JP2003143949A - Artificial cultivation apparatus of mushroom using two or more temperature-regulating media - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an artificial cultivation apparatus of a mushroom by which the cultivation period is shortened and the yield is increased, and which can be operated by a little consumption of power. SOLUTION: This artificial cultivation apparatus by which the cultivation is carried out by putting a cultivation container filled with a medium for the mushroom in an atmosphere suitable for the cultivation of the mushroom, is constituted of a medium temperature-controller using a liquid temperature- controlling medium for cooling the medium packed in the cultivation container from the periphery wall of the cultivation container, and a carpophore temperature-controller using a gaseous temperature-controlling medium for cooling the carpophore emerged from the medium.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mushroom artificial cultivation device, and more particularly to a mushroom artificial cultivation device for controlling the temperature of a cultivation environment suitable for a mushroom to be cultivated.

[0002]

2. Description of the Related Art Conventionally, this type of mushroom artificial cultivating apparatus is not limited to a rack in which a culture bottle filled with a medium is placed and stored in a container or the like, and the temperature, humidity and carbon dioxide concentration of the entire cultivation room are controlled. It is used for the purpose of maintaining. Mushrooms release carbon dioxide and heat to the outside due to their life activity,
It has the property of preferring a humid environment. Therefore, the environment maintenance device used for artificial cultivation of mushrooms is best suited for growing mushrooms, cooling means for the entire cultivation room to prevent temperature rise due to heat generation, ventilation means for not increasing carbon dioxide concentration. And a humidifying means for providing a sufficient humidity.

As a conventional means for maintaining the environment of the cultivation room, for example, as described in claims 1 and 2 of JP-A-5-76243, an air control mechanism,
An environment maintenance device for a cultivation room has been proposed which includes a humidifier mechanism, a fan, a ventilation mechanism, and a control mechanism. The method disclosed in this prior art document controls the carbon dioxide concentration by introducing outside air into the cultivation room using a ventilation mechanism, and combines the air control mechanism, the humidifier mechanism, and each component of the fan,
By controlling them optimally by the control mechanism, the whole cultivation room was maintained in an environment suitable for mushroom growth.

The first problem in the prior art is that the cultivation period is long and the mushroom production cost is high. The reason is that in the culturing process, the temperature of the cultivation container, which rises due to the heat of the medium, is maintained at an optimum value, and therefore the temperature is controlled so that the temperature of the central part of the cultivation container, which becomes the highest temperature, does not exceed the optimum cultivation temperature. . Since air with a low specific heat is used as the cooling medium for this temperature control, the efficiency of heat exchange through the outer wall of the cultivation container is reduced, and therefore the temperature of the cooling medium is set to a temperature considerably lower than the optimum culture temperature. To be done. As a result, temperature unevenness occurs in which the culture medium temperature is below the optimum culture temperature from the center of the cultivation container toward the outer wall, and in the vicinity of the outer wall, the culture temperature is significantly lower than the optimum culture temperature, and the culture period is prolonged. Therefore, the cultivation cycle was lengthened and the production efficiency was inevitably lowered.

The second problem is that a cooling device for cooling the heat generated in the culturing process requires a large amount of electric power. The reason is that air is used as a cooling medium to control the temperature of the entire large-volume cultivation room, so that unnecessary heat exchange with the outside is performed through the walls, floor, ceiling, and doors of the cultivation room. It is also for cooling to a space that is not necessary for the growth of mushrooms, such as a passage in the cultivation room, under the rack, and dead space on the rack near the ceiling. Furthermore, it is necessary to maintain the carbon dioxide concentration in the cultivation room within a predetermined range. Therefore, in order to adjust the carbon dioxide concentration, it is necessary to exhaust the cooling air, which is the cooling medium, to the outside of the room, which causes a wasteful heat loss.

[0006] The third problem is that the cost of the air conditioning mechanism and the humidifying mechanism is high. The reason is that a large-capacity cooling device and a humidifier are required to maintain an environment suitable for growing mushrooms while balancing the temperature, humidity, and carbon dioxide concentration of the whole cultivation room in the culture process. .

[0007] The fourth problem is that it is difficult to increase the yield of mushrooms. The reason is that the culture container after the completion of the culture step is placed in low-temperature cooling air suitable for fruiting body growth, so that the medium is placed in a temperature environment different from the appropriate temperature of the medium.

