678 priority patent/US7323096B2/en
Priority to TW091133045A priority patent/TWI232896B/en
Publication of JP2003147591A publication Critical patent/JP2003147591A/en
Priority to US11/981,136 priority patent/US7857952B2/en
Application granted granted Critical
Publication of JP4745571B2 publication Critical patent/JP4745571B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1617Purification and regeneration of coating baths
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/16Regeneration of process solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/16Regeneration of process solutions
    • C25D21/18Regeneration of process solutions of electrolytes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003Electroplating using gases, e.g. pressure influence
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08Electroplating with moving electrolyte e.g. jet electroplating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • H01L21/2885Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041Cleaning
    • H01L21/02043Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052Wet cleaning only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321After treatment
    • H01L21/3213Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
    • H01L21/32133Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
    • H01L21/32134Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by liquid etching only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a surface treatment method for an object to be treated which is adequate for an electrochemical treatment of, for example, the object to be treated, averts the contact of the object to be treated and the atmosphere air, homogenously activates the surface of the object to be treated with high accuracy, makes it possible to obtain the good deposition of metal ions, rationally feeds and discharges surface treating fluid and treating liquid, performs the effective utilization thereof, obstructs the discharge of the fluid outside the system, makes the realization of a rational system, the improvement in productivity and mass production possible, permits the rational and safe conduction of the electrochemical treatment work permits downsizing and cost lowering of the equipment and permits convenient maintenance and a treatment equipment for the same. SOLUTION: The surface treating fluid is introduced into a reaction chamber 4 in which the object to be treated can be housed. After the surface treatment of the object to be treated, the surface treating fluid is introduced into a separating vessel 4. The surface treating fluid separated of contaminants is circulated to the above reaction chamber 4. The circulating route of the surface treating fluid including the reaction chamber 4 is communicatively connected during the surface treatment of the object to be treated. The surface treating fluid is always circulated in the circulating route.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、例えば被処理物の
電気化学的処理に好適で、被処理物と大気との接触を回
避し、被処理物表面を高精度かつ均質に活性化し、金属
イオンの良好な析出を得られるとともに、表面処理流体
と処理液の給排を合理的に行ない、それらの有効利用と
系外への排出を阻止し、合理的なシステムの実現と生産
性の向上並びに量産化を図れるとともに、電気化学的処
理作業を合理的かつ安全に行なえ、しかも設備の小形化
と低廉化を図れ、メンテナンスに至便な被処理物の表面
処理方法およびその処理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is suitable for, for example, electrochemical treatment of an object to be treated, avoids contact between the object to be treated and the atmosphere, activates the surface of the object to be treated with high accuracy and uniformly, and Good ion deposition can be achieved, and the surface treatment fluid and treatment solution can be rationally supplied and discharged to prevent their effective use and discharge to the outside of the system, realizing a rational system and improving productivity. In addition, the present invention relates to a surface treatment method of an object to be treated and a treatment apparatus thereof, which can be mass-produced, can perform electrochemical treatment work reasonably and safely, and can downsize equipment and cost, and is convenient for maintenance.

【0002】[0002]

【従来の技術】例えば、従来の電気メッキ工程は、前処
理工程とメッキ工程、後処理工程に分けられる。このう
ち、前処理工程は脱脂洗浄や酸洗いを伴い、これらは通
常、専用の浴槽に所定の処理液を収容して加温し、この
処理液に被処理物を所定時間浸漬して行なっている。し
たがって、複数の浴槽とその作業スペ−スを要して設備
費が高価になるとともに、処理液の飛散や有害なガスが
発生する状況下での作業を強いられて作業環境が悪く、
しかも前記浸漬に長時間を要して生産性が悪い、という
問題があった
2. Description of the Related Art For example, a conventional electroplating process is divided into a pretreatment process, a plating process, and a posttreatment process. Of these, the pretreatment process involves degreasing and pickling, and these are usually performed by immersing the prescribed treatment liquid in a dedicated bath and heating it, and immersing the object to be treated in this treatment liquid for a prescribed time. There is. Therefore, a plurality of baths and their work space are required, and the equipment cost becomes high, and the work environment is deteriorated because the work is forced to be performed in a situation where the processing liquid is scattered and harmful gas is generated.
Moreover, there is a problem that the immersion requires a long time and productivity is poor.

【0003】このような問題を解決するものとして、出
願人は、超臨界状態とした物質と、電解質溶液と、界面
活性剤とを反応浴槽に導入し、これらの乳濁状態の下で
電気メッキし、メッキ後は超臨界物質を気化させ、これ
を浴槽外に排出することで、洗浄液を要することなく反
応浴槽や電極等を洗浄できるようにした電気化学的処理
方法を開発し、これを特願2000−253572とし
て既に提案している。
In order to solve such a problem, the applicant has introduced a supercritical substance, an electrolyte solution and a surfactant into a reaction bath and electroplating them under these emulsion conditions. However, after plating, the supercritical substance is vaporized and discharged to the outside of the bath to develop an electrochemical treatment method that makes it possible to wash the reaction bath, electrodes, etc. without requiring a washing liquid. It has already been proposed as the Japanese Patent Application No. 2000-253572.

【0004】[0004]

【発明が解決しようとする課題】本発明は、この既に開
発した電気化学的処理方法およびその処理装置を更に改
善して具体化し、例えば被処理物の電気化学的処理に好
適で、被処理物と大気との接触を回避し、被処理物表面
を高精度かつ均質に活性化し、金属イオンの良好な析出
を得られるとともに、表面処理流体と処理液の給排を合
理的に行ない、それらの有効利用と系外への排出を阻止
し、合理的なシステムの実現と生産性の向上並びに量産
化を図れるとともに、電気化学的処理作業を合理的かつ
安全に行なえ、しかも設備の小形化と低廉化を図れ、メ
ンテナンスに至便な被処理物の表面処理方法およびその
処理装置を提供することを目的とする。
DISCLOSURE OF THE INVENTION The present invention further improves and embodies the electrochemical processing method and the processing apparatus thereof which have already been developed, and is suitable for electrochemical processing of an object to be processed, for example. Avoiding contact with the atmosphere and activating the surface of the object to be treated with high precision and homogeneity, and obtaining good deposition of metal ions, and rationalizing the supply and discharge of the surface treatment fluid and treatment liquid. Prevents effective use and discharge to the outside of the system, realizes a rational system, improves productivity and mass production, and can perform electrochemical treatment work reasonably and safely, and also downsizing equipment and low cost. It is an object of the present invention to provide a method of treating a surface of an object to be treated, which is convenient for maintenance, and an apparatus for treating the surface.

【0005】[0005]

【課題を解決するための手段】このため、請求項1の発
明は、被処理物を収容可能な反応槽に表面処理流体を導
入し、前記被処理物の表面処理後、前記表面処理流体を
分離槽へ導入し、汚染物を分離した表面処理流体を前記
反応槽へ循環する被処理物の表面処理方法において、前
記被処理物の表面処理時、前記反応槽を含む表面処理流
体の循環経路を連通し、該循環経路に前記表面処理流体
を終始循環させて、反応槽に表面処理流体を滞留させて
表面処理する方法に比べ、表面処理流体による被処理物
の表面処理、例えば脱脂洗浄や乾燥を高精度かつ速やか
に行なえるとともに、被処理物と大気との接触を回避
し、例えば被処理物表面の活性処理を高精度かつ確実に
行なえ、例えば金属イオンの良好な析出を得られ、電気
メッキや多層の重ねメッキに好適にしている。
Therefore, according to the invention of claim 1, the surface treatment fluid is introduced into a reaction tank capable of accommodating the object to be treated, and after the surface treatment of the object to be treated, the surface treatment fluid is removed. In the surface treatment method of the object to be treated, which is introduced into the separation tank and circulates the surface treatment fluid from which contaminants are separated into the reaction tank, in the surface treatment of the object to be treated, a circulation path of the surface treatment fluid including the reaction tank. In comparison with a method in which the surface treatment fluid is continuously circulated in the circulation path and the surface treatment fluid is retained in the reaction tank for surface treatment, surface treatment of the object to be treated with the surface treatment fluid, for example, degreasing cleaning or Along with being able to perform drying with high accuracy and speed, avoiding contact between the object to be processed and the atmosphere, for example, active treatment of the surface of the object to be processed can be performed with high accuracy and reliability, and good deposition of metal ions, for example, can be obtained. Electroplating and stacking multiple layers It is preferably in Tsu key.

【0006】請求項2の発明は、被処理物の脱脂または
洗浄またはその乾燥時、前記表面処理流体を終始循環さ
せ、被処理物の脱脂または洗浄またはその乾燥等の表面
活性処理を、高精度かつ確実にしかも速やかに行なうよ
うにしている。請求項3の発明は、前記被処理物の表面
処理後、表面処理流体中の電気化学反応により生成され
た気体を分離または除去するようにして、前記気体の系
内への混入を防止し、被処理物に対する良好な電気化学
反応を得られるとともに、前記表面処理流体の再生を精
度良く行なえるようにしている。請求項4の発明は、前
記被処理物の表面処理後、前記表面処理流体中の酸素と
水素を分離または除去し、電気化学反応により生成され
た酸素と水素の系内への混入を防止し、被処理物に対す
る良好な電気化学反応を得られるとともに、前記表面処
理流体の再生を精度良く行なえるようにしている。
According to a second aspect of the present invention, when degreasing or cleaning the object to be treated or drying the object, the surface treatment fluid is circulated all the time so that surface activation treatment such as degreasing or cleaning the object to be treated or drying the object can be performed with high accuracy. And I try to do it surely and quickly. According to the invention of claim 3, after the surface treatment of the object to be treated, the gas generated by the electrochemical reaction in the surface treatment fluid is separated or removed to prevent the gas from being mixed into the system, A good electrochemical reaction with respect to the object to be treated can be obtained, and the surface treatment fluid can be regenerated accurately. According to the invention of claim 4, after the surface treatment of the object to be treated, oxygen and hydrogen in the surface treatment fluid are separated or removed to prevent mixing of oxygen and hydrogen generated by an electrochemical reaction into the system. In addition, a good electrochemical reaction with respect to the object to be treated can be obtained, and the surface treatment fluid can be regenerated accurately.

【0007】請求項5の発明は、前記表面処理後、電気
化学反応により生成された表面処理流体中の酸素と水素
とを燃焼して水を生成し、該水を分離または除去した前
記表面処理流体を前記循環経路に循環し、前記酸素と水
素を安全かつ容易に除去し、酸素と水素並びに水の混入
による弊害を未然に防止するとともに、表面処理流体に
よる乾燥を円滑かつ能率良く行なうようにしている。請
求項6の発明は、前記反応槽に前記表面処理流体と酸洗
い溶液または電解液を導入後、前記反応槽の給排路を遮
断し、被処理物の酸洗いまたは電気化学反応させて、酸
洗い溶液や電解液の移動とその循環経路への流入を防止
し、酸洗いや電気化学反応を安定して行なえるととも
に、循環経路の腐食やシステムのトラブルを未然に防止
するようにしている。
According to a fifth aspect of the present invention, after the surface treatment, oxygen and hydrogen in a surface treatment fluid generated by an electrochemical reaction are burned to generate water, and the water is separated or removed. A fluid is circulated in the circulation path to safely and easily remove the oxygen and hydrogen, prevent the harmful effects caused by the mixing of oxygen, hydrogen and water, and to perform the drying by the surface treatment fluid smoothly and efficiently. ing. According to a sixth aspect of the present invention, after introducing the surface treatment fluid and a pickling solution or an electrolytic solution into the reaction tank, the supply / discharge path of the reaction tank is blocked, and the object to be treated is pickled or electrochemically reacted. The movement of the pickling solution or electrolyte and its inflow into the circulation route are prevented, so that the pickling and electrochemical reaction can be performed stably, and the corrosion of the circulation route and system troubles are prevented. .

【0008】請求項7の発明は、前記被処理物の酸洗い
または電気化学反応後、前記反応槽内の前記表面処理流
体を前記循環経路へ循環させるとともに、前記酸洗い溶
液または電解液を前記表面処理流体の循環経路から分離
させ、表面処理流体と酸洗い溶液、電解液等を分けて処
理し、それらを合理的かつ安全に処理し、それらの再生
を図るようにしている、請求項8の発明は、前記被処理
物の酸洗いまたは電気化学反応後、その酸洗い溶液また
は電解液中の前記表面処理流体を分離し、これを表面処
理流体の循環経路へ還流させて、酸洗い時または電気化
学反応時、酸洗い溶液や電解液に混入した表面処理流体
の有効利用を図るようにしている。
According to a seventh aspect of the present invention, after the object to be treated is pickled or electrochemically reacted, the surface treatment fluid in the reaction tank is circulated to the circulation path, and the pickling solution or the electrolytic solution is added. 9. The surface treatment fluid is separated from the circulation path, the surface treatment fluid and the pickling solution, the electrolytic solution, etc. are separately treated, and these are treated reasonably and safely to regenerate them. In the invention, after pickling or electrochemical reaction of the object to be treated, the surface treatment fluid in the pickling solution or the electrolytic solution is separated, and this is refluxed to the circulation path of the surface treatment fluid, Alternatively, during the electrochemical reaction, the surface treatment fluid mixed in the pickling solution or the electrolytic solution is effectively used.

【0009】請求項9の発明は、前記表面処理流体が、
大気圧以上の加圧流体または超臨界若しくは亜臨界流体
であり、大気圧以上の加圧流体の場合は、表面処理流体
の入手が容易で、システムを安価かつ安全に製作並びに
運転でき、また超臨界若しくは亜臨界流体の場合は、高
い拡散性によって良好な表面処理状態を得られるように
している。
According to a ninth aspect of the present invention, the surface treatment fluid comprises:
For pressurized fluids above atmospheric pressure or supercritical or subcritical fluids, in the case of pressurized fluids above atmospheric pressure, surface treatment fluids are easily available, and the system can be manufactured and operated inexpensively and safely. In the case of a critical or subcritical fluid, a high surface diffusivity allows a good surface treatment state to be obtained.

【0010】請求項10の発明は、内部に被処理物を収
容し、かつ表面処理流体を導入可能な密閉可能な反応槽
と、該反応槽から被処理物の表面処理後の表面処理流体
を移送され、かつこの表面処理流体中の汚染物を分離可
能な分離槽とを備え、前記汚染物を分離した表面処理流
体を前記反応槽へ循環可能にした被処理物の表面処理装
置において、前記被処理物の表面処理時、前記反応槽を
含む表面処理流体の循環経路を連通し、該循環経路に前
記表面処理流体を終始循環可能にし、反応槽に表面処理
流体を滞留させて表面処理する方法に比べ、表面処理流
体による被処理物の表面処理、例えば脱脂、洗浄、乾燥
を高精度かつ速やかに行なえるとともに、被処理物と大
気との接触を回避し、被処理物表面の活性処理を高精度
かつ確実に行なえ、例えば金属イオンの良好な析出を得
られ、電気メッキや多層の重ねメッキに好適にしてい
る。しかも、使用後の表面処理流体や処理液を貯留する
貯留槽を実質的に廃し、設備のコンパクト化と低廉化を
図れるとともに、表面処理流体の再生を迅速に行なうよ
うにしている。
According to a tenth aspect of the present invention, there is provided a sealable reaction tank for accommodating an object to be treated and introducing a surface treatment fluid, and a surface treatment fluid after the surface treatment of the object to be treated from the reaction vessel. A surface treatment apparatus for a processing object, comprising: a separation tank that is transferred and is capable of separating contaminants in the surface treatment fluid, wherein the surface treatment fluid from which the contaminants have been separated can be circulated to the reaction tank. During the surface treatment of the object to be treated, a circulation path of the surface treatment fluid including the reaction tank is communicated, the surface treatment fluid can be circulated throughout the circulation path, and the surface treatment fluid is retained in the reaction tank for surface treatment. Compared with the method, the surface treatment of the object to be treated with the surface treatment fluid, such as degreasing, cleaning, and drying, can be performed with high accuracy and speed, and the contact between the object and the atmosphere is avoided, and the surface treatment of the object is activated. With high accuracy and certainty For example obtained good deposition of the metal ions, and preferably in the electroplating or multilayer lap plating. In addition, the storage tank for storing the surface treatment fluid and the treatment liquid after use is substantially abolished, the equipment can be made compact and the cost can be reduced, and the surface treatment fluid can be quickly regenerated.

【0011】請求項11の発明は、被処理物の脱脂また
は洗浄またはその乾燥時、前記表面処理流体を終始循環
可能にし、被処理物の脱脂または洗浄またはその乾燥等
の表面活性処理を高精度かつ速やかに行なえる。請求項
12の発明は、表面処理流体中の電気化学反応により生
成された気体を分離または除去可能にし、前記気体の系
内への混入を防止し、被処理物に対する良好な電気化学
反応を得られるとともに、前記表面処理流体の再生を精
度良く行なえるようにしている。請求項13の発明は、
前記循環経路に、表面処理流体中の酸素と水素を分離ま
たは除去可能な反応器を介挿し、酸素と水素の系内への
混入とその弊害を未然に防止し、表面処理流体の再生を
精度良く行なえるようにしている。
In the eleventh aspect of the present invention, when the object to be treated is degreased or washed or dried, the surface treatment fluid can be circulated all the time, and surface activation treatment such as degreasing or washing or drying the object to be treated can be performed with high accuracy. And it can be done quickly. The invention of claim 12 makes it possible to separate or remove the gas generated by the electrochemical reaction in the surface treatment fluid, prevent the gas from entering the system, and obtain a good electrochemical reaction with respect to the object to be treated. At the same time, the surface treatment fluid can be regenerated accurately. The invention of claim 13 is
A reactor that can separate or remove oxygen and hydrogen in the surface treatment fluid is inserted in the circulation path to prevent oxygen and hydrogen from entering the system and their adverse effects, and to accurately reproduce the surface treatment fluid. I try to do well.

【0012】請求項14の発明は、前記循環経路の反応
器の下流側に水を分離可能な脱水装置を介挿し、酸素と
水素を安全かつ容易に除去し、酸素と水素並びに水の混
入による弊害を未然に防止するとともに、表面処理流体
による乾燥を円滑かつ能率良く行なえるようにしてい
る。請求項15の発明は、前記反応槽に前記表面処理流
体と酸洗い溶液または電解液を導入可能に設け、これら
を前記反応槽に導入後、該反応槽の給排路を遮断可能に
設け、酸洗い溶液や電解液の移動とその循環経路への流
入を防止し、酸洗いや電気化学反応を安定して行なえる
とともに、循環経路の腐食やシステムのトラブルを未然
に防止するようにしている。
According to a fourteenth aspect of the present invention, a dehydrator capable of separating water is inserted downstream of the reactor in the circulation path to safely and easily remove oxygen and hydrogen, and to mix oxygen, hydrogen and water. This prevents harmful effects and allows the surface treatment fluid to dry smoothly and efficiently. According to a fifteenth aspect of the present invention, the surface treatment fluid and a pickling solution or an electrolytic solution are provided in the reaction tank so that the supply and discharge paths of the reaction tank can be shut off after they are introduced into the reaction tank. The movement of the pickling solution or electrolyte and its inflow into the circulation route are prevented, so that the pickling and electrochemical reaction can be performed stably, and the corrosion of the circulation route and system troubles are prevented. .

