JP2003135926A - Phosphorus trapping apparatus for semiconductor manufacturing apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a phosphorus trapping apparatus capable of safely removing phosphorus having a solidifying risk such as yellow phosphorus contained in a waste gas from a semiconductor manufacturing apparatus. SOLUTION: Phosphorus is efficiently and surely removed from the waste gas by depositing and solidifying phosphorus in the waste gas by a low temperature oil mist from an oil separating apparatus 22 provided in a trapping apparatus 2 to incorporate the phosphorus in the oil mist, removing phosphorus solid from the oil incorporating the phosphorus solid by a phosphorus solid removing filter 5 and using the oil again in the trapping apparatus 2 as the oil for phosphorus depositing and collecting. Because the phosphorus solid remaining in the phosphorus solid removing filter 5 is wrapped by the oil, the risk of spontaneous combustion is made low and the safe treating work is carried out. The exchange of a poison eliminating agent is safely performed because the waste gas from which phosphorus is removed is sent to a poison eliminating column 106.

Description

DETAILED DESCRIPTION OF THE INVENTION [0001] TECHNICAL FIELD The present invention relates to a method for manufacturing a compound semiconductor.
To remove phosphorus contained in exhaust gas
The present invention relates to a phosphorus trap device for a semiconductor manufacturing apparatus. [0002] 2. Description of the Related Art For the production of various compound semiconductors,
Arsine (AsH) _Three) And phosphine
(PH_ThreeEpitaxial bonding using hydrides such as
VPE (HVPE) method for growing a crystal layer,
Alternatively, epitaxy can be achieved by thermally decomposing organic metals.
Metal-organic pyrolysis (MOCVD)
Method), the required single crystal layer is continuously stacked on the substrate.
Manufacturing of various compound semiconductors that can be layered
The device is being used. The compound semiconductor to be manufactured is GaAs, A
In either case of lGaAs or InGaAs, for example,
In the case of the MOCVD method, usually a group V raw material is excessively supplied.
Crystal growth conditions, the process gas exhaust system
Is a carrier gas for supplying raw material gas to the reactor.
And unreacted hydrogen not consumed for crystal growth
And arsine and / or phosphine. Therefore, a conventional semiconductor manufacturing apparatus of this kind
Unreacted gas of these arsine and phosphine
In order to detoxify metals, for example, detoxification using metal oxides
Towers are provided. [0005] The conventional abatement tower has a problem.
Phosphine, etc., which is sent unreacted
The compound itself is rendered harmless, but thermal decomposition of phosphine etc.
For removing phosphorus such as yellow phosphorus and red phosphorus generated in
Since there is no step, the generated phosphorus is
There is a possibility that it may adhere to the surface or solidify and accumulate in the abatement tower. Phosphorus
Of these, yellow phosphorus is particularly dangerous because it has a pyrophoric property in the atmosphere.
It is rugged and requires strict care
Is what it is. Therefore, emissions from semiconductor manufacturing equipment
Safe removal of phosphorus in gas is desired,
In the past, effective measures have been taken to remove this
did not exist. SUMMARY OF THE INVENTION It is an object of the present invention to provide an apparatus for discharging semiconductor devices.
Safe removal of phosphorus such as yellow phosphorus contained in gas
To provide a phosphorus trap device for semiconductor manufacturing equipment
It is to be. [0007] Means for Solving the Problems To solve the above problems,
Therefore, according to the first aspect of the present invention, solidification adheres in the exhaust gas system.
Semiconductor manufacturing equipment containing phosphorus
For Safe Removal of Phosphorus from Exhaust Gas
A phosphorus trap device for a production apparatus, wherein the exhaust gas is
Gas-liquid contact with oil whose temperature is controlled below the deposition temperature of phosphorus
And quenched, and the precipitated phosphorus solids
A trap device for trapping in oil;
The phosphorus solids obtained in the trapping device are trapped.
To remove the phosphorus solids from the oil
And a filter device, wherein the phosphorus from the filter device is provided.
After removing the solid matter, the oil is
Characterized in that it is supplied again for the purpose
A phosphorus trap device for a manufacturing device is proposed. In the trap device, the temperature is controlled below the phosphorus deposition temperature.
Make the controlled oil come into gas-liquid contact with the exhaust gas efficiently
Dispersed supply effectively connects exhaust gas with oil
Can be touched. Exhaust gas is rapidly cooled and contained in
When phosphorus falls below the deposition temperature, it precipitates and solidifies
Is taken in as if wrapped in oil. This
As a result, phosphorus in the exhaust gas is separated and extracted from the exhaust gas