[0008]

SUMMARY OF THE INVENTION A first object of the present invention is to provide an artificial mushroom cultivating device capable of shortening the culture period and reducing the production cost. Another object of the present invention is to provide an artificial mushroom cultivating device provided with an environment maintaining means that can be operated with low power consumption. Still another object of the present invention is to provide a small-sized and inexpensive artificial cultivating apparatus in comparison with the cultivation scale. Still another object of the present invention is to provide an artificial mushroom cultivation device provided with an environment maintaining means for increasing the yield of mushrooms per unit volume of medium.

[0009]

SUMMARY OF THE INVENTION An object of the present invention is to fill a cultivation container in a mushroom artificial cultivation apparatus in which a cultivation container filled with a medium for mushrooms is placed in an atmosphere suitable for cultivation of the mushroom. Medium temperature control means using a liquid temperature control medium for cooling the prepared medium from the peripheral wall of the cultivation container, and fruit body temperature control using a gas temperature control medium for cooling the fruit bodies generated from the medium Means and
It is solved by a mushroom artificial cultivation device equipped with.

A further object of the present invention is to provide a water temperature control device for performing temperature control that gives a predetermined temperature difference between the liquid temperature control medium and the gas temperature control medium, and a room temperature control device,
It is advantageously solved by a mushroom artificial cultivating device with.

Furthermore, the subject of the present invention is advantageously solved by a mushroom artificial cultivation device provided with a constant temperature water supply device which circulates the liquid temperature control medium at least partially and repeatedly uses it.

Further, the problems of the present invention can be solved more advantageously by using a liquid containing water as a main component for the liquid temperature control medium.

Further, the object of the present invention is advantageously solved by a mushroom artificial cultivation device provided with a device for adding either silver ion, copper ion or hypochlorous acid to the liquid temperature control medium.

Further, an object of the present invention is to artificially cultivate mushrooms in which the liquid temperature control medium supply means is provided with means for introducing ground water and / or surface water to perform heat exchange with the reflux liquid temperature control medium. The device is advantageously solved.

Furthermore, the object of the present invention is advantageously solved by a mushroom artificial cultivation device provided with means for partially or completely shielding the liquid temperature control medium and the gas temperature control medium.

The mushroom artificial cultivating apparatus according to the present invention comprises:
It was completed by paying attention to the fact that the temperature suitable for the medium is different from the temperature suitable for the fruit body in mushroom cultivation, and that the suitable temperature is different in each step of culturing, budding and growing in mushroom cultivation. Therefore, in the mushroom artificial cultivation apparatus according to the present invention, a liquid temperature control medium having a large specific heat is used for temperature control of the culture medium portion, and a gas temperature control medium having a small specific heat is used for temperature control of the fruit body and the culture medium surface portion. .

More specifically, by using a liquid having a large specific heat to control the temperature of the medium portion having a large heat capacity and heat generation, the efficiency of heat exchange between the medium and the temperature control medium is improved, so that the temperature in the medium is increased. In addition to eliminating the unevenness and shortening the culture period, the temperature of the surface of the medium is stable against changes in the temperature in the cultivation room. By maintaining the temperature of the culture medium surface portion stable, the control range of the culture medium surface temperature is greatly expanded, and the temperature load of the cultivation air supply device in the culture process is greatly reduced.

Further, in the present invention, the liquid for cooling the medium portion is controlled to an optimum temperature while referring to the temperature of the cultivation room, which directly affects the fruiting body, so that the medium portion and the fruit body portion are each grown at the optimum temperature. Can be maintained at temperature.

Further, in the present invention, the liquid temperature control medium can be reused by repeatedly circulating and using the liquid temperature control medium, and the amount of the liquid temperature control medium used can be saved.

Further, in the present invention, a liquid temperature control medium containing water as a main component is used. As is well known, water has a large heat capacity as compared with air and is inexpensive, so it is most suitable as a liquid temperature control medium. Furthermore, since the appropriate humidity is supplied to the gas temperature control medium by evaporation from the water surface, the humidifying capacity required for the cultivation air supply device can be reduced.