【0013】請求項16の発明は、前記被処理物の酸洗
いまたは電気化学反応後、前記反応槽内の前記表面処理
流体を前記循環経路へ循環可能に設け、かつ前記酸洗い
溶液または電解液を前記表面処理流体の循環経路から分
離可能にして、表面処理流体と、酸洗い溶液、電解液と
を分けて処理し、それらを合理的かつ安全に処理し、そ
れらの再生を図るようにしている。請求項17の発明
は、前記反応槽の排出路に、酸洗い溶液または電解液中
の表面処理流体を分離可能な処理液回収槽を介挿し、該
回収槽を前記表面処理流体の循環経路に連通し、酸洗い
時または電気化学反応時、酸洗い溶液や電解液に混入し
た表面処理流体の有効利用を図るようにしている。
According to a sixteenth aspect of the present invention, after the object to be treated is pickled or electrochemically reacted, the surface treatment fluid in the reaction tank is circulated to the circulation path, and the pickling solution or electrolytic solution is provided. Is separated from the circulation path of the surface treatment fluid, the surface treatment fluid, the pickling solution, and the electrolytic solution are separately treated, and they are treated reasonably and safely so that they can be regenerated. There is. In the invention of claim 17, a treatment liquid recovery tank capable of separating the surface treatment fluid in the pickling solution or the electrolytic solution is inserted in the discharge passage of the reaction tank, and the collection tank is provided in the circulation passage of the surface treatment fluid. It is designed to make effective use of the surface treatment fluid mixed with the pickling solution or the electrolytic solution during communication, pickling or electrochemical reaction.

【0014】請求項18の発明は、前記表面処理流体
が、大気圧以上の加圧流体または超臨界若しくは亜臨界
流体であり、大気圧以上の加圧流体の場合は、表面処理
流体の入手が容易で、システムを安価かつ安全に製作並
びに運転でき、また超臨界若しくは亜臨界流体の場合
は、高い拡散性によって良好な表面処理状態を得られる
ようにしている。請求項19の発明は、前記反応槽を複
数設け、これらの反応槽を前記循環経路に連通し、前記
反応槽に大気圧以上の加圧流体または超臨界若しくは亜
臨界流体と、酸洗い溶液または電解液とを順次導入し、
各反応槽で被処理物の脱脂洗浄と、酸洗いと、乾燥と、
電気メッキ、乾燥とを順次実行可能にする一方、相隣接
する反応槽を連通し、使用流体を給排可能にするととも
に、相前後する工程を処理する反応槽において、先行反
応槽の処理後、その使用流体を後行の反応槽に供給可能
にし、使用表面処理流体や使用酸溶液等を各反応槽で順
次使用することで、その有効利用を図るとともに、被処
理物の表面処理や各処理工程を合理的に行なえ、その量
産化を図るようにしている。
According to the eighteenth aspect of the present invention, the surface treatment fluid is a pressurized fluid at atmospheric pressure or higher or a supercritical or subcritical fluid. When the pressurized fluid at atmospheric pressure or higher, the surface treatment fluid is not available. It is easy, the system can be manufactured and operated inexpensively and safely, and in the case of supercritical or subcritical fluids, high diffusivity enables good surface treatment conditions to be obtained. In the invention of claim 19, a plurality of the reaction tanks are provided, the reaction tanks are connected to the circulation path, and a pressurized fluid or a supercritical or subcritical fluid at an atmospheric pressure or higher, and a pickling solution or Introducing the electrolytic solution and
In each reaction tank, degreasing and washing of the object to be treated, pickling, and drying,
While making it possible to sequentially perform electroplating and drying, the adjacent reaction tanks are communicated with each other so that the fluid used can be supplied and discharged, and in the reaction tank that processes the successive steps, after processing the preceding reaction tank, By making it possible to supply the used fluid to the subsequent reaction tank and using the used surface treatment fluid and the used acid solution etc. in each reaction tank one by one, it is possible to make effective use of it and also to treat the surface of the object to be treated and each treatment. The process is rationalized and the mass production is attempted.

【0015】請求項20の発明は、内部に被処理物を装
着可能な治具と撹拌手段とを収容し、かつ前記被処理物
の表面処理流体を給排可能な槽本体と、該槽本体を密閉
可能な蓋体とを備えた反応槽を有する被処理物の表面処
理装置において、前記蓋体に単一または複数の前記治具
を着脱可能に取り付け、蓋体と治具の一体化を促し、そ
れらの取り扱いの利便を図るとともに、治具および蓋体
並びに槽本体のメンテナンスを容易に行なえるようにし
ている。請求項21の発明は、前記蓋体と治具とを一体
に昇降可能に構成し、それらの槽本体への出し入れを容
易かつ速やかに行なえるようにしている。
According to a twentieth aspect of the present invention, there is provided a tank main body, which accommodates therein a jig capable of mounting an object to be processed and a stirring means and which can supply and discharge the surface treatment fluid of the object to be processed, and the tank main body. In a surface treatment apparatus for an object to be processed having a reaction tank having a lid capable of sealing a lid, a single or a plurality of the jigs are detachably attached to the lid, and the lid and the jig are integrated. In addition to facilitating the handling of them, the jig, lid, and tank body can be easily maintained. In the twenty-first aspect of the invention, the lid and the jig are configured to be able to move up and down integrally, so that they can be easily put in and taken out from the tank body.

【0016】請求項22の発明は、前記槽本体のチャン
バの横断面形状と、前記治具の横断面形状とを互いに相
似形状に形成し、かつこれらを同心状に配置して、槽本
体と治具の製作の合理化とコンパクト化を図るととも
に、多数の被処理物を効率良く収容かつ処理可能にし、
その量産化を図るようにしている。請求項23の発明
は、前記槽本体のチャンバの横断面形状と、前記治具の
横断面形状とを円形に形成し、かつこれらを同心円状に
配置して、多数の被処理物を効率良く収容かつ処理可能
にし、その量産化を図るとともに、表面処理流体や使用
溶液等の撹拌を精度良く行なえるようにしている。請求
項24の発明は、前記治具を複数に区画し、それらを回
動可能に連結して、治具の開閉を容易に行なえ、治具に
対する被処理物の着脱を簡便に行なえるようにしてい
る。
According to a twenty-second aspect of the present invention, the cross-sectional shape of the chamber of the tank main body and the cross-sectional shape of the jig are formed in similar shapes to each other, and these are arranged concentrically to form a tank main body. In addition to streamlining and downsizing the jig manufacturing, it is possible to efficiently accommodate and process a large number of objects.
We are trying to mass-produce it. According to a twenty-third aspect of the present invention, the cross-sectional shape of the chamber of the tank body and the cross-sectional shape of the jig are formed in a circular shape, and these are arranged concentrically so that a large number of workpieces can be efficiently processed. It can be stored and processed, and its mass production is achieved, and the surface treatment fluid and the used solution can be stirred accurately. According to a twenty-fourth aspect of the present invention, the jig is divided into a plurality of pieces, and the jigs are rotatably connected to each other so that the jig can be easily opened and closed, and an object to be processed can be easily attached to and detached from the jig. ing.

【0017】請求項25の発明は、前記蓋体に前記治具
を通電可能な電極を取り付け、蓋体と治具と電極の一体
化を促し、それらの取り扱いの利便とメンテナンスの容
易化を図るようにしている。請求項26の発明は、相隣
接して配置した治具間に同電位を印加し、各治具に装着
した被処理物に対し、電気メッキ等の電気化学反応の一
様化を図り、各被処理物に対し均一な電気メッキ等の電
気化学反応を得られるようにしている。
According to a twenty-fifth aspect of the present invention, an electrode capable of energizing the jig is attached to the lid body to promote integration of the lid body, the jig and the electrode, thereby facilitating the convenience of handling them and facilitating maintenance. I am trying. According to a twenty-sixth aspect of the present invention, the same electric potential is applied between the jigs arranged adjacent to each other, and the electrochemical reaction such as electroplating is made uniform with respect to the processing object mounted on each jig. A uniform electrochemical reaction such as electroplating can be obtained on the object to be processed.

【0018】請求項27の発明は、前記チャンバの中心
に電極を配置し、各治具の電界強度を一様に設定し、該
治具に装着した被処理物に対し、均一な電気メッキ等の
電気化学反応を得られるようにしている。請求項28の
発明は、前記蓋体の中心に前記撹拌手段を回転可能な撹
拌軸を取り付け、該撹拌軸の外側に前記電極を同軸状に
配置し、蓋体と治具と電極と撹拌手段の一体化を促し、
それらの取り扱いの利便とメンテナンスの容易化を図る
ようにしている。
According to a twenty-seventh aspect of the present invention, an electrode is arranged at the center of the chamber, the electric field strength of each jig is set uniformly, and uniform electroplating or the like is applied to an object to be processed mounted on the jig. The electrochemical reaction of can be obtained. According to a twenty-eighth aspect of the present invention, a stirring shaft capable of rotating the stirring means is attached to the center of the lid body, the electrode is coaxially arranged outside the stirring shaft, and the lid body, the jig, the electrode, and the stirring means. Promote the integration of
We are trying to make them easier to handle and easier to handle.

【0019】請求項29の発明は、前記反応槽に大気圧
以上の加圧流体または超臨界若しくは亜臨界流体と、酸
洗い溶液と、電解液とを順次導入し、被処理物の脱脂洗
浄と、酸洗いと、乾燥と、電気メッキとを順次実行可能
にし、相隣接する反応槽を連通し、使用流体を給排可能
にするとともに、相前後する工程を処理する反応槽にお
いて、先行反応槽の処理後、その使用流体を後行の反応
槽に供給可能にし、使用表面処理流体や使用酸溶液等を
各反応槽で順次使用することで、その有効利用を図ると
ともに、被処理物の表面処理や各処理工程を合理的に行
なえ、その量産化を図るようにしている。請求項30の
発明は、前記電極を不溶性部材で構成するとともに、前
記反応槽に超臨界若しくは亜臨界流体と、電解液とを導
入し、被処理物を電気化学反応可能にして、高い拡散性
を有する超臨界若しくは亜臨界流体の下で、被処理物に
対する金属イオンの析出を良好かつ一様に行なえるとと
もに、電極の減耗を解消し、電極の取り換え等による中
断がなく、前記電気化学反応の生産性を向上するように
している。
In a twenty-ninth aspect of the present invention, a pressurized fluid having a pressure equal to or higher than atmospheric pressure or a supercritical or subcritical fluid, an acid pickling solution, and an electrolytic solution are sequentially introduced into the reaction tank to degrease and wash the object to be treated. , Pickling, drying, and electroplating can be sequentially performed, adjacent reaction tanks can be connected to each other to supply and discharge a fluid to be used, and a preceding reaction tank for processing successive steps After the treatment, the fluid to be used can be supplied to the subsequent reaction tanks, and the surface treatment fluid to be used and the acid solution to be used are sequentially used in each reaction tank to effectively utilize the surface treatment object surface. The treatment and each treatment process can be performed rationally, and the mass production is attempted. According to a thirtieth aspect of the present invention, the electrode is composed of an insoluble member, and a supercritical or subcritical fluid and an electrolytic solution are introduced into the reaction tank to allow an electrochemical reaction of an object to be processed, thereby having high diffusivity. In the presence of a supercritical or subcritical fluid having the above, the deposition of metal ions on the object to be processed can be performed satisfactorily and uniformly, wear of the electrode is eliminated, and there is no interruption due to replacement of the electrode, and the electrochemical reaction Is trying to improve productivity.

【0020】[0020]

【発明の実施の形態】以下、本発明を超臨界または亜臨
界流体を利用して電気化学的処理法である電気メッキ
(ニッケルメッキ)に適用した図示の実施形態について
説明すると、図1乃至図9において1は作業室に設置し
た箱状の処理装置で、その前面の中高位置に扉2が開閉
可能に設けられ、該扉2に臨む処理室3内の下部に耐圧
性の反応槽4が設けられている。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, a preferred embodiment in which the present invention is applied to electroplating (nickel plating) which is an electrochemical treatment method using a supercritical or subcritical fluid will be described with reference to FIGS. In FIG. 9, reference numeral 1 denotes a box-shaped processing apparatus installed in a working chamber, in which a door 2 is provided at a middle height position on the front surface thereof so as to be openable and closable, and a pressure resistant reaction tank 4 is provided at a lower part of the processing chamber 3 facing the door 2. It is provided.

【0021】前記反応槽4は上向きに開口され、その内
部のチャンバに被メッキ物等を着脱可能に装着可能な、
いわゆるメッキ用の治具である被処理物収納容器5と、
電極等を収容し、これを蓋体6で密閉し、更に後述のク
ランプリングを介して蓋体6をロックし、作業終了後、
それらを一体に取り出し可能にしている。
The reaction tank 4 is opened upward, and an object to be plated or the like can be removably mounted in a chamber inside thereof.
An object storage container 5 which is a so-called plating jig,
After accommodating the electrodes and the like, sealing this with a lid 6, and further locking the lid 6 via a clamp ring described later, after the work is completed,
It is possible to take them out together.

【0022】前記反応槽4の直下に、異種のメッキ液を
収容可能な第1および第2処理液槽7,8とが並設さ
れ、それらの溶液を送液ポンプ9,10を介して、反応
槽4へ選択的に供給可能にしている。前記反応槽4の後
方直下に分離槽である耐圧性の処理液回収槽11が設け
られ、該処理液回収槽11は前記反応槽4と略同一の容
積と耐圧能力を備え、前記反応槽4内の処理後の処理液
を重力作用によって流下し、これを加熱して、二酸化炭
素と処理液を分離可能にしている。
Immediately below the reaction tank 4, first and second processing liquid tanks 7 and 8 capable of accommodating different kinds of plating liquids are arranged in parallel, and these solutions are supplied via liquid transfer pumps 9 and 10. It can be selectively supplied to the reaction tank 4. A pressure resistant processing liquid recovery tank 11 which is a separation tank is provided immediately below the reaction tank 4 and the processing liquid recovery tank 11 has substantially the same volume and pressure resistance as the reaction tank 4. The treatment liquid after the treatment inside is flowed down by the action of gravity, and this is heated so that the carbon dioxide and the treatment liquid can be separated.

【0023】前記反応槽4と処理液回収槽11とを処理
液排出管12で接続し、該管12に処理液排出弁13を
介挿している。前記排出弁13は反応槽4への超臨海ま
たは亜臨界流体導入時と、反応槽4での脱脂洗浄および
乾燥時に開弁され、一方、反応槽4での酸洗いとメッキ
処理時に閉弁可能にされている。前記反応槽4の下流側
に耐圧性の分離槽14が設けられ、該分離槽14は前記
処理液回収槽11と同形かつ同様に構成されていて、そ
の減圧かつ加熱作用を介して、処理ガス中の油脂分を分
離し除去可能にしている。
The reaction tank 4 and the processing liquid recovery tank 11 are connected by a processing liquid discharge pipe 12, and a processing liquid discharge valve 13 is inserted in the pipe 12. The discharge valve 13 can be opened when supercritical water or subcritical fluid is introduced into the reaction tank 4 and during degreasing cleaning and drying in the reaction tank 4, while it can be closed during pickling and plating treatment in the reaction tank 4. Has been A pressure-resistant separation tank 14 is provided on the downstream side of the reaction tank 4, and the separation tank 14 has the same shape and the same configuration as the processing liquid recovery tank 11. The oil and fat inside can be separated and removed.

【0024】この他、図中15は酸化被膜除去用の酸洗
い溶液を収容可能な酸洗い溶液収納タンクで、該酸洗い
溶液を反応槽4へ供給可能にしており、16は前記送液
ポンプ9,10と並設した加圧ポンプで、表面処理流体
として超臨界または亜臨界生成流体である二酸化炭素を
密度0.4以上に加圧し、二酸化炭素を液状若しくは気
体状または超臨界若しくは亜臨界状態に加圧可能にして
いる。
In addition, reference numeral 15 in the drawing denotes a pickling solution storage tank capable of containing a pickling solution for removing an oxide film, which can supply the pickling solution to the reaction tank 4, and 16 is the liquid feed pump. A pressure pump installed in parallel with 9, 10 pressurizes carbon dioxide, which is a supercritical or subcritical generation fluid, as a surface treatment fluid to a density of 0.4 or more, and liquid carbon dioxide is liquid or gaseous or supercritical or subcritical It is possible to pressurize to the state.

【0025】図中、17は処理装置1内の後部に設けた
凝縮回収槽で、冷媒導管を介して直下の冷凍機18に連
絡し、該槽17に導入した超臨界または亜臨界生成流体
である二酸化炭素を冷却し液化可能にしている。この
他、19は種々の電気機器を内蔵した制御盤、20は整
流器、21はリレ−ボックス、22はトランス、23は
油槽、24は脱水装置である脱水カラムである。
In the figure, 17 is a condensing and collecting tank provided in the rear part of the processing apparatus 1, which is a supercritical or subcritical product fluid which is connected to the refrigerator 18 immediately below through a refrigerant conduit and is introduced into the tank 17. A certain carbon dioxide is cooled so that it can be liquefied. In addition, 19 is a control panel incorporating various electric devices, 20 is a rectifier, 21 is a relay box, 22 is a transformer, 23 is an oil tank, and 24 is a dehydration column which is a dehydrator.

【0026】前記反応槽4は図6乃至図8のように、有
底筒状の槽本体25と、該本体26の開口部を閉塞する
蓋体6と、該蓋体6の閉塞状態を保持するクランプリン
グ27とを備え、これらは肉厚のステンレス鋼で構成さ
れ、その周面を塩化ビニ−ルや硬質ゴムでライニングし
て絶縁している。前記槽本体25の上部外周面に縮径状
のクランプシ−ル部28が設けられ、該シ−ル部28の
中高部周面に舌片状の複数のクランプ爪29が形成され
ている。
As shown in FIGS. 6 to 8, the reaction tank 4 has a bottomed cylindrical tank body 25, a lid 6 for closing the opening of the body 26, and a closed state of the lid 6. And a clamp ring 27 which is made of thick-walled stainless steel, and its peripheral surface is lined with vinyl chloride or hard rubber for insulation. A reduced diameter clamp seal portion 28 is provided on the outer peripheral surface of the upper portion of the tank body 25, and a plurality of tongue-shaped clamp claws 29 are formed on the peripheral surface of the middle portion of the seal portion 28.