As a result, an oil containing phosphorus solids is obtained. [0009] Phosphorus solids are taken in from the trap device.
Oil is passed through a filter device where the phosphorus solids
Is removed. The oil from which the phosphorus solids have been removed is phosphorus
It is again supplied to the trap device for removal. This result
As a result, from the trap device, phosphorus
Exhaust gas that does not contain
Sent and can be safely processed. Also filter
The phosphorus solids removed by the device are wrapped in oil
It is hard to spontaneously ignite because it is not in contact with air
Therefore, the processing can be performed safely. [0010] BRIEF DESCRIPTION OF THE DRAWINGS FIG.
An example of the embodiment will be described in detail. FIG. 1 shows a phosphorus trap device according to the present invention.
FIG. 1 is a configuration diagram illustrating an example of an embodiment. Phosphorus trap equipment
Device 1 is the reactor 101 of the compound semiconductor manufacturing apparatus 100.
Yellow and red phosphorus contained in the exhaust gas (process gas)
Which phosphorus is trapped and removed,
The wastewater is sent to the abatement tower 106. In the phosphorus trap device 1, the compound half
Included in the exhaust gas from the reactor 101 of the conductor manufacturing apparatus 100
Safely removes phosphorus that has a risk of solidification such as yellow phosphorus
Phosphorus in the exhaust gas solidifies and adheres in the exhaust gas system.
Exhaust gas controlled at a temperature higher than the phosphorus deposition temperature
Introduced into the processing chamber 21 of the wrapping device 2 and introduced
Exhaust gas is controlled below the phosphorus deposition temperature in the processing chamber 21
Quenched by gas-liquid contact with the spilled oil
The trapped phosphorus solids are trapped in the oil and
To remove phosphorus solids taken in
Removed by the phosphorus solids removal filter 5
The phosphorus solids removed from the phosphorus solids removal filter 5
Oil containing no form is again deposited in the processing chamber 21
Supplied as collecting and collecting oil. Reference numeral 2 denotes a trap device.
And the trapping temperature of the yellow phosphorus
Exhaust gas held at a temperature higher than
Sent through the provided exhaust pipe 103
It has become. The trap device 2 is thus
Reactor 10 contained in the exhaust gas sent in
The yellow phosphorus produced by the thermal decomposition of the phosphorus compound in 1
Various types of phosphorus are rapidly cooled and solidified and separated from exhaust gas.
It is a device for taking out. In the configuration shown in FIG.
Oil provided in the processing chamber 21 of the
The oil is efficiently dispersed by the dispersing device 22, and the oil is dispersed.
Processing oil through the exhaust pipe 103
Gas-liquid contact with the exhaust gas introduced into
Exhaust gas is quenched, thereby removing phosphorus in the exhaust gas
And wrapped in oil. Phosphorus
The oil wrapping the solids is naturally
Fall into the oil reservoir 23 at the bottom of the processing chamber 21
Oil and phosphorus solids are collected together
I have. All the phosphorus contained in the exhaust gas is treated
So that it is trapped in the bar 21 as described above.
Therefore, the exhaust system vacuum pump 102 and the exhaust pipe 103
The piping system containing
Is higher than the highest precipitation temperature of yellow phosphorus, for example, 80 ° C or higher,
The temperature is controlled by the
Yellow phosphorus and other phosphorus in the discharged exhaust gas are trapped
Precipitates inside this piping system before it reaches 2
This is a configuration that prevents The oil dispersion device 22 will be described in detail later.
Temperature is sufficient for yellow phosphorus to precipitate and solidify
Oil cooled to 5 ° C or less is supplied and 5 ° C
C is cooled by the oil dispersing device 22.
Are dispersed in the processing chamber 21 and
Is filled with 5 ° C dispersion oil. Exhaust pipe 1
80 ° C. introduced into the processing chamber 21 through
In exhaust gas being heated to 5 ° C or less
Contact with the oil mist
More solidified by cooling, the solidified phosphorus is wrapped in oil
So that it is captured in the oil. Reference numeral 24 denotes a filler.
This increases the gas-liquid contact area between exhaust gas and oil,
I can improve the efficiency of capturing phosphorus
I have. Then, the oil is further dispersed by the oil dispersion device 22.
To prevent the scattered oil from adhering to the inner wall of the processing chamber 21.
Can be prevented. Demised in the processing chamber 21
The mist oil is disposed in the processing channel.
Being entrained in the exhaust gas extracted from chamber 21
It has been prevented from becoming. The trap device 2 is configured as described above.
Therefore, various phosphorus such as yellow phosphorus in exhaust gas
Is trapped by the oil mist as described above,
The oil is collected in the oil reservoir 23 together with the oil. And
The exhaust gas in the processing chamber 21 from which phosphorus has been removed is exhausted.
104 to the final mist separator 105