Furthermore, in the present invention, by adding metal ions such as silver ions and copper ions to the liquid temperature control medium, the liquid temperature control medium and its distribution route are sterilized and the generation of various bacteria in the apparatus is suppressed. be able to. Moreover, in order to suppress the generation of such bacteria, an appropriate amount of hypochlorous acid may be added.

Further, in the present invention, as a result of heat exchange with the medium, heat is exchanged between the liquid temperature control medium whose temperature has risen and the low temperature groundwater and / or surface water, thereby cooling the liquid temperature control medium. It is possible to reduce the power required for the operation.

Furthermore, in the present invention, by providing the shielding panel for shielding the liquid temperature control medium and the gas temperature control medium, it is possible to suppress unnecessary heat exchange between the liquid temperature control medium and the gas temperature control medium. . Further, excessive vaporization of water from the surface of the liquid temperature control medium into the gas temperature control medium can be suppressed.

[0024]

BEST MODE FOR CARRYING OUT THE INVENTION Next, embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 shows a block diagram of a mushroom cultivation environment maintaining means as an embodiment of the artificial mushroom cultivation device according to the present invention. Referring to FIG. 1, the mushroom artificial cultivating apparatus includes a fruit body having a medium temperature control means C1 having a liquid surrounded by a lower dashed line in the left half of the figure as a cooling medium and a gas having a liquid surrounded by an upper dashed line as a cooling medium. The temperature control means C2 is provided, and the former is configured to feed the temperature-controlled cooling medium to the cultivation container temperature adjusting device 6 and the latter to the cultivation chamber 16, respectively.

The above-mentioned medium temperature control means C1 and fruit body temperature control means C2 refer to the room temperature measurement value 20 and the water temperature measurement value 10 to control the temperature of the liquid temperature control medium 4 in association with each other. It has a water temperature control device 1 for generating a signal 2. The constant temperature water supply device 3 is connected to the water temperature control signal 2 and the reflux liquid temperature control medium 8 and adjusts the temperature of the reflux liquid temperature control medium 8 according to the water temperature control signal 2 to generate the liquid temperature control medium 4. The cultivation container temperature adjusting device 6 receives the supply of the liquid temperature control medium 4 through the liquid temperature control medium supply port 5, and maintains the temperature of the medium filled in the cultivation container housed inside. The water temperature measuring device 9 measures the temperature of the liquid temperature control medium 4 from the constant temperature water supply device 3, and measures the water temperature measured value 10
To occur.

The room temperature control device 11 is a cultivation air supply device 13
The room temperature measurement value 20 which is the temperature measurement value of the gas temperature control medium 14 is taken out from and the room temperature control signal 12 for controlling the temperature of the gas temperature control medium 14 is generated. The cultivation air supply device 13 takes in the reflux gas temperature control medium 18 and the outside air 21, and controls the temperature according to the room temperature control signal from the room temperature control device 11. Here, the outside air 21 and the reflux gas temperature control medium 18 are mixed, the temperature is adjusted, and the gas temperature control medium 14 having the optimum carbon dioxide concentration, temperature, and humidity for growing mushrooms is generated and is no longer necessary. The recirculated gas temperature control medium 14 is discharged as the exhaust 22. The cultivation room 16 is connected to the gas temperature control medium 14 and supplies the gas temperature control medium 14 to the fruit bodies, fruit body bases and the culture medium surfaces housed inside. The room temperature measuring device 19 is connected to the reflux gas temperature control medium 18 to measure the temperature and generate a room temperature measurement value 20.

FIG. 2 is a sectional view of the cultivation room and cultivation container temperature adjusting device in the embodiment of the present invention. Below, figure
It will be explained with reference to 1 as appropriate. The cultivation container temperature control device 6 shown by the alternate long and short dash line (thin line) in FIG. 2 convects the liquid temperature control medium 4 taken in from the supply port 5 and maintains the temperature of the cultivation container 201 housed therein.
Is equipped with. The liquid temperature control medium 4 convects in the heat insulating container 202 to exchange heat with the medium filled in the cultivation container 201, and then is discharged from the reflux port 7 to become the reflux liquid temperature control medium 8. The liquid temperature control medium supply port 5 is provided in the heat insulating container 2
The liquid temperature control medium 4 is supplied to 02. The liquid temperature control medium recirculation port 7 recirculates the convected liquid temperature control medium 4 to the outside of the heat insulating container 202 as the recirculation liquid temperature control medium 8. The shielding panel 203 (see FIG. 4) suppresses heat insulation between the liquid temperature control medium 4 and the gas temperature control medium 14 and vaporization of the liquid temperature control medium 4 into the gas temperature control medium 14. The cultivation container 201 has a medium filled therein, and the cultivation container 201 has an opening 205 directed upward. Mushroom fruiting bodies (not shown) are generated from the cultivation container opening 205.