【0027】前記クランプリング27は、前記クランプ
シ−ル部28に回動可能に取り付けられ、その内周面の
中高部に前記係合爪29と係合可能なリング状の係止部
30を形成し、該係止部30の上下に環状溝31,32
を形成している。このうち、前記環状溝31に前記クラ
ンプ爪29が係合し、該溝31の直下に舌片状の複数の
クランプ爪33が形成され、該クランプ爪33を前記ク
ランプ爪29に係合可能にしている。
The clamp ring 27 is rotatably attached to the clamp seal portion 28, and a ring-shaped engaging portion 30 engageable with the engaging claw 29 is formed in the middle height portion of the inner peripheral surface thereof. Then, the annular grooves 31, 32 are provided above and below the locking portion 30.
Is formed. Of these, the clamp claw 29 is engaged with the annular groove 31, and a plurality of tongue-shaped clamp claws 33 are formed immediately below the groove 31, so that the clamp claw 33 can be engaged with the clamp claw 29. ing.

【0028】前記環状溝32に後述する蓋6のクランプ
爪が係合し、前記環状溝32の直上に舌片状の複数のク
ランプ爪34が形成され、該クランプ爪34を前記蓋6
のクランプ爪に係合可能にしている。前記蓋体6は大小
複数段の円板状に形成され、その最大径部周面に複数の
クランプ爪35が形成され、該クランプ爪35が前記ク
ランプ爪34と係脱可能にされていて、蓋体6を着脱可
能にしている。
A clamp claw of the lid 6 described later engages with the annular groove 32, and a plurality of tongue-shaped clamp claws 34 are formed immediately above the annular groove 32.
It can be engaged with the clamp claw. The lid body 6 is formed in a disc shape of large and small stages, and a plurality of clamp claws 35 are formed on the circumferential surface of the maximum diameter part thereof, and the clamp claws 35 are detachable from the clamp claws 34. The lid 6 is removable.

【0029】前記蓋体6の下部に前記反応槽4のチャン
バ36と嵌合可能な略円板状のボス部37が突設され、
該ボス部37の周面に複数のネジ孔38が形成され、該
ネジ孔38にボルト39またはビスをねじ込んで、前記
被処理物収納容器5を着脱可能に取り付けている。
A substantially disk-shaped boss portion 37 that can be fitted into the chamber 36 of the reaction tank 4 is provided on the lower portion of the lid 6 in a protruding manner.
A plurality of screw holes 38 are formed on the peripheral surface of the boss portion 37, and bolts 39 or screws are screwed into the screw holes 38 to detachably mount the object storage container 5.

【0030】前記蓋6の中央部とその両側に大小異径の
貫通孔40,41が設けられ、このうち中央部の貫通孔
40に撹拌軸42が挿入され、該軸42の下端部にファ
ン43が取り付けられ、該軸42の上端部にモ−タ44
に連係するベルトプーリが設けられている。また、大径
側の前記貫通孔41,41に同様な電極棒45,46が
挿入され、これらに正電位と負電位が印加されている。
Through holes 40 and 41 of different sizes are provided in the central portion of the lid 6 and on both sides thereof, and a stirring shaft 42 is inserted into the through hole 40 in the central portion, and a fan is provided at the lower end portion of the shaft 42. 43 is attached, and a motor 44 is attached to the upper end of the shaft 42.
Is provided with a belt pulley. Further, similar electrode rods 45, 46 are inserted into the through holes 41, 41 on the large diameter side, and a positive potential and a negative potential are applied to them.

【0031】このうち、正電位を印加する電極棒45の
下端部にカ−ボン等の導電部材47の一端が取り付けら
れ、この他端が撹拌軸42の周面に装着した電極管48
に通電可能に接続されている。前記電極管48は、カ−
ボンやフェライト等の不溶性電極部材で構成され、電解
溶液に晒され、かつ電界内に置かれても溶出不可能にさ
れている。また、負電位を印加した電極棒46の下端部
にカ−ボン等の導電部材(図示略)の一端が取り付けら
れ、この他端が前記被処理物収納容器5の上端部に通電
可能に接続されている。
Of these, one end of a conductive member 47 such as carbon is attached to the lower end of the electrode rod 45 for applying a positive potential, and the other end is an electrode tube 48 mounted on the peripheral surface of the stirring shaft 42.
Is connected so that it can be energized. The electrode tube 48 is
It is composed of an insoluble electrode member such as bon or ferrite, is exposed to an electrolytic solution, and cannot be eluted even when placed in an electric field. Further, one end of a conductive member (not shown) such as a carbon is attached to the lower end of the electrode rod 46 to which a negative potential is applied, and the other end is connected to the upper end of the object-to-be-processed container 5 so as to be energized. Has been done.

【0032】図中、49は被処理物収納容器5を構成す
る導電性の枠体で、被処理物を掛け止め若しくはクリッ
プ可能にしている。50〜53は前記槽本体25の外面
に開口したポ−トで、チャンバ36に連通し、所定の導
管を接続されている。
In the figure, reference numeral 49 denotes a conductive frame which constitutes the object-to-be-processed container 5, and allows the object to be processed to be hooked or clipped. Numerals 50 to 53 are ports open to the outer surface of the tank body 25, which communicate with the chamber 36 and are connected to predetermined conduits.

【0033】図5は本発明装置の概要を示し、図中54
は超臨界若しくは亜臨界形成流体である二酸化炭素を液
化して収容したガスボンベで、該二酸化炭素を開閉弁5
5および導管56を経て、凝縮回収槽17および後述の
ク−ラ−を介し、加熱器57へ導入可能にしている。前
記加熱器57はヒ−タと撹拌器を備え、前記二酸化炭素
を超臨界または亜臨界状態に形成可能な温度に加熱し、
これを導管58および導入弁59を介して反応槽4へ供
給可能にしている。
FIG. 5 shows an outline of the device of the present invention, which is denoted by 54 in the figure.
Is a gas cylinder containing liquefied and stored carbon dioxide which is a supercritical or subcritical forming fluid.
5 and the conduit 56, and can be introduced into the heater 57 via the condensation recovery tank 17 and a cooler described later. The heater 57 includes a heater and a stirrer, and heats the carbon dioxide to a temperature capable of forming a supercritical or subcritical state,
This can be supplied to the reaction tank 4 via the conduit 58 and the introduction valve 59.

【0034】前記反応槽4に、第1および第2処理槽
7,8に連通する給液導管60,61が接続され、これ
らの給液導管60,61に給液弁62,63が介挿され
ているなお、第1および第2処理槽7,8 にはヒ−タ
と攪拌器が装備されている。
Liquid supply conduits 60, 61 communicating with the first and second processing tanks 7, 8 are connected to the reaction tank 4, and liquid supply valves 62, 63 are inserted into these liquid supply conduits 60, 61. The first and second processing tanks 7 and 8 are equipped with a heater and a stirrer.

【0035】前記反応槽4の上部に、分離槽14に連通
するガス回収管64が接続され、該管64にガス回収弁
65と調圧弁66が介挿されている。前記ガス回収弁6
5は、脱脂洗浄工程および乾燥工程の際に開弁され、酸
洗い工程とメッキ処理工程時に閉弁可能にされている。
また、前記調圧弁66は、該弁66よろ下流側の管路、
つまり処理ガス導管64の圧力を低圧、実施形態では6
MPaに設定可能にしている。
A gas recovery pipe 64 communicating with the separation tank 14 is connected to the upper portion of the reaction tank 4, and a gas recovery valve 65 and a pressure regulating valve 66 are inserted in the pipe 64. The gas recovery valve 6
The valve 5 is opened during the degreasing cleaning step and the drying step, and can be closed during the pickling step and the plating step.
Further, the pressure regulating valve 66 is a pipe line on the downstream side of the valve 66,
That is, the pressure of the processing gas conduit 64 is set to a low pressure, that is, 6 in the embodiment.
It can be set to MPa.

【0036】一方、前記処理液回収槽11の底部に外部
に連通する排出管67が接続され、該管67に排出弁6
8が介挿され、また前記排出管67の上流側に処理液回
収管69が接続されている。前記処理液回収管69は、
精製部を介して第1および第2処理液槽7,8に連通
し、該管69に調圧弁70と遮断弁71が介挿され、前
記調圧弁70によって処理液の圧力を略大気圧に調圧可
能にしている。
On the other hand, a discharge pipe 67 communicating with the outside is connected to the bottom of the treatment liquid recovery tank 11, and the discharge valve 6 is connected to the pipe 67.
8 is inserted, and a treatment liquid recovery pipe 69 is connected to the upstream side of the discharge pipe 67. The processing liquid recovery pipe 69 is
A pressure regulating valve 70 and a shutoff valve 71 are inserted in the pipe 69 so as to communicate with the first and second treatment liquid tanks 7 and 8 through a refining unit, and the pressure of the treatment liquid is made substantially atmospheric by the pressure regulating valve 70. The pressure can be adjusted.

【0037】前記処理液回収槽11の上部にバイパス管
72の一端が接続され、該管72の他端が前記ガス回収
管64の前記ガス回収弁65より上流側に接続され、該
管72に逆止弁を兼ね備える遮断弁73が介挿されてい
る。前記遮断弁73は、前記処理液回収槽11に排出し
た酸洗い溶液やメッキ液の処理過程で、分離した二酸化
炭素とバイパス管72へ導き、これをガス回収管64へ
移動可能にしている。図中、74,75,76は反応槽
4および処理液回収槽11、分離槽14に設けたヒ−タ
である。
One end of a bypass pipe 72 is connected to the upper portion of the processing liquid recovery tank 11, and the other end of the bypass pipe 72 is connected to the gas recovery pipe 64 upstream of the gas recovery valve 65. A shutoff valve 73 that also serves as a check valve is inserted. The shut-off valve 73 guides the separated carbon dioxide and the bypass pipe 72 to the gas recovery pipe 64 in the process of treating the pickling solution and the plating liquid discharged into the treatment liquid recovery tank 11. In the figure, reference numerals 74, 75 and 76 denote heaters provided in the reaction tank 4, the treatment liquid recovery tank 11 and the separation tank 14.

【0038】前記ガス回収管64に分離槽14と反応器
78とが介挿され、このうち反応器78は、分離槽14
の下流側に配置されている。前記反応器78は、略筒状
の容器に鉄とクロムとアルミニウムの金属を基体組成と
する触媒を内蔵し、該触媒に処理ガスを通過させて接触
させ、反応槽4での酸洗いやメッキ処理過程で発生した
水素と酸素を燃焼して水を生成し、水素と酸素を除去す
るとともに、前記生成した水を前記脱水カラム24,2
4に吸収可能にしている。
The separation tank 14 and the reactor 78 are inserted in the gas recovery pipe 64, of which the reactor 78 is the separation tank 14
It is located on the downstream side of. The reactor 78 contains a catalyst having a base composition of metals of iron, chromium and aluminum in a substantially cylindrical container, and passes a treatment gas through the catalyst to bring it into contact with the catalyst to perform pickling or plating in the reaction tank 4. Hydrogen and oxygen generated in the treatment process are burned to generate water, and hydrogen and oxygen are removed, and the generated water is removed from the dehydration columns 24 and 2.
It is possible to absorb in 4.

【0039】前記脱水カラム24,24の下流側にリタ
−ンパイプ79の一端が接続され、その他端が凝縮回収
槽入口弁80を介して凝縮回収槽17に接続され、未使
用および再生二酸化炭素を冷却液化可能にしている。前
記凝縮回収槽17の出口に注入管81の一端が接続さ
れ、この他端が前記導管56の中流部に接続されてい
る。前記注入管81にク−ラ−82と加圧ポンプ16と
が介挿され、前記凝縮回収槽17から流出した気液混合
の二酸化炭素を確実に液化し、これを加圧して加熱器5
7へ供給可能にしている。
One end of the return pipe 79 is connected to the downstream side of the dehydration columns 24, 24, and the other end thereof is connected to the condensation recovery tank 17 via the condensation recovery tank inlet valve 80 to collect unused and regenerated carbon dioxide. Can be cooled and liquefied. One end of the injection pipe 81 is connected to the outlet of the condensing and collecting tank 17, and the other end is connected to the midstream portion of the conduit 56. A cooler 82 and a pressurizing pump 16 are inserted in the injection pipe 81 to surely liquefy the carbon dioxide in the gas-liquid mixture flowing out from the condensing and collecting tank 17 and pressurize the carbon dioxide.
It is possible to supply to 7.

【0040】図中、83は前記注入管81の上流側に介
挿した凝縮回収槽出口弁、84はク−ラ−82に配管し
た冷媒導管で、前記冷凍機18に導通している。85は
前記反応器78と脱水カラム24との間に介挿した調圧
弁で、該弁77より下流側の管路を低圧に設定可能にし
ている。
In the drawing, 83 is a condensation recovery tank outlet valve inserted upstream of the injection pipe 81, and 84 is a refrigerant conduit piped to the cooler 82, which is in communication with the refrigerator 18. Reference numeral 85 is a pressure regulating valve inserted between the reactor 78 and the dehydration column 24, and can set a low pressure in a pipe line downstream of the valve 77.

【0041】このように構成した表面処理装置は、後述
のようにメッキ前処理、つまり脱脂、酸洗い、洗浄、乾
燥の各処理、メッキ処理、メッキ後処理、つまり被処理
物4の回収、乾燥の多工程を単一の反応槽4で行ってい
るから、各処理毎に専用の浴槽を要する従来のメッキ処
理法および設備に比べて、構成が簡単で設置スペ−スが
コンパクトになり、設備費の低減を図れる。しかも、使
用後の二酸化炭素や処理液を一次的に収容する貯留槽を
実質的に廃したから、その分設備のコンパクト化と低廉
化を図れ、また処理液等の再生および循環を速やかに行
なえる。
The surface treatment apparatus thus constructed has a pre-plating treatment, that is, degreasing, pickling, washing, and drying treatments, a plating treatment, and a post-plating treatment, that is, recovery and drying of the object 4 as described later. Since the multi-step process is performed in a single reaction tank 4, the structure is simple and the installation space is compact compared to the conventional plating method and equipment that requires a dedicated bath for each processing. The cost can be reduced. Moreover, since the storage tank that temporarily stores the used carbon dioxide and the treatment liquid is virtually abolished, the equipment can be made compact and the cost can be reduced accordingly, and the regeneration and circulation of the treatment liquid can be performed quickly. It

【0042】また、本発明装置は、前記脱脂、酸洗い、
洗浄、乾燥、メッキ処理の各作業から排出する種々の排
出物、つまり二酸化炭素や酸洗い溶液、界面活性剤を含
むメッキ液を、気液に分けて処理液回収槽11と分離槽
14とに排出し、これらを再生するとともに、これらを
系外へ排出しないから、従来のような高価かつ大形の排
水および排気処理設備を要しない。しかも、使用後の酸
洗い溶液やメッキ液等を系外に排出せず、再生して使用
しているから、これらの消費を最小限に抑制し、メッキ
コストの低減を図れる。
In addition, the device of the present invention, the degreasing, pickling,
Various discharges from the cleaning, drying, and plating operations, that is, a plating solution containing carbon dioxide, a pickling solution, and a surfactant are divided into a gas and a liquid, and are divided into a processing solution recovery tank 11 and a separation tank 14. Since they are discharged and regenerated, and they are not discharged to the outside of the system, there is no need for expensive and large-sized waste water and exhaust treatment facilities as in the conventional case. Moreover, since the pickling solution and the plating solution after use are recycled without being discharged to the outside of the system, consumption of these can be suppressed to the minimum and the plating cost can be reduced.

【0043】更に、前記各処理は良好な拡散性を有する
超臨界または亜臨界二酸化炭素を利用して行なっている
から、メッキ液に被処理物を浸漬する従来のメッキ法に
比べて、酸溶液や電解質溶液の使用量が非常に少量で足
り、したがってそれらの使用量の節減と排出処理設備の
小形軽量化を図れ、前述と相俟って生産性を向上でき
る。
Further, since each of the above treatments is carried out using supercritical or subcritical carbon dioxide having good diffusibility, compared with the conventional plating method in which the object to be treated is immersed in the plating solution, the acid solution is used. A very small amount of the electrolyte solution and the electrolyte solution is sufficient. Therefore, it is possible to save the amount of the electrolyte solution and to reduce the size and weight of the emission treatment facility, and to improve the productivity in combination with the above.

【0044】一方、本発明装置は、被メッキ物の脱脂洗
浄工程と乾燥工程と再生工程(イオン供給を含む)時
に、導入管58、ガス導管64、連通管77、リタ−ン
パイプ79、注入管81等による閉回路を形成し、これ
らに未使用および再生二酸化炭素を循環させているか
ら、前記脱脂洗浄ないし乾燥工程と、その再生工程を一
時に合理的かつ迅速に行なえ、生産性が向上する。
On the other hand, in the apparatus of the present invention, the introduction pipe 58, the gas pipe 64, the communication pipe 77, the return pipe 79, and the injection pipe are used during the degreasing and washing process of the object to be plated, the drying process, and the regenerating process (including ion supply). Since a closed circuit of 81 etc. is formed and the unused and regenerated carbon dioxide is circulated through these, the degreasing washing or drying step and the regenerating step can be performed reasonably and quickly at a time, and the productivity is improved. .

【0045】しかも、反応槽4は後述のように、脱脂洗
浄工程、酸洗い工程、乾燥工程、メッキ処理工程の各工
程、特にメッキ処理前の各工程が完結するまで密閉し、
かつ超臨界または亜臨界流体を循環して、被メッキ物と
大気、とりわけ酸素との接触を回避させているから、被
メッキ物表面の活性化処理を確実かつ高精度に行なえ、
当該表面における金属イオンの析出を確実に行なえる。
したがって、被メッキ物に対する多層メッキを確実に実
現することができる。
Further, as described later, the reaction tank 4 is hermetically sealed until each step of the degreasing and washing step, the pickling step, the drying step and the plating treatment step, especially each step before the plating treatment is completed,
In addition, the supercritical or subcritical fluid is circulated to avoid contact between the object to be plated and the atmosphere, especially oxygen, so that the surface of the object to be plated can be activated reliably and accurately.
The metal ions can be reliably deposited on the surface.
Therefore, it is possible to surely realize the multi-layer plating on the object to be plated.