Here, the oil is safely removed, and then the known configuration is removed.
Sent to harm tower 106, detoxification treatment in elimination tower 106
Is released to the atmosphere after [0018] Phosphorus solids collected in the oil sump 23
The oil containing oil is supplied to the oil reservoir 2 by the feed pump 3.
In the oil passage 4 provided between the oil dispersion device 3 and the oil dispersion device 22.
And is first fed into the phosphorus solids removal filter 5.
You. The phosphorus solids removal filter 5 contains the phosphorus solids in the oil.
Shape is wrapped in oil and not in direct contact with air
Oil that does not contain phosphorus solids
As clean oil from the phosphorus solids removal filter 5.
And sent to the heat exchanger 6. The heat exchanger 6 converts the received oil into yellow phosphorus.
Cooled to below the outlet temperature (eg 5 ° C)
The oil is supplied to an oil dispersion device 22, where it is drained again.
Processing chamber to cool gas below yellow phosphorus deposition temperature
And dispersed between the exhaust gas and the oil mist.
Contact is made. That is, rapid cooling in the processing chamber 21 is performed.
The oil that has captured the solidified phosphorus solids
Separation from phosphorus solids captured by the shape removal filter 5
Oil that is dispersed and supplied again into the processing chamber 21
An oil circulation system for oil reuse
Have been. The phosphorus trap device 1 is configured as described above.
The various types of
Extremely efficient and reliable removal of phosphorus from exhaust gas
Can be. In this case, phosphorus in the exhaust gas is converted to oil mist.
Cools faster, solidifies, and wraps in oil
Oil, i.e., solidified phosphorus is wrapped in oil.
In a state where it is difficult to spontaneously ignite
Cleaning of the phosphorus solids removal filter 5
Work can be done safely. Also, to the abatement tower 106
Is the waste gas from which the phosphorus has been solidified and removed in this way.
Exchange of the abatement agent in the abatement tower 106
And various other maintenance operations can be performed safely. [0022] According to the present invention, the trap device
Solidify the phosphorus in the exhaust gas and wrap it in oil
Take up and filter phosphorus solids with oil using a filter device
Remove it while it is wrapped and remove any oil from the filter device.
Again in the trap device as phosphorus collection oil
Used in semiconductor manufacturing equipment.
Highly efficient and reliable phosphorus with various solidification risks
From the exhaust gas in a safe condition with little risk of spontaneous ignition
can do. In this case, the phosphorus in the exhaust gas is oil
Rapidly cooled and solidified, and wrapped in oil
In a solid state, that is, solidified phosphorus is wrapped in oil.
It is rarely removed by a filter device in a state where it is difficult to ignite spontaneously.
Therefore, cleaning work of the filter device can be performed safely.
Wear. In addition, phosphorus is solidified in the abatement tower in this way.
The exhaust gas that has been removed is sent to the abatement tower.
It is possible to safely perform various maintenance work such as changing
it can.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a configuration diagram showing an example of an embodiment of a phosphorus trap device according to the present invention. [Description of Signs] 1 Phosphorus trap device 2 Trap device 3 Feed pump 4 Oil passage 5 Phosphorus solids removal filter 6 Heat exchanger 21 Processing chamber 22 Oil dispersion device 23 Oil reservoir 24 Filler 25 Demister 100 Compound semiconductor manufacturing device 101 Reactor 102 Exhaust system vacuum pump 103 Exhaust pipe 104 Exhaust tube 105 Final mist separator 106 Detoxification tower

   ────────────────────────────────────────────────── ─── Continuation of front page    (72) Inventor Takenori Nagata             5-1 Anesaki Beach, Ichihara-shi, Chiba Sumitomo Chemical             Industrial Co., Ltd. F-term (reference) 4D002 AA27 AC10 BA13 BA14 BA16                       CA01 DA56 EA13 EA14 FA01                       GA03 GB11                 4D064 AA23 BM34 BM40                 5F045 AA03 AA04 AB10 AB17 AC01                       EG09

Claims (1)

Claims: 1. A phosphorus for a semiconductor manufacturing apparatus for safely removing phosphorus from an exhaust gas from a semiconductor manufacturing apparatus containing phosphorus without solidifying and adhering in an exhaust gas system. A trap device, wherein the exhaust gas is brought into gas-liquid contact with an oil whose temperature is controlled to be equal to or lower than the phosphorus deposition temperature, rapidly cooled, and a trap device for trapping phosphorus solids precipitated thereby in the oil, A filter device for removing the phosphorus solids from the oil in which the phosphorus solids obtained in the trap device are trapped, and the trapping device removes the oil after removing the phosphorus solids from the filter device. A phosphorus trap device for a semiconductor manufacturing device, wherein the device is supplied again for removing phosphorus to the device.