The cultivation container fixing mechanism 204 (see FIG. 3) suppresses and fixes the buoyancy of the cultivation container 201. This is because the cultivation container 201 is usually made of plastic such as polypropylene, and as a mushroom medium, Corn Cob (Corn Cob:
Since corn cobs) and sawdust are widely used, the specific gravity is 1 or less, and it is intended to prevent the liquid temperature control medium 4 from easily floating and becoming unstable.

The cultivation room 16 accommodates the cultivation container temperature control device 6 inside, and the gas temperature control medium 1 is provided on the fruit body and the surface of the culture medium.
Supply 4. The gas temperature control medium 14 is taken in through the supply port 15, convection in the cultivation room 16 is taken in the carbon dioxide gas generated from the medium, and then the gas temperature control medium 14 is discharged as the reflux gas temperature control medium 18 (FIG. 1) through the reflux port 17. The gas temperature control medium supply port 15 supplies the gas temperature control medium 14 to the cultivation room 16. The gas temperature control medium reflux port 17 causes the gas temperature control medium 14 after convection to flow back to the outside of the cultivation room 16 as a reflux gas temperature control medium 18.

FIG. 3 is a plan view of the cultivation container fixing mechanism according to the embodiment of the present invention as viewed from the bottom side. The cultivation container fixing mechanism 204 has a fixing rod 301 arranged in parallel to the diameter of the cultivation container at equal intervals, and the fixing rod 301 tends to become unstable due to buoyancy in the liquid temperature control medium.
Hold the shoulder of 01 and fix it.

FIG. 4 is a plan view of shield plate 203 in the embodiment of the present invention. The small-diameter circular opening group 401 changes the vaporization state of the liquid on the medium container side, and is not necessarily indispensable. It may be increased or decreased depending on the season or the cultivation target, or may be eliminated altogether in some cases. The large-diameter circular opening 402 is located at a position corresponding to the cultivation container opening 205, and the neck of the cultivation container 201 projects from the circular opening 402. The shielding panel 203 shields the liquid temperature control medium 4 and the gas temperature control medium 14 to prevent unnecessary heat exchange between them, and further suppresses excessive vaporization of the liquid temperature control medium into the gas temperature control medium. .

Next, the operation of this apparatus will be described with reference to FIGS. 1, 2 and 3. The water temperature control device 1 determines the optimum temperature for growth of the culture medium portion with respect to the room temperature measurement value 20, and refers to the water temperature measurement value 10 to set the liquid temperature control medium 4 to the optimum culture medium growth temperature according to the type of mushroom. The water temperature control signal 2 for control is output. The constant temperature water supply device 3 is
Upon receiving the water temperature control signal 2, the temperature of the liquid temperature control medium 4 is controlled to the optimum temperature for growing the medium, and the temperature is supplied to the cultivation container temperature adjusting device 6. The cultivation container temperature control device 6 introduces the supplied liquid temperature cooling medium 4 from the liquid temperature control medium supply port 5, and convects the inside of the heat insulating container to exchange heat with the peripheral wall of the cultivation container 201. Cultivation container 20 by heat exchange with a liquid having a large specific heat
The heat generated by the medium filled in 1 is efficiently removed,
The inside of the medium is maintained at a constant temperature without unevenness.

Since the temperature of the liquid temperature control medium 4 is always determined with respect to the temperature of the gas temperature control medium 14, the optimum growth temperature of the medium portion and the optimum growth temperature of the fruit body portion are realized at the same time. The liquid temperature control medium 4 that has convected in the cultivation container temperature control device 6 and has exchanged heat with the culture medium is returned to the constant temperature water supply device 3 from the liquid temperature control medium reflux port 7 as the reflux liquid temperature control medium 8. The water temperature measuring device 9 measures the temperature of the liquid temperature control medium 4 and outputs a water temperature measurement value 10 to the water temperature control device 1.