【0046】また、本発明装置は、ガス導管64、連通
管77、リタ−ンパイプ79、注入管81等による閉回
路を形成し、これらに未使用および再生二酸化炭素を循
環させているから、前記脱脂洗浄ないし乾燥工程と、そ
の再生工程を一時に合理的かつ迅速に行なえ、生産性が
向上する。
Further, in the apparatus of the present invention, a closed circuit is formed by the gas conduit 64, the communication pipe 77, the return pipe 79, the injection pipe 81, etc., and the unused and regenerated carbon dioxide is circulated in these circuits, The degreasing washing or drying process and the regenerating process can be performed reasonably and quickly at a time, and the productivity is improved.

【0047】更に、本発明装置は、被メッキ物の酸洗い
工程やメッキ工程時に、第1および第2処理液槽7,
8、導管60,61、処理液排出管12等による閉回路
を形成し、これらに未使用および再生酸洗い液やメッキ
液を供給可能にしているから、前記酸洗い工程やメッキ
工程と、その再生工程を合理的かつ迅速に行なえ、生産
性が向上するとともに、前記溶液の有効利用を図れる。
Further, the apparatus of the present invention is such that the first and second processing liquid tanks 7,
8, a closed circuit is formed by the conduits 60, 61, the processing liquid discharge pipe 12, etc., and unused and regenerated pickling liquid or plating liquid can be supplied to these, so that the above-mentioned pickling process or plating process, The regeneration process can be performed reasonably and quickly, the productivity is improved, and the solution can be effectively used.

【0048】一方、本発明装置は耐圧の3つの処理槽
4,11,14を要する。このうち、処理液回収槽11
と分離槽14は略同形同大で開閉かつ気密可能に構成さ
れ、適当な加熱装置を備えている。また、反応槽4は、
図6のように槽本体25と蓋体6とクランリング27を
有し、該クランリング27を適当なアクチュエ−タ(図
示略)介して、回動可能にしている。
On the other hand, the apparatus of the present invention requires three pressure-resistant processing tanks 4, 11 and 14. Of these, the processing liquid recovery tank 11
The separation tank 14 has substantially the same shape and size, is openable and airtight, and is equipped with an appropriate heating device. Further, the reaction tank 4 is
As shown in FIG. 6, it has a tank main body 25, a lid body 6 and a clan ring 27, and the clan ring 27 can be rotated through an appropriate actuator (not shown).

【0049】前記蓋体6は、適当なアクチュエ−タ(図
示略)介して上下に移動可能にされ、これにモ−タ44
に連係する撹拌軸42と、正負極の電極棒45,46
と、被処理物収納容器5を取り付け、前記一方の陽極側
の電極棒45に導電部材47の一端を接続し、この他端
を撹拌軸42の外周面に装着した電極管48に接続して
いる。したがって、これらと蓋体6とは一体に組み付け
られ、後述のようにチャンバ36からの出し入れを容易
かつ速やかに行なえるとともに、これらを反応槽4から
取り出せることで、これらと反応槽4のメンテナンスを
容易に行なえる。
The lid 6 is movable up and down through a suitable actuator (not shown), and the motor 44 is attached thereto.
Agitation shaft 42 that is connected to the positive and negative electrode rods 45, 46
Then, the object storage container 5 is attached, one end of the conductive member 47 is connected to the one electrode rod 45 on the anode side, and the other end is connected to the electrode tube 48 mounted on the outer peripheral surface of the stirring shaft 42. There is. Therefore, these and the lid 6 are integrally assembled, and as described later, they can be easily and promptly taken in and out of the chamber 36, and they can be taken out from the reaction tank 4, so that these and the reaction tank 4 can be maintained. Easy to do.

【0050】このような表面処理装置を使用して電気メ
ッキを行なう場合は、被処理物収納容器5の枠体49の
内側に、直接または適当なクリップを介して、被処理物
である被メッキ物を取り付ける。次に、前記収納容器5
の上端部周縁を、予め槽本体25から取り外して置いた
蓋体6のボス37の周面に、ボルト39を介して取り付
ける。その際、被処理物収納容器5の中央に、撹拌軸4
2とその周面に電極管48を位置付け、また一方の電極
棒45の下端に導電部材47の一端を取り付け、この他
端を前記電極管48に電気的に接続する。
When electroplating is carried out using such a surface treatment apparatus, the object to be plated, which is the object to be processed, is placed inside the frame 49 of the object-to-be-processed container 5 directly or through an appropriate clip. Attach an object. Next, the storage container 5
The peripheral edge of the upper end of the is attached to the peripheral surface of the boss 37 of the lid body 6 which has been removed from the tank body 25 in advance, through the bolt 39. At that time, the stirring shaft 4 is provided at the center of the object storage container 5.
2, the electrode tube 48 is positioned on the peripheral surface thereof, one end of the conductive member 47 is attached to the lower end of one electrode rod 45, and the other end is electrically connected to the electrode tube 48.

【0051】こうして、被処理物収納容器5に被メッキ
物を取り付け後、これらをアクチュエ−タで吊り上げて
槽本体25の直上に移動し、これを吊り降して、被処理
物収納容器5等をチャンバ36内に収容するとともに、
蓋体6を槽本体25の開口端部上に載置する。前記槽本
体25の開口部外周に予めクランプリング27が装着さ
れ、該リング27の複数のクランプ爪34間に、蓋体6
の複数のクランプ爪35を嵌合する。
In this way, after the objects to be plated are attached to the object-to-be-processed container 5, these are hoisted by an actuator and moved to directly above the tank main body 25, and the object is to be hung down, and the object-to-be-processed container 5 etc. Is housed in the chamber 36,
The lid 6 is placed on the open end of the tank body 25. A clamp ring 27 is preliminarily attached to the outer periphery of the opening of the tank body 25, and the lid 6 is provided between the plurality of clamp claws 34 of the ring 27.
The plurality of clamp claws 35 are fitted.

【0052】そして、クランプリング27をアクチュエ
−タ(図示略)を介して閉方向に押し回し、前記クラン
プ爪34,35が上下位置して係合したところで、位置
決めピンをクランプリング27と蓋体6に差し込み、こ
れらをロックする。
Then, the clamp ring 27 is pushed and rotated in the closing direction via an actuator (not shown), and when the clamp claws 34 and 35 are vertically positioned and engaged, the positioning pin is attached to the clamp ring 27 and the lid. Insert into 6 and lock them.

【0053】このような状況の下で前記反応槽4に収納
した被メッキ物を脱脂洗浄する場合は、凝縮回収槽出入
口弁80,81、導入弁59、ガス回収弁65、処理液
排出弁13、遮断弁73を夫々開弁し、調圧弁66,8
5を段階的に低圧設定し、開閉弁55を開弁する。この
ようにすると、ガスボンベ54に充填した液化二酸化炭
素が噴出して気化し、この気化した二酸化炭素が導管5
6に導かれて凝縮回収槽17へ移動し、該回収槽17で
冷却液化して気液混合状態になる。
When degreasing and cleaning the object to be plated stored in the reaction tank 4 under such a condition, the condensation recovery tank inlet / outlet valves 80 and 81, the introduction valve 59, the gas recovery valve 65, the processing liquid discharge valve 13 , The shutoff valve 73 is opened, and the pressure regulating valves 66, 8 are opened.
5 is gradually set to a low pressure, and the opening / closing valve 55 is opened. By doing so, the liquefied carbon dioxide filled in the gas cylinder 54 is jetted and vaporized, and the vaporized carbon dioxide is supplied to the conduit 5
6 is moved to the condensing and collecting tank 17 and is cooled and liquefied in the collecting tank 17 to be in a gas-liquid mixed state.

【0054】前記二酸化炭素は、凝縮回収槽17から注
入管79を経てク−ラ−82へ導かれ、該ク−ラ−82
で更に冷却液化されて全量が液化する。前記液化した二
酸化炭素は、加圧ポンプ16へ導かれて略10MPa、
密度0.4以上に加圧され、更に加熱装置57で略50
℃に加熱されて、超臨界状または亜臨界態に達し、この
状態で導管58から反応槽4へ流入する。
The carbon dioxide is guided from the condensation recovery tank 17 to the cooler 82 through the injection pipe 79, and the cooler 82 is supplied.
Is further cooled and liquefied, and the whole amount is liquefied. The liquefied carbon dioxide is guided to the pressurizing pump 16 to have a pressure of about 10 MPa,
Pressurized to a density of 0.4 or higher, and then heated by the heating device 57 to approximately 50
It is heated to 0 ° C., reaches a supercritical state or a subcritical state, and in this state flows into the reaction tank 4 from the conduit 58.

【0055】前記二酸化炭素は反応槽4へ流入後に若干
減圧し、その一部が反応槽4からガス回収管64を経て
分離槽14へ流入し、該槽14を昇圧するとともに、該
槽14から反応器78と脱水カラム24を経てリタ−ン
パイプ79へ移動し、これらの管路を昇圧する。また、
前記二酸化炭素の一部は、反応槽4から処理液排出管1
2を経て処理液回収槽11へ流入し、該槽11を昇圧す
るとともに、バイパス管72に導かれて前記ガス回収管
64に合流し、これらの管路を昇圧する。
The carbon dioxide is slightly decompressed after flowing into the reaction tank 4, and a part of the carbon dioxide flows from the reaction tank 4 into the separation tank 14 through the gas recovery pipe 64 to pressurize the tank 14 and at the same time from the tank 14. It moves to the return pipe 79 through the reactor 78 and the dehydration column 24 and pressurizes these pipes. Also,
A part of the carbon dioxide is discharged from the reaction tank 4 into the processing liquid discharge pipe 1
After flowing into the processing liquid recovery tank 11 via 2, the pressure of the tank 11 is increased, and at the same time, it is guided to the bypass pipe 72 and merges with the gas recovery pipe 64 to pressurize these pipe lines.

【0056】この後、更に導入管58から加圧かつ加熱
した二酸化炭素が反応槽4へ供給され、反応槽4および
その周辺の管路が超臨界状態に達する。すなわち、反応
槽4、ガス回収管64の上流側端部、処理液排出管1
2、処理液回収槽11、バイパス管72が、系内で最も
高圧かつ高温状態(約10MPa、50℃)で、超臨界
状態に置かれる。
Thereafter, the pressurized and heated carbon dioxide is further supplied from the introduction pipe 58 to the reaction tank 4, and the reaction tank 4 and the pipes around the reaction tank 4 reach the supercritical state. That is, the reaction tank 4, the upstream end of the gas recovery pipe 64, the treatment liquid discharge pipe 1
2. The treatment liquid recovery tank 11 and the bypass pipe 72 are placed in a supercritical state at the highest pressure and temperature in the system (about 10 MPa, 50 ° C.).

【0057】また、調圧弁66,85間のガス回収管6
4、分離槽14、反応器78が、系内で次に高圧かつ高
温状態(約6MPa、22℃)で、亜臨界状態に置か
れ、調圧弁85より下流側の脱水カラム24、リタ−ン
パイプ79が系内で最も低圧かつ低温の亜臨界以下の状
態状態に置かれる。
Further, the gas recovery pipe 6 between the pressure regulating valves 66 and 85
4, the separation tank 14 and the reactor 78 are placed in a subcritical state under the next high pressure and high temperature state (about 6 MPa, 22 ° C.) in the system, and the dehydration column 24 and the return pipe downstream of the pressure regulating valve 85. 79 is placed in the lowest pressure and lowest temperature sub-critical state in the system.

【0058】このような状況の下でモ−タ44を駆動
し、ベルトおよびベルトプーリに連係した撹拌軸42を
回転してファン43を回転し、反応槽4内の超臨界二酸
化炭素を撹拌するとともに、反応槽4と処理液回収槽1
1と分離槽14の各ヒ−タ74〜76を加熱する。
Under such a condition, the motor 44 is driven, the stirring shaft 42 linked to the belt and the belt pulley is rotated to rotate the fan 43, and the supercritical carbon dioxide in the reaction tank 4 is stirred. In addition, the reaction tank 4 and the processing liquid recovery tank 1
1 and each of the heaters 74 to 76 in the separation tank 14 are heated.

【0059】このようにすると、超臨界二酸化炭素が反
応槽4内を循環しながら拡散し、該槽4内の前記被メッ
キ物に接触して、該被メッキ物と、陽極側の電極棒45
の下端部、導電部材47、電極管48、並びに陰極側の
電極棒46の下端部、等に付着している油脂分や水分、
異物等を高速かつ効率良く洗浄する。しかも、従来のエ
マルジョン洗浄のような水、溶液の使用を廃しているか
ら、その分被メッキ物等の後述の乾燥を促す。
In this way, the supercritical carbon dioxide diffuses while circulating in the reaction tank 4, contacts the object to be plated in the tank 4, and the object to be plated and the electrode rod 45 on the anode side.
Of oil and fat adhering to the lower end portion of the conductive member 47, the electrode tube 48, the lower end portion of the electrode rod 46 on the cathode side, and the like,
Cleans foreign substances at high speed and efficiently. Moreover, since the use of water and solution as in conventional emulsion cleaning is abolished, the later-described drying of the object to be plated is promoted accordingly.

【0060】このように本発明は超臨界二酸化炭素で被
処理物4の脱脂洗浄を行なっているから、被処理物を脱
脂液に浸漬する従来の方法に比べて、有害な脱脂剤の使
用をなくし、作業環境を改善して、これを安全で迅速か
つ容易に行えるとともに、反応槽4で脱脂洗浄を行なっ
ているから、従来のような専用の脱脂槽を要せず、その
分設備費の低減を図れる。
As described above, according to the present invention, since the object 4 to be processed is degreased and washed with supercritical carbon dioxide, the use of a harmful degreasing agent can be avoided as compared with the conventional method of immersing the object 4 in the degreasing liquid. It eliminates the need to improve the working environment, and this can be done safely, quickly and easily, and because degreasing cleaning is performed in the reaction tank 4, there is no need for a dedicated degreasing tank as in the past, and the equipment cost is reduced accordingly. Can be reduced.

【0061】そして、前記脱脂洗浄によって除去された
油脂分は、ガス回収管64を移動する処理ガス、つまり
超臨界ないし亜臨界二酸化炭素に搬送されて分離槽14
へ移動し、該槽14で減圧かつ加熱されて回収される。
前記回収後、前記処理ガスは反応器78へ導かれ、該反
応器78に内蔵した金属触媒に接触して、処理ガス中の
酸素と水素が燃焼し、それらが除去されるとともに、水
が生成される。この後、前記処理ガスは、調圧弁85で
更に減圧されて脱水カラム24へ移動し、該カラム24
で前記生成した水分が吸収されて再生され、この再生ガ
スがリタ−ンパイプ79を下流側へ移動する。
The oil and fat removed by the degreasing and cleaning is conveyed to the processing gas moving in the gas recovery pipe 64, that is, supercritical or subcritical carbon dioxide, and the separation tank 14
And is decompressed and heated in the tank 14 to be recovered.
After the recovery, the processing gas is guided to the reactor 78, contacts the metal catalyst contained in the reactor 78, burns oxygen and hydrogen in the processing gas, removes them, and produces water. To be done. Thereafter, the processing gas is further decompressed by the pressure regulating valve 85 and moved to the dehydration column 24, and the column 24
Then, the generated water is absorbed and regenerated, and the regenerated gas moves to the downstream side in the return pipe 79.

【0062】前記処理ガスは、リタ−ンパイプ79の下
流側終端部へ移動後、凝縮回収槽17へ導かれ、該回収
槽17で冷却液化され、更にク−ラ−82で冷却液化さ
れ、その全量を液化された後、加圧ポンプ16で加圧さ
れ、かつ加熱器57で加熱されて反応槽4に収容され、
超臨界状態を回復する。
After moving to the downstream end of the return pipe 79, the processing gas is guided to the condensation recovery tank 17, cooled and liquefied in the recovery tank 17, and further cooled and liquefied in the cooler 82. After the whole amount is liquefied, it is pressurized by the pressure pump 16 and heated by the heater 57 to be stored in the reaction tank 4,
Restore the supercritical state.

【0063】このように前記脱脂洗浄は、系内に二酸化
炭素を循環させて行なっているから、超臨界二酸化炭素
を反応槽4内に封じ込めて行なうば場合に比べて、清浄
な二酸化炭素による脱脂洗浄を行なえ、その分脱脂洗浄
を高精度に行なえる。また、前記二酸化炭素は、系内を
循環する間に脱脂洗浄と汚染物の分離を行なった後に再
生され、その有効利用を図っている。そして、その間、
二酸化炭素は系外へ一切排出されないから、二酸化炭素
の消耗ないし消費が極めて少なく、その消耗分だけガス
ボンベ54から補給される。なお、反応槽4の超臨界状
態形成後、処理液排出弁13を閉弁して脱脂洗浄を行な
ってもよい。
As described above, since the degreasing cleaning is performed by circulating carbon dioxide in the system, compared to the case where supercritical carbon dioxide is contained in the reaction tank 4, degreasing with clean carbon dioxide is performed. Cleaning can be performed, and degreasing cleaning can be performed with high accuracy. Further, the carbon dioxide is regenerated after being degreased and washed and separated from contaminants while circulating in the system, so that the carbon dioxide is effectively utilized. And in the meantime,
Since carbon dioxide is not exhausted to the outside of the system at all, consumption or consumption of carbon dioxide is extremely small, and the consumed amount is replenished from the gas cylinder 54. After forming the supercritical state in the reaction tank 4, the treatment liquid discharge valve 13 may be closed to perform degreasing cleaning.

【0064】こうして所定時間脱脂洗浄後、該作業を終
了し、次の酸洗いを行なう。この酸洗いに際しては、反
応槽4の密閉状態や被処理物収納容器5の収納状態、被
メッキ物の収納状態はそのまま維持され、この状況の下
で、例えば加圧ポンプ16とモ−タ44の駆動を一旦停
止し、凝縮回収槽出入口弁80,81、導入弁59、処
理液排出弁13、ガス回収弁65等を閉弁する。すなわ
ち、反応槽4を周辺の管路から遮断し、代わりに酸洗い
溶液収納タンク15の開閉弁(図示略)を開弁して、そ
の送液ポンプ(図示略)を駆動し、加温した酸洗い溶液
を反応槽4へ供給する。
After degreasing and cleaning for a predetermined time, the work is finished and the next pickling is performed. During this pickling, the sealed state of the reaction tank 4, the stored state of the object storage container 5, and the stored state of the object to be plated are maintained as they are. Under this condition, for example, the pressure pump 16 and the motor 44 are used. Is temporarily stopped, and the condensation recovery tank inlet / outlet valves 80, 81, the introduction valve 59, the processing liquid discharge valve 13, the gas recovery valve 65, etc. are closed. That is, the reaction tank 4 was shut off from the peripheral pipe line, and instead, the opening / closing valve (not shown) of the pickling solution storage tank 15 was opened, and the liquid feeding pump (not shown) was driven to warm it. The pickling solution is supplied to the reaction tank 4.

【0065】この場合、反応槽4は高圧に維持されてい
るが、内部の二酸化炭素よりも酸洗い溶液の方が密度が
大きいから、前記酸洗い溶液を反応槽4へ容易に送り込
めるまた、前記反応槽4は、前記脱脂洗浄時と同様に密
閉されて高圧状態を維持し、ヒ−タ74が加熱されて超
臨界状態を維持している。
In this case, the reaction tank 4 is maintained at a high pressure, but since the pickling solution has a higher density than the internal carbon dioxide, the pickling solution can be easily sent to the reaction tank 4. The reaction tank 4 is hermetically sealed and maintains a high pressure state as in the degreasing cleaning, and the heater 74 is heated to maintain a supercritical state.

【0066】このような状況の下でモ−タ44を駆動
し、酸溶液を撹拌すると、超臨界二酸化炭素が高速に拡
散して被メッキ物の表面に接触し、被メッキ物表面の酸
化皮膜を除去し、表面を活性化する。この場合、酸溶液
に適当な界面活性剤を添加して乳濁すれば、酸化皮膜が
均一かつ効率良く除去され、酸洗い能率が向上する。
When the motor 44 is driven and the acid solution is stirred under such a condition, the supercritical carbon dioxide diffuses at high speed and comes into contact with the surface of the object to be plated, and the oxide film on the surface of the object to be plated. Are removed and the surface is activated. In this case, if an appropriate surfactant is added to the acid solution to make it emulsion, the oxide film is uniformly and efficiently removed, and the pickling efficiency is improved.

【0067】このように前記酸洗いは、反応槽4内の密
閉状態を維持することで、新たに二酸化炭素を供給する
ことなく、脱脂洗浄時の超臨界状態を利用して、合理的
かつ能率良く行なえる。そして、所定時間酸洗い後、処
理液排出弁13とガス回収弁65を開弁する。
As described above, the pickling is rational and efficient by maintaining the airtight state in the reaction tank 4 and utilizing the supercritical state at the time of degreasing cleaning without newly supplying carbon dioxide. You can do well. Then, after pickling for a predetermined time, the processing liquid discharge valve 13 and the gas recovery valve 65 are opened.

【0068】このようにすると反応槽4が減圧され、内
部の超臨界二酸化炭素が気化して、反応槽4内に二酸化
炭素と酸洗い液の二層状態が形成される。このうち、密
度の低い二酸化炭素がガス回収管64側へ流出し、密度
の大きい使用後の酸洗い液が、酸化被膜と一緒に処理液
排出管12に導かれ、処理液回収槽11へ流下する。
In this way, the pressure in the reaction tank 4 is reduced, the supercritical carbon dioxide inside is vaporized, and a two-layer state of carbon dioxide and the pickling solution is formed in the reaction tank 4. Of these, carbon dioxide having a low density flows out to the gas recovery pipe 64 side, and the pickling solution after use having a high density is guided to the process liquid discharge pipe 12 together with the oxide film and flows down to the process liquid recovery tank 11. To do.

【0069】この場合、処理液回収槽11は反応槽4の
直下に位置し、前記酸洗い液が重力で落下するから、前
記噴出速度と相俟って処理液回収槽11へ速やかに移動
し、反応槽4内の残留を防止する。また、処理液回収槽
11はバイパス管72を介してガス回収管64に連通し
ているから、前記酸洗い液の流入圧力を吸収し緩衝す
る。
In this case, the treatment liquid recovery tank 11 is located immediately below the reaction tank 4, and the pickling solution drops due to gravity, so that the treatment liquid recovery tank 11 moves quickly to the treatment liquid recovery tank 11 in combination with the ejection speed. , To prevent the reaction tank 4 from remaining. Further, since the treatment liquid recovery tank 11 communicates with the gas recovery pipe 64 via the bypass pipe 72, it absorbs and buffers the inflow pressure of the pickling liquid.

【0070】一方、前記処理液回収槽11は、前記酸洗
い液の排出と前後してヒ−タ75が加熱され、この加熱
によって酸洗い液と、該液に混入した二酸化炭素とが分
離され、この分離した二酸化炭素がバイパス管72へ押
し出され、ガス回収管64へ移動する。
On the other hand, in the treatment solution recovery tank 11, the heater 75 is heated before and after the discharge of the pickling solution, and the heating separates the pickling solution from the carbon dioxide mixed in the solution. The separated carbon dioxide is pushed out to the bypass pipe 72 and moved to the gas recovery pipe 64.

【0071】前記除去した酸化被膜は、排出弁68を開
弁して外部へ排出され、酸化被膜除去後の酸洗い液は、
調圧弁70を介し管内を略大気圧に降下し、遮断弁71
を開弁して精製部(図示略)へ送り込み、精製後の酸洗
い液を酸洗い液収納タンク15若しくはその回収タンク
へ流下する。
The removed oxide film is discharged to the outside by opening the discharge valve 68, and the pickling solution after removing the oxide film is
The pressure inside the pipe is lowered to approximately atmospheric pressure via the pressure regulating valve 70, and the shutoff valve 71
Is opened and sent to a refining section (not shown), and the purified pickling solution flows down to the pickling solution storage tank 15 or its recovery tank.

【0072】このように本発明は、超臨界状態の下で被
メッキ物の酸化皮膜を除去しているから、被メッキ物を
酸洗い液に浸漬する従来の酸洗い法に比べて、酸洗い液
の使用量を低減し、これを迅速かつ容易に行えるととも
に、反応槽4で酸洗いを行なっているから、従来のよう
な専用の酸洗い槽を要せず、その分設備費の低減を図れ
る。
As described above, according to the present invention, since the oxide film on the object to be plated is removed under the supercritical condition, the object to be plated is pickled as compared with the conventional pickling method in which the object to be plated is immersed in the pickling solution. The amount of liquid used can be reduced, and this can be done quickly and easily, and because acid pickling is performed in the reaction tank 4, there is no need for a dedicated pickling tank as in the past, and the equipment cost can be reduced accordingly. Can be achieved.

【0073】この場合、反応槽4、処理液排出管12、
処理液回収槽11、給液管60,61の酸洗い液の付着
を嫌うときは、前記タンク15に水タンク部を設け、こ
の水を前記ポンプ9,10と給液管60,61を介し
て、反応槽4へ供給し、これを処理液回収槽11へ流下
し水洗いすれば、所期の目的が達成される。また、前記
酸洗い時は、反応槽4を周辺の管路から遮断して行なっ
ているから、系内、特にガス回収管64、リタ−ンパイ
プ79側への酸洗い液の流出を防止し、酸洗い液による
腐食を防止できる。
In this case, the reaction tank 4, the processing liquid discharge pipe 12,
When it is desired to prevent the pickling solution from adhering to the treatment liquid recovery tank 11 and the liquid supply pipes 60 and 61, a water tank portion is provided in the tank 15, and this water is supplied through the pumps 9 and 10 and the liquid supply pipes 60 and 61. Then, the intended purpose is achieved by supplying the reaction solution to the reaction tank 4, flowing it down to the treatment liquid recovery tank 11 and washing it with water. Further, at the time of pickling, the reaction tank 4 is shut off from the peripheral pipeline, so that the pickling solution is prevented from flowing out to the inside of the system, especially to the gas recovery pipe 64 and the return pipe 79 side. Corrosion due to pickling solution can be prevented.

【0074】こうして、酸洗い液を精製し前記収納タン
ク15へ戻すのと相前後して、被メッキ物を乾燥する。
この場合は、前記脱脂洗浄後に閉弁した凝縮回収槽出入
口弁80,81、ガス導入弁59、ガス回収弁65を開
弁し、かつ加圧ポンプ16を駆動して、加圧二酸化炭素
を反応槽4内へ供給ないし補給し、反応槽4内の超臨界
状態を維持形成するとともに、前記二酸化炭素を系内に
循環移動する。
Thus, the object to be plated is dried before and after the pickling solution is purified and returned to the storage tank 15.
In this case, the condensation recovery tank inlet / outlet valves 80, 81, the gas introduction valve 59, and the gas recovery valve 65 which are closed after the degreasing cleaning are opened, and the pressurizing pump 16 is driven to react the pressurizing carbon dioxide. It is supplied or replenished into the tank 4 to maintain and form the supercritical state in the reaction tank 4, and the carbon dioxide is circulated and moved into the system.

【0075】このようにすることで、超臨界二酸化炭素
が被メッキ物や電極管48、被メッキ物収納容器5、導
電部材47等に付着した水分と接触し、これを高速かつ
精密に拡散して乾燥する。この場合、前記水分は二酸化
炭素に搬送され、脱水カラム24で除去されて、二酸化
炭素の乾燥能率を維持する。
By doing so, the supercritical carbon dioxide comes into contact with the object to be plated, the electrode tube 48, the object to be plated container 5, the water adhered to the conductive member 47, etc., and diffuses this rapidly and precisely. To dry. In this case, the water is transported to carbon dioxide and removed by the dehydration column 24 to maintain the carbon dioxide drying efficiency.

【0076】このように前記乾燥は、超臨界二酸化炭素
を反応槽4へ導入し、これを速やかに拡散させて排出
し、系内を循環させているから、系内から反応槽4を遮
断して乾燥する場合に比べ、水分が効率良く迅速に搬送
され速やかに乾燥する。
As described above, in the drying, the supercritical carbon dioxide is introduced into the reaction tank 4, and is rapidly diffused and discharged, and is circulated in the system. Therefore, the reaction tank 4 is shut off from the system. Compared with the case of drying by drying, moisture is efficiently and promptly transported and dried quickly.

【0077】こうして被メッキ物を乾燥後、加圧ポンプ
16とモ−タ44の駆動を一旦停止し、凝縮回収槽出入
口弁80,81、処理液排出弁13、ガス回収弁65等
を閉弁し、代わりに第1若しくは第2処理槽7,8の給
液ポンプ9,10を駆動し、所定のメッキ液を反応槽4
へ供給する。この場合、前記メッキ液に適当な界面活性
剤を添加して置く。
After the material to be plated is dried in this way, the driving of the pressure pump 16 and the motor 44 is temporarily stopped, and the condensation recovery tank inlet / outlet valves 80 and 81, the processing liquid discharge valve 13, the gas recovery valve 65, etc. are closed. Then, instead, the liquid supply pumps 9 and 10 of the first and second processing tanks 7 and 8 are driven to apply a predetermined plating liquid to the reaction tank 4.
Supply to. In this case, a suitable surfactant is added to the plating solution and placed.

【0078】このような状況の下で凝縮回収槽出入口弁
80,81と、導入弁59を開弁し、更に加圧ポンプ1
6を駆動して、系内の二酸化炭素を加圧かつ加熱して反
応槽4内へ供給し、反応槽4内を超臨界状態に維持形成
したところで、導入弁59を閉弁し、反応槽4を系内か
ら遮断する。これと前後してモ−タ44を駆動し、撹拌
軸42を回転して超臨界二酸化炭素とメッキ液を撹拌す
る。
Under these circumstances, the condensation recovery tank inlet / outlet valves 80 and 81 and the introduction valve 59 are opened, and the pressurizing pump 1
6 is driven to pressurize and heat the carbon dioxide in the system to supply it into the reaction tank 4, and when the inside of the reaction tank 4 is maintained in a supercritical state, the introduction valve 59 is closed, and the reaction tank is closed. Shut off 4 from the system. Around this, the motor 44 is driven and the stirring shaft 42 is rotated to stir the supercritical carbon dioxide and the plating solution.

【0079】このようにすると、超臨界二酸化炭素が反
応槽4に高速に拡散し、前記メッキ液と界面活性剤とが
急速に混合して乳濁化し、メッキ液の微粒子が反応槽4
内に高密度に拡散して、被メッキ物の表面に接触する。
By doing so, the supercritical carbon dioxide diffuses into the reaction tank 4 at high speed, the plating solution and the surfactant are rapidly mixed and emulsified, and the fine particles of the plating solution are converted into the reaction tank 4.
It diffuses in high density inside and contacts the surface of the object to be plated.

【0080】この状況の下で電極棒45,46に接続し
た電源用スイッチ(図示略)をONし、陽極側の電極管
48と陰極側の被処理物収納容器5に通電すると、メッ
キ液中の純ニッケルイオンが被メッキ物の表面に析出す
る。その際、前記ファン43の回転によって、前記乳濁
物質を撹拌し、前記電解ニッケルイオンを均一に分布さ
せて、該イオンを被メッキ物の表面に緻密に付着させ
る。
Under this condition, when a power switch (not shown) connected to the electrode rods 45 and 46 is turned on to energize the electrode tube 48 on the anode side and the object storage container 5 on the cathode side, the plating solution Pure nickel ions are deposited on the surface of the object to be plated. At that time, the emulsion substance is agitated by the rotation of the fan 43 to uniformly distribute the electrolytic nickel ions, and the ions are densely adhered to the surface of the object to be plated.

【0081】この場合、反応槽4内の中央に電極管48
による陽極が位置し、反応槽4内の外周部に陰極である
被処理物収納容器5と被メッキ物が位置し、この正負電
極に同大の電位を印加しているから、電極管48から直
線状の電気力線が被処理物収納容器5ないし被メッキ物
に向かって、放射状に形成される。この状況は図7のよ
うである。
In this case, the electrode tube 48 is provided in the center of the reaction tank 4.
Since the anode is located in the reaction vessel 4, and the object-to-be-processed container 5 serving as the cathode and the object to be plated are located in the outer peripheral portion of the reaction tank 4, the same potential is applied to the positive and negative electrodes. Linear electric lines of force are formed radially toward the object storage container 5 or the object to be plated. This situation is as shown in FIG.

【0082】この場合、被処理物収納容器5は電極管4
8の同心円上に位置し、該収納容器5に被メッキ物が取
り付けられているから、全ての被メッキ物は同電位に置
かれている。したがって、被メッキ物が同一の場合、該
被メッキ物に対し略同一の電流密度が得られ、均一なメ
ッキ状態を得られる。それゆえ、メッキ槽に一対の電極
を離間して配置する従来のメッキ方法に比べ、均質なメ
ッキ状態を得られる。
In this case, the object storage container 5 is the electrode tube 4
Since the objects to be plated are located on the concentric circles 8 and the objects to be plated are attached to the storage container 5, all the objects to be plated are placed at the same potential. Therefore, when the object to be plated is the same, substantially the same current density can be obtained for the object to be plated, and a uniform plated state can be obtained. Therefore, as compared with the conventional plating method in which the pair of electrodes are separated from each other in the plating tank, a more uniform plating state can be obtained.

【0083】しかも、反応槽4と被処理物収納容器5が
円形断面で、これらが同心円状に配置されているから、
多数の被メッキ物を効率良く等距離位置に配置でき、メ
ッキの量産性ないし生産性の向上を図れるとともに、フ
ァン43によるメッキ液と超臨界二酸化炭素との良好な
撹拌効果を得られ、均一なイオン分布を得られて均質か
つ良質なメッキを得られる。
Moreover, since the reaction tank 4 and the object storage container 5 have a circular cross section and are arranged concentrically,
A large number of objects to be plated can be efficiently arranged at equidistant positions, the mass productivity or productivity of plating can be improved, and a good stirring effect of the plating solution and supercritical carbon dioxide by the fan 43 can be obtained, and uniform plating can be achieved. Ion distribution can be obtained and uniform and high quality plating can be obtained.

【0084】更に、前記電解ニッケルイオンの電解、析
出および付着を超臨界状態で行なっているから、電解ニ
ッケルイオンが反応槽4内を速やかに拡散し、かつ高密
度で均一に分布して、被メッキ物の表面および裏面に付
着する。したがって、電解質溶液中で陽極物質を電解し
析出、付着する従来のメッキ法に比べて、いわゆるメッ
キのつき廻りが非常に良く、被メッキ物の表面および裏
面に均一かつ緻密なメッキ状態を得られ、良好な仕上が
り面を得られる。
Further, since the electrolysis, precipitation and adhesion of the electrolytic nickel ions are carried out in a supercritical state, the electrolytic nickel ions are rapidly diffused in the reaction tank 4 and are uniformly distributed at a high density. It adheres to the front and back of the plated object. Therefore, compared with the conventional plating method in which an anode material is electrolyzed and deposited in an electrolyte solution, the so-called plating contact is very good, and a uniform and dense plating state can be obtained on the front and back surfaces of the object to be plated. A good finished surface can be obtained.

【0085】このため、従来のメッキ法のように、被メ
ッキ物の表面と裏面のメッキを分けて行なう面倒がな
く、その分生産性を向上でき、また被メッキ物が複雑な
形状の場合でも、補助極を要することなく容易に対応で
きる。また、電極管48を不溶性部材で構成し、電解液
および電界中に置かれても溶出しないから、従来のよう
に電極が消耗し取り換える面倒がない。
Therefore, unlike the conventional plating method, there is no trouble of separately plating the front surface and the back surface of the object to be plated, the productivity can be improved accordingly, and even when the object to be plated has a complicated shape. , Can be easily dealt with without requiring an auxiliary electrode. Further, since the electrode tube 48 is made of an insoluble member and does not elute even when placed in an electrolytic solution and an electric field, there is no trouble of replacing the electrode as in the conventional case.

【0086】また、前記メッキ時は、反応槽4を周辺の
管路から遮断して行なっているから、系内、特にガス回
収管64、リタ−ンパイプ79側へのメッキ液の流出を
防止し、メッキ液による腐食を防止できる。
Further, during the plating, the reaction tank 4 is shut off from the peripheral pipelines, so that the plating solution is prevented from flowing out to the inside of the system, particularly to the gas recovery pipe 64 and the return pipe 79 side. It is possible to prevent corrosion due to the plating solution.

【0087】こうして、前記メッキ工程終了後、電極印
加スイッチをOFFし、ファン43を停止して、処理液
排出弁13、ガス回収弁65、導入弁59、凝縮回収槽
出入口弁80,83を開弁する。このようにすると、反
応槽4内が減圧され、超臨界二酸化炭素が減圧されて急
激に気化または液化し、これがメッキ液ないし界面活性
剤と二層状態を形成するこのうち、密度の小さな二酸化
炭素がガス回収管64に押し出され、密度の大きなメッ
キ液ないし界面活性剤が処理液排出管12へ押し出さ
れ、処理液回収槽11へ流下する。
Thus, after the plating process is completed, the electrode application switch is turned off, the fan 43 is stopped, and the treatment liquid discharge valve 13, the gas recovery valve 65, the introduction valve 59, and the condensation recovery tank inlet / outlet valves 80 and 83 are opened. Speak. In this way, the inside of the reaction tank 4 is depressurized and the supercritical carbon dioxide is depressurized and rapidly vaporized or liquefied, which forms a two-layer state with the plating solution or the surfactant. Is extruded into the gas recovery pipe 64, the plating solution or the surfactant having a high density is extruded into the treatment liquid discharge pipe 12, and flows down into the treatment liquid recovery tank 11.