The room temperature controller 11 receives the room temperature measurement value 20 and outputs a room temperature control signal 12 for controlling the temperature of the gas temperature control medium 14 to a predetermined temperature suitable for mushroom growth.
The cultivation air supply device 13 adds the outside air 21 having a low carbon dioxide concentration to the reflux gas temperature control medium 18 containing a large amount of carbon dioxide to reduce the carbon dioxide concentration to a predetermined value or less, and the room temperature control signal 1
2, the temperature is set to a predetermined value, the humidity is set to a predetermined value, the gas temperature control medium 14 having an atmosphere suitable for mushroom growth is generated, and the cultivation room 16 is supplied through the supply port 15.
Supply to. The recirculated gas temperature control medium 18 that has become excessive due to the introduction of the outside air 21 is discharged to the outside as the exhaust 22. The cultivation room 16 introduces the supplied gas temperature control medium 14 from the gas temperature control medium supply port 15 and convects into the room, and the medium surface in the culturing step, the fruit body primordium in the sprouting step, and the child in the growing step. The entity maintains the temperature, carbon dioxide concentration and humidity of the atmosphere in which it grows at appropriate values. Since the medium portion exchanges heat with a liquid having a high specific heat, in the culturing step, the temperature variation in the medium is extremely small with respect to the temperature variation of the gas temperature control medium 14, and the gas temperature control medium 14
The temperature control range is expanded to the same level as the outside temperature. This significantly reduces the temperature load on the cultivation air supply device 13.

Generally, in the culturing process, a cap having air permeability is attached to the opening 205 of the cultivation container. As a result, the temperature fluctuation of the medium with respect to the temperature fluctuation of the gas temperature control medium 14 is further reduced, and the temperature control range of the gas temperature control medium 14 in the culturing process is further expanded.
In the autumn, the outside air can be used as the gas temperature control medium 14 at its temperature without temperature control. The gas temperature control medium 14 containing the carbon dioxide gas generated from the culture medium convection in the cultivation room 16 is recirculated to the cultivation air supply device 13 from the gas temperature control medium recirculation port 17 as the recirculation gas temperature control medium 18. The room temperature measuring device 19 measures the temperature of the gas temperature control medium 14 and outputs a room temperature measurement value 20 to the room temperature control device 11.

As an example of applying the apparatus according to the present invention to mushroom cultivation, a case where it is applied to edible mushroom cultivation will be described in detail along with the production process. In the culturing process in which the mycelium is propagated in the medium, the room temperature measurement value 20 measured by the room temperature measuring device 20 is 0.
In the case of up to 45 ° C, it is desirable to control the water temperature measurement value 10 by the water temperature measuring device 9 to 12 to 30 ° C. Within this range, the growth of mycelia is maintained in an optimum state, and the transition to the subsequent sprouting step is smoothly performed.

In the sprouting step for forming the fruiting body primordium, which is the source of mushroom growth, the room temperature measurement value 20 is controlled within the range of 5 to 25 ° C., and the water temperature measurement value 10 is within the range of 0.5 to 30 ° C. It is preferable to control, and more preferably, the room temperature measurement value 20 is controlled to be in the range of 8.7 to 20.4 ° C., and the water temperature measurement value 10 is preferably controlled to 60% to 140% of the room temperature measurement value 20. . This is because the fruit body primordia are most formed in this range as a result of actual measurement. Since the process after the sprouting process is a low temperature process, the fruit body is placed in an environment of medium temperature, and the room temperature measurement value 20 is controlled within the range of 3 to 20 ° C. in the acclimatization process for shifting to the next low temperature process. , The water temperature measurement value 10 is preferably controlled to 0.5 to 30 ° C., and more preferably the room temperature measurement value 20 is 4.8 to 10.
Control the temperature to 3 ° C and change the measured water temperature 10 to 65
% To 135% is desirable. This is because the fruit body can smoothly move to the next step in this range.

At the step of suppressing the growth of the mushrooms of Enoki mushrooms and suppressing the growth of stems, the growth of mushrooms is made uniform.
0 is controlled to 0 to 15 ° C, and the measured water temperature 10 is 0.5 to 3
It is preferable to control at 0 ° C., more preferably, the room temperature measured value 20 is controlled at 1.8 to 6.2 ° C., and the water temperature measured value 1
It is desirable to control 0 to 55% to 145% of the room temperature measured value 20. It has been demonstrated that the fruit weight of the fruit body is the highest in this range. In the growth step in which the fruiting body after the suppression step is smoothly grown, the room temperature measurement value 20 is controlled to 2 to 18 ° C, and the water temperature measurement value 10 is 0.5 to 30 ° C.
It is preferable that the room temperature measurement value 20 is controlled to 3.2 to 8.8 ° C., and the water temperature measurement value 10 is controlled to 55% to 145% of the room temperature measurement value 20. This is because the fruiting bodies grow smoothly in this range.

Next, the case where the present apparatus is applied to beech mushrooms will be disclosed along the production process. In the culturing process,
When the room temperature measurement value 20 is 0 to 45 ° C, it is desirable to control the water temperature measurement value 10 to 15 to 34 ° C. In the aging step of aging the hyphae propagated in the medium, when the room temperature measured value 20 is 0 to 45 ° C, the water temperature measured value 10 is preferably controlled to 15 to 34 ° C. This is because aging of mycelia proceeds smoothly in this range. In the sprouting process, room temperature measurement value 2
0 to 7 to 23 ℃, water temperature measured value 10 to 3 to 34 ℃
It is preferable to control the room temperature measurement value 20 to 8.5 to 21.5 ° C., and the water temperature measurement value 10
Is preferably controlled to 55% to 145% of the room temperature measured value 20. In the growth process, the room temperature measured value 20 is 7 to 24 ° C.
It is preferable to control the water temperature measurement value 10 to 3 to 34 ° C., and more preferably to measure the room temperature measurement value 20 to 8.8 to 1
It is desirable to control to 9.2 ° C. and control the water temperature measurement value 10 to 60% to 140% of the room temperature measurement value 20.

Next, the functions of the cultivation container temperature control device 6 and the cultivation room 16 will be described with reference to FIG. The cultivation container temperature control device 6 accommodates a plurality of cultivation containers 201 inside. Since the specific gravity of the cultivation container 201 in this state is small, buoyancy is generated in the liquid temperature control medium 4. The fixed frame 204 suppresses the shoulder opening of the cultivation container 201 and fixes it. The liquid temperature control medium 4 is fed from the liquid temperature control medium supply port 5 to the cultivation container temperature adjusting device 6
And the convection of the inside of the cultivation container 201 is performed and heat exchange is performed with the medium filled in the cultivation container 201. The liquid temperature control medium 4 after heat exchange is recirculated from the liquid temperature control medium recirculation port 7 as the recirculation liquid temperature control medium 8. The gas temperature control medium 14 flows into the cultivation chamber 16 from the gas temperature control medium supply port 15 and convects inside, and grows in the culture medium under the cultivation container opening 205 in the culturing step and from the cultivation container opening 205 in the sprouting step. In the growing step, a growing atmosphere having a temperature, a carbon dioxide concentration and a humidity optimum for growth is supplied to the fruiting body primordium from the cultivation container opening 205 in the growing step. Cultivation room 1
The gas temperature control medium 14 containing the carbon dioxide gas generated from the medium by convection in 6 is recirculated from the gas temperature control medium recirculation port 17 as the recirculation gas temperature control medium 18.

Next, the function of the fixed frame 204 will be described with reference to FIGS. The fixing rods 301 arranged in parallel with the diameter of the cultivation container 201 at equal intervals suppress the shoulders of the cultivation container 201 from above, so that the fixed frame 204 suppresses the buoyancy generated in the cultivation container 201 in the liquid temperature control medium 4. The cultivation container 201 is fixed by the fixed frame 204 and the side surface of the heat insulating container 202 and is stabilized in the liquid temperature control medium 4.