【0088】前記処理液回収槽11は、前記メッキ液の
排出と前後してヒ−タ75が加熱され、この加熱によっ
てメッキ液と、該液に混入した二酸化炭素とが分離さ
れ、この分離した二酸化炭素がバイパス管72へ押し出
されて、ガス回収管64へ移動する。また、メッキ液な
いし界面活性剤は、調圧弁70を介し略大気圧に降圧し
て精製部(図示略)へ移動し、これを精製後に第1若し
くは第2処理槽7,8へ流下させる。このようにこの実
施形態は、使用後のメッキ液と界面活性剤を元の第1若
しくは第2処理槽7,8へ戻して再利用を図っている。
In the treatment liquid recovery tank 11, the heater 75 is heated before and after the discharge of the plating liquid, and by this heating, the plating liquid and the carbon dioxide mixed in the liquid are separated and separated. Carbon dioxide is pushed out to the bypass pipe 72 and moves to the gas recovery pipe 64. In addition, the plating solution or the surfactant is reduced to a substantially atmospheric pressure via the pressure regulating valve 70, moves to a refining section (not shown), and is flowed down to the first or second processing tank 7, 8 after refining. As described above, in this embodiment, the used plating solution and the surfactant are returned to the original first or second processing tanks 7 and 8 for reuse.

【0089】こうして、被メッキ物等をメッキ後、これ
を乾燥する。この場合は、前記加圧ポンプ16の運転を
続行し、超臨界二酸化炭素を反応槽4内へ供給ないし補
給し、被メッキ物や電極管48、被メッキ物収納容器
5、導電部材47等に付着したメッキ液等と接触し、こ
れを高速に拡散してガス回収管64へ押し出す。
After plating the object to be plated in this manner, it is dried. In this case, the operation of the pressurizing pump 16 is continued, and supercritical carbon dioxide is supplied or replenished into the reaction tank 4 so that the object to be plated, the electrode tube 48, the object to be plated container 5, the conductive member 47, etc. It comes into contact with the adhered plating liquid or the like, diffuses this at high speed, and pushes it out to the gas recovery pipe 64.

【0090】このように前記乾燥は、超臨界二酸化炭素
を反応槽4へ導入し、これを速やかに拡散させて排出
し、系内を循環させているから、水分が効率良く搬送さ
れ迅速に乾燥する。この場合、二酸化炭素に搬送された
水分は脱水カラム24で除去され、乾燥能率を維持す
る。
As described above, in the above-mentioned drying, supercritical carbon dioxide is introduced into the reaction tank 4, and this is rapidly diffused and discharged, and the system is circulated, so that water is efficiently transported and dried quickly. To do. In this case, the water carried to the carbon dioxide is removed by the dehydration column 24 to maintain the drying efficiency.

【0091】こうして被メッキ物を乾燥後、被メッキ物
を反応槽4から取り出す。この場合は、加圧ポンプ16
とモ−タ44を停止し、導入弁59、ガス回収弁65、
処理液排出弁13を閉弁する。そして、位置決めピン
(図示略)を抜き取り、アクチュエ−タを介してクラン
プリング27を開回動し、該リング27のクランプ爪3
4と蓋体6のクランプ爪35との係合を解除する。この
状況は図8のようである。
After drying the object to be plated in this manner, the object to be plated is taken out from the reaction tank 4. In this case, pressurizing pump 16
And the motor 44 are stopped, and the introduction valve 59, the gas recovery valve 65,
The processing liquid discharge valve 13 is closed. Then, the positioning pin (not shown) is pulled out, the clamp ring 27 is opened and rotated through the actuator, and the clamp claw 3 of the ring 27 is rotated.
4 and the clamp claw 35 of the lid 6 are disengaged. This situation is as shown in FIG.

【0092】この後、アクチュエ−タを介して蓋体6を
吊り上げ、被処理物収納容器5、被メッキ物、電極棒4
5,46、撹拌軸42、電極管48、導電部材47等を
反応槽4から一体に取り出す。この状況は図3のようで
ある。この後、ボルト39を取り外し、被処理物収納容
器5を蓋体6から取り外し、内部の被メッキ物を取り外
せば一連のメッキ作業が終了する。
After that, the lid 6 is lifted up via the actuator to store the object-to-be-processed container 5, the object to be plated, and the electrode rod 4.
5, 46, the stirring shaft 42, the electrode tube 48, the conductive member 47, etc. are taken out from the reaction tank 4 as a unit. This situation is as shown in FIG. After that, the bolt 39 is removed, the object storage container 5 is removed from the lid body 6, and the object to be plated inside is removed to complete a series of plating operations.

【0093】なお、前述の実施形態では洗浄および脱
脂、電気化学的反応、並びに乾燥媒体として、超臨界ま
たは亜臨界流体を用いているが、これに限らず大気圧以
上の加圧流体、例えば二酸化炭素を用いることも可能で
あり、そのようにすることで、超臨界または亜臨界状態
の形成に要する耐圧性処理槽4,11,14や耐圧性管
路、加熱かつ加圧手段等が不要になり、これを安価に製
作できるとともに、作業を容易かつ安全に行なえる利点
がある。
In the above-mentioned embodiment, the supercritical or subcritical fluid is used as the cleaning and degreasing, the electrochemical reaction, and the drying medium, but the present invention is not limited to this, and the pressurized fluid above atmospheric pressure, for example, dioxide. It is also possible to use carbon, and by doing so, the pressure-resistant processing tanks 4, 11, 14 required for forming a supercritical or subcritical state, pressure-resistant pipelines, heating and pressurizing means, etc. are unnecessary. Therefore, there is an advantage that it can be manufactured at low cost and the work can be performed easily and safely.

【0094】また、前述の実施形態では単一の反応槽4
で一連の工程を処理しているが、そのような反応槽4を
複数装備し、これらの反応槽4で各工程を順次独立して
行なわせるとともに、相前後する処理工程を行なう反応
槽4,4間において、先行側の反応槽4で使用した超臨
界二酸化炭素や酸溶液、メッキ液、界面活性剤等を、当
該工程終了後、後行側の反応槽4に供給し、それらの有
効利用と電気化学的処理の量産化を図るようにしても良
い。
Further, in the above-described embodiment, the single reaction tank 4 is used.
, A plurality of such reaction tanks 4 are provided, each of these reaction tanks 4 is sequentially and independently carried out, and the reaction tanks 4 for performing successive processing steps are provided. Between the four, the supercritical carbon dioxide, the acid solution, the plating solution, the surfactant, etc. used in the reaction tank 4 on the preceding side are supplied to the reaction tank 4 on the following side after the completion of the process, and the effective utilization thereof is achieved. The mass production of the electrochemical treatment may be attempted.

【0095】また、被メッキ物に多層メッキする、いわ
ゆる重ねメッキを行なう場合は、前述の各工程を繰り返
し連続して処理すれば良い。したがって、従来の重ねメ
ッキのように、メッキ終了毎に被メッキ物を反応槽から
いちいち取り出し、これを各槽へ移動して前処理を行な
う面倒がなく、それだけ生産性が向上するとともに、二
酸化炭素等の放出による消費を防止できる。しかも、従
来のように被メッキ物を反応槽から取り出す際の外気と
の接触の不安を解消しているから、被処理物表面の活性
処理面を確実かつ安全に維持でき、前記重ねメッキに有
効な利点がある。
Further, in the case of performing multi-layer plating, that is, so-called layer plating, on the object to be plated, the above-mentioned respective steps may be repeatedly and continuously processed. Therefore, unlike the conventional overplating, each time the plating is finished, the object to be plated is taken out of the reaction tank one by one, and it is moved to each tank for pretreatment, which improves productivity and reduces carbon dioxide. It is possible to prevent consumption due to release of the like. Moreover, since it eliminates the concern about contact with the outside air when taking out the object to be plated from the reaction tank as in the past, the active surface of the object to be processed can be reliably and safely maintained, which is effective for the above-mentioned overplating. There are many advantages.

【0096】図10乃至図12は本発明の他の実施形態
を示し、前述の構成と対応する構成部分には同一の符号
を用いている。このうち、図10は本発明の第2の実施
形態を示し、この実施形態は、電極棒45,46の極性
を整流器20の単純な切り換え操作で実現している。
10 to 12 show another embodiment of the present invention, and the same reference numerals are used for the components corresponding to the above-mentioned configurations. Among them, FIG. 10 shows a second embodiment of the present invention, and this embodiment realizes the polarities of the electrode rods 45 and 46 by a simple switching operation of the rectifier 20.

【0097】このように電極棒45,46の極性を変更
しても、電極管48からは金属イオンは放出されず、被
処理物収納容器5との間の電界形成に機能するだけであ
るから、それらの電気化学的反応に支障はなく、電極の
選択と変更を許容し、その合理的な使用と作業を得られ
る。しかも、その際の電気力線は、被処理物収納容器5
から内側の電極管48に向かって放射状に形成され、、
前述と同様な作用効果を得られる。
Even if the polarities of the electrode rods 45 and 46 are changed in this way, metal ions are not released from the electrode tube 48 and only function to form an electric field with the object storage container 5. , Their electrochemical reaction is not hindered, the selection and modification of the electrodes are allowed, and their rational use and work can be obtained. Moreover, the lines of electric force at that time are the objects to be processed container 5
From the inside toward the inner electrode tube 48,
The same effect as the above can be obtained.

【0098】図11は本発明の第3の実施形態を示し、
この実施形態は、互いに相似形状の複数の被処理物収納
容器5,5a,5bを設け、これらを電極管48を中心
に同心円状かつ等距離に配置し、かつこの隣接する電極
管48と被処理物収納容器5,5a、および一対の被処
理物収納容器5,5b間に同電位を印加し、チャンバ3
6内に配置した複数の被処理物収納容器5,5a,5b
によって、メッキの量産化と構成の簡潔化を図るように
している。この場合、被処理物収納容器5,5a,5b
を同心円状に配置しているが、両者を平行に対向配置す
る従来のメッキ法や、略矩形断面の反応槽にも適応する
ことができる。
FIG. 11 shows a third embodiment of the present invention,
In this embodiment, a plurality of object storage containers 5, 5a, 5b having similar shapes to each other are provided, and these are arranged concentrically and equidistantly about the electrode tube 48, and the adjacent electrode tubes 48 and The same potential is applied between the processed material storage containers 5 and 5a and the pair of processed material storage containers 5 and 5b, and the chamber 3
A plurality of processing object storage containers 5, 5a, 5b arranged in 6
By doing so, the mass production of plating and the simplification of the structure are attempted. In this case, the object storage containers 5, 5a, 5b
Although they are arranged concentrically, they can also be applied to a conventional plating method in which they are arranged in parallel to each other and a reaction tank having a substantially rectangular cross section.

【0099】図12は本発明の第4の実施形態を示し、
この実施形態は、被処理物収納容器5を縦方向に二つ割
り可能に形成し、それらの基端部を蝶番87を介して回
動可能に連結し、かつその他端部を適宜なクリップで連
結して、前記容器5からの被メッキ物の出し入れを簡便
に行なえるようにしている。
FIG. 12 shows a fourth embodiment of the present invention,
In this embodiment, the to-be-processed object storage container 5 is formed so that it can be divided into two in the vertical direction, and the base end portions thereof are rotatably connected via a hinge 87, and the other end portions are connected by an appropriate clip. In this way, the object to be plated can be easily taken in and out of the container 5.

【0100】なお、前述の実施形態のように電解した電
極物質を他方の電極物質に析出付着する方法は、原理的
に同様な電鋳および陽極酸化皮膜形成法に適用すること
ができ、前述と同様な効果を得られる。また、反応槽に
電解物質と電極物質を収容し、一方の電極物質を電解
し、これを他方の電極物質側で採集する電解法にも、本
発明を適用することが可能であり、そのようにすること
で、例えば金属の電解精製、電解抽出、電解研磨等に適
用することができ、前述と同様な効果を得られる。
The method of depositing and depositing the electrolyzed electrode material on the other electrode material as in the above-described embodiment can be applied to the same electroforming and anodic oxide film forming method in principle. Similar effects can be obtained. Further, the present invention can also be applied to an electrolysis method in which an electrolytic substance and an electrode substance are accommodated in a reaction tank, one electrode substance is electrolyzed, and the other electrode substance is collected. With this, it can be applied to, for example, electrolytic refining of metals, electrolytic extraction, electrolytic polishing, etc., and the same effects as described above can be obtained.

【0101】また、電解物質を収容可能な反応槽に被処
理物を収容し、電解質溶液に含まれる電解物質を前記被
処理物に析出付着し、外部電界を加えない無電解メッキ
や化成処理法にも本発明を適用することが可能であり、
そのようにすることで前述と同様な効果を得られる。
Further, an object to be treated is housed in a reaction tank capable of containing an electrolytic substance, and the electrolytic substance contained in the electrolyte solution is deposited and adhered to the object to be treated, and electroless plating or chemical conversion treatment method without applying an external electric field. The present invention can be applied to
By doing so, the same effect as described above can be obtained.

【0102】[0102]

【発明の効果】以上のように、請求項1の発明は、被処
理物の表面処理時、前記反応槽を含む表面処理流体の循
環経路を連通し、該循環経路に前記表面処理流体を終始
循環させるから、反応槽に表面処理流体を滞留させて表
面処理する方法に比べ、表面処理流体による被処理物の
表面処理、例えば脱脂洗浄や乾燥を高精度かつ速やかに
行なうことができるとともに、被処理物と大気との接触
を回避し、例えば被処理物表面の活性化処理を高精度か
つ確実に行なえ、例えば金属イオンの良好な析出を得ら
れ、電気メッキや多層の重ねメッキに好適している。
As described above, according to the invention of claim 1, during the surface treatment of the object to be treated, the circulation path of the surface treatment fluid including the reaction tank is communicated with the surface treatment fluid throughout the circulation path. Since it circulates, surface treatment of the object to be treated with the surface treatment fluid, such as degreasing cleaning and drying, can be performed with high accuracy and speed, as compared with the method in which the surface treatment fluid is retained in the reaction tank to perform the surface treatment. Avoiding contact between the object to be treated and the atmosphere, for example, activation treatment of the surface of the object to be treated can be performed with high accuracy and reliability, for example, good deposition of metal ions can be obtained, and it is suitable for electroplating and multi-layer overlay plating. There is.

【0103】請求項2の発明は、被処理物の脱脂または
洗浄またはその乾燥時、前記表面処理流体を終始循環さ
せたから、被処理物の脱脂または洗浄またはその乾燥等
の表面活性化処理を高精度かつ速やかに行うことができ
る。請求項3の発明は、前記被処理物の表面処理後、表
面処理流体中の電気化学反応により生成された気体を分
離または除去するようにしたから、前記気体の系内への
混入を防止し、被処理物に対する良好な電気化学反応を
得られるとともに、前記表面処理流体の再生を精度良く
行なうことができる。
According to the second aspect of the present invention, when the object to be treated is degreased or washed or dried, the surface treatment fluid is circulated throughout, so that the surface activation treatment such as degreasing or washing or the drying of the object to be treated is enhanced. It can be done accurately and quickly. According to the invention of claim 3, after the surface treatment of the object to be treated, the gas generated by the electrochemical reaction in the surface treatment fluid is separated or removed, so that the gas is prevented from entering the system. A good electrochemical reaction with respect to the object to be treated can be obtained, and the surface treatment fluid can be regenerated accurately.

【0104】請求項4の発明は、前記被処理物の表面処
理後、前記表面処理流体中の酸素と水素を分離または除
去したから、電気化学反応により生成された酸素と水素
の系内への混入を防止し、被処理物に対する良好な電気
化学反応を得られるとともに、前記表面処理流体の再生
を精度良く行なうことができる。請求項5の発明は、前
記表面処理後の表面処理流体中の酸素と水素とを燃焼し
て水を生成し、該水を分離した前記表面処理流体を前記
循環経路に循環したから、酸素と水素を安全かつ容易に
除去し、酸素と水素並びに水の系内への混入と、その弊
害を未然に防止することができ、また表面処理流体によ
る乾燥を円滑かつ能率良く行なうことができる。
According to the fourth aspect of the invention, after the surface treatment of the object to be treated, the oxygen and hydrogen in the surface treatment fluid are separated or removed, so that the oxygen and hydrogen produced by the electrochemical reaction are introduced into the system. It is possible to prevent contamination, obtain a good electrochemical reaction with respect to the object to be treated, and accurately regenerate the surface treatment fluid. According to the invention of claim 5, oxygen and hydrogen in the surface-treated fluid after the surface treatment are burned to generate water, and the surface-treated fluid obtained by separating the water is circulated in the circulation path. It is possible to safely and easily remove hydrogen, prevent oxygen, hydrogen, and water from being mixed into the system and the adverse effects thereof, and to perform the drying by the surface treatment fluid smoothly and efficiently.

【0105】請求項6の発明は、前記反応槽に前記表面
処理流体と酸洗い溶液または電解液を導入後、前記反応
槽の給排路を遮断し、被処理物の酸洗いまたは電気化学
反応させたから、酸洗い溶液や電解液の移動とその循環
経路への流入を防止し、酸洗いや電気化学反応を安定し
て行なえるとともに、循環経路の腐食やシステムのトラ
ブルを未然に防止することができる。請求項7の発明
は、前記被処理物の酸洗いまたは電気化学反応後、前記
反応槽内の前記表面処理流体を前記循環経路へ循環させ
るとともに、前記酸洗い溶液または電解液を前記表面処
理流体の循環経路から分離させたから、表面処理流体と
酸洗い溶液、電解液等を分けて処理し、それらを合理的
かつ安全に処理し、それらの再生を図ることができる、
According to a sixth aspect of the present invention, after introducing the surface treatment fluid and the pickling solution or the electrolytic solution into the reaction tank, the supply and discharge passages of the reaction tank are shut off, and the object to be treated is pickled or electrochemically reacted. As a result, it is possible to prevent the pickling solution or electrolyte from moving and flowing into the circulation path, to ensure stable pickling and electrochemical reaction, and to prevent corrosion of the circulation path and system troubles in advance. You can In the invention of claim 7, after the pickling or the electrochemical reaction of the object to be treated, the surface treatment fluid in the reaction tank is circulated to the circulation path, and the pickling solution or the electrolytic solution is added to the surface treatment fluid. Since it is separated from the circulation path of, the surface treatment fluid and the pickling solution, the electrolytic solution, etc. can be treated separately, and they can be treated reasonably and safely to regenerate them.