Next, referring to FIGS. 2 and 4, the shielding panel 20
The function of 3 will be described. The shielding panel 203 shields the liquid temperature control medium 4 and the gas temperature control medium 14 and suppresses unnecessary heat exchange. The moisture vaporized from the liquid temperature control medium 4 is supplied to the gas temperature control medium 14 through the circular opening group 401, so that the humidification capacity of the cultivation air supply device 13 can be reduced. Therefore, in the culturing process, in the spring, summer and autumn, it can be used as a gas temperature control medium without humidifying the outside air at all. Shielding panel 20 depending on mushroom type and environment
In some cases, a shield panel that does not include 3 or that does not include the circular opening group 401 is used. Due to these effects, the gas temperature control medium 1 in the culture process in spring, summer, and winter 1
The outside air can be used as 4 without any temperature control, humidity control, and carbon dioxide control.

Next, a second embodiment of the present invention will be described in detail with reference to the drawings. As shown in FIG. 5, metal ions are generated in the reflux liquid temperature control medium 8,
Ion generator 50 for sterilizing the reflux liquid temperature control medium 8
1 is provided. After sterilizing the reflux liquid temperature control medium 8, the silver ions generated during the generation of the reflux liquid temperature control medium become the post-sterilization reflux liquid temperature control medium 502 and are returned to the constant temperature water supply device 3. After sterilization, the silver ions stay in the reflux liquid temperature control medium 502 for a certain period of time, and sterilize all of the circulation paths of the constant temperature water supply device 3 and the cultivation container temperature adjusting device 6. This bactericidal effect significantly reduces the risk of germs.

Silver ions and copper ions are preferred as the metal ions. This is because these ions have a strong sterilizing power, have a simple device structure, and have a small load on the environment.
The maximum value of the silver ion concentration in the reflux liquid temperature control medium 8 is preferably 0.5 ppm. This is because the bacteria in the reflux liquid temperature control medium 8 can be sufficiently sterilized at this concentration. Furthermore, it is also effective to use hypochlorous acid as a sterilizing method for the reflux liquid temperature control medium 8. This is because a higher bactericidal effect can be obtained by using hypochlorous acid and metal ions in combination.

Next, a third embodiment of the present invention will be described with reference to the drawings. As shown in FIG. 6, a heat exchanger 602 is provided between the cultivation container temperature control device 6 and the constant temperature water supply device 3. The heat exchanger 602 performs heat exchange between the external water 601 taken from the outside and the reflux liquid temperature control medium 8, and after the heat exchange, the reflux liquid temperature control medium 60.
4 is sent to the constant temperature water supply device 3. After heat exchange, the external water 601 becomes drainage 603 and is discharged to the outside.

Regarding the second embodiment of the present invention,
In the process of cultivating the enoki mushroom, the room temperature measured value 20 is 25 ° C,
An example will be described in which groundwater having a water temperature measurement value 10 of 19 ° C and 10 ° C as the external water 601 is used. The reflux liquid temperature control medium 8 whose temperature has risen to 19 ° C. or higher by absorbing the heat generated by the medium exchanges heat with the external water 601 at 10 ° C. in the heat exchanger 602 to lower the temperature. By setting the flow rate of the external water 601 so that the temperature of the reflux liquid temperature control medium 604 after heat exchange, which is sent from the heat exchanger 602, is around 19 ° C., the temperature load of the constant temperature water supply device 3 is significantly reduced. As a result, the power consumption of the constant temperature water supply device 3 is reduced.

[0047]

The first effect of the mushroom artificial cultivating apparatus according to the present invention is that the culturing period is significantly shortened, the turnover rate of the manufacturing equipment is improved, and the manufacturing cost is greatly reduced. . The reason is that by using water with high specific heat to control the temperature of the medium part that has a large heat capacity and heat generation, temperature unevenness in the medium is eliminated and it is possible to set the optimum culture temperature not only in the central part of the medium but also in the peripheral part. This is because

The second effect of the present invention is that the power consumption in the culturing process is greatly reduced. The reason is that by cooling the medium that generates heat during the culturing process with water having a high specific heat, the temperature control range of the cultivation room is greatly expanded, and the power of the cooling device used to control the temperature of the cultivation room in spring, summer, and autumn is increased. It is unnecessary. Further, since the temperature control medium used for cooling the medium is cooled by heat exchange with low temperature ground water and / or surface water, a cooling device is not required for temperature control of the medium portion.