【0106】請求項8の発明は、前記被処理物の酸洗い
または電気化学反応後、その酸洗い溶液または電解液中
の前記表面処理流体を分離し、これを表面処理流体の循
環経路へ還流させたから、酸洗い時または電気化学反応
時、酸洗い溶液や電解液に混入した表面処理流体の有効
利用を図ることができる。請求項9の発明は、前記表面
処理流体が大気圧以上の加圧流体または超臨界若しくは
亜臨界流体であるから、大気圧以上の加圧流体の場合
は、表面処理流体の入手が容易で、システムを安価かつ
安全に製作並びに運転でき、また超臨界若しくは亜臨界
流体の場合は、高い拡散性によって良好な表面処理状態
を得られる効果がある。
According to an eighth aspect of the present invention, after the pickling or electrochemical reaction of the object to be treated, the surface treatment fluid in the pickling solution or the electrolytic solution is separated, and this is refluxed to the circulation route of the surface treatment fluid. Therefore, during the pickling or the electrochemical reaction, the surface treatment fluid mixed in the pickling solution or the electrolytic solution can be effectively used. In the invention of claim 9, since the surface treatment fluid is a pressurized fluid at atmospheric pressure or higher or a supercritical or subcritical fluid, in the case of a pressurized fluid at atmospheric pressure or higher, the surface treatment fluid is easily available, The system can be manufactured and operated inexpensively and safely, and in the case of a supercritical or subcritical fluid, there is an effect that a good surface treatment state can be obtained due to high diffusivity.

【0107】請求項10の発明は、被処理物の表面処理
時、前記反応槽を含む表面処理流体の循環経路を連通
し、該循環経路に前記表面処理流体を終始循環可能にし
たから、反応槽に表面処理流体を滞留させて表面処理す
る方法に比べ、表面処理流体による被処理物の表面処
理、例えば脱脂、洗浄、乾燥を高精度かつ速やかに行な
えるとともに、被処理物と大気との接触を回避し、被処
理物表面の活性処理を高精度かつ確実に行なえ、例えば
金属イオンの良好な析出を得られ、電気メッキや多層の
重ねメッキに好適な効果がある。しかも、使用後の表面
処理流体や処理液を貯留する貯留槽を実質的に廃したか
ら、設備のコンパクト化と低廉化を図れるとともに、表
面処理流体の再生を迅速に行なうことができる。
According to the tenth aspect of the present invention, during the surface treatment of the object to be treated, the circulation route of the surface treatment fluid including the reaction tank is communicated with the circulation route, and the surface treatment fluid can be circulated throughout the reaction. Compared with the method of surface treatment by allowing the surface treatment fluid to stay in the tank, the surface treatment of the object to be treated with the surface treatment fluid, such as degreasing, cleaning, and drying, can be performed with high accuracy and speed, and the object to be treated and the atmosphere It is possible to avoid contact and perform the activation treatment on the surface of the object to be treated with high accuracy and reliability, and obtain good deposition of metal ions, for example, which is suitable for electroplating and multi-layer overplating. Moreover, since the storage tank for storing the surface treatment fluid and the treatment liquid after use is substantially abolished, the equipment can be made compact and inexpensive, and the surface treatment fluid can be quickly regenerated.

【0108】請求項11の発明は、被処理物の脱脂また
は洗浄またはその乾燥時、前記表面処理流体を終始循環
可能にしたから、被処理物の脱脂または洗浄またはその
乾燥等の表面活性処理を高精度かつ速やかに行なうこと
ができる。請求項12の発明は、表面処理流体中の電気
化学反応により生成された気体分離または除去可能にし
たから、前記気体、例えば酸素と水素の系内への混入を
防止し、被処理物に対する良好な電気化学反応を得られ
るとともに、前記表面処理流体の再生を精度良く行なう
ことができる。
According to the eleventh aspect of the present invention, when the object to be treated is degreased or washed or dried, the surface treatment fluid can be circulated all the time. It can be performed with high accuracy and speed. According to the twelfth aspect of the invention, the gas generated by the electrochemical reaction in the surface treatment fluid can be separated or removed, so that the gas, for example, oxygen and hydrogen is prevented from being mixed into the system, which is good for the object to be treated. It is possible to obtain various electrochemical reactions and to accurately regenerate the surface treatment fluid.

【0109】請求項13の発明は、前記循環経路に、表
面処理流体中の酸素と水素を分離または除去可能な反応
器を介挿したから、酸素と水素の系内への混入とその弊
害を未然に防止し、表面処理流体の再生を精度良く行な
うことができる。請求項14の発明は、前記循環経路の
反応器の下流側に水を分離可能な脱水装置を介挿したか
ら、酸素と水素を安全かつ容易に除去し、酸素と水素並
びに水の混入による弊害を未然に防止するとともに、表
面処理流体による乾燥を円滑かつ能率良く行なうことが
できる。
According to the thirteenth aspect of the present invention, since a reactor capable of separating or removing oxygen and hydrogen in the surface treatment fluid is inserted in the circulation path, the mixture of oxygen and hydrogen into the system and its adverse effects are obviated. Therefore, the surface treatment fluid can be regenerated accurately. In the invention of claim 14, since a dehydrator capable of separating water is inserted in the downstream side of the reactor of the circulation path, oxygen and hydrogen can be safely and easily removed, and an adverse effect due to mixing of oxygen, hydrogen and water can be obtained. It is possible to prevent this from occurring and to dry the surface treatment fluid smoothly and efficiently.

【0110】請求項15の発明は、前記反応槽に前記表
面処理流体と酸洗い溶液または電解液を導入可能に設
け、これらを前記反応槽に導入後、該反応槽の給排路を
遮断可能に設けたから、酸洗い溶液や電解液の移動とそ
の循環経路への流入を防止し、酸洗いや電気化学反応を
安定して行なえるとともに、循環経路の腐食やシステム
のトラブルを未然に防止することができる。請求項16
の発明は、前記被処理物の酸洗いまたは電気化学反応
後、前記反応槽内の前記表面処理流体を前記循環経路へ
循環可能に設け、かつ前記酸洗い溶液または電解液を前
記表面処理流体の循環経路から分離可能にしたから、表
面処理流体と、酸洗い溶液、電解液とを分けて処理し、
それらを合理的かつ安全に処理し、それらの再生を図る
ことができる。
According to a fifteenth aspect of the present invention, the surface treatment fluid and the pickling solution or the electrolytic solution can be introduced into the reaction tank, and after introducing these into the reaction tank, the supply / discharge passage of the reaction tank can be cut off. Since it is installed in the equipment, it prevents the pickling solution or electrolytic solution from moving and flowing into the circulation path, which enables stable pickling and electrochemical reaction, and prevents corrosion of the circulation path and system troubles. be able to. Claim 16
In the invention, after the pickling or the electrochemical reaction of the object to be treated, the surface treatment fluid in the reaction tank is circulated to the circulation path, and the pickling solution or the electrolytic solution is added to the surface treatment fluid. Since it can be separated from the circulation path, the surface treatment fluid, the pickling solution, and the electrolytic solution are treated separately,
It is possible to process them reasonably and safely and to regenerate them.

【0111】請求項17の発明は、前記反応槽の排出路
に、酸洗い溶液または電解液中の表面処理流体を分離可
能な処理液回収槽を介挿し、該回収槽を前記表面処理流
体の循環経路に連通したから、酸洗い時または電気化学
反応時、酸洗い溶液や電解液に混入した表面処理流体の
有効利用を図ることができる。請求項18の発明は、前
記表面処理流体が、大気圧以上の加圧流体または超臨界
若しくは亜臨界流体であるから、大気圧以上の加圧流体
の場合は、表面処理流体の入手が容易で、システムを安
価かつ安全に製作並びに運転でき、また超臨界若しくは
亜臨界流体の場合は、高い拡散性によって良好な表面処
理状態を得られる効果がある。
According to a seventeenth aspect of the present invention, a treatment liquid recovery tank capable of separating the surface treatment fluid in the pickling solution or the electrolytic solution is inserted into the discharge passage of the reaction tank, and the recovery tank is connected to the surface treatment fluid. Since the fluid is connected to the circulation path, it is possible to effectively utilize the surface treatment fluid mixed in the pickling solution or the electrolytic solution during pickling or electrochemical reaction. In the invention of claim 18, the surface treatment fluid is a pressurized fluid at atmospheric pressure or higher, or a supercritical or subcritical fluid. Therefore, in the case of a pressurized fluid at atmospheric pressure or higher, the surface treatment fluid is easily available. The system can be manufactured and operated inexpensively and safely, and in the case of a supercritical or subcritical fluid, there is an effect that a good surface treatment state can be obtained due to high diffusivity.

【0112】請求項19の発明は、前記反応槽を複数設
け、これらの反応槽を前記循環経路に連通し、前記反応
槽に大気圧以上の加圧流体または超臨界若しくは亜臨界
流体と、酸洗い溶液または電解液とを順次導入し、各反
応槽で被処理物の脱脂洗浄と、酸洗いと、乾燥と、電気
メッキ、乾燥とを順次実行可能にする一方、相隣接する
反応槽を連通し、使用流体を給排可能にするとともに、
相前後する工程を処理する反応槽において、先行反応槽
の処理後、その使用流体を後行の反応槽に供給可能にし
たから、使用表面処理流体や使用酸溶液等を各反応槽で
順次使用することで、その有効利用を図れるとともに、
被処理物の表面処理や各処理工程を合理的に行なえ、そ
の量産化を図ることができる。
According to a nineteenth aspect of the present invention, a plurality of the reaction tanks are provided, the reaction tanks are connected to the circulation path, and a pressurized fluid or a supercritical or subcritical fluid at an atmospheric pressure or higher is added to the reaction tank and an acid. A cleaning solution or an electrolytic solution is sequentially introduced to enable degreasing cleaning, pickling, drying, electroplating, and drying of the object to be processed in each reaction tank, while connecting adjacent reaction tanks. In addition to being able to supply and discharge the fluid used,
In the reaction tank that processes the successive steps, after the processing of the preceding reaction tank, the used fluid can be supplied to the subsequent reaction tank, so the used surface treatment fluid, the used acid solution, etc. are used sequentially in each reaction tank By doing so, while making effective use of it,
The surface treatment of the object to be treated and each treatment step can be reasonably performed, and the mass production can be achieved.

【0113】請求項20の発明は、蓋体に単一または複
数の治具を着脱可能に取り付け、蓋体と治具の一体化を
促し、それらの取り扱いの利便を図るとともに、治具お
よび蓋体並びに槽本体のメンテナンスを容易に行なうこ
とができる。請求項21の発明は、前記蓋体と治具とを
一体に昇降可能に構成したから、それらの槽本体への出
し入れを容易かつ速やかに行なうことができる。請求項
22の発明は、前記槽本体のチャンバの横断面形状と、
前記治具の横断面形状とを互いに相似形状に形成し、か
つこれらを同心状に配置したから、槽本体と治具の製作
の合理化とコンパクト化を図れるとともに、多数の被処
理物を効率良く収容かつ処理可能にし、その量産化を図
ることができる。請求項23の発明は、前記槽本体のチ
ャンバの横断面形状と、前記治具の横断面形状とを円形
に形成し、かつこれらを同心円状に配置したから、多数
の被処理物を効率良く収容かつ処理可能にし、その量産
化を図れるとともに、表面処理流体や使用溶液等の撹拌
を精度良く行なうことができる。
According to the twentieth aspect of the present invention, a single or a plurality of jigs are detachably attached to the lid body to promote the integration of the lid body and the jigs, and to facilitate the handling of them and to make the jigs and the lids. The body and the tank body can be easily maintained. According to the twenty-first aspect of the invention, the lid and the jig can be integrally lifted and lowered, so that they can be easily and quickly taken in and out of the tank body. According to a twenty-second aspect of the invention, a cross-sectional shape of the chamber of the tank body is
Since the cross-sectional shape of the jig is formed to be similar to each other and they are arranged concentrically, the manufacturing of the tank body and the jig can be rationalized and made compact, and a large number of objects can be efficiently processed. It can be housed and processed, and its mass production can be achieved. In the invention of claim 23, since the cross-sectional shape of the chamber of the tank body and the cross-sectional shape of the jig are formed in a circular shape and these are arranged concentrically, a large number of objects to be processed can be efficiently processed. It can be housed and treated, mass production thereof can be achieved, and the surface treatment fluid, the used solution, and the like can be agitated accurately.

【0114】請求項24の発明は、前記治具を複数に区
画し、それらを回動可能に連結したから、治具の開閉を
容易に行なえ、治具に対する被処理物の着脱を簡便に行
なうことができる。請求項25の発明は、前記蓋体に前
記治具を通電可能な電極を取り付けたから、蓋体と治具
と電極の一体化を促し、それらの取り扱いの利便とメン
テナンスの容易化を図ることができる。請求項26の発
明は、相隣接して配置した治具間に同電位を印加したか
ら、各治具に装着した被処理物に対し、電気メッキ等の
電気化学反応の一様化を図れ、各被処理物に対し均一な
電気メッキ等の電気化学反応を得られる効果がある。
According to the twenty-fourth aspect of the present invention, since the jig is divided into a plurality of parts and they are rotatably connected to each other, the jig can be easily opened and closed, and the object to be processed can be easily attached to and detached from the jig. be able to. According to the twenty-fifth aspect of the present invention, since the lid is provided with an electrode capable of energizing the jig, integration of the lid, the jig and the electrode is promoted, and the convenience of handling them and the ease of maintenance can be achieved. it can. According to the twenty-sixth aspect of the present invention, since the same electric potential is applied between the jigs arranged adjacent to each other, the electrochemical reaction such as electroplating can be made uniform with respect to the object to be processed attached to each jig, There is an effect that a uniform electrochemical reaction such as electroplating can be obtained for each object to be treated.

【0115】請求項27の発明は、前記チャンバの中心
に電極を配置したから、各治具の電界強度を一様に設定
し、該治具に装着した被処理物に対し、均一な電気メッ
キ等の電気化学反応を得られる効果がある。請求項28
の発明は、前記蓋体の中心に前記撹拌手段を回転可能な
撹拌軸を取り付け、該撹拌軸の外側に前記電極を同軸状
に配置したから、蓋体と治具と電極と撹拌手段の一体化
を促し、それらの取り扱いの利便とメンテナンスの容易
化を図ることができる。
According to the twenty-seventh aspect of the present invention, since the electrode is arranged at the center of the chamber, the electric field strength of each jig is set to be uniform, and the object to be processed mounted on the jig is uniformly electroplated. There is an effect that an electrochemical reaction such as can be obtained. Claim 28
In the invention, since the stirring shaft capable of rotating the stirring means is attached to the center of the lid, and the electrode is coaxially arranged outside the stirring shaft, the lid, the jig, the electrode and the stirring means are integrated. The convenience of handling them and the ease of maintenance can be promoted.

【0116】請求項29の発明は、前記反応槽に大気圧
以上の加圧流体または超臨界若しくは亜臨界流体と、酸
洗い溶液と、電解液とを順次導入し、被処理物の脱脂洗
浄と、酸洗いと、乾燥と、電気メッキとを順次実行可能
にし、相隣接する反応槽を連通し、使用流体を給排可能
にするとともに、相前後する工程を処理する反応槽にお
いて、先行反応槽の処理後、その使用流体を後行の反応
槽に供給可能にしたから、使用表面処理流体や使用酸溶
液等を各反応槽で順次使用することで、その有効利用を
図れるとともに、被処理物の表面処理や各処理工程を合
理的に行なえ、その量産化を図ることができる。
In a twenty-ninth aspect of the present invention, a pressurized fluid having a pressure equal to or higher than atmospheric pressure or a supercritical or subcritical fluid, an acid pickling solution, and an electrolytic solution are sequentially introduced into the reaction tank to degrease and wash the object to be treated. , Pickling, drying, and electroplating can be sequentially performed, adjacent reaction tanks can be connected to each other to supply and discharge the fluid to be used, and the preceding reaction tanks can be used to process successive steps. After the treatment, the use fluid can be supplied to the subsequent reaction tanks.By using the surface treatment fluid and the acid solution, etc., used in each reaction tank one after another, the effective use of the surface treatment fluid and the object to be treated can be achieved. It is possible to rationally perform the surface treatment and each treatment step, and to mass-produce the same.

【0117】請求項30の発明は、前記電極を不溶性部
材で構成するとともに、前記反応槽に超臨界若しくは亜
臨界流体と、電解液とを導入し、被処理物を電気化学反
応可能にしたから、高い拡散性を有する超臨界若しくは
亜臨界流体の下で、被処理物に対する金属イオンの析出
を良好かつ一様に行なえるとともに、電極の減耗を解消
し、電極の取り換え等による中断がなく、前記電気化学
反応の生産性を向上することができる。
According to the thirtieth aspect of the present invention, the electrode is made of an insoluble member, and a supercritical or subcritical fluid and an electrolytic solution are introduced into the reaction tank to enable an electrochemical reaction of the object to be treated. In a supercritical or subcritical fluid having a high diffusivity, metal ions can be deposited satisfactorily and uniformly on the object to be processed, the wear of the electrode is eliminated, and there is no interruption due to replacement of the electrode, etc. The productivity of the electrochemical reaction can be improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明装置の正面図である。FIG. 1 is a front view of a device of the present invention.

【図2】本発明装置の内部状況を示す正面図である。FIG. 2 is a front view showing an internal state of the device of the present invention.

【図3】図1の左側面図で、本発明装置の内部状況を示
している。
FIG. 3 is a left side view of FIG. 1, showing an internal state of the device of the present invention.

【図4】図1の平面図で、本発明装置の内部状況を示し
ている。
FIG. 4 is a plan view of FIG. 1, showing an internal state of the device of the present invention.

【図5】本発明装置のフロ−を示す概要図である。FIG. 5 is a schematic view showing a flow of the device of the present invention.

【図6】本発明装置に適用した反応槽を拡大して示す断
面図で、反応槽に治具を取り付けた蓋体を装着し、これ
らをクランプリングでロックして、被処理物の電気化学
反応に備えている状況を示している。
FIG. 6 is an enlarged cross-sectional view showing a reaction tank applied to the device of the present invention, in which a lid body having a jig attached thereto is mounted on the reaction tank, and these are locked by a clamp ring, and the electrochemical reaction of the object to be treated is performed. It shows the situation in preparation for the reaction.

【図7】図6のA−A線に沿う断面図で、反応槽内の治
具と電極との通電状況を若干縮小して図示している。
FIG. 7 is a cross-sectional view taken along the line AA of FIG. 6, showing the state of energization between the jig and the electrodes in the reaction tank slightly reduced.

【図8】本発明装置に適用した反応槽の平面図で、電極
とモ−タを省略し、蓋体とクランプリングとのロック直
前の開状態を示している。
FIG. 8 is a plan view of a reaction tank applied to the apparatus of the present invention, showing an open state immediately before locking of the lid and the clamp ring with the electrodes and the motor omitted.

【図9】本発明装置に適用した蓋体の底面図である。FIG. 9 is a bottom view of a lid body applied to the device of the present invention.

【図10】本発明の第2の実施形態の要部を示す断面図
で、反応槽内の治具と電極との極性を変えた通電状態を
示している。
FIG. 10 is a cross-sectional view showing the main parts of the second embodiment of the present invention, showing an energized state in which the polarities of the jig and the electrodes in the reaction tank are changed.

【図11】本発明の第3の実施形態の要部を示す断面図
で、反応槽内に電極を中心に複数の治具を同心円状に配
置し、その通電状況を示している。
FIG. 11 is a cross-sectional view showing a main part of a third embodiment of the present invention, in which a plurality of jigs are arranged concentrically around an electrode in a reaction tank, and the current supply state is shown.

【図12】本発明の第4の実施形態の要部を示す平面図
で、二つ割りに構成した治具の状況を示している。
FIG. 12 is a plan view showing an essential part of a fourth embodiment of the present invention, showing a situation of a jig configured in two.

【符号の説明】 4 反応槽 5 治具(被処理物収納容器) 6 蓋体 11 分離槽(処理液回収槽) 14 分離槽 24 脱水装置(脱水カラム) 25 槽本体 36 チャンバ 42 撹拌軸 43 撹拌手段(ファン) 45,46 電極(電極棒) 48 電極(電極管) 78 反応器[Explanation of symbols] 4 reaction tanks 5 jigs (processing object storage container) 6 lid 11 Separation tank (treatment liquid recovery tank) 14 Separation tank 24 Dehydrator (dehydration column) 25 tank body 36 chambers 42 stirring shaft 43 Stirring means (fan) 45,46 electrode (electrode rod) 48 electrodes (electrode tube) 78 reactor

───────────────────────────────────────────────────── フロントページの続き (72)発明者 曽根 正人 東京都小金井市本町3−11−8 (72)発明者 佐藤 信義 大阪府大阪市北区堂島浜1丁目2番6号 旭エンジニアリング株式会社内   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Masato Sone             3-11-8 Honmachi, Koganei-shi, Tokyo (72) Inventor Nobuyoshi Sato             1-2-6 Dojimahama, Kita-ku, Osaka-shi, Osaka Prefecture             Asahi Engineering Co., Ltd.

Claims (30)

【特許請求の範囲】[Claims] 【請求項1】 被処理物を収容可能な反応槽に表面処理
流体を導入し、前記被処理物の表面処理後、前記表面処
理流体を分離槽へ導入し、汚染物を分離した表面処理流
体を前記反応槽へ循環する被処理物の表面処理方法にお
いて、前記被処理物の表面処理時、前記反応槽を含む表
面処理流体の循環経路を連通し、該循環経路に前記表面
処理流体を終始循環させることを特徴とする被処理物の
表面処理方法。
1. A surface treatment fluid in which a surface treatment fluid is introduced into a reaction tank capable of accommodating an object to be treated, and after the surface treatment of the object to be treated, the surface treatment fluid is introduced into a separation tank to separate contaminants. In the method of surface-treating an object to be treated, which circulates into the reaction tank, during the surface treatment of the object to be treated, a circulation path of the surface-treatment fluid including the reaction tank is communicated with the surface-treatment fluid throughout the circulation path. A method for treating the surface of an object to be treated, which comprises circulating the object.
【請求項2】 被処理物の脱脂または洗浄またはその乾
燥時、前記表面処理流体を終始循環させる請求項1記載
の被処理物の表面処理方法。
2. The surface treatment method for the object to be treated according to claim 1, wherein the surface treatment fluid is constantly circulated during degreasing or cleaning of the object to be treated or drying thereof.
【請求項3】 前記被処理物の表面処理後、表面処理流
体中の電気化学反応により生成された気体を分離または
除去する請求項1記載の被処理物の表面処理方法。
3. The surface treatment method for an object to be treated according to claim 1, wherein after the surface treatment of the object, the gas generated by the electrochemical reaction in the surface treatment fluid is separated or removed.
【請求項4】 前記被処理物の表面処理後、前記表面処
理流体中の酸素と水素を分離または除去する請求項3記
載の被処理物の表面処理方法。
4. The surface treatment method for an object to be treated according to claim 3, wherein oxygen and hydrogen in the surface treatment fluid are separated or removed after the surface treatment of the object to be treated.
【請求項5】 前記表面処理後の表面処理流体中の酸素
と水素とを燃焼して水を生成し、該水を分離した前記表
面処理流体を前記循環経路に循環する請求項4記載の被
処理物の表面処理方法。
5. The object according to claim 4, wherein oxygen and hydrogen in the surface-treated fluid after the surface treatment are burned to generate water, and the surface-treated fluid separated from the water is circulated in the circulation path. Surface treatment method for treated objects.
【請求項6】 前記反応槽に前記表面処理流体と酸洗い
溶液または電解液を導入後、前記反応槽の給排路を遮断
し、被処理物の酸洗いまたは電気化学反応する請求項1
記載の被処理物の表面処理方法。
6. The surface treatment fluid and the pickling solution or the electrolytic solution are introduced into the reaction tank, and then the supply / discharge passage of the reaction tank is shut off to carry out pickling or electrochemical reaction of the object to be treated.
A method for surface treatment of an object to be treated as described above.
【請求項7】 前記被処理物の酸洗いまたは電気化学反
応後、前記反応槽内の前記表面処理流体を前記循環経路
へ循環させるとともに、前記酸洗い溶液または電解液を
前記表面処理流体の循環経路から分離させる請求項6記
載の被処理物の表面処理方法。
7. After pickling or electrochemical reaction of the object to be treated, the surface treatment fluid in the reaction tank is circulated to the circulation path, and the pickling solution or electrolytic solution is circulated in the surface treatment fluid. The method for surface treatment of an object to be treated according to claim 6, wherein the surface treatment method is separated from the path.
【請求項8】 前記被処理物の酸洗いまたは電気化学反
応後、その酸洗い溶液または電解液中の前記表面処理流
体を分離し、これを表面処理流体の循環経路へ還流させ
る請求項7記載の被処理物の表面処理方法。
8. The method according to claim 7, wherein after the pickling or electrochemical reaction of the object to be treated, the surface treatment fluid in the pickling solution or the electrolytic solution is separated and refluxed to the circulation path of the surface treatment fluid. Surface treatment method of the object to be treated.
【請求項9】 前記表面処理流体が、大気圧以上の加圧
流体または超臨界若しくは亜臨界流体である請求項1記
載の被処理物の表面処理方法。
9. The surface treatment method for an object to be treated according to claim 1, wherein the surface treatment fluid is a pressurized fluid at atmospheric pressure or higher, or a supercritical or subcritical fluid.
【請求項10】 内部に被処理物を収容し、かつ表面処
理流体を導入可能な密閉可能な反応槽と、該反応槽から
被処理物の表面処理後の表面処理流体を移送され、かつ
この表面処理流体中の汚染物を分離可能な分離槽とを備
え、前記汚染物を分離した表面処理流体を前記反応槽へ
循環可能にした被処理物の表面処理装置において、前記
被処理物の表面処理時、前記反応槽を含む表面処理流体
の循環経路を連通し、該循環経路に前記表面処理流体を
終始循環可能にしたことを特徴とする被処理物の表面処
理装置。
10. A reaction vessel capable of accommodating an object to be treated and introducing a surface treatment fluid therein, and a surface treatment fluid after the surface treatment of the object to be treated is transferred from the reaction vessel, and In a surface treatment apparatus for an object to be treated, comprising a separation tank capable of separating contaminants in the surface treatment fluid, and allowing the surface treatment fluid from which the contaminant has been separated to be circulated to the reaction tank, the surface of the object to be treated A surface treatment apparatus for an object to be treated, characterized in that a circulation path of a surface treatment fluid including the reaction tank is communicated during processing, and the surface treatment fluid can be circulated throughout the circulation path.
【請求項11】 被処理物の脱脂または洗浄またはその
乾燥時、前記表面処理流体を終始循環可能にした請求項
10記載の被処理物の表面処理装置。
11. The surface treatment apparatus for the object to be treated according to claim 10, wherein the surface treatment fluid can be circulated throughout the time of degreasing or cleaning the object to be treated or drying the same.
【請求項12】 表面処理流体中の電気化学反応により
生成された気体を分離または除去可能にした請求項10
記載の被処理物の表面処理装置。
12. The gas produced by an electrochemical reaction in the surface treatment fluid can be separated or removed.
A surface treatment apparatus for an object to be treated as described above.
【請求項13】 前記循環経路に、表面処理流体中の酸
素と水素を分離または除去可能な反応器を介挿した請求
項12記載の被処理物の表面処理装置。
13. The surface treatment apparatus for an object to be treated according to claim 12, wherein a reactor capable of separating or removing oxygen and hydrogen in the surface treatment fluid is inserted in the circulation path.
【請求項14】 前記循環経路の反応器の下流側に水を
分離可能な脱水装置を介挿した請求項13記載の被処理
物の表面処理装置。
14. The surface treatment apparatus for an object to be treated according to claim 13, wherein a dehydrator capable of separating water is inserted downstream of the reactor in the circulation path.
【請求項15】 前記反応槽に前記表面処理流体と酸洗
い溶液または電解液を導入可能に設け、これらを前記反
応槽に導入後、該反応槽の給排路を遮断可能に設けた請
求項10記載の被処理物の表面処理装置。
15. The reaction tank is provided with the surface treatment fluid and a pickling solution or an electrolytic solution so as to be introduced, and after introducing these into the reaction tank, a supply / discharge path of the reaction tank can be blocked. 10. The surface treatment apparatus for the article to be treated according to 10.
【請求項16】 前記被処理物の酸洗いまたは電気化学
反応後、前記反応槽内の前記表面処理流体を前記循環経
路へ循環可能に設け、かつ前記酸洗い溶液または電解液
を前記表面処理流体の循環経路から分離可能にした請求
項15記載の被処理物の表面処理装置。
16. After pickling or electrochemical reaction of the object to be treated, the surface treatment fluid in the reaction tank is circulated to the circulation path, and the pickling solution or electrolytic solution is added to the surface treatment fluid. 16. The surface treatment apparatus for an object to be treated according to claim 15, wherein the surface treatment apparatus can be separated from the circulation path.
【請求項17】 前記反応槽の排出路に、酸洗い溶液ま
たは電解液中の表面処理流体を分離可能な処理液回収槽
を介挿し、該回収槽を前記表面処理流体の循環経路に連
通した請求項10記載の被処理物の表面処理装置。
17. A treatment liquid recovery tank capable of separating the surface treatment fluid in the pickling solution or the electrolytic solution is inserted into the discharge passage of the reaction tank, and the collection tank is connected to the circulation passage of the surface treatment fluid. The surface treatment apparatus for an object to be treated according to claim 10.
【請求項18】 前記表面処理流体が、大気圧以上の加
圧流体または超臨界若しくは亜臨界流体である請求項1
0記載の被処理物の表面処理装置。
18. The surface treatment fluid is a pressurized fluid at atmospheric pressure or higher, or a supercritical or subcritical fluid.
0. The surface treatment apparatus for the object to be treated according to 0.
【請求項19】 前記反応槽を複数設け、これらの反応
槽を前記循環経路に連通し、前記反応槽に大気圧以上の
加圧流体または超臨界若しくは亜臨界流体と、酸洗い溶
液または電解液とを順次導入し、各反応槽で被処理物の
脱脂洗浄と、酸洗いと、乾燥と、電気メッキ、乾燥とを
順次実行可能にする一方、相隣接する反応槽を連通し、
使用流体を給排可能にするとともに、相前後する工程を
処理する反応槽において、先行反応槽の処理後、その使
用流体を後行の反応槽に供給可能にした請求項15記載
の被処理物の表面処理装置。
19. A plurality of said reaction tanks are provided, these reaction tanks are connected to said circulation path, and pressurized fluid or supercritical or subcritical fluid at atmospheric pressure or more, and pickling solution or electrolyte solution are provided in said reaction tank. Are sequentially introduced, and degreasing and cleaning of the object to be treated in each reaction tank, pickling, drying, electroplating, and drying can be sequentially performed, while connecting adjacent reaction tanks,
16. The object to be treated according to claim 15, wherein a fluid to be used can be supplied and discharged, and in a reaction tank for treating successive steps, the fluid to be used can be supplied to a subsequent reaction tank after the treatment of the preceding reaction tank. Surface treatment equipment.
【請求項20】 内部に被処理物を装着可能な治具と撹
拌手段とを収容し、かつ前記被処理物の表面処理流体を
給排可能な槽本体と、該槽本体を密閉可能な蓋体とを備
えた反応槽を有する被処理物の表面処理装置において、
前記蓋体に単一または複数の前記治具を着脱可能に取り
付けたことを特徴とする被処理物の表面処理装置。
20. A tank main body, which accommodates a jig capable of mounting an object to be processed and a stirring means, and which can supply and discharge the surface treatment fluid of the object, and a lid capable of sealing the tank main body. In a surface treatment apparatus for an object to be treated having a reaction tank equipped with a body,
A surface treatment apparatus for an object to be treated, wherein one or a plurality of the jigs are detachably attached to the lid.
【請求項21】 前記蓋体と治具とを一体に昇降可能に
構成した請求項20記載の被処理物の表面処理装置。
21. The surface treatment apparatus for an object to be treated according to claim 20, wherein the lid and the jig can be integrally raised and lowered.
【請求項22】 前記槽本体のチャンバの横断面形状
と、前記治具の横断面形状とを互いに相似形状に形成
し、かつこれらを同心状に配置した請求項20記載の被
処理物の表面処理装置。
22. The surface of the object to be treated according to claim 20, wherein the cross-sectional shape of the chamber of the tank main body and the cross-sectional shape of the jig are formed in a similar shape, and these are arranged concentrically. Processing equipment.
【請求項23】 前記槽本体のチャンバの横断面形状
と、前記治具の横断面形状とを円形に形成し、かつこれ
らを同心円状に配置した請求項22記載の被処理物の表
面処理装置。
23. The surface treating apparatus for an object to be treated according to claim 22, wherein the cross-sectional shape of the chamber of the tank body and the cross-sectional shape of the jig are formed in a circular shape, and these are arranged concentrically. .
【請求項24】 前記治具を複数に区画し、それらを回
動可能に連結した請求項22または請求項23記載の被
処理物の表面処理装置。
24. The surface treating apparatus for the object to be treated according to claim 22, wherein the jig is divided into a plurality of pieces, and the jigs are rotatably connected to each other.
【請求項25】 前記蓋体に前記治具を通電可能な電極
を取り付けた請求項20または請求項23記載の被処理
物の表面処理装置。
25. The surface treatment apparatus for an object to be treated according to claim 20, wherein an electrode capable of energizing the jig is attached to the lid body.
【請求項26】 相隣接して配置した治具間に同電位を
印加した請求項20または請求項23記載の被処理物の
表面処理装置。
26. The surface treatment apparatus for an object to be treated according to claim 20 or 23, wherein the same potential is applied between jigs arranged adjacent to each other.
【請求項27】 前記チャンバの中心に電極を配置した
請求項20または請求項23記載の被処理物の表面処理
装置。
27. The surface treatment apparatus for an object to be treated according to claim 20, wherein an electrode is arranged at the center of the chamber.
【請求項28】 前記蓋体の中心に前記撹拌手段を回転
可能な撹拌軸を取り付け、該撹拌軸の外側に前記電極を
同軸状に配置した請求項20または請求項23記載の被
処理物の表面処理装置。
28. The object to be treated according to claim 20 or 23, wherein a stirring shaft capable of rotating the stirring means is attached to the center of the lid, and the electrode is coaxially arranged outside the stirring shaft. Surface treatment equipment.
【請求項29】 前記反応槽に、大気圧以上の加圧流体
または超臨界若しくは亜臨界流体と、酸洗い溶液と、電
解液とを順次導入し、被処理物の脱脂洗浄と、酸洗い
と、乾燥と、電気メッキとを順次実行可能にした請求項
20記載の被処理物の表面処理装置。
29. A pressurized fluid at atmospheric pressure or higher or a supercritical or subcritical fluid, a pickling solution, and an electrolytic solution are sequentially introduced into the reaction tank to perform degreasing cleaning and pickling of an object to be treated. The surface treatment apparatus for an object to be treated according to claim 20, wherein the drying, the electroplating, and the electroplating can be sequentially performed.
【請求項30】 前記電極を不溶性部材で構成するとと
もに、前記反応槽に超臨界若しくは亜臨界流体と、電解
液とを導入し、被処理物を電気メッキ可能にした請求項
20記載の被処理物の表面処理装置。
30. The object to be processed according to claim 20, wherein the electrode is made of an insoluble member, and a supercritical or subcritical fluid and an electrolytic solution are introduced into the reaction tank to enable electroplating of the object to be processed. Surface treatment equipment for objects.
JP2001348787A 2001-11-14 2001-11-14 Surface treatment method and treatment apparatus for workpiece Expired - Lifetime JP4745571B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2001348787A JP4745571B2 (en) 2001-11-14 2001-11-14 Surface treatment method and treatment apparatus for workpiece
PCT/JP2002/011203 WO2003042434A1 (en) 2001-11-14 2002-10-29 Method and device for surface treatment of treated object
EP02777985A EP1445353A4 (en) 2001-11-14 2002-10-29 Method and device for surface treatment of treated object
US10/416,678 US7323096B2 (en) 2001-11-14 2002-10-29 Method for treating the surface of object and apparatus thereof
TW091133045A TWI232896B (en) 2001-11-14 2002-11-11 Surface treating method of object to be treated and treatment apparatus thereof
US11/981,136 US7857952B2 (en) 2001-11-14 2007-10-31 Method for treating the surface of object and apparatus thereof

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JP2006223000A Division JP4404884B2 (en) 2006-08-18 2006-08-18 Surface treatment equipment for workpieces

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010202979A (en) * 2010-04-26 2010-09-16 Yoshida Hideo Plated article and plating method
KR101614307B1 (en) * 2014-08-14 2016-04-22 대원강업주식회사 Surface treatment system and its control method
CN113275306A (en) * 2021-04-19 2021-08-20 龙岩市华研活性炭科技有限公司 Dynamic rotational flow active carbon pickling machine

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010202979A (en) * 2010-04-26 2010-09-16 Yoshida Hideo Plated article and plating method
KR101614307B1 (en) * 2014-08-14 2016-04-22 대원강업주식회사 Surface treatment system and its control method
CN113275306A (en) * 2021-04-19 2021-08-20 龙岩市华研活性炭科技有限公司 Dynamic rotational flow active carbon pickling machine

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