A third advantage of the present invention is that the cost of the device can be reduced. The reason is that by cooling the medium that generates heat during the culturing process with water having a high specific heat,
The temperature control range of the cultivation room is greatly expanded, and in spring, summer and autumn, it is sufficient to control the temperature of only the cultivation container. Therefore, the capacity of the cooling device can be reduced. Further, the humidifying effect due to vaporization from the liquid temperature control medium surface can reduce the capacity of the humidifier. Therefore, the capacities of the cooling device and the humidifier can be made smaller than those of the conventional environment maintaining device.

A fourth effect of the present invention is that the yield of mushrooms per unit volume of medium is increased.
The reason is that by using two types of temperature control media, liquid and gas, the temperature of the medium portion and the temperature of the fruiting body primordium and the fruiting body generated from the surface of the medium are separately controlled in the sprouting step and the growing step. This is because it becomes possible to set the optimum growth temperature for each.

[Brief description of drawings]

FIG. 1 is a block diagram of a first embodiment of an artificial cultivation device for mushrooms according to the present invention.

FIG. 2 is a cross-sectional view of a cultivation room and a cultivation container temperature adjusting device in the mushroom artificial cultivation device according to the present invention.

FIG. 3 is a plan view of the cultivation container fixing mechanism in the artificial cultivation device for mushrooms according to the present invention, viewed from the bottom side.

FIG. 4 is a plan view of a shield plate in the artificial cultivation device for mushrooms according to the present invention.

FIG. 5 is a block diagram of another embodiment of the mushroom artificial cultivating apparatus according to the present invention.

FIG. 6 is a block diagram of still another embodiment of the mushroom artificial cultivating device according to the present invention.

[Explanation of symbols]

1 Water temperature controller 2 Water temperature control signal 3 Constant temperature water supply device 4 Liquid temperature control medium 5 Liquid temperature control medium supply port 6 Cultivation container temperature control device 7 Liquid temperature control medium reflux port 8 Reflux liquid temperature control medium 9 Water temperature measuring instrument 10 Water temperature measurement value 11 Room temperature controller 12 Room temperature control signal 13 Cultivation air supply device 14 Gas temperature control medium 15 Gas temperature control medium supply port 16 cultivation room 17 Gas temperature control medium reflux port 18 Reflux gas temperature control medium 19 Room temperature measuring instrument 20 Room temperature measurement 21 Outside air 22 Exhaust 201 cultivation container 202 insulated container 203 Shield panel 204 Cultivation container fixing mechanism 205 Cultivation container opening 301 fixed rod 401 circular aperture group 402 circular opening 501 ion generator 502 Post-sterilization reflux liquid temperature control medium 601 External water 602 heat exchanger 603 drainage 604 Reflux liquid temperature control medium after heat exchange C1 medium temperature control means C2 Fruit body temperature control means

Claims (7)

[Claims] 1. In a mushroom artificial cultivating apparatus for cultivating a cultivation container filled with a medium for mushrooms in an atmosphere suitable for cultivation of the mushroom, cooling the medium filled in the cultivation container from the peripheral wall of the cultivation container. Medium temperature control means using a liquid temperature control medium for cooling, and fruit body temperature control means using a gas temperature control medium for cooling fruit bodies generated from the medium, An artificial cultivating device for mushrooms. 2. A temperature control means for performing a temperature control that gives a specific temperature difference between the temperature of the liquid temperature control medium and the temperature of the gas temperature control medium. Item 1. The mushroom artificial culture device according to Item 1. 3. The artificial mushroom cultivating apparatus according to claim 1 or 2, further comprising means for circulating the liquid temperature control medium at least partially and repeatedly using it. 4. The liquid containing water as a main component is used as a temperature control medium for the liquid.
The mushroom artificial culture device according to any one of 1. 5. The mushroom artificial body according to claim 1, wherein any one of silver ions, copper ions or hypochlorous acid is added to the liquid temperature control medium. Cultivation equipment. 6. The mushroom according to claim 1, further comprising means for exchanging heat between the liquid temperature control medium and ground water and / or surface water. Artificial cultivation device. 7. The mushroom according to claim 1, further comprising means for partially or wholly shielding the liquid temperature control medium and the gas temperature control medium. Artificial cultivation device.